JPH10261630A - プラズマ処理方法及び装置 - Google Patents

プラズマ処理方法及び装置

Info

Publication number
JPH10261630A
JPH10261630A JP9065984A JP6598497A JPH10261630A JP H10261630 A JPH10261630 A JP H10261630A JP 9065984 A JP9065984 A JP 9065984A JP 6598497 A JP6598497 A JP 6598497A JP H10261630 A JPH10261630 A JP H10261630A
Authority
JP
Japan
Prior art keywords
gas
deposition
dielectric
plasma processing
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9065984A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10261630A5 (enrdf_load_stackoverflow
Inventor
Tomohiro Okumura
智洋 奥村
Hiroshi Tanabe
浩 田辺
Kazuyuki Sawada
和幸 澤田
Yasushi Arai
康司 新井
Naoki Suzuki
直樹 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP9065984A priority Critical patent/JPH10261630A/ja
Publication of JPH10261630A publication Critical patent/JPH10261630A/ja
Publication of JPH10261630A5 publication Critical patent/JPH10261630A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Drying Of Semiconductors (AREA)
JP9065984A 1997-03-19 1997-03-19 プラズマ処理方法及び装置 Pending JPH10261630A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9065984A JPH10261630A (ja) 1997-03-19 1997-03-19 プラズマ処理方法及び装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9065984A JPH10261630A (ja) 1997-03-19 1997-03-19 プラズマ処理方法及び装置

Publications (2)

Publication Number Publication Date
JPH10261630A true JPH10261630A (ja) 1998-09-29
JPH10261630A5 JPH10261630A5 (enrdf_load_stackoverflow) 2005-02-17

Family

ID=13302792

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9065984A Pending JPH10261630A (ja) 1997-03-19 1997-03-19 プラズマ処理方法及び装置

Country Status (1)

Country Link
JP (1) JPH10261630A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007040110A1 (ja) * 2005-09-30 2007-04-12 Tokyo Electron Limited プラズマ処理装置と方法
JP2007165849A (ja) * 2005-11-15 2007-06-28 Matsushita Electric Ind Co Ltd プラズマ処理装置
JP2010183092A (ja) * 2005-11-15 2010-08-19 Panasonic Corp プラズマ処理装置
KR101242248B1 (ko) * 2005-11-02 2013-03-12 파나소닉 주식회사 플라즈마 처리 장치
JP2023112780A (ja) * 2022-02-02 2023-08-15 東京エレクトロン株式会社 基板処理装置、および基板処理方法
KR20240065994A (ko) * 2022-11-07 2024-05-14 주식회사 이오테크닉스 웨이퍼 가공 장치

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007040110A1 (ja) * 2005-09-30 2007-04-12 Tokyo Electron Limited プラズマ処理装置と方法
JP2007103519A (ja) * 2005-09-30 2007-04-19 Tokyo Electron Ltd プラズマ処理装置と方法
KR101242248B1 (ko) * 2005-11-02 2013-03-12 파나소닉 주식회사 플라즈마 처리 장치
TWI409873B (zh) * 2005-11-02 2013-09-21 松下電器產業股份有限公司 電漿處理裝置
JP2007165849A (ja) * 2005-11-15 2007-06-28 Matsushita Electric Ind Co Ltd プラズマ処理装置
JP2010183092A (ja) * 2005-11-15 2010-08-19 Panasonic Corp プラズマ処理装置
JP2023112780A (ja) * 2022-02-02 2023-08-15 東京エレクトロン株式会社 基板処理装置、および基板処理方法
KR20240065994A (ko) * 2022-11-07 2024-05-14 주식회사 이오테크닉스 웨이퍼 가공 장치

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