JPH10244615A - Transparent conductive laminated body and el element - Google Patents

Transparent conductive laminated body and el element

Info

Publication number
JPH10244615A
JPH10244615A JP9052010A JP5201097A JPH10244615A JP H10244615 A JPH10244615 A JP H10244615A JP 9052010 A JP9052010 A JP 9052010A JP 5201097 A JP5201097 A JP 5201097A JP H10244615 A JPH10244615 A JP H10244615A
Authority
JP
Japan
Prior art keywords
layer
transparent conductive
conductive layer
fluororesin
transparent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9052010A
Other languages
Japanese (ja)
Other versions
JP3716537B2 (en
Inventor
Nobumi Yokota
述史 横田
Wataru Wada
渉 和田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP05201097A priority Critical patent/JP3716537B2/en
Publication of JPH10244615A publication Critical patent/JPH10244615A/en
Application granted granted Critical
Publication of JP3716537B2 publication Critical patent/JP3716537B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To improve adhesion to a luminous layer, and luminous efficiency of an El element, prevent uneven luminance, and improve durability and handling by sequentially laminating a transparent base, a transparent conductive layer, and a fluororesin layer. SOLUTION: An polyester film is preferably used for a transparent base 1, on which a transparent conductive layer 2 is laminated. The transparent conductive layer 2 is formed from indium oxide, tin monoxide, and gold by vacuum deposition, sputtering, ion plating or the like. A fluororesin layer 4 is laminated on the transparent conductive layer 2, with enhancing bond strength especially in the case of adhering to a phosphor layer. It is preferable to provide a metallic layer 3 composed of platinum and/or palladium between the transparent conductive layer 2 and the fluororesin layer 4. A forming process of the fluororesin layer 4, laminated on the transparent conductive layer 2 or the metallic layer 3, is performed by gravure coating, reverse coating or the like.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、エレクトロルミネ
ッセンス(以下ELと略記する)素子用透明導電性積層
体およびEL素子に関するものであり、EL等の表示装
置に使用して、好適な透明導電性積層体およびEL素子
に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transparent conductive laminate for an electroluminescence (hereinafter abbreviated as EL) device and an EL device, which is suitable for use in a display device such as an EL device. The present invention relates to a laminate and an EL element.

【0002】[0002]

【従来の技術】従来、EL素子用透明導電性積層体とし
て、透明性を有する基材と透明導電性層からなる積層体
をベースとし、該透明導電性層上に、発光体層、誘電体
層、および背面電極(金属箔等)を順次形成する(特公
平1−81112号公報)方法が知られている。また予
め形成された発光体層、絶縁体層、および背面電極から
なる積層体の光体層を前記透明導電層とラミネート方式
により接合した後、さらに全体を透明防湿外皮フィルム
で被覆して構成したものが知られている。最近では発光
体層における蛍光体が、水分遮蔽性の処理がされたこと
を特徴とするEL発光体層と、絶縁体層、および背面電
極をスクリーン印刷で順次積層し、透明防湿外皮フィル
ムを使用しない廉価タイプのものも知られている。
2. Description of the Related Art Conventionally, a transparent conductive laminate for an EL element has been based on a laminate comprising a transparent base material and a transparent conductive layer, and a light emitting layer, a dielectric layer and a dielectric layer are formed on the transparent conductive layer. There is known a method of sequentially forming a layer and a back electrode (metal foil or the like) (Japanese Patent Publication No. 1-81112). Further, after the light emitting layer of the laminate composed of the preformed light emitting layer, the insulating layer, and the back electrode was bonded to the transparent conductive layer by a laminating method, the whole was further covered with a transparent moisture-proof outer skin film. Things are known. Recently, the phosphor in the phosphor layer has been subjected to a moisture shielding treatment, and the EL phosphor layer, the insulator layer, and the back electrode are sequentially laminated by screen printing, and a transparent moisture-proof outer skin film is used. Inexpensive types that do not are also known.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、EL素
子用透明導電性積層体として、透明防湿外皮フィルムを
使用しないものは耐久性が不十分であった。本発明者ら
は透明防湿外皮フィルムを使用しないEL素子であっ
て、接着力および耐久性に優れた透明導電性積層体およ
びEL素子を得ることを検討した。すなわち本発明は、
EL素子の外部雰囲気から侵入する水分の影響に対し、
発光体層との接着性に優れ、EL素子の発光効率を向上
させ、輝度ムラの発生を防止し、優れた耐久性と取扱い
性を有するEL素子用透明導電性積層体を提供すること
を目的とする。
However, a transparent conductive laminate for an EL element which does not use a transparent moisture-proof outer cover film has insufficient durability. The present inventors have studied to obtain a transparent conductive laminate and an EL element which are an EL element not using a transparent moisture-proof outer cover film and have excellent adhesive strength and durability. That is, the present invention
For the effect of moisture entering from the outside atmosphere of the EL element,
An object of the present invention is to provide a transparent conductive laminate for an EL element having excellent adhesion to a light-emitting layer, improving luminous efficiency of the EL element, preventing occurrence of luminance unevenness, and having excellent durability and handleability. And

【0004】また、EL素子用透明導電性積層体は透明
導電性層面にスリ傷等を生じると、断線による不点灯が
発生する問題があり、本発明はこれらの問題を生じるこ
となく、EL素子加工工程における取扱い性を容易にす
ることを目的としたものである。
[0004] Further, the transparent conductive laminate for an EL element has a problem in that if the surface of the transparent conductive layer is scratched or the like, unlit lighting occurs due to disconnection, and the present invention does not cause these problems. The purpose is to facilitate handling in the processing step.

【0005】[0005]

【課題を解決するための手段】本発明は、透明性を有す
る基材(A),透明導電層(B)およびフっ素系樹脂層
(C)がこの順で積層されていることを特徴とするEL
素子用透明導電性積層体、さらには透明導電層(B)と
フッ素系樹脂層(C)の間に白金および/またはパラジ
ウムからなる金属層(D)を有することを特徴とするE
L素子用透明導電性積層体並びにこれらの透明導電性積
層体を用いたEL素子により達成される。
The present invention is characterized in that a transparent substrate (A), a transparent conductive layer (B) and a fluorine-based resin layer (C) are laminated in this order. EL
E comprising a transparent conductive laminate for an element, and a metal layer (D) made of platinum and / or palladium between the transparent conductive layer (B) and the fluororesin layer (C).
This is achieved by a transparent conductive laminate for an L element and an EL element using these transparent conductive laminates.

【0006】[0006]

【発明の実施の形態】本発明の透明導電性積層体におい
て使用される透明性を有する基材(A)としては、特に
限定されないが耐熱性の優れた各種高分子フィルムが適
している。具体的にはポリエチレンテレフターレート等
のポリエステル、ポリカーボネート、ポリ塩化ビニル、
ポリエチレン、ポリプロピレン、ポリアミド、セルロー
スアセテート、ポリサルフォン等、広範な高分子フィル
ムを挙げることができるが、特にこれらの中でもポリエ
ステルフィルムが好ましい。これは、ポリエステルフィ
ルムが透明性、寸法安定性、厚みの均一性、強度、耐熱
性、耐薬品性、耐水性等の性質に優れたものであるから
である。通常、前記ポリエステルフィルムは、機械的性
質を向上させるために二軸方向に延伸されたものが用い
られる。前記絶縁性透明高分子フィルム(A)は、透明
電極としての機能を考慮し、通常50μm〜250μm
の厚みを有するものを用いる。
BEST MODE FOR CARRYING OUT THE INVENTION The transparent substrate (A) used in the transparent conductive laminate of the present invention is not particularly limited, but various polymer films having excellent heat resistance are suitable. Specifically, polyester such as polyethylene terephthalate, polycarbonate, polyvinyl chloride,
A wide range of polymer films such as polyethylene, polypropylene, polyamide, cellulose acetate, and polysulfone can be mentioned, and among them, a polyester film is particularly preferable. This is because the polyester film is excellent in properties such as transparency, dimensional stability, thickness uniformity, strength, heat resistance, chemical resistance, and water resistance. Usually, the polyester film used is biaxially stretched in order to improve mechanical properties. The insulating transparent polymer film (A) is usually 50 μm to 250 μm in consideration of the function as a transparent electrode.
Having a thickness of.

【0007】透明性を有する基材(A)上に積層される
透明導電性層(B)としては、導電性を有し且つ薄膜形
成時に透明性を有するものがよく、例えば金、銀、白
金、パラジウム、ロジウム等の金属、酸化錫、酸化イン
ジウム、酸化アンチモン、酸化チタン、酸化ジルコニウ
ム、或いは酸化インジウム−酸化錫系、酸化錫ー酸化ア
ンチモン系等の金属酸化物、特に好ましくは酸化インジ
ウム−酸化錫、金を真空蒸着法、スパッタリング法、イ
オンプレーティング法等によって形成できる。これらの
透明導電性層(B)は単層でもよいが2層以上の複層に
することもできる。透明導電性層(B)の厚みは特に限
定されないが、表面電気抵抗値として1Ω/□〜100
0Ω/□、好ましくは50Ω/□〜500Ω/□がよ
い。また、透明導電性層(B)の可視光線領域の全光線
透過率は50%以上で、好ましくは70%以上がよい。
The transparent conductive layer (B) to be laminated on the transparent substrate (A) is preferably a layer having conductivity and transparency when forming a thin film, for example, gold, silver, platinum and the like. , Palladium, metal such as rhodium, tin oxide, indium oxide, antimony oxide, titanium oxide, zirconium oxide, or metal oxide such as indium oxide-tin oxide, tin oxide-antimony oxide, particularly preferably indium oxide-oxide Tin and gold can be formed by a vacuum deposition method, a sputtering method, an ion plating method, or the like. The transparent conductive layer (B) may be a single layer or a multilayer of two or more layers. Although the thickness of the transparent conductive layer (B) is not particularly limited, the surface electric resistance is 1 Ω / □ to 100
0Ω / □, preferably 50Ω / □ to 500Ω / □. The total light transmittance of the transparent conductive layer (B) in the visible light region is 50% or more, and preferably 70% or more.

【0008】透明導電性層(B)の上に積層されるフッ
素系樹脂層(C)は、特に蛍光体層と接合せしめた場
合、特異的に接着力を高めることができるものである。
本発明において使用可能なフッ素系樹脂層(C)の材料
としては、例えばフッ化ビニリデン系樹脂、アクリル系
フッ素樹脂、ウレタン系フッ素樹脂、およびその混合物
等があるが、これらの1種または2種以上をアセトン、
酢酸エチル等の溶剤に溶かし、または希釈してこれを塗
工乾燥せしめることによりフッ素系樹脂層(C)が形成
できる。フッ素系樹脂層(C)の厚さは特に限定されな
いが、透明導電層の特性を損なわず且つ蛍光体との接着
性を向上せしめるためには、1nm〜500nmの範囲
で選択するのがよく、より好ましくは10nm〜100
nmである。
[0008] The fluorine-based resin layer (C) laminated on the transparent conductive layer (B) can specifically enhance the adhesive strength, particularly when bonded to a phosphor layer.
Examples of the material of the fluororesin layer (C) usable in the present invention include vinylidene fluoride resin, acrylic fluororesin, urethane fluororesin, and a mixture thereof. Acetone,
The fluororesin layer (C) can be formed by dissolving or diluting it in a solvent such as ethyl acetate or the like and coating and drying it. The thickness of the fluorine-based resin layer (C) is not particularly limited, but is preferably selected from the range of 1 nm to 500 nm in order to not impair the properties of the transparent conductive layer and to improve the adhesion with the phosphor. More preferably, 10 nm to 100
nm.

【0009】透明導電性層(B)とフッ素系樹脂層
(C)の間には、さらに白金および/またはパラジウム
からなる金属層(D)を設けることが好ましい。金属層
(D)により(B)層と(C)層の接着性を一層向上さ
せることができる。金属層(D)の厚さは特に限定され
ないが、0.3nm〜3nmの範囲、より好ましくは
0.3nm〜1.5nmの透明性を損なわない範囲で選
択するのがよい。金属層(D)の形成方法としては、透
明導電性層(B)と同様の真空蒸着法、スパッタリング
法、イオンプレーティング法等によって形成する。
It is preferable to further provide a metal layer (D) made of platinum and / or palladium between the transparent conductive layer (B) and the fluororesin layer (C). The metal layer (D) can further improve the adhesion between the layers (B) and (C). The thickness of the metal layer (D) is not particularly limited, but is preferably in the range of 0.3 nm to 3 nm, more preferably in the range of 0.3 nm to 1.5 nm without impairing the transparency. The metal layer (D) is formed by the same vacuum deposition method, sputtering method, ion plating method or the like as the transparent conductive layer (B).

【0010】また、透明導電性層(B)上あるいは金属
層(D)上に積層されるフッ素系樹脂層(C)の形成方
法としては、例えばグラビアコーティング法やリバース
コーティング法など公知の塗工方法により行うことがで
きる。
As a method of forming the fluororesin layer (C) laminated on the transparent conductive layer (B) or the metal layer (D), for example, a known coating method such as a gravure coating method or a reverse coating method is used. It can be done by a method.

【0011】かくして本発明で得られるEL素子用透明
導電性積層体は、その優れた接着性および表面保護性か
らEL素子は基よりタッチパネル基材、静電防止基材や
静電シールド基材等として、広く用いることができる。
Thus, the transparent conductive laminate for an EL element obtained by the present invention is not limited to a touch panel substrate, an antistatic substrate, an electrostatic shield substrate, etc., based on the EL element because of its excellent adhesiveness and surface protection. Can be widely used.

【0012】本発明の透明導電性積層体から常法により
EL素子を得ることができる。例えば、アルミ箔の上に
フッ素系樹脂、メチルエチルケトンなどの有機溶剤、チ
タン酸バリウなどを混合し、スクリーン印刷して、遠赤
外線ヒーターで加熱乾燥し、次にフッ素系樹脂バインダ
ー、有機溶剤、蛍光発光体を混合し、アルミ箔を絶縁処
理した上にスクリーン印刷して、遠赤外線ヒーターで加
熱乾燥後、上記アルミ箔/絶縁体層/発光体層の発光体
層と透明導電性積層体のフッ素系樹脂を塗工した層と
を、プレス法で圧着積層してEL素子を得ることができ
る。
An EL element can be obtained from the transparent conductive laminate of the present invention by a conventional method. For example, a fluorine resin, an organic solvent such as methyl ethyl ketone, barium titanate, etc. are mixed on an aluminum foil, screen printed, heated and dried by a far-infrared heater, and then a fluorine resin binder, an organic solvent, and fluorescent light emission. The body is mixed, the aluminum foil is insulated, screen printed, heated and dried with a far-infrared heater, and then the fluorinated layer of the aluminum foil / insulator layer / luminescent layer and the transparent conductive laminate The EL element can be obtained by press-bonding and laminating a layer coated with a resin by a press method.

【0013】[0013]

【実施例】以下、実施例により本発明を説明するが、実
施例中の特性値は次の方法により測定したものである。
EXAMPLES The present invention will be described below with reference to examples. The characteristic values in the examples are measured by the following methods.

【0014】(1)表面電気抵抗値 ゴム硬度(JIS K6301-1975による)約60のゴム
シート上に、35mm幅にカットしたサンプルをのせ、
2mm厚みのパラジウム板を間隔35mmにセットした
測定用電極をそのサンプルと直交する位置に置き、荷重
3Kgをかけ、その端子間の抵抗値をデジタルテスター
(岩崎通信機製VOAC707)を使用して抵抗値を直
読した。
(1) Surface electric resistance value A sample cut to a width of 35 mm is placed on a rubber sheet having a rubber hardness (according to JIS K6301-1975) of about 60,
A measuring electrode having a 2 mm thick palladium plate set at an interval of 35 mm is placed at a position orthogonal to the sample, a load of 3 kg is applied, and the resistance between the terminals is measured using a digital tester (VOAC707 manufactured by Iwasaki Communication Equipment). Was read directly.

【0015】(2)光線透過率 スガ試験機(株)製ヘイズコンピューター HGM-2DP型
で、可視光線領域の全光線透過率を測定した。
(2) Light transmittance The total light transmittance in the visible light region was measured using a haze computer HGM-2DP type manufactured by Suga Test Instruments Co., Ltd.

【0016】(3)接着力 A&D社製テンシロン UCT-100型で試料幅15mm×長
さ100mmを剥離速度50mm/分で180°ピール
時の接着力を測定した。
(3) Adhesive force Adhesive force at 180 ° peel was measured using a Tensilon UCT-100 manufactured by A & D Co. at a peeling speed of 50 mm / min at a sample width of 15 mm × length of 100 mm.

【0017】(4)耐久性 30℃90%の雰囲気中で、EL素子を100V400
Hzで500時間連続点灯後の外観変化を肉眼観察し
た。
(4) Durability In an atmosphere of 30.degree.
The appearance change after continuous lighting at 500 Hz for 500 hours was visually observed.

【0018】実施例1〜3,比較例1〜2 二軸延伸ポリエチレンテレフタレートフイルム(東レ
(株)”ルミラー”厚さ188μm、可視光線透過率8
8%)基材に、In2 3 /SnO2 =90/10の組
成のインジウム・スズ酸化物をスパッタリング法により
付着させ透明導電層を積層し透明導電性フィルムを得
た。スパッタリングは真空度10-4TorrにてAr/O2
混合ガス導入のもとに行った。付着膜厚は50nmであ
った。このようにして得た透明導電性フィルムは表面電
気抵抗値200Ω/□、可視光線透過率81%を示し
た。
Examples 1 to 3 and Comparative Examples 1 to 2 Biaxially stretched polyethylene terephthalate film (Lumirror, Toray Industries, Inc., thickness 188 μm, visible light transmittance 8)
8%) Indium tin oxide having a composition of In 2 O 3 / SnO 2 = 90/10 was adhered to the substrate by a sputtering method, and a transparent conductive layer was laminated to obtain a transparent conductive film. Sputtering is performed at a vacuum of 10 -4 Torr with Ar / O 2
The test was performed with the introduction of a mixed gas. The deposited film thickness was 50 nm. The transparent conductive film thus obtained exhibited a surface electric resistance value of 200Ω / □ and a visible light transmittance of 81%.

【0019】次いで、得られた透明導電性フィルムの透
明導電層の上に(1)フッ化ビニリデン系樹脂”フロー
レン”Cl−25(日本合成ゴム(株)製)を酢酸エチ
ルで1%に希釈した塗料、(2)MFA−7(松本油脂
製薬(株)製)のアクリル系フッ素樹脂をアセトンで1
%に希釈した塗料、および(3)MFU−1(松本油脂
製薬(株)製)のウレタン系フッ素樹脂をメチルイソブ
チルケトンで1%に希釈した塗料を、それぞれ用いてグ
ラビアコ−ティング法により120℃/2分で塗工積層
させ透明導電性積層体(1)、(2)および(3)をそ
れぞれ得た。これらのフッ素系樹脂の塗工厚みは50n
mであった。 また、比較のため、得られた透明導電性
フィルムの透明導電層の上に(4)高誘電率のシアノエ
チルプルラン(信越化学(株)製シアノレジンCR−
S)をジメチルホルムアミド/アセトン=1/1の混合
溶媒で1%に希釈した塗料についても同様に、グラビア
コーティング法により120℃/2分で塗工積層させ透
明導電性積層体(4)を得た。この塗工厚みも50nm
であった。このようにして得た透明導電性積層体
(1)、(2)、(3)および(4)はいずれも表面電
気抵抗値250Ω/□、可視光線透過率83%を示し
た。
Next, (1) a vinylidene fluoride resin "Floren" Cl-25 (manufactured by Nippon Synthetic Rubber Co., Ltd.) was diluted to 1% with ethyl acetate on the transparent conductive layer of the obtained transparent conductive film. (2) Acrylic fluororesin of MFA-7 (Matsumoto Yushi Seiyaku Co., Ltd.)
% And a paint obtained by diluting (3) a urethane-based fluororesin of MFU-1 (Matsumoto Yushi Seiyaku Co., Ltd.) to 1% with methyl isobutyl ketone by gravure coating method. Coating and lamination were performed at a temperature of 2 ° C. for 2 minutes to obtain transparent conductive laminates (1), (2) and (3), respectively. The coating thickness of these fluororesins is 50n
m. For comparison, on the transparent conductive layer of the obtained transparent conductive film, (4) cyanoethyl pullulan having a high dielectric constant (Cyanoresin CR- manufactured by Shin-Etsu Chemical Co., Ltd.)
Similarly, a coating obtained by diluting S) to 1% with a mixed solvent of dimethylformamide / acetone = 1/1 is applied and laminated by a gravure coating method at 120 ° C. for 2 minutes to obtain a transparent conductive laminate (4). Was. This coating thickness is also 50nm
Met. The thus obtained transparent conductive laminates (1), (2), (3) and (4) all had a surface electric resistance of 250Ω / □ and a visible light transmittance of 83%.

【0020】次に、アルミ箔100μmの上にフッ素系
樹脂30部、有機溶剤メチルエチルケトン40部、チタ
ン酸バリウム30部を混合し、スクリーン印刷して、遠
赤外線ヒーターで120℃、3分間加熱乾燥した。次
に、フッ素系樹脂バインダー30部、有機溶剤メチルエ
チルケトン40部、、蛍光発光体30部を混合し、アル
ミ箔を絶縁処理した上にスクリーン印刷して、遠赤外線
ヒーターで120℃、3分間加熱乾燥した。次に、上記
アルミ箔/絶縁体層/発光体層の発光体層と各透明導電
性積層体のフッ素系樹脂を塗工した層とを、プレス法
(150℃/3分、50kg/cm2 )で圧着積層してEL
素子をそれぞれ得た。
Next, 30 parts of a fluorinated resin, 40 parts of an organic solvent methyl ethyl ketone, and 30 parts of barium titanate were mixed on 100 μm of an aluminum foil, screen-printed, and dried by heating at 120 ° C. for 3 minutes using a far-infrared heater. . Next, 30 parts of a fluorinated resin binder, 40 parts of an organic solvent methyl ethyl ketone, and 30 parts of a fluorescent material were mixed, and aluminum foil was insulated and screen-printed. did. Next, the luminous layer of the above-mentioned aluminum foil / insulator layer / luminous layer and the fluororesin-coated layer of each transparent conductive laminate were pressed at 150 ° C./3 minutes, 50 kg / cm 2. EL)
Devices were obtained respectively.

【0021】透明導電性積層体(1)、(2)、(3)
および(4)から得られるEL素子、透明導電性フィル
ムをそのまま透明導電性積層体として用いるEL素子に
ついてそれぞれ接着力と耐久性を測定した結果を表1に
示す。
Transparent conductive laminates (1), (2), (3)
Table 1 shows the results of measuring the adhesive strength and the durability of the EL device obtained from (4) and the EL device using the transparent conductive film as it is as the transparent conductive laminate.

【0022】[0022]

【表1】 [Table 1]

【0023】実施例4、比較例3 二軸延伸ポリエチレンテレフタレートフイルム(東レ
(株)”ルミラー”厚さ188μm、可視光線透過率8
8%)基材に、In2 3 /SnO2 =90/10の組
成のインジウム・スズ酸化物をスパッタリング法により
付着させた。スパッタリングは真空度10-4TorrにてA
r/O2 混合ガス導入のもとに行った。付着膜厚は50
nmであった。このようにして得た透明導電性フィルム
は表面電気抵抗値200Ω/□、可視光線透過率81%
を示した。次に、得られた透明導電層の上にパラジウム
をスパッタリング法により付着させた。スパッタリング
は真空度10-4TorrにてArガス導入のもとに行った。
付着膜厚は1nmであった。このようにして得た透明導
電性フィルムは表面電気抵抗値210Ω/□、可視光線
透過率80%を示した。
Example 4, Comparative Example 3 Biaxially stretched polyethylene terephthalate film (Lumirror, Toray Industries, Ltd., thickness 188 μm, visible light transmittance 8)
8%) Indium tin oxide having a composition of In 2 O 3 / SnO 2 = 90/10 was applied to the substrate by a sputtering method. Sputtering A at vacuum degree 10 -4 Torr
The test was performed under the introduction of an r / O 2 mixed gas. Adhesion film thickness is 50
nm. The transparent conductive film thus obtained had a surface electric resistance of 200Ω / □ and a visible light transmittance of 81%.
showed that. Next, palladium was deposited on the obtained transparent conductive layer by a sputtering method. Sputtering was performed at a degree of vacuum of 10 -4 Torr under the introduction of Ar gas.
The thickness of the deposited film was 1 nm. The transparent conductive film thus obtained exhibited a surface electric resistance value of 210 Ω / □ and a visible light transmittance of 80%.

【0024】次に、得られた透明導電層の上にフローレ
ンCl−25(日本合成ゴム(株)製)のフッ化ビニリ
デン系樹脂を酢酸エチルで1%に希釈した塗料につい
て、グラビアコーティング法により120℃/2分で塗
工積層させた。このフッ素系樹脂の塗工厚みは50nm
であった。このようにして得た透明導電性積層体は24
0Ω/□、可視光線透過率83%を示した。
Next, a coating material obtained by diluting a vinylidene fluoride resin of Florene Cl-25 (manufactured by Nippon Synthetic Rubber Co., Ltd.) to 1% with ethyl acetate on the obtained transparent conductive layer by a gravure coating method. Coating and lamination were performed at 120 ° C./2 minutes. The coating thickness of this fluororesin is 50 nm
Met. The transparent conductive laminate thus obtained is 24
0 Ω / □, visible light transmittance 83%.

【0025】次に、アルミ箔100μmの上にフッ素系
樹脂30部、有機溶剤メチルエチルケトン40部、チタ
ン酸バリウム30部を混合し、スクリーン印刷して、遠
赤外線ヒーターで120℃、3分間加熱乾燥した。次
に、フッ素系樹脂バインダー30部、有機溶剤メチルエ
チルケトン40部、、蛍光発光体30部を混合し、アル
ミ箔を絶縁処理した上にスクリーン印刷して、遠赤外線
ヒーターで120℃、3分間加熱乾燥した。次に、上記
アルミ箔/絶縁体層/発光体層の発光体層と透明導電性
積層体のフッ素系樹脂を塗工した層とを、プレス法(1
50℃/3分、50kg/cm2 )で圧着積層してEL素子
を得た。
Next, 30 parts of a fluorinated resin, 40 parts of an organic solvent methyl ethyl ketone, and 30 parts of barium titanate were mixed on an aluminum foil of 100 μm, screen-printed, and dried by heating at 120 ° C. for 3 minutes using a far-infrared heater. . Next, 30 parts of a fluorinated resin binder, 40 parts of an organic solvent methyl ethyl ketone, and 30 parts of a fluorescent material were mixed, and aluminum foil was insulated and screen-printed. did. Next, the luminous body layer of the above-mentioned aluminum foil / insulator layer / luminous body layer and the layer coated with the fluororesin of the transparent conductive laminate were pressed by the press method (1).
The EL element was obtained by pressure bonding at 50 ° C./3 minutes at 50 kg / cm 2 ).

【0026】比較のため、その透明導電性積層体構成の
過程である積層構成がPET/ITO/Pdの積層体と
アルミ箔/絶縁体層/発光体層の発光体層とを、同様の
プレス法(150℃/3分、50kg/cm2 )で圧着積層
してEL素子を得た。
For comparison, a laminate having a PET / ITO / Pd laminate structure and an aluminum foil / insulator layer / light-emitting layer, which is a process of forming the transparent conductive laminate, were subjected to the same pressing. The EL element was obtained by pressure bonding and lamination by the method (150 ° C./3 minutes, 50 kg / cm 2 ).

【0027】これらのEL素子について接着力を測定し
た結果を表2に示す。
Table 2 shows the results of measuring the adhesive strength of these EL devices.

【0028】[0028]

【表2】 [Table 2]

【0029】[0029]

【発明の効果】本発明によれば、接着力および耐久性に
優れた透明導電性積層体およびEL素子を得ることがで
きる。それによりEL素子の外部雰囲気から侵入する水
分の影響に対し、発光体層との接着性に優れ、EL素子
の発光効率を向上させ、輝度ムラの発生を防止し、優れ
た耐久性と取扱い性を有するEL素子用透明導電性積層
体を得ることができる。
According to the present invention, a transparent conductive laminate and an EL element having excellent adhesive strength and durability can be obtained. As a result, it has excellent adhesion to the luminescent layer against the influence of moisture entering from the external atmosphere of the EL element, improves the luminous efficiency of the EL element, prevents luminance unevenness, and has excellent durability and handleability. The transparent conductive laminated body for EL elements which has this can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】実施例1で得られたEL素子の断面模式図であ
る。
FIG. 1 is a schematic sectional view of an EL device obtained in Example 1.

【図2】実施例4で得られたEL素子の断面模式図であ
る。
FIG. 2 is a schematic cross-sectional view of the EL device obtained in Example 4.

【符号の説明】[Explanation of symbols]

1:透明性を有する基材 2:透明導電層 3:金属層 4:フッ素系樹脂層 5:発光体層 6:絶縁層 7:背面電極層 1: Transparent substrate 2: Transparent conductive layer 3: Metal layer 4: Fluorine resin layer 5: Light emitting layer 6: Insulating layer 7: Back electrode layer

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】透明性を有する基材(A)、透明導電層
(B)およびフッ素系樹脂層(C)がこの順で積層され
ていることを特徴とするエレクトロルミネッセンス素子
用透明導電性積層体。
1. A transparent conductive laminate for an electroluminescent element, wherein a transparent base material (A), a transparent conductive layer (B) and a fluororesin layer (C) are laminated in this order. body.
【請求項2】透明導電層(B)とフッ素系樹脂層(C)
の間に白金および/またはパラジウムからなる金属層
(D)を有することを特徴とする請求項1記載の透明導
電性積層体。
2. A transparent conductive layer (B) and a fluororesin layer (C).
2. The transparent conductive laminate according to claim 1, further comprising a metal layer (D) made of platinum and / or palladium.
【請求項3】請求項1または2記載の透明導電性積層体
を用いたエレクトロルミネッセンス素子。
3. An electroluminescent device using the transparent conductive laminate according to claim 1.
JP05201097A 1997-03-06 1997-03-06 Transparent conductive laminate and EL device Expired - Fee Related JP3716537B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP05201097A JP3716537B2 (en) 1997-03-06 1997-03-06 Transparent conductive laminate and EL device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP05201097A JP3716537B2 (en) 1997-03-06 1997-03-06 Transparent conductive laminate and EL device

Publications (2)

Publication Number Publication Date
JPH10244615A true JPH10244615A (en) 1998-09-14
JP3716537B2 JP3716537B2 (en) 2005-11-16

Family

ID=12902855

Family Applications (1)

Application Number Title Priority Date Filing Date
JP05201097A Expired - Fee Related JP3716537B2 (en) 1997-03-06 1997-03-06 Transparent conductive laminate and EL device

Country Status (1)

Country Link
JP (1) JP3716537B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006019019A1 (en) * 2004-08-17 2006-02-23 Toray Industries, Inc. Composite transparent conductive substrate for touch panel and touch panel

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006019019A1 (en) * 2004-08-17 2006-02-23 Toray Industries, Inc. Composite transparent conductive substrate for touch panel and touch panel
JPWO2006019019A1 (en) * 2004-08-17 2008-05-08 東レ株式会社 Composite transparent conductive substrate for touch panel and touch panel

Also Published As

Publication number Publication date
JP3716537B2 (en) 2005-11-16

Similar Documents

Publication Publication Date Title
JP3310408B2 (en) Transparent conductive film
JP3483355B2 (en) Transparent conductive laminate
JP3716537B2 (en) Transparent conductive laminate and EL device
JP3476277B2 (en) Transparent conductive laminate
KR20030064604A (en) Transparent conductive film and electroluminescence light emitting device therewith
EP1802913A1 (en) Large area el lamp
JP3741164B2 (en) Laminated film for electronic materials
JP3341277B2 (en) Transparent conductive film for electroluminescence device
JPH0112663B2 (en)
JPH09156022A (en) Transparent conductive laminate
JPH0437560B2 (en)
JPH1148388A (en) Transparent conductive film
JP2001014952A (en) Transparent conductive film and electroluminescence panel
JP2526642B2 (en) Transparent conductive film
JP3466001B2 (en) Transparent conductive laminate
JP3146059B2 (en) Transparent conductive film
JP2987177B2 (en) Transparent conductive moisture-proof film and EL light emitting device
JP2000071374A (en) Transparent conductive laminate and its production
JPH07122367A (en) Dispersion type field emission element
JPH1034797A (en) Transparent conductive laminate and manufacture thereof
JPH03238792A (en) Electro-luminescence light emitting apparatus
JP3019524B2 (en) EL
JP3922320B2 (en) Transparent conductive laminate
JPH09277424A (en) Transparent conductive laminate and electroluminescence surface light-emission member using the same
JPH0547474A (en) Electroluminescence element

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20040720

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20040810

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20041005

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20050426

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20050809

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20050822

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20041005

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080909

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090909

Year of fee payment: 4

LAPS Cancellation because of no payment of annual fees