KR101110790B1 - Exposure apparatus - Google Patents

Exposure apparatus Download PDF

Info

Publication number
KR101110790B1
KR101110790B1 KR1020110069804A KR20110069804A KR101110790B1 KR 101110790 B1 KR101110790 B1 KR 101110790B1 KR 1020110069804 A KR1020110069804 A KR 1020110069804A KR 20110069804 A KR20110069804 A KR 20110069804A KR 101110790 B1 KR101110790 B1 KR 101110790B1
Authority
KR
South Korea
Prior art keywords
jig
cells
stage
photomask
exposure
Prior art date
Application number
KR1020110069804A
Other languages
Korean (ko)
Inventor
김성봉
오영학
이순섭
Original Assignee
주식회사 옵티레이
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 옵티레이 filed Critical 주식회사 옵티레이
Priority to KR1020110069804A priority Critical patent/KR101110790B1/en
Application granted granted Critical
Publication of KR101110790B1 publication Critical patent/KR101110790B1/en

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: An exposing apparatus is provided to increase the productivity of a plurality of cells by simultaneously implementing exposing processes to entire jig on which a plurality of cells is loaded. CONSTITUTION: An exposing apparatus(100) includes a plurality of stage parts(110) and a plurality of optical houses(120). When jigs respectively including a plurality of arrangement markers and a plurality of cell loading parts are loaded on the stage parts, each stage part moves the loaded jigs from first positions to second positions and arranges the jigs based on the arrangement markers. The optical houses are in connection with photo-mask holders. When photo-masks are in connection with the cells, the cells are exposed. The photo-masks are determined by a jig unit and supplies identical exposing patterns to the cells.

Description

Exposure apparatus {EXPOSURE APPARATUS}

The present application relates to an exposure apparatus, and more particularly, to an exposure apparatus capable of simultaneously performing an exposure process on a plurality of cells in a jig unit by using a jig that is easy to align and adhere to.

When manufacturing a glass or a semiconductor device of a display device, a photolithography (PR) is coated on a glass or a substrate and then a photolithography process is performed. The photolithography process is a process of transferring a pattern formed on a mask onto a glass or a substrate through an exposure apparatus.

The related art in this regard is disclosed in Korean Patent Laid-Open Publication No. 10-2011-0059207.

The present application provides a jig unit exposure technology that can significantly increase the production efficiency of the cell.

The present application provides a sealing and alignment technique between a jig and a photomask that can stably provide the same exposure pattern for a plurality of cells.

The present application provides a technique for closely contacting a plurality of cells exposed to a photomask in a vacuum state in order to minimize the refraction of light to improve the exposure quality.

The present application provides an automatic performance technique for each exposure process and a technique for shortening the discharge cycle of the exposed cells.

The present application provides a technique for performing each exposure process individually.

Among the embodiments, the exposure apparatus includes a plurality of stage portions and a plurality of optical system houses that correspond one-to-one and operate independently, each of the plurality of stage portions each comprising a plurality of alignment markers and a plurality of cells for loading the plurality of cells. When a jig including cell loading parts is loaded, the loaded jig is moved from a first position to a second position, and then the aligned jig is aligned through the plurality of alignment markers, and the alignment is performed by x of the moved jig. And at least one of an axial direction, a y axis direction, or a θ rotation, wherein each of the plurality of optical house houses is linked to a photomask holder holding a photomask, and the plurality of cells is in close contact with the photomask holder. Exposing cells, wherein the photomask is determined by the jig unit and provides the same exposure pattern to the plurality of cells The.

In one embodiment, each of the plurality of stage parts may return the jig at the second position to the first position after the exposure. In one embodiment, the exposure apparatus further includes a load arm for loading the jig to the first position before the exposure and an unload arm for unloading the jig returned to the first position after the exposure to the unloading area. can do. In one embodiment, the load arm may suck the jig through a region other than the plurality of cell loading portions and the plurality of cell loading portions to load the sucked jig into the first position. In one embodiment, the unloading arm may suck the jig through an area other than the plurality of cell loading parts and the plurality of cell loading parts to unload the returned jig from the first position to the unloading area. .

Among the embodiments, the exposure apparatus includes a plurality of stage parts, a plurality of optical house, a first suction device and a second suction device, each of the plurality of stage parts includes a sealing part, and a jig (the jig has a plurality of The alignment jig, a plurality of cell loading portions for loading the plurality of cells, and a suction portion formed at the bottom of each of the plurality of cell loading portions) are loaded into the seal, and the loaded jig is removed from the first position. After moving to the second position to align the moved jig through the plurality of alignment markers, the alignment includes at least one of an x-axis direction, a y-axis direction, or a θ rotation of the moved jig, wherein the plurality of optical systems Each of the houses cooperates with a photomask holder for holding a photomask, the jig and the plurality of cells are in close contact with each other through the first suction device, and the second suction When the plurality of cells and the photo mask are in close contact with the device, sikimyeo exposing the plurality of cells, the photo mask is determined by the jig unit of the exposure apparatus to provide the same exposure pattern in the plurality of cells.

In one embodiment, the suction unit may be disposed at the lower end of each of the plurality of cells.

The disclosed technology of the present application may dramatically increase the production efficiency of a cell by simultaneously performing an exposure process in a jig unit in which a plurality of cells are loaded.

The disclosed technology of the present application can stably provide the same exposure pattern for a plurality of cells using a configuration and alignment markers that can seal between the jig and the photomask.

The disclosed technology of the present application may closely contact a plurality of cells and a photomask to be exposed in a vacuum state, thereby minimizing the refraction of light to improve the exposure quality.

The disclosed technology of the present application may automatically perform each exposure process from the input of the jig to the discharge, and may perform the exposure process with a predetermined time difference to reduce the cycle of discharging the exposed cells from the exposure apparatus.

The disclosed technique of the present application can perform each exposure process individually to expose the cell without being affected by other exposure processes. Therefore, even when some operations are impossible, the exposed cells can be produced through the remaining portions, and the cells can be exposed using other types of masks.

1A to 1D are diagrams for describing an exposure apparatus according to an embodiment of the disclosed technology.
FIG. 2 is a plan view illustrating a jig used in the exposure apparatus of FIG. 1. FIG.
3 is a view for explaining a jig suction part of the load arm and the unload arm of the exposure apparatus in FIG. 1.
4 is a plan view illustrating a stage part of the exposure apparatus in FIG. 1.
FIG. 5 is a view for explaining a state in which a cell, a jig, and a photomask are in close contact with a stage part of the exposure apparatus in FIG. 1.
6 is a view for explaining the operation of the exposure apparatus in FIG.

The description of the disclosed technique is merely an example for structural or functional explanation and the scope of the disclosed technology should not be construed as being limited by the embodiments described in the text. That is, the embodiments may be variously modified and may have various forms, and thus the scope of the disclosed technology should be understood to include equivalents capable of realizing the technical idea. In addition, the objects or effects presented in the disclosed technology does not mean that a specific embodiment should include all or only such effects, and thus the scope of the disclosed technology should not be understood as being limited thereto.

On the other hand, the meaning of the terms described in the present application should be understood as follows.

Terms such as "first" and "second" are intended to distinguish one component from another component, and the scope of rights should not be limited by these terms. For example, the first component may be named a second component, and similarly, the second component may also be named a first component.

When a component is referred to as being "connected" to another component, it should be understood that there may be other components in between, although it may be directly connected to the other component. On the other hand, when a component is referred to as being "directly connected" to another component, it should be understood that there is no other component in between. On the other hand, other expressions describing the relationship between the components, such as "between" and "immediately between" or "neighboring to" and "directly neighboring to", should be interpreted as well.

Singular expressions should be understood to include plural expressions unless the context clearly indicates otherwise, and terms such as "comprise" or "have" refer to features, numbers, steps, operations, components, parts, or parts thereof described. It is to be understood that the combination is intended to be present and does not exclude in advance the possibility of the presence or addition of one or more other features or numbers, steps, operations, components, parts or combinations thereof.

All terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which the disclosed technology belongs, unless otherwise defined. Generally, the terms defined in the dictionary used are to be interpreted to coincide with the meanings in the context of the related art, and should not be interpreted as having ideal or excessively formal meanings unless clearly defined in the present application.

1A to 1D are diagrams for describing an exposure apparatus according to an embodiment of the disclosed technology. 1A is a plan view of the exposure apparatus, FIG. 1B is a side view of the exposure apparatus, FIG. 1C is a perspective view for explaining a stage portion of the exposure apparatus, and FIG. 1D is a perspective view for explaining a vision camera and a photomask holder of the exposure apparatus.

1A to 1D, the exposure apparatus 100 includes a support 105, a plurality of stage parts 110, a plurality of optical system houses 120, a plurality of photomask holders 130, and a first conveyance. The unit 140, the second carrying unit 150, a plurality of vision cameras 160 and the arm robot 170.

The support 105 is a structure capable of flatly supporting the components of the exposure apparatus 100 and serves as a shelf on which the components of the exposure apparatus 100 are arranged.

The plurality of stage units 110 may be arranged in a row on the support 105, and may move back and forth between predetermined positions, and may operate independently of each other. In one embodiment, the number of stage parts 110 may correspond to two. In addition, in one embodiment, each of the stage portions 110 may be moved back and forth between the first position and the second position, where each stage portion 110 is a jig (200) The loading position, that is, on an imaginary extension line connecting the first carrying unit 140 and the second carrying unit 150, the second position is a position where the exposure is performed.

In one embodiment, each of the plurality of stage parts 110 may return the jig 200 at the second position to the first position after the exposure.

The jig 200 will be described in more detail with reference to FIG. 2 below.

The plurality of optical system houses 120 are installed in one-to-one correspondence with the plurality of stage units 110 and operate independently of each other. In one embodiment, each of the optical system houses 120 is installed to be spaced apart from each of the plurality of stage parts 110 in the vertically above the second position. In one embodiment, the optics houses 120 irradiate ultraviolet light to expose the cell.

Here, the plurality of photomask holders 130, the plurality of optical system houses 120, and the plurality of stage units 110 are equally composed of a plurality of components. do.

Each of the plurality of photomask holders 130 is disposed in a one-to-one correspondence with each of the plurality of optical house 120 in the second position and interlocked with each of the plurality of optical house 120. The photomask holder 130 holds the photomask between the stage 110 and the optical system house 120 when the stage 110 is in the second position.

In one embodiment, the photomask holder 130 is attached by a photomask holding device (not shown). That is, the photomask uses a method of vacuum absorbing a film having a photomask pattern directly engraved on the transparent glass or a photomask pattern engraved on the transparent glass.

The first carrying unit 140 is disposed spaced apart from the upper portion of the support 105 and carries a jig 200 provided from the outside from one side, the second carrying unit 150 is the same as the first carrying unit 140 It is arranged spaced apart on the upper portion of the support 105 in height and carries the jig 200 from the other side to the outside. The first carrying unit 140 and the second carrying unit 150 may be disposed on a virtual straight line in which the stage units 110 are aligned. In one embodiment, the first conveying part 140 and the second conveying part 150 may correspond to a conveyor.

The plurality of vision cameras 160 are arranged to observe the direction of the stage unit 110 from the upper side of the mask holder 130, and thus the jig (in the process of aligning the jig 200 loaded on the stage unit 110). 200). In one embodiment, four vision cameras 160 may be disposed above one mask holder 130, and each corner of the rectangular jig 200 may be observed.

The arm robot 170 is installed in parallel with a virtual straight line in which the stage parts 110 are aligned, and includes a load arm 172 and an unload arm 174 at an upper portion thereof. The load arm 172 and the unload arm 174 may move in parallel between the first carrying part 140 and the second carrying part 150, and the load arm 172 and the unloading arm 174 may move in the jig 200. Can be loaded or unloaded.

FIG. 2 is a plan view illustrating a jig used in the exposure apparatus of FIG. 1. FIG.

In FIG. 2, the jig 200 includes a plurality of alignment markers 210, a plurality of cell loading units 220, and a suction unit 222.

In one embodiment, the plurality of alignment markers 210 are provided at a predetermined position in front of the jig 200, and in one embodiment, four alignment markers 210 are located near each corner of the front of the jig 200. It can be provided one by one.

The jig 200 loaded on the stage unit 110 and moved to the second position may be aligned through the alignment markers 210. In other words, the jig 200 moved to the second position is compared with the set position while observing with the vision camera 160 and the alignment markers 210 of the jig 200 are sensed to be shifted from the position. The jig 200 is aligned through at least one of θ rotations based on the X-axis direction, the Y-axis direction, or the center of the jig 200. In one embodiment, each of the plurality of vision cameras 160 may observe a square area having a length of 100 mm on one side including each of the plurality of alignment markers 210.

The plurality of cell loading units 220 may be a portion in which the plurality of cells 300 may be loaded on the front surface of the jig 200, and may be implemented as a groove formed in accordance with the shape of the cell 300.

In one embodiment, a plurality of suction parts 222 may be formed at the bottom of each of the plurality of cell loading parts 220, and the plurality of suction parts 222 may include the cell loading parts 220 on the front surface of the jig 200. It is a vent that can move the air penetrated from the back of the jig 200 to.

Since the plurality of cells 300 are loaded in the jig 200, the photomask is determined in a jig unit and provides the same exposure pattern to the plurality of cells 300. In one embodiment, two cells 300 may be loaded in one jig 200.

3 is a view for explaining a jig suction part of the load arm and the unload arm of the exposure apparatus in FIG. 1.

In FIG. 3, the jig adsorption part 176 is provided at the front end of the rod arm 172 and the unload arm 174 to hold the jig 200. The jig adsorption unit 176 may be configured of a panel having a width corresponding to the jig 200, and includes a plurality of adsorbers 178 and a plurality of cells 300 loaded in the jig 200 and the jig 200. It is configured to adsorb.

In one embodiment, the load arm 172 adsorbs the jig 200 by adsorbing the jig 200 through an area other than the plurality of cell loading parts 220 and the plurality of cell loading parts 220 through the jig adsorption part 176. Load 200 at the first position.

In one embodiment, the unload arm 174 sucks the jig 200 through the jig adsorption unit 176 through an area other than the plurality of cell loading units 220 and the plurality of cell loading units 220 to perform exposure. And the jig 200 returned to the first position is unloaded from the first position to the unloading area. Here, the unloading area corresponds to the second carrying part 150.

4 is a plan view illustrating a stage part of the exposure apparatus in FIG. 1.

In FIG. 4, a plurality of jig suction units 116 may be formed at a lower end of the region 112 in which the jig 200 is loaded in the stage unit 110.

In addition, the stage unit 110 may be provided with a sealing unit 114 surrounding the outer edge of the region 112 in which the jig 200 is loaded. In one embodiment, the seal 114 may be comprised of a packing through which air does not pass.

In an exemplary embodiment, a plurality of exposure vacuum suction units 118 may be formed at a portion between the edge of the region 112 where the jig is loaded and the sealing unit 114.

In one embodiment, the jig suction unit 116 and the exposure vacuum suction unit 118 is an air vent through which the air moves through the front side to the rear side of the stage unit 110.

FIG. 5 is a view for explaining a state in which a cell, a jig, and a photomask are in close contact with a stage part of the exposure apparatus in FIG. 1.

In FIG. 5, when the stage unit 110 loads the jig 200 and moves to the second position to be disposed under the photomask holder 130, the position of the jig 200 is aligned, and the photomask holder 130 is positioned. ) May be lowered to contact the holding photomask 400 with the plurality of cells 300.

In one embodiment, the exposure apparatus 100 may further include a first suction device 420 and a second suction device 430 on the rear surface of each of the stage units 110. The first suction device 420 may be in close contact with the rear of the stage unit 110 to suck air through the jig suction unit 116, and the second suction device 430 may be in close contact with the rear of the stage unit 110. Air may be sucked through the common suction unit 118. In one embodiment, each of the first suction device 420 and the second suction device 430 may be driven independently of each other.

In one embodiment, the region in which the jig suction portion 116 of the stage portion 110 is formed is recessed to form a groove over a region narrower than the region 112 in which the jig 200 is loaded, so that the stage portion 110 is formed. And a space 119 surrounded by the jig 200 may be formed.

In one embodiment, when the first suction device 420 is operated to suck air through the jig suction unit 116, the jig 200 is in close contact with the stage unit 110, and the plurality of cells 300 are jig It can be in close contact. In addition, when the second suction device 430 is operated to suck air through the exposure vacuum suction part 118, the space enclosed by the photomask 400, the stage part 110, and the sealing part 114 is in a vacuum state. The photomask 400 may be completely in contact with the plurality of cells 300. As a result, the refraction of light transmitted through the photomask 400 may be minimized during the exposure process, and thus the exposure quality may be improved.

6 is a view for explaining the operation of the exposure apparatus in FIG.

In FIG. 6, the first transporter 140 receives the jig 200 loaded with the plurality of cells 300 from the outside and transports the jig 200 one by one.

The load arm 172 holds the jig 200 in the first carrying part 140 and loads the jig 200 into the stage part 110 in the first position. This process may be independently performed on the plurality of stage units 110.

When the jig 200 is loaded, the stage unit 110 moves the loaded jig 200 from the first position to the second position.

Align the position of the jig 200 through the alignment markers 210 using the vision camera 160, and when the jig 200 is aligned, the first suction device 420 is operated to move the jig 200 and the plurality of jig 200. The cells 300 are tightly fixed and the second suction device 430 is operated to tightly fix the plurality of cells 300 and the photomask 400.

The optical system house 120 exposes the plurality of cells 300 by irradiating ultraviolet rays and provides the plurality of cells 300 with a pattern formed on the photomask 400.

The stage unit 110 returns the jig 200 at the second position to the first position after the exposure.

The unload arm 174 holds the jig 200 returned to the first position and loads the jig 200 into the unloading area, that is, the second carrying part 150.

The second carrying part 150 moves the jig 200 which has been exposed to the outside, and the plurality of cells 300 and the jig 200 are separated from the moved jig 200 by using the separating device 320. Can be.

In one embodiment, the exposure apparatus 100 may perform the process of moving the exposed jig 200 to the second position in a 9-second period.

In one embodiment, the arm robot 170 unloads the exposed jig 200 in each of the stages 110 and loads a new jig 200 in the stages 110 at intervals of nine seconds.

In one embodiment, it may take 2 seconds when the unload arm 174 moves both ends of the first position, 0.5 seconds when unloading the jig 200 exposed at the first position, and the load arm When 172 and unload arm 174 move from the first position to the first conveyance 140 and the second conveyance 150, respectively, it may take two seconds, and the load arm 172 is first When loading a new jig 200 in the position it may take 1 second. That is, it may take 6 seconds to load the jig 200 in which the arm robot 170 unloads the jig 200 exposed at one stage and loads the new jig 200.

It will be apparent to those skilled in the art that various modifications and variations can be made to the present invention without departing from the spirit and scope of the present invention as set forth in the following claims It can be understood that

100 exposure apparatus 105 support
110: stage unit 120: optical system house
130: photomask holder 140: the first carrying part
150: second carrier 160: vision camera
170: arm robot 172: load arm
174: unload arm 200: jig
210: alignment marker 220: suction
176: jig adsorption unit 178: adsorber
114: sealing part 116: jig suction part
118: suction unit for exposure vacuum 300: cell
400: photomask 420: first suction device
430: second suction device

Claims (7)

A plurality of stage parts and a plurality of optical system houses, a first suction device and a second suction device, which correspond to one-to-one and operate independently;
Each of the plurality of stage portions includes a sealing portion, and each of the plurality of stage portions includes a plurality of cell loading portions for loading a plurality of alignment markers and a plurality of cells and a suction portion formed at a lower end of each of the plurality of cell loading portions. When the containing jig is loaded into the seal, the loaded jig is moved from the first position to the second position, and then the aligned jig is aligned through the plurality of alignment markers, and the alignment is x of the moved jig. At least one of an axial direction, a y axis direction, or a θ rotation,
Each of the plurality of optical system houses interlocks with a photomask holder holding a photomask, the jig and the plurality of cells are in close contact with each other through the first suction device, and the photomask and the second device are contacted with each other through the second suction device. And exposing the plurality of cells when the cells are in close contact, wherein the photomask is determined in the jig unit and provides the same exposure pattern to the plurality of cells. The method of claim 1, wherein each of the plurality of stage units
And the jig at the second position is returned to the first position after the exposure. The method of claim 2,
A rod arm for loading the jig into the first position prior to the exposure; And
And an unload arm for unloading the jig returned to the first position after the exposure to the unloading area. 4. The rod arm of claim 3, wherein the rod arm is
And the adsorbed jig is loaded into the first position by adsorbing the jig through an area other than the plurality of cell loading parts and the plurality of cell loading parts. The method of claim 4, wherein the unload arm
And unloading the returned jig from the first position to the unloading area by adsorbing the jig through the region other than the plurality of cell loading portions and the plurality of cell loading portions. delete The exposure apparatus of claim 1, wherein the suction unit is disposed at a lower end of each of the plurality of cells.
KR1020110069804A 2011-07-14 2011-07-14 Exposure apparatus KR101110790B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020110069804A KR101110790B1 (en) 2011-07-14 2011-07-14 Exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020110069804A KR101110790B1 (en) 2011-07-14 2011-07-14 Exposure apparatus

Publications (1)

Publication Number Publication Date
KR101110790B1 true KR101110790B1 (en) 2012-02-15

Family

ID=45840046

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110069804A KR101110790B1 (en) 2011-07-14 2011-07-14 Exposure apparatus

Country Status (1)

Country Link
KR (1) KR101110790B1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101256791B1 (en) * 2012-08-27 2013-04-19 주식회사 필옵틱스 Exposure apparatus
KR101397425B1 (en) 2012-09-24 2014-05-20 주식회사 옵티레이 Exposure apparatus
WO2017105014A1 (en) * 2015-12-14 2017-06-22 한국기계연구원 Ultraviolet exposure device for manufacturing biochip

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007293376A (en) * 2007-08-14 2007-11-08 Hitachi High-Technologies Corp Exposure device and method for manufacturing substrate

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007293376A (en) * 2007-08-14 2007-11-08 Hitachi High-Technologies Corp Exposure device and method for manufacturing substrate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101256791B1 (en) * 2012-08-27 2013-04-19 주식회사 필옵틱스 Exposure apparatus
KR101397425B1 (en) 2012-09-24 2014-05-20 주식회사 옵티레이 Exposure apparatus
WO2017105014A1 (en) * 2015-12-14 2017-06-22 한국기계연구원 Ultraviolet exposure device for manufacturing biochip

Similar Documents

Publication Publication Date Title
US6806945B2 (en) Automatic exposing apparatus and method for exposing both sides of works
CN107017191B (en) Transfer apparatus, exposure apparatus, and device manufacturing method
KR101040479B1 (en) Coating and developing apparatus
JP6001961B2 (en) Substrate processing apparatus and substrate processing method
KR20060007211A (en) Exposure system
KR101997932B1 (en) Substrate processing apparatus
TW201828391A (en) Substrate transport device, detection position calibration method and substrate processing apparatus
JP2008198882A (en) Substrate-treating device
KR101110790B1 (en) Exposure apparatus
KR20110091013A (en) Exposure apparatus and exposure method
KR20100042586A (en) Substrate carrier device and substrate carrier method
JP5512633B2 (en) Substrate processing system, substrate transfer method, program, and computer storage medium
KR101098927B1 (en) Exposure apparatus
JP2013098476A (en) Substrate processing system, substrate transfer method, program, and computer storage medium
JP2535821B2 (en) Substrate high-speed conversion device and method
KR101436195B1 (en) Exposure apparatus and exposure method
JP5227701B2 (en) Substrate processing system
KR20100090643A (en) Substrate processing system
CN116520649A (en) Substrate carrying and exposing device and method, flat panel display and device manufacturing method
JP4794471B2 (en) Exposure apparatus and method for exchanging top plate of negative pressure chamber of exposure apparatus
KR20030063219A (en) Substrate processing apparatus and substrate processing method
KR102233465B1 (en) Unit for transferring substrate, Apparatus and Method for treating substrate with the unit
JP7287058B2 (en) Substrate transport apparatus, exposure apparatus, flat panel display manufacturing method, device manufacturing method, and exposure method
JP5752827B2 (en) Substrate processing system, substrate transfer method, program, and computer storage medium
KR101051691B1 (en) Exposure equipment

Legal Events

Date Code Title Description
A201 Request for examination
A302 Request for accelerated examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20141204

Year of fee payment: 4

FPAY Annual fee payment

Payment date: 20151117

Year of fee payment: 5

FPAY Annual fee payment

Payment date: 20170117

Year of fee payment: 6

LAPS Lapse due to unpaid annual fee