JPH09304917A - 露光方法 - Google Patents

露光方法

Info

Publication number
JPH09304917A
JPH09304917A JP14351696A JP14351696A JPH09304917A JP H09304917 A JPH09304917 A JP H09304917A JP 14351696 A JP14351696 A JP 14351696A JP 14351696 A JP14351696 A JP 14351696A JP H09304917 A JPH09304917 A JP H09304917A
Authority
JP
Japan
Prior art keywords
pattern
light
mask
exposure
reticle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14351696A
Other languages
English (en)
Japanese (ja)
Other versions
JPH09304917A5 (enExample
Inventor
Tsuneo Miyai
恒夫 宮井
Nobutaka Umagome
伸貴 馬込
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP14351696A priority Critical patent/JPH09304917A/ja
Publication of JPH09304917A publication Critical patent/JPH09304917A/ja
Publication of JPH09304917A5 publication Critical patent/JPH09304917A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP14351696A 1996-05-14 1996-05-14 露光方法 Pending JPH09304917A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14351696A JPH09304917A (ja) 1996-05-14 1996-05-14 露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14351696A JPH09304917A (ja) 1996-05-14 1996-05-14 露光方法

Publications (2)

Publication Number Publication Date
JPH09304917A true JPH09304917A (ja) 1997-11-28
JPH09304917A5 JPH09304917A5 (enExample) 2004-08-26

Family

ID=15340565

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14351696A Pending JPH09304917A (ja) 1996-05-14 1996-05-14 露光方法

Country Status (1)

Country Link
JP (1) JPH09304917A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007052187A (ja) * 2005-08-17 2007-03-01 Sk Electronics:Kk フォトマスク及びレンズ
JP2009116268A (ja) * 2007-11-09 2009-05-28 V Technology Co Ltd フォトマスク及びそれを使用した凸状パターン形成方法
JP2009277900A (ja) * 2008-05-15 2009-11-26 V Technology Co Ltd 露光装置及びフォトマスク
CN109799673A (zh) * 2019-01-04 2019-05-24 合肥鑫晟光电科技有限公司 一种掩膜板及其制备方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007052187A (ja) * 2005-08-17 2007-03-01 Sk Electronics:Kk フォトマスク及びレンズ
JP2009116268A (ja) * 2007-11-09 2009-05-28 V Technology Co Ltd フォトマスク及びそれを使用した凸状パターン形成方法
JP2009277900A (ja) * 2008-05-15 2009-11-26 V Technology Co Ltd 露光装置及びフォトマスク
CN109799673A (zh) * 2019-01-04 2019-05-24 合肥鑫晟光电科技有限公司 一种掩膜板及其制备方法
CN109799673B (zh) * 2019-01-04 2022-09-23 合肥鑫晟光电科技有限公司 一种掩膜板及其制备方法

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