JPH10216662A - Bubbled cleaning tank - Google Patents

Bubbled cleaning tank

Info

Publication number
JPH10216662A
JPH10216662A JP3291597A JP3291597A JPH10216662A JP H10216662 A JPH10216662 A JP H10216662A JP 3291597 A JP3291597 A JP 3291597A JP 3291597 A JP3291597 A JP 3291597A JP H10216662 A JPH10216662 A JP H10216662A
Authority
JP
Japan
Prior art keywords
tank
cleaning
cleaning tank
plate
pure water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3291597A
Other languages
Japanese (ja)
Other versions
JP2987616B2 (en
Inventor
Masami Shikura
正美 四倉
Kimio Onodera
公夫 小野寺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tsukasa Rubber and Electric Materials Co Ltd
Original Assignee
Tsukasa Rubber and Electric Materials Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tsukasa Rubber and Electric Materials Co Ltd filed Critical Tsukasa Rubber and Electric Materials Co Ltd
Priority to JP9032915A priority Critical patent/JP2987616B2/en
Publication of JPH10216662A publication Critical patent/JPH10216662A/en
Application granted granted Critical
Publication of JP2987616B2 publication Critical patent/JP2987616B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To conduct bubble cleaning without scattering a liq. chemical during cleaning and with high safety and efficiency. SOLUTION: One cleaning tank 1 is divided by a partition into a liq. chemical tank 1A and a pure water tank 1B, and a bubbler 5 is provided at the bottom of each tank to constitute a bubbled cleaning tank. The bubbler 5 is formed by providing a bubble plate consisting of an open-cell synthetic resin sheet and made hydrophilic at the compressed air outlet of the casing 6 to be supplied with compressed air from a blower 16. Further, a receiver fabricated by latticing plates is furnished above the bubble plate.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、洗浄槽内に気泡を
噴出するバブリング式洗浄槽に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a bubbling type cleaning tank for blowing bubbles into a cleaning tank.

【0002】[0002]

【従来の技術】従来、半導体製品,石英ガラスなどの洗
浄は、ポンプで槽内の薬剤を循環させ、液の流れによる
洗浄と、槽内の薬剤に洗浄物を浸し、作業員がブラシで
こすることで洗浄していたが、被洗浄物の形状によって
は、製品部材の複雑な溝の部分或いは角の部分等が完全
に洗浄されない事態が生じた。これに対処し、超音波発
生装置を洗浄槽に設け、超音波を洗浄槽内に発射し超音
波振動をかけた液中で被洗浄槽内物表面の汚染を落とす
手段が実施されている。しかし、半導体製品、石英ガラ
スなどの洗浄に当っては満足出来ない点もあった。ま
た、洗浄結果を高めるために薬液槽と純水槽の2槽を用
意し、被洗浄物を薬液槽に入れ被洗浄物表面を薬液処理
し落ち易くなった汚れを落とし、更にその後、被洗浄物
を純水槽に移動して洗浄することにより、薬液,汚物を
更に除去する手段か採用された。この従来装置にあって
は、洗浄槽を薬液槽と純水槽の2槽とし、別個に設置さ
れており、薬液槽で洗浄を終了した被洗浄物は、薬液槽
から取り出し離れた洗浄槽に移し変えるような作業をし
ている為、薬液が飛散し、安全性及び洗浄効果が悪く生
産性が向上しなかった。
2. Description of the Related Art Conventionally, for cleaning semiconductor products, quartz glass, etc., chemicals in a tank are circulated by a pump, and cleaning is performed by flowing a liquid, and a cleaning object is immersed in the chemicals in the tank. However, depending on the shape of the object to be cleaned, complicated grooves or corners of the product member may not be completely cleaned. To cope with this, an ultrasonic generator is provided in the cleaning tank, and means for emitting ultrasonic waves into the cleaning tank and removing contamination on the surface of the inside of the tank to be cleaned in a liquid subjected to ultrasonic vibration is implemented. However, there were also points that were not satisfactory in cleaning semiconductor products, quartz glass, and the like. Also, two tanks, a chemical tank and a pure water tank, are prepared in order to enhance the cleaning result. The object to be cleaned is put into the chemical tank, and the surface of the object to be cleaned is treated with the chemical solution to remove dirt that has become easy to fall off. Was moved to a pure water tank and washed to remove chemicals and dirt. In this conventional apparatus, the cleaning tank is made up of two tanks, a chemical tank and a pure water tank, which are installed separately, and the object to be cleaned which has been washed in the chemical tank is removed from the chemical tank and transferred to a cleaning tank which is separated from the tank. Since the operation of changing was carried out, the chemical solution was scattered, and the safety and the cleaning effect were poor, and the productivity was not improved.

【0003】[0003]

【発明が解決しようとする課題】上記の点に鑑みて、本
発明は、洗浄作業中に薬液の飛散がなく、安全性の高い
作業が行なえ、かつ、洗浄性能の高いバブリング洗浄が
行なえるバブリング式洗浄槽を得ることを目的とする。
SUMMARY OF THE INVENTION In view of the above points, the present invention provides a bubbling method which can perform a highly safe operation without scattering of a chemical solution during a cleaning operation and can perform a bubbling cleaning having a high cleaning performance. The purpose is to obtain a type washing tank.

【0004】[0004]

【課題を解決するための手段】本発明は、1つの洗浄槽
内に隔壁を設けることにより、洗浄槽を薬液槽と純水槽
に分割し、上記各槽の槽底部に発泡装置を設たバブリン
グ式洗浄槽とした。上記発泡装置は、送風機からの圧空
を送られる筐体の圧空流出部位に、連続多孔質合成樹脂
板よりなり親水性処理を施こした気泡板を設けたもので
ある。そして、板状体を格子状に組んだ受け台を気泡板
上位に設けている。
SUMMARY OF THE INVENTION The present invention provides a bubbling system in which a washing tank is divided into a chemical solution tank and a pure water tank by providing a partition in one washing tank, and a foaming device is provided at the bottom of each tank. A washing tank was used. In the foaming apparatus, a foam plate made of a continuous porous synthetic resin plate and subjected to a hydrophilic treatment is provided at a compressed air outflow portion of a housing to which compressed air is sent from a blower. Then, a pedestal in which the plate-like members are assembled in a lattice shape is provided above the bubble plate.

【0005】[0005]

【発明の実施の形態】本発明の実施の形態を図面と共に
次に説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0006】洗浄槽1は直方体で架台2上に載置され、
中央部分に設けた隔壁3により薬液槽1Aと純水槽1B
との2区画を構成している。薬液槽1Aと純水槽1Bと
の槽底部4にはそれぞれ発泡装置5を設ける。発泡装置
5は上部が開いた筐体6を固定手段7で架台2に取り付
け、上部の開いた部分に気泡板8を固定手段9により取
り付ける。即ち、図4に示す如く筐体6の上縁を囲う槽
底部4に受板9Aを固定し、その上にテフロンソフトシ
ートよりなるパッキン9Bを介して気泡板8を置き、そ
の上に当板9Cを当てがいテフロンボルト9Dにより上
記各部を一体に締め付け固定する。そして、図2に示す
如く、気泡板8の上面を被って板状体10を格子状に組
んだ受台11を設けている。受台11は脚部12により
槽底部4に乗っている。
[0006] The washing tank 1 is mounted on a gantry 2 in a rectangular parallelepiped.
Chemical solution tank 1A and pure water tank 1B by partition wall 3 provided at the center
And the other two sections. Foaming devices 5 are provided at the tank bottoms 4 of the chemical solution tank 1A and the pure water tank 1B, respectively. The foaming apparatus 5 attaches the housing 6 with the open top to the gantry 2 by the fixing means 7, and attaches the foam plate 8 to the open top by the fixing means 9. That is, as shown in FIG. 4, a receiving plate 9A is fixed to the tank bottom 4 surrounding the upper edge of the housing 6, and a bubble plate 8 is placed thereon via a packing 9B made of a Teflon soft sheet. 9C is applied, and the above-mentioned parts are integrally tightened and fixed by a Teflon bolt 9D. Then, as shown in FIG. 2, there is provided a pedestal 11 which covers the upper surface of the bubble plate 8 and assembles the plate-like members 10 in a lattice. The cradle 11 is mounted on the tank bottom 4 by the legs 12.

【0007】気泡板8は、多孔質の連続した気孔を持つ
樹脂よりなり、例えばポリプロピレン樹脂を微粉砕し炉
内で均一な温度で焼結すると多孔質の連続した気孔を持
つ板を得ることが出来る。しかし、樹脂特有の撥水性が
あるため、気孔板7の表面に親水性基を含む物質を保持
(吸着もしくは結合)させることにより、親水性処理を
することによって、気泡が細かく強く発生するようにし
ている。
The bubble plate 8 is made of a resin having porous continuous pores. For example, when a polypropylene resin is finely pulverized and sintered at a uniform temperature in a furnace, a plate having porous continuous pores can be obtained. I can do it. However, since the resin has a unique water repellency, a substance containing a hydrophilic group is held (adsorbed or bonded) on the surface of the porous plate 7 to perform a hydrophilic treatment so that bubbles are generated finely and strongly. ing.

【0008】筐体6の底部には給気管12が開口してい
る。図示の例では給気管12が二股に分岐しているが、
給気管の開口は1以上適宜数で良い。給気管12は、電
磁弁13を介して空気配管14、電磁弁15を経て送風
機16に連なっている。
[0008] At the bottom of the housing 6, an air supply pipe 12 is opened. In the illustrated example, the air supply pipe 12 is bifurcated,
The number of openings of the air supply pipe may be one or more. The air supply pipe 12 is connected to a blower 16 via an air pipe 14 via an electromagnetic valve 13 and an electromagnetic valve 15.

【0009】洗浄槽1の薬液槽1A純水槽1Bのそれぞ
れの槽底部4にはドレン管17を、純水槽1Bの槽壁1
8には洗浄水供給管19及びオーバーフロー管20を取
り付ける。
A drain pipe 17 is provided at the bottom 4 of each of the chemical solution tank 1A and the pure water tank 1B of the cleaning tank 1, and a tank wall 1 of the pure water tank 1B.
A cleaning water supply pipe 19 and an overflow pipe 20 are attached to 8.

【0010】洗浄槽1A,純水槽1Bの槽壁上部及び隔
壁3の上部には、ガイドレール21を設け開閉蓋22を
摺動自在に嵌合支持している。各槽のガイドレール21
は多段式に複数の(図示の例では上下に2枚、両側で4
枚)の開閉蓋22を支持している。
A guide rail 21 is provided above the tank walls of the washing tank 1A and the pure water tank 1B and the partition wall 3, and an opening / closing lid 22 is slidably fitted and supported. Guide rail 21 for each tank
Is a plurality of multi-stages (in the example shown, two at the top and bottom, four on both sides)
) Of the open / close lid 22.

【0011】ガイドレール21は洗浄槽1より長く、洗
浄槽1の両側に突出させてあり、作業中洗浄槽1の上面
を全開するときにはガイドレール21両側の突出部分に
開閉蓋22を重ねて位置させ、洗浄槽を閉じるときはガ
イドレール21に添わせて上部下部の開閉蓋22を洗浄
槽1の上に移動し洗浄槽1を閉じる。
The guide rail 21 is longer than the cleaning tank 1 and protrudes on both sides of the cleaning tank 1. When the upper surface of the cleaning tank 1 is fully opened during operation, the opening / closing lid 22 is placed on the protruding portion on both sides of the guide rail 21. When the cleaning tank is closed, the open / close lid 22 at the upper and lower part is moved over the cleaning tank 1 along the guide rail 21 to close the cleaning tank 1.

【0012】洗浄槽1は、対腐触性を考慮するとプラス
チック製とするのが好ましい。特に半導体向け洗浄は金
属が含有していないもの、酸,アルカリ液に耐えられる
プラスチックが要求され、弗酸洗浄槽に使用するとき
は、ポリプロピレン材が適している。
The washing tank 1 is preferably made of plastic in consideration of anti-corrosion properties. In particular, for cleaning for semiconductors, a metal-free plastic and a plastic which can withstand acids and alkalis are required. When used in a hydrofluoric acid cleaning tank, a polypropylene material is suitable.

【0013】次に本発明洗浄槽1による洗浄操作につき
説明する。被洗浄物が石英ガラスの場合、薬液槽1Aを
弗酸槽とする。被洗浄物の種類によって適宜使用薬液は
変更する。被洗浄物は受台11上にあって、気泡板8か
ら噴出し、受台11を構成する板状体10で整流された
状態の気泡にたたかれ、表面の汚染を取り除かれる。即
ち、電磁弁15,13を開き送風機16を作動させる
と、空気配管14,給気管12を経て発泡装置5の筐体
6内に空気が充満し、気泡板8の全面に存在する微細な
気孔を通って、筐体6内の空気が薬液槽1A及び純水槽
1B内に微細な気泡となって強く噴出する。
Next, the cleaning operation by the cleaning tank 1 of the present invention will be described. When the object to be cleaned is quartz glass, the chemical solution tank 1A is a hydrofluoric acid tank. The chemical used varies depending on the type of the object to be cleaned. The object to be cleaned is on the pedestal 11 and is ejected from the bubble plate 8, and is beaten by the rectified air bubbles by the plate 10 constituting the pedestal 11, thereby removing the contamination on the surface. That is, when the electromagnetic valves 15 and 13 are opened and the blower 16 is operated, the air is filled in the housing 6 of the foaming device 5 through the air pipe 14 and the air supply pipe 12, and fine pores existing on the entire surface of the bubble plate 8 are formed. , The air in the housing 6 is ejected strongly as fine bubbles into the chemical solution tank 1A and the pure water tank 1B.

【0014】上記気泡板8から気泡が噴出する際に、気
孔から噴出した空気は、気泡板8が親水性処理がなされ
ているために、気孔表面に付着しその体積を増す前に微
細な気泡の状態で気泡板8から離れる。洗浄槽内に噴出
した気泡は被洗浄物に衝突し気泡による衝撃或いは気泡
の破裂による衝撃などにより汚れを取り去る洗浄が行わ
れている。更に、洗浄水供給管19の電磁弁19Aを開
くことにより純水槽1Bに純水を供給する。オーバーフ
ローした純水はオーバーフロー管20からオーバーフロ
ーしている。薬液槽1Aでの洗浄が完了したら被洗浄物
を薬液槽1Aと接する純水槽1Bに入れ変える。薬液槽
1Aと純水槽1Bとは隣接して設けられているので、上
記薬液槽1Aから純水槽1Bへの移し代えの作業のとき
も、洗浄槽1外の周囲に薬液を飛散させるようなことは
ない。そして純水槽1Bに入れた洗浄物は薬液槽1Aと
同様にバブリングによって弗酸液及び汚物が除去され
る。
When bubbles are blown out of the bubble plate 8, the air blown out of the pores adheres to the surface of the pores and increases the volume before the bubbles increase because the bubble plate 8 is subjected to hydrophilic treatment. In the state described above. Cleaning is performed in which bubbles ejected into the cleaning tank collide with an object to be cleaned and remove dirt by an impact due to bubbles or an impact due to bursting of bubbles. Further, pure water is supplied to the pure water tank 1B by opening the solenoid valve 19A of the cleaning water supply pipe 19. The overflowed pure water overflows from the overflow pipe 20. When the cleaning in the chemical solution tank 1A is completed, the object to be cleaned is replaced in the pure water tank 1B in contact with the chemical solution tank 1A. Since the chemical solution tank 1A and the pure water tank 1B are provided adjacent to each other, even when the transfer from the chemical solution tank 1A to the pure water tank 1B is performed, the chemical solution may be scattered around the outside of the cleaning tank 1. There is no. The cleaning solution put in the pure water tank 1B is subjected to bubbling to remove the hydrofluoric acid solution and dirt similarly to the chemical liquid tank 1A.

【0015】上記洗浄の途中では開閉蓋22をガイドレ
ール21に添って移動し洗浄槽1Aの上面を被って液の
飛散などの生じないようにしている。純水槽1Bでの洗
浄が終了したら被洗浄物を図示しない流し槽に移動しス
プレーガンで超純水洗浄し洗浄を終了する。
During the washing, the opening / closing lid 22 is moved along the guide rail 21 to cover the upper surface of the washing tank 1A so as to prevent the liquid from scattering. When the cleaning in the pure water tank 1B is completed, the object to be cleaned is moved to a sink tank (not shown), and the object is cleaned with ultrapure water using a spray gun, thereby completing the cleaning.

【0016】[0016]

【発明の効果】本発明は洗浄槽を二槽式とすることによ
り薬液槽から純水槽へ被洗浄物を移すときに薬液を槽外
に散らすことがなく、作業性を簡素化出来、かつ、洗浄
槽の製作費用を安価にすることが出来た。
According to the present invention, the cleaning tank is of a two-tank type, so that when the object to be cleaned is transferred from the chemical tank to the pure water tank, the chemical is not scattered outside the tank, and the workability can be simplified, and The manufacturing cost of the cleaning tank was reduced.

【0017】また気泡板を洗浄槽底部に設けることによ
り、また、気泡板を親水性処理をすることで微細な気泡
を強く発生させ被洗浄物に対して気泡の衝撃を加えるこ
とが出来、洗浄効果を高めることが出来る。
Further, by providing the bubble plate at the bottom of the cleaning tank, and by subjecting the bubble plate to a hydrophilic treatment, fine bubbles are strongly generated and the impact of the bubbles can be applied to the object to be cleaned. The effect can be enhanced.

【0018】更に、気泡板上位に設けた、板状体を格子
状に組んだ受台上で被洗浄物を洗浄するため、噴出した
気泡は受台を構成する板状体で整流された状態で一層強
力に被洗浄物に当たり洗浄効果を高めている。
Further, in order to clean the object to be cleaned on a receiving table provided on the bubble plate and having a plate-like body assembled in a lattice, the ejected bubbles are rectified by the plate-like body constituting the receiving table. And more powerfully hits the object to be cleaned, and enhances the cleaning effect.

【図面の簡単な説明】[Brief description of the drawings]

【図1】図1は本発明洗浄槽の受台と気泡板を取り除い
た状態の平面図。
FIG. 1 is a plan view of a cleaning tank according to the present invention with a pedestal and a bubble plate removed.

【図2】図2は本発明洗浄槽の一部縦断正面図。FIG. 2 is a partially longitudinal front view of the cleaning tank of the present invention.

【図3】図3は本発明洗浄槽の側面図。FIG. 3 is a side view of the cleaning tank of the present invention.

【図4】図4は発泡装置筐体の気泡板取り付け部分の拡
大断面図。
FIG. 4 is an enlarged cross-sectional view of a foam plate mounting portion of the foaming apparatus casing.

【符号の説明】[Explanation of symbols]

1 洗浄槽 1A 薬液槽 1B 純水槽 2 架台 3 隔壁 5 発泡装置 6 筐体 8 気泡板 10 板状体 11 受台 14 空気配管 16 送風機 21 ガイドレール DESCRIPTION OF SYMBOLS 1 Cleaning tank 1A Chemical liquid tank 1B Pure water tank 2 Frame 3 Partition wall 5 Foaming device 6 Casing 8 Bubble plate 10 Plate-shaped body 11 Receiving stand 14 Air piping 16 Blower 21 Guide rail

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 1つの洗浄槽内に隔壁を設けることによ
り、洗浄槽を薬液槽と純水槽に分割し、上記各槽の槽底
部に発泡装置を設けてなるバブリング式洗浄槽。
1. A bubbling type cleaning tank comprising a cleaning tank divided into a chemical liquid tank and a pure water tank by providing a partition in one cleaning tank, and a foaming device provided at the bottom of each tank.
【請求項2】 発泡装置は、送風機からの圧空を送られ
る筐体の圧空流出部位に、連続多孔質合成樹脂板よりな
り親水性処理を施こした気泡板を設けたものである請求
項1記載のバブリング式洗浄槽。
2. The foaming device according to claim 1, wherein a foam plate made of a continuous porous synthetic resin plate and subjected to a hydrophilic treatment is provided at a pressurized air outflow portion of a housing to which pressurized air from the blower is sent. The described bubbling-type washing tank.
【請求項3】 板状体を格子状に組んだ受け台を気泡板
上位に設けてなる請求項1記載のバブリング式洗浄槽。
3. The bubbling type cleaning tank according to claim 1, wherein a receiving table in which the plate-like members are assembled in a lattice is provided on the bubble plate.
JP9032915A 1997-01-31 1997-01-31 Bubbling type washing tank Expired - Fee Related JP2987616B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9032915A JP2987616B2 (en) 1997-01-31 1997-01-31 Bubbling type washing tank

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9032915A JP2987616B2 (en) 1997-01-31 1997-01-31 Bubbling type washing tank

Publications (2)

Publication Number Publication Date
JPH10216662A true JPH10216662A (en) 1998-08-18
JP2987616B2 JP2987616B2 (en) 1999-12-06

Family

ID=12372204

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9032915A Expired - Fee Related JP2987616B2 (en) 1997-01-31 1997-01-31 Bubbling type washing tank

Country Status (1)

Country Link
JP (1) JP2987616B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009098270A (en) * 2007-10-15 2009-05-07 Tokyo Electron Ltd Substrate cleaning device
CN113257661A (en) * 2021-04-14 2021-08-13 中环领先半导体材料有限公司 Method for improving rinsing effect of 8-inch abrasive washing FO tank

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009098270A (en) * 2007-10-15 2009-05-07 Tokyo Electron Ltd Substrate cleaning device
CN113257661A (en) * 2021-04-14 2021-08-13 中环领先半导体材料有限公司 Method for improving rinsing effect of 8-inch abrasive washing FO tank

Also Published As

Publication number Publication date
JP2987616B2 (en) 1999-12-06

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