JP3346979B2 - Resin composition for sealing electronic parts - Google Patents

Resin composition for sealing electronic parts

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Publication number
JP3346979B2
JP3346979B2 JP10171896A JP10171896A JP3346979B2 JP 3346979 B2 JP3346979 B2 JP 3346979B2 JP 10171896 A JP10171896 A JP 10171896A JP 10171896 A JP10171896 A JP 10171896A JP 3346979 B2 JP3346979 B2 JP 3346979B2
Authority
JP
Japan
Prior art keywords
weight
silica gel
resin
particle size
resin composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP10171896A
Other languages
Japanese (ja)
Other versions
JPH09286845A (en
Inventor
賢至 鮫島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP10171896A priority Critical patent/JP3346979B2/en
Publication of JPH09286845A publication Critical patent/JPH09286845A/en
Application granted granted Critical
Publication of JP3346979B2 publication Critical patent/JP3346979B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は寸法安定性に優れ外
部からの水分の浸入が問題となる固体撮像素子等の窓付
き電子部品の封止用樹脂組成物に関するものである
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resin composition for sealing electronic parts with windows, such as a solid-state image sensor, which has excellent dimensional stability and in which penetration of moisture from the outside is problematic.

【0002】[0002]

【従来の技術】トランジスター、IC、コンデンサー、
ダイオード等の電子部品の封止方法としてエポキシ樹脂
組成物のトランスファー成形による方法が低コスト大量
生産に適するため幅広く実用化され従来金属やセラミッ
クで封止されていたのが樹脂封止に置き変わってきてい
る。最近マルチメディア化が進む中で映像や画像をパソ
コンに取り込んだり遠隔地へ瞬時に送信する必要がでて
きており、小型軽量で低コストの固体撮像素子が必要と
なってきた。従来固体撮像素子はセラミックのケースに
搭載しガラスの窓を接着したものだが高性能であるもの
の高価であった。そこで低コスト化のためにエポキシ樹
脂組成物でモールドしたケースに素子を搭載しガラスや
アクリル樹脂の窓をつける方法がとられているが、セラ
ミックに比べ寸法精度が悪かったり外部から浸入する水
分がエポキシ樹脂内を浸透していきやがてケース内で露
結し特性劣化を引き起こしていた。一般に水分浸入防止
のためにはシリカ等の吸湿性の低い充填材を樹脂に高充
填する手段がとられるが本用途には不十分で長期間の間
に水分が樹脂内を拡散していき内部の素子に到達してい
た。そこで樹脂内の拡散を防ぐため水分を固定化すべく
吸水性ポリマー等の吸湿剤が検討されているが、有機物
の吸湿剤を用いると膨潤が発生し製品の寸法安定性や外
観に問題が出ていた。
2. Description of the Related Art Transistors, ICs, capacitors,
As a method for encapsulating electronic components such as diodes, a method by transfer molding of an epoxy resin composition is suitable for low-cost mass production, and has been widely put into practical use. ing. Recently, with the progress of multimedia, it is necessary to capture images and images to a personal computer or to transmit the images to a remote place instantly, and a small-sized, light-weight, low-cost solid-state imaging device is required. Conventionally, a solid-state imaging device is mounted on a ceramic case and bonded with a glass window, but it has high performance but is expensive. Therefore, to reduce costs, a method of mounting the element in a case molded with an epoxy resin composition and attaching a window made of glass or acrylic resin has been adopted, but the dimensional accuracy is lower than that of ceramic and moisture entering from the outside is It gradually penetrated the epoxy resin and eventually became dewed in the case, causing deterioration in characteristics. In general, in order to prevent water intrusion, a means of filling the resin with a filler having low hygroscopicity such as silica is used, but it is insufficient for this application and moisture diffuses inside the resin for a long period of time and Device. Therefore, in order to prevent the diffusion in the resin, a moisture absorbent such as a water absorbent polymer is being studied to fix the water content.However, when an organic moisture absorbent is used, swelling occurs and there is a problem in the dimensional stability and appearance of the product. Was.

【0003】[0003]

【発明が解決しようとする課題】本発明は寸法安定性と
外部から浸入する水分を遮断する能力とを飛躍的に高め
た電子部品封止用樹脂組成物を提供するものである。
SUMMARY OF THE INVENTION An object of the present invention is to provide a resin composition for sealing electronic parts, which has significantly improved dimensional stability and ability to block moisture entering from the outside.

【0004】[0004]

【課題を解決するための手段】本発明は、エポキシ樹
脂、フェノール樹脂硬化剤、硬化促進剤、無機充填材、
シリカゲルを必須成分とし、該シリカゲルの最大粒径が
200μm以下、平均粒径5〜40μm、平均細孔容積
が0.1〜50ml/gで、全組成物中のシリカゲルの
含有量が1〜30重量%であることを特徴とする電子部
品封止用樹脂組成物である。
The present invention provides an epoxy resin, a phenol resin curing agent, a curing accelerator, an inorganic filler,
Silica gel is an essential component, the maximum particle size of the silica gel is 200 μm or less, the average particle size is 5 to 40 μm, the average pore volume is 0.1 to 50 ml / g, and the content of silica gel in the total composition is 1 to 30. % By weight, which is a resin composition for sealing electronic parts.

【0005】該シリカゲルは粒子内に直径50〜300
Å程度の空孔が無数にあり水分を吸着保持できる。空孔
の容積は重要で平均細孔容積が0.1ml/g未満では
水分吸着能が低く実用的でなく、50ml/gを越える
と樹脂の流動性が劣化する。また最大粒径が200μm
以上では充填性が劣る。平均粒径は、5〜40μmの
範囲が必要で5μm未満では流動性が劣化し40μmを
越えると充填性が悪くなる。全樹脂組成物中の含有量
が、1重量%未満では吸湿性能が低く30重量%を越え
ると防湿性より透湿性が高くなり水分浸入防止特性が低
くなる。また流動性が劣化し成形不良を引き起こす。シ
リカゲル粒子の形状は破砕状、球状等特に限定しない。
The silica gel has a particle diameter of 50-300.
There are innumerable holes of about Å and moisture can be absorbed and held. The volume of pores is important. If the average pore volume is less than 0.1 ml / g, the water adsorption capacity is low and not practical, and if the average pore volume exceeds 50 ml / g, the fluidity of the resin deteriorates. The maximum particle size is 200 μm
Above, the filling property is inferior. The average particle size is required to be in the range of 5 to 40 μm. If the average particle size is less than 5 μm, the fluidity is deteriorated. If the content in the whole resin composition is less than 1% by weight, the moisture absorption performance is low, and if it exceeds 30% by weight, the moisture permeability is higher than the moisture proof property, and the moisture intrusion prevention property is low. In addition, the fluidity is deteriorated, resulting in poor molding. The shape of the silica gel particles is not particularly limited, such as a crushed shape and a spherical shape.

【0006】無機充填材としては、シリカ、アルミナ、
クレー、炭酸カルシウム、チッ化アルミ、チッ化珪素等
があるが、これらの中ではシリカが好ましい。シリカと
しては、溶融シリカや結晶シリカが望ましく破砕または
球状で平均粒径が10〜30μm、最大粒径が150μ
m以下で有ればよいが、他の粒径のものでもかまわない
しこれらを混合して用いてもよい。本発明に用いるシリ
カとシリカゲルの合計量が全組成物の65重量%〜90
重量%であることが必要であるシリカとシリカゲルの合
計量が65〜90重量%のときに寸法安定性と吸湿性が
特に優れ、この範囲外では成形性と吸湿性が両立できな
い。
As the inorganic filler, silica, alumina,
Clay, calcium carbonate, aluminum nitride, silicon nitride, etc. are preferred, and among these, silica is preferred. As the silica, fused silica or crystalline silica is preferably crushed or spherical, having an average particle size of 10 to 30 μm, and a maximum particle size of 150 μm.
m or less, but other particles may be used, or a mixture of these may be used. The total amount of silica and silica gel used in the present invention is 65% by weight to 90% of the total composition.
When the total amount of silica and silica gel, which needs to be in the range of 65% by weight, is 65 to 90% by weight, the dimensional stability and the hygroscopicity are particularly excellent.

【0007】本発明に用いられるエポキシ樹脂は、2個
以上のエポキシ基を含むものならば特には限定しない。
例えばクレゾールノボラック型エポキシ樹脂、三官能エ
ポキシ樹脂、ビフェニル型エポキシ樹脂、ジシクロペン
タジエン型エポキシ樹脂、ビスフェノール型エポキシ樹
脂、臭素化エポキシ樹脂等が挙げられる。これらのエポ
キシ樹脂は、単独でも混合して用いてもよい。フェノー
ル樹脂硬化剤は、2個以上の水酸基を含むものならば特
に限定しない。例えば、フェノールノボラック樹脂、ク
レゾールノボラック樹脂、フェノールアラルキル樹脂、
ジシクロペンタジエン変性フェノール樹脂、トリフェニ
ルメタン型樹脂及びこれらの変性樹脂が挙げられる。こ
れらのフェノール樹脂は、単独でも混合して用いても良
い。又これらの硬化剤の配合量としてはエポキシ樹脂の
エポキシ基数と硬化剤の水酸基数を合わせるように配合
することが好ましい。硬化促進剤としては、イミダゾー
ル、有機ホスフィン、3級アミン、1,8−ジアザビシ
クロ(5,4,0)ウンデセン−7等が挙げられるが特
に限定するものではない。これらは、単独でも混合して
用いてもよい。
[0007] The epoxy resin used in the present invention is not particularly limited as long as it contains two or more epoxy groups.
For example, cresol novolak type epoxy resin, trifunctional epoxy resin, biphenyl type epoxy resin, dicyclopentadiene type epoxy resin, bisphenol type epoxy resin, brominated epoxy resin and the like can be mentioned. These epoxy resins may be used alone or as a mixture. The phenol resin curing agent is not particularly limited as long as it contains two or more hydroxyl groups. For example, phenol novolak resin, cresol novolak resin, phenol aralkyl resin,
Examples include dicyclopentadiene-modified phenolic resins, triphenylmethane-type resins, and modified resins thereof. These phenol resins may be used alone or as a mixture. The amount of these curing agents is preferably such that the number of epoxy groups in the epoxy resin and the number of hydroxyl groups in the curing agent match. Examples of the curing accelerator include, but are not particularly limited to, imidazole, organic phosphine, tertiary amine, 1,8-diazabicyclo (5,4,0) undecene-7, and the like. These may be used alone or as a mixture.

【0008】本発明は、エポキシ樹脂、フェノール樹脂
硬化剤、硬化促進剤、無機充填材、シリカゲルを必須成
分とするが これら以外に必要に応じてシランカップリ
ング剤等の無機充填材の表面処理剤、三酸化アンチモン
等の難燃剤、カーボンブラック、ベンガラ等の着色剤、
天然ワックス、合成ワックス等の離型剤及びシリコーン
オイル、ゴム等の低応力添加剤その他種々の添加剤を適
宜配合しても差し支えない。又、本発明の電子部品封止
用樹脂組成物を成形材料として製造するには、エポキシ
樹脂、フェノール樹脂硬化剤、硬化促進剤、無機充填
材、シリカゲル、その他の添加剤をミキサー等によって
充分に均一に混合した後、更に熱ロールまたはニーダー
等で溶融混練し、冷却粉砕して封止材料とすることがで
きる。
The present invention comprises an epoxy resin, a phenolic resin curing agent, a curing accelerator, an inorganic filler, and silica gel as essential components. In addition to these, a surface treating agent for an inorganic filler such as a silane coupling agent may be used if necessary. , Flame retardants such as antimony trioxide, coloring agents such as carbon black and red iron oxide,
A release agent such as natural wax and synthetic wax and a low stress additive such as silicone oil and rubber and other various additives may be appropriately compounded. Further, in order to manufacture the resin composition for sealing electronic parts of the present invention as a molding material, epoxy resin, phenol resin curing agent, curing accelerator, inorganic filler, silica gel, and other additives are sufficiently mixed with a mixer or the like. After uniform mixing, the mixture is further melt-kneaded with a hot roll or a kneader, and cooled and pulverized to obtain a sealing material.

【0009】[0009]

【実施例】以下本発明を実施例で示す。配合割合は重量
部で示す。 《実施例1》 ・ビフェニル型エポキシ樹脂 90重量部 (油化シェル (株)YX4000:エポキシ当量190、融点107℃) ・臭素化エポキシ樹脂 8重量部 (大日本インキ化学工業(株) エピクロン152:エポキシ当量360、軟化 点65℃) ・フェノールノボラック樹脂 52重量部 (住友デュレズ(株):水酸基当量105、軟化点70℃) ・シリカゲルA 15重量部 (最大粒径200μm、平均粒径20μm、平均細孔容積5ml/g) ・破砕溶融シリカ 100重量部 (平均粒径15μm、最大粒径100μm) ・球状溶融シリカ 500重量部 (平均粒径23μm、最大粒径75μm) ・γ−グリシドキシプロピルトリメトキシシラン 6重量部 (日本ユニカー(株)) ・2−メチルイミダゾール 1重量部 (四国化成(株)2MZ) ・三酸化アンチモン 8重量部 ・ヘキストワックスS 3重量部 ・カーボンブラック 2重量部 を常温で充分に混合し次に80〜110℃で2軸熱ロー
ルを用いて混練し冷却後粉砕して電子部品封止用樹脂組
成物を得た。
The present invention will be described below by way of examples. The mixing ratio is shown in parts by weight. << Example 1 >> 90 parts by weight of biphenyl type epoxy resin (Yuka 4000, epoxy equivalent 190, melting point 107 ° C.) 8 parts by weight of brominated epoxy resin (Epiclon 152, Dainippon Ink and Chemicals, Inc.) Epoxy equivalent 360, softening point 65 ° C) Phenol novolak resin 52 parts by weight (Sumitomo Durez Co., Ltd .: hydroxyl equivalent 105, softening point 70 ° C) Silica gel A 15 parts by weight (maximum particle diameter 200 μm, average particle diameter 20 μm, average)・ Pore volume 5 ml / g) ・ Crushed fused silica 100 parts by weight (average particle size 15 μm, maximum particle size 100 μm) ・ Spherical fused silica 500 parts by weight (average particle size 23 μm, maximum particle size 75 μm) ・ γ-glycidoxypropyl 6 parts by weight of trimethoxysilane (Nippon Unicar Co., Ltd.) 1 part by weight of 2-methylimidazole (Shikoku Chemicals Co., Ltd. 2MZ) Antimony trioxide 8 parts by weight ・ Hoechst wax S 3 parts by weight ・ Carbon black 2 parts by weight are sufficiently mixed at room temperature, then kneaded at 80 to 110 ° C. using a biaxial heat roll, cooled, pulverized, and sealed for electronic parts. A resin composition for stopping was obtained.

【0010】《実施例2、3》表1に示した配合で実施
例1と同様にして電子部品封止用樹脂組成物を得た。 実施例2のエポキシ樹脂はクレゾールノボラック型エポ
キシ樹脂(住友化学(株):エポキシ当量200、軟化点
60℃)を使用した。 《比較例1〜5》表1に示した配合で実施例1と同様に
して電子部品封止用樹脂組成物を得た。 実施例、比較例で得られた樹脂組成物をトランスファー
成形機を用いて温度175℃、注入圧120Kg /c
2 で 成形した後、175℃、8時間のポストキュア
処理を行いテストピースを得た。比較例で使用したシリ
カゲルは下記のとおり。 ・シリカゲルB:最大粒径30μm、平均粒径2μm、
平均細孔容積10ml/g ・シリカゲルC:最大粒径150μm、平均粒径25μ
m、平均細孔容積0.01ml/g ・シリカゲルD:最大粒径100μm、平均粒径8μ
m、平均細孔容積90ml/g
Examples 2 and 3 A resin composition for sealing electronic parts was obtained in the same manner as in Example 1 with the composition shown in Table 1. As the epoxy resin of Example 2, a cresol novolak type epoxy resin (Sumitomo Chemical Co., Ltd .: epoxy equivalent: 200, softening point: 60 ° C.) was used. << Comparative Examples 1 to 5 >> Resin compositions for encapsulating electronic components were obtained in the same manner as in Example 1 with the formulations shown in Table 1. Using a transfer molding machine, the resin compositions obtained in Examples and Comparative Examples were heated at a temperature of 175 ° C. and an injection pressure of 120 kg / c.
After molding at m 2 , post-curing treatment was performed at 175 ° C. for 8 hours to obtain a test piece. The silica gel used in the comparative example is as follows.・ Silica gel B: maximum particle size 30 μm, average particle size 2 μm,
Average pore volume 10 ml / g • Silica gel C: maximum particle size 150 μm, average particle size 25 μ
m, average pore volume 0.01 ml / g ・ Silica gel D: maximum particle size 100 μm, average particle size 8 μm
m, average pore volume 90 ml / g

【0011】《評価方法》 ・スパイラルフロー(流動性):EMMI−I−66に
準じた金型を用い、175℃、注入圧70Kg/cm2
で測定した。 ・吸湿率:50φ3mm厚の円盤を成形し、85℃、相
対湿度85%の恒温恒湿槽で336時間処理後デシケー
ター中で室温まで冷却後、重量増加率を測定した。 ・水分トラップ性:予め樹脂組成物を175℃で成形
し、50φ1mm厚の成形板を得、該成形板を五酸化燐
を入れた凹型のガラス容器の上部に接着剤を用いて密閉
した後、85℃、相対湿度85%の恒温恒湿槽に100
時間、300時間放置後、内部の五酸化燐の重量増加率
を測定した。 評価 ○:0.1重量%未満、×:0.1重量%以上 ・寸法安定性:50φ3mm厚の円盤を成形し、85
℃、相対湿度85%の恒温恒湿槽で336時間処理後の
成形品表面の平滑性を50倍の顕微鏡で目視観察し判定
した。以上の評価結果を表1に示す。
<< Evaluation method >> Spiral flow (fluidity): Using a mold conforming to EMMI-I-66, 175 ° C., injection pressure 70 kg / cm 2.
Was measured. Moisture absorption: A disk having a thickness of 50 mm and a thickness of 3 mm was molded, treated in a thermo-hygrostat at 85 ° C. and a relative humidity of 85% for 336 hours, cooled to a room temperature in a desiccator, and then measured for the rate of weight increase. Moisture trapping property: The resin composition was previously molded at 175 ° C. to obtain a molded plate having a diameter of 50 mm and a thickness of 1 mm, and the molded plate was sealed with an adhesive on the upper part of a concave glass container containing phosphorus pentoxide. 100 in a thermo-hygrostat at 85 ° C and 85% relative humidity
After standing for 300 hours for 300 hours, the weight increase rate of phosphorus pentoxide inside was measured. Evaluation :: Less than 0.1% by weight, ×: 0.1% by weight or more Dimensional stability: A disk having a thickness of 50 mm 3 mm was formed, and
The surface smoothness of the molded product after the treatment in a thermo-hygrostat at 85 ° C. and a relative humidity of 85% for 336 hours was visually observed and judged with a microscope of 50 times magnification. Table 1 shows the evaluation results.

【0012】[0012]

【表1】 [Table 1]

【0013】[0013]

【発明の効果】本発明の樹脂組成物を用いることにより
寸法安定性に優れ、外部からの水分の浸入が防止でき、
特に固体撮像素子等の窓付き電子部品用に好適である。
EFFECT OF THE INVENTION By using the resin composition of the present invention, the dimensional stability is excellent, the infiltration of moisture from the outside can be prevented,
It is particularly suitable for electronic parts with windows such as solid-state imaging devices.

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) C08L 63/00 - 63/10 C08G 59/62 C08K 3/34 - 3/36 H01L 23/29 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int. Cl. 7 , DB name) C08L 63/00-63/10 C08G 59/62 C08K 3/34-3/36 H01L 23/29

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 エポキシ樹脂、フェノール樹脂硬化剤、
硬化促進剤、無機充填材、シリカゲルを必須成分とし、
該シリカゲルの最大粒径が200μm以下、平均粒径5
〜40μm、平均細孔容積が0.1〜50ml/gで、
全組成物中のシリカゲルの含有量が1〜30重量%であ
ることを特徴とする電子部品封止用樹脂組成物。
An epoxy resin, a phenol resin curing agent,
Hardening accelerator, inorganic filler, silica gel as essential components,
The maximum particle size of the silica gel is 200 μm or less, and the average particle size is 5
4040 μm, average pore volume is 0.1-50 ml / g,
A resin composition for sealing electronic parts, wherein the content of silica gel in the entire composition is 1 to 30% by weight.
【請求項2】 無機充填材が、シリカであり、シリカと
シリカゲルの合計量が全組成物中の65〜90重量%で
ある請求項1記載の電子部品封止用樹脂組成物。
2. The electronic component sealing resin composition according to claim 1, wherein the inorganic filler is silica, and the total amount of silica and silica gel is 65 to 90% by weight of the total composition.
JP10171896A 1996-04-23 1996-04-23 Resin composition for sealing electronic parts Expired - Fee Related JP3346979B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10171896A JP3346979B2 (en) 1996-04-23 1996-04-23 Resin composition for sealing electronic parts

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10171896A JP3346979B2 (en) 1996-04-23 1996-04-23 Resin composition for sealing electronic parts

Publications (2)

Publication Number Publication Date
JPH09286845A JPH09286845A (en) 1997-11-04
JP3346979B2 true JP3346979B2 (en) 2002-11-18

Family

ID=14308094

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JP10171896A Expired - Fee Related JP3346979B2 (en) 1996-04-23 1996-04-23 Resin composition for sealing electronic parts

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US6495260B1 (en) 1999-06-15 2002-12-17 Sumitomo Bakelite Company Limited Method of producing epoxy for molding semiconductor device, molding material, and semiconductor device

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