JPH0943849A - Both side exposure device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To lighten the burden of a worker when a mask plate is fitted, checked or cleaned and to prevent the lower mask plate and the like from being soiled by dust when the upper mask plate is cleaned. SOLUTION: An upper outside frame 58 constituting an upper mask part 44 is formed to be U-shaped and the opposite side of the aperture part thereof is reinforced by a supporting bar 65. An upper holding frame 56 is arranged on the inside of the frame 58 and both left and right sides thereof are connected to the frame 58 through a slide rail 64. Since the rail 64 can be slid by three stages and extended, the frame 56 can be pulled out in front of an exposure part. Then, pivoting shaft supporting pieces 73 are respectively fitted to the inside walls of the front and the back parts of the frame 56. An upper mask frame 50 is arranged on the inside of the frame 56 and at the lower part thereof and the front edge and the back edge thereof are held by the pieces 73 so as to be freely pivoted around a pivoting shaft 75 as a center.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to the upper and lower surfaces of a plate to be exposed by irradiating light from both the upper and lower directions with the upper mask plate and the lower mask plate being in close contact with each other. The present invention relates to a double-sided exposure device that performs exposure.

Such a double-sided exposure apparatus is used, for example, in the case of printing and exposing an array pattern of through holes on both sides of a thin metal plate which is a raw material of a shadow mask for a color picture tube.

[0003]

2. Description of the Related Art Generally, in a double-sided exposure apparatus, an upper mask plate is attached by adsorbing it to the lower surface of an upper mask frame, and a lower mask plate is attached by adsorbing it to the upper surface of a lower mask frame. To attach these mask plates,
This is performed every time the mask plate is replaced so as to change the mask pattern.

FIG. 10 is a sectional view showing an example of a conventional double-sided exposure apparatus. As shown in FIG. 10, the upper mask frame 304
Is fixed to the arm 310. Arm 310 is axis 3
It is attached to the column 312 so as to be rotatable around 08. The column 312 is fixed to the fixed table 314.

In FIG. 10, the mask plate is attached in the following manner. First, the upper mask frame 304 is rotated upward, and the arm 310 is fixed so as to be tilted by about 45 degrees. Then, the worker 318 carries the upper mask plate 300 into the inside from the outside of the apparatus,
00 is brought into contact with the suction portion of the upper mask frame 304,
Then, a suction pump (not shown) is activated to attach the upper mask plate 300 to the upper mask frame 304 by suction. Similarly, the lower mask plate 302 is carried in, placed on the lower mask frame 306 and brought into contact with the suction portion of the lower mask frame 306, and then the suction pump (not shown) is activated to The mask plate 302 is attached to the lower mask frame 306 by suction.

Generally, in a double-sided exposure apparatus,
In order to improve the exposure accuracy, it is necessary to regularly check and clean the surface of the mask plate. FIG.
In, the check and cleaning of the mask plate are performed as follows. As with the case of attaching the mask plate, first,
The upper mask frame 304 is rotated upward and the arm 310 is fixed in a state of being inclined by about 45 degrees. And the worker 31
8 checks or cleans the lower surface of the upper mask plate 300 with the upper mask plate 300 still attached to the upper mask frame 304. Similarly, with the lower mask plate 302 still attached to the lower mask frame 306, the lower mask frame 306 is
Check or clean the top surface of.

[0007]

However, the conventional double-sided exposure apparatus has the following problems. When attaching the mask plate, or checking or cleaning the mask plate, as shown in FIG. 10, the worker 318 had to put his body inside the apparatus to perform the work, and the workability was poor. Moreover, since the inside of the apparatus is small, the work has to be done by one person, and the burden on the worker 318 is heavy. In particular, when mounting a large-sized upper mask plate, a heavy mask plate is carried from outside the apparatus to the inside by one person, and a large mask plate is moved in a narrow apparatus while being mounted on the lower surface of the upper mask frame 304. The work to do was extremely difficult.

When the lower surface of the upper mask plate 300 is cleaned while the arm 310 is tilted at about 45 degrees, dust attached to the upper mask plate 300 and the like falls onto the upper surface of the lower mask plate 302, and the lower mask plate 302 is removed. The plate 302 was sometimes soiled with dust. If the exposed plate 316 sandwiched between the upper mask plate 300 and the lower mask plate 302 is a hoop material, the exposed plate 316 remains on the lower mask plate 302 during cleaning. Therefore, the dust falls on the exposed plate 316, and the exposed plate 316 may be contaminated with the dust.

Therefore, an object of the present invention is to solve the above-mentioned problems of the prior art and to reduce the burden on the operator when mounting the upper mask plate or when checking or cleaning the upper mask plate. It is an object of the present invention to provide a double-sided exposure apparatus that does not stain the lower mask plate and the like with dust when cleaning the upper mask plate.

[0010]

In order to achieve the above-mentioned object, the invention as set forth in claim 1 provides, in a housing, on both upper and lower surfaces of an exposed plate coated with a photosensitizer.
In a state where the upper mask plate and the lower mask plate on which a mask pattern is formed are closely attached, respectively, from above the exposed plate to the upper surface of the exposed plate through the upper mask plate, and from below the exposed plate. A double-sided exposure device that irradiates light to the lower surface of the exposed plate through the lower mask plate to expose the upper and lower surfaces of the exposed plate, respectively, and adsorbs the upper surface of the upper mask plate. And an upper mask frame capable of holding the upper mask plate at a position substantially parallel to the upper surface of the plate to be exposed, and an upper holding for holding the upper mask frame rotatably around a predetermined rotation axis. The gist of the present invention is to include a frame and guide means for movably guiding the upper holding frame between the inside and the outside of the housing.

According to the first aspect of the invention, the upper holding frame can be moved between the inside and the outside of the apparatus by the guide by the guiding means, so that the upper mask frame can be pulled out to the outside of the apparatus when necessary. , It can be pushed back into the device. Further, since the upper mask frame is rotatably held by the upper holding frame, it can be turned and turned upside down when pulled out of the apparatus.

According to a second aspect of the present invention, in the double-sided exposure apparatus according to the first aspect, the rotation axis is in a plane substantially parallel to a surface of the exposed plate arranged in the housing. The gist is that it is arranged so as to pass through the central portion of the upper mask frame, and that the upper holding frame holds the upper mask frame so that it can rotate at least 180 degrees.

According to a third aspect of the present invention, in the double-sided exposure apparatus according to the first aspect, one end of the guiding means is attached to the upper holding frame, and the other end is attached to a fixed portion in the housing. The gist of the invention is to include a slide mechanism capable of moving the upper holding frame between the inside and the outside of the housing by sliding a predetermined number of stages to expand and contract.

According to the third aspect of the invention, since the slide mechanism for moving the upper holding frame can be expanded and contracted, it can be compactly housed in the apparatus when it is not necessary.

[0015]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below based on examples with reference to the drawings. FIG. 1 is a sectional view showing a double-sided exposure apparatus as an embodiment of the present invention.

As shown in FIG. 1, the double-sided exposure device 30 includes
An exposure unit 32 is provided at the center, and the exposure unit 3 is provided on the left and right.
2, a supply unit 34 for loading the exposed plate 93 into the exposure unit 2, and a discharge unit 3 for receiving the exposed plate 93 unloaded from the exposure unit 32.
6 is provided. The supply unit 34 carries in the plate to be exposed 93, which is carried in from the outside and is placed on the upper surface, and preliminarily aligns the plate to be exposed 93 on the upper surface, and carries the plate to be exposed 93 to a predetermined position of the exposing unit 32 by a carrying device (not shown). To do. The discharge unit 36 also has a transport device (not shown), and carries out the exposed plate 93 to be exposed from the exposure unit 32 and discharges the plate 93 to the next step, for example, a developing device. The shutters 32a and 32b are controlled to open and close when the exposed plate 93 is conveyed from the supply unit 34 or the discharge unit 36.

The exposure section 32 is provided with exposure light sources 38 and 40 on the upper and lower sides in a housing 33, and a mask section 42 for bringing the mask plates into close contact with both surfaces of the exposed plate 93, respectively, between the light sources. Have. The mask portion 42 is an upper mask portion 44.
And a lower mask portion 46, and linear rails 68 that are vertically provided on the pedestal of the exposure unit 32 are provided on both left and right sides of the mask unit 42. The upper mask portion 44 and the lower mask portion 46 face each other along the linear rail 68 so as to be able to approach and separate from each other.

The upper mask portion 44 mainly includes an upper outer frame 58 and an upper holding frame 56, which are connected via a slide rail 64 as described later. Upper holding frame 56
Is provided with a rotation shaft support piece 73.
3, the upper mask frame 50 is held so as to be rotatable in the arrow A direction about the rotation shaft 75.

The upper mask frame 50 has a suction portion (not shown) on the lower surface, and the suction portion causes the upper mask plate 48 to be attached.
The upper mask plate 48 is held in a substantially horizontal position by vacuum suction of the peripheral portion of the upper surface of the. The upper outer frame 58 is provided with guide blocks 66 on both left and right sides, and slidably engages with linear rails 68 erected on the left and right sides through the guide blocks 66. That is, the upper outer frame 58
Can move up and down together with the upper holding frame 56 and the like.

On the other hand, the lower mask portion 46 is the upper mask portion 44.
Similarly, the lower outer frame 62 and the lower holding frame 60 are mainly provided, and both are connected via a slide rail 63 as described later. The lower holding frame 60 holds the lower mask frame 54 above it. Further, a ball caster 83 is provided above the lower holding frame 60 and is in contact with the lower mask frame 54, and the lower mask frame 54 is movable in the horizontal direction with respect to the lower holding frame 60. A roller 53 is in contact with one end of the lower mask frame 54, and the roller 53 moves in the direction of arrow B by a moving mechanism (not shown).
At this time, the lower mask frame 54 is biased toward the roller 53 by a biasing means (not shown) so that the lower mask frame 54 always contacts the roller 53. Therefore, when the roller 53 moves in the arrow B direction by the moving mechanism, the lower mask frame 54 also moves in the arrow B direction. The roller 5
3, the moving mechanism and the urging means are all mounted on the lower holding frame 60. Further, in order to be movable in a direction different from the arrow B direction (for example, a direction perpendicular to the paper surface in FIG. 1) in the horizontal plane, the rollers 53,
A moving mechanism and urging means are also installed.

The lower mask frame 54 has a suction portion (not shown) on the upper surface, and the lower mask plate 52 is provided by the suction portion.
The lower mask plate 52 is held in a substantially horizontal position by vacuum suction of the peripheral portion of the lower surface of the. A seal member 55 is attached to the peripheral portion of the lower mask frame 54. Like the upper outer frame 58, the lower outer frame 62 is provided with guide blocks 66 on both left and right side surfaces.
It is slidably engaged with the linear rail 68 via.
That is, the lower outer frame 62 is also vertically movable together with the lower holding frame 60 and the like.

The upper mask plate 48 and the lower mask plate 52 have a light-transmitting property with high transmission efficiency of light having a wavelength in the ultraviolet region, and the lower surface of the upper mask plate 48 and the upper surface of the lower mask plate 52 are respectively provided with a predetermined amount. The mask pattern of is drawn. CCD cameras 20 and 22 are arranged below the lower holding frame 60.

The alignment between the upper mask plate 48 and the lower mask plate 52 is checked by using the CCD cameras 20 and 22, while the lower mask frame 54 and the lower mask plate 52 are horizontally moved by the moving mechanism of the lower holding frame 60. And the lower mask plate 52 is fixed when the upper mask plate 48 is aligned with the upper mask plate 48.

Then, the exposed plate 93 is placed on the upper surface of the lower mask plate 52, the upper mask portion 44 is lowered along the linear rail 68 in the direction of arrow C, and the lower surface of the upper mask plate 48 is exposed. Contact the plate 93. At that time, the seal member 55 on the peripheral portion of the lower mask frame 54 contacts the lower surface of the upper mask frame 50. After that, the space surrounded by the seal member 55 is evacuated to bring the upper mask plate 48 and the lower mask plate 52 into vacuum contact with the exposed plate 93, respectively. In this state, the exposure light sources 38 and 40 are controlled to be lit, and light is applied to both surfaces of the exposed plate 93 through the upper mask plate 48 and the lower mask plate 52 to perform exposure, and both surfaces of the exposed plate 93 are exposed. Bake the mask pattern on the mask plate.

Here, the structure of the upper mask portion 44, which is a characteristic portion of this embodiment, will be described. FIG. 2 shows FIG.
3 is a perspective view schematically showing the configuration of an upper mask portion 44 in FIG. As shown in FIG. 2, the upper outer frame 58 forming the upper mask portion 44 has a U-shape, and the opposite side of the opening is reinforced by a support rod 65. The upper holding frame 56 is arranged within the frame of the upper outer frame 58, and both left and right sides are connected to the upper outer frame 58 via slide rails 64. Further, rotary shaft support pieces 73 are attached to the front and rear inner walls of the upper holding frame 56, respectively. The upper mask frame 50 is disposed in the lower part of the upper holding frame 56 and is arranged below the rotating frame support piece 73.
The front end and the rear end are rotatably held about the rotating shaft 75. Further, a vacuum line (not shown) for vacuum suction at the suction portion of the upper mask frame 50 passes through the inside of the rotating shaft 75. Therefore, the rotation shaft 75 is provided with a rotary joint so as not to hinder the rotation. Since the turning range is up to about 180 degrees, which will be described later, the vacuum line may be simply constituted by a hose.

Further, the upper holding frame 56 is provided with a holding mechanism 74 on the front side of one side surface. The sandwiching mechanism 74 includes an upper outer frame 58.
A slide shaft 76 (see FIG.
Then, (not shown) is sandwiched between the rotating rollers 70 and 72.
Therefore, the upper holding frame 56 is vertically guided by the sandwiching mechanism 74 at the front side of one side surface thereof, so that the upper outer frame 5
It is possible to move up and down along the slide shaft 76 and the linear rail 68 while keeping its posture horizontal with the unit 8.

FIG. 3 is a plan view showing the upper mask portion 44 of FIG. 2 as viewed from above. Although not shown in FIG. 2, stopper mechanisms 110 are provided on the left and right with the rotation shaft 75 interposed therebetween so that the upper mask frame 50 does not rotate except when necessary. As shown in FIG. 3, the stopper mechanism 110 includes a cylinder 100 and a fixing pin 104 attached to the upper holding frame 56, and abutting pieces 106 and 108 attached to the upper mask frame 50. The cylinder 100 reciprocates the moving pin 102 in the direction of arrow D. The operation of the stopper mechanism 110 will be described later in detail.

In the structure described above, since the slide rails 64 of the upper mask portion 44 can be slid in three steps and extended, the upper holding frame 56 is located in front of the exposure portion 32 (upper surface of FIG. 1). It is possible to pull out. Further, since the upper mask frame 50 is rotatable about the rotation shaft 75, the upper mask frame 50 is outside the exposure unit 32 after the upper holding frame 56 is pulled out, and the upper mask frame 50 is indicated by an arrow A in FIG.
It can be turned upside down by turning about 180 degrees.

FIG. 4 shows the PP 'of the exposure unit 32 in FIG.
It is sectional drawing which shows the cross section of a direction. In FIG. 4, the upper holding frame 5
6 shows a state in which 6 is pulled out in front of the exposure unit 32.
5 is a plan view showing a state in which the upper mask frame 50 is being pulled out and then the upper mask frame 50 is being rotated. Further, FIG. 6 is a perspective view showing a state in which the upper holding frame 56 is pulled out and the upper mask frame 50 is turned upside down in the upper mask portion 44 in FIG. 2, and FIG. 7 shows the upper mask portion 44 in FIG. It is the top view shown from the upper part.

Therefore, for example, when attaching the upper mask plate 48, an operator (not shown) lowers the shutter 94 on the front surface of the exposure section 32 to open the front surface of the exposure section 32, as shown in FIG. , Holding the upper holding frame 56 by hand with the exposure unit 3
Pull out from inside 2. Then, the slide rails 64 slide in three stages and extend in front of the exposure unit 32, and the upper holding frame 56 is pulled out of the exposure unit 32 together with the upper mask frame 50. Outside the exposure unit 32, the operator rotates the upper mask frame 50 by about 180 degrees in the direction of arrow A as shown in FIG. 5 and turns it over as shown in FIG. Then, as shown in FIG. 6, the upper mask plate 48 is placed from above on the upper surface of the upper mask frame 50 turned upside down, and is attached to the suction portion 77 provided on the upper surface of the upper mask frame 50 by suction. After that, with the upper mask plate 48 adsorbed, the upper mask frame 50 is rotated about 180 degrees in the opposite direction to the previous one to return to the original state. As a result, the upper mask plate 48 is in a state of being attracted to the lower surface of the upper mask frame 50. After that, the upper holding frame 56 is pushed back into the exposure unit 32 and positioned at a predetermined position in the exposure unit 32.

When pulling out the upper holding frame 56, the handle 78 of the holding mechanism 74 is operated to rotate the rotating roller 72 of the holding mechanism 74 by approximately 90 ° as shown by arrow E in FIG. Since the sandwiching of the slide shaft 76 by the rotating rollers 70 and 72 is released, the upper holding frame 56 is released from the constraint from the slide shaft 76 and can move forward.

When the upper mask frame 50 is rotated,
In the stopper mechanism 110, the moving pin 102 is moved by the cylinder 100 to release the restraint of the upper mask frame 50. This will be described later in detail.

When the upper mask plate is to be cleaned, the operator must also expose the exposure unit 32 as in the case of mounting the upper mask plate.
The shutter 94 on the front surface of the exposure unit 32 is lowered to open the front surface of the exposure unit 32, and the upper holding frame 56 is pulled out by hand from the inside of the exposure unit 32. At this time, the upper mask plate 48 is also attracted to the upper mask frame 50, and together with the upper holding frame 56, the exposure unit 3 is exposed.
2 is pulled out. Then, the worker uses the exposure unit 32.
The upper mask plate 50 is turned upside down after rotating the upper mask frame 50 together with the upper mask plate 48 outside the
The surface 8 (contact surface with the exposed plate 93) is cleaned. Then, with the upper mask plate 48 adsorbed, the upper mask frame 5
After turning 0 again to return it to the original state, the upper holding frame 5
6 is pushed back into the exposure unit 32 and positioned at a predetermined position in the exposure unit 32.

On the other hand, as shown in FIG. 1, the lower mask portion 4
In 6 as well, since the lower holding frame 60 and the lower outer frame 62 are connected by the slide rails 63 that are slidable in three stages, the lower holding frame 60 is placed in front of the exposure unit 32 (similar to the upper holding frame 56). It can be pulled out to the upper side of the paper in FIG. 1). Therefore, for example, even when the lower mask plate 52 is attached, the lower holding frame 60 can be pulled out from the inside of the exposure unit 32 and the lower mask plate 52 can be attached outside the exposure unit 32.

However, since the lower mask plate 52 may be simply placed on the upper surface of the lower mask frame 54 and attached, the lower mask portion 46 is not provided with a rotating shaft for rotating the lower mask frame 54. .

FIG. 8 is a sectional view showing a section of the mask portion 42 in FIG. Although not shown in FIG. 1, male register pins 80 are attached downward at the four corners of the upper mask frame 50, as shown in FIG. Then, female register pins 88 are attached upward at the four corners of the lower holding frame 60 so as to face them. Therefore, the upper mask portion 44
To join the lower mask part 46 to the linear rail 6
When lowered down along 8, the male register pin 80 attached to the upper mask frame 50 is inserted into the female register pin 88 attached to the lower holding frame 60. Thereby, when the upper mask portion 44 and the lower mask portion 46 are joined, the horizontal position of the upper mask plate 48 can be always set to the same position with respect to the lower holding frame 60. Therefore, for example, when the upper holding frame 56 that has been pulled out for cleaning is pushed back into the exposure unit 32, the upper mask unit 44 is lowered and joined to the lower mask unit 46, and when the exposure is restarted, the upper mask It is not necessary to realign the plate 48 and the lower mask plate 52 in the horizontal direction.

FIG. 9 is an explanatory view for explaining the operation of the stopper mechanism 110 of FIG. 9, the drawing on the right side is a plan view showing the stopper mechanism 110 as viewed from above, and the drawing on the left side is a cross-sectional view showing a cross section in the QQ 'direction of the drawing on the right side. In addition, in order to make it easy to understand the operation of the stopper mechanism, the entire drawing is deformed.

As shown in the diagram on the right side of FIG. 9, the contact pieces 106 and 108 attached to the upper mask frame 50 have a semicircular cross section for contacting the moving pin 102 or the fixed pin 104, respectively. Is provided with a groove. Further, the fixed pin 104 attached to the upper holding frame 56 is fixed and does not move, but the movable pin 102 is not
00 to reciprocate in a direction parallel to the rotating shaft 75.

In a normal state, that is, in a state where the suction portion of the upper mask frame 50 faces downward, as shown in FIG. 9A, the abutting piece 108 abuts the fixing pin 104 and the abutting piece 1
Since 06 is in contact with the moving pin 102, the upper mask frame 50 is fixed and cannot rotate. Therefore, when rotating the upper mask frame 50, as shown in FIG. 9B, the cylinder 100 is driven to pull the moving pin 102 toward the cylinder 100 side. As a result, the contact piece 106 does not contact the moving pin 102, so that the upper mask frame 50 is unconstrained and can rotate in the direction of arrow A, as shown in FIG. 9C. . Then, when the upper mask frame 50 rotates about 180 degrees, as shown in FIG. 9D, the contact piece 106 contacts the fixing pin 104, and the upper mask frame 50 rotates further. I can't. Therefore,
The cylinder 100 is driven again, and as shown in FIG. 9E, the moving pin 102 is pushed out to the contact piece 108 side this time. Then, the contact piece 108 comes into contact with the moving pin 102, and the upper mask frame 50 is fixed in an inverted state and cannot rotate. Thus, the stopper mechanism 1
By 10, the upper mask frame 50 can be positioned at a predetermined position in the axial direction of the rotating shaft 75.

The operation from turning the upper mask frame 50 upside down to returning it to the original normal state is as follows.
Since the operation opposite to the above may be performed, the description thereof will be omitted. Further, the stopper mechanisms 110 are respectively provided at the front part and the rear part of the upper mask frame 50 as shown in FIG. 3, but both perform the same operation as described above.

As described above, according to the present embodiment,
When attaching the upper mask plate 48, or the upper mask plate 48
When performing the check or the cleaning, the worker can perform the work outside the device without putting the body inside the device as in the conventional case, so that the workability is improved. Further, since it is possible for two or more persons to perform the work, it is possible to attach the large-sized upper mask plate relatively easily. Furthermore, since the upper mask frame 50 is rotatable and can be turned upside down outside the apparatus, when the upper mask plate 48 is attached, it can be attached only by placing it on the upper mask frame 50 from above. Therefore, even when the upper mask plate 48 is heavy, the mounting work is simplified. Also, the upper mask plate 4
Since the check and cleaning in 8 can be performed with the target surface facing upward, the operator can perform the cleaning in a comfortable posture.

Also, when cleaning the upper mask plate 48, the upper mask plate 48 can be pulled out of the apparatus for cleaning, so that the dust adhering to the upper mask plate 48 can be removed. It does not fall on the plate and does not stain the lower mask plate 52 or the exposed plate 93 with dust.

Further, in this embodiment, since the rotating shaft 75 passes through the central portion of the upper mask frame 50, the space required for rotating the upper mask frame 50 can be reduced. Further, since the axial direction of the rotating shaft 75 coincides with the pulling direction of the upper holding frame 56, when the worker stands in front of the exposure unit 32 and pulls out the upper holding frame 56, the worker has to rotate the rotating shaft 75. It will face the plane of rotation perpendicular to. Therefore, the upper holding frame 56
When rotating, it is very easy for the operator to rotate.

Further, in this embodiment, since the slide rails 64 and 63 which can be expanded and contracted by sliding in three stages are used as guide means for pulling out the upper holding frame 56 and the lower holding frame 60, it is necessary. When not in use, it can be compactly stored in the device.

[0045]

As described above, according to the invention of claim 1, 2 or 3, when the mask plate is attached,
Alternatively, when the mask plate is checked or cleaned, the worker can perform the work outside the device without putting the body inside the device as in the conventional case, so that the workability is improved. Also,
Since it is possible for two or more people to perform the work, it is possible to attach a large-sized mask plate relatively easily. Furthermore, since the upper mask frame is rotatable and can be turned upside down outside the apparatus, when mounting the upper mask plate, the upper mask frame can be mounted simply by placing it on the upper mask frame from above. Even when the upper mask plate is heavy, the installation work becomes easy. Also, the upper mask plate 48
Checking and cleaning can also be performed with the target surface facing upward, so that the worker can perform in a comfortable posture.

Also, when cleaning the upper mask plate, since the upper mask plate can be pulled out of the apparatus for cleaning, dust attached to the upper mask plate remains on the lower mask plate and the exposed plate. It does not fall on the screen and does not stain the lower mask plate or exposed plate with dust.

[Brief description of drawings]

FIG. 1 is a sectional view showing a double-sided exposure apparatus as an embodiment of the present invention.

FIG. 2 is a perspective view schematically showing a configuration of an upper mask section 44 in FIG.

3 is a plan view showing the upper mask portion 44 of FIG. 2 as viewed from above. FIG.

FIG. 4 is a cross-sectional view showing a cross section of the exposure unit 32 in FIG. 1 taken along the line PP ′.

5 is a plan view showing a state in which the upper mask frame 50 is being rotated after the upper holding frame 56 is pulled out in the upper mask portion 44 in FIG. 3. FIG.

6 is a perspective view showing a state in which an upper holding frame 56 is pulled out in the upper mask portion 44 in FIG. 2 and the upper mask frame 50 is rotated and turned upside down.

7 is a plan view showing the upper mask portion 44 of FIG. 6 as viewed from above.

8 is a cross-sectional view showing a cross section of a mask portion 42 in FIG.

9 is an explanatory diagram for explaining the operation of the stopper mechanism 110 of FIG.

FIG. 10 is a sectional view showing an example of a conventional double-sided exposure apparatus.

[Explanation of symbols]

 20, 22 ... CCD camera 30 ... Surface exposure device 32 ... Exposure section 32a, 32b ... Shutter 33 ... Housing 34 ... Supply section 36 ... Ejection section 38, 40 ... Exposure light source 42 ... Mask section 44 ... Upper mask section 46 ... Lower mask part 48 ... Upper mask plate 50 ... Upper mask frame 52 ... Lower mask plate 53 ... Roller 54 ... Lower mask frame 55 ... Seal member 56 ... Upper holding frame 58 ... Upper outer frame 60 ... Lower holding frame 62 ... Lower outer frame 64, 63 ... Slide rail 65 ... Support rod 66 ... Guide block 68 ... Linear rail 70, 72 ... Rotating roller 73 ... Rotating shaft supporting piece 74 ... Clamping mechanism 75 ... Rotating shaft 76 ... Slide shaft 77 ... Adsorption part 78 ... Handle 80 ... Register pin 83 ... Ball caster 88 ... Register pin 93 ... Exposure plate 94 ... Shutter 100 ... Cylinder 102 ... Movement pin 104 ... Fixed pins 106, 108 ... Abutting piece 110 ... Stopper mechanism 300 ... Upper mask plate 302 ... Lower mask plate 304 ... Upper mask frame 306 ... Lower mask frame 308 ... Shaft 310 ... Arm 312 ... Strut 314 ... Fixed table 316 ... Exposure Plate 318 ... Worker

Claims (3)

[Claims] 1. An upper surface of a plate to be exposed, to which a mask pattern is formed, in a state in which an upper mask plate and a lower mask plate on which mask patterns are formed are closely attached to the upper and lower surfaces of the plate to which the photosensitive agent is applied. The upper surface of the exposed plate through the upper mask plate, the lower surface of the exposed plate through the lower mask plate from below the exposed plate, respectively, by irradiating light, A double-sided exposure device for performing exposure on both upper and lower surfaces, the upper mask frame being capable of adsorbing an upper surface of the upper mask plate and holding the upper mask plate in a position substantially parallel to the upper surface of the exposed plate. An upper holding frame for rotatably holding the upper mask frame about a predetermined rotation axis, and a guide means for movably guiding the upper holding frame between the inside and the outside of the casing. A double-sided exposure apparatus comprising: 2. The double-sided exposure apparatus according to claim 1, wherein the rotation axis is in a plane substantially parallel to a surface of the exposed plate arranged in the housing, and the center of the upper mask frame. A double-sided exposure apparatus which is disposed so as to pass through a section and which holds the upper mask frame so that the upper mask frame can be rotated at least 180 degrees. 3. The double-sided exposure apparatus according to claim 1, wherein one end of the guide unit is attached to the upper holding frame and the other end is attached to a fixed portion in the housing, and the guide unit slides by a predetermined stage to expand and contract. By doing so, a double-sided exposure apparatus including a slide mechanism that can move the upper holding frame between the inside and the outside of the housing.