JPH10303163A - Substrate treating device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent the outbreak of bacteria in the pure water supplying system of a substrate treating device which treats substrates by using a treating solution prepared by mixing the pure water and a chemical together. SOLUTION: To a pure water weighing tank 2 which stores pure water required for preparing a treating solution, pure water is supplied from a pure water supplying source 21 through a pure water taking-out line 22 and a pure water discharging line 23. The tank 2 is provided with an overflow discharge line 26 for making excessive pure water overflow the tank 2 so that the pure water may not be stored in the tank 2 in excess of a second storing quantity. After the pure water is stored in the tank 2 by the second storing quantity, pure water is supplied little by little to the tank 2 so that the pure water may overflow into the over flow discharge line 26 until the pure water in the tank 2 is supplied to a preparing tank 3. In other words, the pure water is made to slowly leak out from the tank 2. Therefore, the outbreak of bacteria in the pure water can be prevented, because the pure water is always maintained in a fresh state.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate processing apparatus for performing processing on substrates to be processed such as a semiconductor wafer, a glass substrate for a liquid crystal display device, and a glass substrate for a PDP (plasma display panel).

[0002]

2. Description of the Related Art In a semiconductor device manufacturing process, a batch-type wafer processing apparatus for processing a plurality of semiconductor wafers (hereinafter, simply referred to as "wafers") collectively is sometimes used. This type of wafer processing apparatus is used to collectively immerse a plurality of wafers in a processing liquid, thereby cleaning the wafer surface or removing a thin film formed on the wafer surface.

FIG. 4 is a conceptual diagram showing a configuration example of a wafer processing apparatus. The wafer processing apparatus includes a chemical solution weighing tank 100
The treatment liquid is prepared by mixing the first stored amount of chemical solution stored in the storage tank and the second stored amount of pure water stored in the pure water weighing tank 101 in a preparation tank 102, and the prepared processing liquid is prepared. The liquid is supplied to and stored in the processing tank 103, and the wafer W is immersed in the processing liquid in the processing tank 103 for processing.

A pure water supply source 110 is provided in a pure water weighing tank 101.
A pure water supply path 111 from which pure water is introduced from the tank, and pure water stored in the pure water weighing tank 101 to a mixing tank 102.
The pure water outflow channel 112 for leading to the water is connected. A pure water supply valve 113 and a pure water outflow valve 114 are provided in the middle of the pure water supply path 111 and the pure water outflow path 112, respectively.

When supplying pure water to the pure water measuring tank 101, the pure water outflow valve 114 is closed and the pure water supply valve 11 is closed.
3 is opened. As a result, the pure water accumulates in the pure water weighing tank 101. The pure water supply valve 113 is connected to the pure water weighing tank 101.
Is closed in response to the storage completion signal indicating that the second storage amount of pure water has been stored from the pure water upper limit sensor 115. Thereby, in the pure water weighing tank 101,
A second storage amount of pure water will be stored. afterwards,
At a predetermined timing, the pure water outflow valve 114 is opened, and the pure water stored in the pure water weighing tank 101 flows out to the mixing tank 102.

Thereafter, a pure water lower limit sensor 116 outputs an outflow completion signal indicating that a necessary amount of pure water of the second storage amount has been supplied to the mixing tank 102. Here, the required amount of pure water supplied to the mixing tank 102 is defined as the amount stored in the pure water weighing tank 101 up to the height of the pure water upper limit sensor 115 (that is, the second storage amount) and the pure water lower limit. This corresponds to the difference from the amount stored up to the height of the sensor 116.

When the outflow completion signal is output, the pure water outflow valve 114 is closed and the pure water supply valve 11 is closed.
3 is opened until the storage completion signal is output from the pure water upper limit sensor 115 next. As a result, pure water used for the next preparation is stored in the pure water weighing tank 101. Similarly, when supplying the chemical from the chemical supply source 120 to the chemical weighing tank 100, the chemical outflow valve 121 is closed and the chemical supply valve 12 is closed.
2 is opened until a storage completion signal is output from the chemical liquid upper limit sensor 123, and the chemical liquid of the first stored amount is supplied to the chemical liquid weighing tank 10
Stored at 0. Thereafter, the chemical solution outflow valve 121 is opened, and the chemical solution outflow valve 121 is closed in response to the outflow completion signal being output from the chemical solution lower limit sensor 124, whereby the first liquid stored in the chemical solution weighing tank 100 is stored. The required amount of the chemical solution out of the stored amount is discharged to the preparation tank 102 via the chemical solution outflow passage 125.

[0008]

However, the second amount of pure water stored in the pure water weighing tank 101 does not always flow out to the mixing tank 102 immediately after storage, and the progress of the process Depending on the circumstances and production process, for example, it may be discharged after several tens of minutes to several hours. That is,
Pure water may remain in the pure water supply path 111 and the pure water weighing tank 101 for a relatively long time. In this case, bacteria are generated in the pure water supply path 111 and the pure water weighing tank 101, and the pure water is contaminated. If the pure water is contaminated, the processing liquid prepared using the pure water is also contaminated,
Consequently, the wafer W processed by the processing liquid is contaminated.

Accordingly, an object of the present invention is to solve the above-mentioned technical problems and to treat bacteria in a pure water supply system when a substrate is treated using a treatment solution prepared by mixing pure water and a chemical solution. It is an object of the present invention to provide a substrate processing apparatus capable of preventing the occurrence of the generation.

[0010]

Means for Solving the Problems and Effects of the Invention According to the first aspect of the present invention, there is provided a chemical solution weighing tank for storing a first storage amount of a chemical solution, and a second storage amount. A pure water weighing tank for storing pure water, a mixing tank for mixing the chemical solution and the pure water to prepare a processing liquid necessary for substrate processing, and a chemical liquid flow valve that can be opened / closed. And a drug solution outflow path connecting the drug solution weighing tank and the preparation tank,
A pure water outflow path connecting the pure water weighing tank and the blending tank via a pure water flow valve that can be opened / closed, and the pure water weighing when the pure water outflow valve is closed. Pure water supplying means for supplying pure water to the tank, and further continuing to supply even if the storage amount in the pure water weighing tank reaches the second storage amount, and pure water stored in the pure water weighing tank. A substrate processing apparatus comprising: an overflow discharge path for discharging pure water in a pure water weighing tank to outside of the pure water weighing tank when the amount exceeds a second storage amount.

According to the present invention, the pure water in the pure water weighing tank can overflow while the pure water is supplied into the pure water weighing tank. The pure water in the supply system can always be kept fresh without stagnation. Therefore, the generation of bacteria in the pure water supply system can be prevented,
Pure water is not contaminated. Therefore, the processing liquid generated using the pure water is also free from contamination, so that the substrate can be satisfactorily processed. Therefore, a high-quality substrate can be provided.

Further, since the pure water in the pure water weighing tank overflows, if the supply of the pure water is stopped during the overflow, the storage amount of the pure water in the pure water weighing tank becomes second.
Storage amount. Therefore, a conventional upper limit sensor becomes unnecessary. According to a second aspect of the present invention, the pure water supply means includes: a pure water supply path connecting a pure water supply source and the pure water weighing tank via a pure water supply valve that can be opened / closed; A switching unit configured to switch a flow rate of pure water supplied from the water supply source to the pure water weighing tank through the pure water supply path between a first flow rate and a second flow rate that is higher than the first flow rate. The pure water flow rate adjusting means, and before the pure water stored in the pure water weighing tank reaches the second storage amount, the pure water flow rate such that the pure water flow rate becomes the second flow rate. Controlling the flow rate adjusting means, when the pure water stored in the pure water weighing tank reaches the second storage amount, the pure water is adjusted so that the flow rate of the pure water becomes the first flow rate; 2. A control means for controlling a water flow rate adjusting means.
It is a substrate processing apparatus of a statement.

According to the present invention, since the pure water at the second flow rate is supplied to the pure water weighing tank until the stored amount of pure water in the pure water weighing tank reaches the second stored amount, Supply can be done quickly. Further, when the stored amount of pure water in the pure water weighing tank reaches the second stored amount, pure water having a first flow rate smaller than the second flow rate is supplied to the pure water weighing tank. For example, when discharging the overflowed pure water out of the apparatus, the amount of the discharged pure water can be minimized. Therefore, pure water can be saved.

According to a third aspect of the present invention, the pure water flow rate adjusting means is interposed in the pure water supply path and can be opened / closed, and an upstream side and a downstream side of the communication valve.
A bypass passage having both ends connected to the pure water supply passage, and a flow control valve interposed in the bypass passage and configured to regulate a flow rate of pure water flowing through the bypass passage; The flow rate of pure water supplied to the pure water weighing tank is switched between the first flow rate and the second flow rate by controlling the opening and closing of the water.
It is a substrate processing apparatus of a statement.

According to the present invention, the adjustment of the flow rate of pure water can be achieved by controlling the opening and closing of the communication valve. That is, when the communication valve is closed, the pure water is supplied to the pure water weighing tank through the bypass passage, so that the flow control valve is set so that the flow of the pure water in the bypass passage becomes the first flow amount. Is adjusted, the flow rate of pure water supplied to the pure water weighing tank can be set as the first flow rate. Further, if the communication valve is opened in this state, pure water flows through the two systems of the pure water supply passage and the bypass passage.
If the diameter of the pure water supply path and the like are determined so that the flow rate of the pure water is determined, the flow rate of the pure water to the pure water weighing tank can be set as the second flow rate.

As described above, the flow rate of the pure water can be adjusted by controlling the opening and closing of the communication valve. Therefore, the flow rate can be adjusted with a simple configuration at a low cost. The invention according to claim 4 further includes a pure water circulation path connected to the pure water supply valve and the pure water supply source, wherein the pure water supply valve supplies pure water supplied from the pure water supply source. The substrate processing apparatus according to claim 2 or 3, wherein the substrate can be selectively guided to the pure water weighing tank and the pure water circulation path.

According to the present invention, the pure water can be circulated in the pure water supply source, the pure water supply path, and the pure water circulation path while prohibiting the supply of the pure water to the pure water weighing tank. .
Therefore, when it is necessary to prohibit the supply of pure water to the pure water weighing tank as in the preparation of the processing liquid, if pure water is circulated, bacteria can be further circulated in the pure water supply path. Occurrence can be prevented. Therefore, contamination of pure water can be more reliably prevented.

[0018]

Embodiments of the present invention will be described below in detail with reference to the accompanying drawings. FIG. 1 is a conceptual diagram showing a wafer processing apparatus which is a substrate processing apparatus according to an embodiment of the present invention. The wafer processing apparatus includes a required amount of a chemical solution of the first stored amount stored in the chemical solution weighing tank 1 and a required amount of pure water of the second stored amount stored in the pure water weighing tank 2. Are mixed in the preparation tank 3 to prepare a processing liquid, and the prepared processing liquid is supplied to and stored in the processing tank 4, and the wafer W is processed in the processing tank 4.
The processing of the wafer W in the processing bath 4 is performed while the processing liquid overflows in the processing bath 4.

A chemical solution is supplied to the chemical solution weighing tank 1 from a chemical solution supply source 10 through a chemical solution supply path 11. As the chemical, hydrofluoric acid, ammonia, aqueous ammonia, aqueous hydrochloric acid, or the like is used. A chemical liquid supply valve VSC that can be opened / closed is provided at an intermediate portion of the chemical liquid supply path 11 so that the supply of the chemical liquid to the chemical liquid weighing tank 1 and the stop of the supply can be controlled.

The chemical solution weighing tank 1 is connected to a chemical solution outflow path 12 for supplying the chemical solution stored in the chemical solution weighing tank 1 to the mixing tank 3. A chemical liquid outflow valve VOC that can be opened / closed is provided at an intermediate portion of the chemical liquid outflow passage 12.
With this configuration, the chemical solution stored in the chemical solution weighing tank 1 can flow out to the mixing tank 3, and the outflow of the chemical solution from the chemical solution weighing tank 1 to the mixing tank 3 can be prohibited. I have.

A chemical liquid upper limit sensor SUC is arranged above the side surface of the chemical liquid measuring tank 1. Chemical liquid upper limit sensor SUC
Turns on when the chemical solution is stored in the chemical solution weighing tank 1 by the first storage amount, and outputs a storage completion signal. In addition, a chemical solution lower limit sensor SD is provided below the side surface of the chemical solution weighing tank 1.
C is provided. The chemical liquid lower limit sensor SDC is turned on when a required amount of the chemical liquid out of the chemical liquid stored in the chemical liquid weighing tank 1 is completed, and outputs a supply completion signal.

In connection with the pure water weighing tank 2, the pure water supply mechanism 2
0 is provided. The pure water supply mechanism 20 is for supplying the pure water stored in the pure water supply source 21 to the pure water weighing tank 2, and is connected to the pure water supply source 21.
2 is provided. The end of the pure water outlet 22 on the side opposite to the pure water supply source 20 is the first end of a pure water supply valve VSW which is a three-way valve.
It is connected to port P1. Second pure water supply valve VSW
One end of the pure water discharge path 23 is connected to the port P2. The other end of the pure water discharge path 23 reaches the pure water weighing tank 2. As a result, when the ports P1 and P2 of the pure water supply valve VSW are connected, the pure water supply passage 21
Pure water is supplied to the pure water weighing tank 2 via the pure water discharge path 2 and the pure water discharge path 23. Also, pure water supply valve VSW
One end of the pure water circulation path 24 is connected to the third port P3. With this configuration, when the ports P1 and P3 of the pure water supply valve VSW are connected, pure water in the pure water supply source 21 is supplied to the pure water supply source 21 via the pure water extraction path 22 and the pure water circulation path 24. It can be returned.

A communication valve VTW that can be opened / closed is provided in the middle of the pure water discharge passage 22. A bypass passage 25 for guiding pure water from the pure water supply source 21 to the pure water supply valve VSW without passing through the communication valve VTW branches off from the pure water extraction passage 22 on the upstream side of the communication valve VTW. A flow regulating valve VVW which is always open is provided in the middle of the bypass passage 25.
Is interposed. The flow rate adjustment valve VVW is adjusted so as to allow a predetermined first flow rate of pure water to pass therethrough. When the communication valve VTW is opened, the pure water extraction passage 22 can pass pure water having a second flow rate higher than the first flow rate together with pure water passing through the bypass passage 25. It has become. With this configuration, the pure water weighing tank 2
The pure water can be supplied at either the first flow rate or the second flow rate.

The pure water supply mechanism 20 also includes a pure water weighing tank 2
An overflow discharge path 26 is provided for overflowing the pure water stored therein. The overflow discharge path 26 is for overflowing the pure water to the outside of the pure water weighing tank 2 when the pure water reaches the second storage amount even when the pure water reaches the second storage amount. It is connected to a supply source 21. With this configuration, the pure water that has overflowed is returned to the pure water supply source 21.

In connection with the overflow discharge path 26, a pure water detection sensor SUW that is turned on when pure water is discharged to the overflow discharge path 26 and outputs a pure water detection signal is provided. The pure water weighing tank 2 is connected to a pure water outflow path 27 for guiding the pure water stored in the pure water weighing tank 2 to the mixing tank 3. A pure water outflow valve VOW which can be opened / closed is provided at an intermediate portion of the pure water outflow passage 27, whereby the pure water in the pure water weighing tank 2 can be discharged to the mixing tank 3, Further, the outflow of the pure water in the pure water weighing tank 2 to the mixing tank 3 can be prohibited.

In the vicinity of the lower side of the pure water weighing tank 2,
When the pure water in the pure water weighing tank 2 is supplied to the mixing tank 3 and as a result, the necessary amount of pure water out of the pure water in the pure water weighing tank 2 has been flown out, and the supply completion signal is output. A pure water lower limit sensor SDW for outputting is provided. The mixing tank 3 is provided with a temperature adjusting means (not shown), and the processing liquid stored in the mixing tank 3 is maintained at a predetermined temperature, for example, 40 ° C. to 80 ° C. For this reason, the processing on the wafer W in the processing tank 4 is always performed appropriately under certain conditions.

The mixing tank 3 and the processing tank 4 are connected by a processing liquid supply path 28.
A processing liquid supply valve V that can be opened and closed is interposed in the middle of the processing liquid supply valve V. By opening / closing the processing liquid supply valve V, the supply of the processing liquid to the processing tank 4 can be started / stopped. FIG. 2 is a block diagram showing a main electrical configuration of the wafer processing apparatus. The wafer processing apparatus includes a control unit 30 that functions as a control center of the wafer processing apparatus. The control unit 30 is configured by a microcomputer or the like, and executes various processes such as a processing liquid preparation process according to a control program stored in the memory 31.

The controller 30 receives as input signals a storage completion signal from the chemical solution upper limit sensor SUC and a chemical solution lower limit sensor SUC.
A supply completion signal from the DC, a supply completion signal from the pure water lower limit sensor SDW, and a pure water detection signal from the pure water detection sensor SUW are provided. Control unit 30
Is based on these input signals, the chemical supply valve VSC,
Chemical outflow valve VOC, communication valve VTW and pure water outflow valve VO
The opening and closing of W and the switching of the connection port of the pure water supply valve VSW are controlled.

The control unit 30 controls opening and closing of the processing liquid supply valve V according to a control program. FIG. 3 is a flowchart for explaining the processing liquid preparation processing executed in the control unit 30. The control unit 30 starts supplying the chemical solution and the pure water to each of the weighing tanks 1 and 2 at a predetermined timing, for example, at the timing when the chemical solution lower limit sensor SDC and the pure water lower limit sensor SDW output the supply completion signal (step). S1). Specifically, the chemical outflow valve VO
While closing C, the chemical supply valve VSC is opened. As a result, the chemical is supplied from the chemical supply source 10 to the chemical weighing tank 1 via the chemical supply path 11, and is stored in the chemical weighing tank 1. Further, the pure water outflow valve VOW is closed, the communication valve VTW is opened, and the switching of the connection port of the pure water supply valve VSW is controlled to connect the ports P1 and P2. As a result, a second flow of pure water is introduced from the pure water supply source 21 through the pure water extraction passage 22 and the bypass passage 25 to the pure water discharge passage 23 through the pure water supply valve VSW, It is guided to the pure water weighing tank 2 through the discharge path 23. Thereby, pure water is supplied to the pure water weighing tank 2 at a stretch, and is stored in the pure water weighing tank 2.

Next, the control unit 30 controls the chemical solution upper limit sensor S
Based on the output of the UC, it is determined whether or not the chemical has been stored in the chemical weighing tank 1 by the first storage amount, and based on the output of the pure water detection sensor SUW, the pure water has only the second storage amount. It is determined whether or not the water is stored in the pure water weighing tank 2 (step S2). If the chemical liquid upper limit sensor SUC is turned on and the storage completion signal is output, it can be considered that the chemical liquid has been stored by the first storage amount, so the control unit 30 inputs the storage completion signal from the chemical liquid upper limit sensor SUC. , The chemical supply valve VSC is closed (step S3). As a result, the first stored amount of the drug solution is stored in the drug solution weighing tank 1.

When the pure water detection sensor SUW is turned on and a pure water detection signal is output, the pure water storage amount in the pure water weighing tank 2 reaches the second storage amount, and as a result, pure water is It can be considered that the waste gas is discharged to the overflow discharge passage 26.
Therefore, the control unit 30 closes the communication valve VTW in response to the input of the pure water detection signal (Step S3). As a result, the pure water in the pure water supply source 21 is guided to the pure water discharge path 23 through the bypass path 25 and further to the pure water weighing tank 1. On the other hand, the pure water weighing tank 1 stores the second storage amount of pure water as described above. Therefore, the pure water in the pure water weighing tank 1 is discharged to the overflow discharge path 26 thereafter. However, at this time, the pure water weighing tank 1
Since the flow rate of the pure water supplied to the hopper is the first flow rate, the pure water discharged to the overflow discharge path 26 is small. That is, pure water is slowly leaked.

Thereafter, at a predetermined timing, the control unit 30 starts preparation of the processing liquid. Specifically, the connection port of the pure water supply valve VSW is controlled to connect the ports P1 and P3 (Step S4). As a result, the supply of pure water to the pure water weighing tank 2 is stopped. Thereby, the slow leak of the pure water is stopped, so that the stored amount of the pure water in the pure water weighing tank 2 can be accurately set to the second stored amount.
On the other hand, if the discharge of the pure water in the pure water supply source 21 is stopped, the pure water stays in the pure water outlet 22 and bacteria may be generated. Therefore, pure water is circulated by connecting ports P1 and P3. That is, the pure water in the pure water supply source 21 is guided to the pure water circulation path 24 through the bypass path 25, and further returns to the pure water supply source 21.

Thereafter, the control unit 30 controls the chemical outflow valve VOC.
Then, the pure water outflow valve VOW is opened (step S5).
As a result, the chemical solution in the chemical solution weighing tank 1 and the pure water in the pure water weighing tank 2 flow out to the mixing tank 3, and the chemical solution and the pure water are mixed.
And mixed. Thereafter, the control unit 30 determines whether or not only a required amount of the chemical solution out of the first stored amount of the chemical solution stored in the chemical solution weighing tank 1 has flowed out to the preparation tank 3 based on the output of the chemical solution lower limit sensor SDC. Is determined (step S6).
Further, based on the output of the pure water lower limit sensor SDW, it is determined whether or not only a necessary amount of pure water of the second stored amount of pure water stored in the pure water weighing tank 2 has flowed out to the mixing tank 3. It is determined (step S6).

When the chemical liquid lower limit sensor SDC is turned on and the supply completion signal is output, it can be considered that almost all of the required amount of chemical liquid has flowed into the mixing tank 3. When the pure water lower limit sensor SDW is turned on and the supply completion signal is output, it can be considered that almost all the necessary amount of pure water has flowed out to the preparation tank 3. In this case, it can be considered that a necessary amount of the chemical solution and pure water are mixed in the preparation tank 3 to generate a processing solution having a necessary concentration.

Therefore, the control unit 30 sets the chemical liquid lower limit sensor S
At the same time that the outflow completion signal is output from the DC and the pure water lower limit sensor SDW, the chemical solution outflow valve VOC and the pure water outflow valve VOW are closed (step S7), and the outflow of the chemical solution and pure water to the mixing tank 3 is forcibly stopped. Let it. Thereafter, for example, immediately after step 7, supply of the chemical solution and pure water used for the next process is started (step S8). Specifically, the control unit 30 opens the chemical supply valve VSC. as a result,
The chemical in the chemical supply source 10 is supplied to the chemical weighing tank 1 via the chemical supply path 11. Further, the connection port of the pure water supply valve VSW is controlled, the ports P1 and P2 are connected, and the communication valve VTW is opened. As a result, the second flow of pure water is supplied to the pure water weighing tank 2.

Thereafter, the control unit 30 returns to step S2 to determine whether or not the chemical is stored in the chemical weighing tank 1 by the first storage amount, and determines whether the pure water is the pure water by the second storage amount. The process of determining whether or not the sample is stored in the weighing tank 2 is executed again. When the chemical is stored in the chemical weighing tank 1 by the first storage amount, the control unit 30 closes the chemical supply valve VSC and stops the chemical supply. When the storage amount of pure water in the pure water weighing tank 2 reaches the second storage amount, the control unit 3
A value of 0 closes the communication valve VTW and causes a slow leak of pure water. Thereafter, in such a state, the process waits until the next processing liquid is prepared.

On the other hand, the controller 30 controls the processing liquid supply path 28
Then, the processing liquid supply valve V interposed is opened, and the supply of the processing liquid in the mixing tank 3 to the processing tank 4 is started. In the processing tank 4, the supplied processing liquid accumulates and eventually overflows. The processing is performed on the wafer W in such a state.
Thereafter, at an arbitrary timing when the processing on the wafer W should be terminated, the processing liquid supply valve V interposed in the processing liquid supply path 28 is closed to supply the processing liquid in the mixing tank 3 to the processing tank 4. Stop.

As described above, according to this embodiment, even after pure water has accumulated in the pure water weighing tank 2 by the first storage amount, the pure water discharge path 22, the pure water discharge path 23, and the pure water Since pure water is constantly circulated in the tank 2, the pure water in the pure water discharge path 22, the pure water discharge path 23, and the pure water in the pure water weighing tank 2 can be kept fresh. Bacteria can be prevented from being generated inside and the like. Moreover, even while pure water is being supplied to the mixing tank 3, the pure water circulation path is used to prevent the pure water from staying in the pure water extraction path 22. Can be more reliably prevented from occurring. Therefore, the contamination of the pure water can be prevented, so that the contamination of the processing liquid can be prevented, and the contamination of the wafer W can be prevented. Therefore, high quality wafer W
Can be provided.

When pure water is stored in the pure water weighing tank 2, the second flow of pure water is introduced into the pure water weighing tank 2 at once, while the pure water is introduced into the pure water circulation path 24 and the overflow discharge path. 26
In the case of circulating the pure water, since pure water having a first flow rate smaller than the second flow rate is made to flow, it is possible to realize a quick pure water supply and to drive the pure water supply source 21. The source is not overburdened.

In the above description, the pure water is circulated through the pure water circulation path 24 and the overflow discharge path 26 to prevent the pure water from staying. For example, the pure water is discharged outside the apparatus. You may do so. In this case, if a configuration in which a small amount of pure water flows as described above, the discharged pure water can be minimized, which leads to saving of pure water. However, it goes without saying that circulating pure water without discharging it leads to saving of pure water.

The description of one embodiment of the present invention is as described above, but the present invention is not limited to the above embodiment. For example, in the above embodiment, the communication valve VTW,
Although separate components are used as the flow control valve VVW and the pure water supply valve VSW, for example, one valve may be used for these functions. According to this configuration, the number of components can be reduced, which leads to a reduction in component costs. Also, since the number of pipe connection steps is reduced,
Connection work is simplified.

In the above embodiment, pure water is supplied to the mixing tank 3.
During the supply of pure water, pure water is guided to the pure water circulation path 24 to prevent the pure water from staying in the pure water extraction path 22. However, the time during which the pure water is supplied to the preparation tank 3 is not so long, and therefore, depending on the conditions, the generation of bacteria may not occur. Therefore, the pure water circulation path 24 may not be provided. In this case, since the pure water supply valve VSW does not need to be a three-way valve and may be a two-way valve, the configuration is simplified and the cost of parts can be reduced.

Further, in the above-described embodiment, the flow rate of pure water supplied is reduced in order to prevent stagnation of pure water. If it can be used, there is no particular problem even if the flow rate of the pure water is increased to the normal second flow rate. Therefore, in such a case, the communication valve VTW and the flow control valve VVW may not be provided. According to this configuration, since the number of parts is reduced, the cost of parts is reduced.

Further, in the above-described embodiment, the communication valve VTW is interposed in the middle of the pure water discharge path 22, and the bypass path 25 having both ends connected upstream and downstream of the communication valve VTW is provided. By controlling the opening and closing of the communication valve VTW, the flow rate of pure water to the pure water weighing tank 2 can be controlled by the first flow rate and the second flow rate.
The flow rate is switched to However, instead of such a configuration, for example, a valve with a flow rate adjusting function may be interposed in the middle of the pure water discharge passage 22.

As a valve with a flow rate adjusting function, for example, a valve whose opening degree can be adjusted so that the flow rate of pure water flowing through the pure water discharge passage 22 becomes the first flow rate and the second flow rate. Can be considered. In addition, for example, the pure water discharge path 2
2 has a function of switching these paths when another path through which pure water of the first flow rate can be connected is connected to the pure water extraction path 22. Can be considered.

Further, in the above embodiment, the wafer W
Although the present invention is applied to an apparatus that performs treatment by immersing the processing liquid in a processing liquid, the present invention mixes a chemical liquid and pure water to prepare a processing liquid, and then prepares the prepared processing liquid. The present invention can be applied to any apparatus that processes a wafer W by using the apparatus. For example, the present invention can be applied to an apparatus that chucks a wafer W with a rotary chuck and rotates the wafer W at a high speed, and on the other hand, processes a processing liquid from a nozzle toward the surface of the wafer W.

Further, in the above embodiment, the case where the present invention is applied to an apparatus for processing a wafer W is described. However, for example, an apparatus for processing a glass substrate for a liquid crystal display device or a PDP glass substrate is also described. The invention can be applied. In addition, it is possible to make various design changes within the scope described in the claims.

[Brief description of the drawings]

FIG. 1 is a conceptual diagram illustrating a configuration of a wafer processing apparatus that is a substrate processing apparatus according to an embodiment of the present invention.

FIG. 2 is a block diagram showing a main electrical configuration of the wafer cleaning apparatus.

FIG. 3 is a flowchart illustrating a processing liquid preparation process.

FIG. 4 is a conceptual diagram showing a configuration of a conventional wafer processing apparatus.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Chemical solution measuring tank 2 Pure water measuring tank 3 Mixing tank 12 Chemical solution outflow path 20 Pure water supply mechanism (pure water supply means) 21 Pure water supply source 22 Pure water extraction path (pure water supply path) 23 Pure water discharge path (pure (Water supply path) 24 Pure water circulation path 25 Bypass path (Pure water flow rate control means) 26 Overflow discharge path 27 Pure water outflow path 30 Control unit VOC Chemical liquid discharge valve VSW Pure water supply valve VTW Communication valve (Pure water supply amount control means) ) VVW flow control valve (pure water flow control means) VOW pure water outflow valve

Claims (4)

[Claims] 1. A chemical liquid weighing tank for storing a first storage amount of a chemical liquid, a pure water weighing tank for storing a second storage amount of pure water, mixing the chemical liquid and pure water, A preparation tank for preparing a processing liquid necessary for substrate processing, a chemical solution outflow path connecting the above-mentioned chemical weighing tank and the above-mentioned preparation tank via a chemical liquid flow valve that can be opened / closed, A pure water outflow path connecting the pure water weighing tank and the mixing tank via a pure water flow valve, and when the pure water outflow valve is closed, pure water is supplied to the pure water weighing tank. A pure water supply means for supplying and continuing to supply even when the storage amount in the pure water weighing tank reaches the second storage amount, and a pure water stored in the pure water weighing tank for the second storage amount. It includes an overflow discharge path for discharging the pure water in the pure water weighing tank out of the pure water weighing tank when it exceeds The substrate processing apparatus according to. 2. The pure water supply means for connecting a pure water supply source and the pure water weighing tank via a pure water supply valve that can be opened / closed, and a pure water supply source. Pure water flow rate for switching the pure water flow rate supplied to the pure water weighing tank through the pure water supply path between a first flow rate and a second flow rate larger than the first flow rate Adjusting means, and before the pure water stored in the pure water weighing tank reaches the second storage amount, the flow rate of the pure water is the second flow rate.
Controlling the pure water flow rate adjusting means so that the pure water stored in the pure water weighing tank reaches the second storage amount. 2. A substrate processing apparatus according to claim 1, further comprising control means for controlling said pure water flow rate adjusting means so that said flow rate becomes 1. 3. The pure water flow control means is interposed in the pure water supply path and can be opened / closed. The pure water supply path is connected to the pure water supply path upstream and downstream of the communication valve. A bypass passage having both ends connected thereto, and a flow control valve interposed in the bypass passage and controlling a flow rate of pure water flowing through the bypass passage, wherein the control means controls opening and closing of the communication valve. By the above, the flow rate of pure water supplied to the pure water weighing tank is controlled by the first
3. The substrate processing apparatus according to claim 2, wherein the flow rate is switched between the first flow rate and the second flow rate. 4. The pure water supply valve further includes a pure water circulation path connecting the pure water supply valve to the pure water supply source, wherein the pure water supply valve supplies pure water supplied from the pure water supply source to the pure water supply path. 4. The substrate processing apparatus according to claim 2, wherein the substrate processing apparatus can be selectively guided to a weighing tank and a pure water circulation path.