JPH09306802A - 投影露光装置 - Google Patents

投影露光装置

Info

Publication number
JPH09306802A
JPH09306802A JP8116249A JP11624996A JPH09306802A JP H09306802 A JPH09306802 A JP H09306802A JP 8116249 A JP8116249 A JP 8116249A JP 11624996 A JP11624996 A JP 11624996A JP H09306802 A JPH09306802 A JP H09306802A
Authority
JP
Japan
Prior art keywords
substrate
alignment
substrate stage
reference member
mark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8116249A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09306802A5 (enrdf_load_html_response
Inventor
Masakazu Murakami
雅一 村上
Hiroshi Shirasu
廣 白数
Tomohide Hamada
智秀 浜田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP8116249A priority Critical patent/JPH09306802A/ja
Priority to KR1019970015201A priority patent/KR970077111A/ko
Priority to US08/853,389 priority patent/US5920378A/en
Publication of JPH09306802A publication Critical patent/JPH09306802A/ja
Publication of JPH09306802A5 publication Critical patent/JPH09306802A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP8116249A 1995-03-14 1996-05-10 投影露光装置 Pending JPH09306802A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP8116249A JPH09306802A (ja) 1996-05-10 1996-05-10 投影露光装置
KR1019970015201A KR970077111A (ko) 1996-05-10 1997-04-23 투영 노광 장치
US08/853,389 US5920378A (en) 1995-03-14 1997-05-09 Projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8116249A JPH09306802A (ja) 1996-05-10 1996-05-10 投影露光装置

Publications (2)

Publication Number Publication Date
JPH09306802A true JPH09306802A (ja) 1997-11-28
JPH09306802A5 JPH09306802A5 (enrdf_load_html_response) 2004-11-18

Family

ID=14682467

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8116249A Pending JPH09306802A (ja) 1995-03-14 1996-05-10 投影露光装置

Country Status (2)

Country Link
JP (1) JPH09306802A (enrdf_load_html_response)
KR (1) KR970077111A (enrdf_load_html_response)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015513219A (ja) * 2012-03-08 2015-04-30 マッパー・リソグラフィー・アイピー・ビー．ブイ． ウェーハなどのターゲットを処理するためのリソグラフィシステム及び方法
JP2015198202A (ja) * 2014-04-02 2015-11-09 キヤノン株式会社 露光装置および物品製造方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101227290B1 (ko) * 2004-06-09 2013-01-29 가부시키가이샤 니콘 기판 유지 장치 및 그것을 구비하는 노광 장치, 노광 방법,디바이스 제조 방법, 그리고 발액 플레이트
KR101364347B1 (ko) * 2004-10-15 2014-02-18 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
CN101598903A (zh) * 2004-11-01 2009-12-09 株式会社尼康 曝光装置及曝光方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015513219A (ja) * 2012-03-08 2015-04-30 マッパー・リソグラフィー・アイピー・ビー．ブイ． ウェーハなどのターゲットを処理するためのリソグラフィシステム及び方法
JP2015198202A (ja) * 2014-04-02 2015-11-09 キヤノン株式会社 露光装置および物品製造方法

Also Published As

Publication number Publication date
KR970077111A (ko) 1997-12-12

Similar Documents

Publication Publication Date Title
JP3203719B2 (ja) 露光装置、その露光装置により製造されるデバイス、露光方法、およびその露光方法を用いたデバイス製造方法
US6727978B2 (en) Projection exposure apparatus and projection exposure method
KR100524266B1 (ko) 리소그래피 투영 장치
JP2829642B2 (ja) 露光装置
WO2007043535A1 (ja) 光学特性計測方法、露光方法及びデバイス製造方法、並びに検査装置及び計測方法
KR20020011864A (ko) 스테이지 장치, 계측장치 및 계측방법, 노광장치 및노광방법
JP2610815B2 (ja) 露光方法
TW201101369A (en) Exposure method and device manufacturing method, and overlay error measuring method
US5812271A (en) Reticle pre-alignment apparatus and method thereof
US5920378A (en) Projection exposure apparatus
JPH10144598A (ja) 走査型露光装置及びそれを用いたデバイスの製造方法
JPH09306802A (ja) 投影露光装置
US4007988A (en) Manufacture of multi-layer structures
EP1118835B1 (en) Clearance measuring device and method for exposure
WO2022160564A1 (zh) 控片量测方法及量测装置
JPH09246168A (ja) 走査型露光装置および方法ならびに該装置を用いてデバイスを製造する方法
JP3204253B2 (ja) 露光装置及びその露光装置により製造されたデバイス、並びに露光方法及びその露光方法を用いてデバイスを製造する方法
KR100301139B1 (ko) 투영노광장치및방법
JP2000106345A (ja) 露光装置及びその露光装置により製造されたデバイス、並びに露光方法及びその露光方法を用いたデバイス製造方法
USRE37359E1 (en) Projection exposure method and apparatus capable of performing focus detection with high accuracy
KR100446653B1 (ko) 웨이퍼 정렬기와 이를 이용한 웨이퍼 정렬 방법
US4050817A (en) Manufacture of multi-layer structures
JPH0766115A (ja) 露光装置
US6320659B1 (en) Clearance measuring device and method for exposure
JPH1152545A (ja) レチクルおよびそれによって転写されたパターンならびにレチクルと半導体ウエハとの位置合わせ方法

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20041109

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20061024

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20070612