JPH09165498A - Resin composition for sealing of electronic component part - Google Patents

Resin composition for sealing of electronic component part

Info

Publication number
JPH09165498A
JPH09165498A JP7326077A JP32607795A JPH09165498A JP H09165498 A JPH09165498 A JP H09165498A JP 7326077 A JP7326077 A JP 7326077A JP 32607795 A JP32607795 A JP 32607795A JP H09165498 A JPH09165498 A JP H09165498A
Authority
JP
Japan
Prior art keywords
resin
zeolite
silica gel
weight
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7326077A
Other languages
Japanese (ja)
Other versions
JP3611383B2 (en
Inventor
Kenji Samejima
賢至 鮫島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP32607795A priority Critical patent/JP3611383B2/en
Publication of JPH09165498A publication Critical patent/JPH09165498A/en
Application granted granted Critical
Publication of JP3611383B2 publication Critical patent/JP3611383B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a resin compsn. for sealing of an electronic component part which has excellent dimensional stability, effect of preventing water penetration or the like by incorporating a curing agent, a curing accelerator, an inorg. filler, a particular zeolite, and silica gel into an epoxy resin. SOLUTION: An epoxy resin (A) (e.g. a bisphenol type epoxy resin), a phenolic resin curing agent (B) (e.g. phenol novolak resin), a curing accelerator (C) (e.g. 2-methylimidazole), an inorg. filler (D) (e.g. silica), a zeolite (E) in an amt. of 3 to 30wt.% based on the whole composition, the zeolite having a compsn. represented by the formula (wherein (x)=0.1 to 2; (y)=1 to 200; (z)=0 to 100; M represents an alkali metal or an alkaline earth metal; and (n) is a valency of the metal) and a max. particle diameter of not more than 200μm, and a silica gel (E) in an amt. of 3 to 30wt.% based on the whole compsn., the silica gel having a max. particle diameter of not more than 200μm are used as indispensable components to obtain a resin compsn. for sealing of an electronic component part.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は寸法安定性に優れ外
部からの水分の浸入が問題となる固体撮像素子等の窓付
き電子部品の封止用樹脂組成物に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resin composition for encapsulating an electronic component with a window such as a solid-state image sensor, which has excellent dimensional stability and has a problem of infiltration of moisture from the outside.

【0002】[0002]

【従来の技術】トランジスター、IC、コンデンサー、
ダイオード等の電子部品の封止方法としてエポキシ樹脂
のトランスファー成形による方法が低コスト大量生産に
適するため幅広く実用化され、従来金属やセラミックで
封止されていたのが樹脂封止に置き変わってきている。
最近マルチメディア化が進む中で映像や画像をパソコン
に取り込んだり遠隔地へ瞬時に送信する必要がでてきて
おり、小型軽量で低コストの固体撮像素子が必要となっ
てきた。従来固体撮像素子はセラミックのケースに搭載
しガラスの窓を接着したものだが高性能であるものの高
価であった。そこで低コスト化のためにエポキシ樹脂で
モールドしたケースに素子を搭載しガラスやアクリル樹
脂の窓をつける方法が取られているが、セラミックに比
べ寸法精度が悪かったり外部から浸入する水分がエポキ
シ樹脂内を浸透していき、やがてケース内で露結し特性
劣化を引き起こしていた。一般に水分浸入防止のために
はシリカ等の吸湿性の低い無機充填材を樹脂組成物中に
高充填する手段が取られるが本用途には不十分で長期間
の間に水分が樹脂内に拡散し、内部の素子に到達してい
た。そこで樹脂内の拡散を防ぐため水分を固定化すべく
吸水性ポリマー等の吸湿剤が検討されているが、有機物
の吸湿剤を用いると膨潤が発生し製品の寸法安定性や外
観に問題がでていた。
2. Description of the Related Art Transistors, ICs, capacitors,
As a method of sealing electronic parts such as diodes, the method of transfer molding of epoxy resin is widely used because it is suitable for low-cost mass production, and the conventional metal and ceramic sealing has been replaced by resin sealing. There is.
With the recent progress in multimedia, it has become necessary to capture images and images in a personal computer and instantly send them to a remote place, and a small-sized, lightweight, low-cost solid-state imaging device has been required. Conventionally, a solid-state image sensor is mounted in a ceramic case and a glass window is adhered, but it is expensive although it has high performance. Therefore, to reduce costs, a method of mounting an element in a case molded with epoxy resin and attaching a window of glass or acrylic resin has been adopted, but the dimensional accuracy is worse than that of ceramic and moisture entering from outside is epoxy resin. It penetrated through the inside and eventually formed condensation in the case, causing deterioration of characteristics. Generally, in order to prevent water infiltration, a means of highly filling an inorganic filler with low hygroscopicity such as silica into the resin composition is taken, but this is not sufficient for this application and water diffuses into the resin over a long period of time. Then, it reached the internal element. Therefore, hygroscopic agents such as water-absorbent polymers are being studied to fix water in order to prevent diffusion in the resin, but when organic hygroscopic agents are used, swelling occurs and problems occur with dimensional stability and appearance of the product. It was

【0003】[0003]

【発明が解決しようとする課題】本発明は、寸法安定性
と外部から浸入する水分を遮断する能力とを飛躍的に高
めた電子部品封止用樹脂組成物を提供するものである。
DISCLOSURE OF THE INVENTION The present invention provides a resin composition for encapsulating electronic parts, which has dramatically improved dimensional stability and the ability to block moisture invading from the outside.

【0004】[0004]

【課題を解決するための手段】本発明は、エポキシ樹
脂、フェノール樹脂硬化剤、硬化促進剤、無機充填材、
ゼオライト、シリカゲルを必須成分とし、該ゼオライト
の構造が式(1)で示されその最大粒径が200μm以
下で、全組成物中のゼオライトの含有量が3〜30重量
%、該シリカゲルの最大粒径が200μm以下で全組成
物中のシリカゲルの含有量が3〜30重量%であること
を特徴とする電子部品封止用樹脂組成物である。 xM2/nO・Al23・ySiO2・zH2O (1) (ここで、x=0.1〜2.0、y=1.0〜200、
z=0〜100、Mはアルカリ金属またはアルカリ土類
金属で、nはその原子価である。)
The present invention provides an epoxy resin, a phenol resin curing agent, a curing accelerator, an inorganic filler,
Zeolite and silica gel are essential components, the structure of the zeolite is represented by the formula (1), the maximum particle size is 200 μm or less, the content of zeolite in the entire composition is 3 to 30% by weight, and the maximum particle size of the silica gel is A resin composition for encapsulating an electronic component, which has a diameter of 200 μm or less and a content of silica gel in the entire composition of 3 to 30% by weight. xM 2 / n O · Al 2 O 3 · ySiO 2 · zH 2 O (1) ( where, x = 0.1~2.0, y = 1.0~200 ,
z = 0 to 100, M is an alkali metal or alkaline earth metal, and n is its valence. )

【0005】[0005]

【発明の実施の形態】本発明に用いられるエポキシ樹脂
は、2個以上のエポキシ基を含むものならば特には限定
しない。例えば、クレゾールノボラック型エポキシ樹
脂、三官能エポキシ樹脂、ビフェニル型エポキシ樹脂、
ジシクロペンタジエン型エポキシ樹脂、ビスフェノール
型エポキシ樹脂、臭素化エポキシ樹脂等が挙げられる。
これらのエポキシ樹脂は、単独でも混合して使用して良
い。フェノール樹脂硬化剤は、2個以上の水酸基を含む
ものならば特に限定しない。例えば、フェノールノボラ
ック型、クレゾールノボラック型、フェノールアラルキ
ル型、ジシクロペンタジエン型トリフェニルメタン型及
びこれらの変性樹脂が挙げられる。これらのフェノール
樹脂硬化剤は、単独でも混合して用いて良い。又これら
の硬化剤の配合量としてはエポキシ樹脂のエポキシ基数
と硬化剤の水酸基数を合わせるように配合することが好
ましい。硬化促進剤としては、イミダゾール、有機ホス
フィン、3級アミン、1,8−ジアザビシクロウンデセ
ンが挙げられるが特に限定するものではない。これら
は、単独でも混合して用いても良い。
BEST MODE FOR CARRYING OUT THE INVENTION The epoxy resin used in the present invention is not particularly limited as long as it contains two or more epoxy groups. For example, cresol novolac type epoxy resin, trifunctional epoxy resin, biphenyl type epoxy resin,
Examples thereof include dicyclopentadiene type epoxy resin, bisphenol type epoxy resin, brominated epoxy resin and the like.
These epoxy resins may be used alone or as a mixture. The phenol resin curing agent is not particularly limited as long as it contains two or more hydroxyl groups. Examples thereof include phenol novolac type, cresol novolac type, phenol aralkyl type, dicyclopentadiene type triphenylmethane type, and modified resins thereof. These phenol resin curing agents may be used alone or in combination. The amount of these curing agents is preferably such that the number of epoxy groups in the epoxy resin matches the number of hydroxyl groups in the curing agent. Examples of the curing accelerator include imidazole, organic phosphine, tertiary amine, and 1,8-diazabicycloundecene, but are not particularly limited. These may be used alone or in combination.

【0006】本発明に用いる式(1)のゼオライトは、
最大粒径が200μm以下で、結晶構造を有し、その性
質上結晶粒子内に直径3〜20Åの空孔が無数にあり水
分を吸着保持できる。シリカゲルも粒子内に直径50〜
300Å程度の空孔が無数にあり水分を吸着保持でき
る。これら吸湿剤を用いエポキシ樹脂組成物中に配合し
鋭意検討したところゼオライトとシリカゲルを併用する
ことにより単独配合では達成できなかった長時間にわた
る安定した水分吸着能を得られることが判った。ゼオラ
イトは、最大粒径が200μm以下であり、これ越える
と充填性が劣る。平均粒径は、特に限定しないが5〜3
0μmの範囲が好ましい。全組成物中の含有量は3重量
%未満では吸湿性能が低く30重量%を越えると流動性
が劣化し成形不良を引き起こす。ゼオライト粒子の形状
は破砕状、球状、さいころ状等があるが、特に限定しな
い。シリカゲル粒子は最大粒径が200μmを超えると
充填性が劣る。平均粒径は、特に限定しないが5〜30
μmの範囲が好ましい。全組成物中の含有量は3重量%
未満では吸湿性能が低く30重量%を越えると流動性が
劣化し成形不良を引き起こす。シリカゲル粒子の形状は
破砕状、球状等があるが、特に限定しない。ゼオライト
とシリカゲルは併用することが必須でその併用比は特に
限定しないが、長期間の水分遮断能力と成形時の流動性
が良好なことから0.5:1〜1:0.5の範囲が好ま
しい。
The zeolite of the formula (1) used in the present invention is
It has a maximum particle size of 200 μm or less, has a crystal structure, and has a large number of pores with a diameter of 3 to 20 Å in the crystal particles by its nature, so that water can be adsorbed and held. Silica gel also has a diameter of 50 ~
It has an innumerable number of pores of about 300 Å and can absorb and hold water. When these hygroscopic agents were blended in an epoxy resin composition and studied earnestly, it was found that by using zeolite and silica gel together, a stable moisture adsorption capacity for a long time, which could not be achieved by a single blending, could be obtained. Zeolite has a maximum particle size of 200 μm or less, and if the maximum particle size is exceeded, the packing property becomes poor. The average particle size is not particularly limited, but is 5 to 3
A range of 0 μm is preferred. If the content in the entire composition is less than 3% by weight, the hygroscopic performance is low, and if it exceeds 30% by weight, the fluidity is deteriorated and molding failure occurs. The shape of the zeolite particles may be a crushed shape, a spherical shape, a dice shape, or the like, but is not particularly limited. If the maximum particle size of the silica gel particles exceeds 200 μm, the filling property will be poor. The average particle size is not particularly limited, but is 5 to 30.
The range of μm is preferred. Content in the total composition is 3% by weight
If it is less than 40% by weight, the hygroscopicity is low, and if it exceeds 30% by weight, the fluidity is deteriorated to cause defective molding. The silica gel particles may have a crushed shape, a spherical shape, or the like, but are not particularly limited. Zeolite and silica gel are required to be used in combination, and the combination ratio is not particularly limited. preferable.

【0007】無機充填材としては、シリカ、アルミナ、
クレー、炭酸カルシウム、チッ化アルミ、チッ化珪素等
があるが、これらの中ではシリカが好ましい。シリカと
しては、溶融シリカが望ましく破砕または球状で平均粒
径が10〜30μm最大粒径が150μmであれば良い
が、他の粒径のものでもかまわないし、これらを2種以
上組み合わせても使用できる。本発明に用いるシリカ
は、全組成物中に40重量%以上含み、かつゼオライト
とシリカゲルとシリカの合計量が75〜90重量%であ
ることが必要である。シリカが40重量%未満では信頼
性、成形性、寸法安定性が劣る。ゼオライトとシリカゲ
ルとシリカの合計量が75〜90重量%のときに寸法安
定性と吸湿性が特に優れこの範囲外では成形性が劣る。
As the inorganic filler, silica, alumina,
Clay, calcium carbonate, aluminum nitride, silicon nitride and the like are available, and silica is preferred among these. As the silica, fused silica is preferably crushed or spherical and has an average particle size of 10 to 30 μm and a maximum particle size of 150 μm, but other particle sizes may be used, and two or more kinds of these may be used in combination. . The silica used in the present invention must be contained in an amount of 40% by weight or more in the total composition, and the total amount of zeolite, silica gel and silica must be 75 to 90% by weight. If the silica content is less than 40% by weight, the reliability, moldability, and dimensional stability are poor. When the total amount of zeolite, silica gel and silica is 75 to 90% by weight, the dimensional stability and hygroscopicity are particularly excellent, and the formability is poor outside this range.

【0008】本発明の封止用樹脂組成物は、熱膨張係数
が、1.5×10-51/℃以下で成形収縮率が0.3%
以下であることも必要でこの範囲内ならば優れた寸法安
定性が得られる。さらに封止用樹脂組成物の吸湿率が、
85℃、相対湿度85%、336時間吸湿処理後で0.
4重量%以上である必要がある。0.4重量%未満だと
水分吸着能力が不十分で、内部の素子への水分の浸入の
防止にならない。尚、本発明での熱膨張係数及び吸湿率
の測定方法については実施例の項で述べる。
The encapsulating resin composition of the present invention has a coefficient of thermal expansion of 1.5 × 10 −5 1 / ° C. or less and a molding shrinkage of 0.3%.
It is also necessary to be below, and within this range, excellent dimensional stability can be obtained. Further, the moisture absorption rate of the sealing resin composition,
85 ° C., relative humidity 85%, 0.3% after moisture absorption treatment for 336 hours.
It must be 4% by weight or more. If it is less than 0.4% by weight, the moisture adsorption capacity is insufficient, and it is not possible to prevent the infiltration of moisture into the internal elements. The method of measuring the coefficient of thermal expansion and the coefficient of moisture absorption in the present invention will be described in the section of Examples.

【0009】本発明は、エポキシ樹脂、フェノール樹脂
硬化剤、硬化促進剤、無機充填材、ゼオライト及びシリ
カゲルを必須成分とするが これら以外に必要に応じて
シランカップリング剤等の表面処理剤、三酸アンチモン
等の難燃剤、カーボンブラック、ベンガラ等の着色剤、
天然ワックス、合成ワックス等の離型剤及びシリコーン
オイル、ゴム等の低応力添加剤その他種々の添加剤を適
宜配合しても差し支えない。又、本発明の電子部品封止
用樹脂組成物を成形材料として製造するには、エポキシ
樹脂、フェノール樹脂硬化剤、硬化促進剤、無機充填
材、ゼオライト及びシリカゲル、その他の添加剤をミキ
サー等によって充分に均一に混合した後、更に熱ロール
またはニーダー等で溶融混練し、冷却粉砕して封止材料
とすることができる。
In the present invention, an epoxy resin, a phenol resin curing agent, a curing accelerator, an inorganic filler, zeolite and silica gel are essential components, but in addition to these, a surface treatment agent such as a silane coupling agent, Flame retardants such as antimony acid, colorants such as carbon black and red iron oxide,
Release agents such as natural wax and synthetic wax, low-stress additives such as silicone oil and rubber, and various other additives may be appropriately blended. Further, in order to produce the electronic component sealing resin composition of the present invention as a molding material, an epoxy resin, a phenol resin curing agent, a curing accelerator, an inorganic filler, zeolite and silica gel, and other additives are mixed with a mixer or the like. After sufficiently uniformly mixing, the mixture can be further melt-kneaded with a hot roll or a kneader, cooled and pulverized to obtain a sealing material.

【0010】[0010]

【実施例】以下本発明を実施例で具体的に説明する。 《実施例1》 ・ビフェニル型エポキシ樹脂: [油化シェル(株)、YX4000H、 エポキシ当量190、融点170℃] 90重量部 ・臭素化エポキシ樹脂: [大日本インキ工業(株)、エピクロン152、エポキシ当量360、軟化点6 5℃] 8重量部 ・フェノールノボラック樹脂: [住友デュレズ(株)、水酸基当量105、軟化点70℃] 52重量部 ・2−メチルイミダゾール: 1重量部 ・ゼオライト: [東ソー(株)、ゼオラムA−3] 100重量部 ・シリカゲル: [東海化学(株)、最大粒径200ミクロン] 100重量部 ・破砕溶融シリカ: [平均粒径15ミクロン、最大粒径100ミクロン] 100重量部 ・球状溶融シリカ: [平均粒径23ミクロン、最大粒径74ミクロン] 500重量部 ・γ−グリシドキシプロピルトリメトキシシラン 6重量部 ・三酸化アンチモン 8重量部 ・ヘキストワックスS 3重量部 ・カーボンブラック 2重量部 を常温で充分に混合し次に80〜110℃で2軸熱ロー
ルを用いて混練し冷却後粉砕して電子部品封止用樹脂組
成物を得た。
The present invention will be specifically described below with reference to examples. << Example 1 >> Biphenyl type epoxy resin: [Yukasei Shell Co., Ltd., YX4000H, epoxy equivalent 190, melting point 170 ° C.] 90 parts by weight Brominated epoxy resin: Dainippon Ink and Chemicals, Epicron 152, Epoxy equivalent 360, softening point 65 ° C.] 8 parts by weight Phenol novolac resin: [Sumitomo Dures Co., Ltd., hydroxyl equivalent 105, softening point 70 ° C.] 52 parts by weight 2-methylimidazole: 1 part by weight Zeolite: [ Tosoh Corporation, Zeolum A-3] 100 parts by weight Silica gel: [Tokai Chemical Industry Co., Ltd., maximum particle size 200 microns] 100 parts by weight Crushed fused silica: [Average particle size 15 microns, maximum particle size 100 microns] 100 parts by weight-Spherical fused silica: [average particle size 23 microns, maximum particle size 74 microns] 500 parts by weight-γ-glycidoxypropylto Methoxysilane 6 parts by weight Antimony trioxide 8 parts by weight Hoechst wax S 3 parts by weight Carbon black 2 parts by weight are sufficiently mixed at room temperature and then kneaded at 80 to 110 ° C. using a biaxial heating roll and cooled. It was pulverized to obtain a resin composition for sealing electronic parts.

【0011】《実施例2、3》表1に示した配合で実施
例1と同様にして電子部品封止用樹脂組成物を得た。 《比較例1〜3》表1に示した配合で実施例1と同様に
して電子部品封止用樹脂組成物を得た。実施例、比較例
の樹脂組成物をトランスファー成形機を用いて温度17
5℃、注入圧120Kg /cm2で成形した後、175
℃、8時間のポストキュア処理を行いテストピースを得
た。
<< Examples 2 and 3 >> Using the formulations shown in Table 1, the resin composition for sealing electronic parts was obtained in the same manner as in Example 1. << Comparative Examples 1 to 3 >> Resin compositions for electronic component encapsulation were obtained in the same manner as in Example 1 with the formulations shown in Table 1. The resin compositions of Examples and Comparative Examples were heated at a temperature of 17 using a transfer molding machine.
175 after molding at 5 ° C. and injection pressure of 120 kg / cm 2.
Post-cure treatment was performed at 8 ° C. for 8 hours to obtain a test piece.

【0012】《評価方法》 ・スパイラルフロー:EMMI−I−66に準じた金型
を用い、175℃、注入圧70Kg /cm2で測定し
た。 ・熱膨張係数:15×4×4mmのテストピースを17
5℃、90秒硬化で成形しポストキュア処理後、TMA
[セイコー電子工業(株)・製]を用いて、60℃におけ
る値とした。昇温スピードは5℃/分、単位は、×10
-51/℃。 ・成形収縮率:JIS K−6911に準じ円盤のテス
トピースを175℃、90秒硬化で成形し、ポストキュ
ア処理後の寸法より求めた。単位は%。 ・吸湿率:50φ×3mm厚の円盤を成形し、85℃、
相対湿度85%の恒温恒湿槽で336時間処理後、デシ
ケーター中で室温まで冷却後、重量増加率を測定した。 ・寸法安定性:50φ×3mm厚の円盤を85℃、相対
湿度85%の恒温恒湿槽で336時間処理後の成形品表
面の平滑性を50倍の顕微鏡で目視観察し判定した。○
は表面が平滑なもの、×は凹凸が見られるもの。 ・水分トラップ性:上方が開いた円筒状のガラス容器に
五酸化燐を入れ、予め樹脂組成物を175℃で50φ×
1mm(厚さ)の大きさに成形し、接着剤を用いてガラ
ス容器を上記の成形品で密封した後、前記の密封された
ガラス容器を85℃、相対湿度85%の恒温恒湿槽に1
00時間及び300時間放置した後、内部の五酸化燐の
重量増加率を測定した。○は0.3%以下、×は0.3
%以上 以上の評価結果を表1に示す。
<Evaluation Method> Spiral flow: Measured at a temperature of 175 ° C. and an injection pressure of 70 kg / cm 2 using a mold conforming to EMMI-I-66.・ Thermal expansion coefficient: 15 × 4 × 4 mm test piece 17
Molded by curing at 5 ℃ for 90 seconds, post cure, TMA
The value at 60 ° C. was obtained using [manufactured by Seiko Instruments Inc.]. Temperature rising speed is 5 ° C / min, unit is × 10
-5 1 / ° C. Molding shrinkage rate: A disk test piece was molded by curing at 175 ° C. for 90 seconds according to JIS K-6911, and was determined from the dimensions after the post cure treatment. Units%.・ Moisture absorption rate: A disk with a thickness of 50φ x 3 mm is formed at 85 ° C,
After treatment for 336 hours in a thermo-hygrostat having a relative humidity of 85%, the weight increase rate was measured after cooling to room temperature in a desiccator. -Dimensional stability: A disc having a diameter of 50 mm and a thickness of 3 mm was treated for 336 hours in a thermo-hygrostat at 85 ° C. and a relative humidity of 85%. ○
Indicates that the surface is smooth, and × indicates that there are irregularities. Moisture trapping property: Phosphorus pentoxide was placed in a cylindrical glass container having an open top, and the resin composition was preliminarily heated to 175 ° C. and 50φ ×
After molding to a size of 1 mm (thickness) and sealing the glass container with the above-mentioned molded product using an adhesive, the sealed glass container is placed in a thermo-hygrostat at 85 ° C and a relative humidity of 85%. 1
After standing for 00 hours and 300 hours, the weight increase rate of phosphorus pentoxide inside was measured. ○: 0.3% or less, ×: 0.3
Table 1 shows the evaluation results of not less than%.

【0013】 表 1 実 施 例 比 較 例 1 2 3 1 2 3 4 配合(重量部) ビフェニル型エポキシ樹脂 90 90 90 90 90 90クレソ゛ -ルノ-ホ゛ラック型エポキシ樹脂 95 臭素化エポキシ樹脂 8 8 8 8 8 8 8 フェノールノボラック樹脂 52 52 52 52 52 52 52 2−メチルイミダゾール 1 0.7 1 1 1 1 1,8-シ゛アサ゛ヒ゛シクロウンテ゛セン 1.2 ゼオライト 100 150 50 200 400 シリカゲル 100 120 80 200 400 破砕溶融シリカ 100 100 100 100 200 球状溶融シリカ 500 550 600 500 500 600 γ−ク゛リシト゛キシフ゜ロヒ゜ルトリメトキシシラン 6 6 6 6 6 6 6 三酸化アンチモン 8 8 8 8 8 8 8 ヘキストワックスS 3 3 3 3 3 3 3カーボンブラック 2 2 2 2 2 2 2 特性 スパラルフロー(cm) 100 60 95 90 90 120 0 熱膨張係数(×10-51/℃) 1.4 1.4 1.3 1.4 1.4 1.2 ∧ 成形収縮率(%) 0.26 0.24 0.23 0.26 0.25 0.20 成 吸湿率(%) 0.80 1.23 0.56 0.60 0.59 0.32 形 寸法安定性 ○ ○ ○ ○ ○ ○ 不 水分トラップ性 100時間後 ○ ○ ○ ○ ○ × 可 300時間後 ○ ○ ○ × × × ∨ Table 1 Example Comparative Example 1 2 3 1 2 3 4 Compounding (parts by weight) Biphenyl type epoxy resin 90 90 90 90 90 90 Cresol-runo-volak type epoxy resin 95 Brominated epoxy resin 8 8 8 8 8 8 8 Phenol novolac Resin 52 52 52 52 52 52 52 2-Methylimidazole 1 0.7 1 1 1 1 1, 1, 8-Diazabicycloundecene 1.2 Zeolite 100 150 50 200 400 Silica gel 100 120 80 200 400 Crushed fused silica 100 100 100 100 200 Spherical fused Silica 500 550 600 500 500 600 γ-glycidoxypropyltrimethoxysilane 6 6 6 6 6 6 6 antimony trioxide 8 8 8 8 8 8 8 Hoechst wax S 3 3 3 3 3 3 3 carbon black 2 2 2 2 2 2 2 Characteristics Sparal flow (cm) 100 60 95 90 90 120 0 Thermal expansion coefficient (× 10 -5 1 / ℃) 1.4 1.4 1.3 1.4 1.4 1.2 ∧ Molding shrinkage (%) 0.26 0.24 0.23 0.26 0.25 0.20 Moisture absorption (%) ) 0.80 1.23 0.56 0.60 0.59 0.32 Dimensions Qualitative ○ ○ ○ ○ ○ ○ non moisture trapping after 100 hours ○ ○ ○ ○ ○ × friendly after 300 hours ○ ○ ○ × × × ∨

【0014】[0014]

【発明の効果】本発明の樹脂組成物を用いることによ
り、寸法安定性に優れ、外部からの水分の浸入が防止で
き、特に固体撮像素子等の窓付き電子部品用に好適であ
る。
EFFECTS OF THE INVENTION By using the resin composition of the present invention, the dimensional stability is excellent and the intrusion of moisture from the outside can be prevented, and it is particularly suitable for windowed electronic parts such as solid-state image pickup devices.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 エポキシ樹脂、フェノール樹脂硬化剤、
硬化促進剤、無機充填材、ゼオライト、シリカゲルを必
須成分とし、該ゼオライトの構造が式(1)で示されそ
の最大粒径が200μm以下で、全組成物中のゼオライ
トの含有量が3〜30重量%、該シリカゲルの最大粒径
が200μm以下で全組成物中のシリカゲルの含有量が
3〜30重量%であることを特徴とする電子部品封止用
樹脂組成物。 xM2/nO・Al23・ySiO2・zH2O (1) (ここで、x=0.1〜2.0、y=1.0〜200、
z=0〜100、Mはアルカリ金属またはアルカリ土類
金属で、nはその原子価である。)
An epoxy resin, a phenol resin curing agent,
A curing accelerator, an inorganic filler, zeolite, and silica gel are essential components, the structure of the zeolite is represented by the formula (1), the maximum particle size is 200 μm or less, and the content of the zeolite in the entire composition is 3 to 30. %, The maximum particle size of the silica gel is 200 μm or less, and the content of silica gel in the total composition is 3 to 30% by weight. xM 2 / n O · Al 2 O 3 · ySiO 2 · zH 2 O (1) ( where, x = 0.1~2.0, y = 1.0~200 ,
z = 0 to 100, M is an alkali metal or alkaline earth metal, and n is its valence. )
【請求項2】 無機充填材としてシリカを全組成物中に
40重量%以上含み、かつゼオライトとシリカゲルとシ
リカの合計量が全組成物中の75〜90重量%である電
子部品封止用樹脂組成物。
2. A resin for encapsulating electronic parts, which contains 40% by weight or more of silica as an inorganic filler in the total composition, and the total amount of zeolite, silica gel and silica is 75 to 90% by weight of the total composition. Composition.
【請求項3】 請求項1記載の電子部品封止用樹脂組成
物の成形収縮率が0.3%以下で熱膨張係数が1.5×
10-51/℃以下である電子部品封止用樹脂組成物。
3. The resin composition for encapsulating electronic components according to claim 1, which has a molding shrinkage of 0.3% or less and a thermal expansion coefficient of 1.5 ×.
A resin composition for encapsulating electronic components, having a temperature of 10 -5 1 / ° C or less.
【請求項4】 請求項1記載の電子部品封止用樹脂組成
物の吸湿率が85℃、相対湿度85%、336時間処理
後で0.4重量%以上である電子部品封止用樹脂組成
物。
4. A resin composition for encapsulating electronic components, wherein the resin composition for encapsulating electronic components according to claim 1 has a moisture absorption rate of 85 ° C., relative humidity of 85%, and 0.4% by weight or more after 336 hours of treatment. Stuff.
JP32607795A 1995-12-14 1995-12-14 Resin composition for sealing electronic parts Expired - Fee Related JP3611383B2 (en)

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JPH09165498A true JPH09165498A (en) 1997-06-24
JP3611383B2 JP3611383B2 (en) 2005-01-19

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11158351A (en) * 1997-11-28 1999-06-15 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device
JP2007119547A (en) * 2005-10-26 2007-05-17 Yoshikawa Kogyo Co Ltd Epoxy resin composition, hollow package for semiconductor device and semiconductor part device
JP2021080483A (en) * 2021-03-04 2021-05-27 旭化成株式会社 Complex

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JPS57162747A (en) * 1981-03-31 1982-10-06 Nitto Electric Ind Co Ltd Epoxy resin composition
JPS6166762A (en) * 1984-09-08 1986-04-05 Somar Corp Epoxy resin composition for powder coating
JPH03122113A (en) * 1989-10-06 1991-05-24 Somar Corp Imidazole compound-containing curing agent composition, production thereof and thermosetting epoxy resin composition
JPH03122114A (en) * 1989-10-06 1991-05-24 Somar Corp Curing agent composition, production thereof and thermosetting epoxy resin composition
JPH05295084A (en) * 1992-04-21 1993-11-09 Toray Dow Corning Silicone Co Ltd Curable resin composition
JPH06227112A (en) * 1993-01-29 1994-08-16 Somar Corp Laser beam high-absorptive thermosetting resin composition
JPH0753870A (en) * 1993-08-18 1995-02-28 Toray Dow Corning Silicone Co Ltd Curable resin composition
JPH07216196A (en) * 1994-01-26 1995-08-15 Shin Etsu Chem Co Ltd Epoxy resin composition
JPH0995527A (en) * 1995-09-29 1997-04-08 Sumitomo Bakelite Co Ltd Resin composition for sealing electronic component

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Publication number Priority date Publication date Assignee Title
JPS57162747A (en) * 1981-03-31 1982-10-06 Nitto Electric Ind Co Ltd Epoxy resin composition
JPS6166762A (en) * 1984-09-08 1986-04-05 Somar Corp Epoxy resin composition for powder coating
JPH03122113A (en) * 1989-10-06 1991-05-24 Somar Corp Imidazole compound-containing curing agent composition, production thereof and thermosetting epoxy resin composition
JPH03122114A (en) * 1989-10-06 1991-05-24 Somar Corp Curing agent composition, production thereof and thermosetting epoxy resin composition
JPH05295084A (en) * 1992-04-21 1993-11-09 Toray Dow Corning Silicone Co Ltd Curable resin composition
JPH06227112A (en) * 1993-01-29 1994-08-16 Somar Corp Laser beam high-absorptive thermosetting resin composition
JPH0753870A (en) * 1993-08-18 1995-02-28 Toray Dow Corning Silicone Co Ltd Curable resin composition
JPH07216196A (en) * 1994-01-26 1995-08-15 Shin Etsu Chem Co Ltd Epoxy resin composition
JPH0995527A (en) * 1995-09-29 1997-04-08 Sumitomo Bakelite Co Ltd Resin composition for sealing electronic component

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11158351A (en) * 1997-11-28 1999-06-15 Sumitomo Bakelite Co Ltd Epoxy resin composition and semiconductor device
JP2007119547A (en) * 2005-10-26 2007-05-17 Yoshikawa Kogyo Co Ltd Epoxy resin composition, hollow package for semiconductor device and semiconductor part device
JP2021080483A (en) * 2021-03-04 2021-05-27 旭化成株式会社 Complex

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