JPH10192773A - Method for drying polyimide film - Google Patents

Method for drying polyimide film

Info

Publication number
JPH10192773A
JPH10192773A JP398997A JP398997A JPH10192773A JP H10192773 A JPH10192773 A JP H10192773A JP 398997 A JP398997 A JP 398997A JP 398997 A JP398997 A JP 398997A JP H10192773 A JPH10192773 A JP H10192773A
Authority
JP
Japan
Prior art keywords
polyimide
film
resin
solvent
supercritical fluid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP398997A
Other languages
Japanese (ja)
Inventor
Yoshiyuki Yamamori
義之 山森
Etsu Takeuchi
江津 竹内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP398997A priority Critical patent/JPH10192773A/en
Publication of JPH10192773A publication Critical patent/JPH10192773A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0346Organic insulating material consisting of one material containing N
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/227Drying of printed circuits

Landscapes

  • Drying Of Solid Materials (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a polyimide film which is never foamed due to the vaporization of the remaining solvent and moisture in one step, excellent in productivity without deteriorating the resin and reduced in remaining solvent. SOLUTION: This drying method consists in bringing the solvent and moisture remaining in a polyimide film or a polyimide laminated film into contact with a supercritical fluid below the glass transition temp. of the resin and removing them. In this case, the polyimide film and a highly air-permeable spacer film are couple, wound and brought into contact with the supercritical fluid. Carbon dioxide is used as the supercritical fluid.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、フレキシブルプリ
ント配線板やTABテープに用いられるポリイミドフィ
ルムおよびプリント配線板同士の張り合わせ用接着剤シ
ート(いわゆるボンディングシート)やカバーレイフィ
ルムあるいは半導体チップとリードフレームの張り合わ
せ用接着テープ(いわゆるLOCテープ)等に用いられ
るポリイミド系接着フィルムの乾燥方法に関するもので
ある。
The present invention relates to a polyimide film used for a flexible printed wiring board or a TAB tape, an adhesive sheet for bonding printed wiring boards (so-called bonding sheet), a coverlay film or a semiconductor chip to a lead frame. The present invention relates to a method for drying a polyimide adhesive film used for an adhesive tape for bonding (so-called LOC tape) and the like.

【0002】[0002]

【従来の技術】ポリイミドフィルムはフレキシブルプリ
ント配線板やTABテープの基材として、またポリイミ
ド系接着フィルムはリジッドフレキシブルプリント配線
板用のボンディングシートやカバーレイフィルムとし
て、あるいは半導体チップとリードフレームを張り合わ
せるためのLOCテープなど、電気・電子機器の小型軽
量化に伴い信頼性の求められる用途に盛んに用いられる
ようになっている。しかしポリイミド系フィルムは耐熱
性が優れる反面、フィルム製造においては樹脂のガラス
転移温度以上の高温で十分加熱しないと内部に含まれる
溶剤を十分除去できないため非常に高価な設備が必要で
あり、さらに生産性を落とす大きな要因となっていた。
また接着性や加工温度の低温化を目的としてポリイミド
以外の他の樹脂を添加したポリイミド系接着フィルムで
は高温で長時間乾燥させると内部の樹脂が硬化あるいは
分解してしまい本来の目的である接着性を示さなくなる
ため反応しない程度の高温で長時間乾燥させる必要があ
り極めて生産性を落とす原因となっていた。これらポリ
イミド系樹脂を使った用途ではポリイミドの高い耐熱性
を活かす意味で後工程でも半田付けや熱圧着工程など高
温での工程を経ることが多いが、このとき事前に溶剤あ
るいは水分が十分に除去されていないと、残存している
溶剤や水分が一気に気化して発泡するなどの問題があっ
た。
2. Description of the Related Art A polyimide film is used as a base material of a flexible printed wiring board or a TAB tape, and a polyimide adhesive film is used as a bonding sheet or a coverlay film for a rigid flexible printed wiring board, or a semiconductor chip is bonded to a lead frame. LOC tapes and the like have been widely used in applications requiring reliability with the reduction in size and weight of electric and electronic devices. However, while polyimide-based films have excellent heat resistance, film production requires extremely expensive equipment because the solvent contained inside cannot be sufficiently removed unless heated sufficiently at a temperature higher than the glass transition temperature of the resin. This was a major factor in reducing sex.
In addition, in the case of a polyimide adhesive film to which other resin than polyimide is added for the purpose of lowering the adhesiveness and processing temperature, if the resin is dried at a high temperature for a long time, the resin inside hardens or decomposes, and the original purpose adhesiveness Therefore, it is necessary to dry at a high temperature that does not cause a reaction for a long period of time, which causes a significant decrease in productivity. In applications using these polyimide resins, high temperature processes such as soldering and thermocompression are often performed in the post-process in order to take advantage of the high heat resistance of the polyimide, but at this time the solvent or moisture is sufficiently removed in advance. If not, there is a problem that the remaining solvent and water vaporize at a stretch and foam.

【0003】[0003]

【発明が解決しようとする課題】本発明の目的とすると
ころは、樹脂の品質を落とさずに生産性の優れた残存溶
剤の少ないポリイミド系フィルムを提供するものであ
る。
SUMMARY OF THE INVENTION An object of the present invention is to provide a polyimide-based film which is excellent in productivity without deteriorating the quality of the resin and has a small amount of residual solvent.

【0004】[0004]

【課題を解決するための手段】本発明はポリイミド系フ
ィルムあるいはポリイミド複合フィルムに残存する溶剤
および水分を樹脂のガラス転移温度以下の超臨界流体と
接触させて除去することを特徴とするポリイミド系フィ
ルムの乾燥方法であり、このとき通気性の良いスペーサ
ーフィルムとポリイミド系フィルムを対にして巻き取っ
た状態で超臨界流体に接触させることを特徴とするポリ
イミド系フィルムの乾燥方法である。また用いる超臨界
流体が二酸化炭素であることを特徴とするポリイミド系
フィルムの乾燥方法である。
According to the present invention, there is provided a polyimide film characterized in that a solvent and moisture remaining in a polyimide film or a polyimide composite film are removed by contact with a supercritical fluid having a temperature lower than the glass transition temperature of the resin. A method for drying a polyimide film, wherein a pair of a spacer film having good air permeability and a polyimide film are brought into contact with a supercritical fluid in a wound state at this time. A supercritical fluid to be used is carbon dioxide, which is a method for drying a polyimide film.

【0005】[0005]

【発明の実施の形態】本発明におけるポリイミド系樹脂
とはイミド骨格を有するポリイミド、ポリエーテルイミ
ド、ポリアミドイミド樹脂などからなる純粋なポリイミ
ドの他、ポリイミド樹脂に加工温度の低減、接着性の向
上を目的としてエポキシ樹脂、アクリル樹脂、ポリアミ
ド樹脂、ポリアミドイミド樹脂など他の樹脂を添加した
もの等を挙げることができるが、ポリイミドを主成分と
した樹脂フィルムであれば特に限定はされない。本発明
で用いられるポリイミド樹脂は一般に前駆体であるのポ
リアミック酸を熱的もしくは化学的に閉環して得られる
が特に限定されるモノではない。ポリアミック酸は通常
ジアミンと酸無水物とを反応させることにより得られ
る。ジアミンとしては、フェニレンジアミン、ジアミノ
ジフェニルメタン、ジアミノジフェニルスルホン、ジア
ミノジフェニルエ−テル、2,2-ビス[4-(4-アミノフェ
ノキシ)フェニル]プロパン、1,3-ビス(3-アミノフェ
ノキシ)ベンゼン、4,4'-ジアミノジフェニルメタン、
3,3'-ジメチルベンジジン、4,4'-ジアミノ-P-テルフェ
ニル、4,4'-ジアミノ-P-クォーターフェニル、2,8-ジア
ミノジフェニレンオキサイドあるいはα,ω−ビス(3
−アミノプロピル)ポリジメチルシロキサンなどのシロ
キサンジアミンを、酸無水物としては、トリメリット酸
無水物、ピロメリット酸二無水物、ビフェニルテトラカ
ルボン酸二無水物、ベンゾフェノンテトラカルボン酸二
無水物、オキシジフタル酸二無水物などを使用すること
ができるがこれらに限定されるわけではない。またそれ
ぞれ1種又は2種以上を適宜組み合わせて用いることが
できる。
BEST MODE FOR CARRYING OUT THE INVENTION In the present invention, a polyimide resin is a polyimide having an imide skeleton, a polyether imide, a polyamide imide resin or the like, and a polyimide resin is used to reduce the processing temperature and improve the adhesiveness. Examples of the purpose include a resin to which another resin such as an epoxy resin, an acrylic resin, a polyamide resin, and a polyamideimide resin is added. However, the resin film is not particularly limited as long as it is a resin film containing polyimide as a main component. The polyimide resin used in the present invention is generally obtained by thermally or chemically ring closing a precursor polyamic acid, but is not particularly limited. The polyamic acid is usually obtained by reacting a diamine with an acid anhydride. Examples of the diamine include phenylenediamine, diaminodiphenylmethane, diaminodiphenylsulfone, diaminodiphenylether, 2,2-bis [4- (4-aminophenoxy) phenyl] propane, and 1,3-bis (3-aminophenoxy) benzene , 4,4'-diaminodiphenylmethane,
3,3'-dimethylbenzidine, 4,4'-diamino-P-terphenyl, 4,4'-diamino-P-quarterphenyl, 2,8-diaminodiphenylene oxide or α, ω-bis (3
Siloxane diamines such as -aminopropyl) polydimethylsiloxane, and as acid anhydrides, trimellitic anhydride, pyromellitic dianhydride, biphenyltetracarboxylic dianhydride, benzophenonetetracarboxylic dianhydride, oxydiphthalic acid A dianhydride or the like can be used, but is not limited thereto. In addition, one kind or two or more kinds can be used in appropriate combination.

【0006】本発明においてポリイミド樹脂は一般にポ
リアミック酸を経由して得ることができるが、このとき
溶剤としては通常テトラカルボン酸二無水物またはジア
ミン類と反応しない有機極性溶媒中で行われる。この有
機極性溶媒は、反応系に対して不活性であり、かつ生成
物に対して溶媒であること以外に、反応成分の少なくと
も一方、好ましくは両者に対して良溶媒でなければなら
ない。この種の溶媒として代表的なものは、N,N-ジメチ
ルホルムアミド、N,N-ジメチルアセトアミド、ジメチル
スルホン、ジメチルスルホキシド、N-メチル-2-ピロリ
ドン等があり、これらの溶媒は単独または組み合わせて
使用される。この他にも溶媒として組み合わせて用いら
れるものとしてベンゼン、ジオキサン、キシレン、トル
エン、シクロヘキサン等の非極性溶媒が、原料の分散
媒、反応調節剤あるいは生成物からの揮散調節剤、皮膜
平滑剤等として使用される。
In the present invention, the polyimide resin can be generally obtained via a polyamic acid. In this case, the solvent is usually obtained in an organic polar solvent which does not react with tetracarboxylic dianhydride or diamine. In addition to being inert to the reaction system and being a solvent for the product, the organic polar solvent must be a good solvent for at least one of the reaction components, preferably both. Typical solvents of this type include N, N-dimethylformamide, N, N-dimethylacetamide, dimethylsulfone, dimethylsulfoxide, N-methyl-2-pyrrolidone, and the like, and these solvents may be used alone or in combination. used. In addition, non-polar solvents such as benzene, dioxane, xylene, toluene, and cyclohexane may be used in combination as solvents, as a dispersion medium of a raw material, a volatilization regulator from a reaction regulator or a product, a volatilization regulator from a product, a film smoother, and the like. used.

【0007】本発明におけるポリイミド複合フィルムと
はポリイミド系フィルムと金属箔や他の樹脂フィルムの
積層された複合フィルムであるが、銅箔とポリイミドフ
ィルムの張り合わされたフレキシブルプリント回路用基
板やTAB用テープ、またPETやアルミ箔上にポリイ
ミド系フィルムの形成されたボンディングシートなどを
挙げることができるが、ポリイミド系のフィルムが他の
フィルム上に積層されているものであれば特に限定され
ない。
The polyimide composite film in the present invention is a composite film in which a polyimide-based film and a metal foil or another resin film are laminated. A flexible printed circuit board or a TAB tape in which a copper foil and a polyimide film are laminated. And a bonding sheet in which a polyimide-based film is formed on PET or aluminum foil, but is not particularly limited as long as the polyimide-based film is laminated on another film.

【0008】本発明における超臨界流体としては、二酸
化炭素が好ましいが樹脂のガラス転移温度以下で超臨界
状態を示し、上述の溶剤と溶解度定数の近く、毒性、引
火性の少ないものであれば特に限定されない。また溶剤
を除去するための温度・圧力は溶剤の種類および超臨界
流体の種類により異なるが、二酸化炭素を用いる場合、
31℃〜150℃、75〜300kgf/cm2にするのが好
ましい。
As the supercritical fluid in the present invention, carbon dioxide is preferable. However, a supercritical fluid which exhibits a supercritical state below the glass transition temperature of the resin, has a solubility constant close to that of the above-mentioned solvent, and has low toxicity and flammability is particularly preferred. Not limited. The temperature and pressure for removing the solvent differ depending on the type of solvent and the type of supercritical fluid, but when using carbon dioxide,
The temperature is preferably from 31 to 150 ° C and from 75 to 300 kgf / cm 2 .

【0009】スペーサーフィルムとして用いることので
きる材料としては、ポリプロピレン、ポリエステル、ポ
リエーテルサルフォン、ポリイミド、ポリエーテルイミ
ド、ポリアミド、ポリエチレン等のプラスチックフィル
ムあるいはアルミ箔、銅箔、ステンレス箔などの金属箔
が挙げることができる。スペーサーフィルムの形状はポ
リイミド系樹脂と超臨界流体の接触面積を向上させるも
のであれば特に限定されないが、一般にはエンボス加工
されたものや端部に突起(ディンプル)のついたものあ
るいはメッシュ状のものなどを挙げることができる。
Materials that can be used as the spacer film include plastic films such as polypropylene, polyester, polyethersulfone, polyimide, polyetherimide, polyamide, and polyethylene, and metal foils such as aluminum foil, copper foil, and stainless steel foil. Can be mentioned. The shape of the spacer film is not particularly limited as long as it improves the contact area between the polyimide resin and the supercritical fluid, but is generally embossed, has protrusions (dimples) at its ends, or has a mesh shape. And the like.

【0010】[0010]

【実施例】【Example】

(実施例1)乾燥窒素ガス導入管、冷却器、温度計、撹
拌機を備えた四口フラスコに、脱水精製したN−メチル
−2−ピロリドン(NMP)1428gを入れ、窒素ガ
スを流し系中をかき混ぜながら2,2−ビス(4−(4
−アミノフェノキシ)フェニル)プロパン(BAPP)
82.1g(0.10モル)、1,3-ビス(3-アミノフェ
ノキシ)ベンゼン(APB)38.7g(0.20モ
ル)、α,ω−ビス(3−アミノプロピル)ジメチルジ
シロキサン(APDS)24.9g(0.10モル)を
投入し、均一になるまでかき混ぜる。均一に溶解後、系
を20℃に保ちながら、3,3’,4,4’−ビフェニ
ルテトラカルボン酸二無水物(BPDA)82.4g
(0.28モル)、3,3’,4,4’−ベンゾフェノ
ンテトラカルボン酸二無水物(BTDA)38.7g
(0.12モル)を粉末状のまま15分間かけて添加
し、その後8時間撹拌を続けた。この間フラスコは20
℃に保った。その後、窒素ガス導入管と冷却器を外し、
トルエンを満たしたディーン・スターク管をフラスコに
装着し、系にトルエン612gを添加した。油浴に代え
て系を175℃に加熱し発生する水を系外に除いた。6
時間加熱したところ、系からの水の発生は認められなく
なった。系を冷却することによりポリイミド溶液PI−
1が得られた。
(Example 1) 1428 g of dehydrated and purified N-methyl-2-pyrrolidone (NMP) was placed in a four-necked flask equipped with a dry nitrogen gas inlet tube, a cooler, a thermometer, and a stirrer, and nitrogen gas was allowed to flow therethrough. While stirring the 2,2-bis (4- (4
-Aminophenoxy) phenyl) propane (BAPP)
82.1 g (0.10 mol), 38.7 g (0.20 mol) of 1,3-bis (3-aminophenoxy) benzene (APB), α, ω-bis (3-aminopropyl) dimethyldisiloxane ( (APDS) 24.9 g (0.10 mol) is added and stirred until uniform. After uniformly dissolving, keeping the system at 20 ° C., 82.4 g of 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride (BPDA).
(0.28 mol), 3,3 ', 4,4'-benzophenonetetracarboxylic dianhydride (BTDA) 38.7 g
(0.12 mol) in the form of a powder over 15 minutes, followed by stirring for 8 hours. During this time the flask is 20
C. After that, remove the nitrogen gas inlet tube and cooler,
A Dean-Stark tube filled with toluene was attached to the flask, and 612 g of toluene was added to the system. The system was heated to 175 ° C. instead of the oil bath, and the generated water was removed from the system. 6
After heating for an hour, no water was generated from the system. By cooling the system, the polyimide solution PI-
1 was obtained.

【0011】ガラス製フラスコにポリイミド樹脂PI−
1を500g入れ、室温でビスフェノールA型エポキシ
化合物(エピコート828、油化シェルエポキシ製)2
0g、キシレノール樹脂(商品名:ザイロック)10g
を系を撹拌しながら徐々に加え、引き続き2時間撹拌し
ポリイミド系樹脂溶液を調製した。得られた樹脂のガラ
ス転移温度は熱機械分析法によると170℃であった。
(以下ガラス転移温度はすべて熱機械分析法による) この変性ポリアミック酸溶液をバーコーターで市販のポ
リエステルフィルム(三菱ダイヤホイル製)の片面にバ
ーコーターでイミド化後の厚みが100μmになるように
塗布し、110℃で30分、130℃で30分、160℃で60分乾燥
を行い、片面にポリエステルフィルムの付いたポリイミ
ド系接着フィルムを得た(フィルム1)。得られたポリ
イミド系接着フィルム中の溶剤含有量を熱重量分析(温
度範囲30〜400℃:以下全て同様の装置、条件で溶
剤含有量を測定)したところ、1.3%の溶剤がまだ残
留していることが分かった。このポリイミドフィルムを
ステンレス板の端部に高さ2mmの突起を設けたスペーサ
ー内部に100m巻き付け圧力100kg/cm2、温度35
℃の調臨界状態の二酸化炭素で1時間処理し、樹脂中の
溶剤含有量を測定したところ0.018%に低下した。
In a glass flask, a polyimide resin PI-
1, 500 g of bisphenol A type epoxy compound (Epicoat 828, manufactured by Yuka Shell Epoxy) at room temperature
0 g, xylenol resin (trade name: Xyloc) 10 g
Was gradually added while stirring the system, and subsequently stirred for 2 hours to prepare a polyimide resin solution. The glass transition temperature of the obtained resin was 170 ° C. according to thermomechanical analysis.
(Hereinafter, all the glass transition temperatures are determined by thermomechanical analysis.) Apply this modified polyamic acid solution to one side of a commercially available polyester film (manufactured by Mitsubishi Diafoil) using a bar coater so that the thickness after imidization becomes 100 μm with a bar coater. Then, drying was performed at 110 ° C. for 30 minutes, 130 ° C. for 30 minutes, and 160 ° C. for 60 minutes to obtain a polyimide-based adhesive film having a polyester film on one side (Film 1). When the solvent content in the obtained polyimide-based adhesive film was subjected to thermogravimetric analysis (temperature range: 30 to 400 ° C .; hereinafter, the solvent content was measured using the same apparatus and under the same conditions), 1.3% of the solvent still remained. I knew I was doing it. This polyimide film is wound 100 m inside a spacer having a protrusion having a height of 2 mm at the end of a stainless steel plate, pressure 100 kg / cm 2 , temperature 35
The solution was treated with carbon dioxide in a controlled critical state at a temperature of 1 ° C. for 1 hour, and the content of the solvent in the resin was measured and found to be 0.018%.

【0012】(比較例1)実施例1のフィルム1を用い
180℃で30分、200℃で30分乾燥加えたがまだ溶剤含有量
は0.18%であった。一方更に240℃で30分乾燥を加
えたところ溶剤含有量は0.03%まで低下したが、樹
脂中のエポキシ樹脂が硬化してしまい接着力を失いもは
や接着フィルムとしては使用できなかった。
Comparative Example 1 Using the film 1 of Example 1
After drying at 180 ° C. for 30 minutes and at 200 ° C. for 30 minutes, the solvent content was still 0.18%. On the other hand, when drying was further performed at 240 ° C. for 30 minutes, the solvent content was reduced to 0.03%, but the epoxy resin in the resin was cured and the adhesive strength was lost, so that it could no longer be used as an adhesive film.

【0013】(実施例2)温度計、撹拌装置、還流コン
デンサ−及び乾燥窒素ガス吹込み口を備えた4つ口セパ
ラブルフラスコに、精製した無水のパラフェニレンジア
ミン108gと4,4’−ジアミノジフェニルエ−テル
200gをとり、これに無水のN−メチル−2−ピロリ
ドン90重量%とトルエン10重量%の混合溶剤を、全
仕込原料中の固形分割合が20重量%になるだけの量を
加えて溶解した。乾燥窒素ガスは反応の準備段階より生
成物取り出しまでの全工程にわたり流しておいた。次い
で、精製した無水の3,3’,4,4’−ビフェニルテ
トラカルボン酸二無水物294gとピロメリット酸二無
水物218gを撹拌しながら少量ずつ添加するが、発熱
反応であるため、外部水槽に約15℃の冷水を循環させ
てこれを冷却した。添加後、内部温度を20℃に設定
し、5時間撹拌し、反応を終了してポリアミック酸溶液
を得た。得られた樹脂のイミド化後のガラス転移温度は
熱機械分析法によると312℃であった。市販の銅箔上
に、このポリアミック酸溶液をバーコーターでイミド化
後の厚みが25μmになるように塗布し、110℃で15分、1
50℃で15分、200℃で15分、250℃で15分、300℃で15分
加熱・乾燥を行いポリイミド複合フィルム2(フレキシ
ブルプリント回路用基板)を得た。得られたポリイミド
複合フィルム中の溶剤含有量を熱重量分析を行ったとこ
ろ、3.3%の溶剤がまだ残留していることが分かっ
た。このポリイミドフィルムをステンレス板の端部に高
さ2mmの突起を設けたスペーサー内部に銅箔がステンレ
ススペーサー帯に密着するように100m巻き付け圧力
100kg/cm2、温度35℃の調臨界状態の二酸化炭素で
1時間処理したところ、樹脂中の溶剤含有量を測定した
ところ0.008%に低下した。
EXAMPLE 2 108 g of purified anhydrous paraphenylenediamine and 4,4'-diamino were placed in a four-neck separable flask equipped with a thermometer, a stirrer, a reflux condenser and a dry nitrogen gas inlet. Take 200 g of diphenyl ether, add thereto a mixed solvent of 90% by weight of anhydrous N-methyl-2-pyrrolidone and 10% by weight of toluene, and add an amount such that the solid content ratio in all the raw materials becomes 20% by weight. In addition, it dissolved. Dry nitrogen gas was allowed to flow throughout the entire process from the preparation of the reaction to the removal of the product. Next, 294 g of purified anhydrous 3,3 ', 4,4'-biphenyltetracarboxylic dianhydride and 218 g of pyromellitic dianhydride are added little by little with stirring. The mixture was cooled by circulating cold water at about 15 ° C. After the addition, the internal temperature was set to 20 ° C., and the mixture was stirred for 5 hours, and the reaction was completed to obtain a polyamic acid solution. The glass transition temperature of the obtained resin after imidization was 312 ° C. according to thermomechanical analysis. This polyamic acid solution was applied on a commercially available copper foil with a bar coater so that the thickness after imidization became 25 μm, and was applied at 110 ° C. for 15 minutes, 1 minute.
Heating and drying at 50 ° C. for 15 minutes, 200 ° C. for 15 minutes, 250 ° C. for 15 minutes, and 300 ° C. for 15 minutes, a polyimide composite film 2 (flexible printed circuit board) was obtained. A thermogravimetric analysis of the solvent content in the obtained polyimide composite film showed that 3.3% of the solvent still remained. 100m wound pressure 100 kg / cm 2 to the copper foil of this polyimide film to the spacer interior which is provided a protrusion height of 2mm on the end of the stainless steel plate is brought into close contact with the stainless steel spacer strip, the critical state regulating temperature 35 ° C. Carbon dioxide For 1 hour, the content of the solvent in the resin was measured and found to be 0.008%.

【0014】(比較例2)実施例2のポリイミド複合フ
ィルム2を用い350℃で30分乾燥加えたがまだ溶剤含有
量は0.78%であった。一方更に380℃で30分乾燥を
加えたところ溶剤含有量は0.014%まで低下した
が、銅箔が酸化しないように常に窒素雰囲気に置換でき
る高温の炉が必須であり、しかも銅箔は高温がかかるた
め焼きなまされて軟化してしまいTAB等銅箔の剛性が
必要な用途には使用することができなかった。
Comparative Example 2 The polyimide composite film 2 of Example 2 was dried at 350 ° C. for 30 minutes, but the solvent content was still 0.78%. On the other hand, when the solvent was further dried at 380 ° C. for 30 minutes, the solvent content was reduced to 0.014%. However, a high-temperature furnace which can always be replaced with a nitrogen atmosphere so as not to oxidize the copper foil is indispensable. Because of the high temperature, it was annealed and softened, and could not be used for applications requiring the rigidity of copper foil such as TAB.

【0015】[0015]

【発明の効果】本発明はポリイミド系フィルムあるいは
ポリイミド複合フィルムを通気性の良いスペーサーフィ
ルムと対にして巻き取った状態とし、樹脂のガラス転移
温度以下で超臨界状態となる二酸化炭素等の超臨界流体
と接触させて残存する溶剤および水分を除去することを
特徴とするポリイミド系フィルムの乾燥方法であるが、
本方法は通常除去の難しかった微量の残存溶剤をポリイ
ミド系フィルムに熱や機械的なダメージがほとんど加わ
らないためフィルムを劣化させることなく効率よく除去
可能な工業的に優れたポリイミド系フィルムの乾燥方法
である。
According to the present invention, a polyimide film or a polyimide composite film is wound into a pair with a spacer film having good air permeability, and the supercritical state of carbon dioxide or the like which becomes a supercritical state below the glass transition temperature of the resin is obtained. Is a method for drying a polyimide film characterized by removing the solvent and moisture remaining in contact with the fluid,
This method is an industrially superior method of drying a polyimide-based film that can remove a small amount of residual solvent, which was usually difficult to remove, with little heat or mechanical damage to the polyimide-based film and efficiently remove the film without deteriorating the film. It is.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 ポリイミド系フィルムに残存する溶剤お
よび水分を樹脂のガラス転移温度以下の超臨界流体と接
触させて除去することを特徴とするポリイミド系フィル
ムの乾燥方法。
1. A method for drying a polyimide film, comprising removing a solvent and moisture remaining in the polyimide film by contacting the solvent and water with a supercritical fluid having a glass transition temperature of the resin or lower.
【請求項2】 請求項1においてポリイミド系フィルム
が金属あるいは他の樹脂との複合フィルムであることを
特徴とするポリイミド複合フィルムの乾燥方法。
2. The method for drying a polyimide composite film according to claim 1, wherein the polyimide film is a composite film with a metal or another resin.
【請求項3】 請求項1又は2においてポリイミド系フ
ィルムを通気性の良いスペーサーフィルムと対にして巻
き取った状態で超臨界流体に接触させることを特徴とす
るポリイミド系フィルムの乾燥方法。
3. A method for drying a polyimide-based film according to claim 1, wherein the polyimide-based film is brought into contact with a supercritical fluid in a wound state while being paired with a spacer film having good air permeability.
【請求項4】 請求項1、2又は3において超臨界流体
が二酸化炭素であることを特徴とするポリイミド系フィ
ルムの乾燥方法。
4. The method for drying a polyimide film according to claim 1, wherein the supercritical fluid is carbon dioxide.
JP398997A 1997-01-13 1997-01-13 Method for drying polyimide film Pending JPH10192773A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP398997A JPH10192773A (en) 1997-01-13 1997-01-13 Method for drying polyimide film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP398997A JPH10192773A (en) 1997-01-13 1997-01-13 Method for drying polyimide film

Publications (1)

Publication Number Publication Date
JPH10192773A true JPH10192773A (en) 1998-07-28

Family

ID=11572438

Family Applications (1)

Application Number Title Priority Date Filing Date
JP398997A Pending JPH10192773A (en) 1997-01-13 1997-01-13 Method for drying polyimide film

Country Status (1)

Country Link
JP (1) JPH10192773A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001029114A1 (en) * 1999-10-19 2001-04-26 National University Of Singapore A chemical curing process for polyimide formation
WO2004052642A1 (en) * 2002-12-09 2004-06-24 Fcm Co., Ltd. CONDUCTIVE SHEET HAVING CONDUCTIVE LAYER ON Si-CONTAINING LAYER
KR100855783B1 (en) * 2007-03-13 2008-09-01 엘에스엠트론 주식회사 Method for dying polyimide film to increasing the adhesion between metal and the polyimide film
JP2014123121A (en) * 2012-12-20 2014-07-03 Xerox Corp Method of making fuser member
JP2015007211A (en) * 2013-05-27 2015-01-15 株式会社リコー Production method of polyimide precursor and production method of polyimide
WO2020004293A1 (en) * 2018-06-25 2020-01-02 大日本印刷株式会社 Polyimide film, polyimide material, layered body, member for display, touch panel member, liquid crystal display device, and organic electroluminescent display device
JP2020002353A (en) * 2018-06-25 2020-01-09 大日本印刷株式会社 Polyimide film, polyimide material, layered body, member for display, touch panel member, liquid crystal display device, and organic electroluminescent display device

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001029114A1 (en) * 1999-10-19 2001-04-26 National University Of Singapore A chemical curing process for polyimide formation
SG93845A1 (en) * 1999-10-19 2003-01-21 Univ Singapore A chemical curing process for polyimide formation
WO2004052642A1 (en) * 2002-12-09 2004-06-24 Fcm Co., Ltd. CONDUCTIVE SHEET HAVING CONDUCTIVE LAYER ON Si-CONTAINING LAYER
JP2004188654A (en) * 2002-12-09 2004-07-08 Fcm Kk Conductive sheet
KR100855783B1 (en) * 2007-03-13 2008-09-01 엘에스엠트론 주식회사 Method for dying polyimide film to increasing the adhesion between metal and the polyimide film
JP2014123121A (en) * 2012-12-20 2014-07-03 Xerox Corp Method of making fuser member
JP2015007211A (en) * 2013-05-27 2015-01-15 株式会社リコー Production method of polyimide precursor and production method of polyimide
WO2020004293A1 (en) * 2018-06-25 2020-01-02 大日本印刷株式会社 Polyimide film, polyimide material, layered body, member for display, touch panel member, liquid crystal display device, and organic electroluminescent display device
JP2020002353A (en) * 2018-06-25 2020-01-09 大日本印刷株式会社 Polyimide film, polyimide material, layered body, member for display, touch panel member, liquid crystal display device, and organic electroluminescent display device

Similar Documents

Publication Publication Date Title
CN111278898B (en) Ultrathin black polyimide film and preparation method thereof
TWI408200B (en) Novel polyimide film, adhesive film obtained using the same, and flexible metal laminated laminate
JP4625458B2 (en) Adhesive film and use thereof
JPH03503065A (en) Method for lowering dielectric constant of polyimide using diamic acid additive
EP0598911B1 (en) Film adhesive and production thereof
JP4009918B2 (en) Polyimide film, method for producing the same, and metal laminate using the same
JPH10192773A (en) Method for drying polyimide film
CN112500803B (en) Polyimide adhesive film and preparation method and application thereof
JP2003335874A (en) Polyimide film
JP6936639B2 (en) Laminates, flexible metal-clad laminates, and flexible printed circuit boards
JP3635384B2 (en) Heat resistant bonding sheet
KR101195719B1 (en) Adhesive film, flexible metal-clad laminate of enhanced dimensional stability obtained therefrom and process for producing the same
JP2009280660A (en) Polyimide resin
JPH05331445A (en) Production of film adhesive
JP2001244380A (en) Polyimide film for surface mounted area array package
JP2003206353A (en) Polyimide film and metal circuit board having base material of the same
CN111892884A (en) Hot-melt polyimide adhesive film and preparation method and application thereof
JP2003011308A (en) Film-shaped laminated member
JP3059248B2 (en) Manufacturing method of flexible printed circuit board
JPH05331425A (en) Film adhesive
JP2673630B2 (en) TAB tape and method for producing the same
JP3065388B2 (en) Manufacturing method of flexible printed circuit board
JP4150403B2 (en) Flexible printed circuit board, FC tape and TAB tape comprising the same
JPH0432289A (en) Board for flexible printed circuit and manufacture thereof
JP2002283369A (en) Method for manufacturing polyimide film