JPH0990415A - Liquid crystal display device and its manufacture - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent a cell reaction between a pixel electrode and an electrically conductive layer for supplying signal to a non-linear element at the time of forming the light shielding layer such as a black matrix of a substrate holding a liquid crystal of a liquid crystal display device, etc. SOLUTION: After a pixel electrode 6 and a TFT of a non-linear element is formed completely on an insulating transparent substrate 1, an insulated protective film 8 is formed on the whole surface of the substrate 1. Next, a pattern forming is applied by using black resist having a negative type photosensitivity to form a black matrix 9 and then respective electrodes are exposed by etching and removing the insulated protective film 8 on the pixel 6 and the mounted electrode part of extension edge parts of a source electrode 7 and a gate electrode 2 by masking the black matrix 9. Since, when the pattern of the black matrix 9 is formed, the insulated protective film 8 below the matrix 9 covers the whole surface of the substrate, the developer on the matrix 9 is not brought into contact with the pixel electrode 6, the source electrode 7 and the gate electrode 2 and therefore the cell reaction between ITO of the pixel electrode 6 and the source electrode 7 and the between the ITO and Al of the gate electrode 2 is not generated.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display and a method for manufacturing the same.

[0002]

2. Description of the Related Art In a conventional liquid crystal display device, a TFT substrate on which pixel electrodes, thin film transistors of non-linear elements, a black matrix, etc. are formed, and an opposite substrate is formed opposite to the TFT substrate with a liquid crystal interposed therebetween to form an opposite electrode. There are some with. A method of manufacturing a TFT substrate of this conventional liquid crystal display device will be described with reference to FIG.

First, the gate electrode 2 is patterned on the insulating transparent substrate 1 (FIG. 5A). Next, the gate insulating film 3, the silicon semiconductor layer 4, and the channel protective film 5 are formed, and the channel protective film 5 on the gate electrode 2 is patterned. Next, an n ⁺ silicon film (not shown) containing impurities such as phosphorus is formed, and the n ⁺ silicon film and the silicon semiconductor layer 4 are patterned (FIG. 5B).

Next, after forming an ITO transparent conductive film as a pixel electrode 6 and patterning it, source / drain electrodes 7 are formed.
Is patterned. Next, SiN to be the insulating protective film 8
_{An X} film is formed and patterned to expose the pixel electrode 6,
A configuration is obtained in which the mounting electrode portions at the extended ends of the source electrode 7 and the gate electrode 2 are exposed (FIG. 5C). Finally, a black matrix 9 is formed as a light-shielding layer by patterning a black resist to complete the TFT substrate (FIG. 5).
(D)).

[0005]

In the above-mentioned conventional liquid crystal display device, ITO is used for the pixel electrode 6 and Al or Al compound is used for the gate electrode 2 and the source / drain electrodes 7, and as shown in FIG. The insulating protective film 8 is patterned to form the pixel electrode 6 and the mounting electrode portion at the extended end portion of the gate electrode 2 and the source electrode 7 (the mounting electrode portion at the extended end portion of the gate electrode 2 is not shown). After exposure, FIG. 5 (d)
The black matrix 9 is formed as shown in FIG.
The black matrix 9 is formed by patterning a black resist, but when a photosensitive colored resist such as a black resist is used and patterning is performed by a photo process, a developing solution becomes an electrolytic solution to cause a cell reaction between ITO and Al. However, there is a problem that the transparent ITO is reduced and the pixel electrode 6 is colored, and Al is corroded.

Further, in the case of a black resist having a negative type photosensitive group, it is difficult for light to enter the thick black resist in the pattern processing of the black matrix 9, and uniform photocrosslinking cannot be obtained in the film. There is a problem that the pattern shape of the black matrix 9 after development is not a desired shape. A first object of the present invention is to provide a liquid crystal display device capable of preventing a battery reaction between a pixel electrode and a conductor layer supplying a signal to a non-linear element when a light shielding layer such as a black matrix is formed, and a manufacturing method thereof. Is.

A second object of the present invention is to prevent a battery reaction between a pixel electrode and a conductor layer for supplying a signal to a non-linear element when a light-shielding layer such as a black matrix is formed, and also to prevent light-shielding layer such as a black matrix. It is to provide a method for manufacturing a liquid crystal display device capable of forming a desired shape.

[0008]

A liquid crystal display device according to claim 1, wherein one of the two substrates sandwiching a liquid crystal layer has a pixel electrode, a non-linear element and a signal for the non-linear element on an insulating substrate. Is formed, an insulating protective film is formed so as to cover a region other than the mounting portion of the pixel electrode and the conductive layer, and a light shielding layer is formed on the entire surface of the insulating protective film. . Therefore, the insulating protective film and the light shielding layer have substantially the same shape, and after forming the light shielding layer, the insulating protective film formed on the entire surface of the substrate is etched by using the light shielding layer as a mask to expose the mounting portions of the pixel electrode and the conductor layer. Since the insulating protective film covers the pixel electrode and the conductor layer when forming the pattern of the light shielding layer, it is possible to prevent a battery reaction between the pixel electrode and the conductor layer.

In a method of manufacturing a liquid crystal display device according to a second aspect, one of the two substrates sandwiching the liquid crystal layer is formed so that a pixel electrode, a non-linear element, and a signal to the non-linear element are provided on an insulating substrate. Forming an insulating protective film so as to cover the pixel electrode, the non-linear element and the conductive layer after forming the conductive layer for supplying the liquid, and the insulating protective film in the region excluding the mounting portion of the pixel electrode and the conductive layer. And a step of forming a light-shielding layer on the substrate and etching the insulating protective film using the light-shielding layer as a mask to expose the mounting portions of the pixel electrode and the conductor layer. Thus, after forming the light shielding layer on the insulating protective film covering the pixel electrode, the non-linear element and the conductor layer, the insulating protective film is etched by using the light shielding layer as a mask to expose the mounting portion of the pixel electrode and the conductor layer. By doing so, since the insulating protective film covers the pixel electrode and the conductor layer at the time of forming the pattern of the light shielding layer, it is possible to prevent a battery reaction between the pixel electrode and the conductor layer.

In the method of manufacturing a liquid crystal display device according to a third aspect of the present invention, the method of forming one of the two substrates sandwiching the liquid crystal layer is such that the pixel electrode, the non-linear element and the non-linear element are signaled on the insulating substrate. Forming an insulating protective film so as to cover the pixel electrode, the non-linear element and the conductive layer after forming the conductive layer for supplying the liquid, and the insulating protective film in the region excluding the mounting portion of the pixel electrode and the conductive layer. A step of forming a transparent resist on the substrate, a step of coloring the transparent resist to form a light-shielding layer, and a step of etching the insulating protective film using the light-shielding layer as a mask to expose the mounting portion of the pixel electrode and the conductor layer. It is characterized by including. As described above, after the transparent resist is colored on the insulating protective film covering the pixel electrode, the non-linear element and the conductor layer to form the light shielding layer, the insulating protective film is etched by using the light shielding layer as a mask to etch the pixel electrode and the conductive layer. By exposing the mounting part of the body layer, the insulating protective film covers the pixel electrode and the conductor layer during pattern formation of the transparent resist that serves as the light-shielding layer, preventing the battery reaction between the pixel electrode and the conductor layer. it can. Further, the light-shielding layer is a transparent resist at the time of pattern formation,
Light can easily enter even a thick-film resist, and a desired pattern shape can be obtained.

According to a fourth aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device, wherein one of the two substrates sandwiching a liquid crystal layer is formed so that a pixel electrode, a non-linear element and a signal to the non-linear element are formed on an insulating substrate. Forming an insulating protective film so as to cover the pixel electrode, the non-linear element and the conductive layer after forming the conductive layer for supplying the liquid, and the insulating protective film in the region excluding the mounting portion of the pixel electrode and the conductive layer. To form a transparent resist, a step of etching the insulating protective film by using the transparent resist as a mask to expose the mounting portion of the pixel electrode and the conductor layer, and a step of coloring the transparent resist to form a light-shielding layer It is characterized by including and. In this way, after forming a transparent resist that is colored and becomes a light-shielding layer on the insulating protective film that covers the pixel electrode, the non-linear element and the conductor layer, the transparent protective film is used as a mask to etch the insulating protective film to form the pixel electrode. By exposing the mounting portion of the conductor layer and the conductor layer, the insulating protective film covers the pixel electrode and the conductor layer during pattern formation of the transparent resist that becomes the light-shielding layer, so that the battery reaction between the pixel electrode and the conductor layer occurs. Can be prevented. Further, since the light-shielding layer is a transparent resist at the time of pattern formation, light can easily enter even a thick-film resist and a desired pattern shape can be obtained.

According to a fifth aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device, wherein one of the two substrates sandwiching a liquid crystal layer is formed so that a pixel electrode, a non-linear element and a signal to the non-linear element are provided on an insulating substrate. Forming an insulating protective film so as to cover the pixel electrode, the non-linear element and the conductive layer after forming the conductive layer for supplying the liquid, and the insulating protective film in the region excluding the mounting portion of the pixel electrode and the conductive layer. A step of forming a transparent conductive film on the transparent conductive film, a step of coagulating and depositing an electrodeposition coating on the transparent conductive film to form a light shielding layer, and a step of etching the insulating protective film using the light shielding layer as a mask to mount the pixel electrode and the conductor layer. And exposing it. As described above, after the transparent conductive film is formed as a light shielding layer on the insulating protective film covering the pixel electrode, the non-linear element and the conductor layer by the electrodeposition method, the insulating protective film is etched by using the light shielding layer as a mask to etch the pixel electrode and the conductive layer. By exposing the mounting part of the body layer,
Since the insulating protective film covers the pixel electrode and the conductor layer at the time of forming the pattern of the transparent conductive film serving as the light-shielding layer, the battery reaction between the pixel electrode and the conductor layer can be prevented. Further, since the transparent conductive film is used, a thin light-shielding layer can be obtained.

According to a sixth aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device, wherein one of the two substrates sandwiching a liquid crystal layer is formed so that a pixel electrode, a non-linear element and a signal to the non-linear element are formed on an insulating substrate. Forming an insulating protective film so as to cover the pixel electrode, the non-linear element and the conductive layer after forming the conductive layer for supplying the liquid, and the insulating protective film in the region excluding the mounting portion of the pixel electrode and the conductive layer. A step of forming a transparent conductive film on the transparent conductive film, a step of etching the insulating protective film using the transparent conductive film as a mask to expose the mounting portion of the pixel electrode and the conductive layer, and solidifying and depositing an electrodeposition coating on the transparent conductive film. And a step of forming a light shielding layer. In this way, the transparent conductive film is patterned on the insulating protective film covering the pixel electrode, the non-linear element and the conductor layer, and the insulating protective film is etched by using the transparent conductive film as a mask to mount the pixel electrode and the conductive layer. After exposing the portion, the transparent conductive film is formed into a light-shielding layer by an electrodeposition method, so that the insulating protective film covers the pixel electrode and the conductor layer during pattern formation of the transparent conductive film to be the light-shielding layer. The battery reaction between the electrode and the conductor layer can be prevented. Further, since the transparent conductive film is used, a thin light-shielding layer can be obtained.

[0014]

Embodiments of the present invention will be described below with reference to the drawings. [First Embodiment] First, a first embodiment of the present invention will be described with reference to FIG. FIG. 1 shows a TFT in a liquid crystal display device according to a first embodiment of the present invention.
FIG. 6 is a cross-sectional view in order of the steps, showing a method for manufacturing a substrate.

Similar to the conventional example, on the insulating transparent substrate 1, the gate electrode 2, the gate insulating film 3, the silicon semiconductor layer 4, the channel protective film 5, the n ⁺ silicon film (not shown), the pixel electrode 6 and the source are formed. After the drain electrode 7 is sequentially formed to complete the pixel electrode 6 and the TFT of the non-linear element, an insulating protective film 8 such as a SiN _x film is formed on the entire surface of the substrate (FIG. 1A).

Next, pattern formation is performed using a negative type black resist having photosensitivity to form a black matrix (light-shielding layer) 9 (FIG. 1B). Next, using the black matrix 9 as a mask, the insulating protective film 8 on the pixel electrodes 6 and on the mounting electrode portions of the extended ends of the source electrodes 7 and the gate electrodes 2 is removed by dry etching with SF type gas,
Each electrode is exposed (FIG. 1 (c)). In this way, the black matrix 9 is formed on the entire surface of the insulating protective film 8, and the TFT substrate in which the insulating protective film 8 and the black matrix 9 have substantially the same shape is completed.

According to the first embodiment, since the insulating protective film 8 under the black matrix 9 covers the entire surface of the substrate when the pattern of the black matrix 9 is formed, the developing solution of the black matrix 9 is applied to the pixel electrode 6 and the source. The electrode 7 and the gate electrode 2 do not come into contact with each other, and the battery reaction between the ITO of the pixel electrode 6 and the source electrode 7 and the Al of the gate electrode 2 does not occur. Therefore, blackening of the pixel electrode 6 due to reduction of the transparent ITO and corrosion of Al of the source electrode 7 and the gate electrode 2 can be prevented. In addition, the black matrix 9 is replaced with the insulating protective film 8
By using this etching mask, the number of steps can be reduced.

Although the organic resist film is used for the black matrix 9 in the first embodiment, an inorganic film having a high light shielding property may be used. Even in this case,
Since the insulating protective film 8 covers the entire surface of the substrate when the black matrix 9 is formed, the ITO of the pixel electrode 6 and the Al of the wiring material of the gate electrode 2 and the source electrode 7 are exposed in the etchant for the inorganic film. Can be prevented.

[Second Embodiment] Next, a second embodiment of the present invention will be described with reference to FIG. 2A to 2D are sectional views in order of the steps, showing a method for manufacturing a TFT substrate in a liquid crystal display device according to a second embodiment of the present invention. Similar to the first embodiment, the pixel electrode 6 and the TF
After completing T, an insulating protective film 8 is formed on the entire surface of the substrate.
After that, pattern formation is performed using a negative and transparent colorless and transparent resist 9a such as casein or gelatin as a material of the black matrix (light-shielding layer) 9A (FIG. 2A).

Next, the colorless and transparent resist 9a is colored black by a dyeing method to form a black matrix 9A (FIG. 2 (b)). At this time, as long as it becomes black, either single-color dyeing or multi-color dyeing may be used. Next, using the black matrix 9A as a mask, the insulating protective film 8 on the pixel electrode 6 and on the mounting electrode portion at the extended end of the source electrode 7 and the gate electrode 2 is
As in the first embodiment, the insulating protection film 8 and the black matrix 9 are removed by etching and exposing each electrode.
A TFT substrate having substantially the same shape as A is completed (FIG. 2 (c)).

Also in the second embodiment, the colorless and transparent resist 9 which becomes the black matrix 9A by being colored.
When the pattern a is formed, the insulating protection film 8 thereunder covers the entire surface of the substrate, so that the same effect as that of the first embodiment can be obtained, and the black matrix 9A serves as an etching mask for the insulating protection film 8. The same applies to the reduction of the process.

Further, since the colorless and transparent resist 9a is used, light can easily enter even the thick resist 9a, and the black matrix 9A having a desired pattern can be obtained. [Third Embodiment] Next, a third embodiment of the present invention will be described with reference to FIG. FIG. 3 shows the TF in the liquid crystal display device according to the third embodiment of the present invention.
FIG. 6 is a cross-sectional view in order of the steps, showing a method for manufacturing a T substrate.

Similar to the second embodiment, after the pixel electrode 6 and the TFT are completed, an insulating protective film 8 is formed on the entire surface of the substrate, and then a negative material such as casein or gelatin is used as a material for the black matrix 9A. Pattern formation is performed using a colorless and transparent resist 9a having mold sensitivity (FIG. 3A). Next, using the colorless and transparent resist 9a as a mask, the insulating protective film 8 on the pixel electrode 6 and the mounting electrode portion at the extended end portion of the source electrode 7 and the gate electrode 2 is removed by etching to expose each electrode (FIG. 3 (b)). At this time, the insulating protective film 8 and the colorless and transparent resist 9a have substantially the same shape.

After that, a colorless and transparent resist 9a is formed on the second resist.
Similar to the above embodiment, the black matrix 9A is formed by coloring in black by the dyeing method to complete the TFT substrate (FIG. 3C). According to the third embodiment,
The same effect as the second embodiment can be obtained. [Fourth Embodiment] Next, a fourth embodiment of the present invention will be described with reference to FIG. FIG. 4 shows the TF in the liquid crystal display device according to the fourth embodiment of the present invention.
FIG. 6 is a cross-sectional view in order of the steps, showing a method for manufacturing a T substrate.

Similar to the first embodiment, after the pixel electrode 6 and the TFT are completed, the insulating protective film 8 is formed on the entire surface of the substrate. Then, as a material for the black matrix (light-shielding layer) 9B, first, a transparent conductive film 9b made of ITO is patterned in a matrix (FIG. 4A). Next, an electrodeposition coating material having a predetermined spectral characteristic is coagulated and deposited on the transparent conductive film 9b to form a colored black matrix 9B (FIG. 4B). Specifically, by immersing the TFT array in an electrodeposition tank containing an electrodeposition coating material having a black pigment and a polymer resin and applying an anode to the transparent conductive film 9b, black resin particles are formed on the transparent conductive film 9b. Is deposited to provide an antireflection film. After that, the deposited antireflection film is thermally crosslinked by drying, baked and made non-conductive to form the black matrix 9B.

Next, using the black matrix 9B as a mask, the pixel electrode 6 and the source electrode 7 and the gate electrode 2 are formed.
The insulating protection film 8 on the mounting electrode portion at the extended end of is removed by etching as in the first embodiment to expose each electrode, so that the insulating protection film 8 and the black matrix 9B have substantially the same shape. The completed TFT substrate is completed (Fig. 4
(C)).

According to the fourth embodiment, when the transparent conductive film 9b to be the black matrix 9B is patterned, the insulating protection film 8 thereunder covers the entire surface of the substrate, so that the first embodiment is described. The same effect can be obtained, and the number of steps can be reduced by using the black matrix 9B as an etching mask for the insulating protective film 8. Further, since the transparent conductive film 9b is used, the thin black matrix 9B can be obtained. The transparent conductive film 9b is not limited to ITO and may be an organic conductive film.

In the fourth embodiment, after the transparent conductive film 9b is colored, the insulating protective film 8 is etched to expose each electrode, but the transparent conductive film 9b which is not colored is used as a mask for insulation. Even if the transparent conductive film 9b is colored after the protective film 8 is etched to expose each electrode, the same effect can be obtained. In this case, it is sufficient to take measures to prevent the source and the gate from being short-circuited.

In the above embodiment, the black matrix 9, 9A, 9B is clearly shown as the light shielding layer pattern, but the pattern is not limited to this and may be a black stripe.
In addition, in the above-described embodiment, ITO is used for the pixel electrode 6,
Although the battery reaction using Al or an Al compound as the wiring metal material of the source electrode 7 and the gate electrode 2 is described, the battery reaction between the pixel electrode material and the wiring metal material is IT.
It is not limited to O and Al. Therefore, needless to say, it can occur between other metals, and the battery reaction suppressing effect of the present invention is effective.

Further, in the above embodiment, the case where the TFT is used as the non-linear element has been described in detail, but the present invention is also effective for the liquid crystal display device using the non-linear element such as MIM or diode.

[0031]

According to the liquid crystal display device of the present invention, the light-shielding layer is formed on the entire surface of the insulating protection film of one of the two substrates sandwiching the liquid crystal layer. Has a substantially same shape, and after the light-shielding layer is formed, the insulating protection film formed on the entire surface of the substrate can be etched using the light-shielding layer as a mask to expose the mounting portion of the pixel electrode and the conductor layer. Since the insulating protective film covers the pixel electrode and the conductor layer during formation, it is possible to prevent a battery reaction between the pixel electrode and the conductor layer.

According to a second aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device, wherein one of two substrates sandwiching a liquid crystal layer is formed on an insulating protective film covering a pixel electrode, a non-linear element and a conductor layer. After the light-shielding layer is formed, the insulating protection film is etched using the light-shielding layer as a mask to expose the mounting portion of the pixel electrode and the conductor layer. Since it covers, the battery reaction between the pixel electrode and the conductor layer can be prevented.

According to a third aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device, wherein one of the two substrates sandwiching the liquid crystal layer is formed on the insulating protective film covering the pixel electrode, the non-linear element and the conductor layer. After the transparent resist is colored to form the light-shielding layer, the insulating protective film is etched using the light-shielding layer as a mask to expose the mounting portion of the pixel electrode and the conductor layer, thereby forming a transparent resist pattern that becomes the light-shielding layer. Since the insulating protective film covers the pixel electrode and the conductor layer during formation, it is possible to prevent a battery reaction between the pixel electrode and the conductor layer. Further, since the light-shielding layer is a transparent resist at the time of pattern formation, light can easily enter even a thick-film resist,
A desired pattern shape can be obtained.

According to a fourth aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device, the method of forming one of two substrates sandwiching a liquid crystal layer is performed on an insulating protective film covering a pixel electrode, a non-linear element and a conductor layer. After forming a transparent resist that becomes a light-shielding layer by coloring, the transparent protective film becomes a light-shielding layer by etching the insulating protective film using the transparent resist as a mask to expose the mounting portion of the pixel electrode and the conductor layer. Since the insulating protective film covers the pixel electrode and the conductor layer during the pattern formation, the battery reaction between the pixel electrode and the conductor layer can be prevented. Further, the light shielding layer is
Since it is a transparent resist, light can easily enter even with a thick film resist, and a desired pattern shape can be obtained.

According to a fifth aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device, wherein one of the two substrates sandwiching a liquid crystal layer is formed on an insulating protective film covering a pixel electrode, a non-linear element and a conductor layer. After the transparent conductive film is formed into a light-shielding layer by an electrodeposition method, the insulating protective film is etched using the light-shielding layer as a mask to expose the mounting portions of the pixel electrode and the conductor layer, thereby forming a pattern of the transparent conductive film to be the light-shielding layer. Since the insulating protective film covers the pixel electrode and the conductor layer during formation,
A battery reaction between the pixel electrode and the conductor layer can be prevented. Also,
Since the transparent conductive film is used, a thin light shielding layer can be obtained.

According to a sixth aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device, the method of forming one of two substrates sandwiching a liquid crystal layer is performed on an insulating protective film covering a pixel electrode, a non-linear element and a conductor layer. The transparent conductive film is formed into a pattern, the insulating protective film is etched using the transparent conductive film as a mask to expose the mounting portions of the pixel electrode and the conductor layer, and then the light shielding layer is formed by the electrodeposition method. Since the insulating protective film covers the pixel electrode and the conductor layer at the time of pattern formation of the transparent conductive film to be formed, the battery reaction between the pixel electrode and the conductor layer can be prevented. Moreover, since the transparent conductive film is used, a thin light-shielding layer can be obtained.

Further, it is possible to reduce the number of steps by using the light-shielding layer or the transparent resist or transparent conductive film to be the light-shielding layer as an etching mask for the insulating protective film. And
Since the black matrix is formed with the insulating protective film covering the entire surface of the substrate, the TFT array is protected from the contamination environment in the black matrix forming step. Therefore, Al due to the battery reaction during the processing of the black resist
Blackening due to corrosion / ITO reduction can be prevented. Further, the shape controllability of the black matrix pattern can be improved by forming the black matrix pattern in advance with a colorless and transparent resist and then coloring it.

Further, the electrodeposition black matrix is replaced with a TFT.
A thin film black matrix can be obtained by directly forming on the array.

[Brief description of drawings]

FIG. 1 is a cross-sectional view in order of the steps, showing a method for manufacturing a TFT substrate in a liquid crystal display device according to a first embodiment of the present invention.

2A to 2C are cross-sectional views in order of the steps, showing a method for manufacturing a TFT substrate in a liquid crystal display device according to a second embodiment of the present invention.

3A to 3C are cross-sectional views in order of the steps, showing a method for manufacturing a TFT substrate in a liquid crystal display device according to a third embodiment of the present invention.

4A to 4C are cross-sectional views in order of the steps, showing a method for manufacturing a TFT substrate in a liquid crystal display device according to a fourth embodiment of the present invention.

FIG. 5 is a cross-sectional view in order of the steps, showing a method for manufacturing a TFT substrate in a conventional liquid crystal display device.

[Explanation of symbols]

 1 Insulating Transparent Substrate 2 Gate Electrode 6 Pixel Electrode 7 Source / Drain Electrode 8 Insulation Protective Film 9, 9A, 9B Black Matrix 9a Colorless Transparent Resist 9b Transparent Conductive Film

Claims (6)

[Claims] 1. A liquid crystal display device in which a liquid crystal layer is sandwiched between two substrates, wherein one of the two substrates is a pixel electrode, a non-linear element, and a signal to the non-linear element on an insulating substrate. A conductive layer to be supplied is formed, an insulating protective film is formed so as to cover a region other than a mounting portion of the pixel electrode and the conductive layer, and a light shielding layer is formed on the entire surface of the insulating protective film. Liquid crystal display device. 2. A method of manufacturing a liquid crystal display device in which a liquid crystal layer is sandwiched between two substrates, wherein one of the two substrates is formed by a pixel electrode, a non-linear element, and A step of forming an insulating protective film so as to cover the pixel electrode, the non-linear element and the conductor layer after forming a conductor layer for supplying a signal to the non-linear element; and a step of forming the pixel electrode and the conductor layer. A step of forming a light-shielding layer on the insulating protective film in a region excluding a mounting portion, and a step of exposing the mounting portion of the pixel electrode and the conductor layer by etching the insulating protective film using the light-shielding layer as a mask A method for manufacturing a liquid crystal display device, comprising: 3. A method of manufacturing a liquid crystal display device in which a liquid crystal layer is sandwiched between two substrates, wherein one of the two substrates is formed by a pixel electrode, a non-linear element and a non-linear element on an insulating substrate. A step of forming an insulating protective film so as to cover the pixel electrode, the non-linear element and the conductor layer after forming a conductor layer for supplying a signal to the non-linear element; and a step of forming the pixel electrode and the conductor layer. A step of forming a transparent resist on the insulating protective film in a region excluding the mounting portion, a step of coloring the transparent resist to form a light shielding layer, and etching the insulating protective film using the light shielding layer as a mask And a step of exposing a mounting portion of the pixel electrode and the conductive layer, the method of manufacturing a liquid crystal display device. 4. A method of manufacturing a liquid crystal display device in which a liquid crystal layer is sandwiched between two substrates, wherein one of the two substrates is formed by a pixel electrode, a non-linear element, and a non-linear element on an insulating substrate. A step of forming an insulating protective film so as to cover the pixel electrode, the non-linear element and the conductor layer after forming a conductor layer for supplying a signal to the non-linear element; and a step of forming the pixel electrode and the conductor layer. Forming a transparent resist on the insulating protective film in a region other than the mounting portion, and etching the insulating protective film using the transparent resist as a mask to expose the mounting portion of the pixel electrode and the conductor layer A method for manufacturing a liquid crystal display device, comprising: a step; and a step of coloring the transparent resist to form a light shielding layer. 5. A method of manufacturing a liquid crystal display device in which a liquid crystal layer is sandwiched between two substrates, wherein one of the two substrates is formed by a pixel electrode, a non-linear element, and A step of forming an insulating protective film so as to cover the pixel electrode, the non-linear element and the conductor layer after forming a conductor layer for supplying a signal to the non-linear element; and a step of forming the pixel electrode and the conductor layer. A step of forming a transparent conductive film on the insulating protective film in a region excluding a mounting portion; a step of coagulating and depositing an electrodeposition paint on the transparent conductive film to form a light shielding layer; and the insulating protection using the light shielding layer as a mask. Etching the film to expose the mounting portion of the pixel electrode and the conductive layer, the method for manufacturing a liquid crystal display device. 6. A method of manufacturing a liquid crystal display device in which a liquid crystal layer is sandwiched between two substrates, wherein one of the two substrates is formed by forming a pixel electrode, a non-linear element, and a non-linear element on an insulating substrate. A step of forming an insulating protective film so as to cover the pixel electrode, the non-linear element and the conductor layer after forming a conductor layer for supplying a signal to the non-linear element; and a step of forming the pixel electrode and the conductor layer. A step of forming a transparent conductive film on the insulating protective film in a region excluding the mounting portion, and etching the insulating protective film using the transparent conductive film as a mask to expose the mounting portion of the pixel electrode and the conductor layer A method of manufacturing a liquid crystal display device, comprising: a step; and a step of solidifying and depositing an electrodeposition coating material on the transparent conductive film to form a light shielding layer.