JPH10104513A5 - - Google Patents
Info
- Publication number
- JPH10104513A5 JPH10104513A5 JP1997261501A JP26150197A JPH10104513A5 JP H10104513 A5 JPH10104513 A5 JP H10104513A5 JP 1997261501 A JP1997261501 A JP 1997261501A JP 26150197 A JP26150197 A JP 26150197A JP H10104513 A5 JPH10104513 A5 JP H10104513A5
- Authority
- JP
- Japan
- Prior art keywords
- reduction objective
- image
- concave mirrors
- objective according
- lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19639586.0 | 1996-09-26 | ||
| DE1996139586 DE19639586A1 (de) | 1996-09-26 | 1996-09-26 | Katadioptrisches Mikrolithographie-Reduktionsobjektiv |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10104513A JPH10104513A (ja) | 1998-04-24 |
| JPH10104513A5 true JPH10104513A5 (OSRAM) | 2005-06-23 |
Family
ID=7806978
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9261501A Pending JPH10104513A (ja) | 1996-09-26 | 1997-09-26 | カタジオプトリックマイクロリソグラフィ用縮小対物レンズ |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0833180A3 (OSRAM) |
| JP (1) | JPH10104513A (OSRAM) |
| DE (1) | DE19639586A1 (OSRAM) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4117856B2 (ja) * | 1997-12-12 | 2008-07-16 | 株式会社小松製作所 | 狭帯域発振エキシマレーザ及びフッ化物プリズム |
| TW405160B (en) | 1998-05-15 | 2000-09-11 | Nippon Kogaku Kk | Light-exposure method, light-exposure apparatus and the manufacture method thereof |
| DE69933973T2 (de) * | 1998-07-29 | 2007-06-28 | Carl Zeiss Smt Ag | Katadioptrisches optisches system und damit ausgestattete belichtungsvorrichtung |
| US6451507B1 (en) | 1998-08-18 | 2002-09-17 | Nikon Corporation | Exposure apparatus and method |
| JP4717974B2 (ja) * | 1999-07-13 | 2011-07-06 | 株式会社ニコン | 反射屈折光学系及び該光学系を備える投影露光装置 |
| US6600608B1 (en) * | 1999-11-05 | 2003-07-29 | Carl-Zeiss-Stiftung | Catadioptric objective comprising two intermediate images |
| TW538256B (en) * | 2000-01-14 | 2003-06-21 | Zeiss Stiftung | Microlithographic reduction projection catadioptric objective |
| JP4245286B2 (ja) * | 2000-10-23 | 2009-03-25 | 株式会社ニコン | 反射屈折光学系および該光学系を備えた露光装置 |
| JP2004514943A (ja) | 2000-11-28 | 2004-05-20 | カール・ツアイス・エスエムテイ・アーゲー | 157nmリソグラフィ用の反射屈折投影系 |
| DE10127227A1 (de) * | 2001-05-22 | 2002-12-05 | Zeiss Carl | Katadioptrisches Reduktionsobjektiv |
| US7085075B2 (en) * | 2003-08-12 | 2006-08-01 | Carl Zeiss Smt Ag | Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 |
| US7023524B2 (en) * | 2003-12-18 | 2006-04-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| KR101492266B1 (ko) | 2004-06-10 | 2015-02-11 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래피 투영 노광 장치를 위한 투영 대물렌즈 |
| JP5495555B2 (ja) * | 2005-03-31 | 2014-05-21 | ケーエルエー−テンカー コーポレイション | 非球面を使用した小型で超高naの反射屈折対物レンズ |
| EP1746463A2 (de) | 2005-07-01 | 2007-01-24 | Carl Zeiss SMT AG | Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv |
| JP5836686B2 (ja) * | 2011-07-28 | 2015-12-24 | キヤノン株式会社 | 反射屈折光学系及びそれを有する撮像装置 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL269391A (OSRAM) * | 1961-09-19 | |||
| GB2197962A (en) * | 1986-11-10 | 1988-06-02 | Compact Spindle Bearing Corp | Catoptric reduction imaging apparatus |
| US5004331A (en) * | 1989-05-03 | 1991-04-02 | Hughes Aircraft Company | Catadioptric projector, catadioptric projection system and process |
| US5031976A (en) * | 1990-09-24 | 1991-07-16 | Kla Instruments, Corporation | Catadioptric imaging system |
| DE69314567T2 (de) * | 1992-07-29 | 1998-02-26 | Nippon Kogaku Kk | Verkleinerndes katadioptrisches Projektionssystem |
| US5557469A (en) * | 1994-10-28 | 1996-09-17 | Ultratech Stepper, Inc. | Beamsplitter in single fold optical system and optical variable magnification method and system |
| DE29516768U1 (de) * | 1995-10-24 | 1996-02-01 | Lindener Werner | Abblendbares Spiegelobjektiv |
| US5717518A (en) * | 1996-07-22 | 1998-02-10 | Kla Instruments Corporation | Broad spectrum ultraviolet catadioptric imaging system |
-
1996
- 1996-09-26 DE DE1996139586 patent/DE19639586A1/de not_active Withdrawn
-
1997
- 1997-09-06 EP EP97115480A patent/EP0833180A3/de not_active Withdrawn
- 1997-09-26 JP JP9261501A patent/JPH10104513A/ja active Pending
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