JPH09199830A - Manufacture of flexible wiring board - Google Patents

Manufacture of flexible wiring board

Info

Publication number
JPH09199830A
JPH09199830A JP2455596A JP2455596A JPH09199830A JP H09199830 A JPH09199830 A JP H09199830A JP 2455596 A JP2455596 A JP 2455596A JP 2455596 A JP2455596 A JP 2455596A JP H09199830 A JPH09199830 A JP H09199830A
Authority
JP
Japan
Prior art keywords
wiring board
flexible wiring
insulating film
adhesive
circuit pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2455596A
Other languages
Japanese (ja)
Inventor
Takashi Saito
貴 齊藤
Hiroshi Nakagawa
浩志 中川
Kenkichi Hirai
謙吉 平井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Arisawa Mfg Co Ltd
Hosiden Corp
Original Assignee
Arisawa Mfg Co Ltd
Hosiden Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arisawa Mfg Co Ltd, Hosiden Corp filed Critical Arisawa Mfg Co Ltd
Priority to JP2455596A priority Critical patent/JPH09199830A/en
Publication of JPH09199830A publication Critical patent/JPH09199830A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a solderable and flexible wiring board having small dimensional change by heat. SOLUTION: First, an epoxy-based, polyester-based or acryl-based bonding agent is applied to an insulating film using a comma-coater, and the bonding agent is semicured under a suitable travelling and heating condition. Then, the metal foil such as copper foil, aluminum foil and the like is joined to the adhesive surface of the above-mentioned insulating film using a roll laminator and the like, the bonding agent is cured, and a metal clad board is formed. Then, a prescribed circuit pattern is formed by etching the metal foil. A cover lay is formed on the circuit pattern, a surface treatment is conducted on the exposed circuit pattern, solder plating, nickel plating and gold plating are conducted, and a flexible wiring board is manufactured.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明はフレキシブル配線基
板の製造方法に関する。具体的に言うと、寸法変化の少
ないフレキシブル配線基板に関する。
TECHNICAL FIELD The present invention relates to a method for manufacturing a flexible wiring board. More specifically, the present invention relates to a flexible wiring board having a small dimensional change.

【0002】[0002]

【従来の技術】フレキシブル配線基板(FPC)は、絶
縁性フィルム上に導電性を有する銅箔等の金属箔を貼り
合わせたものであり、前記金属箔にはエッチング等によ
り所定の回路パターンが形成される。この回路パターン
面には、はんだ付け時のブリッジ防止等のため、絶縁性
の樹脂フィルムからなるカバーレイが形成されている。
このフレキシブル配線基板は、柔軟性を有しており、そ
の柔軟性により各種の電子機器等に広く用いられるよう
になってきた。
2. Description of the Related Art A flexible printed circuit (FPC) is an insulating film on which a metal foil such as a conductive copper foil is attached, and a predetermined circuit pattern is formed on the metal foil by etching or the like. To be done. A coverlay made of an insulating resin film is formed on the circuit pattern surface to prevent bridges during soldering.
This flexible wiring board has flexibility, and due to the flexibility, it has been widely used in various electronic devices and the like.

【0003】上記の絶縁性フィルムには、例えばポリイ
ミドやポリエステルなどの絶縁性を有する樹脂フィルム
が用いられる。かかるフレキシブル配線基板は次のよう
にして作製することができる。まず、絶縁性フィルム上
に接着剤を塗付し、加熱して溶媒を揮散させて半硬化状
態にする。その後、銅箔などの金属箔を貼り合わせる。
更に、加熱して接着剤を硬化させ、金属箔貼り合わせ基
板を作製する。
As the insulating film, a resin film having an insulating property such as polyimide or polyester is used. Such a flexible wiring board can be manufactured as follows. First, an adhesive is applied on the insulating film and heated to volatilize the solvent to make it a semi-cured state. After that, a metal foil such as a copper foil is attached.
Furthermore, the adhesive is cured by heating to produce a metal foil bonded substrate.

【0004】上記金属箔貼り合わせ基板をエッチング処
理して、所定の回路パターンを形成する。この後、前記
回路パターンの電子部品との接続部分を露出させて、ス
クリーン印刷等にてカバーレイを形成する。最後に露出
した回路パターン上にはんだやNi/Auを付着させ
て、露出した回路パターンの表面処理を行ない、フレキ
シブル配線基板を作製する。
The metal foil bonded substrate is etched to form a predetermined circuit pattern. After that, the connection portion of the circuit pattern with the electronic component is exposed, and a coverlay is formed by screen printing or the like. Finally, solder or Ni / Au is adhered on the exposed circuit pattern and surface treatment of the exposed circuit pattern is performed to manufacture a flexible wiring board.

【0005】このように作製されたフレキシブル配線基
板に種々の電子部品をはんだ付けして、電子部品を実装
することができる。
Various electronic components can be soldered to the flexible wiring board thus manufactured to mount the electronic components.

【0006】[0006]

【発明が解決しようとする課題】しかしながら、上記製
造にPETフィルムを使用した時、例えばカバーレイ等
をスクリーン印刷した場合には加熱硬化を行っていた。
また、はんだ付けにより部品実装を行う場合にも、はん
だの融点以上の高温が負荷されていた。
However, when a PET film is used in the above production, for example, when a cover lay or the like is screen-printed, it is heat-cured.
Further, even when components are mounted by soldering, a high temperature higher than the melting point of the solder is applied.

【0007】このため、PETフィルムの寸法が変化
し、フレキシブル配線基板が大きくたるんだり、しわが
発生したりして、フレキシブル配線基板の信頼性を損ね
ることがあった。
For this reason, the dimensions of the PET film may change, and the flexible wiring board may largely sag or wrinkle, which may impair the reliability of the flexible wiring board.

【0008】本発明は叙上の従来例の欠点に鑑みてなさ
れたものであり、その目的とするところは、熱による寸
法変化の小さく、はんだ付けが可能なフレキシブル配線
基板を提供することにある。
The present invention has been made in view of the drawbacks of the above conventional examples, and an object of the present invention is to provide a flexible wiring board which has a small dimensional change due to heat and can be soldered. .

【0009】[0009]

【課題を解決するための手段】本発明のフレキシブル配
線基板の製造方法は、絶縁性フィルムと、この絶縁性フ
ィルムの上に貼り合わされた回路パターンとなるべき金
属箔とを有するフレキシブル配線基板の製造方法であっ
て、前記絶縁性フィルムの少なくとも一方の面に接着剤
を塗布し、適切な走行条件、加熱条件にて半硬化状態に
仕上げて金属箔と貼り合わせ、熱硬化させることを特徴
としている。
A method for manufacturing a flexible wiring board according to the present invention is a method for manufacturing a flexible wiring board having an insulating film and a metal foil to be a circuit pattern bonded on the insulating film to form a circuit pattern. The method is characterized in that an adhesive is applied to at least one surface of the insulating film, and a semi-cured state is finished under appropriate running conditions and heating conditions, and the metal foil is bonded to the semi-cured state and heat-cured. .

【0010】本発明のフレキシブル配線基板には、PE
Tフィルムを用いるが、加熱後の寸法変化率が小さいも
の程好ましく、例えば150℃、30分加熱後の寸法変
化率が0.1%以下のものが望ましい。
The flexible wiring board of the present invention comprises PE
Although a T film is used, the smaller the dimensional change rate after heating is, the better. For example, the dimensional change rate after heating at 150 ° C. for 30 minutes is preferably 0.1% or less.

【0011】また厚さも種々のものを用いることがで
き、例えば、25μm、50μm、75μm等の絶縁性
フィルムを用いることができる。
Various thicknesses can be used, and for example, an insulating film having a thickness of 25 μm, 50 μm, 75 μm or the like can be used.

【0012】絶縁性フィムルの少なくとも一方の面に接
着剤を塗布し、適切な走行条件及び加熱条件にて半硬化
状態に仕上げる。
An adhesive is applied to at least one surface of the insulating film and finished in a semi-cured state under appropriate running and heating conditions.

【0013】半硬化状態に仕上げる加熱温度としては、
絶縁性フィルムの耐熱グレードに応じてあらかじめ実験
することにより寸法変化率が最小となるように設定すれ
ばよく、例えば150℃、30分加熱後の寸法変化率が
0.1%以下のPETフィルムを用いた場合には110
℃〜160℃の範囲が望ましい。また、一般グレードの
PETフィルムを用いる場合には、貼り合わせ前に18
0℃、10分の熱処理を行うとよい。
The heating temperature for finishing to a semi-cured state is as follows:
It may be set according to the heat-resistant grade of the insulating film so as to minimize the dimensional change rate. For example, a PET film having a dimensional change rate of 0.1% or less after heating at 150 ° C. for 30 minutes is used. 110 if used
The range of ℃ -160 ℃ is desirable. In addition, when using a PET film of general grade,
It is preferable to perform heat treatment at 0 ° C. for 10 minutes.

【0014】[0014]

【発明の実施の形態】本発明のフレキシブル配線基板は
次のようにして作製する。まず、絶縁性フィルム上にコ
ンマコータ等を用いて、エポキシ系、ポリエステル系、
アクリル系などの接着剤を塗付し、例えば110℃〜1
60℃で10分間加熱して溶媒を揮散させ、接着剤を半
硬化状態にする。
BEST MODE FOR CARRYING OUT THE INVENTION The flexible wiring board of the present invention is manufactured as follows. First, by using a comma coater or the like on the insulating film, epoxy type, polyester type,
Apply an acrylic adhesive or the like, for example 110 ° C to 1
The adhesive is semi-cured by heating at 60 ° C. for 10 minutes to evaporate the solvent.

【0015】次に加熱しながら、ロールラミネータ等を
用いて、銅箔やアルミニウム箔などの金属箔を前記絶縁
性フィルムの接着面に貼り合わせる。
Next, while heating, a metal foil such as a copper foil or an aluminum foil is attached to the adhesive surface of the insulating film by using a roll laminator or the like.

【0016】この後、例えば70℃、48時間加熱して
接着剤を硬化させ、金属箔貼り合わせ基板を作製する。
After that, the adhesive is cured by heating at 70 ° C. for 48 hours, for example, to prepare a metal foil bonded substrate.

【0017】次に金属箔をエッチング処理して所定の回
路パターンを形成する。以下、従来例と同様にしてカバ
ーレイを形成し、露出した回路パターンに表面処理を行
ないはんだ等を付着させ、本発明のフレキシブル配線基
板を作製する。
Next, the metal foil is etched to form a predetermined circuit pattern. Thereafter, a cover lay is formed in the same manner as in the conventional example, surface treatment is performed on the exposed circuit pattern, and solder or the like is attached thereto to manufacture the flexible wiring board of the present invention.

【0018】このようにして作製されたフレキシブル配
線基板は、たるみやしわが少なく、例えば図1に示すよ
うなリフローカーブにより、電子部品をはんだ付けする
ことができる。なお、図1に示すリフローカーブは、フ
レキシブル配線基板に低温はんだによって電子部品を実
装するための条件を示したものであり、この場合にはま
ずフレキシブル基板を徐々に加熱して、80℃〜130
℃の範囲で加熱開始から少なくとも60秒間加熱してプ
リヒートを行う。次に、フレキシブル基板を80秒以内
に最高加熱温度よりも5℃低い温度、すなわち150℃
〜185℃の範囲にまで上昇させ、その後155℃〜1
90℃の最高加熱温度まで上昇させるとともに20秒以
内に電子部品のはんだ付けを終了させるとよい。
The flexible wiring board manufactured in this manner has less slack and wrinkles, and electronic components can be soldered by a reflow curve as shown in FIG. 1, for example. The reflow curve shown in FIG. 1 shows conditions for mounting electronic components on a flexible wiring board by low-temperature soldering. In this case, first, the flexible board is gradually heated to 80 ° C. to 130 ° C.
Preheating is performed by heating in the range of ° C for at least 60 seconds from the start of heating. Next, the flexible substrate is heated within 80 seconds by 5 ° C lower than the maximum heating temperature, that is, 150 ° C.
~ 185 ° C range, then 155 ° C ~ 1
It is advisable to raise the maximum heating temperature of 90 ° C. and complete the soldering of electronic components within 20 seconds.

【0019】[0019]

【実施例】次に実施例として、上記金属箔貼り合わせ基
板にエッチング処理を施することにより回路パターンを
形成し、本発明の効果を確認した。
EXAMPLES Next, as an example, a circuit pattern was formed by subjecting the above-mentioned metal foil laminated substrate to an etching treatment, and the effect of the present invention was confirmed.

【0020】〔実施例〕絶縁性フィルムとして、厚さ7
5μmの低熱収縮性のポリエステルフィルム〔帝人
(株)製SLA、150℃、30分加熱後寸法変化率:
0.1%〕を用い、乾燥後の厚さが約25μmとなるよ
うにエポキシ樹脂系の接着剤を塗付して、110℃〜1
60℃で10分間乾燥する。次にロールラミネータを用
いて70℃で厚さ35μmの銅箔を貼り合わせ、その後
エッチング処理を施して所定の回路パターンを形成し
た。
[Example] An insulating film having a thickness of 7
5 μm low heat shrinkable polyester film [SLA manufactured by Teijin Limited, 150 ° C., dimensional change rate after heating for 30 minutes:
0.1%], and an epoxy resin-based adhesive is applied so that the thickness after drying is about 25 μm.
Dry at 60 ° C for 10 minutes. Next, a copper foil having a thickness of 35 μm was attached at 70 ° C. using a roll laminator, and then an etching process was performed to form a predetermined circuit pattern.

【0021】次にこれらの回路パターンが形成されたも
のを用いて、150℃、30分後加熱後の寸法変化率を
測定した。
Next, using those having these circuit patterns formed thereon, the dimensional change rate after heating at 150 ° C. for 30 minutes was measured.

【0022】[0022]

【表1】 [Table 1]

【0023】表1から分かるように 110℃、140
℃に加熱した半硬化状態の接着剤で貼り合わせた実施例
では、いずれも寸法変化率は長さ方向、幅方向ともに
0.1%程度であり、たわみやしわが見られず、電子部
品の実装にもほとんど影響がなかった。
As can be seen from Table 1, 140 ° C., 140 ° C.
In each of the examples bonded with the semi-cured adhesive heated to 0 ° C., the dimensional change rate was about 0.1% in both the length direction and the width direction, and no bending or wrinkling was observed. There was almost no impact on the implementation.

【0024】また、160℃で貼り合わせた実施例1の
ものも、長さ方向に0.2%に縮み、わずかにたわみや
しわが見られ、電子部品の実装にやや影響が見られた程
度であった。
Also, in Example 1 which was bonded at 160 ° C., the shrinkage was 0.2% in the length direction, slight bending and wrinkling were observed, and there was a slight effect on the mounting of electronic parts. Met.

【0025】〔比較例〕次に、加熱後の寸法変化率が異
なるPETフィルムを用いて、実施例と同様に回路パタ
ーンを形成し、150℃、30分加熱後の寸法変化率を
測定した。
Comparative Example Next, using PET films having different dimensional change rates after heating, a circuit pattern was formed in the same manner as in the example, and the dimensional change rate after heating at 150 ° C. for 30 minutes was measured.

【0026】絶縁性フィルムとして、150℃、30分
加熱後の寸法変化率がそれぞれ0.4%、1.3%の2
種類のPETフィルム〔厚さ75μm、東レ(株)製〕
を用い、乾燥後の厚さが約25μmとなるように接着剤
を塗付して、140℃で10分間乾燥する。次にラミネ
ータを用いて70℃で厚さ35μmの銅箔を貼り合わ
せ、その後エッチング処理を施して所定の回路パターン
を形成し、比較例の基板を作製した。
As an insulating film, the dimensional change rates after heating at 150 ° C. for 30 minutes are 0.4% and 1.3%, respectively.
Types of PET film [thickness 75 μm, manufactured by Toray Industries, Inc.]
Using, the adhesive is applied so that the thickness after drying is about 25 μm, and dried at 140 ° C. for 10 minutes. Next, a copper foil having a thickness of 35 μm was attached at 70 ° C. by using a laminator, and then an etching process was performed to form a predetermined circuit pattern, thereby producing a substrate of a comparative example.

【0027】これらの比較例の基板について、150
℃、30分加熱後の寸法変化率(変化の大きい長さ方
向)を測定した。その結果を表2に示す。
For the substrates of these comparative examples, 150
The dimensional change rate (longitudinal direction in which the change was large) was measured after heating at 30 ° C. for 30 minutes. Table 2 shows the results.

【0028】[0028]

【表2】 [Table 2]

【0029】表2から分かるように、実施例の基板で
は、寸法変化率が0.1%であったのに対し、比較例の
理基板では、それぞれ寸法変化率は0.5%、1.5%
であった。
As can be seen from Table 2, the dimensional change rate of the substrate of the example was 0.1%, whereas the dimensional change rate of the comparative substrate was 0.5% and 1. 5%
Met.

【0030】また、実施例の基板において、加熱後の寸
法変化率が0.1%のPETフィルムを用いた場合に
は、しわやたるみがほとんど見られず、電子部品の実装
には全く影響がなかった。寸法変化率が0.4%のPE
Tフィルムを用いた場合にはしわやたるみが見られ、電
子部品の実装には適さなかった。寸法変化率が1.3%
のPETフィルムを用いた場合にはしわやたるみが多く
見られ、電子部品の実装にはまったく不適であった。
When a PET film having a dimensional change rate after heating of 0.1% is used in the substrate of the embodiment, almost no wrinkles or sagging are observed, and there is no influence on the mounting of electronic parts. There wasn't. PE with a dimensional change rate of 0.4%
When the T film was used, wrinkles and sagging were observed, which was not suitable for mounting electronic parts. Dimensional change rate is 1.3%
When the PET film of No. 3 was used, many wrinkles and sagging were observed, and it was completely unsuitable for mounting electronic parts.

【0031】このように絶縁性フィルムの少なくとも一
方の面に接着剤を塗布し、適切な走行条件及び加熱条件
にて半硬化状態に仕上げて、前記金属箔と貼り合わせ、
加熱後の寸法変化率を0.2%程度にしておけば、回路
パターンを表面処理してもしわやたるみを生じにくく、
また実装部品の実装性もよいフレキシブル配線基板を製
造することができる。したがって信頼性のあるフレキシ
ブル配線基板を提供できる。
In this way, an adhesive is applied to at least one surface of the insulating film, finished in a semi-cured state under appropriate running conditions and heating conditions, and bonded to the metal foil,
If the dimensional change rate after heating is set to about 0.2%, wrinkles and slack are less likely to occur even when the circuit pattern is surface-treated,
In addition, it is possible to manufacture a flexible wiring board having good mountability of mounted components. Therefore, a reliable flexible wiring board can be provided.

【0032】[0032]

【発明の効果】本発明のフレキシブル配線基板は、絶縁
性フィルムと、この絶縁性フィルムの上に貼り合わされ
た回路パターンとなるべき金属箔とを有するフレキシブ
ル配線基板の製造方法であって、前記絶縁性フィルムの
少なくとも一方の面に接着剤を塗布し、前記塗布した接
着剤を適切な走行条件及び加熱条件にて半硬化状態に仕
上げて、前記金属箔と貼り合わせ、接着剤を熱硬化させ
ることを特徴としているので、しわやたるみの少ないフ
レキシブル配線基板を製造することができる。
The flexible wiring board of the present invention is a method for manufacturing a flexible wiring board having an insulating film and a metal foil to be a circuit pattern laminated on the insulating film. Applying an adhesive to at least one surface of the conductive film, finishing the applied adhesive to a semi-cured state under appropriate running conditions and heating conditions, bonding it to the metal foil, and thermally curing the adhesive. Therefore, it is possible to manufacture a flexible wiring board with less wrinkles and slack.

【0033】このとき、150℃、30分加熱後の寸法
変化率が0.1%以下の絶縁性フィルムを用いれば、フ
レキシブル配線基板の寸法変化率を0.2%程度に抑え
ることができ、実装時におけるしわやたるみの発生を少
なくできる。
At this time, if an insulating film having a dimensional change rate of 0.1% or less after heating at 150 ° C. for 30 minutes is used, the dimensional change rate of the flexible wiring board can be suppressed to about 0.2%. The occurrence of wrinkles and slack during mounting can be reduced.

【0034】また、接着剤は適切な走行条件及び加熱条
件にて、110℃〜160℃の温度範囲で半硬化状態に
すると、フレキシブル配線基板の寸法変化率を最小限に
抑えることができる。
When the adhesive is semi-cured in the temperature range of 110 ° C. to 160 ° C. under appropriate running and heating conditions, the dimensional change rate of the flexible wiring board can be minimized.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明のフレキシルブル配線基板に電子部品を
実装する際のリフローカーブの一例である。
FIG. 1 is an example of a reflow curve when an electronic component is mounted on a flexible wiring board of the present invention.

フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 B29L 31:34 (72)発明者 平井 謙吉 新潟県上越市南本町1丁目5番5号 株式 会社有沢製作所内Continuation of front page (51) Int.Cl. 6 Identification number Internal reference number FI Technical display location B29L 31:34 (72) Inventor Kenkichi Hirai 1-5 Minamihonmachi, Joetsu City, Niigata Prefecture Arisawa Manufacturing Co., Ltd.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 絶縁性フィルムと、この絶縁性フィルム
の上に貼り合わされた回路パターンとなるべき金属箔と
を有するフレキシブル配線基板の製造方法において、 前記絶縁性フィルムの少なくとも一方の面に接着剤を塗
布し、前記塗布した接着剤上から、前記金属箔を加熱下
において貼り合わせ、接着剤を適切な走行条件及び加熱
条件にて、半硬化状態に仕上げて、前記金属箔と張り合
わせ、その後接着剤を熱硬化させることを特徴としたフ
レキシブル配線基板の製造方法。
1. A method for manufacturing a flexible wiring board, comprising: an insulating film; and a metal foil, which is laminated on the insulating film to form a circuit pattern, wherein an adhesive is applied to at least one surface of the insulating film. Is applied, and the metal foil is pasted on the applied adhesive under heating, the adhesive is finished in a semi-cured state under appropriate running conditions and heating conditions, and the adhesive is applied to the metal foil, and then adhered. A method for manufacturing a flexible wiring board, which comprises thermally curing an agent.
【請求項2】 前記フレキシブル配線基板は、150
℃、30分加熱後の寸法変化率が0.2%以下であるこ
とを特徴とする請求項1に記載のフレキシブル配線基板
の製造方法。
2. The flexible wiring board comprises 150
The method for manufacturing a flexible wiring board according to claim 1, wherein the dimensional change rate after heating at 30 ° C. for 30 minutes is 0.2% or less.
【請求項3】 前記絶縁性フィルムに塗布した接着剤の
加熱処理は、110℃〜160℃の温度範囲で行うこと
を特徴とする請求項1または2に記載のフレキシブル配
線基板の製造基板。
3. The flexible wiring board manufacturing substrate according to claim 1, wherein the heat treatment of the adhesive applied to the insulating film is performed in a temperature range of 110 ° C. to 160 ° C.
JP2455596A 1996-01-17 1996-01-17 Manufacture of flexible wiring board Pending JPH09199830A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2455596A JPH09199830A (en) 1996-01-17 1996-01-17 Manufacture of flexible wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2455596A JPH09199830A (en) 1996-01-17 1996-01-17 Manufacture of flexible wiring board

Publications (1)

Publication Number Publication Date
JPH09199830A true JPH09199830A (en) 1997-07-31

Family

ID=12141411

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2455596A Pending JPH09199830A (en) 1996-01-17 1996-01-17 Manufacture of flexible wiring board

Country Status (1)

Country Link
JP (1) JPH09199830A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7858200B2 (en) 2004-07-27 2010-12-28 Kaneka Corporation Adhesive film and use thereof
US8338560B2 (en) 2005-04-25 2012-12-25 Kaneka Corporation Polyimide film and use thereof
US8426548B2 (en) 2004-09-24 2013-04-23 Kaneka Corporation Polyimide film and adhesive film and flexible metal-clad laminate both obtained with the same
US8435641B2 (en) 2002-11-28 2013-05-07 Kaneka Corporation Process for producing heat-resistant flexible laminate and heat-resistant flexible laminate produced thereby
KR20150001662A (en) 2013-06-26 2015-01-06 듀폰 도레이 컴파니, 리미티드 Polyimide film
TWI494407B (en) * 2004-05-13 2015-08-01 Kaneka Corp Adhesive film and production method therefor and flexible metal-clad laminate and production method therefor
KR102305521B1 (en) * 2021-03-04 2021-09-30 주식회사 오플렉스 Backplate film for flexible display and flexible display comprising the same

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8435641B2 (en) 2002-11-28 2013-05-07 Kaneka Corporation Process for producing heat-resistant flexible laminate and heat-resistant flexible laminate produced thereby
TWI494407B (en) * 2004-05-13 2015-08-01 Kaneka Corp Adhesive film and production method therefor and flexible metal-clad laminate and production method therefor
TWI494406B (en) * 2004-05-13 2015-08-01 Kaneka Corp Adhesive film and production method therefor and flexible metal-clad laminate and production method therefor
US7858200B2 (en) 2004-07-27 2010-12-28 Kaneka Corporation Adhesive film and use thereof
US8426548B2 (en) 2004-09-24 2013-04-23 Kaneka Corporation Polyimide film and adhesive film and flexible metal-clad laminate both obtained with the same
US8338560B2 (en) 2005-04-25 2012-12-25 Kaneka Corporation Polyimide film and use thereof
KR20150001662A (en) 2013-06-26 2015-01-06 듀폰 도레이 컴파니, 리미티드 Polyimide film
KR102305521B1 (en) * 2021-03-04 2021-09-30 주식회사 오플렉스 Backplate film for flexible display and flexible display comprising the same

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