CN108369385A - Biochip making ultraviolet exposure apparatus according - Google Patents
Biochip making ultraviolet exposure apparatus according Download PDFInfo
- Publication number
- CN108369385A CN108369385A CN201680072701.3A CN201680072701A CN108369385A CN 108369385 A CN108369385 A CN 108369385A CN 201680072701 A CN201680072701 A CN 201680072701A CN 108369385 A CN108369385 A CN 108369385A
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- CN
- China
- Prior art keywords
- mounting portion
- exposure apparatus
- exposed mask
- biochip
- ultraviolet exposure
- Prior art date
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Abstract
This record is related to a kind of biochip making ultraviolet exposure apparatus according, it further decreases the volume shared by device, therefore it could be used that in narrow place, and expense needed for the making of the further alleviator of energy, therefore it can generally be used in the case where no expense is born, the main mould for making the biochip with fine structure can be manufactured.
Description
Technical field
This record is related to a kind of biochip making ultraviolet exposure apparatus according, more specifically, is related to a kind of for having
There is the making of the biochip of fine structure and can not be made of ultraviolet by the biochip that place and expense are limited and are used
Line exposing device.
Background technology
With the development of modern medical techniques, it is not only the technology for the treatment of human diseases, the technology to diagnose the illness is also together
It is developed.The technology to diagnose the illness is the progress in the form of from the external observation of human body or interrogation in the past, and since
Start to have been greatly developed when observation inside of human body can be imaged by X-ray.Recently, not only pass through Magnetic resonance imaging
(Magnetic Resonance Imaging, MRI) camera method, computerized tomography (Computed Tomography, CT) camera shooting
The large scale equipments such as method diagnose the illness, and can also be inserted into the inside that picture pick-up device simply observes human body to inside of human body by endoscope
And it diagnoses the illness.Moreover, being expected to be gradually introduced by intravascular be inserted into there is the diagnosing machinery people of nanometer unit size to see
Examine the technology of inside of human body.
But modern is difficult to the cancer of one of obstinate disease overcome, if making diagnosis using X-ray camera shooting is more difficult, if
Using Magnetic resonance imaging camera method or computer tomography method, diagnosis is costly, leads to financial burden weight.And
And also can directly be observed by endoscope, but the human organ that can put into endoscope is limited, accordingly, it is difficult to extensively
The diagnosis of the general cancer for being suitable for being possible to occur at a variety of positions.In addition, the diagnosing machinery people being inserted into human body is due to also locating
In the research and development stage, therefore its commercialization may need a very long time.
In order to solve described problem, have as the cancer diagnosis technology to attract attention recently and examined using the cancer of biochip
Disconnected technology.The technology launches the cell of patient in the biochip comprising the diagnostic reagent specifically combined with cancer cell,
And whether observing its specific binding, whether morbidity more easily to diagnose cancer.
Biochip needs to form the fluid channel with the structure similarly sized with cell, can carry out point of cell
From.In order to make the biochip with this fluid channel, it is necessary to have the main moulds of the shape corresponding to fluid channel.Due to main mould
Also there is fine structure, therefore in order to form such fine structure, uses and utilizes the shape corresponding to fine structure
Exposed mask cures the exposure process of photosensitive polymer.
But since existing exposure device includes the structure for being aligned multiple masks, volume is very huge, therefore energy
It enough uses the place of the device limited, and manufactures required costly, therefore its purchase needs prodigious expense, therefore very
Hardly possible generally uses.
Invention content
This record provides a kind of biochip making ultraviolet exposure apparatus according, the biological core for being used to have fine structure
Piece makes and can not be limited and be used by place and expense.
Moreover, the technical problems to be solved by the invention are not limited to the technical problem, technology is led belonging to the present invention
The technical staff in domain should be able to be clearly understood that others not mentioned technical problem.
The biochip making of one embodiment of the invention includes with ultraviolet exposure apparatus according：Chamber；Mounting portion is disposed in
Chamber interior, and it can be drawn out to along first direction the outside of chamber, mounting portion is for installing exposed mask and being applied in one side
It is covered with the wafer substrate of photosensitive polymer；Exposed mask fixed part is disposed in the top of mounting portion, is used to support mounting portion
Top includes the transmissive window for making ultraviolet light be transmitted to exposed mask with the fixed exposed mask being disposed between mounting portion；
And light source portion, it is disposed in chamber interior, for providing ultraviolet light to wafer substrate and exposed mask, mounting portion includes：Vacuum serves as a contrast
Pad, is disposed in the lower part of mounting portion, is fixed wafer substrate and exposed mask by forming vacuum between wafer substrate
On mounting portion；And venthole, it is flowed for making air be padded to vacuum, so as to pad fixed wafer substrate and exposure by vacuum
Photomask is detached from from mounting portion.
At this point, mounting portion can further comprise：Driving unit, the wafer substrate for making to be mounted on mounting portion and vacuum
Liner is moved along the second direction parallel with the short transverse of chamber.
Driving unit may include：Tilting cam makes vacuum liner be moved along second direction by rotation；And camshaft,
It is the rotary shaft of tilting cam.
The biochip making ultraviolet exposure apparatus according of the present embodiment can further comprise：A pair of tracks portion, along
One direction is arranged on the inner wall of chamber, described when mounting portion is brought out the outside of chamber or is introduced into the inside of chamber
A pair of tracks portion is used to guide the movement of mounting portion.
Chamber by internal with external in order to cut off, it may include multiple faces, at least part in a face in multiple faces
It is opened, and can draw and introduce mounting portion by open one side.
One wafer substrate can be installed on mounting portion.
Exposed mask fixed part can be hinged on the side of mounting portion.
Mounting portion can further comprise：Presser unit is disposed in the edge of mounting portion and exposed mask fixed part, for adding
Pressure exposed mask fixed part makes it be tightly attached to mounting portion.
In addition, light source portion may include：Light emitting diode, the light for emitting ultraviolet wavelength.
Moreover, light source portion can be used for emitting the ultraviolet light of single wavelength.
The biochip of the present embodiment, which makes ultraviolet exposure apparatus according, to be further comprised：Timing poriotn, it is photosensitive for setting
The property high molecular time for exposure.
Wafer substrate may include silicon material.
Vacuum liner can be made of elastic material.
According to this record, it is possible to provide a kind of biochip making ultraviolet exposure apparatus according further decreases whole dress
Shared volume is set, therefore can also be used in narrow place, and the making for capableing of further alleviator is cost
With, therefore no expense burden ground can be used generally.And, it is possible to provide a kind of biochip making is filled with ultraviolet exposure
It is standby, the main mould for making the biochip with fine structure can be manufactured.
Description of the drawings
Fig. 1 is the solid of the appearance for the biochip making ultraviolet exposure apparatus according for illustrating one embodiment of the invention
Figure.
Fig. 2 is that the mounting portion for the biochip making ultraviolet exposure apparatus according for illustrating one embodiment of the invention is brought out
To the stereogram of external pattern.
Fig. 3 is the side view of the biochip making ultraviolet exposure apparatus according of Fig. 2.
Fig. 4 is to illustrate the side that chamber is deleted from the biochip making ultraviolet exposure apparatus according of Fig. 2 and vacuum lining
The figure of pattern after pad.
Fig. 5 is the sectional view for the section for illustrating the V-V lines cut-out along Fig. 1.
Fig. 6 is the enlarged drawing in the fields A of enlarged drawing 5.
Fig. 7 is the pattern that a diagram embodiment according to the present invention installs wafer substrate and exposed mask to mounting portion
Figure.
Fig. 8 is to be equipped with wafer substrate and exposed mask in diagram mounting portion, and cover the pattern of exposed mask fixed part
Figure.
Fig. 9 is to illustrate to the mounting portion for being equipped with wafer substrate and exposed mask to cover exposed mask fixed part, and pass through
The figure of the fixed pattern of presser unit.
Figure 10 be diagram be fixed with exposed mask fixed part mounting portion be introduced in chamber after pattern figure.
Figure 11 is to have taken the biochip making of an embodiment through the invention to be manufactured with ultraviolet exposure apparatus according
The photo of the first embodiment of biochip making main mould.
Figure 12 is to have taken the biochip making of an embodiment through the invention to be manufactured with ultraviolet exposure apparatus according
The photo of the second embodiment of biochip making main mould.
Figure 13 is to have taken the biochip making of an embodiment through the invention to be manufactured with ultraviolet exposure apparatus according
The photo of the 3rd embodiment of biochip making main mould.
Figure 14 is to have taken the biochip making of an embodiment through the invention to be manufactured with ultraviolet exposure apparatus according
The photo of the fourth embodiment of biochip making main mould.
Specific implementation mode
Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.But in explaining the present invention, in order to the clear present invention's
The explanation of known function or structure is omitted in main idea.
In order to clearly state the present invention, the part unrelated with explanation is omitted, and throughout the specification for identical
Or similar structural element uses identical reference numeral.Moreover, the size and thickness of each structure indicated in the accompanying drawings be for
It is arbitrarily indicated convenient for explanation, therefore the present invention is not limited to content as shown in the figure.
Fig. 1 is the vertical of the appearance for the biochip making ultraviolet exposure apparatus according 100 for illustrating one embodiment of the invention
Body figure.
Fig. 2 is the mounting portion 120 for the biochip making ultraviolet exposure apparatus according 100 for illustrating one embodiment of the invention
It is drawn out to the stereogram of external pattern.Fig. 3 is the side view of the biochip making ultraviolet exposure apparatus according 100 of Fig. 2.
Fig. 4 is to illustrate the side that chamber 110 is deleted from the biochip making ultraviolet exposure apparatus according 100 of Fig. 2 and vacuum liner
The figure of pattern after 122.Fig. 5 is the sectional view for the section for illustrating the V-V lines cut-out along Fig. 1.Fig. 6 is the fields A of enlarged drawing 5
Enlarged drawing.
As shown in Figures 1 to 6, the biochip making ultraviolet exposure apparatus according 100 of one embodiment of the invention includes
Chamber 110, mounting portion 120, exposed mask fixed part 130 and light source portion 140.
Chamber 110 is used to form the shape of the biochip making ultraviolet exposure apparatus according 100 of the present embodiment, in it
Portion forms space, can divide into internal and external.At this point, the chamber 110 of the present embodiment is in order to make in the making of biochip
The ultraviolet light used to extraneous radiation, can not be made of the material for capableing of shielding ultraviolet rays.Moreover, for the same reasons, it can
It is formed by opaque material.
The chamber 110 of the present embodiment outwardly and inwardly may include multiple faces to distinguish, as an example, as shown in Figure 1, can
It is formed to have the hexahedral shape in six faces.
At this point, in the multiple faces for forming chamber 110, wherein one side can at least open a part, and pass through open one
Aftermentioned mounting portion 120 can be drawn and be introduced in face.Determine open one side is that the biochip of the present embodiment makes of ultraviolet
The arranging relationship of line exposing device 100 and user.The process of biochip making ultraviolet exposure apparatus according 100 is used in user
In, the one side of only open and user's arranging the most adjacent chamber 110 can make the peace for being brought out and introducing by the face
Dress portion 120 can also be adjacent to arranging with user, therefore user can more easily use the biochip of the present embodiment to make
With ultraviolet exposure apparatus according 100.
The mounting portion 120 of the present embodiment can be disposed in the inside of chamber 110 as shown in Figure 1, later as shown in Figures 2 and 3
The outside of chamber 110 can be drawn out to along first direction.Behind the outside that mounting portion 120 is drawn out to chamber 110, thoughts are coated
The high molecular wafer substrate 10 of photosensitiveness and exposed mask 20 are installed in successively on mounting portion 120.
" first direction " of the present embodiment is similar to the one side for the opening for determining chamber 110 as described above.From the present embodiment
Biochip making with ultraviolet exposure apparatus according 100 be the " the 1st of the present embodiment to the direction that the user of the device extends is used
Direction ".Therefore, the mounting portion 120 of the present embodiment can be from the inside of chamber 110 to biochip making ultraviolet exposure apparatus according
100 user is drawn out to outside.
The wafer substrate 10 of the present embodiment can be the wafer of silicon material, and in one example, photosensitive polymer can be used
The SU-8 series of Mai Kenuo (MicroChem) company, but not limited to this.It can be carried out if it is by ultraviolet curing
The material of photoresist process, it will be able to be included in the practical range of the present invention.
The mounting portion 120 of the present embodiment only installs a wafer substrate 10 and an exposed mask 20, the peace of the present embodiment
Dress portion 120 is also only arranged one.Therefore, the biochip making ultraviolet exposure apparatus according 100 of the present embodiment can further subtract
Small size can also use in narrow place.Moreover, can further mitigate expense needed for making, therefore without taking
Generally use to burden.
It is formed with the pattern that can make the main mould needed for the making of biochip on the exposed mask 20 of the present embodiment.If
It is exposed under ultraviolet light after arranging exposed mask 20 on the wafer substrate 10 coated with photosensitive polymer, photonasty high score
Son is cured into the shape corresponding to the main mould being formed on exposed mask 20.Later, it is removed by etching work procedure uncured
Unnecessary portion, it will be able to form biochip making main mould.
Exposed mask fixed part 130 supports the top of mounting portion 120 in the inside of chamber 110 and fixation is disposed in and installs
Exposed mask 20 between portion 120, to prevent from being misaligned between wafer substrate 10 and exposed mask 20 during ultraviolet light provides
And occur bad.
In order to successfully provide ultraviolet light to the wafer substrate 10 and exposed mask 20 being disposed between mounting portion 120,
The exposed mask fixed part 130 of the present embodiment includes transmissive window 132, so that the ultraviolet light occurred by aftermentioned light source portion 140
It can successfully transmit.
The exposed mask fixed part 130 of the present embodiment is hinged on the side of mounting portion 120, is more specifically hinged on when peace
Dress portion 120 is drawn out to the side of mounting portion 120 nearest from chamber 110 when outside.Therefore, when mounting portion 120 is brought out and
When wafer substrate 10 and exposed mask 20 are fixed on mounting portion 120, exposed mask fixed part 130 can by hinge movement with
Mounting portion 120 detaches, to be arranged as depicted in figs. 2 and 3.On the contrary, when mounting portion 120 is introduced into so that mounting portion 120
And exposed mask fixed part 130 is when being disposed in the inside of chamber 110, and as shown in Figures 4 and 5, exposed mask fixed part 130 and peace
Dress portion 120 is arranged side by side, and in the upper support mounting portion 120 of mounting portion 120.
At this point, the mounting portion 120 of the present embodiment further comprises presser unit 128, to improve and exposed mask fixed part
130 fixed force.Presser unit 128 is disposed in the edge of mounting portion 120 and exposed mask fixed part 130, in order to make exposure cover
Mould fixed part 130 can more be firmly supported and be fixedly mounted the top in portion 120, and presser unit 128 is pressurizeed to mounting portion 120
And fix exposed mask fixed part 130.
Fig. 1 to Fig. 3 illustrates a presser unit 128 according to an example of the present embodiment, and but not limited to this, if being formed
Multiple presser units 128 should be able to more improve fixed force.
At this point, the mounting portion 120 of the present embodiment may include vacuum liner 122 and venthole 124 (air vent).
As shown in Figures 5 and 6, the space interior contacted with wafer substrate 10 is formed as vacuum, Xiang Jing by vacuum liner 122
Physa plate 10 plays the role of fixed wafer substrate 10 during providing ultraviolet light.The vacuum liner 122 of the present embodiment is by elastic material
Texture is at therefore capable of more successfully assisting the formation of vacuum.
Venthole 124 injects air to the vacuum space being formed between vacuum liner 122 and wafer substrate 10, so that knot
The wafer substrate 10 of beam exposure is detached from vacuum liner 122.It can in order to form vacuum by vacuum liner 122 according to the present embodiment
Cut off venthole 124, then when detaching wafer substrate 10, can Opening Ventilation hole 124 so that air is flowed.
The vacuum liner 122 and venthole 124 of the present embodiment are disposed in the wafer substrate 10 coated with photosensitive polymer
One side opposing face, do not interfere with the exposure process carried out by ultraviolet light.For this purpose, vacuum liner 122 and venthole 124 every
The opposing face that mounting portion 120 is disposed in exposed mask fixed part 130, more specifically, can be disposed in and be fixed with exposed mask
Portion 130 supports the downside of the opposite mounting portion 120 in upside of mounting portion 120.
In addition, the biochip of the present embodiment, which makes, uses ultraviolet exposure apparatus according 100, as shown in Figure 5 and Figure 6, further
Including driving unit 126.Driving unit 126 can make to be disposed in mounting portion along the second direction parallel with the height of chamber 110
122 movement of vacuum liner on 120.
In one example, the driving unit 126 of the present embodiment includes tilting cam 126a and camshaft 126b.It tilts convex
Wheel 126a is the structure for converting rotational motion into linear motion, and camshaft 126b forms the rotary shaft of tilting cam 126a.
According to the present embodiment, tilting cam 126a is rotated centered on camshaft 126b, so that the rotation of tilting cam 126a
Transhipment turn is changed to the linear motion moved in second direction relative to ground upper and lower directions.Therefore, the present embodiment with drive
The connected vacuum liner 122 of moving cell 126 can also carry out upper and lower directions linear motion, therefore can adjust height.
" second direction " of the present embodiment is the biochip making ultraviolet exposure apparatus according from ground and the present embodiment
The parallel direction of 100 short transverse, can vertically form with first direction, as an example can be parallel with gravity direction.
The vacuum liner 122 of the present embodiment can be disposed in the central part of mounting portion 120, to be brought out when mounting portion 120
When being detached to the outside of chamber 110 and exposed mask fixed part 130 from mounting portion 120, vacuum liner 122 has than mounting portion
120 high or identical height.When wafer substrate 10 is padded with the another side of the one side coated with photosensitive polymer and vacuum
When the mode of 122 contacts is mounted on mounting portion 120,126 vacuum of driving unit liner 122 through this embodiment earthward moves
It is dynamic, and the another side of vacuum unit absorption wafer substrate 10, to the space between wafer substrate 10 and vacuum liner 122
Form vacuum.
In addition, it includes light source portion 140 that the biochip of the present embodiment, which makes of ultraviolet exposure apparatus according 100,.Such as Fig. 5 institutes
Show, light source portion 140 is disposed in the upside inside chamber 110, for providing ultraviolet light, with cured coated on wafer substrate 10
Photosensitive polymer.
The light source portion 140 of the present embodiment may include the light emitting diode for emitting the light of ultraviolet field to provide ultraviolet light
(Light Emitting Diode, LED), and in order to realize exposure evenly with bad, this implementation that prevents product
The light source portion 140 of example can emit the light of the ultraviolet field of single wavelength.
The biochip making ultraviolet exposure apparatus according 100 of the present embodiment further comprises orbit portion 150, is used for auxiliary
Help the extraction of mounting portion 120.
Orbit portion 150 is set as a pair of, is arranged along a first direction on the inner wall of chamber 110.It is right on orbit portion 150
A pair of of edge in the edge of mounting portion 120 is connect, mounting portion 120 is drawn out to the outside of chamber 110 or is introduced in inside
When orbit portion 150 be used to guide the movement of mounting portion 120.
In addition, the biochip making ultraviolet exposure apparatus according 100 of the present embodiment can further comprise timing poriotn 160.
Timing poriotn 160 is used to adjust the time for providing ultraviolet light from light source portion 140 to wafer substrate 10 and exposed mask 20.The present embodiment
Timing poriotn 160 can include together：Input unit is used to adjust the time for providing ultraviolet light；And display unit, be used for
User is visibly displayed and informs the time of the offer ultraviolet light.In addition to this, the display unit controllable power of the present embodiment
Supply whether or whether showing the supply of the power supply together.
The foregoing describe the structures of the biochip making ultraviolet exposure apparatus according 100 of the present embodiment.In the following, with reference to figure
7 to Figure 10 illustrate a use example of the biochip making ultraviolet exposure apparatus according 100 of one embodiment of the invention.But
This is only an example, and the deformation of a variety of use examples can be carried out in the general knowledge level of technical field.
Fig. 7 to Figure 10 illustrates the biochip making in the present embodiment and is installed in ultraviolet exposure apparatus according 100 successively
Wafer substrate 10 and exposed mask 20 and the process being exposed.Fig. 7 is to illustrate an embodiment according to the present invention to installation
Portion 120 is installed by the figure of the pattern of wafer substrate 10 and exposed mask 20.Fig. 8 is to illustrate to be equipped with wafer in mounting portion 120
Substrate 10 and exposed mask 20, and cover the figure of the pattern of exposed mask fixed part 130.Fig. 9 is to illustrate to being equipped with wafer
The mounting portion 120 of substrate 10 and exposed mask 20 covers exposed mask fixed part 130, and passes through 128 fixed sample of presser unit
The figure of state.Figure 10 be illustrate be fixed with exposed mask fixed part 130 mounting portion 120 be introduced in chamber 110 after
The figure of pattern.
If as shown in fig. 7, being drawn out to the outside of chamber 110 by 150 mounting portion 120 of orbit portion, pass through hinge movement
Exposed mask fixed part 130 is opened, and is detached from mounting portion 120.Here, so-called separation is not meant to that exposed mask is fixed
Portion 130 is detached from mounting portion 120 completely, but in the state of meaning that hinged shaft part is combined with mounting portion 120, it is moved by cutting with scissors
And it is opened.If exposed mask fixed part 130 is opened, drive can be passed through by being disposed in the vacuum liner 122 at the center of mounting portion 120
Moving cell 126 carries out ascending motion from ground, to which vacuum liner 122 is with same or higher with the height of mounting portion 120
Highly.
If exposed mask fixed part 130 is opened, wafer substrate 10 and exposed mask can be installed on mounting portion 120 successively
20.At this point, the one side in wafer substrate 10 can be coated with photosensitive polymer.In one example, the photonasty of the present embodiment
Macromolecule can be applied in the liquid state, and be uniformly coated on wafer substrate 10 by spin coating, and but not limited to this.In crystalline substance
Uncoated photosensitive polymer on the another side of physa plate 10, wafer substrate 10 the surface of its uncoated photosensitive polymer with
It is installed on mounting portion 120 in the state of 122 contact of vacuum liner.
If wafer substrate 10 and exposed mask 20 are installed on mounting portion 120, as shown in figure 8, exposed mask is fixed
Portion 130 can carry out pivotal motion to mounting portion 120 and combine.
As shown in figure 9, if exposed mask fixed part 130 is arranged side by side by hinge movement and mounting portion 120, pressurize list
Fixed installation portion 120 and exposed mask fixed part 130 while the edge pressure of first 128 pairs of exposed mask fixed parts 130.If logical
It is overpressurized the combination that unit 128 completes mounting portion 120 and exposed mask fixed part 130, then is combined with exposed mask fixed part 130
Mounting portion 120 inside of chamber 110 can be introduced in along orbit portion 150.
In addition, after the combination for completing mounting portion 120 and exposed mask fixed part 130 by presser unit 128, driving
Unit 126 rises so that wafer substrate 10 and exposed mask 20 are mutually close to be arranged.Driving unit 126 rise process be
The mounting portion 120 combined with exposed mask fixed part 130 is introduced in before or after chamber 110, or unrelated with sequence.
The pattern completed after introducing is as shown in Figure 10.Later, user can utilize timing poriotn 160 to set ultraviolet irradiation
Time transmits the transmissive window 132 of exposed mask fixed part 130 if emitting the light of ultraviolet field by light source unit 140
Ultraviolet light can be on corresponding with the shape being formed on exposed mask 20 shape solidification wafer substrate 10 photosensitive polymer.
Although not shown, after terminating to expose, process can be carried out according to the sequence opposite with the sequence of Fig. 7 to Figure 10.That is,
Process can be carried out according to the sequence of Figure 10, Fig. 9, Fig. 8 and Fig. 7.After terminating to expose, combined with exposed mask fixed part 130
Mounting portion 120 can be drawn out to the outside of chamber 110 again from the inside of chamber 110 along orbit portion 150.If mounting portion 120
Be drawn out to the outside of chamber 110 completely, then release the pressurization carried out by presser unit 128, exposed mask fixed part 130 into
Row hinge movement is detached with mounting portion 120.
Before this, following process can be carried out：I.e. by driving unit 126 in vacuum liner 122 and wafer substrate 10
Between maintain vacuum in the state of driving unit 126 decline, be thus mutually close to be arranged wafer substrate 10 and exposed mask 20
It is separated from each other.By the decline of driving unit 126, vacuum liner 122 is flow to by 124 air of venthole naturally, to
Vacuum can be released.Therefore, it can be detached with 10 nature of wafer substrate because of the fixed vacuum liner 122 of vacuum.Therefore, wafer
Substrate 10 can not be smoothed out separation impairedly.
Later, no cured photosensitive polymer can be removed by etching work procedure, to form biochip making master
Mould, and can be used and biochip is made according to main mould provided in this embodiment.
Figure 11 to Figure 14 illustrates the life made using the biochip making ultraviolet exposure apparatus according 100 of the present embodiment
The practical photograph of object chip manufacturing main mould.According to the biochip making ultraviolet exposure apparatus according 100 of the present embodiment, can carry
For the main mould of the biochip with fine size flow path can be made.
Biochip includes the micro-flow path formed by the fine width and fine structure of units of micrometers.Therefore, in order to make
The main mould of the micro-flow path with units of micrometers is used to form also with fine structure, needs to carry out Precision Machining.Therefore, this reality
122 and presser unit 128 can be padded during exposure by vacuum by applying the biochip making ultraviolet exposure apparatus according 100 of example
Etc. structures improve fixed force, in order to avoid generating dislocation between wafer substrate 10 and exposed mask 20, therefore micro-flow path can be made
Use main mould.
Moreover, the biochip making ultraviolet exposure apparatus according 100 of the present embodiment deletes unnecessary structure, and
A wafer substrate 10 is once only exposed, therefore the volume that whole device occupies can be further decreased, also can in narrow place
It is enough to use.Moreover, can further mitigate expense needed for the making of biochip making ultraviolet exposure apparatus according 100, therefore energy
It is enough not use generally the burden of expense.
More than, the particular embodiment of the present invention is described and illustrated, but the present invention is not limited to recorded implementations
Example can carry out a variety of amendments and change in the case where not departing from the thought and range of the present invention, this is for people in the art
Member is self-evident.Therefore, that fixed case or variation should not be construed as being detached from the technological thought of the present invention or viewpoint
Individual examples, within the embodiment deformed should belong to the scope of protection of the present invention.
Claims (13)
1. a kind of biochip making ultraviolet exposure apparatus according, including：
Chamber；
Mounting portion is disposed in the inside of the chamber, and the outside of the chamber, the peace can be drawn out to along first direction
Dress portion is used to install exposed mask and is coated with the wafer substrate of photosensitive polymer in one side；
Exposed mask fixed part is disposed in the top of the mounting portion, is used to support the top of the mounting portion and is arranged with fixed
The exposed mask between the mounting portion, and include the transmissive window for making ultraviolet light be transmitted to the exposed mask；And
Light source portion is disposed in the inside of the chamber, for providing ultraviolet light to the wafer substrate and the exposed mask,
The mounting portion includes：
Vacuum pads, and is disposed in the lower part of the mounting portion, will be described by forming vacuum between the wafer substrate
Wafer substrate and the exposed mask are fixed on the mounting portion；And
Venthole is flowed for making air be padded to the vacuum, so as to pad the fixed wafer substrate by the vacuum
And the exposed mask is detached from from the mounting portion.
2. biochip making ultraviolet exposure apparatus according according to claim 1, wherein
The mounting portion further comprises：Driving unit, the wafer substrate for making to be mounted on the mounting portion and institute
Vacuum liner is stated to move along the second direction parallel with the short transverse of the chamber.
3. biochip making ultraviolet exposure apparatus according according to claim 2, wherein
The driving unit includes：
Tilting cam makes the vacuum liner be moved along the second direction by rotation；And
Camshaft is the rotary shaft of tilting cam.
4. biochip making ultraviolet exposure apparatus according according to claim 1, further comprises：
A pair of tracks portion is arranged along the first direction on the inner wall of the chamber, and institute is drawn out in the mounting portion
When stating the outside of chamber or being introduced into the inside of the chamber, the pair of orbit portion is used to guide the movement of the mounting portion.
5. biochip making ultraviolet exposure apparatus according according to claim 1, wherein
The chamber include multiple faces with by the inside with it is described it is external cut off, at least one of a face in multiple faces
Divide and be opened, and draws and introduce the mounting portion by the open one side.
6. biochip making ultraviolet exposure apparatus according according to claim 1, wherein
One wafer substrate is installed on the mounting portion.
7. biochip making ultraviolet exposure apparatus according according to claim 1, wherein
The exposed mask fixed part is hinged on the side of the mounting portion.
8. biochip making ultraviolet exposure apparatus according according to claim 1, wherein
The mounting portion further comprises：Presser unit is disposed in the edge of the mounting portion and the exposed mask fixed part,
For pressurizeing, the exposed mask fixed part makes it be tightly attached to the mounting portion.
9. biochip making ultraviolet exposure apparatus according according to claim 1, wherein
The light source portion includes：Light emitting diode, the light for emitting ultraviolet wavelength.
10. biochip making ultraviolet exposure apparatus according according to claim 1, wherein
The light source portion is used to emit the ultraviolet light of single wavelength.
11. biochip making ultraviolet exposure apparatus according according to claim 1, further comprises：
Timing poriotn, the time for exposure for setting the photosensitive polymer.
12. biochip making ultraviolet exposure apparatus according according to claim 1, wherein
The wafer substrate includes silicon material.
13. biochip making ultraviolet exposure apparatus according according to claim 1, wherein
The vacuum liner is made of elastic material.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020150178081A KR101764836B1 (en) | 2015-12-14 | 2015-12-14 | Uv exposure system for biochip fabrication |
| KR10-2015-0178081 | 2015-12-14 | ||
| PCT/KR2016/014103 WO2017105014A1 (en) | 2015-12-14 | 2016-12-02 | Ultraviolet exposure device for manufacturing biochip |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108369385A true CN108369385A (en) | 2018-08-03 |
Family
ID=59056966
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201680072701.3A Pending CN108369385A (en) | 2015-12-14 | 2016-12-02 | Biochip making ultraviolet exposure apparatus according |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR101764836B1 (en) |
| CN (1) | CN108369385A (en) |
| WO (1) | WO2017105014A1 (en) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
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| KR101464706B1 (en) * | 2014-07-16 | 2014-11-28 | 마이다스시스템주식회사 | Scan and step exposure system |
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| JP2007219242A (en) | 2006-02-17 | 2007-08-30 | Mitsubishi Precision Co Ltd | Contact exposure method and contact exposure apparatus |
| KR101110790B1 (en) * | 2011-07-14 | 2012-02-15 | 주식회사 옵티레이 | Exposure apparatus |
| JP5867916B2 (en) | 2011-12-06 | 2016-02-24 | 国立研究開発法人産業技術総合研究所 | Exposure apparatus and exposure method |
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2015
- 2015-12-14 KR KR1020150178081A patent/KR101764836B1/en active IP Right Grant
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| JPH0943849A (en) * | 1995-08-02 | 1997-02-14 | Dainippon Screen Mfg Co Ltd | Both side exposure device |
| CN101363984A (en) * | 2007-08-10 | 2009-02-11 | 庄添财 | Lifting mechanism for objective table |
| JP5200622B2 (en) * | 2008-03-28 | 2013-06-05 | ウシオ電機株式会社 | Method for removing mask in light irradiation device |
| KR101256791B1 (en) * | 2012-08-27 | 2013-04-19 | 주식회사 필옵틱스 | Exposure apparatus |
| CN104637854A (en) * | 2013-11-13 | 2015-05-20 | 沈阳新松机器人自动化股份有限公司 | Sucker used for sucking silicon wafers |
| KR101464706B1 (en) * | 2014-07-16 | 2014-11-28 | 마이다스시스템주식회사 | Scan and step exposure system |
| CN104934356A (en) * | 2015-07-16 | 2015-09-23 | 北京工业大学 | Large-size wafer vacuum chuck |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2017105014A1 (en) | 2017-06-22 |
| KR101764836B1 (en) | 2017-08-14 |
| KR20170070498A (en) | 2017-06-22 |
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