JPH10142555A5 - - Google Patents

Info

Publication number
JPH10142555A5
JPH10142555A5 JP1996309975A JP30997596A JPH10142555A5 JP H10142555 A5 JPH10142555 A5 JP H10142555A5 JP 1996309975 A JP1996309975 A JP 1996309975A JP 30997596 A JP30997596 A JP 30997596A JP H10142555 A5 JPH10142555 A5 JP H10142555A5
Authority
JP
Japan
Prior art keywords
optical member
optical
projection
optical system
projection optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1996309975A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10142555A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP8309975A priority Critical patent/JPH10142555A/ja
Priority claimed from JP8309975A external-priority patent/JPH10142555A/ja
Publication of JPH10142555A publication Critical patent/JPH10142555A/ja
Publication of JPH10142555A5 publication Critical patent/JPH10142555A5/ja
Pending legal-status Critical Current

Links

JP8309975A 1996-11-06 1996-11-06 投影露光装置 Pending JPH10142555A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8309975A JPH10142555A (ja) 1996-11-06 1996-11-06 投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8309975A JPH10142555A (ja) 1996-11-06 1996-11-06 投影露光装置

Publications (2)

Publication Number Publication Date
JPH10142555A JPH10142555A (ja) 1998-05-29
JPH10142555A5 true JPH10142555A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 2004-12-24

Family

ID=17999630

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8309975A Pending JPH10142555A (ja) 1996-11-06 1996-11-06 投影露光装置

Country Status (1)

Country Link
JP (1) JPH10142555A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6522386B1 (en) 1997-07-24 2003-02-18 Nikon Corporation Exposure apparatus having projection optical system with aberration correction element
JP2002184667A (ja) 2000-12-14 2002-06-28 Nikon Corp 補正部材の製造方法、投影光学系の製造方法および露光装置の調整方法
EP1953805A4 (en) * 2005-11-10 2010-03-31 Nikon Corp OPTICAL LIGHTING SYSTEM, EXPOSURE SYSTEM AND EXPOSURE METHOD
KR101235492B1 (ko) 2006-07-03 2013-02-20 칼 짜이스 에스엠테 게엠베하 리소그래피 투사 대물렌즈 교정/수리 방법
US7372633B2 (en) * 2006-07-18 2008-05-13 Asml Netherlands B.V. Lithographic apparatus, aberration correction device and device manufacturing method
JP2010506388A (ja) * 2006-10-02 2010-02-25 カール・ツァイス・エスエムティー・アーゲー 光学システムの結像特性を改善する方法及びその光学システム
CN101548240B (zh) 2006-12-01 2014-09-17 卡尔蔡司Smt有限责任公司 具有用于减小像差的可替换、可操纵的校正布置的光学系统
DE102008001892A1 (de) 2008-05-21 2009-11-26 Carl Zeiss Smt Ag Optisches System für die Mikrolithographie
DE102008043243A1 (de) 2008-10-28 2009-10-29 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie sowie Verfahren zum Verbessern der Abbildungseigenschaften eines Projektionsobjektivs
JP5312058B2 (ja) * 2009-01-19 2013-10-09 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
JP6410406B2 (ja) * 2012-11-16 2018-10-24 キヤノン株式会社 投影光学系、露光装置および物品の製造方法
DE102015211699A1 (de) 2014-08-13 2016-02-18 Carl Zeiss Smt Gmbh Abbildendes optisches System sowie Verfahren zum optischen Design
CN105549327B (zh) * 2014-10-29 2018-03-02 上海微电子装备（集团）股份有限公司 曝光装置的调整装置及调整方法
DE102015218329A1 (de) * 2015-09-24 2017-03-30 Carl Zeiss Smt Gmbh Optische Korrekturanordnung, Projektionsobjektiv mit einer solchen optischen Korrekturanordnung sowie mikrolithografische Apparatur mit einem solchen Projektionsobjektiv
JP7178932B2 (ja) * 2019-03-12 2022-11-28 キヤノン株式会社 露光装置、および物品製造方法

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