JPH09505853A - フッ素セル - Google Patents
フッ素セルInfo
- Publication number
- JPH09505853A JPH09505853A JP8509988A JP50998896A JPH09505853A JP H09505853 A JPH09505853 A JP H09505853A JP 8509988 A JP8509988 A JP 8509988A JP 50998896 A JP50998896 A JP 50998896A JP H09505853 A JPH09505853 A JP H09505853A
- Authority
- JP
- Japan
- Prior art keywords
- anode
- cell
- fluorine
- chamber
- electrolyte
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
- C25B9/17—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/24—Halogens or compounds thereof
- C25B1/245—Fluorine; Compounds thereof
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/042—Electrodes formed of a single material
- C25B11/043—Carbon, e.g. diamond or graphene
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B15/00—Operating or servicing cells
- C25B15/02—Process control or regulation
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
- C25B9/60—Constructional parts of cells
- C25B9/63—Holders for electrodes; Positioning of the electrodes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Automation & Control Theory (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Hybrid Cells (AREA)
- Battery Mounting, Suspending (AREA)
- Glass Compositions (AREA)
- Battery Electrode And Active Subsutance (AREA)
- Apparatus Associated With Microorganisms And Enzymes (AREA)
- Lubricants (AREA)
- Fuel Cell (AREA)
- Primary Cells (AREA)
- Developing Agents For Electrophotography (AREA)
- Coating By Spraying Or Casting (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Insulated Conductors (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1. フッ素を生産するためのフッ素セルにおいて、 陰極室と陽極室とを有するセル容器と、その内部に陽極を有する前記陽極室と 、前記フッ素セルの操業中に発生するフッ素ガスと水素ガスを分離するために前 記陰極室と前記陽極室の間にある分離手段であって前記陰極室と前記陽極室間の 電解質の流通を許容する該分離手段を有する前記陰極室と前記陽極室と、前記分 離手段の下端の下方に延びて前記電解質と継続的に接触する前記陽極と、前記陽 極室又は前記陰極室の少なくとも一つに配置されてその配置された少なくとも一 つの前記陽極室又は前記陰極室内の電解質のレベルを検出する制御センサ手段と 、前記制御センサ手段からの信号に応じて電流の供給を開始または停止するため に該信号に応じる電流供給手段とを含む前記フッ素セル。 2. 前記分離手段が、前記セル内で前記電解質の液面の下方に延びるスカー ト部材であり、前記電解質の液面の上方に存する分離された二つの室、すなわち 、フッ素を受容する陽極室と水素を受容する陰極室とを形成する該スカート部材 である請求項1に記載のセル。 3. 前記電解質液面の上方の二つの室は密閉され、それらと連通してフッ素 又は水素のいずれか望むものをガス抜き又は抽出させる手段を有する請求項2に 記載のセル。 4. 前記電解質を溶融するために加熱できる加熱手段をさらに含む請求項1 ないし3のいずれか一つに記載のセル。 5. 前記制御センサ手段が、電解を調整する装置を制御する少なくとも一つ のセンサを含む請求項1ないし4のいずれか一つに記載のセル。 6. 前記制御センサ手段が、前記陽極室内に延びて前記電解質の液面レベル に応じて信号を生じるプローブを含む請求項1ないし5のいずれか一つに記載の セル。 7. 前記プローブが、前記電解質のレベルを検知するための電気的導通プロ ーブ、電気的接触プローブ、キャパシタンストランスデューサーおよびオプティ カルトランスデューサー(光学的変換器)を含む一群から選択される請求項6に 記載のセル。 8. 前記陽極室および前記陰極室内におけるセンサの設定位置と前記電解質 の高さの差との関係に基づいて、実質的に所定圧でフッ素を生産するように配置 された請求項1ないし7のいずれか一つに記載のセル。 9. 前記陽極室内における前記電解質の最大液面レベルを検出するために第 二センサ手段を設ける請求項1ないし8のいずれか一つに記載のセル。 10. 前記センサ手段が、前記電解質の液面レベルを検出するために前記陽極 室又は前記陰極室のいずれかに配置される請求項1に記載のセル。 11. 陽極が炭素陽極部を含み、該陽極部が固定手段によって前記陽極部に取 り付けられる金属ハンガー部と、少なくとも前記陽極部と前記ハンガー部の間の 接続領域に被覆される金属被膜とを有する、フッ素セルに用いられる陽極。 12. 前記ハンガー部を、ボルト又はネジのような機械的手段によって前記陽 極部に取り付ける請求項11に記載の陽極。 13. 前記ハンガー部と前記陽極部の接続領域を、実質的に前記ハンガー部と 同一の金属で被覆する請求項11又は12に記載の陽極。 14. 前記ハンガー部を、ニッケル又はニッケル基合金によって形成する請求 項11ないし13のいずれか一つに記載の陽極。 15. 前記陽極部と前記ハンガー部の接続領域に施す前記被膜を、火炎溶射又 はプラズマ溶射のような物理的な蒸着技術によって施す請求項11ないし14の いずれか一つに記載の陽極。 16. 金属被膜を施す前記炭素陽極部の領域にさらに別の処理を施す請求項1 1ないし15のいずれか一つに記載の陽極。 17. 請求項11ないし16のいずれか一つに記載の陽極を有する請求項1な いし10のいずれか一つに記載のフッ素を生産するためのフッ素セル。 18. 可撓性ハンガー手段が接続される陽極部と、前記陽極と前記陽極室の壁 間の移動を許容するように前記陽極室の壁に接続される前記可撓性ハンガー手段 と、前記陽極と前記壁間に介在される電気的に絶縁性の案内部材とを含む、フッ 素セルの陽極室内での陽極取付け構造。 19. 前記可撓性ハンガー手段を、前記陽極室の壁に貫通孔を設けずに、前記 陽極室の内面に接続する請求項18に記載の陽極取付け構造。 20. 前記接続法が溶接である請求項19に記載の陽極取付け構造。 21. 前記の電気的に絶縁性の案内部材が、フッ素系プラスチック材料を含む 請求項18ないし20のいずれか一つに記載の陽極取付け構造。 22. 前記案内部材を、前記陽極室の壁の片側又は両側に取り付ける請求項1 8ないし21のいずれか一つに記載の陽極取付け構造。 23. 請求項18ないし22のいずれか一つに記載の陽極取付け構造を有する 請求項1ないし10および請求項17のいずれか一つに記載のフッ素セル。 24. 添付の明細書および図面において実質的に記載されたフッ素セル。 25. 添付の明細書および図面において実質的に記載されたフッ素セルに用い る陽極。 26. 添付の明細書および図面において実質的に記載されたフッ素セルに用い る陽極取付け構造。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9418598.0 | 1994-09-14 | ||
GB9418598A GB9418598D0 (en) | 1994-09-14 | 1994-09-14 | Fluorine cell |
PCT/GB1995/002145 WO1996008589A2 (en) | 1994-09-14 | 1995-09-11 | Fluorine cell |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH09505853A true JPH09505853A (ja) | 1997-06-10 |
JP3769017B2 JP3769017B2 (ja) | 2006-04-19 |
Family
ID=10761369
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50998896A Expired - Lifetime JP3769017B2 (ja) | 1994-09-14 | 1995-09-11 | フッ素セル |
Country Status (11)
Country | Link |
---|---|
US (1) | US5688384A (ja) |
EP (3) | EP0965661B1 (ja) |
JP (1) | JP3769017B2 (ja) |
KR (1) | KR100390139B1 (ja) |
CN (1) | CN1137808A (ja) |
AT (3) | ATE231932T1 (ja) |
CA (3) | CA2221161A1 (ja) |
DE (3) | DE69523560T2 (ja) |
GB (1) | GB9418598D0 (ja) |
WO (1) | WO1996008589A2 (ja) |
ZA (1) | ZA957669B (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004043885A (ja) * | 2002-07-11 | 2004-02-12 | L'air Liquide Sa Pour L'etude & L'exploitation Des Procedes Georges Claude | フッ素ガス生成装置 |
EP1457587A1 (en) | 2002-11-08 | 2004-09-15 | Toyo Tanso Co., Ltd. | Fluorine gas generator and method of electrolytic bath liquid level control |
WO2007023615A1 (ja) | 2005-08-25 | 2007-03-01 | Toyo Tanso Co., Ltd. | フッ素系ガス発生装置 |
WO2007083740A1 (ja) * | 2006-01-20 | 2007-07-26 | Toyo Tanso Co., Ltd. | フッ素又は三フッ化窒素を製造するための電解装置 |
US7316765B2 (en) | 2003-07-14 | 2008-01-08 | Toyo Tanso Co., Ltd. | Apparatus and method for molten salt electrolytic bath control |
JP2013010989A (ja) * | 2011-06-29 | 2013-01-17 | Toyo Tanso Kk | 電解装置 |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6210549B1 (en) * | 1998-11-13 | 2001-04-03 | Larry A. Tharp | Fluorine gas generation system |
WO2000051938A1 (en) * | 1999-03-04 | 2000-09-08 | Surface Technology Systems Limited | Chlorotrifluorine gas generator system |
KR100746384B1 (ko) * | 1999-03-04 | 2007-08-03 | 서페이스 테크놀로지 시스템스 피엘씨 | 기체발생장치 |
FR2795817B1 (fr) * | 1999-07-02 | 2001-08-10 | Inst Francais Du Petrole | Sonde capacitive de mesure du niveau d'un liquide conducteur de l'electricite dans un recipient et procede de fabrication d'une telle sonde |
US6500356B2 (en) * | 2000-03-27 | 2002-12-31 | Applied Materials, Inc. | Selectively etching silicon using fluorine without plasma |
US20030010354A1 (en) * | 2000-03-27 | 2003-01-16 | Applied Materials, Inc. | Fluorine process for cleaning semiconductor process chamber |
WO2001077412A1 (fr) * | 2000-04-07 | 2001-10-18 | Toyo Tanso Co., Ltd. | Appareil pour la production de fluor gazeux |
US6843258B2 (en) * | 2000-12-19 | 2005-01-18 | Applied Materials, Inc. | On-site cleaning gas generation for process chamber cleaning |
US20030098038A1 (en) * | 2001-11-26 | 2003-05-29 | Siegele Stephen H. | System and method for on-site generation and distribution of fluorine for fabrication processes |
US20030121796A1 (en) * | 2001-11-26 | 2003-07-03 | Siegele Stephen H | Generation and distribution of molecular fluorine within a fabrication facility |
US20040037768A1 (en) * | 2001-11-26 | 2004-02-26 | Robert Jackson | Method and system for on-site generation and distribution of a process gas |
JP3725822B2 (ja) * | 2001-12-27 | 2005-12-14 | レール・リキード−ソシエテ・アノニム・ア・ディレクトワール・エ・コンセイユ・ドゥ・スールベイランス・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード | フッ素ガス生成及び供給装置 |
KR100519843B1 (ko) | 2002-05-29 | 2005-10-06 | 도요탄소 가부시키가이샤 | 불소가스 발생장치 |
GB0215697D0 (en) * | 2002-07-06 | 2002-08-14 | Boc Group Plc | Fluorine cell |
KR101089623B1 (ko) * | 2002-10-04 | 2011-12-06 | 더 리전츠 오브 더 유니버시티 오브 캘리포니아 | 불소 분리 및 발생 장치 |
JP3527735B1 (ja) | 2002-11-20 | 2004-05-17 | 東洋炭素株式会社 | フッ素ガス発生装置 |
EP1880043A4 (en) * | 2005-04-15 | 2009-06-03 | Innovative Hydrogen Solutions | ELECTROLYTIC CELL FOR INTERNAL COMBUSTION ENGINE |
US20070074743A1 (en) * | 2005-10-04 | 2007-04-05 | Mcfarlane Graham | H2 conditioning of chamber following cleaning cycle |
JP5567375B2 (ja) * | 2010-04-14 | 2014-08-06 | 東洋炭素株式会社 | 気体発生装置および気体発生方法 |
CN101949025A (zh) * | 2010-10-18 | 2011-01-19 | 天津市泰旭物流有限公司 | 一种采用电解合成法生产六氟化硫的技术 |
CN101949024A (zh) * | 2010-10-18 | 2011-01-19 | 天津市泰旭物流有限公司 | 电解氟化钾一氟化氢制备氟气的技术 |
TWI551730B (zh) * | 2010-11-17 | 2016-10-01 | 首威公司 | 電解器設備 |
CN102337491A (zh) * | 2011-10-28 | 2012-02-01 | 核工业理化工程研究院华核新技术开发公司 | 制氟用碳阳极的热喷涂处理方法 |
WO2013092773A1 (en) | 2011-12-22 | 2013-06-27 | Solvay Sa | Liquid level control in an electrolytic cell for the generation of fluorine |
WO2014037485A1 (en) * | 2012-09-10 | 2014-03-13 | Solvay Sa | A chamber cleaning method using f2 and a process for manufacture of f2 for this method |
CN106637284B (zh) * | 2016-12-28 | 2018-07-06 | 中核四0四有限公司 | 一种中温电解制氟用炭阳极板螺孔浸渍方法及装置 |
CN107201530A (zh) * | 2017-05-10 | 2017-09-26 | 东北大学 | 一种碱土金属氯化物溶液隔膜电解制备氢氧化物的方法 |
KR102258314B1 (ko) * | 2017-06-30 | 2021-06-01 | 쇼와 덴코 가부시키가이샤 | 불소 전해조 양극 설치부, 불소 전해조 및 불소 가스의 제조 방법 |
JP7428126B2 (ja) * | 2018-08-03 | 2024-02-06 | 株式会社レゾナック | 電解合成用陽極、及び、フッ素ガス又は含フッ素化合物の製造方法 |
WO2020085066A1 (ja) * | 2018-10-24 | 2020-04-30 | 昭和電工株式会社 | フッ素ガス製造装置 |
CN111005032A (zh) * | 2019-12-26 | 2020-04-14 | 福建德尔科技有限公司 | 一种便携式全自动高纯氟气生产装置系统 |
US20230332305A1 (en) * | 2020-09-08 | 2023-10-19 | Versum Materials Us, Llc | Electrode attachment assembly, cell and method of use |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3616436A (en) * | 1967-06-13 | 1971-10-26 | Georg Haas | Oxygen stream dispenser |
NL170314C (nl) * | 1970-06-01 | 1982-10-18 | Montedison Spa | Electrolysecel voor de bereiding van fluor. |
US4002552A (en) * | 1975-09-19 | 1977-01-11 | Trienco, Inc. | Liquid level control system |
FR2349667A1 (fr) * | 1976-04-26 | 1977-11-25 | Solvay | Cellule d'electrolyse a diaphragme |
GB2135334A (en) * | 1983-02-24 | 1984-08-30 | British Nuclear Fuels Plc | Composite carbon electrode |
US5037518A (en) * | 1989-09-08 | 1991-08-06 | Packard Instrument Company | Apparatus and method for generating hydrogen and oxygen by electrolytic dissociation of water |
DE69018761T2 (de) * | 1989-10-26 | 1995-12-07 | Mitsui Toatsu Chemicals | Methode zur Herstellung von Stickstofftrifluorid. |
JPH03232988A (ja) * | 1990-02-06 | 1991-10-16 | Toyo Tanso Kk | 炭素電極ならびにそれを用いるhf含有溶融塩の電解方法及び装置 |
US5154813A (en) * | 1991-06-10 | 1992-10-13 | Dill Raymond J | Protective coating of stub ends in anode assemblies |
CA2071235C (en) * | 1991-07-26 | 2004-10-19 | Gerald L. Bauer | Anodic electrode for electrochemical fluorine cell |
-
1994
- 1994-09-14 GB GB9418598A patent/GB9418598D0/en active Pending
-
1995
- 1995-09-11 CA CA002221161A patent/CA2221161A1/en not_active Abandoned
- 1995-09-11 EP EP99114648A patent/EP0965661B1/en not_active Expired - Lifetime
- 1995-09-11 AT AT98100057T patent/ATE231932T1/de not_active IP Right Cessation
- 1995-09-11 CA CA002238142A patent/CA2238142A1/en not_active Abandoned
- 1995-09-11 US US08/624,409 patent/US5688384A/en not_active Expired - Lifetime
- 1995-09-11 AT AT95931296T patent/ATE207980T1/de active
- 1995-09-11 DE DE69523560T patent/DE69523560T2/de not_active Expired - Lifetime
- 1995-09-11 EP EP95931296A patent/EP0728228B1/en not_active Expired - Lifetime
- 1995-09-11 CA CA002174520A patent/CA2174520C/en not_active Expired - Fee Related
- 1995-09-11 JP JP50998896A patent/JP3769017B2/ja not_active Expired - Lifetime
- 1995-09-11 KR KR1019960702456A patent/KR100390139B1/ko not_active IP Right Cessation
- 1995-09-11 AT AT99114648T patent/ATE220734T1/de not_active IP Right Cessation
- 1995-09-11 DE DE69529537T patent/DE69529537T2/de not_active Expired - Lifetime
- 1995-09-11 EP EP98100057A patent/EP0852267B1/en not_active Expired - Lifetime
- 1995-09-11 WO PCT/GB1995/002145 patent/WO1996008589A2/en active IP Right Grant
- 1995-09-11 DE DE69527446T patent/DE69527446T2/de not_active Expired - Lifetime
- 1995-09-11 CN CN95190885A patent/CN1137808A/zh active Pending
- 1995-09-13 ZA ZA957669A patent/ZA957669B/xx unknown
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004007802A3 (en) * | 2002-07-11 | 2004-07-15 | Air Liquide | Apparatus for the generation of fluorine gas |
JP2004043885A (ja) * | 2002-07-11 | 2004-02-12 | L'air Liquide Sa Pour L'etude & L'exploitation Des Procedes Georges Claude | フッ素ガス生成装置 |
KR101065906B1 (ko) * | 2002-07-11 | 2011-09-19 | 레르 리키드 쏘시에떼 아노님 뿌르 레드 에렉스뿔라따시옹 데 프로세데 조르즈 클로드 | 불소 가스 생성 장치 |
US7351322B2 (en) | 2002-11-08 | 2008-04-01 | Toyo Tanso Co., Ltd. | Fluorine gas generator and method of electrolytic bath liquid level control |
EP1457587A1 (en) | 2002-11-08 | 2004-09-15 | Toyo Tanso Co., Ltd. | Fluorine gas generator and method of electrolytic bath liquid level control |
US7316765B2 (en) | 2003-07-14 | 2008-01-08 | Toyo Tanso Co., Ltd. | Apparatus and method for molten salt electrolytic bath control |
WO2007023615A1 (ja) | 2005-08-25 | 2007-03-01 | Toyo Tanso Co., Ltd. | フッ素系ガス発生装置 |
US8366886B2 (en) | 2005-08-25 | 2013-02-05 | Toyo Tanso Co., Ltd. | Fluorogas generator |
WO2007083740A1 (ja) * | 2006-01-20 | 2007-07-26 | Toyo Tanso Co., Ltd. | フッ素又は三フッ化窒素を製造するための電解装置 |
US8142623B2 (en) | 2006-01-20 | 2012-03-27 | Toyo Tanso Co., Ltd. | Electrolytic apparatus for producing fluorine or nitrogen trifluoride |
US8419921B2 (en) | 2006-01-20 | 2013-04-16 | Toyo Tanso Co., Ltd. | Electrolytic apparatus for producing fluorine or nitrogen trifluoride |
US8419908B2 (en) | 2006-01-20 | 2013-04-16 | Toyo Tanso Co., Ltd. | Electrolytic apparatus for producing fluorine or nitrogen trifluoride |
JP2013010989A (ja) * | 2011-06-29 | 2013-01-17 | Toyo Tanso Kk | 電解装置 |
Also Published As
Publication number | Publication date |
---|---|
US5688384A (en) | 1997-11-18 |
ZA957669B (en) | 1996-04-15 |
EP0852267A2 (en) | 1998-07-08 |
DE69527446D1 (de) | 2002-08-22 |
WO1996008589A3 (en) | 1996-09-26 |
EP0728228B1 (en) | 2001-10-31 |
ATE231932T1 (de) | 2003-02-15 |
JP3769017B2 (ja) | 2006-04-19 |
DE69523560T2 (de) | 2002-07-18 |
EP0852267A3 (en) | 1998-09-30 |
DE69527446T2 (de) | 2003-01-23 |
EP0965661B1 (en) | 2002-07-17 |
EP0965661A2 (en) | 1999-12-22 |
CA2174520C (en) | 1999-07-06 |
EP0965661A3 (en) | 2000-01-19 |
EP0728228A1 (en) | 1996-08-28 |
WO1996008589A2 (en) | 1996-03-21 |
EP0852267B1 (en) | 2003-01-29 |
ATE207980T1 (de) | 2001-11-15 |
CA2174520A1 (en) | 1996-03-21 |
KR960705961A (ko) | 1996-11-08 |
DE69529537T2 (de) | 2003-11-06 |
CN1137808A (zh) | 1996-12-11 |
ATE220734T1 (de) | 2002-08-15 |
DE69523560D1 (en) | 2001-12-06 |
CA2221161A1 (en) | 1996-03-21 |
CA2238142A1 (en) | 1996-03-21 |
DE69529537D1 (de) | 2003-03-06 |
KR100390139B1 (ko) | 2003-11-17 |
GB9418598D0 (en) | 1994-11-02 |
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