JPH09326352A - 照明光学装置 - Google Patents

照明光学装置

Info

Publication number
JPH09326352A
JPH09326352A JP8163848A JP16384896A JPH09326352A JP H09326352 A JPH09326352 A JP H09326352A JP 8163848 A JP8163848 A JP 8163848A JP 16384896 A JP16384896 A JP 16384896A JP H09326352 A JPH09326352 A JP H09326352A
Authority
JP
Japan
Prior art keywords
light source
lens
lens element
lens elements
section
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP8163848A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09326352A5 (enExample
Inventor
Osamu Tanitsu
修 谷津
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP8163848A priority Critical patent/JPH09326352A/ja
Publication of JPH09326352A publication Critical patent/JPH09326352A/ja
Publication of JPH09326352A5 publication Critical patent/JPH09326352A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP8163848A 1996-06-04 1996-06-04 照明光学装置 Withdrawn JPH09326352A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8163848A JPH09326352A (ja) 1996-06-04 1996-06-04 照明光学装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8163848A JPH09326352A (ja) 1996-06-04 1996-06-04 照明光学装置

Publications (2)

Publication Number Publication Date
JPH09326352A true JPH09326352A (ja) 1997-12-16
JPH09326352A5 JPH09326352A5 (enExample) 2004-11-04

Family

ID=15781911

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8163848A Withdrawn JPH09326352A (ja) 1996-06-04 1996-06-04 照明光学装置

Country Status (1)

Country Link
JP (1) JPH09326352A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6452661B1 (en) 1998-02-27 2002-09-17 Nikon Corporation Illumination system and exposure apparatus and method
CN103309139A (zh) * 2012-03-09 2013-09-18 索尼公司 照明装置和显示器

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6452661B1 (en) 1998-02-27 2002-09-17 Nikon Corporation Illumination system and exposure apparatus and method
US6665051B2 (en) 1998-02-27 2003-12-16 Nikon Corporation Illumination system and exposure apparatus and method
US7023953B2 (en) 1998-02-27 2006-04-04 Nikon Corporation Illumination system and exposure apparatus and method
CN103309139A (zh) * 2012-03-09 2013-09-18 索尼公司 照明装置和显示器
JP2013186366A (ja) * 2012-03-09 2013-09-19 Sony Corp 照明装置および表示装置
KR20130103370A (ko) * 2012-03-09 2013-09-23 소니 주식회사 조명 장치 및 표시 장치

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