JPH09288275A - Method for removing oriented film and device for removing oriented film - Google Patents
Method for removing oriented film and device for removing oriented filmInfo
- Publication number
- JPH09288275A JPH09288275A JP10121996A JP10121996A JPH09288275A JP H09288275 A JPH09288275 A JP H09288275A JP 10121996 A JP10121996 A JP 10121996A JP 10121996 A JP10121996 A JP 10121996A JP H09288275 A JPH09288275 A JP H09288275A
- Authority
- JP
- Japan
- Prior art keywords
- alignment film
- film
- substrate
- elastic body
- oriented film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 67
- 239000000758 substrate Substances 0.000 claims abstract description 41
- 229920005989 resin Polymers 0.000 claims abstract description 22
- 239000011347 resin Substances 0.000 claims abstract description 22
- 239000000463 material Substances 0.000 claims abstract description 21
- 239000004973 liquid crystal related substance Substances 0.000 claims abstract description 19
- 238000004140 cleaning Methods 0.000 claims description 15
- 239000002861 polymer material Substances 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 239000013013 elastic material Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 176
- 241001422033 Thestylus Species 0.000 description 12
- 239000000523 sample Substances 0.000 description 11
- 239000010409 thin film Substances 0.000 description 8
- 238000005259 measurement Methods 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 7
- 238000007645 offset printing Methods 0.000 description 4
- 238000000691 measurement method Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000002952 polymeric resin Substances 0.000 description 2
- 238000004080 punching Methods 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000572 ellipsometry Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000007726 management method Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
Landscapes
- A Measuring Device Byusing Mechanical Method (AREA)
- Liquid Crystal (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、液晶表示素子に用
いられる基板上に形成された配向膜の膜厚を触針法によ
って測定する際に、配向膜のみを選択的に除去する配向
膜除去方法及び配向膜除去装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to removal of an alignment film, which selectively removes only the alignment film when the film thickness of the alignment film formed on a substrate used for a liquid crystal display device is measured by a stylus method. A method and an alignment film removing apparatus.
【0002】[0002]
【従来の技術】液晶表示素子の構造は、図5に示される
ように、ITO(Indium Tin Oxide)や透明樹脂等から成
る絶縁膜等の下層膜22及び液晶分子の配向方向を規定
する配向膜23が形成された一対の基板21によって液
晶24を挾持し、周囲をシール剤25で封止するもので
ある。前記配向膜23はポリイミド等の高分子材料から
なっており、液晶と接する最上層に形成されている。こ
の配向膜23は、一般にはオフセット印刷法やスピン塗
布法等によって形成される。2. Description of the Related Art As shown in FIG. 5, a structure of a liquid crystal display device is such that an underlayer film 22 such as an insulating film made of ITO (Indium Tin Oxide) or a transparent resin and an alignment film for defining the alignment direction of liquid crystal molecules. The liquid crystal 24 is held between a pair of substrates 21 on which the liquid crystal 23 is formed, and the periphery is sealed with a sealant 25. The alignment film 23 is made of a polymer material such as polyimide and is formed in the uppermost layer in contact with the liquid crystal. The alignment film 23 is generally formed by an offset printing method, a spin coating method, or the like.
【0003】前記配向膜23にはラビング法等によって
配向処理がなされており、これによって該配向膜に接す
る液晶分子の配向方向を規定させている。The alignment film 23 is subjected to an alignment treatment by a rubbing method or the like, which defines the alignment direction of liquid crystal molecules in contact with the alignment film.
【0004】前記配向処理を適切に行い、液晶表示素子
として良好な表示品位を得るためには、配向処理に先立
つ配向膜形成時点においても、種々のプロセスを最適化
し、これを維持管理する必要がある。特に、配向膜の膜
厚管理は、それが液晶分子のプレティルト角等の配向特
性に大きな影響を及ぼすため、非常に重要な項目の一つ
であり、配向膜の膜厚の簡便かつ信頼性の高い測定方法
は常に要求されているところである。In order to properly perform the above-mentioned alignment treatment and obtain good display quality as a liquid crystal display element, it is necessary to optimize various processes and maintain them even at the time of forming the alignment film prior to the alignment treatment. is there. In particular, the control of the film thickness of the alignment film is one of the very important items because it has a great influence on the alignment characteristics such as the pretilt angle of liquid crystal molecules. High measurement methods are always required.
【0005】この膜厚は、走査型電子顕微鏡を用いれば
非常に精度の高い膜厚測定をすることが可能であるが、
装置が大掛かりなものであり、大変高価なものであると
いう点から、配向膜の膜厚管理に用いるのは現実的でな
い。This film thickness can be measured with extremely high accuracy by using a scanning electron microscope.
Since the device is large-scale and very expensive, it is not realistic to use it for controlling the film thickness of the alignment film.
【0006】従来から用いられている他の薄膜の膜厚測
定方法としては、エリプソメトリー法等のように、光を
プローブとして利用し、既知の光学定数を有する対象膜
の透過或いは反射特性を測定し、得られた情報から膜厚
を算出する方法がある。この方法では、対象膜の膜厚を
非接触・非破壊で測定することができるため、膜厚測定
後においてもその後の工程に影響を与えることがないと
いう利点を有している。As another method for measuring the thickness of a thin film, which has been conventionally used, light is used as a probe to measure the transmission or reflection characteristics of a target film having a known optical constant, such as the ellipsometry method. Then, there is a method of calculating the film thickness from the obtained information. This method has an advantage that the film thickness of the target film can be measured in a non-contact and non-destructive manner, and therefore even after the film thickness is measured, the subsequent steps are not affected.
【0007】ところが、光をプローブとして利用する方
法においては、対象膜の光学定数を予め把握しておく必
要があるが、通常前記配向膜は膜厚が数百オングストロ
ーム以下の極薄膜であり、これが透明電極、絶縁膜等が
多数形成された多積層基板上に形成されているので、焼
成の際に光学定数が変動する恐れがある。さらに、基板
全体として非常に複雑な光学系を成しているので、プロ
ーブから得られる光学特性を正確に解釈することが困難
な場合が多い。したがって、膜厚を決定するために必須
である光学定数の信頼性が得られないために、その測定
値の信頼性が低下してしまう。さらに、液晶表示素子に
形成されている薄膜は、その光学特性ができるだけ近い
ものを積層させているので、これらの差を正確に読み取
るためにはかなりの精度が要求される。したがって、こ
れらの難点を克服するためには、かなりの設備と時間と
を要するという問題点を有していた。However, in the method of using light as a probe, it is necessary to know the optical constant of the target film in advance. Normally, the alignment film is an ultrathin film having a film thickness of several hundred angstroms or less. Since it is formed on a multi-layered substrate on which a large number of transparent electrodes, insulating films, etc. are formed, the optical constant may change during firing. Further, since the substrate as a whole constitutes a very complicated optical system, it is often difficult to accurately interpret the optical characteristics obtained from the probe. Therefore, the reliability of the optical constant, which is indispensable for determining the film thickness, cannot be obtained, so that the reliability of the measured value decreases. Further, the thin films formed on the liquid crystal display element are laminated so that the optical characteristics thereof are as close as possible, so that considerable accuracy is required to read these differences accurately. Therefore, there is a problem in that considerable equipment and time are required to overcome these difficulties.
【0008】さらに他の薄膜の膜厚測定方法としては、
対象膜の一部をカッターナイフによって除去し、押圧を
かけたプローブを対象膜の残存部と除去部との間の段差
を含む領域に接触させながら前記段差を横切るように走
査し、この段差による針の変位量から膜厚を算出する触
針法がある。Still another thin film thickness measuring method is as follows:
A part of the target film is removed by a cutter knife, and the probe is pressed against a region including a step between the remaining part and the removed part of the target film, and scanning is performed so as to cross the step. There is a stylus method that calculates the film thickness from the amount of displacement of the needle.
【0009】この触針法を利用する場合、配向膜に除去
部が形成されてしまうため、その後のラビング処理時に
ラビング不良が発生してしまうので全ての基板に適用す
ることはできない。しかしながら、一般に上述したよう
なオフセット印刷法やスピン塗布法等によって形成され
た薄膜の膜厚を管理する場合、これらの方法では1枚ず
つの基板に対する膜厚のバラツキは発生しにくく、数時
間程度のある期間毎に対するバラツキの方が発生しやす
いため、所定期間毎に抜き打ちで1枚の基板を抜き取
り、この基板に対して膜厚を測定して管理する方法がと
られる。When this stylus method is used, a removed portion is formed in the alignment film, and rubbing failure occurs during the subsequent rubbing process, so that it cannot be applied to all substrates. However, in general, when controlling the film thickness of the thin film formed by the offset printing method or the spin coating method as described above, it is difficult for these methods to cause the variation in the film thickness for each substrate, and it takes about several hours. Since a variation with respect to each certain period is more likely to occur, a method is adopted in which one substrate is extracted by punching every predetermined period, and the film thickness of this substrate is measured and controlled.
【0010】前記触針法においては、光をプローブとし
て利用する方法に比べて簡便に測定することができると
いう利点を有している。The stylus method has an advantage that measurement can be performed more easily than a method using light as a probe.
【0011】[0011]
【発明が解決しようとする課題】しかしながら、上述し
た触針法によって液晶表示素子の基板上に形成された配
向膜の膜厚を測定しようとする場合、以下のような問題
点があった。However, when the film thickness of the alignment film formed on the substrate of the liquid crystal display element is to be measured by the above-mentioned stylus method, there are the following problems.
【0012】通常配向膜の下層には透明樹脂層等から成
る薄膜が形成されているため、カッターナイフによって
配向膜を除去する際に、カッターの刃先が下層膜にまで
達してしまい、配向膜のみを除去することが非常に困難
であり、測定値の信頼性が低下してしまうという問題点
を有していた。Since a thin film made of a transparent resin layer or the like is usually formed in the lower layer of the alignment film, the blade edge of the cutter reaches the lower layer film when the alignment film is removed by a cutter knife, and only the alignment film is formed. Was very difficult to remove, and there was the problem that the reliability of the measured values was reduced.
【0013】この触針法における問題点に対し、特開平
3−150894号公報では、多層薄膜回路基板の膜厚
管理方法において、成膜時にビアホールと同時に膜厚チ
ェック用ホールを形成する方法が開示されているが、通
常液晶表示素子に形成される配向膜にはホールを形成す
る必要がないため、新たに膜厚チェック用ホールを形成
しようとするとその分工程数が増加し、簡便でなくなる
という問題点を有している。また、オフセット印刷法を
用いる場合、予め膜厚チェック用ホールが形成されるよ
うな判を用いてパターニングすることも考えられるが、
上述したようにラビング処理時にラビング不良を起こし
てしまうという問題点を有している。さらに、所定の期
間毎に抜き打ちで膜厚を測定するときのみに膜厚チェッ
ク用ホールが形成されるような判を用いてパターニング
することも考えられるが、オフセット印刷法を用いて薄
膜を形成する場合、判を交換するときにも形成される薄
膜の膜厚は変動しやすいので、測定値の信頼性が全くな
くなってしまうという問題点を有している。To solve the problem in the stylus method, Japanese Patent Laid-Open No. 3-150894 discloses a method of forming a film thickness check hole at the same time as a via hole during film formation in a film thickness management method for a multilayer thin film circuit board. However, since it is not necessary to form a hole in the alignment film that is usually formed in the liquid crystal display element, if a new film thickness check hole is attempted to be formed, the number of steps increases correspondingly, which is not convenient. I have a problem. Further, when using the offset printing method, it is possible to perform patterning by using a format in which a film thickness check hole is formed in advance.
As described above, there is a problem that rubbing failure occurs during the rubbing process. Further, it is conceivable that patterning is performed using a format in which a film thickness check hole is formed only when the film thickness is measured by punching every predetermined period, but a thin film is formed using the offset printing method. In this case, the film thickness of the thin film formed tends to fluctuate even when the format is exchanged, so that there is a problem that the reliability of the measured value is completely lost.
【0014】また、プラズマエッチングによって前記配
向膜の一部を除去する方法も考えられるが、装置が大掛
かりなものとなり、コスト面や簡便さという点から、配
向膜の膜厚管理に用いるのは実現的でない。Further, a method of removing a part of the alignment film by plasma etching can be considered, but it requires a large-scale apparatus and is used for controlling the film thickness of the alignment film in terms of cost and simplicity. Not relevant.
【0015】本発明は、上記の問題点に鑑みなされたも
のであり、液晶表示素子の配向膜の膜厚を測定するにあ
たって、簡便さという触針法の利点を活かしつつ、かつ
信頼性よく測定するために、配向膜のみを選択的に除去
することを可能とする配向膜除去方法及び配向膜除去装
置を提供するものである。The present invention has been made in view of the above problems, and in measuring the film thickness of the alignment film of a liquid crystal display element, the advantage of the stylus method of simplicity is utilized, and the measurement is performed reliably. In order to do so, the present invention provides an alignment film removing method and an alignment film removing apparatus that can selectively remove only the alignment film.
【0016】[0016]
【課題を解決するための手段】本発明の請求項1記載の
配向膜除去方法は、液晶表示装置に用いる基板に形成さ
れた高分子材料からなる配向膜の膜厚を触針法によって
測定する際に、前記配向膜を除去する方法であって、樹
脂材料からなる弾性体を前記配向膜に接触させ、該弾性
体を摺動させることによって前記配向膜の一部を除去す
る第1の工程と、前記第1の工程によって生じた配向膜
の除去部を洗浄する第2の工程と、を含むことを特徴と
するものである。In the method for removing an alignment film according to claim 1 of the present invention, the film thickness of an alignment film made of a polymer material formed on a substrate used in a liquid crystal display device is measured by a stylus method. At this time, a method of removing the alignment film, which is a first step of removing a part of the alignment film by bringing an elastic body made of a resin material into contact with the alignment film and sliding the elastic body. And a second step of cleaning the removed portion of the alignment film generated by the first step.
【0017】本発明の請求項2記載の配向膜除去方法
は、請求項1記載の配向膜除去方法において、前記第1
の工程において、樹脂材料からなる弾性体を用いて前記
配向膜の一部を除去する際に、前記樹脂材料からなる弾
性体と前記配向膜との間にスリット状のくりぬき部を有
するプレートを介在させ、該スリット状のくりぬき部を
介して前記弾性体を前記配向膜に接触、摺動させること
を特徴とするものである。The method for removing an alignment film according to a second aspect of the present invention is the method for removing an alignment film according to the first aspect, wherein:
In the step of (1), when a part of the alignment film is removed using an elastic body made of a resin material, a plate having a slit-shaped hollow portion is interposed between the elastic body made of the resin material and the alignment film. Then, the elastic body is brought into contact with and slid on the alignment film through the slit-shaped hollow portion.
【0018】本発明の請求項3記載の配向膜除去装置
は、配向膜の形成された基板を固定するためのステージ
と、前記基板の配向膜形成面に接触かつ摺動可能に設け
られた樹脂材料からなる弾性体を有し、前記配向膜を除
去する配向膜除去手段と、前記基板の、前記配向膜除去
手段による配向膜が除去された部分を洗浄する洗浄手段
とを有することを特徴とするものである。According to a third aspect of the present invention, in the alignment film removing apparatus, a stage for fixing the substrate on which the alignment film is formed, and a resin provided so as to be in contact with and slidable on the surface of the substrate on which the alignment film is formed. An alignment film removing means for removing the alignment film, which has an elastic body made of a material, and a cleaning means for cleaning a portion of the substrate where the alignment film is removed by the alignment film removing means. To do.
【0019】以下に上記構成による作用を説明する。本
発明の請求項1記載の配向膜除去方法においては、樹脂
材料からなる弾性体を配向膜に接触し、摺動させること
によって配向膜を除去する、つまり、前記弾性体を前記
配向膜に接触させた状態で擦り動かすことによって摩擦
力を生じさせ、該摩擦力によって配向膜を除去するた
め、配向膜の下層膜を同時に除去してしまうことなく、
配向膜のみを選択的に除去することが可能となるので、
触針法による膜厚測定値の信頼性を向上させることがで
きる。The operation of the above configuration will be described below. In the method for removing an alignment film according to claim 1 of the present invention, the alignment film is removed by bringing an elastic body made of a resin material into contact with the alignment film and sliding the same, that is, bringing the elastic body into contact with the alignment film. A frictional force is generated by rubbing in the state of being made, and the alignment film is removed by the frictional force, so that the lower layer film of the alignment film is not removed at the same time.
Since it is possible to selectively remove only the alignment film,
The reliability of the film thickness measurement value obtained by the stylus method can be improved.
【0020】本発明の請求項2記載の配向膜除去方法に
おいては、スリット状のくりぬき部を介して樹脂材料か
らなる弾性体を配向膜に接触、摺動させることによって
前記配向膜の一部を除去するため、配向膜の除去部と残
存部とを限られた領域内に共存させることができる。In the method for removing an alignment film according to a second aspect of the present invention, an elastic body made of a resin material is brought into contact with and slid on the alignment film through a slit-shaped hollow portion to remove a part of the alignment film. Since it is removed, the removed portion and the remaining portion of the alignment film can coexist in a limited region.
【0021】本発明の請求項3記載の配向膜除去装置に
おいては、上述したような配向膜除去方法を実現させる
ことが可能となる。In the alignment film removing apparatus according to the third aspect of the present invention, it is possible to realize the alignment film removing method as described above.
【0022】[0022]
【発明の実施の形態】本発明の実施の形態について、図
1乃至図4を用いて以下に説明する。図1は、本発明の
配向膜除去方法を用いて、液晶表示素子上に形成された
配向膜の膜厚を触針法によって測定する工程を示した断
面図であり、図1(a)において、1はガラス基板、2
はITOや絶縁膜等からなる下層膜、3は配向膜であ
る。BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to FIGS. FIG. 1 is a cross-sectional view showing a step of measuring the film thickness of an alignment film formed on a liquid crystal display element by a stylus method using the alignment film removing method of the present invention. 1 is a glass substrate, 2
Is a lower layer film made of ITO or an insulating film, and 3 is an alignment film.
【0023】まず、図1(b)に示されるように、配向
膜3が最上層に形成された基板の上に、スリット状のく
りぬき部を有するプレート4をセットする。次に、図1
(c)に示されるように、前記スリット状のくりぬき部
から樹脂材料からなる弾性体5を配向膜3に接触、摺動
させることによって配向膜3の一部を除去し、配向膜3
の残存部と除去部との間に段差を形成する。配向膜3の
一部を除去した後、図1(d)に示されるように、配向
膜3の一部を除去した際に生じた異物6を取り去るため
にエア7を吹きかけることによって洗浄を行う。さら
に、図1(e)に示されるように、配向膜の残存部と除
去部との間の段差を含む領域に接触させながら前記段差
を横切るようにプローブ8を走査させ、この段差による
前記プローブ8の変位量から膜厚を算出する。First, as shown in FIG. 1 (b), a plate 4 having slit-shaped hollow portions is set on a substrate on which an alignment film 3 is formed as the uppermost layer. Next, FIG.
As shown in (c), a part of the alignment film 3 is removed by bringing the elastic body 5 made of a resin material into contact with and sliding on the alignment film 3 from the slit-shaped hollow portion.
A step is formed between the remaining portion and the removed portion. After part of the alignment film 3 is removed, as shown in FIG. 1D, cleaning is performed by blowing air 7 to remove the foreign matter 6 generated when part of the alignment film 3 is removed. . Further, as shown in FIG. 1E, the probe 8 is scanned so as to cross the step while contacting a region including the step between the remaining portion and the removed portion of the alignment film, and the probe is caused by the step. The film thickness is calculated from the displacement amount of 8.
【0024】なお、配向膜3の一部を除去した際に生じ
た異物6を取り去るために、エアを吹きかけるかわりに
アセトン等の薬剤でふき取っても良い。Incidentally, in order to remove the foreign matter 6 generated when a part of the alignment film 3 is removed, a chemical such as acetone may be wiped off instead of blowing air.
【0025】このように、本発明においては、触針法を
用いて膜厚を測定する際に、対象膜である配向膜をカッ
ターナイフではなく樹脂材料からなる弾性体を用いて除
去しているため、配向膜のみを選択的に除去することが
可能となり、触針法による膜厚測定値の信頼性を向上さ
せることが可能となる。これは、液晶表示素子の基板に
形成される配向膜は一般にポリイミド系高分子樹脂やア
ミド系高分子樹脂によって形成されるが、これらの材料
は他の物質との親和性が殆ど無いため下層膜との密着強
度はそれほど大きいものではないので、カッターナイフ
を用いて削り取るよりは、樹脂材料からなる弾性体を用
いてこすり取るほうが適しているためである。As described above, in the present invention, when the film thickness is measured by the stylus method, the alignment film which is the target film is removed by using the elastic body made of the resin material instead of the cutter knife. Therefore, only the alignment film can be selectively removed, and the reliability of the film thickness measurement value obtained by the stylus method can be improved. This is because the alignment film formed on the substrate of the liquid crystal display element is generally formed of a polyimide-based polymer resin or an amide-based polymer resin, but since these materials have almost no affinity with other substances, the lower layer film. Since the adhesion strength to and is not so large, it is more suitable to scrape off with an elastic body made of a resin material than to scrape off with a cutter knife.
【0026】通常触針法で膜厚を測定する際、プローブ
が走査できる距離は2ミリ程度であるので、この範囲内
に除去部と残存部との両方を共存させるようにする必要
がある。本発明では樹脂材料からなる弾性体5を配向膜
3に接触、摺動させることによって配向膜3の除去を行
っているので、前記プレート4を用いることなく2ミリ
の範囲内に除去部と残存部との両方を共存させるように
することが困難である。従って、前記プレート4は、限
られた範囲内に配向膜の除去部と残存部とを共存させる
ために用いることが望ましい。Usually, when measuring the film thickness by the stylus method, the distance that the probe can scan is about 2 mm, so it is necessary to make both the removed portion and the remaining portion coexist within this range. In the present invention, since the alignment film 3 is removed by contacting and sliding the elastic body 5 made of a resin material with the alignment film 3, the removal portion and the remaining portion remain within a range of 2 mm without using the plate 4. It is difficult to make both department and department coexist. Therefore, it is preferable that the plate 4 is used to coexist the removed portion and the remaining portion of the alignment film within a limited range.
【0027】次に、配向膜の形成された基板から配向膜
を除去させるための配向膜除去装置について、図2を用
いて以下に説明する。Next, an alignment film removing apparatus for removing the alignment film from the substrate on which the alignment film is formed will be described below with reference to FIG.
【0028】図2は本発明の配向膜除去装置の概略図で
あり、基板9を固定するステージ10と、前記基板9に
形成された配向膜を選択的に除去する配向膜除去手段1
1と、配向膜を除去する際に生ずる異物を洗浄する洗浄
手段12と、前記各手段を制御する制御部13とを有し
ている。FIG. 2 is a schematic view of an alignment film removing apparatus of the present invention, which includes a stage 10 for fixing a substrate 9 and an alignment film removing means 1 for selectively removing the alignment film formed on the substrate 9.
1, a cleaning unit 12 for cleaning foreign substances generated when the alignment film is removed, and a control unit 13 for controlling each unit.
【0029】本実施の形態においては、前記ステージ1
0には吸着孔が設けられており、基板9を吸着固定する
ことができるようになっている。In the present embodiment, the stage 1
0 is provided with an adsorption hole so that the substrate 9 can be adsorbed and fixed.
【0030】また、前記配向膜除去手段11は、伸縮可
能なアーム14と、その先に設けられた樹脂材料からな
る弾性体15とからなっており、該弾性体15はステー
ジ10に吸着固定された基板9に形成された配向膜に接
触状態または非接触状態とすることができるようになっ
ている。さらに、前記弾性体15は、前記基板9に形成
された配向膜に接触し、摺動するようになっている。The alignment film removing means 11 is composed of an extendable and retractable arm 14 and an elastic body 15 made of a resin material provided in front of the arm 14, and the elastic body 15 is fixed to the stage 10 by suction. The alignment film formed on the substrate 9 can be brought into a contact state or a non-contact state. Further, the elastic body 15 comes into contact with the alignment film formed on the substrate 9 and slides.
【0031】さらに、前記洗浄手段12はエア噴出口を
有するエアガン16を備えており、該エアガン16の噴
出口は、前記弾性体15と前記基板9に形成された配向
膜との接触箇所を向いており、前記弾性体15によって
前記基板9上の配向膜を除去する際に生ずる異物を噴出
エアによって吹き飛ばすことができるようになってい
る。Further, the cleaning means 12 is equipped with an air gun 16 having an air ejection port, and the ejection port of the air gun 16 faces the contact point between the elastic body 15 and the alignment film formed on the substrate 9. Therefore, the elastic body 15 can blow off the foreign matter generated when the alignment film on the substrate 9 is removed by the jet air.
【0032】上記構成による配向膜除去装置によって配
向膜を除去する方法について図3のフロー図を用いて説
明する。A method of removing the alignment film by the alignment film removing apparatus having the above structure will be described with reference to the flow chart of FIG.
【0033】まず、図3(a)に示されるように、ステ
ージ10上の所定位置に基板9を吸着固定させる。次
に、図3(b)に示されるように、配向膜除去手段11
及び洗浄手段12を所定位置まで移動させ、前記配向膜
除去手段11に備えられたアーム14を伸ばし、該アー
ム14の先端に設けられた弾性体15を基板9に形成さ
れた配向膜に接触させる。次に、図3(c)に示される
ように、前記弾性体15を摺動させ、基板9に形成され
た配向膜を除去する。次に、図3(d)に示されるよう
に、洗浄手段12に設けられたエアガン16からエアを
噴出させ、配向膜除去により生ずる異物を吹き飛ばす。
次に、図3(e)に示されるように、前記配向膜除去手
段11及び洗浄手段12を退避させ、基板9を取り除
く。First, as shown in FIG. 3A, the substrate 9 is adsorbed and fixed at a predetermined position on the stage 10. Next, as shown in FIG. 3B, the alignment film removing means 11
Then, the cleaning means 12 is moved to a predetermined position, the arm 14 provided in the alignment film removing means 11 is extended, and the elastic body 15 provided at the tip of the arm 14 is brought into contact with the alignment film formed on the substrate 9. . Next, as shown in FIG. 3C, the elastic body 15 is slid to remove the alignment film formed on the substrate 9. Next, as shown in FIG. 3D, air is ejected from the air gun 16 provided in the cleaning means 12 to blow away foreign matters generated by removing the alignment film.
Next, as shown in FIG. 3E, the alignment film removing means 11 and the cleaning means 12 are retracted, and the substrate 9 is removed.
【0034】なお、前記配向膜除去装置において、配向
膜除去手段11及び洗浄手段12を固定させておき、基
板9を移動させるようにしてもよい。In the alignment film removing device, the alignment film removing means 11 and the cleaning means 12 may be fixed and the substrate 9 may be moved.
【0035】また、必要に応じて基板9と弾性体15と
の間にスリット状のくりぬき部を有するプレートを介在
させてもよい。この場合、前記プレートは弾性体15が
基板9上の配向膜を摺動する際にぐらつかないようにし
ておく必要がある。これは、例えばステージ10上に固
定しておけば良い。If desired, a plate having a slit-shaped hollow portion may be interposed between the substrate 9 and the elastic body 15. In this case, it is necessary that the plate does not wobble when the elastic body 15 slides on the alignment film on the substrate 9. This may be fixed on the stage 10, for example.
【0036】図4に本発明の配向膜除去方法を用いた触
針法による膜厚測定方法と従来の触針法による膜厚測定
方法とによって、一つの基板に対して10カ所で膜厚を
測定した結果を示す。なお、本発明の配向膜除去方法に
おいては、弾性体15として市販のプラスチック製消し
ゴムを用いた。この基板の正確な膜厚を走査型電子顕微
鏡を用いて測定した所、450オングストロームであっ
た。この図から分かるように、本発明の配向膜除去方法
を用いた触針法による膜厚測定方法においては従来の触
針法による膜厚測定方法に比べて測定値の信頼性が高い
ことが分かる。FIG. 4 shows that the film thickness is measured at 10 locations on one substrate by the film thickness measurement method by the stylus method using the alignment film removing method of the present invention and the conventional film thickness measurement method by the stylus method. The measurement results are shown. In the alignment film removing method of the present invention, a commercially available plastic eraser was used as the elastic body 15. The accurate film thickness of this substrate was measured with a scanning electron microscope and found to be 450 Å. As can be seen from this figure, the film thickness measuring method by the stylus method using the alignment film removing method of the present invention has higher reliability of the measured value than the conventional film thickness measuring method by the stylus method. .
【0037】なお、本実施の形態においては、配向膜の
膜厚を測定するにあたって、配向膜を除去する工程と、
プローブピンを用いて前記配向膜の膜厚を測定する工程
とを、異なる装置を用いて行っているが、本発明の配向
膜除去装置にプローブピンを備えた段差測定手段を設け
て制御部13により制御するようにしても良い。In the present embodiment, in measuring the film thickness of the alignment film, a step of removing the alignment film,
Although the step of measuring the film thickness of the alignment film by using the probe pin is performed by using a different device, the alignment film removing device of the present invention is provided with a step measuring means provided with the probe pin, and the control unit 13 is provided. It may be controlled by.
【0038】[0038]
【発明の効果】以上説明したように、本発明の配向膜除
去方法によれば、配向膜を樹脂材料からなる弾性体を用
いて除去するため、配向膜の下層膜まで除去する事な
く、配向膜のみを選択的に除去することが可能となるの
で、触針法による測定値の信頼性を向上させることがで
きるという効果を奏する。As described above, according to the method for removing an alignment film of the present invention, since the alignment film is removed by using the elastic body made of the resin material, the alignment film can be aligned without removing the lower layer film of the alignment film. Since only the film can be selectively removed, the reliability of the measured value by the stylus method can be improved.
【0039】また、スリット状のくりぬき部を介して樹
脂材料からなる弾性体を配向膜に接触、摺動させること
によって前記配向膜の一部を除去するため、配向膜の除
去部と残存部とを限られた領域内に共存させることがで
きるという効果を奏する。Further, since a part of the alignment film is removed by bringing an elastic body made of a resin material into contact with and sliding on the alignment film through the slit-shaped hollow portion, the alignment film removal part and the remaining part are removed. Has the effect of being able to coexist in a limited area.
【0040】また、本発明の配向膜除去装置を用いるこ
とによって、容易に配向膜のみを選択的に除去すること
ができるという効果を奏する。Further, by using the alignment film removing apparatus of the present invention, it is possible to easily and selectively remove only the alignment film.
【図1】本発明の配向膜除去方法を用いた触針法による
膜厚測定の工程を示すフロー図である。FIG. 1 is a flow chart showing a process of film thickness measurement by a stylus method using an alignment film removing method of the present invention.
【図2】本発明の配向膜除去装置を示す概略図である。FIG. 2 is a schematic view showing an alignment film removing apparatus of the present invention.
【図3】本発明の配向膜除去装置を用いて配向膜を除去
する工程をしめすフロー図である。FIG. 3 is a flow chart showing a step of removing an alignment film using the alignment film removing apparatus of the present invention.
【図4】本発明と従来技術との膜厚の測定値の結果を示
す図である。FIG. 4 is a diagram showing the results of film thickness measurement values of the present invention and the prior art.
【図5】液晶表示素子の断面形状を示す図である。FIG. 5 is a diagram showing a cross-sectional shape of a liquid crystal display element.
1 ガラス基板 2 下層膜 3 配向膜 4 プレート 5 樹脂材料からなる弾性体 6 異物 7 エア 8 プローブ 9 基板 10 ステージ 11 配向膜除去手段 12 洗浄手段 13 制御部 14 アーム 15 樹脂材料からなる弾性体 16 エアガン DESCRIPTION OF SYMBOLS 1 Glass substrate 2 Lower layer film 3 Alignment film 4 Plate 5 Elastic body made of resin material 6 Foreign matter 7 Air 8 Probe 9 Substrate 10 Stage 11 Alignment film removing means 12 Cleaning means 13 Control section 14 Arm 15 Elastic body made of resin material 16 Air gun
Claims (3)
高分子材料からなる配向膜の膜厚を触針法によって測定
する際に、前記配向膜を除去する方法であって、 樹脂材料からなる弾性体を前記配向膜に接触させ、該弾
性体を摺動させることによって前記配向膜の一部を除去
する第1の工程と、 前記第1の工程によって生じた配向膜の除去部を洗浄す
る第2の工程と、を含むことを特徴とする配向膜除去方
法。1. A method for removing an alignment film formed of a polymer material formed on a substrate used for a liquid crystal display device when the film thickness is measured by a stylus method, the method comprising a resin material. A first step of removing a part of the alignment film by bringing the elastic body into contact with the alignment film and sliding the elastic body, and cleaning a removal part of the alignment film generated by the first step A second step; and a method for removing an alignment film, comprising:
なる弾性体を用いて前記配向膜の一部を除去する際に、
前記樹脂材料からなる弾性体と前記配向膜との間にスリ
ット状のくりぬき部を有するプレートを介在させ、該ス
リット状のくりぬき部を介して前記弾性体を前記配向膜
に接触、摺動させることを特徴とする請求項1記載の配
向膜除去方法。2. In the first step, when a part of the alignment film is removed using an elastic body made of a resin material,
A plate having a slit-shaped hollow portion is interposed between the elastic body made of the resin material and the alignment film, and the elastic body is brought into contact with and slid on the alignment film through the slit-shaped hollow portion. The method for removing an alignment film according to claim 1, wherein
のステージと、 前記基板の配向膜形成面に接触かつ摺動可能に設けられ
た樹脂材料からなる弾性体を有し、前記配向膜を除去す
る配向膜除去手段と、 前記基板の、前記配向膜除去手段による配向膜が除去さ
れた部分を洗浄する洗浄手段と、を有することを特徴と
する配向膜除去装置。3. An alignment film, comprising: a stage for fixing a substrate having an alignment film formed thereon; and an elastic body made of a resin material provided slidably in contact with the alignment film formation surface of the substrate. An alignment film removing apparatus comprising: an alignment film removing unit for removing the alignment film; and a cleaning unit for cleaning a portion of the substrate where the alignment film is removed by the alignment film removing unit.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10121996A JPH09288275A (en) | 1996-04-23 | 1996-04-23 | Method for removing oriented film and device for removing oriented film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10121996A JPH09288275A (en) | 1996-04-23 | 1996-04-23 | Method for removing oriented film and device for removing oriented film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH09288275A true JPH09288275A (en) | 1997-11-04 |
Family
ID=14294798
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10121996A Pending JPH09288275A (en) | 1996-04-23 | 1996-04-23 | Method for removing oriented film and device for removing oriented film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH09288275A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011175090A (en) * | 2010-02-24 | 2011-09-08 | Citizen Finetech Miyota Co Ltd | Method for manufacturing liquid crystal display element |
JP2013015323A (en) * | 2011-06-30 | 2013-01-24 | Ulvac Japan Ltd | Film thickness measuring apparatus and film thickness measuring method |
CN105182574A (en) * | 2015-08-28 | 2015-12-23 | 武汉华星光电技术有限公司 | Method for measuring thickness of alignment film on thin film transistor (TFT) substrate and method for measuring thickness of alignment film on color filter (CF) substrate |
-
1996
- 1996-04-23 JP JP10121996A patent/JPH09288275A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011175090A (en) * | 2010-02-24 | 2011-09-08 | Citizen Finetech Miyota Co Ltd | Method for manufacturing liquid crystal display element |
JP2013015323A (en) * | 2011-06-30 | 2013-01-24 | Ulvac Japan Ltd | Film thickness measuring apparatus and film thickness measuring method |
CN105182574A (en) * | 2015-08-28 | 2015-12-23 | 武汉华星光电技术有限公司 | Method for measuring thickness of alignment film on thin film transistor (TFT) substrate and method for measuring thickness of alignment film on color filter (CF) substrate |
CN105182574B (en) * | 2015-08-28 | 2018-03-30 | 武汉华星光电技术有限公司 | The orientation membrane thickness measured method on orientation membrane thickness measured method and CF substrates in TFT substrate |
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