JPH08264409A - 半導体集積回路装置の製造方法 - Google Patents

半導体集積回路装置の製造方法

Info

Publication number
JPH08264409A
JPH08264409A JP7060995A JP6099595A JPH08264409A JP H08264409 A JPH08264409 A JP H08264409A JP 7060995 A JP7060995 A JP 7060995A JP 6099595 A JP6099595 A JP 6099595A JP H08264409 A JPH08264409 A JP H08264409A
Authority
JP
Japan
Prior art keywords
pattern
corners
distance
semiconductor wafer
main surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7060995A
Other languages
English (en)
Japanese (ja)
Inventor
Susumu Komoriya
進 小森谷
Toshiharu Nagatsuka
俊治 永塚
Shinji Kuniyoshi
伸治 国吉
Hiroshi Maejima
央 前島
Nobuyuki Irikita
信行 入来
Takeshi Kato
毅 加藤
Masayuki Hiranuma
雅幸 平沼
Takashi Hiroi
高志 広井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7060995A priority Critical patent/JPH08264409A/ja
Priority to KR1019960006818A priority patent/KR960035850A/ko
Publication of JPH08264409A publication Critical patent/JPH08264409A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP7060995A 1995-03-20 1995-03-20 半導体集積回路装置の製造方法 Pending JPH08264409A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP7060995A JPH08264409A (ja) 1995-03-20 1995-03-20 半導体集積回路装置の製造方法
KR1019960006818A KR960035850A (ko) 1995-03-20 1996-03-14 반도체집적회로장치의 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7060995A JPH08264409A (ja) 1995-03-20 1995-03-20 半導体集積回路装置の製造方法

Publications (1)

Publication Number Publication Date
JPH08264409A true JPH08264409A (ja) 1996-10-11

Family

ID=13158532

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7060995A Pending JPH08264409A (ja) 1995-03-20 1995-03-20 半導体集積回路装置の製造方法

Country Status (2)

Country Link
JP (1) JPH08264409A (ko)
KR (1) KR960035850A (ko)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006186177A (ja) * 2004-12-28 2006-07-13 Oki Electric Ind Co Ltd 半導体装置の製造方法
JP2008028389A (ja) * 2006-07-18 2008-02-07 Asml Netherlands Bv インスペクション方法およびインスペクション装置、リソグラフィ装置、リソグラフィ処理セルならびにデバイス製造方法
JP2008147258A (ja) * 2006-12-06 2008-06-26 Canon Inc 計測装置及びこれを備える投影露光装置並びにデバイス製造方法
JP2008244497A (ja) * 2008-06-06 2008-10-09 Fujitsu Ltd 半導体装置
JP2009260344A (ja) * 2008-04-16 2009-11-05 Asml Netherlands Bv リソグラフィ投影装置を測定する方法
JP2017107069A (ja) * 2015-12-10 2017-06-15 株式会社ニコン 基板処理装置およびテスト用シート基板

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006186177A (ja) * 2004-12-28 2006-07-13 Oki Electric Ind Co Ltd 半導体装置の製造方法
US7507508B2 (en) 2004-12-28 2009-03-24 Oki Semiconductor Co., Ltd Method for manufacturing a semiconductor device
JP2008028389A (ja) * 2006-07-18 2008-02-07 Asml Netherlands Bv インスペクション方法およびインスペクション装置、リソグラフィ装置、リソグラフィ処理セルならびにデバイス製造方法
US7916284B2 (en) 2006-07-18 2011-03-29 Asml Netherlands B.V. Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
JP2008147258A (ja) * 2006-12-06 2008-06-26 Canon Inc 計測装置及びこれを備える投影露光装置並びにデバイス製造方法
US8537334B2 (en) 2006-12-06 2013-09-17 Canon Kabushiki Kaisha Measuring apparatus and projection exposure apparatus having the same
JP2009260344A (ja) * 2008-04-16 2009-11-05 Asml Netherlands Bv リソグラフィ投影装置を測定する方法
US8208122B2 (en) 2008-04-16 2012-06-26 Asml Netherlands B.V. Method of measuring a lithographic projection apparatus
JP2008244497A (ja) * 2008-06-06 2008-10-09 Fujitsu Ltd 半導体装置
JP2017107069A (ja) * 2015-12-10 2017-06-15 株式会社ニコン 基板処理装置およびテスト用シート基板

Also Published As

Publication number Publication date
KR960035850A (ko) 1996-10-28

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