JPH10209031A5 - - Google Patents

Info

Publication number
JPH10209031A5
JPH10209031A5 JP1997021026A JP2102697A JPH10209031A5 JP H10209031 A5 JPH10209031 A5 JP H10209031A5 JP 1997021026 A JP1997021026 A JP 1997021026A JP 2102697 A JP2102697 A JP 2102697A JP H10209031 A5 JPH10209031 A5 JP H10209031A5
Authority
JP
Japan
Prior art keywords
mask
optical system
mark pattern
illumination
projection optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP1997021026A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10209031A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP9021026A priority Critical patent/JPH10209031A/ja
Priority claimed from JP9021026A external-priority patent/JPH10209031A/ja
Priority to KR10-1998-0001610A priority patent/KR100525067B1/ko
Publication of JPH10209031A publication Critical patent/JPH10209031A/ja
Priority to US09/456,010 priority patent/US6456377B1/en
Priority to US10/212,764 priority patent/US6825932B2/en
Publication of JPH10209031A5 publication Critical patent/JPH10209031A5/ja
Withdrawn legal-status Critical Current

Links

JP9021026A 1997-01-20 1997-01-20 結像特性補正方法及び投影露光装置 Withdrawn JPH10209031A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP9021026A JPH10209031A (ja) 1997-01-20 1997-01-20 結像特性補正方法及び投影露光装置
KR10-1998-0001610A KR100525067B1 (ko) 1997-01-20 1998-01-20 노광 장치의 광학 특성 측정 방법, 노광 장치의 동작 방법 및 투영 노광 장치
US09/456,010 US6456377B1 (en) 1997-01-20 1999-12-07 Method for measuring optical feature of exposure apparatus and exposure apparatus having means for measuring optical feature
US10/212,764 US6825932B2 (en) 1997-01-20 2002-08-07 Method for measuring optical feature of exposure apparatus and exposure apparatus having means for measuring optical feature

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9021026A JPH10209031A (ja) 1997-01-20 1997-01-20 結像特性補正方法及び投影露光装置

Publications (2)

Publication Number Publication Date
JPH10209031A JPH10209031A (ja) 1998-08-07
JPH10209031A5 true JPH10209031A5 (cg-RX-API-DMAC7.html) 2004-12-24

Family

ID=12043509

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9021026A Withdrawn JPH10209031A (ja) 1997-01-20 1997-01-20 結像特性補正方法及び投影露光装置

Country Status (1)

Country Link
JP (1) JPH10209031A (cg-RX-API-DMAC7.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001044113A (ja) 1999-08-02 2001-02-16 Nikon Corp ビーム出力制御方法、ビーム出力装置、及び露光システム、並びに当該露光システムを用いるデバイス製造方法
US7177010B2 (en) * 2004-11-03 2007-02-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20070115452A1 (en) * 2005-11-23 2007-05-24 Asml Netherlands B.V. Method of measuring the magnification of a projection system, device manufacturing method and computer program product

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