JPH0943613A - Production of liquid crystal element - Google Patents

Production of liquid crystal element

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Publication number
JPH0943613A
JPH0943613A JP19382895A JP19382895A JPH0943613A JP H0943613 A JPH0943613 A JP H0943613A JP 19382895 A JP19382895 A JP 19382895A JP 19382895 A JP19382895 A JP 19382895A JP H0943613 A JPH0943613 A JP H0943613A
Authority
JP
Japan
Prior art keywords
liquid crystal
electrode substrates
pair
manufacturing
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19382895A
Other languages
Japanese (ja)
Other versions
JP3214303B2 (en
Inventor
Maki Sunaga
眞樹 須永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP19382895A priority Critical patent/JP3214303B2/en
Priority to US08/687,990 priority patent/US5942066A/en
Publication of JPH0943613A publication Critical patent/JPH0943613A/en
Application granted granted Critical
Publication of JP3214303B2 publication Critical patent/JP3214303B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To improve the strength of adhesion of adhesive pieces and to shorten the time for a curing treatment of sealants for liquid crystal cells by mounting heating elements at a pair of electrode substrates and curing the sealants for liquid crystal cells and the adhesive pieces by heating a pair of these electrode substrates by the heat generated by the heating elements. SOLUTION: The sealants 7 for the liquid crystal cells contg. one pack type thermoplastic epoxy adhesives for enclosing the liquid crystal cells with the sealants themselves and the adhesives and the adhesive pieces 8 of a hot melt type contg. thermosetting epoxy adhesives for spot adhering the electrode substrates 1a, 1b are mounted at least at either side of the opposite surfaces of a pair of the electrode substrates 1a, 1b arranged to face each other. While the respective electrode substrates 1a, 1b stuck to each other are pressurized by air pressures, the heat generated by the respective heating elements 4a, 4b is transmitted via heat plates 3a, 3b and cushion materials 2a, 2b to the respective electrode substrates 1a, 1b, by which the sealants 7 for the liquid crystal cells and the adhesive pieces 8 are cured.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、液晶素子の製造方
法に係り、特に対向する一対の電極基板間に液晶を封入
する液晶セル用シール剤及び一対の電極基板を点接着す
る接着剤ビースの硬化工程を有する液晶素子の製造方法
に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a liquid crystal device, and more particularly to a liquid crystal cell sealing agent for sealing liquid crystal between a pair of opposing electrode substrates and an adhesive bead for spot-bonding the pair of electrode substrates. The present invention relates to a method for manufacturing a liquid crystal element having a curing step.

【0002】[0002]

【従来の技術】従来、一対の電極基板を接着する液晶セ
ル用シール剤及び接着剤ビースの硬化方法は、一対の電
極基板を重ね合わせ、アライメントした後、加熱時の熱
膨張による電極基板の歪みを抑えるために電極基板全面
を、0.1〜5.0kg/cm2 の圧力で加圧しながら10
0〜200℃に設定されたオーブンの中で硬化させると
いう方法が一般的であった。
2. Description of the Related Art Conventionally, a method for curing a liquid crystal cell sealant and an adhesive bead for adhering a pair of electrode substrates has been such that a pair of electrode substrates are superposed and aligned, and then the electrode substrates are distorted due to thermal expansion during heating. In order to suppress the pressure, press the entire surface of the electrode substrate with a pressure of 0.1 to 5.0 kg / cm 2 and
A general method is to cure in an oven set to 0 to 200 ° C.

【0003】この時の電極基板の歪みを抑えるための加
圧方法としては、例えば、電極基板全面に加重を印加す
るおもりによる加圧方法やエアー圧、バネ荷重等を利用
した加圧治具による方法などがある。
As a pressing method for suppressing the distortion of the electrode substrate at this time, for example, a pressing method using a weight for applying a weight to the entire surface of the electrode substrate or a pressing jig using air pressure, spring load or the like is used. There are ways.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、電極基
板の歪みを抑えるためのおもりやエアー圧、バネ荷重を
利用する加圧治具はそれ自体の熱容量が大きいため、例
えば160℃設定のオーブン中に投入したエアー加圧治
具内の電極基板の温度が150℃に達するには約3時間
を要する。このように、昇温速度が非常に遅い温度プロ
ファイルでの硬化には以下のような問題があった。
However, since the pressure jig which uses the weight, the air pressure, and the spring load for suppressing the distortion of the electrode substrate has a large heat capacity itself, for example, in a oven set at 160 ° C. It takes about 3 hours for the temperature of the electrode substrate in the introduced air pressure jig to reach 150 ° C. As described above, there are the following problems in curing in a temperature profile in which the rate of temperature rise is very slow.

【0005】(1)ホットメルトタイプの接着剤ビース
が十分に溶ける以前に、接着剤ビース中の硬化剤とエポ
キシ接着剤の硬化反応が進んでしまい、電極基板との界
面にいわゆる濡れが生じず、十分な接着強度が得られな
くなる。このような状態では、とりわけ強誘電性液晶素
子においては耐衝撃性が低下する恐れがある。
(1) Before the hot-melt type adhesive bead is sufficiently melted, the curing reaction between the curing agent and the epoxy adhesive in the adhesive bead proceeds, and so-called wetting does not occur at the interface with the electrode substrate. However, sufficient adhesive strength cannot be obtained. In such a state, impact resistance may be lowered particularly in the ferroelectric liquid crystal element.

【0006】(2)液晶セル用シール剤の硬化には約1
50℃で、約1時間の熱処理が必要であるが、上述した
従来の硬化方法では、硬化のための熱処理時間(約1時
間)と、昇温時間(約3時間)、さらに冷却時間必要で
あり、電極基板の投入から取り出しまでの処理時間に長
時間を要する。
(2) About 1 is required to cure the liquid crystal cell sealant.
Although heat treatment at 50 ° C. for about 1 hour is required, the above-described conventional curing method requires heat treatment time for curing (about 1 hour), heating time (about 3 hours), and cooling time. Therefore, a long processing time is required from the loading of the electrode substrate to the removal thereof.

【0007】更に、加圧治具内に電極基板を設置し、そ
れをオーブンに投入という従来の硬化方法では、大面積
の電極基板の加圧、加熱処理に、大型の加圧治具とオー
ブンが必要となるためにコストが高くなる。
Further, according to the conventional curing method of placing an electrode substrate in a pressure jig and putting it in an oven, a large pressure jig and an oven are used for the pressure and heat treatment of a large area electrode substrate. Therefore, the cost becomes high.

【0008】そこで、本発明は、接着剤ビースの接着強
度の向上と、液晶セル用シール剤の硬化処理時間の短縮
化を図ることができる液晶素子の製造方法を提供するこ
とを目的とする。
Therefore, an object of the present invention is to provide a method of manufacturing a liquid crystal element, which can improve the adhesive strength of the adhesive bead and shorten the curing treatment time of the liquid crystal cell sealant.

【0009】[0009]

【課題を解決するための手段】本発明は、上述事情に鑑
みなされたものであって、液晶がその間に注入される対
向する一対の電極基板の貼り合わせ面に、前記一対の電
極基板とそれ自身とで前記液晶を封入する液晶セル用シ
ール剤、及び前記一対の電極基板を点接着する接着剤ビ
ースを取り付けて前記一対の電極基板を貼り合わせ、前
記一対の電極基板を加熱、加圧して前記液晶セル用シー
ル剤及び接着剤ビースを硬化させる硬化工程を少なくと
も有する液晶素子の製造方法において、前記硬化工程に
て、前記一対の電極基板に発熱体を取り付け、前記発熱
体の発熱により前記一対の電極基板を加熱して前記接着
剤ビースを硬化させることを特徴としている。
SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, in which the pair of electrode substrates and the pair of electrode substrates are provided on the bonding surfaces of the pair of opposing electrode substrates into which liquid crystal is injected. A liquid crystal cell sealant for enclosing the liquid crystal with itself, and an adhesive bead for spot-bonding the pair of electrode substrates are attached to bond the pair of electrode substrates, and the pair of electrode substrates are heated and pressed. In a method of manufacturing a liquid crystal element having at least a curing step of curing the liquid crystal cell sealant and the adhesive bead, in the curing step, a heating element is attached to the pair of electrode substrates, and the pair of electrodes is heated by the heating element. The electrode substrate is heated to cure the adhesive bead.

【0010】また、好ましくは、前記発熱体を面状に形
成し電極基板に対応した大きさにする。
Further, preferably, the heating element is formed in a planar shape and has a size corresponding to the electrode substrate.

【0011】また、好ましくは、前記発熱体を、前記一
対の電極基板上の両面に均熱用のヒータプレートと緩衝
材を介して取り付ける。
Preferably, the heating element is attached to both surfaces of the pair of electrode substrates via a heater plate for soaking and a cushioning material.

【0012】[0012]

【発明の実施の形態】以下、図面に基づいて本発明の実
施の形態について説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0013】図1は、本発明の実施の形態に係る液晶素
子の製造方法におけるシール剤及び接着剤ビースの硬化
工程を示す概略断面図である。
FIG. 1 is a schematic cross-sectional view showing a step of curing a sealant and an adhesive bead in a method of manufacturing a liquid crystal element according to an embodiment of the present invention.

【0014】この図に示すように、多段に設置された複
数の各一対の電極基板1a,1b間には、それぞれ下か
ら順に緩衝材2a、ヒートプレート3a、面状の発熱体
4、ヒートプレート3b、緩衝材2bが設置されてい
る。ヒートプレート3a、面状の発熱体4は、電極基板
1a,1bよりもやや大きく形成されており、緩衝材2
a,2b、ヒートプレート3bは、電極基板1a,1b
とほぼ同じ大きさで形成されている。
As shown in this figure, between each of the plurality of pairs of electrode substrates 1a, 1b arranged in multiple stages, the cushioning material 2a, the heat plate 3a, the planar heating element 4, and the heat plate are arranged in order from the bottom. 3b and cushioning material 2b are installed. The heat plate 3a and the planar heating element 4 are formed to be slightly larger than the electrode substrates 1a and 1b, and the cushioning material 2
a, 2b, the heat plate 3b, the electrode substrate 1a, 1b
It is formed with almost the same size as.

【0015】また、最上部に位置する電極基板1a,1
bの上部には、緩衝材2a、ヒートプレート3a、発熱
体4、ヒートプレート3b、緩衝材2bを介してエアー
圧による加圧を受けるアルミ等からなるエアー圧受け用
の金属材5が載置される。金属材5は、その厚さが均一
で、受けたエアー圧を均一に電極基板1a,1bに伝え
ることができる。
Further, the uppermost electrode substrates 1a, 1
On the upper part of b, a metal material 5 for air pressure receiving, which is made of aluminum or the like and is pressed by air pressure through the cushioning material 2a, the heat plate 3a, the heating element 4, the heat plate 3b, and the cushioning material 2b, is placed. To be done. The metal material 5 has a uniform thickness and can uniformly transmit the received air pressure to the electrode substrates 1a and 1b.

【0016】また、最下部に位置する電極基板1a,1
bの下部にも、加圧台6との間に緩衝材2a、ヒートプ
レート3a、発熱体4、ヒートプレート3b、緩衝材2
bが設置されている。
Also, the electrode substrates 1a, 1 located at the bottom
The cushioning material 2a, the heat plate 3a, the heating element 4, the heat plate 3b, and the cushioning material 2 are also provided between the pressure table 6 and the lower part of b.
b is installed.

【0017】対向して配置された一対の電極基板1a,
1bの、対向する面の少なくともどちらか一方側には、
それ自身とで液晶セルを封入するための一液型熱硬化性
エポキシ接着剤を含む液晶セル用シール剤7、及び電極
基板1a,1bを点接着する熱硬化性エポキシ接着剤を
含むホットメルトタイプの接着剤ビース8が取り付けら
れている。
A pair of electrode substrates 1a arranged to face each other,
On at least one side of the facing surface of 1b,
A liquid crystal cell sealant 7 containing a one-pack type thermosetting epoxy adhesive for encapsulating a liquid crystal cell by itself, and a hot melt type containing a thermosetting epoxy adhesive for spot-bonding the electrode substrates 1a and 1b. Adhesive beads 8 are attached.

【0018】緩衝材2a,2bは薄く形成されており、
各電極基板1a,1bが受けるエアー圧による加圧力を
均一化するために設置されている。
The cushioning materials 2a and 2b are thinly formed,
The electrode substrates 1a and 1b are installed to equalize the pressure applied by the air pressure.

【0019】ヒートプレート3a,3bは、その間に配
置される面状の発熱体4の発熱を電極基板1a,1bに
対して均一に伝熱するためのものであり、伝熱性のよい
アルミ材等で形成されている。
The heat plates 3a and 3b are for uniformly transmitting the heat generated by the planar heating element 4 disposed between them to the electrode substrates 1a and 1b, and are made of an aluminum material or the like having good heat conductivity. Is formed by.

【0020】このように、本発明の実施の形態に係る液
晶素子の製造方法における液晶セル用シール剤及び接着
剤ビースの硬化工程では、貼り合わせた各電極基板1
a,1bをエアー圧で加圧しながら、各発熱体4の発熱
をヒートプレート3a,3b、緩衝材2a,2bを介し
て各電極基板1a,1bに伝熱して、液晶セル用シール
剤7及び接着剤ビース8を硬化させる。
As described above, in the step of curing the sealant for liquid crystal cells and the adhesive bead in the method for manufacturing a liquid crystal element according to the embodiment of the present invention, each electrode substrate 1 bonded together
While heating a and 1b with air pressure, the heat generated by each heating element 4 is transferred to the electrode substrates 1a and 1b through the heat plates 3a and 3b and the cushioning materials 2a and 2b, and the liquid crystal cell sealant 7 and The adhesive bead 8 is cured.

【0021】尚、緩衝材2a,2bは薄く形成され、ヒ
ートプレート3a,3bは伝熱性がよいので、発熱体4
の発熱をほとんど逃がすことなく電極基板1a,1bに
伝熱することができる。
Since the cushioning materials 2a and 2b are formed thin and the heat plates 3a and 3b have good heat conductivity, the heating element 4
It is possible to transfer heat to the electrode substrates 1a and 1b with almost no escape of heat.

【0022】次に、本発明の実施例を挙げて詳細に説明
する。
Next, examples of the present invention will be described in detail.

【0023】[0023]

【実施例】 (実施例1)上述した液晶セル用シール剤及び接着剤ビ
ースの硬化工程において、各一対の電極基板1a,1b
を構成する一方のガラス基板(板厚:1.1mm、サイ
ズ:300mm×320mm)上に、スクリーン印刷法
にて液晶セル用シール剤(例えば、三井東圧化学社製、
商品名:ストラクトボンドXN−21−F)を印刷し、
その後、平均粒径5.6μm 程度の接着剤ビース(例え
ば、東レ社製、商品名:トレパールタイプIII )を1mm
2 当たり平均170個の密度で散布した。
Example 1 In the curing process of the liquid crystal cell sealant and the adhesive bead described above, a pair of electrode substrates 1a and 1b are provided.
On one of the glass substrates (plate thickness: 1.1 mm, size: 300 mm x 320 mm) constituting the liquid crystal cell, a sealant for a liquid crystal cell (for example, manufactured by Mitsui Toatsu Chemicals, Inc.
Product name: Struct Bond XN-21-F) is printed,
After that, 1 mm of an adhesive bead having an average particle size of about 5.6 μm (for example, manufactured by Toray Industries, Inc., trade name: Trepearl Type III) is used.
Spraying was carried out at an average density of 170 pieces per 2 pieces.

【0024】また、一対の電極基板1a,1bを構成す
る他方のガラス基板(板厚は1.1mm)上に平均粒径
1.04μm 程度のスペーサー(例えば、触媒化成工業
社製、商品名:シリカマイクロビーズ)を1mm2 当たり
平均300個の密度で散布した。
A spacer having an average particle diameter of about 1.04 μm (for example, manufactured by Catalyst Kasei Kogyo Co., Ltd., trade name: on the other glass substrate (thickness is 1.1 mm) constituting the pair of electrode substrates 1a and 1b. Silica micro beads) were sprayed at an average density of 300 per 1 mm 2 .

【0025】そして、この2枚のガラス基板を貼り合わ
せて、一対の電極基板1a,1bを作成した。
Then, the two glass substrates were bonded together to form a pair of electrode substrates 1a and 1b.

【0026】そして、図1に示すように、加圧台6上に
設けた緩衝材(例えば、ブリジストン社製、商品名:エ
バーライトスコットフェルト、厚さ:1mm)2a、ヒー
トプレート(板厚が1mmのアルミ板)3a、面状の発熱
体(例えば、坂口電熱社製、商品名:サミコン230、
ワット密度:1W/cm2 )4、ヒートプレート(板厚が3
mmのアルミ板)3b、緩衝材(緩衝材2aと同じもの)
2bの上に最下部に位置する電極基板1a,1bを載置
し、最上部に位置する電極基板1a,1bとの間に設置
される複数の各電極基板1a,1b間にも同様の緩衝材
2a、ヒートプレート3a、発熱体4、ヒートプレート
3b、緩衝材2bを設け、更に、最上部に位置する電極
基板1a,1b上に設けた同様の緩衝材2a、ヒートプ
レート3a、発熱体4、ヒートプレート3b、緩衝材2
bの上にエアー圧を受ける金属材(板圧が8mmのアルミ
板)5を載置する。
As shown in FIG. 1, a cushioning material (for example, manufactured by Bridgestone Co., trade name: Everlight Scott felt, thickness: 1 mm) 2a provided on the pressure table 6 and a heat plate (plate thickness: 1 mm aluminum plate 3a, planar heating element (for example, Sakaguchi Dentsu Co., Ltd., trade name: Samicon 230,
Watt density: 1W / cm 2 ) 4, Heat plate (thickness is 3
mm aluminum plate) 3b, cushioning material (same as cushioning material 2a)
The lowermost electrode substrate 1a, 1b is placed on 2b, and a similar buffer is provided between the plurality of electrode substrates 1a, 1b installed between the uppermost electrode substrate 1a, 1b. The material 2a, the heat plate 3a, the heating element 4, the heat plate 3b, and the buffer material 2b are provided, and further, the same buffer material 2a, the heat plate 3a, and the heating element 4 provided on the uppermost electrode substrates 1a and 1b are provided. , Heat plate 3b, cushioning material 2
A metal material (aluminum plate having a plate pressure of 8 mm) 5 that receives air pressure is placed on b.

【0027】そして、これらをエアー加圧式の治具(図
示省略)内にセットし、各電極基板1a,1bに対して
エアー圧(1kg/cm2)で加圧し、各発熱体4に通電して
発熱させる。
Then, these are set in an air pressure type jig (not shown), and pressure is applied to each electrode substrate 1a, 1b by air pressure (1 kg / cm 2 ) to energize each heating element 4. To heat up.

【0028】この時、接しているヒートプレート3bの
温度が160℃に保たれるように、接続されている温度
センサ(図示省略)と温調器(図示省略)で発熱体4の
発熱を調整する。
At this time, the heat generation of the heating element 4 is adjusted by the connected temperature sensor (not shown) and temperature controller (not shown) so that the temperature of the heat plate 3b in contact therewith is maintained at 160.degree. To do.

【0029】各発熱体4の発熱は、それぞれヒートプレ
ート3a,3b、緩衝材2a,2bを介して各電極基板
1a,1bに伝熱され、電極基板1a,1bの温度が1
50℃に達するまでに10〜15分を要した。その後、
電極基板1a,1bを150℃で1時間保持した後、発
熱体4への通電をオフにして自然冷却させてから、この
治具(図示省略)内からこれらの電極基板1a,1b等
を取り出す。
The heat generated by each heating element 4 is transferred to each of the electrode substrates 1a and 1b via the heat plates 3a and 3b and the buffer materials 2a and 2b, respectively, so that the temperature of the electrode substrates 1a and 1b is 1%.
It took 10 to 15 minutes to reach 50 ° C. afterwards,
After the electrode substrates 1a and 1b are held at 150 ° C. for 1 hour, the heating element 4 is turned off and naturally cooled, and then the electrode substrates 1a and 1b are taken out from the jig (not shown). .

【0030】そして、この電極基板1a,1bを35mm
角にカットして、接着剤ビース8の接着強度を剪断法に
よって測定した。表1は、この時の接着剤ビース8の接
着強度を示す測定結果である。
Then, the electrode substrates 1a and 1b are set to 35 mm.
After cutting into corners, the adhesive strength of the adhesive bead 8 was measured by a shearing method. Table 1 shows the measurement results showing the adhesive strength of the adhesive bead 8 at this time.

【0031】[0031]

【表1】 そして、上述した本実施例による接着剤ビース8の接着
強度と、従来の液晶セル用シール剤及び接着剤ビースの
硬化工程における接着剤ビースの接着強度とを比較する
ために、下記のような比較サンプルを作成した。
[Table 1] Then, in order to compare the adhesive strength of the adhesive bead 8 according to the present embodiment described above with the adhesive strength of the adhesive bead in the curing process of the conventional liquid crystal cell sealant and adhesive bead, the following comparisons are made. I made a sample.

【0032】この比較サンプルは、上述した実施例1と
同様の方法で形成した一対の電極基板を張り合せ、この
電極基板と緩衝材とを交互に積層してオーブン内にセッ
トし、各電極基板に対して、エアー加圧式の治具による
エアー圧(1kg/cm2)で加圧した後、オーブン内を16
0℃に保温する。
In this comparative sample, a pair of electrode substrates formed by the same method as in the above-mentioned Example 1 was laminated, and the electrode substrates and the buffer material were alternately laminated and set in an oven. Against this, after pressurizing with air pressure (1 kg / cm 2 ) by an air pressure type jig,
Keep warm at 0 ° C.

【0033】この場合、この電極基板の温度が150℃
に達するまでに約3時間を要した。その後、この150
℃の温度で1時間保持した後、自然冷却させてから、こ
の電極基板を取り出す。
In this case, the temperature of this electrode substrate is 150 ° C.
It took about 3 hours to reach. Then this 150
The electrode substrate is taken out after being kept at a temperature of ° C for 1 hour and then naturally cooled.

【0034】そして、この電極基板を35mm角にカット
して、同様に接着剤ビースの接着強度を剪断法によって
測定した。表2は、この時の接着剤ビースの接着強度を
示す測定結果である。
Then, this electrode substrate was cut into a 35 mm square and the adhesive strength of the adhesive bead was similarly measured by the shearing method. Table 2 shows the measurement results showing the adhesive strength of the adhesive bead at this time.

【0035】[0035]

【表2】 この比較結果から明らかなように、表1に示す実施例1
における接着剤ビースは、発熱体4の発熱がヒートプレ
ート3a、緩衝材2a,2bを介して電極基板1a,1
bの全面に直接伝熱されることによって、電極基板1
a,1bの温度分布が均一になり、また、昇温時間も早
いため、各サンプルとも安定した強い接着強度(剪断強
度)が得られている。
[Table 2] As is clear from this comparison result, Example 1 shown in Table 1
In the adhesive bead in, the heat generated by the heating element 4 is transmitted through the heat plate 3a and the cushioning materials 2a, 2b to the electrode substrates 1a, 1
By directly transferring heat to the entire surface of b, the electrode substrate 1
Since the temperature distributions of a and 1b are uniform and the temperature rising time is short, stable strong adhesive strength (shear strength) is obtained for each sample.

【0036】これに対し、表2に示す比較のために作成
した従来の硬化工程による接着剤ビースは、オーブンで
加熱するために電極基板の内側より外側の方が温度が高
くなり(温度分布が不均一)、また、昇温時間も遅いた
め、極端に接着強度の低い部分が存在し、そのサンプル
(表2のサンプルNO. 1、2)に関しては、接着強度
(剪断強度)の測定が不可能であり、各サンプルの接着
強度(剪断強度)の平均値も実施例1よりも低かった。
尚、表2で示した従来工程による接着剤ビースの接着強
度の平均値は、接着強度(剪断強度)を測定できたもの
に関してのみの値である。
On the other hand, in the adhesive bead produced by the conventional curing process prepared for comparison shown in Table 2, the temperature is higher on the outside of the electrode substrate than on the inside of the electrode substrate (the temperature distribution is In addition, since the temperature rise time is slow, there is a portion with extremely low adhesive strength, and the adhesive strength (shear strength) of the sample (Sample No. 1 and 2 in Table 2) cannot be measured. It was possible, and the average value of the adhesive strength (shear strength) of each sample was also lower than that of Example 1.
The average value of the adhesive strength of the adhesive bead according to the conventional process shown in Table 2 is a value only for the adhesive strength (shear strength) that can be measured.

【0037】(実施例2)本実施例では、図1におい
て、各一対の電極基板1a,1bを構成する一方のガラ
ス基板(板厚:1.1mm)上に、スクリーン印刷法にて
液晶セル用シール剤(例えば、三井東圧化学社製、商品
名:ストラクトボンドXN−21−F)を印刷し、その
後、平均粒径5.6μm 程度の接着剤ビース(例えば、
東レ社製、商品名:トレパールタイプIII )を1mm2
たり平均80個の密度で散布した。
(Embodiment 2) In this embodiment, a liquid crystal cell is screen-printed on one glass substrate (plate thickness: 1.1 mm) constituting each pair of electrode substrates 1a and 1b in FIG. Sealant (for example, manufactured by Mitsui Toatsu Chemical Co., Inc., trade name: Structbond XN-21-F) is printed, and then an adhesive bead having an average particle size of about 5.6 μm (for example,
Toray's trade name: Trepearl Type III) was sprayed at an average density of 80 pieces per 1 mm 2 .

【0038】また、各一対の電極基板1a,1bを構成
する他方のガラス基板(板厚は1.1mm)上に平均粒径
1.04μm 程度のスペーサー(例えば、触媒化成工業
社製、商品名:シリカマイクロビーズ)を1mm2 当たり
平均300個の密度で散布した。
A spacer having an average particle diameter of about 1.04 μm (for example, a product name of Catalyst Kasei Kogyo Co., Ltd.) is formed on the other glass substrate (thickness is 1.1 mm) constituting each pair of electrode substrates 1a and 1b. : Silica micro beads) were sprayed at an average density of 300 per 1 mm 2 .

【0039】そして、この2枚のガラス基板を貼り合わ
せて、一対の電極基板1a,1bを作成した。
Then, the two glass substrates were bonded together to form a pair of electrode substrates 1a and 1b.

【0040】そして、この電極基板1a,1bを実施例
1と同様の方法で硬化処理した後、下記の相転移温度を
示すピリミジン系の強誘電性液晶を注入して、図2に示
すような液晶パネル10を作成した。
Then, after the electrode substrates 1a and 1b are cured by the same method as in Example 1, a pyrimidine-based ferroelectric liquid crystal exhibiting the following phase transition temperature is injected, and as shown in FIG. A liquid crystal panel 10 was created.

【0041】 そして、上述した本実施例による電気実装を施した液晶
パネル10と、実施例1の従来の液晶セル用シール剤及
び接着剤ビースの硬化方法で貼り合わせた電極基板に、
上述した強誘電性液晶を注入し電気実装を施して作成し
た比較サンプルの液晶パネルとの耐衝撃試験を、50G
の落下試験によって行った。
[0041] Then, the liquid crystal panel 10 which is electrically mounted according to the above-described embodiment and the electrode substrate bonded by the conventional method for curing the liquid crystal cell sealant and the adhesive bead of the first embodiment,
A shock resistance test with a liquid crystal panel of a comparative sample prepared by injecting the above-mentioned ferroelectric liquid crystal and performing electrical mounting was performed at 50 G.
The drop test was performed.

【0042】この落下試験(耐衝撃試験)の結果、本実
施例による液晶パネル10の液晶の配向に乱れは認めら
れなかったが、図2に示すように比較サンプルの液晶パ
ネルは、表示面11の両サイド11a,11b(斜線部
分)に位置する液晶の配向に乱れが生じた。
As a result of this drop test (shock resistance test), no disorder was observed in the alignment of the liquid crystal of the liquid crystal panel 10 according to this example. However, as shown in FIG. Disturbance occurred in the alignment of the liquid crystal located on both sides 11a, 11b (hatched portions).

【0043】このように、本実施の形態に係る液晶セル
用シール剤及び接着剤ビースの硬化工程により、硬化処
理の時間の短縮化と、接着剤ビースの接着強度を上げて
液晶素子の耐衝撃性の向上を図ることができる。
As described above, the curing process of the liquid crystal cell sealant and the adhesive bead according to the present embodiment shortens the curing time and increases the adhesive strength of the adhesive bead to increase the impact resistance of the liquid crystal element. It is possible to improve the sex.

【0044】また、ヒートプレート3a,3bを用いず
に発熱体4を、一対の電極基板1a,1b上に緩衝材2
a,2bを介して設置して、電極基板1a,1bを加熱
するようにしてもよい。
Further, the heating element 4 is provided on the pair of electrode substrates 1a and 1b without using the heat plates 3a and 3b.
The electrode substrates 1a and 1b may be heated by installing them via a and 2b.

【0045】[0045]

【発明の効果】以上説明したように、本発明によると、
液晶セル用シール剤及び接着剤ビースの硬化工程におい
て、一対の電極基板に発熱体を取り付け、発熱体の発熱
により一対の電極基板を加熱して液晶セル用シール剤及
び接着剤ビースを硬化させることにより、電極基板の全
面が均一に加熱され、且つ昇温時間を早くすることがで
きる。
As described above, according to the present invention,
In the process of curing the liquid crystal cell sealant and the adhesive bead, the heating elements are attached to the pair of electrode substrates, and the pair of electrode substrates are heated by the heat generated by the heat generator to cure the liquid crystal cell sealant and the adhesive bead. Thereby, the entire surface of the electrode substrate is uniformly heated, and the temperature rising time can be shortened.

【0046】従って、十分な接着剤ビースの接着強度が
得られることにより、作成される液晶素子の耐衝撃性を
高めることができ、また、硬化処理時間が短縮化される
ことによって、液晶素子の製造効率の向上を図ることが
できる。
Therefore, by obtaining a sufficient adhesive strength of the adhesive bead, it is possible to enhance the impact resistance of the liquid crystal element to be produced, and by shortening the curing processing time, the liquid crystal element The manufacturing efficiency can be improved.

【0047】また、大面積の電極基板に対してもそれに
合わせた発熱体を使用するだけでよいので、従来のよう
に電極基板を加熱するための大型のオーブン等の設備が
不要となり、コストの低減を図ることができる。
Further, since it is only necessary to use a heating element suitable for a large-area electrode substrate, equipment such as a large oven for heating the electrode substrate unlike the prior art is not required, resulting in cost reduction. It can be reduced.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施の形態に係る液晶セル用シール剤
及び接着剤ビースの硬化工程を示す概略断面図。
FIG. 1 is a schematic cross-sectional view showing a step of curing a liquid crystal cell sealant and an adhesive bead according to an embodiment of the present invention.

【図2】比較サンプル用に作成した液晶パネルの落下試
験による液晶の配向の乱れを模式的に示した図。
FIG. 2 is a diagram schematically showing disorder of liquid crystal alignment due to a drop test of a liquid crystal panel prepared for a comparative sample.

【符号の説明】[Explanation of symbols]

1a,1b 電極基板 2a,2b 緩衝材 3a,3b ヒートプレート 4 発熱体 5 金属材 7 液晶セル用シール剤 8 接着剤ビース 10 液晶パネル 1a, 1b Electrode substrate 2a, 2b Buffer material 3a, 3b Heat plate 4 Heating element 5 Metal material 7 Liquid crystal cell sealant 8 Adhesive bead 10 Liquid crystal panel

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 液晶がその間に注入される対向する一対
の電極基板の貼り合わせ面に、前記一対の電極基板とそ
れ自身とで前記液晶を封入する液晶セル用シール剤、及
び前記一対の電極基板を接着する接着剤ビースを取り付
けて前記一対の電極基板を貼り合わせ、前記一対の電極
基板を加熱、加圧して前記液晶セル用シール剤及び接着
剤ビースを硬化させる硬化工程を少なくとも有する液晶
素子の製造方法において、 前記硬化工程にて、前記一対の電極基板に発熱体を取り
付け、前記発熱体の発熱により前記一対の電極基板を加
熱して前記接着剤ビースを硬化させる、 ことを特徴とする液晶素子の製造方法。
1. A sealant for a liquid crystal cell, which seals the liquid crystal between the pair of electrode substrates and itself on a bonding surface of a pair of opposite electrode substrates into which liquid crystal is injected, and the pair of electrodes. A liquid crystal device having at least a curing step of attaching an adhesive bead for adhering substrates and bonding the pair of electrode substrates together, and heating and pressurizing the pair of electrode substrates to cure the liquid crystal cell sealant and the adhesive bead. In the manufacturing method, the heating step is attached to the pair of electrode substrates in the curing step, and the pair of electrode substrates is heated by the heat generated by the heating elements to cure the adhesive bead. Liquid crystal device manufacturing method.
【請求項2】 前記発熱体は、面状に形成され前記電極
基板に対応した大きさである、 請求項1記載の液晶素子の製造方法。
2. The method for manufacturing a liquid crystal element according to claim 1, wherein the heating element is formed in a planar shape and has a size corresponding to the electrode substrate.
【請求項3】 前記発熱体は、前記一対の電極基板上の
両面に均熱用のヒータプレートと緩衝材を介して取り付
けられる、 請求項1又は2記載の液晶素子の製造方法。
3. The method of manufacturing a liquid crystal element according to claim 1, wherein the heating element is attached to both surfaces of the pair of electrode substrates via a heater plate for soaking and a buffer material.
【請求項4】 前記電極基板は、多段に複数設置されて
いる、 請求項1乃至3のいずれか1項記載の液晶素子の製造方
法。
4. The method for manufacturing a liquid crystal element according to claim 1, wherein a plurality of the electrode substrates are installed in multiple stages.
【請求項5】 前記シール剤は、一液型熱硬化性エポキ
シ接着剤を含んでいる、 請求項1記載の液晶素子の製造方法。
5. The method for manufacturing a liquid crystal element according to claim 1, wherein the sealant contains a one-component thermosetting epoxy adhesive.
【請求項6】 前記接着剤ビースは、前記一対の電極基
板を点接着する熱硬化性エポキシ接着剤を含むホットメ
ルトタイプである、 請求項1記載の液晶素子の製造方法。
6. The method of manufacturing a liquid crystal element according to claim 1, wherein the adhesive bead is a hot-melt type including a thermosetting epoxy adhesive for spot-bonding the pair of electrode substrates.
JP19382895A 1995-07-28 1995-07-28 Manufacturing method of liquid crystal element Expired - Fee Related JP3214303B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP19382895A JP3214303B2 (en) 1995-07-28 1995-07-28 Manufacturing method of liquid crystal element
US08/687,990 US5942066A (en) 1995-07-28 1996-07-29 Process for producing liquid crystal device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19382895A JP3214303B2 (en) 1995-07-28 1995-07-28 Manufacturing method of liquid crystal element

Publications (2)

Publication Number Publication Date
JPH0943613A true JPH0943613A (en) 1997-02-14
JP3214303B2 JP3214303B2 (en) 2001-10-02

Family

ID=16314426

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19382895A Expired - Fee Related JP3214303B2 (en) 1995-07-28 1995-07-28 Manufacturing method of liquid crystal element

Country Status (1)

Country Link
JP (1) JP3214303B2 (en)

Also Published As

Publication number Publication date
JP3214303B2 (en) 2001-10-02

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