JPH08223695A - Ultrasonic probe and its production - Google Patents

Ultrasonic probe and its production

Info

Publication number
JPH08223695A
JPH08223695A JP4615495A JP4615495A JPH08223695A JP H08223695 A JPH08223695 A JP H08223695A JP 4615495 A JP4615495 A JP 4615495A JP 4615495 A JP4615495 A JP 4615495A JP H08223695 A JPH08223695 A JP H08223695A
Authority
JP
Japan
Prior art keywords
ultrasonic
acoustic lens
oscillator
pressure
ultrasonic oscillator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4615495A
Other languages
Japanese (ja)
Other versions
JP3337179B2 (en
Inventor
Hiroshi Yamamoto
弘 山本
Yasuo Hayakawa
泰夫 早川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Construction Machinery Co Ltd
Original Assignee
Hitachi Construction Machinery Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Construction Machinery Co Ltd filed Critical Hitachi Construction Machinery Co Ltd
Priority to JP04615495A priority Critical patent/JP3337179B2/en
Publication of JPH08223695A publication Critical patent/JPH08223695A/en
Application granted granted Critical
Publication of JP3337179B2 publication Critical patent/JP3337179B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE: To reduce the deterioration with age at the junction parts among an ultrasonic oscillator, an acoustic lens and an ultrasonic absorbing material and also to secure the excellent acoustic characteristic. CONSTITUTION: An ultrasonic oscillator 1 and an acoustic lens 5 made of quarz are set on a pressure jig and both junction faces are closely put together with pressure after the pollution layers such as the oxides, etc., are eliminated on the junction faces by means of a beam source. Thus the oscillator 1 and the lens 5 can be put together with pressure. In the same way, the oscillator 1 and an ultrasonic absorbing member 7 are put together with pressure. An Au/Cr evaporation film 4 is formed on one of both sides of the lens 5, and the films 4 (metallic films for formation of electrode 2 and 3) are formed on both sides of the oscillator 1. Therefore, the oscillator 1, the lens 5 and the member 7 can be joined together with pressure. In such a constitution, it is possible to obtain an ultrasonic probe which has the excellent acoustic characteristic that never changes for a long period of time.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、超音波探触子における
超音波発振子,音響レンズ及び超音波吸収材相互間の接
合構造およびその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a bonding structure between an ultrasonic oscillator, an acoustic lens and an ultrasonic absorber in an ultrasonic probe and a method for manufacturing the same.

【0002】[0002]

【従来の技術】従来、超音波探触子を組立てるための、
超音波発振子と音響レンズおよび超音波吸収材を接合す
る方法としては、主としてエポキシ樹脂等の有機接着剤
を用いる方法が採用されていた。
2. Description of the Related Art Conventionally, for assembling an ultrasonic probe,
As a method of joining the ultrasonic oscillator, the acoustic lens, and the ultrasonic absorber, a method using an organic adhesive such as an epoxy resin has been mainly adopted.

【0003】しかし、超音波発振子と音響レンズおよび
超音波吸収材を接合するために、エポキシ樹脂等の電気
絶縁性の有機接着剤を用いる場合、幾つかの問題点の存
在が認められた。先ず、接合に用いるエポキシ樹脂系接
着剤が経時変化を起こすため、超音波探触子の音響特性
が経時的に劣化する恐れがあり、測定の信頼性を損ねる
という問題があった。
However, when an electrically insulating organic adhesive such as an epoxy resin is used to bond the ultrasonic oscillator to the acoustic lens and the ultrasonic absorber, some problems have been recognized. First, since the epoxy resin adhesive used for joining changes with time, there is a possibility that the acoustic characteristics of the ultrasonic probe may deteriorate over time, and there is a problem that the reliability of measurement is impaired.

【0004】また、一般的に、エポキシ樹脂系の有機接
着剤と超音波発振子および音響レンズにおける音響イン
ピーダンスの差は極めて大きいので、エポキシ樹脂系の
有機接着剤を用いて超音波発振子と音響レンズを接合す
ると、有機接着剤が音響境界層を形成し、その結果超音
波が反射される。そのため超音波発振子から音響レンズ
へ超音波が充分に伝播せず、良好な音響特性を示さない
という問題点もあった。
In general, the difference in acoustic impedance between the epoxy resin-based organic adhesive, the ultrasonic oscillator and the acoustic lens is extremely large. When the lenses are bonded, the organic adhesive forms an acoustic boundary layer, which results in the reflection of ultrasonic waves. Therefore, there is also a problem that the ultrasonic wave does not sufficiently propagate from the ultrasonic oscillator to the acoustic lens, and good acoustic characteristics are not exhibited.

【0005】[0005]

【発明が解決しようとする課題】従って、本発明の目的
は、超音波発振子と音響レンズとの接合部の経時変化が
小さく、そのうえ、良好な音響特性を有する超音波探触
子の構造およびその製造方法を提供することにある。
SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a structure of an ultrasonic probe which has a small change with time in the joint between the ultrasonic oscillator and the acoustic lens and which has good acoustic characteristics. It is to provide the manufacturing method.

【0006】[0006]

【課題を解決するための手段】上記目的は、超音波発振
子と超音波吸収材と音響レンズを電気絶縁物を用いずに
物理的な圧接により接合し、また超音波発振子と音響レ
ンズの接合のために、真空中で接合面にイオンビームま
たはアトムビームを照射した後圧接することにより達成
される。特に本発明では、音響レンズの材料に石英を使
用し、この音響レンズの超音波発振子との接合面にAu
/Cr蒸着膜を配設させる。
The above object is to join an ultrasonic oscillator, an ultrasonic absorber, and an acoustic lens by physical pressure contact without using an electrical insulator, and to attach the ultrasonic oscillator and the acoustic lens. For joining, it is achieved by irradiating the joining surface with an ion beam or an atom beam in a vacuum and then performing pressure welding. In particular, in the present invention, quartz is used as the material of the acoustic lens, and Au is bonded to the joint surface of the acoustic lens with the ultrasonic oscillator.
/ Cr vapor deposition film is provided.

【0007】[0007]

【作用】超音波発振子および音響レンズの接合面に真空
中でイオンビームまたはアトムビームを照射することに
よって、接合面に付着している酸化皮膜や水分等の汚染
層が除去される。これにより接合面は清浄かつ活性な面
となり、加圧して密着させれば極めて良好な圧接接合が
形成される。
By irradiating the bonding surface of the ultrasonic oscillator and the acoustic lens with an ion beam or an atom beam in a vacuum, the contaminated layer such as an oxide film or water adhering to the bonding surface is removed. As a result, the joint surface becomes a clean and active surface, and if pressure is applied to bring it into close contact, an extremely good pressure-welded joint is formed.

【0008】なお、この明細書の全体を通じて使用され
る“圧接”という用語は、接合しようとする面を清浄に
して高圧で両者を接触させて面で拡散を生じさせて接合
させることを意味する。
The term "pressure welding" used throughout this specification means that the surfaces to be joined are cleaned and brought into contact with each other at a high pressure to cause diffusion on the surfaces to join them. .

【0009】[0009]

【実施例】以下、図面を参照しながら本発明を更に詳細
に説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described in more detail below with reference to the drawings.

【0010】図1は本発明による超音波探触子の構造を
示す模式的断面図である。圧電素子からなる超音波発振
子1に接合する音響レンズ5の接合面には予めAu/C
r蒸着膜4が設けられている。その他の金属蒸着膜も使
用できる。Au/Cr膜は表面にAuが露出しているた
め、化学的に安定している。このAu/Cr膜はスパッ
タリングあるいは真空蒸着などのベーパデポジション法
により成膜することができる。このような成膜方法は当
業者に公知である。先ず、Cr膜を成膜し、その上にA
u膜を成膜する。Cr膜はレンズと金属の結合を助長す
る。Au/Cr蒸着膜4の膜厚は蒸着面の粗さなどによ
り特に限定されないが、一般的に、3μm以上であるこ
とが好ましい。3μm未満では十分な接合効果が得られ
ない恐れがある。一方、Au/Cr膜の膜厚の上限値は
使用する超音波発振子の厚みによるが、超音波発振子の
厚みの1/10程度であることが好ましい。例えば、2
5MHzであれば、上限値は8μm程度となる。これよ
りも厚いAu/Cr蒸着膜4を使用すると界面反射波な
どの不都合が生じるので好ましくない。
FIG. 1 is a schematic sectional view showing the structure of an ultrasonic probe according to the present invention. The bonding surface of the acoustic lens 5 to be bonded to the ultrasonic oscillator 1 made of a piezoelectric element is previously Au / C.
An r vapor deposition film 4 is provided. Other metal vapor deposition films can also be used. Since Au is exposed on the surface of the Au / Cr film, it is chemically stable. This Au / Cr film can be formed by a vapor deposition method such as sputtering or vacuum evaporation. Such film forming methods are known to those skilled in the art. First, a Cr film is formed and A is formed on it.
A u film is formed. The Cr film promotes the bonding between the lens and the metal. The film thickness of the Au / Cr vapor deposition film 4 is not particularly limited depending on the roughness of the vapor deposition surface and the like, but in general, it is preferably 3 μm or more. If it is less than 3 μm, a sufficient bonding effect may not be obtained. On the other hand, the upper limit of the film thickness of the Au / Cr film depends on the thickness of the ultrasonic oscillator used, but is preferably about 1/10 of the thickness of the ultrasonic oscillator. For example, 2
If it is 5 MHz, the upper limit is about 8 μm. If the Au / Cr vapor deposition film 4 thicker than this is used, inconveniences such as interface reflection waves may occur, which is not preferable.

【0011】超音波発振子1の一方の面には上部電極2
が設けられ、他方の面には下部電極3が設けられてい
る。上部電極2は例えばAu/Cr膜から形成すること
ができる。その他の金属も当然使用できる。上部電極の
形成方法は特に限定されないが、例えば、スパッタリン
グ又は真空蒸着などのベーパデポジションなどの方法に
より形成することができる。上部電極2の厚さは特に限
定されないが、一般的に、3000Å〜5000Åの範
囲内であることが好ましい。3000Å未満では超音波
発振子1の表面の粗さのために、上部電極2の存在する
箇所が無いなどの不都合が生じ、また、5000Å超で
は特に問題はないが、不経済なだけである。また、下部
電極3は上部電極2と同様に、Au/Cr膜から形成す
ることができる。その他の金属も当然使用できる。下部
電極3の形成方法は特に限定されないが、例えば、スパ
ッタリング又は真空蒸着などのベーパデポジションなど
の方法により形成することができる。下部電極3の厚さ
は特に限定されないが、一般的に、3000Å〜500
0Åの範囲内であることが好ましい。3000Å未満で
は超音波発振子1の表面の粗さのために、上部電極3の
存在する箇所が無いなどの不都合が生じ、また、500
0Å超では特に問題はないが、不経済なだけである。下
部電極3の形成材料としてAu/Cr蒸着膜を使用して
いるので、音響レンズ5のAu/Cr蒸着膜4と、接合
時にAu−Au接合となるため化学的にも安定となるの
で好ましい。
The upper electrode 2 is provided on one surface of the ultrasonic oscillator 1.
And the lower electrode 3 is provided on the other surface. The upper electrode 2 can be formed of, for example, an Au / Cr film. Other metals can of course be used. The method of forming the upper electrode is not particularly limited, but the upper electrode can be formed by a method such as vapor deposition such as sputtering or vacuum deposition. The thickness of the upper electrode 2 is not particularly limited, but in general, it is preferably within the range of 3000 Å to 5000 Å. If it is less than 3000 Å, the surface roughness of the ultrasonic oscillator 1 causes a disadvantage such as the absence of the upper electrode 2, and if it exceeds 5000 Å, there is no particular problem, but it is uneconomical. Further, the lower electrode 3 can be formed of an Au / Cr film, like the upper electrode 2. Other metals can of course be used. The method of forming the lower electrode 3 is not particularly limited, but the lower electrode 3 can be formed by a method such as vapor deposition such as sputtering or vacuum deposition. The thickness of the lower electrode 3 is not particularly limited, but is generally 3000 Å to 500
It is preferably in the range of 0Å. If it is less than 3000 Å, the surface roughness of the ultrasonic oscillator 1 causes a disadvantage such as the absence of the upper electrode 3, and 500
Above 0Å there is no particular problem, but it is only uneconomical. Since the Au / Cr vapor deposition film is used as the material for forming the lower electrode 3, the Au / Cr vapor deposition film 4 of the acoustic lens 5 and the Au-Au junction at the time of joining are chemically stable, which is preferable.

【0012】音響レンズ5は石英から形成されている。
石英は化学的に非常に安定であり、耐食性にも優れてい
る。従って、金属製音響レンズの場合に発生する腐食の
問題は全く起こらない。また、音響レンズ5と超音波発
振子1との間にはAu/Cr膜しか存在しないので、発
振時にこの膜に起因する反射波の発生は殆ど無く、良好
な音響特性が得られる。
The acoustic lens 5 is made of quartz.
Quartz is chemically very stable and has excellent corrosion resistance. Therefore, the problem of corrosion that occurs in the case of a metallic acoustic lens does not occur at all. Further, since only the Au / Cr film exists between the acoustic lens 5 and the ultrasonic oscillator 1, there is almost no generation of reflected waves due to this film during oscillation, and good acoustic characteristics can be obtained.

【0013】超音波発振子1を構成する圧電素子はPZ
T(Pb(Zr,Ti)03系セラミックス)又はPb
TiO3(チタン酸鉛)などを使用できる。このような
素材は当業者に周知である。
The piezoelectric element forming the ultrasonic oscillator 1 is PZ.
T (Pb (Zr, Ti) 0 3 based ceramic) or Pb
TiO 3 (lead titanate) or the like can be used. Such materials are well known to those of ordinary skill in the art.

【0014】音響レンズ5のAu/Cr蒸着膜4の一端
に電極接続用リード線6を接続させる。この接続は例え
ば、銀ペースト又は常温硬化性導電性樹脂などを用いる
ことにより行うことができる。
An electrode connecting lead wire 6 is connected to one end of the Au / Cr vapor deposition film 4 of the acoustic lens 5. This connection can be made by using, for example, a silver paste or a room temperature curable conductive resin.

【0015】図2は本発明の超音波探触子の製造方法の
一工程を例証する模式図である。図2において、符号1
は圧電素子を材料とする超音波発振子、5は石英を材料
とする音響レンズ、13a及び13bはアトムビームを
発生するビーム源、14a及び14bは加圧治具であ
り、これらは真空処理室20内に配置されている。真空
処理室20の適当な箇所には、真空排気手段(図示され
ていない)に接続されるダクト22が設けられている。
FIG. 2 is a schematic view illustrating one step of the method for manufacturing an ultrasonic probe of the present invention. In FIG. 2, reference numeral 1
Is an ultrasonic oscillator made of a piezoelectric element, 5 is an acoustic lens made of quartz, 13a and 13b are beam sources that generate atom beams, 14a and 14b are pressure jigs, and these are vacuum processing chambers. It is located within 20. A duct 22 connected to an evacuation means (not shown) is provided at an appropriate position in the vacuum processing chamber 20.

【0016】まず、超音波発振子1及び音響レンズ5を
それぞれ加圧治具14a及び14bに装着して真空処理
室20内の雰囲気をダクト22から真空排気する。次に
ビーム源13a及び13bからアルゴンのアトムビーム
を発生させ、同ビームをそれぞれ超音波発振子1及び音
響レンズ5の接合面に照射して、これら接合面に存在す
る汚染層(例えば、自然酸化物又は物理吸着水など)を
除去する。この操作により接合面は清浄かつ活性な面と
なるので、加圧治具14a及び14bを用いて両部材の
接合面を密着させ、所定時間加圧し続けることにより、
両部材の接合面で拡散が起こり、超音波発振子1と音響
レンズ2とを圧接接合させることができる。加圧治具は
各部材間の圧接接合を行うためのものであり、油圧シリ
ンダなどにより構成できる。
First, the ultrasonic oscillator 1 and the acoustic lens 5 are mounted on the pressing jigs 14a and 14b, respectively, and the atmosphere in the vacuum processing chamber 20 is evacuated from the duct 22. Next, an atom beam of argon is generated from the beam sources 13a and 13b, and the beams are irradiated to the joint surfaces of the ultrasonic oscillator 1 and the acoustic lens 5, respectively, and a contamination layer (for example, natural oxidation) existing on these joint surfaces is irradiated. Substance or physically adsorbed water). Since the joint surface becomes a clean and active surface by this operation, the joint surfaces of both members are brought into close contact with each other by using the pressure jigs 14a and 14b, and the pressure is continuously applied for a predetermined time.
Diffusion occurs at the joint surfaces of both members, and the ultrasonic oscillator 1 and the acoustic lens 2 can be pressure-bonded to each other. The pressure jig is for performing pressure contact bonding between the respective members, and can be configured by a hydraulic cylinder or the like.

【0017】超音波発振子1と音響レンズ5の圧接接合
が完了したら、超音波発振子1と加圧治具14aを分離
する。そして、図3に示されるように、加圧治具14a
に超音波吸収材7を装着する。超音波発振子1の圧接の
際の真空圧を維持しながら、音響レンズ5と接合されて
いない超音波発振子1の他方の接合面と超音波吸収材7
の接合面に、ビーム源13a及び13bから発生された
アルゴンのアトムビームを照射し、これら接合面に存在
する汚染層(例えば、自然酸化物又は物理吸着水など)
を除去する。この操作により接合面は清浄かつ活性な面
となるので、加圧治具14a及び14bを用いて両部材
の接合面を密着させ、所定時間加圧し続けることによ
り、両部材の接合面で拡散が起こり、超音波発振子1と
超音波吸収材7とを圧接接合させることができる。斯く
して、従来のようなエポキシ樹脂系有機接着剤を使用す
ることなく、超音波発振子1を間に挟んで、音響レンズ
5及び超音波吸収材7をそれぞれ一体的に圧接接合させ
ることができる。
When the pressure welding of the ultrasonic oscillator 1 and the acoustic lens 5 is completed, the ultrasonic oscillator 1 and the pressing jig 14a are separated. Then, as shown in FIG. 3, the pressing jig 14a
The ultrasonic absorber 7 is attached to. While maintaining the vacuum pressure during the pressure contact of the ultrasonic oscillator 1, the other bonding surface of the ultrasonic oscillator 1 not bonded to the acoustic lens 5 and the ultrasonic absorber 7
The bonding surface of the is irradiated with the atom beam of argon generated from the beam sources 13a and 13b, and the contamination layer (for example, natural oxide or physically adsorbed water) existing on these bonding surfaces.
Is removed. Since the joint surface becomes a clean and active surface by this operation, the joint surfaces of both members are brought into close contact with each other by using the pressure jigs 14a and 14b, and pressure is continued for a predetermined time, so that the joint surfaces of both members are diffused. Then, the ultrasonic oscillator 1 and the ultrasonic absorber 7 can be pressure-bonded to each other. Thus, the acoustic lens 5 and the ultrasonic absorbing material 7 can be integrally pressure-bonded to each other with the ultrasonic oscillator 1 interposed therebetween without using a conventional epoxy resin-based organic adhesive. it can.

【0018】本発明では、超音波発振子1,音響レンズ
5及び超音波吸収材7の各接合面を清浄化する手段とし
てイオンビーム又はアトムビームを使用するが、その理
由は、真空の状態で活性な面をつくり、かつその状態を
保持しながら同一チャンバ内で接合するためである。表
面清浄化手段としてはプラズマ、有機溶剤又は超純水等
があるが、表面活性化と接合を同一チャンバ内で実施す
るにはイオンビーム又はアトムビームを使用するのが最
も好ましい。イオンビーム又はアトムビームとしては、
例えば、アルゴンなどのビームが好適に使用できる。
In the present invention, an ion beam or an atom beam is used as a means for cleaning the bonding surfaces of the ultrasonic oscillator 1, the acoustic lens 5 and the ultrasonic absorbing material 7, because the vacuum state is used. This is for forming an active surface and for bonding in the same chamber while maintaining the state. Plasma, an organic solvent, ultrapure water, or the like is used as the surface cleaning means, but it is most preferable to use an ion beam or an atom beam in order to perform surface activation and bonding in the same chamber. As an ion beam or atom beam,
For example, a beam of argon or the like can be preferably used.

【0019】真空処理室20を使用するのは、イオンビ
ーム又はアトムビームによる清浄化処理を効率的に行う
ためである。この目的のために好適な真空圧は特に限定
されないが、一般的に、10-6Torr程度であることが好
ましい。真空処理室20内の真空圧がこれよりも低真空
の場合には接合面の再汚染防止にならないし、またこれ
よりも高真空の場合には、清浄化処理自体の効果を更に
高めることにはならないので不経済なだけである。
The vacuum processing chamber 20 is used in order to efficiently perform the cleaning process by the ion beam or atom beam. The vacuum pressure suitable for this purpose is not particularly limited, but is generally preferably about 10 -6 Torr. When the vacuum pressure in the vacuum processing chamber 20 is lower than this, recontamination of the joint surface cannot be prevented, and when the vacuum pressure is higher than this, the effect of the cleaning process itself is further enhanced. It is uneconomical because it cannot happen.

【0020】ビーム源13a及び13bとしては、例え
ば、アトムテックなどから市販されているビームガンな
どの当業者に公知の装置を使用できる。接合面の清浄化
処理に必要なイオンビーム又はアトムビームの出力は特
に限定されない。部材間の圧接接合を確立するのに必要
充分な清浄化度が得られる出力であればよい。一般的な
指標として、イオンビーム又はアトムビームの出力は1
keV,25mA程度であることが好ましい。出力が1
keV,25mA未満の場合には接合面の清浄化が不十
分になる可能性がある。一方、出力が1keV,25m
Aを大きく超えた場合には、接合面に大きな空孔等を形
成するなどの不都合が生じるので好ましくない。また、
ビーム照射時間は接合面の清浄化に必要充分な長さであ
ればよく、特に限定されない。所望の接合面清浄化度を
得るために、ビーム出力とビーム照射時間とは反比例の
関係を有する。例えば、高出力のビームを使用すれば、
照射時間は短時間となり、一方、低出力のビームを使用
すれば照射時間は長くなる。単なる一般的な指標とし
て、1keV,25mA程度の出力のビームを使用する
場合、照射時間は600秒間程度である。
As the beam sources 13a and 13b, for example, a device known to those skilled in the art, such as a beam gun commercially available from Atomtech, can be used. The output of the ion beam or atom beam required for the cleaning treatment of the bonding surface is not particularly limited. Any output may be used as long as the degree of cleanliness necessary and sufficient to establish the pressure welding between the members is obtained. As a general index, the output of ion beam or atom beam is 1
It is preferably about keV, 25 mA. Output is 1
If the keV is less than 25 mA, the cleaning of the joint surface may be insufficient. On the other hand, the output is 1 keV, 25 m
If it exceeds A, it is not preferable because it causes inconvenience such as formation of large holes in the joint surface. Also,
The beam irradiation time is not particularly limited as long as it is long enough for cleaning the bonding surface. In order to obtain the desired degree of cleanliness of the joint surface, the beam output and the beam irradiation time have an inverse relationship. For example, if you use a high power beam,
The irradiation time is short, while the irradiation time is longer if a low power beam is used. As a general index, when using a beam having an output of about 1 keV and 25 mA, the irradiation time is about 600 seconds.

【0021】加圧治具14a及び14bによる各部材の
加圧圧力及び加圧時間は各部材間で圧接接合を形成させ
るのに必要充分な大きさ及び長さであればよく、特に限
定されない。一般的に、12.5MPa以上の加圧圧力
を使用する場合、加圧時間は30秒間程度である。加圧
圧力が高すぎると石英製音響レンズ5が破損する恐れが
ある。一般的に、加圧圧力の上限は被接合物によって決
定される。
The pressurizing pressure and the pressurizing time of each member by the pressing jigs 14a and 14b are not particularly limited as long as they are the size and length necessary and sufficient for forming the pressure welding between the members. Generally, when using a pressurizing pressure of 12.5 MPa or more, the pressurizing time is about 30 seconds. If the pressure applied is too high, the quartz acoustic lens 5 may be damaged. Generally, the upper limit of the pressurizing pressure is determined by the objects to be joined.

【0022】本実施例では、被接合材即ち圧電素子1、
音響レンズ5及び超音波吸収材7は何れも室温で接合し
たが、ヒータ等を用いて被接合材の加熱を行い、接合面
の温度をある範囲まで上昇させてから接合すると、接合
強度はさらに上昇する。
In this embodiment, the material to be joined, that is, the piezoelectric element 1,
Although both the acoustic lens 5 and the ultrasonic absorber 7 are bonded at room temperature, if the materials to be bonded are heated using a heater or the like to raise the temperature of the bonding surface to a certain range and then bond, the bonding strength is further improved. To rise.

【0023】また、本実施例では真空中で接合を行った
が、アトムビームの照射後、アルゴンや窒素などの不活
性なガスで雰囲気を満たした後接合してもよい。不活性
ガス雰囲気を形成すると、部材の再酸化及び再汚染を防
止することができる。
Although the bonding is performed in a vacuum in this embodiment, the bonding may be performed after the irradiation of the atom beam and the atmosphere is filled with an inert gas such as argon or nitrogen. The formation of the inert gas atmosphere can prevent reoxidation and recontamination of the member.

【0024】次に本発明を用いて製作された超音波探触
子の組立構造を図4により説明する。図4において、符
号1は超音波発振子、5は音響レンズ、6は下部電極接
続用リード線、7は超音波吸収材、8は上部電極接続用
リード線、9は充填材、10は保護ケース、11は端子
をそれぞれ示す。基本的な構成部品自体は従来のエポキ
シ樹脂系接着剤を使用する超音波探触子と大体同じであ
る。例えば、前記のように超音波発振子1は当業者に周
知の圧電素子及びPT(チタン酸鉛)などを使用でき
る。音響レンズ5としては石英を使用する。超音波吸収
材7としては鉛,錫などを使用できる。超音波吸収材は
超音波振動を抑制する機能を果たす。下部電極用リード
線6は保護ケース10の内壁面に接続されている。上部
電極接続用リード線8は超音波吸収材7の上面に接続さ
れている。超音波吸収材の下面に接続してもよい。リー
ド線8は絶縁材12で絶縁され、保護ケース10の外部
に取り出される。充填材9は例えば、エポキシ系の樹脂
などを使用できる。保護ケース10は金属製であり、音
響レンズ側電極の導体を兼ねる。
Next, the assembly structure of the ultrasonic probe manufactured by using the present invention will be described with reference to FIG. In FIG. 4, reference numeral 1 is an ultrasonic oscillator, 5 is an acoustic lens, 6 is a lower electrode connecting lead wire, 7 is an ultrasonic absorbing material, 8 is an upper electrode connecting lead wire, 9 is a filling material, and 10 is a protective material. A case and 11 are terminals, respectively. The basic components themselves are almost the same as the ultrasonic probe using the conventional epoxy resin adhesive. For example, as described above, the ultrasonic oscillator 1 can use a piezoelectric element and PT (lead titanate) that are well known to those skilled in the art. Quartz is used as the acoustic lens 5. Lead, tin, or the like can be used as the ultrasonic absorber 7. The ultrasonic absorber has a function of suppressing ultrasonic vibration. The lower electrode lead wire 6 is connected to the inner wall surface of the protective case 10. The upper electrode connecting lead wire 8 is connected to the upper surface of the ultrasonic absorber 7. It may be connected to the lower surface of the ultrasonic absorber. The lead wire 8 is insulated by the insulating material 12 and taken out of the protective case 10. As the filler 9, for example, an epoxy resin or the like can be used. The protective case 10 is made of metal and also serves as a conductor of the acoustic lens side electrode.

【0025】次に本発明の超音波探触子の動作について
説明する。超音波発振子1に端子11を介して図示しな
いパルス電圧発生器によってパルス電圧を印加すると、
超音波パルスが発生する。発生した超音波は音響レンズ
5を介して図示しない被検体に入射して超音波探傷を行
う。
Next, the operation of the ultrasonic probe of the present invention will be described. When a pulse voltage is applied to the ultrasonic oscillator 1 via the terminal 11 by a pulse voltage generator (not shown),
Ultrasonic pulse is generated. The generated ultrasonic waves are incident on a subject (not shown) via the acoustic lens 5 to perform ultrasonic flaw detection.

【0026】下記の表1に超音波発振子の材料として代
表的な圧電素子(PbTiO3系セラミックス)、音響
レンズの材料として使用される石英、及び有機接着剤の
材料として代表的なエポキシ樹脂の音響インピーダンス
を示す。
Table 1 below shows a typical piezoelectric element (PbTiO 3 -based ceramics) as a material of an ultrasonic oscillator, quartz used as a material of an acoustic lens, and an epoxy resin typical as a material of an organic adhesive. Indicates acoustic impedance.

【0027】[0027]

【表1】 [Table 1]

【0028】前記の表1より、エポキシ樹脂の音響イン
ピーダンスは圧電素子及び石英のそれよりも小さいこと
がわかる。
From Table 1 above, it can be seen that the acoustic impedance of the epoxy resin is smaller than that of the piezoelectric element and quartz.

【0029】ところで、平面で接合された2つの物質の
音響インピーダンスをそれぞれZ1及びZ2とすると、こ
れらの接合界面での音圧反射率rは次式で表される。 r=(Z2−Z1)/(Z2+Z1) … (1)
By the way, assuming that the acoustic impedances of two substances bonded on a plane are Z 1 and Z 2 , respectively, the sound pressure reflectance r at the bonding interface between them is expressed by the following equation. r = (Z 2 -Z 1) / (Z 2 + Z 1) ... (1)

【0030】例えば圧電素子とエポキシ樹脂を接合した
場合には、前記(1)式に表1の音響インピーダンスの
数値を代入してr=−0.81(ここで、−(マイナ
ス)は位相の反転を意味する)の結果を得る。即ち、圧
電素子で発生した超音波の81%が接合界面で反射して
しまうため、超音波が効率よく音響レンズに伝播しない
ことがわかる。
For example, when a piezoelectric element and an epoxy resin are bonded, substituting the numerical value of the acoustic impedance in Table 1 into the equation (1), r = -0.81 (where-(minus) is the phase Which means inversion). That is, it is understood that 81% of the ultrasonic waves generated by the piezoelectric element are reflected at the bonding interface, so that the ultrasonic waves do not propagate efficiently to the acoustic lens.

【0031】これに対し、圧電素子と石英を直接圧接接
合した場合には、前記(1)式よりr=−0.44とな
り、接合界面における超音波の反射が少なくなるため、
圧電素子で発生した超音波を効率よく音響レンズに伝播
することができる。
On the other hand, when the piezoelectric element and quartz are directly pressure-bonded to each other, r = -0.44 is obtained from the above equation (1), and the reflection of ultrasonic waves at the bonding interface is reduced.
Ultrasonic waves generated by the piezoelectric element can be efficiently propagated to the acoustic lens.

【0032】石英製音響レンズにAu/Crを蒸着する
ことにより、吸音剤であるPbを安定的にムラ無く接合
することができるため、ダンピングを効かせることがで
きる。パルス波を送信した時の受信波数は2〜3波長程
度の短いものが得られる。しかし、接合手段としてエポ
キシ樹脂などの有機接着剤を用いた場合、接合面にムラ
ができる可能性がある。また、厚みもAu/Cr蒸着膜
程度にすることは困難となる。その結果、波数は4〜7
波長程度と長いものとなる。
By vapor-depositing Au / Cr on the quartz acoustic lens, the sound absorbing agent Pb can be bonded stably and evenly, so that damping can be made effective. When the pulse wave is transmitted, the number of received waves is as short as a few wavelengths. However, when an organic adhesive such as an epoxy resin is used as the joining means, the joining surface may be uneven. In addition, it is difficult to set the thickness to about Au / Cr vapor deposition film. As a result, the wave number is 4-7
It will be as long as the wavelength.

【0033】[0033]

【発明の効果】本発明の圧接接合法による超音波探触子
は、超音波発振子と音響レンズとの間に接着剤などの音
響境界層を有さないので、良好な音響特性を示す。ま
た、本発明によれば、接合時に経時変化の恐れがある有
機接着剤を使用せずに強固な圧接接合を行うことが可能
であるので、性能が長期間変化しない超音波探触子を提
供することができる。
The ultrasonic probe by the pressure welding method of the present invention does not have an acoustic boundary layer such as an adhesive between the ultrasonic oscillator and the acoustic lens, and therefore exhibits good acoustic characteristics. Further, according to the present invention, since it is possible to perform strong pressure welding without using an organic adhesive that may change with time during joining, an ultrasonic probe whose performance does not change for a long time is provided. can do.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の超音波探触子の一例の模式的断面図で
ある。
FIG. 1 is a schematic sectional view of an example of an ultrasonic probe of the present invention.

【図2】本発明の超音波探触子の製造方法の一工程を例
証する模式図である。
FIG. 2 is a schematic view illustrating one step of the method for manufacturing an ultrasonic probe of the present invention.

【図3】本発明の超音波探触子の製造方法の別の工程を
例証する模式図である。
FIG. 3 is a schematic view illustrating another step of the method for manufacturing an ultrasonic probe of the present invention.

【図4】本発明の超音波探触子の組立構造の一例の模式
的断面図である。
FIG. 4 is a schematic cross-sectional view of an example of the assembly structure of the ultrasonic probe of the present invention.

【符号の説明】[Explanation of symbols]

1 超音波発振子 2 上部電極 3 下部電極 4 Au/Cr蒸着膜 5 音響レンズ 6 下部電極接続用リード線 7 超音波吸収材 8 上部電極接続用リード線 9 充填材 10 保護ケース 13a,13b ビーム源 14a,14b 加圧治具 20 真空処理室 22 排気ダクト 1 Ultrasonic Oscillator 2 Upper Electrode 3 Lower Electrode 4 Au / Cr Evaporated Film 5 Acoustic Lens 6 Lower Electrode Connecting Lead Wire 7 Ultrasonic Absorber 8 Upper Electrode Connecting Lead Wire 9 Filling Material 10 Protective Case 13a, 13b Beam Source 14a, 14b Pressure jig 20 Vacuum processing chamber 22 Exhaust duct

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 超音波発振子を間に挟んで、超音波吸収
材と、両面に電極形成用金属膜を有する超音波発振子と
音響レンズとを相互に圧接接合させたことからなること
を特徴とする超音波探触子。
1. An ultrasonic absorber, an ultrasonic absorber having an electrode-forming metal film on both sides, and an acoustic lens are pressure-bonded to each other with an ultrasonic oscillator interposed therebetween. A characteristic ultrasonic probe.
【請求項2】 音響レンズは石英からなり、前記音響レ
ンズの超音波発振子との接合面にAu/Cr蒸着膜が設
けられている請求項1の超音波探触子。
2. The ultrasonic probe according to claim 1, wherein the acoustic lens is made of quartz, and an Au / Cr vapor deposition film is provided on a bonding surface of the acoustic lens with the ultrasonic oscillator.
【請求項3】 電極形成用金属膜はAu/Cr膜であ
り、超音波吸収材は鉛又は錫からなる請求項1の超音波
探触子。
3. The ultrasonic probe according to claim 1, wherein the electrode forming metal film is an Au / Cr film, and the ultrasonic absorbing material is lead or tin.
【請求項4】 超音波発振子の音響レンズとの接合面,
前記音響レンズの前記超音波発振子との接合面,前記超
音波発振子の超音波吸収材との接合面,および前記超音
波吸収材の前記超音波発振子との接合面に真空中でイオ
ンビームあるいはアトムビームを照射した後に前記超音
波吸収材,前記超音波発振子,及び前記音響レンズを加
圧しながら密着させることにより、超音波発振子を間に
挟んで、超音波吸収材と、超音波発振子と音響レンズと
を相互に圧接接合させることを特徴とする超音波探触子
の製造方法。
4. A joint surface between an ultrasonic oscillator and an acoustic lens,
Ions in vacuum on the joint surface of the acoustic lens with the ultrasonic oscillator, the joint surface of the ultrasonic oscillator with the ultrasonic absorber, and the joint surface of the ultrasonic absorber with the ultrasonic oscillator. Beam or atom beam is applied, and the ultrasonic absorber, the ultrasonic oscillator, and the acoustic lens are brought into close contact with each other while being pressed, and the ultrasonic oscillator is sandwiched between the ultrasonic absorber and the ultrasonic absorber. A method for manufacturing an ultrasonic probe, characterized in that a sound wave oscillator and an acoustic lens are pressure-bonded to each other.
【請求項5】 音響レンズは石英からなり、前記音響レ
ンズの超音波発振子との接合面にAu/Cr蒸着膜が設
けられており、前記超音波発振子はその両面に電極形成
用金属膜を有し、超音波吸収材は鉛又は錫からなる請求
項4の方法。
5. The acoustic lens is made of quartz, and an Au / Cr vapor deposition film is provided on a bonding surface of the acoustic lens with the ultrasonic oscillator, and the ultrasonic oscillator has metal films for electrode formation on both surfaces thereof. The method of claim 4, wherein the ultrasonic absorber comprises lead or tin.
【請求項6】 超音波吸収材と超音波発振子と音響レン
ズとの圧接接合において、前記超音波発振子と前記音響
レンズとを圧接接合させた後に、前記超音波発振子と前
記超音波吸収材とを圧接接合させる請求項4の方法。
6. In the pressure welding of the ultrasonic absorber, the ultrasonic oscillator and the acoustic lens, the ultrasonic oscillator and the ultrasonic absorber are pressed after the ultrasonic oscillator and the acoustic lens are pressure welded to each other. The method according to claim 4, wherein the material is pressure-welded.
JP04615495A 1995-02-10 1995-02-10 Ultrasonic probe and manufacturing method thereof Expired - Lifetime JP3337179B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP04615495A JP3337179B2 (en) 1995-02-10 1995-02-10 Ultrasonic probe and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP04615495A JP3337179B2 (en) 1995-02-10 1995-02-10 Ultrasonic probe and manufacturing method thereof

Publications (2)

Publication Number Publication Date
JPH08223695A true JPH08223695A (en) 1996-08-30
JP3337179B2 JP3337179B2 (en) 2002-10-21

Family

ID=12739079

Family Applications (1)

Application Number Title Priority Date Filing Date
JP04615495A Expired - Lifetime JP3337179B2 (en) 1995-02-10 1995-02-10 Ultrasonic probe and manufacturing method thereof

Country Status (1)

Country Link
JP (1) JP3337179B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001244548A (en) * 2000-03-01 2001-09-07 Hamamatsu Photonics Kk Semiconductor laser device
WO2003092321A1 (en) * 2002-04-25 2003-11-06 Postech Foundation Sound focus speaker of gas-filled sound lens attachment type

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001244548A (en) * 2000-03-01 2001-09-07 Hamamatsu Photonics Kk Semiconductor laser device
WO2003092321A1 (en) * 2002-04-25 2003-11-06 Postech Foundation Sound focus speaker of gas-filled sound lens attachment type
US7204342B2 (en) 2002-04-25 2007-04-17 Postech Foundation Sound focus speaker of gas-filled sound lens attachment type

Also Published As

Publication number Publication date
JP3337179B2 (en) 2002-10-21

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