JP2011175090A - Method for manufacturing liquid crystal display element - Google Patents

Method for manufacturing liquid crystal display element Download PDF

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JP2011175090A
JP2011175090A JP2010038961A JP2010038961A JP2011175090A JP 2011175090 A JP2011175090 A JP 2011175090A JP 2010038961 A JP2010038961 A JP 2010038961A JP 2010038961 A JP2010038961 A JP 2010038961A JP 2011175090 A JP2011175090 A JP 2011175090A
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liquid crystal
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crystal alignment
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JP5538948B2 (en
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Masaki Oishi
正樹 大石
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Citizen Holdings Co Ltd
Citizen Finetech Miyota Co Ltd
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Citizen Finetech Miyota Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a liquid crystal display element, for inexpensively and easily obtaining a liquid crystal display element without requiring a large expensive apparatus. <P>SOLUTION: Liquid crystal alignment layers 16, 20 formed on a silicon substrate 4 and a counter electrode substrate 6, respectively, are partially removed in a prescribed portion by scraping and peeling to expose electrodes under the respective alignment layers. To scrape and peel off the alignment layers, for example, a probe pin 5, which is a sharp member, may be used to stick into the layer to scratch. Subsequently, the silicon substrate 4 and the counter electrode substrate 6 are cleaned to remove foreign substances around the portions 1, 2 removed by scraping and peeling. Finally, the silicon substrate 4 and the counter electrode substrate 6 are bonded to each other with a sealing agent 7 leaving a prescribed gap. In the bonding step, an electrode pad 50 in the portion 1 where the liquid crystal alignment layer is removed on the silicon substrate 4, and a counter electrode 18 in the portion 2 where the liquid crystal alignment layer is removed on the counter electrode substrate 6 are electrically connected with a conducting agent 3. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

本発明は液晶表示素子の製造方法に関するものである。   The present invention relates to a method for manufacturing a liquid crystal display element.

一般に、LCOS(Liquid Crystal On Silicon)と呼ばれる液晶表示素子は、表面に画素電極が形成されたシリコン基板と、それに相対し表面に対向電極が形成されたガラス基板に液晶配向膜を形成した後に、前記両基板を所定の位置関係で貼り合せ、前記基板間に液晶を注入した液晶表示パネルを回路基板若しくは基台上に実装し、画素電極と対向電極間に電位差を与え、液晶の配向を制御することにより各種表示を得るものである。   In general, a liquid crystal display element called LCOS (Liquid Crystal On Silicon) is formed by forming a liquid crystal alignment film on a silicon substrate having a pixel electrode formed on the surface and a glass substrate having a counter electrode formed on the surface. A liquid crystal display panel in which the two substrates are bonded in a predetermined positional relationship and liquid crystal is injected between the substrates is mounted on a circuit substrate or a base, and a potential difference is applied between the pixel electrode and the counter electrode to control the alignment of the liquid crystal. By doing so, various displays are obtained.

前記液晶表示素子のシリコン基板への電位の供給は、シリコン基板と回路基板上の電極パッドをワイヤーで接続し、電気的に導通させることで実現している。一方、対向電極への電位の供給は、ガラス基板と回路基板間に熱硬化性導電性樹脂、例えば銀ペーストなどを塗布し、対向電極と回路基板上の電極パッドとを電気的に接続させることで実現している。   The supply of the potential to the silicon substrate of the liquid crystal display element is realized by connecting the silicon substrate and the electrode pad on the circuit substrate with a wire and making them electrically conductive. On the other hand, the potential is supplied to the counter electrode by applying a thermosetting conductive resin such as silver paste between the glass substrate and the circuit board to electrically connect the counter electrode and the electrode pad on the circuit board. Is realized.

また、前記対向電極基板への電位の供給時に前記画素電極が形成されたシリコン基板及び前記対向電極上に形成された液晶配向膜の除去を行い、前記両基板を所定の位置関係で貼り合せる際に直接電気的接続を行い、前記対向電極への電位供給を前記シリコン基板と回路基板上の電極パッドをワイヤーで接続を行う際に同時に行うことも可能である。   Further, when supplying the potential to the counter electrode substrate, the silicon substrate on which the pixel electrode is formed and the liquid crystal alignment film formed on the counter electrode are removed, and the two substrates are bonded in a predetermined positional relationship. It is also possible to perform electrical connection directly to the counter electrode and supply potential to the counter electrode at the same time when the silicon substrate and the electrode pad on the circuit substrate are connected by a wire.

図4は液晶表示素子を示す図であり、構造断面図である。複数の画素10が形成されたシリコン基板4と、対向電極18が形成された対向電極基板6にそれぞれ液晶配向膜16及び20を有している。前記シリコン基板4上の液晶配向膜16及び対向電極基板6上の液晶配向膜20に強力なレーザーLAを照射することにより前記液晶配向膜の破壊を行い、対向電極基板6側においては対向電極18の一部を露出させ、シリコン基板4側においては、前記対向電極18と導通するための電極パッド50の一部を露出させる。この部位に導通剤52を塗布し、シール剤22により所定の隙間で前記シリコン基板4と対向電極基板6を張り合わせることでシリコン基板4上の電極パッド50と対向電極基板6上の対向電極18間の電気的接続を行っている。(例えば、特許文献1参照)   FIG. 4 is a diagram showing a liquid crystal display element and is a sectional view of the structure. Liquid crystal alignment films 16 and 20 are provided on the silicon substrate 4 on which the plurality of pixels 10 are formed and the counter electrode substrate 6 on which the counter electrode 18 is formed, respectively. The liquid crystal alignment film 16 on the silicon substrate 4 and the liquid crystal alignment film 20 on the counter electrode substrate 6 are irradiated with a powerful laser LA to destroy the liquid crystal alignment film, and on the counter electrode substrate 6 side, the counter electrode 18 is destroyed. A part of the electrode pad 50 for conducting with the counter electrode 18 is exposed on the silicon substrate 4 side. A conductive agent 52 is applied to this portion, and the silicon substrate 4 and the counter electrode substrate 6 are bonded to each other with a seal agent 22 at a predetermined gap, whereby the electrode pad 50 on the silicon substrate 4 and the counter electrode 18 on the counter electrode substrate 6 are bonded. There is an electrical connection between them. (For example, see Patent Document 1)

特開2006−343515号公報JP 2006-343515 A

図4に示した従来技術によると、前記液晶配向膜16及び20の除去に強力なレーザーLA装置が必要となる。前記レーザーLA装置は大掛かりな装置となり、設置・維持に多額の費用を必要とする。また、前記シリコン基板4上にはウェハ状態では複数の液晶表示素子が形成されているため、前記液晶配向膜16及び20の除去を前記強力なレーザーLA照射で行うためには、前記画素電極が形成されたシリコン基板4以上の大型なステージが必要となる。また、複数のレーザーLAにて同時に行う際にも同様に大型な装置が必要となってしまう。   According to the prior art shown in FIG. 4, a powerful laser LA apparatus is required to remove the liquid crystal alignment films 16 and 20. The laser LA apparatus is a large-scale apparatus and requires a large amount of cost for installation and maintenance. In addition, since a plurality of liquid crystal display elements are formed on the silicon substrate 4 in the wafer state, in order to remove the liquid crystal alignment films 16 and 20 by the powerful laser LA irradiation, the pixel electrode A large stage larger than the formed silicon substrate 4 is required. Similarly, a large apparatus is required when performing simultaneously with a plurality of lasers LA.

本発明は、大型で高価な装置を必要とせず安価で容易に前記液晶配向膜の除去を行うことができ、結果として安価な液晶表示素子を得ることができる液晶表示素子の製造方法を提供することを目的とする。   The present invention provides a method for manufacturing a liquid crystal display element that can easily and inexpensively remove the liquid crystal alignment film without requiring a large and expensive device, and as a result, can obtain an inexpensive liquid crystal display element. For the purpose.

前記目的を達成するため、本発明の液晶表示素子の製造方法は、複数の画素電極を有する第1電極基板と、前記第1電極基板に相対する対向電極を有する第2電極基板を所定の隙間を有して貼り合わせ、前記所定の隙間に液晶を注入して製作する液晶表示素子の製造方法において、少なくとも、前記第1電極基板及び第2電極基板に前記液晶を配向させるための液晶配向膜を形成する工程と、前記第1電極基板及び第2電極基板の各々の液晶配向膜の所定部位を削剥によりその一部を除去して前記液晶配向膜直下の電極を露出する工程と、前記工程により露出した電極の周囲に残る異物の除去を行う洗浄工程と、を有することを特徴とする。   In order to achieve the above object, a method of manufacturing a liquid crystal display element according to the present invention includes a first electrode substrate having a plurality of pixel electrodes and a second electrode substrate having a counter electrode facing the first electrode substrate with a predetermined gap. A liquid crystal alignment film for aligning the liquid crystal on at least the first electrode substrate and the second electrode substrate in a method for manufacturing a liquid crystal display device manufactured by injecting liquid crystal into the predetermined gap A step of removing a predetermined portion of each liquid crystal alignment film of each of the first electrode substrate and the second electrode substrate by removing a part thereof to expose an electrode immediately below the liquid crystal alignment film; And a cleaning process for removing foreign matter remaining around the exposed electrode.

また、前記第1電極基板及び第2電極基板の各々の液晶配向膜の所定部位を削剥によりその一部を除去して前記液晶配向膜直下の電極を露出する工程は、ウェハ基板の状態で行うことができる。   Further, the step of removing a predetermined portion of the liquid crystal alignment film of each of the first electrode substrate and the second electrode substrate to remove a part thereof to expose the electrode immediately below the liquid crystal alignment film is performed in the state of a wafer substrate. be able to.

また、前記第1電極基板及び第2電極基板の各々の液晶配向膜の所定部位を削剥によりその一部を除去して前記液晶配向膜直下の電極を露出する工程は、尖形部材を刺衝することによって行うことができる。   Further, the step of removing a predetermined portion of the liquid crystal alignment film of each of the first electrode substrate and the second electrode substrate to remove a part of the liquid crystal alignment film to expose the electrode immediately below the liquid crystal alignment film, Can be done.

本発明によれば、前記画素電極が形成されたシリコン基板及び前記対向電極基板上の前記液晶配向膜の除去を簡易な削剥手段によって行うので、大型な装置を用いずに基板単位で効率的に行うことが可能である。   According to the present invention, since the removal of the liquid crystal alignment film on the silicon substrate on which the pixel electrode is formed and the counter electrode substrate is performed by a simple scraping means, it is possible to efficiently perform the substrate unit without using a large apparatus. Is possible.

また、前述の効果により画素電極が形成されたシリコン基板及び前記対向電極基板上の前記液晶配向膜の除去を容易に行うことが可能であり、結果安価で小型な液晶表示素子の供給が可能となる。   In addition, it is possible to easily remove the liquid crystal alignment film on the silicon substrate on which the pixel electrode is formed and the counter electrode substrate by the above-described effect, and as a result, it is possible to supply an inexpensive and small liquid crystal display element. Become.

本発明に係る液晶表示素子を示す構造断面図Structural sectional view showing a liquid crystal display device according to the present invention 本発明の液晶表示素子の製造方法を示す工程毎断面図Sectional drawing for every process which shows the manufacturing method of the liquid crystal display element of this invention 本発明の液晶表示素子の製造方法をウェハ基板状態で行う例の模式図The schematic diagram of the example which performs the manufacturing method of the liquid crystal display element of this invention in a wafer substrate state 液晶表示素子を示す構造断面図Structural sectional view showing a liquid crystal display element

図1は本発明に係る液晶表示素子を示す図であり、構造断面図である。複数の画素10を有するシリコン基板4上に液晶配向膜16が形成されている。また、対向電極18を有する対向電極基板6上にも同様に液晶配向膜20が形成されている。前記液晶配向膜16及び20の一部は基板状態で除去されており、それぞれ前記液晶配向膜16及び20が除去された部分1と2を有している。   FIG. 1 is a diagram showing a liquid crystal display device according to the present invention, and is a sectional view of the structure. A liquid crystal alignment film 16 is formed on a silicon substrate 4 having a plurality of pixels 10. Similarly, a liquid crystal alignment film 20 is formed on the counter electrode substrate 6 having the counter electrode 18. The liquid crystal alignment films 16 and 20 are partially removed in the substrate state, and have portions 1 and 2 from which the liquid crystal alignment films 16 and 20 are removed, respectively.

前記シリコン基板4の前記液晶配向膜が除去された部分1の部位に露出する電極パッド50と、前記対向電極基板6の前記液晶配向膜が除去された部分2の部位に露出する前記対向電極18は例えば導電球(不図示)を有した導通剤3により電気的接続を取っている。また、前記シリコン基板4と対向電極基板6はシール剤7により所定の隙間で貼り合わされている。   The electrode pad 50 exposed at the portion 1 of the silicon substrate 4 where the liquid crystal alignment film is removed and the counter electrode 18 exposed at the portion 2 of the counter electrode substrate 6 where the liquid crystal alignment film is removed. Is electrically connected by a conductive agent 3 having a conductive ball (not shown), for example. The silicon substrate 4 and the counter electrode substrate 6 are bonded together with a sealant 7 at a predetermined gap.

図2は本発明の液晶表示素子の製造方法を示す図であり、工程毎断面図である。以下、図2に準じて説明を行う。   FIG. 2 is a diagram showing a method for manufacturing a liquid crystal display element of the present invention, and is a cross-sectional view for each process. Hereinafter, description will be given according to FIG.

(A):シリコン基板4及び対向電極基板6に液晶配向膜16及び20の形成を行う。前記液晶配向膜16、20は、例えばSiO材料を斜方蒸着法によって形成される。 (A): Liquid crystal alignment films 16 and 20 are formed on the silicon substrate 4 and the counter electrode substrate 6. The liquid crystal alignment layers 16 and 20 are formed, for example, by oblique deposition of SiO 2 material.

(B):続いて、前記液晶配向膜16及び20の所定部分を削剥によりその一部を除去し、各々の配向膜直下の電極を露出する。削剥手段としては、例えば、尖形部材であるプローブピン5を刺衝して傷をつけることにより除去を行うことが可能である。このようにしてプローブピン等で行うことで、本工程は前記シリコン基板4及び対向電極基板6の基板状態での対応が可能であり、また大型で高価な装置を必要とせずに実施できるのである。 (B): Subsequently, a predetermined part of the liquid crystal alignment films 16 and 20 is removed by scraping to expose the electrodes directly under the respective alignment films. As the scraping means, for example, the removal can be performed by puncturing the probe pin 5 which is a pointed member and scratching it. By performing the probe pins or the like in this way, this step can be performed in the substrate state of the silicon substrate 4 and the counter electrode substrate 6 and can be performed without requiring a large and expensive apparatus. .

尚、(B)に示す工程はウェハ基板状態で行うことが可能である。図3は、本発明の液晶表示素子の製造方法をウェハ基板状態で行う例の模式図である。シリコン基板4上の個々の液晶表示素子領域8の各液晶配向膜の所定の位置にプローブピン5を整列させた治工具を使用することにより前記(B)の工程をウェハ基板状態で対応することが可能である。このような構成によれば、容易な手段で一括処理することが可能になるので、レーザー手段にて一つ一つ処理していく場合に比べ生産性が向上する。   The process shown in (B) can be performed in a wafer substrate state. FIG. 3 is a schematic view of an example in which the method for producing a liquid crystal display element of the present invention is performed in a wafer substrate state. By using a jig with the probe pins 5 aligned at predetermined positions of the liquid crystal alignment films of the individual liquid crystal display element regions 8 on the silicon substrate 4, the step (B) can be handled in the wafer substrate state. Is possible. According to such a configuration, since it is possible to perform batch processing with easy means, productivity is improved as compared with the case where processing is performed one by one with laser means.

(C):続いて、前記シリコン基板4及び対向電極基板6の洗浄を行う。この洗浄工程において、前記液晶配向膜16及び20を削剥によって除去した部分1及び2周辺に残った異物、例えば除去された液晶配向膜であるSiOの除去を行う。 (C): Subsequently, the silicon substrate 4 and the counter electrode substrate 6 are cleaned. In this cleaning step, foreign matters remaining around the portions 1 and 2 where the liquid crystal alignment films 16 and 20 are removed by scraping, for example, SiO 2 which is the removed liquid crystal alignment film, are removed.

(D):最後に、前記シリコン基板4及び対向電極基板6をシール剤7により所定の隙間で貼りあわせる。また、この際に前記シリコン基板4の前記液晶配向膜が除去された部分1の電極パッド50と前記対向電極基板6の前記液晶配向膜が除去された部分2の前記対向電極18は、例えば導電球(不図示)を有した導電剤3により電気的接続を行う。 (D): Finally, the silicon substrate 4 and the counter electrode substrate 6 are bonded together with a sealant 7 at a predetermined gap. At this time, the electrode pad 50 in the portion 1 of the silicon substrate 4 from which the liquid crystal alignment film has been removed and the counter electrode 18 in the portion 2 of the counter electrode substrate 6 from which the liquid crystal alignment film has been removed are electrically conductive, for example. Electrical connection is made by a conductive agent 3 having a sphere (not shown).

1 シリコン基板上の液晶配向膜が除去された部分
2 対向電極基板上の液晶配向膜が除去された部分
3 導通剤
4 シリコン基板
5 プローブピン
6 対向電極基板
7 シール剤
8 液晶表示素子領域
10 画素電極
16 シリコン基板上の液晶配向膜
18 対向電極
20 対向電極基板上の液晶配向膜
22 シール剤
50 電極パッド
52 導通剤
DESCRIPTION OF SYMBOLS 1 The part from which the liquid crystal aligning film on the silicon substrate was removed 2 The part from which the liquid crystal aligning film on the counter electrode substrate was removed 3 Conducting agent 4 Silicon substrate 5 Probe pin 6 Counter electrode substrate 7 Sealing agent 8 Liquid crystal display element region 10 Pixel Electrode 16 Liquid crystal alignment film 18 on silicon substrate Counter electrode 20 Liquid crystal alignment film 22 on counter electrode substrate Sealing agent 50 Electrode pad 52 Conducting agent

Claims (3)

複数の画素電極を有する第1電極基板と、前記第1電極基板に相対する対向電極を有する第2電極基板を所定の隙間を有して貼り合わせ、前記所定の隙間に液晶を注入して製作する液晶表示素子の製造方法において、
少なくとも、
前記第1電極基板及び第2電極基板に前記液晶を配向させるための液晶配向膜を形成する工程と、
前記第1電極基板及び第2電極基板の各々の液晶配向膜の所定部位を削剥によりその一部を除去して前記液晶配向膜直下の電極を露出する工程と、
前記工程により露出した電極の周囲に残る異物の除去を行う洗浄工程と、
を有することを特徴とする液晶表示素子の製造方法。
A first electrode substrate having a plurality of pixel electrodes and a second electrode substrate having a counter electrode facing the first electrode substrate are bonded together with a predetermined gap, and liquid crystal is injected into the predetermined gap. In the manufacturing method of the liquid crystal display element to
at least,
Forming a liquid crystal alignment film for aligning the liquid crystal on the first electrode substrate and the second electrode substrate;
Removing a portion of the liquid crystal alignment film of each of the first electrode substrate and the second electrode substrate by removing a predetermined portion thereof to expose the electrode immediately below the liquid crystal alignment film;
A cleaning step of removing foreign matter remaining around the electrode exposed by the step;
A method for producing a liquid crystal display element, comprising:
前記第1電極基板及び第2電極基板の各々の液晶配向膜の所定部位を削剥によりその一部を除去して前記液晶配向膜直下の電極を露出する工程は、ウェハ基板の状態で行うことを特徴とする請求項1に記載の液晶表示素子の製造方法。   The step of removing a predetermined portion of the liquid crystal alignment film of each of the first electrode substrate and the second electrode substrate by removing a part thereof to expose the electrode immediately below the liquid crystal alignment film is performed in the state of a wafer substrate. The method for producing a liquid crystal display element according to claim 1. 前記第1電極基板及び第2電極基板の各々の液晶配向膜の所定部位を削剥によりその一部を除去して前記液晶配向膜直下の電極を露出する工程は、尖形部材を刺衝することによって行うことを特徴とする請求項1又は2に記載の液晶表示素子の製造方法。
The step of removing a predetermined portion of the liquid crystal alignment film of each of the first electrode substrate and the second electrode substrate to remove a part thereof to expose the electrode immediately below the liquid crystal alignment film is to stab a pointed member. The method for producing a liquid crystal display element according to claim 1, wherein:
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CN102854651A (en) * 2012-09-27 2013-01-02 豪威科技(上海)有限公司 Reflective liquid crystal panel and manufacturing method thereof
CN107703682A (en) * 2017-09-22 2018-02-16 深圳市华星光电半导体显示技术有限公司 LCD alignment method and LCD alignment system

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