JPH09232734A - Bump-formed flexible printed circuit board and manufacturing method thereof - Google Patents

Bump-formed flexible printed circuit board and manufacturing method thereof

Info

Publication number
JPH09232734A
JPH09232734A JP3467196A JP3467196A JPH09232734A JP H09232734 A JPH09232734 A JP H09232734A JP 3467196 A JP3467196 A JP 3467196A JP 3467196 A JP3467196 A JP 3467196A JP H09232734 A JPH09232734 A JP H09232734A
Authority
JP
Japan
Prior art keywords
layer
flexible printed
printed circuit
bumps
bump
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3467196A
Other languages
Japanese (ja)
Inventor
Hideaki Shikayama
英明 鹿山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP3467196A priority Critical patent/JPH09232734A/en
Publication of JPH09232734A publication Critical patent/JPH09232734A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/24Reinforcing the conductive pattern
    • H05K3/241Reinforcing the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/4007Surface contacts, e.g. bumps

Landscapes

  • Electric Connection Of Electric Components To Printed Circuits (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a flexible printed circuit having high reliability of the connection to circuit elements such as ICs. SOLUTION: A flexible printed circuit has spherical bumps 4, the surface of which is a solder layer 5 formed on a Ni layer 6 or Au layer. The bumps 4 are formed by the Cu plating, using a high concn. brightener. The Cu ion concn. is 200-250g/liter and current density is 30-50A/dm<2> to form the spherical bumps 4.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、フレキシブルプリ
ント配線板(以下、単にFPCと略称する)にIC等の
回路部品接続用球形バンプを設けたもの及びその製造方
法に関するものである。特に、接続の信頼性の高いバン
プを有するFPC及びその製造方法に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flexible printed wiring board (hereinafter simply referred to as FPC) provided with spherical bumps for connecting circuit components such as ICs and a method for manufacturing the same. In particular, the present invention relates to an FPC having bumps with high connection reliability and a manufacturing method thereof.

【0002】[0002]

【従来の技術】IC等の回路部品接続用のバンプは、従
来よりFPC表面に設けられたレジスト層の所定の位置
に回路が露出するような開口部を設け、これに銅メッキ
を施し、更にハンダメッキを施して形成してきた。
2. Description of the Related Art Conventionally, bumps for connecting circuit components such as ICs are provided with an opening for exposing a circuit at a predetermined position of a resist layer provided on the surface of an FPC, and copper is plated on the opening. It has been formed by applying solder plating.

【0003】[0003]

【発明が解決しようとする課題】従来のメッキ方法で
は、メッキ表面が平坦になったり、変形してくぼみが出
来たりして、うまく球状にならず接続の信頼性が充分で
はなかった。また、銅メッキとハンダメッキとが直接触
れているため、加熱等によりもろい銅、錫化合物が出
来、これも接続の信頼性を阻害していた。
In the conventional plating method, the plating surface was flat or was deformed to form a recess, which did not form a spherical shape properly and the connection reliability was not sufficient. Further, since the copper plating and the solder plating are in direct contact with each other, brittle copper and tin compounds are formed by heating or the like, which also hinders the reliability of connection.

【0004】[0004]

【課題を解決するための手段】銅メッキを施こすにあた
り、銅濃度、光沢剤濃度を高くし、電流密度を高くする
ことにより球状のバンプを形成させた。また、銅と錫と
を直接触れないようにするため、銅メッキの上にニッケ
ルメッキ層を設けて、その上にハンダ層を設けた。また
ニッケル層の上に金メッキ層を設けて、その上にハンダ
層を設けたもの、銅メッキのかわりにニッケルメッキで
バンプを形成させ、その上にハンダ層を設けた。こうし
て得られた球状のバンプにより、IC等の回路部品とF
PCとの接続の信頼性が向上した。特に、ハンダメッキ
層を銅と直接触れないように金層又はニッケル層の上に
設けたものは、熱をかけてももろい銅、錫化合物が出来
ないため、接続の信頼性がより向上した。
[Means for Solving the Problems] When copper plating is applied, spherical bumps are formed by increasing the copper concentration and the brightener concentration and increasing the current density. Further, in order to prevent direct contact between copper and tin, a nickel plating layer was provided on the copper plating, and a solder layer was provided thereon. In addition, a gold plating layer was provided on the nickel layer and a solder layer was provided on the nickel layer, and bumps were formed by nickel plating instead of copper plating, and the solder layer was provided thereon. With the spherical bumps thus obtained, circuit parts such as IC and F
The reliability of the connection with the PC has improved. In particular, the solder plating layer provided on the gold layer or the nickel layer so as not to come into direct contact with copper did not produce brittle copper and tin compounds even when heat was applied, so that the connection reliability was further improved.

【0005】[0005]

【実施例】本発明を実施例により説明する。回路形成し
たフレキシブルプリント基板上にアクリル、エポキシ系
の感光性の印刷レジスト層を設け、所定の位置に回路が
露出するように0.14mmφの開口部を形成した。こ
の開口部に銅メッキによりバンプを形成させた。
EXAMPLES The present invention will be described with reference to examples. An acrylic or epoxy photosensitive printing resist layer was provided on the circuit-formed flexible printed circuit board, and an opening of 0.14 mmφ was formed so that the circuit was exposed at a predetermined position. Bumps were formed in the openings by copper plating.

【0006】銅メッキの条件 ・メッキ液の組成 CuSO4 :200±5g/リットル 光沢剤A* :25±5cc/リットル 光沢剤B** :10±1cc/リットル H2SO4 :110±5g/リットル Cl- :50±10ppm* 光沢剤A :「カッパークリームA」(リーロナール社
商品名)** 光沢剤B:「カッパークリームB」(リーロナール社
商品名) ・通電条件 浴温 :30〜35℃ 電流密度 :30〜50A/dm2 通電時間 :10〜15分
Conditions for Copper Plating Composition of Plating Solution CuSO 4 : 200 ± 5 g / liter Brightening agent A * : 25 ± 5 cc / liter Brightening agent B ** : 10 ± 1 cc / liter H 2 SO 4 : 110 ± 5 g / liter l Cl -: 50 ± 10ppm * brightener A: "Copper Cream A" (Rironaru trade name) ** brightener B: "Copper Cream B" (Rironaru trade name) energizing conditions bath temperature: 30 to 35 ° C. Current density: 30 to 50 A / dm 2 Energization time: 10 to 15 minutes

【0007】前記のメッキ条件により図に示したよう
に、下径180〜220μmφで高さ50〜70μmの
球状バンプを形成することが出来た。エッジ効果により
開口部周辺からメッキがはじまるが光沢剤によりメッキ
速度が調整され、かつ、Cuイオンが多く、電流密度が
高いのでメッキが上へ上へと成長し、球状バンプとなっ
た。
Under the above plating conditions, as shown in the figure, a spherical bump having a lower diameter of 180 to 220 μmφ and a height of 50 to 70 μm could be formed. The plating started from the periphery of the opening due to the edge effect, but the plating speed was adjusted by the brightening agent, and since the Cu ions were large and the current density was high, the plating grew upward and became a spherical bump.

【0008】こうして得られた銅バンプに更にメッキを
施して次のバンプを形成させた。 銅バンプ上に直接20±5μmのハンダ層を設けたも
の 銅バンプ上に3〜6μmのニッケル層を設け、その上
に20±5μmのハンダ層を設けたもの 銅バンプ上に3〜6μmのニッケル層を設け、続いて
0.025〜0.1μmの金メッキ層を設け、その上に
20±5μmのハンダ層を設けたもの
The copper bumps thus obtained were further plated to form the next bump. 20 ± 5 μm solder layer provided directly on copper bumps 3-6 μm nickel layer provided on copper bumps, 20 ± 5 μm solder layer provided on it 3-6 μm nickel on copper bumps Layer, followed by a 0.025 to 0.1 μm gold plated layer, and a solder layer of 20 ± 5 μm on it

【0009】[0009]

【発明の効果】本願の如く、光沢剤の濃度を高め、Cu
イオン濃度及び電流密度を高くすることで得られた球形
バンプによれば、FPCの回路とIC等の回路部品との
確実な接続が可能となり、接続の信頼性が向上した。
As described in the present application, the concentration of the brightening agent is increased and Cu
With the spherical bumps obtained by increasing the ion concentration and the current density, the FPC circuit and circuit components such as ICs can be reliably connected, and the connection reliability is improved.

【0010】バンプ表面のハンダ層を加熱溶融させるこ
とで、IC等回路部品とFPCの回路との接続が容易に
確実に実施することが出来た。これは本願の方法によ
り、ほぼ球状のバンプが形成されたことの効果である。
By heating and melting the solder layer on the bump surface, the circuit components such as IC and the FPC circuit can be connected easily and surely. This is an effect of forming substantially spherical bumps by the method of the present application.

【0011】前記のバンプ夫々同様に接続が容易
で確実であったが、は長期信頼性の上で特にすぐれ
ていた。すなわち、長期使用の加速テストとしての加熱
試験(例えば100℃,2週間加熱)を行っても、接合
強度の低下が全くといっていいほど認められなかった。
これは硬くて脆い金属間化合物の成長が極めて遅いこと
によると思われる。
Similar to each of the bumps described above, connection was easy and reliable, but was particularly excellent in terms of long-term reliability. That is, even when a heating test (eg, heating at 100 ° C. for 2 weeks) as an accelerated test for long-term use was performed, no decrease in bonding strength was observed at all.
This is probably due to the extremely slow growth of the hard and brittle intermetallic compound.

【0012】銅とハンダとの間にニッケル層又はニッケ
ルと金の層があることにより、金属間化合物の成長がお
さえられる。特にニッケル層の上に金をごく薄くメッキ
したが最も有効であった。但し、金の層が厚すぎるの
は有効ではなかった。また、銅メッキによるバンプ形成
のかわりに、ニッケルメッキによるバンプ形成によって
も、同様に容易で信頼性の高い接続を確保することが出
来た。
The presence of the nickel layer or the nickel and gold layer between the copper and the solder suppresses the growth of intermetallic compounds. In particular, gold was plated very thinly on the nickel layer, which was most effective. However, it was not effective for the gold layer to be too thick. Also, instead of forming bumps by copper plating, forming bumps by nickel plating also made it possible to secure an easy and highly reliable connection.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明のバンプを示す断面模式図である。FIG. 1 is a schematic sectional view showing a bump of the present invention.

【図2】銅バンプに直接ハンダ層を設けた場合を示す。FIG. 2 shows a case where a solder layer is directly provided on a copper bump.

【図3】銅バンプにニッケル層を設けて、その上にハン
ダ層を設けた場合を示す。
FIG. 3 shows a case where a nickel layer is provided on a copper bump and a solder layer is provided thereon.

【図4】銅バンプにニッケル層、続いて金メッキ層を設
けて、その上にハンダ層を設けた場合を示す。
FIG. 4 shows a case where a nickel layer and then a gold plating layer are provided on a copper bump and a solder layer is provided thereon.

【符号の説明】[Explanation of symbols]

1・・・基板 2・・・回路 3・・・レジスト層 4・・・銅バンプ 5・・・ハンダ層 6・・・ニッケル層 7・・・金メッキ層 1 ... Substrate 2 ... Circuit 3 ... Resist layer 4 ... Copper bump 5 ... Solder layer 6 ... Nickel layer 7 ... Gold plating layer

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 フレキシブルプリント回路表面に設けら
れたレジスト開口部に、ほぼ球状の接続信頼性の高いバ
ンプを形成させたことを特徴とするフレキシブルプリン
ト回路。
1. A flexible printed circuit, wherein substantially spherical bumps having high connection reliability are formed in a resist opening provided on the surface of the flexible printed circuit.
【請求項2】 バンプ表面がハンダ層よりなり、そのハ
ンダ層はニッケル層又は金層の上に形成されていること
を特徴とする請求項1に記載のフレキシブルプリント回
路。
2. The flexible printed circuit according to claim 1, wherein the bump surface is made of a solder layer, and the solder layer is formed on the nickel layer or the gold layer.
【請求項3】 フレキシブルプリント回路表面に設けら
れたレジスト開口部に、銅メッキによりバンプを形成さ
せる方法であって、銅メッキの際、高濃度の光沢剤を使
用し、銅イオン濃度を200〜250g/リットル、電
流密度を30〜50A/dm2として、球状バンプを形
成させることを特徴とするバンプ付きフレキシブルプリ
ント回路の製造方法。
3. A method of forming a bump by copper plating in a resist opening provided on the surface of a flexible printed circuit, wherein a high-concentration brightening agent is used during copper plating, and a copper ion concentration of 200 to A method of manufacturing a flexible printed circuit with bumps, comprising forming spherical bumps at 250 g / liter and a current density of 30 to 50 A / dm 2 .
JP3467196A 1996-02-22 1996-02-22 Bump-formed flexible printed circuit board and manufacturing method thereof Pending JPH09232734A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3467196A JPH09232734A (en) 1996-02-22 1996-02-22 Bump-formed flexible printed circuit board and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3467196A JPH09232734A (en) 1996-02-22 1996-02-22 Bump-formed flexible printed circuit board and manufacturing method thereof

Publications (1)

Publication Number Publication Date
JPH09232734A true JPH09232734A (en) 1997-09-05

Family

ID=12420902

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3467196A Pending JPH09232734A (en) 1996-02-22 1996-02-22 Bump-formed flexible printed circuit board and manufacturing method thereof

Country Status (1)

Country Link
JP (1) JPH09232734A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014036165A (en) * 2012-08-09 2014-02-24 Shinko Electric Ind Co Ltd Semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014036165A (en) * 2012-08-09 2014-02-24 Shinko Electric Ind Co Ltd Semiconductor device

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