JPH10199846A - 紫外線処理方法 - Google Patents
紫外線処理方法Info
- Publication number
- JPH10199846A JPH10199846A JP1452297A JP1452297A JPH10199846A JP H10199846 A JPH10199846 A JP H10199846A JP 1452297 A JP1452297 A JP 1452297A JP 1452297 A JP1452297 A JP 1452297A JP H10199846 A JPH10199846 A JP H10199846A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- ozone
- oxidation
- ultraviolet
- temp
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 12
- 239000000758 substrate Substances 0.000 claims abstract description 27
- 229910052709 silver Inorganic materials 0.000 claims abstract description 16
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229910052802 copper Inorganic materials 0.000 claims abstract description 14
- 230000001678 irradiating effect Effects 0.000 claims abstract description 3
- 239000004332 silver Substances 0.000 claims description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 10
- 239000010949 copper Substances 0.000 claims description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 230000003647 oxidation Effects 0.000 abstract description 11
- 238000007254 oxidation reaction Methods 0.000 abstract description 11
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 abstract description 2
- 230000001629 suppression Effects 0.000 abstract 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 11
- 150000002894 organic compounds Chemical class 0.000 description 7
- 239000000126 substance Substances 0.000 description 4
- 125000004430 oxygen atom Chemical group O* 0.000 description 3
- 230000005281 excited state Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000002596 correlated effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005283 ground state Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1452297A JPH10199846A (ja) | 1997-01-09 | 1997-01-09 | 紫外線処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1452297A JPH10199846A (ja) | 1997-01-09 | 1997-01-09 | 紫外線処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10199846A true JPH10199846A (ja) | 1998-07-31 |
| JPH10199846A5 JPH10199846A5 (enrdf_load_stackoverflow) | 2004-10-21 |
Family
ID=11863446
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1452297A Pending JPH10199846A (ja) | 1997-01-09 | 1997-01-09 | 紫外線処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH10199846A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001244227A (ja) * | 2000-02-25 | 2001-09-07 | Natl Inst Of Advanced Industrial Science & Technology Meti | 半導体基板表面の気相洗浄法 |
| KR20040001993A (ko) * | 2002-06-29 | 2004-01-07 | 주식회사 하이닉스반도체 | 구리 금속 배선 형성방법 및 이를 이용한 반도체 소자의다층 배선 형성방법 |
| SG115381A1 (en) * | 2001-06-20 | 2005-10-28 | Univ Singapore | Removal of organic layers from organic electronic devices |
-
1997
- 1997-01-09 JP JP1452297A patent/JPH10199846A/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001244227A (ja) * | 2000-02-25 | 2001-09-07 | Natl Inst Of Advanced Industrial Science & Technology Meti | 半導体基板表面の気相洗浄法 |
| SG115381A1 (en) * | 2001-06-20 | 2005-10-28 | Univ Singapore | Removal of organic layers from organic electronic devices |
| KR20040001993A (ko) * | 2002-06-29 | 2004-01-07 | 주식회사 하이닉스반도체 | 구리 금속 배선 형성방법 및 이를 이용한 반도체 소자의다층 배선 형성방법 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A131 | Notification of reasons for refusal |
Effective date: 20051205 Free format text: JAPANESE INTERMEDIATE CODE: A131 |
|
| A711 | Notification of change in applicant |
Effective date: 20051213 Free format text: JAPANESE INTERMEDIATE CODE: A712 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20051221 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20060214 |
|
| A02 | Decision of refusal |
Effective date: 20060905 Free format text: JAPANESE INTERMEDIATE CODE: A02 |