JPH11204902A - Manufacture of adhesive-coated flexible printed-circuit board - Google Patents

Manufacture of adhesive-coated flexible printed-circuit board

Info

Publication number
JPH11204902A
JPH11204902A JP543798A JP543798A JPH11204902A JP H11204902 A JPH11204902 A JP H11204902A JP 543798 A JP543798 A JP 543798A JP 543798 A JP543798 A JP 543798A JP H11204902 A JPH11204902 A JP H11204902A
Authority
JP
Japan
Prior art keywords
adhesive
polyamic acid
copper foil
polyimide
flexible printed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP543798A
Other languages
Japanese (ja)
Inventor
Yoshitaka Okugawa
良隆 奥川
Etsu Takeuchi
江津 竹内
Yoshiyuki Yamamori
義之 山森
Hideaki Sasajima
秀明 笹嶋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP543798A priority Critical patent/JPH11204902A/en
Publication of JPH11204902A publication Critical patent/JPH11204902A/en
Pending legal-status Critical Current

Links

Landscapes

  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Laminated Bodies (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a manufacturing method of a high thermal resistant adhesive-coated flexible printed-circuit board having no curl at all. SOLUTION: A polyamidic acid film 2 is formed from polyamidic acid solution of polyimide resin having a smaller linear expansion coefficient than that of copper to be annealed at a high temperature after thermocompression bonding with a copper foil 3, so that the polyamidic acid may be turned into ring-closed imide to form the copper foil 3 with polyimide enabling the adhesive-coated flexible printed-circuit board to be manufactured by fluidly coating and drying an adhesive resin solution on this polyimide layer.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、回路形成後に、別
の回路基板と張り合わせたり、半導体素子や電気・電子
部品を接着固定することができ、カールが無く、耐熱性
の良い接着剤付きフレキシブルプリント回路板の製造方
法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flexible, heat-resistant adhesive with no curl, which is capable of bonding to another circuit board or bonding and fixing a semiconductor element or an electric or electronic component after forming a circuit. The present invention relates to a method for manufacturing a printed circuit board.

【0002】[0002]

【従来の技術】従来、フレキシブルプリント回路板は、
銅箔と接着剤付き絶縁フィルムを熱圧着などの方法で張
り合わせたり、銅箔上に直接ポリアミド酸樹脂溶液を塗
布乾燥させて接着剤層の無いポリイミドフレキシブルプ
リント回路板を得る方法で製造されている。また、フレ
キシブルプリント回路板の絶縁層上に接着剤樹脂層を設
け、別のプリント回路板と接着したり、半導体素子や電
子部品を接着固定させたりすることが行われている。
2. Description of the Related Art Conventionally, a flexible printed circuit board has
It is manufactured by laminating a copper foil and an insulating film with an adhesive by thermocompression bonding or by applying a polyamic acid resin solution directly on the copper foil and drying to obtain a polyimide flexible printed circuit board without an adhesive layer. . Further, an adhesive resin layer is provided on an insulating layer of a flexible printed circuit board, and is bonded to another printed circuit board, or a semiconductor element or an electronic component is bonded and fixed.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、このよ
うな接着剤付きフレキシブルプリント回路板では、次の
ような問題点があった。接着剤付き絶縁フィルムを銅箔
と熱圧着したものでは、絶縁フィルムの接着剤の耐熱が
低いため、絶縁層上に塗布する接着剤として高温での乾
燥が必要となる耐熱の良い接着剤を用いることができな
かった。また、銅箔上に直接ポリアミド酸樹脂を塗布乾
燥させた後にアニールして接着剤層の無いポリイミドフ
レキシブルプリント回路板を得る方法では、耐熱性が良
いので、絶縁層上に塗布する接着剤に、高耐熱接着剤を
使用することができるが、一般に、このような接着剤層
のないポリイミドフレキシブル回路板では、ポリイミド
樹脂上に接着剤を設けない状態でカールがないように設
計されており、絶縁層上に接着剤層を形成すると、樹脂
層を内にして大きくカールが発生してしまい、回路加工
やハンドリングに支障が生じる。
However, such a flexible printed circuit board with an adhesive has the following problems. When an insulating film with an adhesive is thermocompression-bonded to a copper foil, the adhesive of the insulating film has a low heat resistance. Therefore, an adhesive having a high heat resistance that needs to be dried at a high temperature is used as the adhesive applied on the insulating layer. I couldn't do that. In addition, in a method of obtaining a polyimide flexible printed circuit board without an adhesive layer by applying a polyamic acid resin directly on a copper foil and drying and then annealing it, since the heat resistance is good, the adhesive applied on the insulating layer is Although a high heat-resistant adhesive can be used, in general, such a polyimide flexible circuit board without an adhesive layer is designed so that no curl occurs without providing an adhesive on the polyimide resin, and the insulating material is insulated. If an adhesive layer is formed on the layer, curling will be greatly generated with the resin layer inside, which will hinder circuit processing and handling.

【0004】そこで本発明は、従来の接着剤付きフレキ
シブルプリント回路板が有する上記の問題を鑑みて、鋭
意研究をした結果なされたものであり、接着剤付きでカ
ールが無く、耐熱性の良い接着剤付きフレキシブルプリ
ント板の製造方法を提供することを目的とする。
Accordingly, the present invention has been made as a result of intensive studies in view of the above-mentioned problems of the conventional flexible printed circuit board with an adhesive. An object of the present invention is to provide a method for producing a flexible printed board with an agent.

【0005】[0005]

【課題を解決するための手段】上記の目的を達成するた
めに、本発明の接着剤付きフレキシブルプリント板の製
造方法は、イミド化後の線膨張係数が銅よりも小さいポ
リイミド樹脂のポリアミド酸溶液からポリアミド酸フィ
ルムを作製し、銅箔と熱圧着して張り合わせる工程と、
得られたポリアミド酸フィルム付き銅箔を高温でアニー
ルしてポリアミド酸を閉環させてポリイミド付き銅箔を
得る工程と、該ポリイミド層上に接着剤樹脂溶液を塗布
乾燥させる工程からなる、ことを特徴としている。
In order to achieve the above object, a method for producing a flexible printed board with an adhesive according to the present invention comprises a polyamic acid solution of a polyimide resin having a linear expansion coefficient after imidization smaller than that of copper. From a polyamic acid film, thermocompression bonding with copper foil and laminating,
A step of annealing the obtained copper foil with a polyamic acid film at a high temperature to close the polyamic acid to obtain a copper foil with a polyimide, and a step of applying and drying an adhesive resin solution on the polyimide layer. And

【0006】[0006]

【発明の実施の形態】図1は、本発明の接着剤付きフレ
キシブルプリント回路板の製造方法の1例をしめす。図
1において、まず離型可能な基材上にポリアミド酸樹脂
溶液を流延塗布し、半乾燥させてポリアミド酸フィルム
をえる。次に、このポリアミド酸フィルムを基材付きの
まま、ポリアミド酸樹脂面を銅箔と対向させて熱圧着
し、その後、基材を剥離する。得られたポリアミド酸フ
ィルム付き銅箔を、乾燥、アニールさせて、ポリアミド
酸を閉環させてポリイミド樹脂にする。さらにこのポリ
イミド樹脂層上に、接着剤樹脂溶液を流延塗布して、接
着剤付きフレキシブルプリント回路板を得る。
FIG. 1 shows an example of a method for manufacturing a flexible printed circuit board with an adhesive according to the present invention. In FIG. 1, first, a polyamic acid resin solution is cast and applied on a mold releasable substrate, and semi-dried to obtain a polyamic acid film. Next, the polyamic acid film is thermocompression-bonded to the copper foil with the polyamic acid resin surface facing the copper foil while the substrate is still attached, and then the substrate is peeled off. The obtained copper foil with a polyamic acid film is dried and annealed to close the polyamic acid to form a polyimide resin. Further, an adhesive resin solution is cast and coated on the polyimide resin layer to obtain a flexible printed circuit board with an adhesive.

【0007】ポリアミド酸溶液は、ポリイミドの原料と
なる、酸無水物とジアミンとを溶媒中で混合攪拌するこ
とによって得られる。ポリアミド酸を加熱イミド化して
得られるポリイミド樹脂の線膨張係数は、銅箔の線膨張
係数よりも小さいことが必要である。銅箔より線膨張係
数が大きいと、接着剤を塗布したときに銅箔を外にして
カールが発生する。
A polyamic acid solution is obtained by mixing and stirring an acid anhydride and a diamine, which are raw materials for polyimide, in a solvent. It is necessary that the coefficient of linear expansion of a polyimide resin obtained by heating and imidizing a polyamic acid be smaller than the coefficient of linear expansion of a copper foil. If the coefficient of linear expansion is larger than that of the copper foil, the copper foil is removed when the adhesive is applied, and curling occurs.

【0008】ポリアミド酸溶液を塗布して、ポリアミド
酸フィルムを作製する方法では、ドクターブレード、ナ
イフコータ、バーコータ、カーテンコータ、ダイコー
タ、ロールコータ、リバースコータなどが使用できる。
In the method of preparing a polyamic acid film by applying a polyamic acid solution, a doctor blade, a knife coater, a bar coater, a curtain coater, a die coater, a roll coater, a reverse coater and the like can be used.

【0009】ポリアミド酸を塗布する基材には、金属箔
や樹脂フィルムが使用できるが、ここで得るポリアミド
酸フィルムを後に高温加熱によってイミド化してしてポ
リイミド絶縁層とするため、金属異物が含まれることは
好ましくないので、樹脂フィルムを使用するのが好まし
い。ポリアミド酸フィルムは、半乾燥状態で使用するの
で、通常のポリイミドフィルム作製のような高温をかけ
る必要はないので、樹脂フィルムが使用できる。
A metal foil or a resin film can be used as a base material on which the polyamic acid is applied. However, since the polyamic acid film obtained here is subsequently imidized by heating at a high temperature to form a polyimide insulating layer, metal foreign substances are contained. It is not preferable to use a resin film. Since the polyamic acid film is used in a semi-dried state, there is no need to apply a high temperature as in the production of a normal polyimide film, so that a resin film can be used.

【0010】樹脂フィルムには、ポリイミド、ポリアミ
ドイミド、ポリエステル、ポリプロピレン、ポリエチレ
ン等の樹脂によるフィルムが使用できる。樹脂フィルム
の表面には、各種の離型処理を施してもよい。
As the resin film, a film made of a resin such as polyimide, polyamide imide, polyester, polypropylene and polyethylene can be used. Various release treatments may be applied to the surface of the resin film.

【0011】ポリアミド酸フィルムの乾燥は、溶媒分を
含んだ半乾燥状態で終了することが必要である。半乾燥
時の溶媒含有量は、1%以上20%未満であることが好
ましい。乾燥しすぎて溶媒分が1%以下に減少すると、
次に銅箔と加熱ラミネートする工程で、十分に接着力が
出ず、フレキシブルプリント板を得ることが出来ない。
乾燥が不十分で溶媒が20%以上残っていると、加熱ラ
ミネート時に発泡したり、樹脂流動して厚みの不均一を
生じるため、好ましくない。
The drying of the polyamic acid film needs to be completed in a semi-dry state containing a solvent. The solvent content at the time of semi-drying is preferably 1% or more and less than 20%. If it is too dry and the solvent content drops below 1%,
Next, in the step of heat lamination with a copper foil, sufficient adhesive strength is not obtained, and a flexible printed board cannot be obtained.
If the drying is insufficient and the solvent remains at 20% or more, it is not preferable because foaming occurs at the time of heat lamination or the resin flows to cause uneven thickness.

【0012】ポリアミド酸フィルムと銅箔をラミネート
する方法には、加熱の出来るロールラミネータが好適に
使用できる。ラミネートはポリアミド酸フィルム単体を
銅箔と直接ラミネートしてもよいが、ポリアミド酸フィ
ルムを基材から引き剥がすときに変形したり、静電気に
よって異物が付着するため、ポリアミド酸フィルム作製
に使用した基材フィルムをポリアミド酸フィルムにつけ
たままポリアミド酸フィルム面を銅箔と対向させてラミ
ネートする方がよい。加熱温度とラミネート速度および
ラミネート圧力を制御することによって、充分な接着強
度を得ながら均一な厚みを保持してポリアミド酸フィル
ムと銅箔とを張り合わせる。加熱温度は、使用するポリ
アミド酸フィル物樹脂組成によって異なるが、通常、8
0℃から200℃の温度で行われる。加熱温度が高すぎ
るとポリアミド酸が軟化流動して厚みが不均一になった
り、溶媒成分が急激に気化して発泡する。加熱温度が低
すぎると充分な接着強度が出ず、加熱イミド化を行う工
程で剥離が生じる。ラミネート速度は、通常、加熱温度
が高いときには早く、加熱温度が低いときには遅くす
る。ラミネート圧力が低すぎると充分な接着力が出ず、
圧力が高すぎるとポリアミド酸フィルムが流動して厚み
ムラが生じる。
For laminating the polyamic acid film and the copper foil, a roll laminator that can be heated can be suitably used. Lamination may be performed by directly laminating a polyamic acid film directly with a copper foil.However, since the polyamic acid film is deformed when peeled off from the substrate or a foreign substance adheres due to static electricity, the substrate used for preparing the polyamic acid film is used. It is better to laminate the polyamic acid film with the polyamic acid film surface facing the copper foil with the film attached to the polyamic acid film. By controlling the heating temperature, the laminating speed, and the laminating pressure, the polyamic acid film and the copper foil are laminated while maintaining a uniform thickness while obtaining a sufficient adhesive strength. The heating temperature depends on the composition of the polyamic acid-filled resin to be used.
It is performed at a temperature of 0 ° C to 200 ° C. If the heating temperature is too high, the polyamic acid softens and flows, resulting in a non-uniform thickness, or the solvent component is rapidly vaporized and foamed. If the heating temperature is too low, sufficient adhesive strength will not be obtained, and peeling will occur in the step of heat imidization. The laminating speed is usually high when the heating temperature is high, and slow when the heating temperature is low. If the lamination pressure is too low, sufficient adhesive strength will not be obtained,
If the pressure is too high, the polyamic acid film flows to cause uneven thickness.

【0013】ポリアミド酸フィルムをラミネートした銅
箔は、高温度で加熱することによって、ポリアミド酸を
閉環させてポリイミドにする。このときの最高加熱温度
は、使用するポリアミド酸の樹脂によって異なるが、通
常、線膨張係数が銅箔よりも小さいような組成では、3
50℃から450℃の最高温度で加熱される。加熱は複
数の温度ステップに分けて昇温する。最初から高温にす
ると、ポリアミド酸フィルム中に残っている溶媒成分が
急激に気化して発泡してしまうので好ましくない。
The copper foil on which the polyamic acid film is laminated is heated at a high temperature to close the polyamic acid to form a polyimide. The maximum heating temperature at this time differs depending on the polyamic acid resin used.
It is heated at a maximum temperature of 50 ° C to 450 ° C. Heating is performed in multiple temperature steps. If the temperature is raised from the beginning, the solvent component remaining in the polyamic acid film is undesirably rapidly vaporized and foamed.

【0014】次に、得られたポリイミドフィルム付銅箔
のポリイミド面に、接着剤を塗布する。塗布する方法
は、ポリアミド酸のフィルムを作製する方法と同じ方法
が使用できる。
Next, an adhesive is applied to the polyimide surface of the obtained copper foil with a polyimide film. The same method as the method for producing a polyamic acid film can be used for the application.

【0015】接着剤樹脂としては、熱可塑性、熱硬化
性、それらの混合でも使用できるが、エポキシ、フェノ
ール、ポリイミド、ポリアミドイミド、ポリエーテルイ
ミド等が好適に使用できる。特に、シリコーン変性ポリ
イミドにエポキシ樹脂を混合した樹脂が、低い温度で接
着でき、しかも接着力が高く、吸湿率が低いので耐湿信
頼性も良く、最も好ましい。
As the adhesive resin, thermoplastic, thermosetting, or a mixture thereof can be used, but epoxy, phenol, polyimide, polyamideimide, polyetherimide and the like can be preferably used. In particular, a resin obtained by mixing an epoxy resin with a silicone-modified polyimide can be bonded at a low temperature, has a high adhesive strength, and has a low moisture absorption rate.

【0016】[0016]

【実施例】(実施例1)厚さ75μmのポリエステルフ
ィルム上に、イミド化後の線膨張係数が10ppmのポ
リアミド酸の15重量%NMP溶液を、ダイコータで塗
布し、100℃で10分間乾燥して、厚みが50μmの
ポリアミド酸フィルムを得た。18μmの圧延銅箔(日
本鉱業製)上に、上記のポリアミド酸フィルムを重ね
て、ロールラミネータで140℃で加熱圧着した。得ら
れた銅箔付ポリアミド酸フィルムを窒素乾燥機内で、連
続的に150℃、200℃、250℃、300℃、35
0℃で各々15分加熱し、さらに400℃で2時間加熱
し、イミド化を行った。イミド化後のポリイミド層の厚
みは25μmで、銅箔を内にして曲率半径50cmでカ
ールしていた。このポリイミド層上に、シリコーン変性
ポリイミドとエポキシ樹脂を混合した接着剤樹脂のNM
P溶液を、バーコータで流延塗布し、80℃、150
℃、220℃で各々3分乾燥して、10μmの接着剤層
を形成した。得られた接着剤付きフレキシブルプリント
板は、カールが無く、半導体チップの回路面と250℃
で10秒間加熱圧着したときのピール強度は1.5kg
/cmであった。
EXAMPLE 1 A 15% by weight NMP solution of polyamic acid having a linear expansion coefficient of 10 ppm after imidization was applied on a 75 μm-thick polyester film by a die coater and dried at 100 ° C. for 10 minutes. Thus, a polyamic acid film having a thickness of 50 μm was obtained. The above polyamic acid film was superimposed on a rolled copper foil of 18 μm (manufactured by Nippon Mining Co., Ltd.), and heated and pressed at 140 ° C. with a roll laminator. The obtained polyamic acid film with copper foil was continuously heated at 150 ° C, 200 ° C, 250 ° C, 300 ° C, 35 ° C in a nitrogen dryer.
Each was heated at 0 ° C. for 15 minutes, and further heated at 400 ° C. for 2 hours to perform imidization. The polyimide layer after imidization had a thickness of 25 μm and was curled with a radius of curvature of 50 cm with the copper foil inside. On this polyimide layer, NM of an adhesive resin obtained by mixing a silicone-modified polyimide and an epoxy resin
The P solution was cast and applied with a bar coater,
After drying at 220 ° C. for 3 minutes, an adhesive layer having a thickness of 10 μm was formed. The obtained flexible printed board with adhesive has no curl, and the circuit surface of the semiconductor chip has a temperature of 250 ° C.
Peel strength when heat-pressed for 10 seconds at 1.5kg
/ Cm.

【0017】(実施例2)厚さ75μmのポリエステル
フィルム上に、イミド化後の線膨張係数が12ppmの
ポリアミド酸の13重量%NMP溶液を、ダイコータで
塗布し、100℃で10分間乾燥して、厚みが40μm
のポリアミド酸フィルムを得た。18μmの圧延銅箔
(日本鉱業製)上に、上記のポリアミド酸フィルムを重
ねて、ロールラミネータで140℃で加熱圧着した。得
られた銅箔付ポリアミド酸フィルムを窒素乾燥機内で、
連続的に150℃、200℃、250℃、300℃、3
50℃で各々15分加熱し、さらに400℃で2時間加
熱し、イミド化を行った。イミド化後のポリイミド層の
厚みは20μmで、銅箔を内にして曲率半径30cmで
カールしていた。このポリイミド層上に、シリコーン変
性ポリイミド接着剤樹脂のNMP溶液を、バーコータで
流延塗布し、80℃、150℃、230℃で各々5分乾
燥して、12μmの接着剤層を形成した。得られた接着
剤付きフレキシブルプリント板は、カールが無く、半導
体チップの回路面と250℃で10秒間加熱圧着したと
きのピール強度は1.3kg/cmであった。
Example 2 A 13% by weight NMP solution of polyamic acid having a linear expansion coefficient of 12 ppm after imidization was applied on a 75 μm-thick polyester film by a die coater, and dried at 100 ° C. for 10 minutes. , Thickness is 40μm
Was obtained. The above polyamic acid film was superimposed on a rolled copper foil of 18 μm (manufactured by Nippon Mining Co., Ltd.), and heated and pressed at 140 ° C. with a roll laminator. The resulting polyamic acid film with copper foil in a nitrogen dryer,
Continuously 150 ° C, 200 ° C, 250 ° C, 300 ° C, 3
Each was heated at 50 ° C. for 15 minutes, and further heated at 400 ° C. for 2 hours to perform imidization. The polyimide layer after imidization had a thickness of 20 μm and was curled with a radius of curvature of 30 cm with the copper foil inside. An NMP solution of a silicone-modified polyimide adhesive resin was cast and applied on the polyimide layer with a bar coater, and dried at 80 ° C., 150 ° C., and 230 ° C. for 5 minutes each to form a 12 μm adhesive layer. The obtained flexible printed board with the adhesive had no curl, and had a peel strength of 1.3 kg / cm when heated and pressed at 250 ° C. for 10 seconds on the circuit surface of the semiconductor chip.

【0018】(実施例3)厚さ75μmのポリエステル
フィルム上に、イミド化後の線膨張係数が10ppmの
ポリアミド酸の15重量%NMP溶液を、ダイコータで
塗布し、100℃で10分間乾燥して、厚みが25μm
のポリアミド酸フィルムを得た。18μmの圧延銅箔
(日本鉱業製)上に、上記のポリアミド酸フィルムを重
ねて、ロールラミネータで130℃で加熱圧着した。得
られた銅箔付ポリアミド酸フィルムを窒素乾燥機内で、
連続的に150℃、200℃、250℃、300℃、3
50℃で各々15分加熱し、さらに400℃で2時間加
熱し、イミド化を行った。イミド化後のポリイミド層の
厚みは12μmで、銅箔を内にして曲率半径60cmで
カールしていた。このポリイミド層上に、シリコーン変
性ポリイミドとエポキシ樹脂を混合した接着剤樹脂のN
MP溶液を、バーコータで流延塗布し、80℃、150
℃、230℃で各々5分乾燥して、10μmの接着剤層
を形成した。得られた接着剤付きフレキシブルプリント
板は、カールが無く、半導体チップの回路面と250℃
で10秒間加熱圧着したときのピール強度は1.6kg
/cmであった
Example 3 A 15% by weight NMP solution of polyamic acid having a linear expansion coefficient of 10 ppm after imidization was applied on a 75 μm-thick polyester film by a die coater and dried at 100 ° C. for 10 minutes. 25 μm thick
Was obtained. The above polyamic acid film was superimposed on a rolled copper foil of 18 μm (manufactured by Nippon Mining Co., Ltd.) and heated and pressed at 130 ° C. with a roll laminator. The resulting polyamic acid film with copper foil in a nitrogen dryer,
Continuously 150 ° C, 200 ° C, 250 ° C, 300 ° C, 3
Each was heated at 50 ° C. for 15 minutes, and further heated at 400 ° C. for 2 hours to perform imidization. The polyimide layer after imidization had a thickness of 12 μm and was curled with a radius of curvature of 60 cm with the copper foil inside. On this polyimide layer, an N-type adhesive resin obtained by mixing a silicone-modified polyimide and an epoxy resin is used.
The MP solution was applied by casting with a bar coater,
After drying at 230C for 5 minutes each, an adhesive layer having a thickness of 10 m was formed. The obtained flexible printed board with adhesive has no curl, and the circuit surface of the semiconductor chip has a temperature of 250 ° C.
Peel strength is 1.6kg when pressed with heat for 10 seconds
/ Cm

【0019】(比較例1)厚さ75μmのポリエステル
フィルム上に、イミド化後の線膨張係数が25ppmの
ポリアミド酸の15重量%NMP溶液を、ダイコータで
塗布し、100℃で10分間乾燥して、厚みが50μm
のポリアミド酸フィルムを得た。18μmの圧延銅箔
(日本鉱業製)上に、上記のポリアミド酸フィルムを重
ねて、ロールラミネータで140℃に加熱圧着した。得
られた銅箔付ポリアミド酸フィルムを窒素乾燥機内で、
連続的に150℃、200℃、250℃、300℃、3
50℃で各々15分加熱し、さらに400℃で2時間加
熱し、イミド化を行った。イミド化後のポリイミド層の
厚みは25μmで、銅箔を外にして曲率半径60cmで
カールしていた。このポリイミド層上に、シリコーン変
性ポリイミド接着剤樹脂のNMP溶液を、バーコータで
流延塗布し、80℃、150℃、230℃で各々5分乾
燥して、10μmの接着剤層を形成した。得られた接着
剤付きフレキシブルプリント板は、銅箔を外にして曲率
半径10cmでカールしており、フレキシブル回路板と
して微細回路の加工に使用できなかった。
Comparative Example 1 A 15 wt% NMP solution of polyamic acid having a linear expansion coefficient of 25 ppm after imidization was applied on a 75 μm thick polyester film by a die coater and dried at 100 ° C. for 10 minutes. , Thickness 50μm
Was obtained. The above polyamic acid film was superimposed on a rolled copper foil of 18 μm (manufactured by Nippon Mining Co., Ltd.), and was heated and pressed at 140 ° C. with a roll laminator. The resulting polyamic acid film with copper foil in a nitrogen dryer,
Continuously 150 ° C, 200 ° C, 250 ° C, 300 ° C, 3
Each was heated at 50 ° C. for 15 minutes, and further heated at 400 ° C. for 2 hours to perform imidization. The polyimide layer after imidization had a thickness of 25 μm and was curled with a radius of curvature of 60 cm with the copper foil outside. An NMP solution of a silicone-modified polyimide adhesive resin was cast and applied on this polyimide layer with a bar coater, and dried at 80 ° C., 150 ° C., and 230 ° C. for 5 minutes each to form a 10 μm adhesive layer. The obtained flexible printed board with an adhesive was curled with a radius of curvature of 10 cm outside the copper foil, and could not be used as a flexible circuit board for processing fine circuits.

【0020】[0020]

【発明の効果】本発明の接着剤付きフレキシブルプリン
ト回路板の製造方法によれば、回路形成後に、別の回路
基板と張り合わせたり、半導体素子や電気・電子部品を
接着固定する事ができ、カールが無く、耐熱性の良い接
着剤付きフレキシブルプリント回路板を得ることが出来
る。
According to the method of manufacturing a flexible printed circuit board with an adhesive of the present invention, after forming a circuit, it can be bonded to another circuit board or a semiconductor element or an electric / electronic component can be bonded and fixed. And a flexible printed circuit board with an adhesive having good heat resistance can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明の接着剤付きフレキシブル回路板の製
造方法の一例を示す。
FIG. 1 shows an example of a method for producing a flexible circuit board with an adhesive according to the present invention.

【符号の説明】[Explanation of symbols]

1:塗工基材 2:アミック酸フィルム 3:銅箔 4:接着剤樹脂層 1: Coating base material 2: Amic acid film 3: Copper foil 4: Adhesive resin layer

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI H05K 3/38 H05K 3/38 E // C09J 179/08 C09J 179/08 Z (72)発明者 笹嶋 秀明 東京都品川区東品川2丁目5番8号 住友 ベークライト株式会社内────────────────────────────────────────────────── ─── Continued on the front page (51) Int.Cl. 6 Identification symbol FI H05K 3/38 H05K 3/38 E // C09J 179/08 C09J 179/08 Z (72) Inventor Hideaki Sasashima Shinagawa-ku, Tokyo Shinagawa 2-5-8 Sumitomo Bakelite Co., Ltd.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 イミド化後の線膨張係数が銅よりも小さ
いポリイミド樹脂のポリアミド酸溶液からポリアミド酸
フィルムを作製し、銅箔と熱圧着して張り合わせる工程
と、得られたポリアミド酸フィルム付き銅箔を高温でア
ニールしてポリアミド酸を閉環させてポリイミド付き銅
箔を得る工程と、該ポリイミド層上に接着剤樹脂溶液を
塗布乾燥させる工程からなる、接着剤付きフレキシブル
プリント板の製造方法。
1. A step of preparing a polyamic acid film from a polyamic acid solution of a polyimide resin having a linear expansion coefficient smaller than that of copper after imidization, thermocompression bonding with a copper foil, and attaching the obtained polyamic acid film. A method for producing a flexible printed board with an adhesive, comprising: a step of annealing a copper foil at a high temperature to close a polyamic acid to obtain a copper foil with a polyimide; and a step of applying and drying an adhesive resin solution on the polyimide layer.
【請求項2】 接着剤樹脂が、シリコーン変性ポリイミ
ドとエポキシ樹脂の混合物である、請求項1記載の接着
剤付きフレキシブルプリント板の製造方法。
2. The method for producing a flexible printed board with an adhesive according to claim 1, wherein the adhesive resin is a mixture of a silicone-modified polyimide and an epoxy resin.
JP543798A 1998-01-14 1998-01-14 Manufacture of adhesive-coated flexible printed-circuit board Pending JPH11204902A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP543798A JPH11204902A (en) 1998-01-14 1998-01-14 Manufacture of adhesive-coated flexible printed-circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP543798A JPH11204902A (en) 1998-01-14 1998-01-14 Manufacture of adhesive-coated flexible printed-circuit board

Publications (1)

Publication Number Publication Date
JPH11204902A true JPH11204902A (en) 1999-07-30

Family

ID=11611183

Family Applications (1)

Application Number Title Priority Date Filing Date
JP543798A Pending JPH11204902A (en) 1998-01-14 1998-01-14 Manufacture of adhesive-coated flexible printed-circuit board

Country Status (1)

Country Link
JP (1) JPH11204902A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003011270A (en) * 2001-07-02 2003-01-15 Jsr Corp Dielectric layer with conductive foil, capacitor using the same and forming method thereof
JP2007076231A (en) * 2005-09-15 2007-03-29 Toyobo Co Ltd Laminated polyimide film
JP2010129610A (en) * 2008-11-25 2010-06-10 Panasonic Electric Works Co Ltd Flex-rigid printed wiring board
JP2011049332A (en) * 2009-08-26 2011-03-10 Panasonic Electric Works Co Ltd Resin sheet with metal foil and flexible printed wiring board

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003011270A (en) * 2001-07-02 2003-01-15 Jsr Corp Dielectric layer with conductive foil, capacitor using the same and forming method thereof
JP2007076231A (en) * 2005-09-15 2007-03-29 Toyobo Co Ltd Laminated polyimide film
JP2010129610A (en) * 2008-11-25 2010-06-10 Panasonic Electric Works Co Ltd Flex-rigid printed wiring board
JP2011049332A (en) * 2009-08-26 2011-03-10 Panasonic Electric Works Co Ltd Resin sheet with metal foil and flexible printed wiring board

Similar Documents

Publication Publication Date Title
WO1997001437A1 (en) Circuit board laminates and method of making
JP2783389B2 (en) Method of manufacturing flexible metal foil laminate
JPH11204902A (en) Manufacture of adhesive-coated flexible printed-circuit board
JP3167421B2 (en) Polyamic acid film
JP3356560B2 (en) Flexible copper-clad laminated film and method for producing the same
JPH06283866A (en) Multilayer circuit board and manufacture thereof
JPH1022325A (en) Ic chip adhering sheet and ic package
JPH09199830A (en) Manufacture of flexible wiring board
JP2653582B2 (en) Polyimide film having a polyamic acid layer on the surface having openings and flexible printed circuit board or circuit board using the same
JPH02122697A (en) Flexible metal foil lamination board and manufacture thereof
JP2653583B2 (en) Polyimide film having a polyamic acid layer on its surface and substrate for flexible printed circuit using the same
JP2862101B2 (en) Method for manufacturing two-layer TAB tape
JP3385726B2 (en) TAB adhesive tape
JP2691086B2 (en) Method for manufacturing flexible printed circuit board
JPH05291710A (en) Flexible printed-circuit board and its manufacture
JP2000167979A (en) Flexible double-sided copper-clad board with adhesive
JPS5875884A (en) Method of producing printed circuit board
JP2567529B2 (en) Polyamic acid film and method for producing the same
JP4056299B2 (en) Polyimide copper clad laminate using ultra-thin copper foil and method for producing the same
JPH10259363A (en) Production of adhesive tape for electronic part
JPH05152699A (en) Double-sided substrate and manufacture thereof
JPH05267807A (en) Double-sided board
JP3817326B2 (en) Manufacturing method of adhesive tape for electronic parts
JP2000216302A (en) Interposer with reinforced plate and its manufacture
JP2672906B2 (en) Polyamic acid film