JPH09223650A - 露光装置 - Google Patents

露光装置

Info

Publication number
JPH09223650A
JPH09223650A JP8027179A JP2717996A JPH09223650A JP H09223650 A JPH09223650 A JP H09223650A JP 8027179 A JP8027179 A JP 8027179A JP 2717996 A JP2717996 A JP 2717996A JP H09223650 A JPH09223650 A JP H09223650A
Authority
JP
Japan
Prior art keywords
optical system
stage
wafer
photosensitive substrate
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8027179A
Other languages
English (en)
Japanese (ja)
Inventor
Masahiko Okumura
正彦 奥村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP8027179A priority Critical patent/JPH09223650A/ja
Priority to KR1019960082558A priority patent/KR970062817A/ko
Publication of JPH09223650A publication Critical patent/JPH09223650A/ja
Priority to US09/206,238 priority patent/US6122036A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7034—Leveling

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP8027179A 1993-10-21 1996-02-15 露光装置 Pending JPH09223650A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP8027179A JPH09223650A (ja) 1996-02-15 1996-02-15 露光装置
KR1019960082558A KR970062817A (ko) 1996-02-15 1996-12-31 노광장치
US09/206,238 US6122036A (en) 1993-10-21 1998-12-07 Projection exposure apparatus and method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8027179A JPH09223650A (ja) 1996-02-15 1996-02-15 露光装置

Publications (1)

Publication Number Publication Date
JPH09223650A true JPH09223650A (ja) 1997-08-26

Family

ID=12213859

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8027179A Pending JPH09223650A (ja) 1993-10-21 1996-02-15 露光装置

Country Status (2)

Country Link
JP (1) JPH09223650A (ko)
KR (1) KR970062817A (ko)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999039374A1 (fr) * 1998-01-29 1999-08-05 Nikon Corporation Procede d'exposition et dispositif associe
EP1174679A2 (en) * 2000-07-18 2002-01-23 Nikon Corporation Interferometer box
KR100547666B1 (ko) * 2004-02-18 2006-02-02 양균의 권선금형의 수정점 위치 지정과 수정량 확인 기능을 갖는 장치 및 이를 이용한 수정량 조정방법
JP2014122910A (ja) * 2006-09-01 2014-07-03 Nikon Corp 移動体駆動方法及び移動体駆動システム、パターン形成方法及び装置、露光方法及び装置、並びにデバイス製造方法
US9081301B2 (en) 2006-09-01 2015-07-14 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method
JP2015157420A (ja) * 2014-02-25 2015-09-03 日本電子株式会社 三次元積層造形装置
US9958792B2 (en) 2006-08-31 2018-05-01 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US10067428B2 (en) 2006-08-31 2018-09-04 Nikon Corporation Movable body drive system and movable body drive method, pattern formation apparatus and method, exposure apparatus and method, device manufacturing method, and decision-making method
US10101673B2 (en) 2006-08-31 2018-10-16 Nikon Corporation Movable body drive method and system, pattern formation method and apparatus, exposure method and apparatus for driving movable body based on measurement value of encoder and information on flatness of scale, and device manufacturing method
CN114290549A (zh) * 2021-12-21 2022-04-08 江苏京创先进电子科技有限公司 划片机工作台的调平机构及调平方法
CN115597504A (zh) * 2022-12-15 2023-01-13 杭州百子尖科技股份有限公司（Cn） 用于机器视觉量测的激光同轴度的校准装置及校准方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3013837B2 (ja) * 1998-04-27 2000-02-28 日本電気株式会社 ステージ位置計測装置およびその計測方法

Cited By (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999039374A1 (fr) * 1998-01-29 1999-08-05 Nikon Corporation Procede d'exposition et dispositif associe
US6813000B1 (en) 1998-01-29 2004-11-02 Nikon Corporation Exposure method and apparatus
EP1174679A2 (en) * 2000-07-18 2002-01-23 Nikon Corporation Interferometer box
EP1174679A3 (en) * 2000-07-18 2003-03-12 Nikon Corporation Interferometer box
KR100547666B1 (ko) * 2004-02-18 2006-02-02 양균의 권선금형의 수정점 위치 지정과 수정량 확인 기능을 갖는 장치 및 이를 이용한 수정량 조정방법
US10353301B2 (en) 2006-08-31 2019-07-16 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US9958792B2 (en) 2006-08-31 2018-05-01 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US10338482B2 (en) 2006-08-31 2019-07-02 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US10353302B2 (en) 2006-08-31 2019-07-16 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US10162274B2 (en) 2006-08-31 2018-12-25 Nikon Corporation Movable body drive method and system, pattern formation method and apparatus, exposure method and apparatus for driving movable body based on measurement value of encoder and information on flatness of scale, and device manufacturing method
US10101673B2 (en) 2006-08-31 2018-10-16 Nikon Corporation Movable body drive method and system, pattern formation method and apparatus, exposure method and apparatus for driving movable body based on measurement value of encoder and information on flatness of scale, and device manufacturing method
US10073359B2 (en) 2006-08-31 2018-09-11 Nikon Corporation Movable body drive system and movable body drive method, pattern formation apparatus and method, exposure apparatus and method, device manufacturing method, and decision-making method
US10067428B2 (en) 2006-08-31 2018-09-04 Nikon Corporation Movable body drive system and movable body drive method, pattern formation apparatus and method, exposure apparatus and method, device manufacturing method, and decision-making method
US9983486B2 (en) 2006-08-31 2018-05-29 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US9081301B2 (en) 2006-09-01 2015-07-14 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method
US9377698B2 (en) 2006-09-01 2016-06-28 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method
US9874822B2 (en) 2006-09-01 2018-01-23 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US9760021B2 (en) 2006-09-01 2017-09-12 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method
US9971253B2 (en) 2006-09-01 2018-05-15 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method
US9740114B2 (en) 2006-09-01 2017-08-22 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method
US9625834B2 (en) 2006-09-01 2017-04-18 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method
US9429854B2 (en) 2006-09-01 2016-08-30 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method
JP2018151646A (ja) * 2006-09-01 2018-09-27 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
US9846374B2 (en) 2006-09-01 2017-12-19 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method
JP2014122910A (ja) * 2006-09-01 2014-07-03 Nikon Corp 移動体駆動方法及び移動体駆動システム、パターン形成方法及び装置、露光方法及び装置、並びにデバイス製造方法
US10197924B2 (en) 2006-09-01 2019-02-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method
US10289010B2 (en) 2006-09-01 2019-05-14 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
JP2015111695A (ja) * 2006-09-01 2015-06-18 株式会社ニコン 露光方法及び露光装置、並びにデバイス製造方法
JP2015008306A (ja) * 2006-09-01 2015-01-15 株式会社ニコン 露光方法及び露光装置、並びにデバイス製造方法
JP2015157420A (ja) * 2014-02-25 2015-09-03 日本電子株式会社 三次元積層造形装置
CN114290549A (zh) * 2021-12-21 2022-04-08 江苏京创先进电子科技有限公司 划片机工作台的调平机构及调平方法
CN115597504A (zh) * 2022-12-15 2023-01-13 杭州百子尖科技股份有限公司（Cn） 用于机器视觉量测的激光同轴度的校准装置及校准方法
CN115597504B (zh) * 2022-12-15 2023-04-07 杭州百子尖科技股份有限公司 用于机器视觉量测的激光同轴度的校准装置及校准方法

Also Published As

Publication number Publication date
KR970062817A (ko) 1997-09-12

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