|
JP2001068541A
(ja)
*
|
1999-08-26 |
2001-03-16 |
Tatsumo Kk |
処理基板トレイ
|
|
JP4700819B2
(ja)
*
|
2000-03-10 |
2011-06-15 |
キヤノン株式会社 |
基板保持装置、半導体製造装置および半導体デバイス製造方法
|
|
KR100840236B1
(ko)
*
|
2001-12-14 |
2008-06-20 |
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헐레이션을 방지할 수 있는 노광 장치
|
|
SG157962A1
(en)
|
2002-12-10 |
2010-01-29 |
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|
|
TWI254841B
(en)
*
|
2002-12-23 |
2006-05-11 |
Asml Netherlands Bv |
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|
|
SG115629A1
(en)
*
|
2003-03-11 |
2005-10-28 |
Asml Netherlands Bv |
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|
|
SG115631A1
(en)
|
2003-03-11 |
2005-10-28 |
Asml Netherlands Bv |
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|
|
EP2157480B1
(en)
|
2003-04-09 |
2015-05-27 |
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|
|
KR101289959B1
(ko)
|
2003-04-11 |
2013-07-26 |
가부시키가이샤 니콘 |
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|
|
TWI474380B
(zh)
|
2003-05-23 |
2015-02-21 |
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|
|
TWI360158B
(en)
|
2003-10-28 |
2012-03-11 |
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|
|
TWI385414B
(zh)
|
2003-11-20 |
2013-02-11 |
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|
|
US7394521B2
(en)
|
2003-12-23 |
2008-07-01 |
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|
|
TWI609410B
(zh)
|
2004-02-06 |
2017-12-21 |
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|
|
US7898642B2
(en)
|
2004-04-14 |
2011-03-01 |
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|
|
KR101421915B1
(ko)
|
2004-06-09 |
2014-07-22 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
|
JP4813831B2
(ja)
*
|
2005-07-05 |
2011-11-09 |
積水化学工業株式会社 |
表面処理用ステージ構造
|
|
DE602006012746D1
(de)
|
2005-01-14 |
2010-04-22 |
Asml Netherlands Bv |
Lithografische Vorrichtung und Herstellungsverfahren
|
|
KR20140140648A
(ko)
|
2005-05-12 |
2014-12-09 |
가부시키가이샤 니콘 |
투영 광학계, 노광 장치 및 노광 방법
|
|
JP4629548B2
(ja)
*
|
2005-10-03 |
2011-02-09 |
株式会社目白プレシジョン |
投影露光装置
|
|
US20090031955A1
(en)
*
|
2007-07-30 |
2009-02-05 |
Applied Materials, Inc. |
Vacuum chucking heater of axisymmetrical and uniform thermal profile
|
|
JP5267029B2
(ja)
|
2007-10-12 |
2013-08-21 |
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照明光学装置、露光装置及びデバイスの製造方法
|
|
US8379187B2
(en)
|
2007-10-24 |
2013-02-19 |
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|
|
US9116346B2
(en)
|
2007-11-06 |
2015-08-25 |
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|
|
JP5959069B2
(ja)
*
|
2014-07-14 |
2016-08-02 |
国立研究開発法人産業技術総合研究所 |
半導体プロセス用キャリア
|
|
CN106707691B
(zh)
*
|
2015-07-15 |
2018-10-16 |
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|
|
JP6795903B2
(ja)
*
|
2016-04-20 |
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|
|
JP6664529B2
(ja)
*
|
2019-03-04 |
2020-03-13 |
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|
|
KR102261935B1
(ko)
*
|
2019-09-25 |
2021-06-07 |
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|