JPH09306818A5 - - Google Patents

Info

Publication number
JPH09306818A5
JPH09306818A5 JP1996121940A JP12194096A JPH09306818A5 JP H09306818 A5 JPH09306818 A5 JP H09306818A5 JP 1996121940 A JP1996121940 A JP 1996121940A JP 12194096 A JP12194096 A JP 12194096A JP H09306818 A5 JPH09306818 A5 JP H09306818A5
Authority
JP
Japan
Prior art keywords
exposure method
shots
patterns
amount
device pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996121940A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09306818A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP8121940A priority Critical patent/JPH09306818A/ja
Priority claimed from JP8121940A external-priority patent/JPH09306818A/ja
Priority to KR1019970018304A priority patent/KR100471461B1/ko
Priority to US08/856,029 priority patent/US5973766A/en
Publication of JPH09306818A publication Critical patent/JPH09306818A/ja
Publication of JPH09306818A5 publication Critical patent/JPH09306818A5/ja
Pending legal-status Critical Current

Links

JP8121940A 1996-05-16 1996-05-16 露光方法 Pending JPH09306818A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP8121940A JPH09306818A (ja) 1996-05-16 1996-05-16 露光方法
KR1019970018304A KR100471461B1 (ko) 1996-05-16 1997-05-12 노광방법및노광장치
US08/856,029 US5973766A (en) 1996-05-16 1997-05-14 Exposure method and exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8121940A JPH09306818A (ja) 1996-05-16 1996-05-16 露光方法

Publications (2)

Publication Number Publication Date
JPH09306818A JPH09306818A (ja) 1997-11-28
JPH09306818A5 true JPH09306818A5 (cg-RX-API-DMAC7.html) 2004-12-02

Family

ID=14823701

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8121940A Pending JPH09306818A (ja) 1996-05-16 1996-05-16 露光方法

Country Status (1)

Country Link
JP (1) JPH09306818A (cg-RX-API-DMAC7.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8139218B2 (en) 2005-07-06 2012-03-20 Asml Netherlands B.V. Substrate distortion measurement
JP5062992B2 (ja) * 2005-11-22 2012-10-31 ルネサスエレクトロニクス株式会社 半導体装置の製造方法
JP6006420B2 (ja) * 2012-08-29 2016-10-12 エーエスエムエル ネザーランズ ビー．ブイ． 変形パターン認識手法、パターン転写方法、処理デバイスモニタリング方法、及びリソグラフィ装置
JP2017090817A (ja) * 2015-11-16 2017-05-25 キヤノン株式会社 露光装置、及び物品の製造方法

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