JPS59141060A - Ultrasonic probe - Google Patents

Ultrasonic probe

Info

Publication number
JPS59141060A
JPS59141060A JP1439283A JP1439283A JPS59141060A JP S59141060 A JPS59141060 A JP S59141060A JP 1439283 A JP1439283 A JP 1439283A JP 1439283 A JP1439283 A JP 1439283A JP S59141060 A JPS59141060 A JP S59141060A
Authority
JP
Japan
Prior art keywords
holder
piezoelectric element
electrode
metal film
ultrasonic probe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1439283A
Other languages
Japanese (ja)
Inventor
Atsuo Iida
安津夫 飯田
Nobushiro Shimura
孚城 志村
Nobuyoshi Takagi
高城 信義
Yoshio Koshikawa
越川 誉生
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP1439283A priority Critical patent/JPS59141060A/en
Publication of JPS59141060A publication Critical patent/JPS59141060A/en
Pending legal-status Critical Current

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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N29/00Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
    • G01N29/22Details, e.g. general constructional or apparatus details
    • G01N29/24Probes

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
  • Ultra Sonic Daignosis Equipment (AREA)

Abstract

PURPOSE:To attain to improve the beam emitting shape and conversion efficiency of a probe, by performing the leading-out of the emitting side electrode of a piezoelectric element by a thin metal film formed by plating or vapor deposition. CONSTITUTION:Electrodes 41, 42 comprising gold or silver are formed on the entire front and back surfaces of a piezoelectric element 1 by baking or plating but the inner diameter of a holder 3 is set to a size larger than the diameter of the piezoelectric element 1 and a packing material 2 is interposed between both of them. The lower end surface of the holder 3 and the electrode 41 are set on the same surface and the end surface of the packing material 2 is also set on the same surface between both of them. In the next step, a thin metal film 7 with a thickness of several mum or less is formed on the front side of these surfaces while the adjustment of the thickness and conductivity is performed by a plating method. In this case, the holder 3 is made conductive to connect between the electrode 41 and a lead wire 51 by the path of electrode 41-metal film 7-holder 3-lead wire 51.

Description

【発明の詳細な説明】 発明の技術分野 本発明は、探傷、超音波診断等に用いられる超音波探触
子に関する。
DETAILED DESCRIPTION OF THE INVENTION Technical Field of the Invention The present invention relates to an ultrasonic probe used for flaw detection, ultrasonic diagnosis, and the like.

従来技術と問題点 従来の超音波探触子には、第1図に示すようにPZT等
の圧電素子1の両面に銀焼き付は等で円形電極41.4
2を形成し、放射側の電極41はその一部を裏面に折り
曲げて折返し電極としたものがある。これは電極41へ
のリード線51の接続を容易にするためであるが、この
ために背面電極42の一部が切欠されこの切欠部には電
界が加わらないので全体が一様に駆動されず、ビーム形
状、効率等が劣化する欠点がある。この影響は特に圧電
素子1の直径が10鰭以下などの小径になると顕著にな
る。即ち第1図(blに示す電極41の折返し部はリー
ド線51の取付けのためにある程度以上の大きさが必要
であり、圧電素子径が小になると非駆動部が相対的に増
大するからである。同図において、2は圧電素子1の後
方に生じる超音波を吸収するバンキング材、3は円筒状
のホルダ、52は電極42のリード線である。図示しな
いがホルダ3は上端が閉じて短円筒体状をなし、手操作
診断用の場合は該短円筒状体が把持部を有する短棒状ケ
ースの先端部に埋め込まれ、機械走査型の場合はたとえ
ば回転円筒体の周面に120°間隔で3個等の態様で埋
め込まれて使用される。
Prior Art and Problems In a conventional ultrasonic probe, as shown in Fig. 1, a piezoelectric element 1 made of PZT or the like has a circular electrode 41.4 with silver baked on both sides.
2, and a part of the radiation side electrode 41 is bent to the back surface to form a folded electrode. This is to facilitate the connection of the lead wire 51 to the electrode 41, but for this purpose, a part of the back electrode 42 is cut out, and no electric field is applied to this cutout, so the whole is not driven uniformly. However, there are drawbacks such as deterioration of beam shape, efficiency, etc. This effect becomes particularly noticeable when the diameter of the piezoelectric element 1 becomes small, such as 10 fins or less. That is, the folded part of the electrode 41 shown in FIG. In the figure, 2 is a banking material that absorbs ultrasonic waves generated behind the piezoelectric element 1, 3 is a cylindrical holder, and 52 is a lead wire of the electrode 42. Although not shown, the holder 3 has a closed upper end. It has a short cylindrical body shape, and in the case of manual diagnosis, the short cylindrical body is embedded in the tip of a short bar-shaped case having a gripping part, and in the case of mechanical scanning type, it is embedded in the circumferential surface of the rotating cylinder at 120 degrees. It is used by being embedded in three pieces at intervals.

第2図は上述の非駆動部が生じるという欠点を除去する
ために、圧電素子1の放射側、裏側各全面に電極41.
42を設け、放射側電極41の電極引出しは別途に引出
し用の金属箔6を電極41の表面からホルダ3の側面に
かけて取付けてそのホルダ側面部で行なうようにした従
来例である。
In FIG. 2, electrodes 41.
This is a conventional example in which a metal foil 6 for drawing out the radiation side electrode 41 is separately attached from the surface of the electrode 41 to the side surface of the holder 3, and the electrode drawing of the radiation side electrode 41 is carried out on the side surface of the holder 3.

このようにすれば電極41.42は共に同径の円板とし
て平行平面内で対向することができるので圧電素子全体
に電界が加わり、ビーム形状、効率等に問題は生じない
。ところが、この金属箔6は金、銅、アルミニウム等の
素材を5〜20μm程度の厚みに薄く引き延ばしたもの
であり、金属箔6を電極41に接着剤で均一に固着する
ことがむづかしく、量産性に乏しい。従って金属箔6は
同図(b)に示すように従来直径方向に延びる帯状にし
ているが金属箔6を帯状にすると電極41との間に段差
が生じるので、電極41の表面側に薄いガラス板等の音
響整合層(図示せず)をエポキシなどの接着剤で貼付け
ようとすると、接着層が該段差を吸収するように厚くな
る必要があり、このために音響の整合が劣化する欠点を
有する。
In this way, the electrodes 41 and 42 can be arranged as disks of the same diameter and face each other in parallel planes, so that an electric field is applied to the entire piezoelectric element, and there are no problems with the beam shape, efficiency, etc. However, this metal foil 6 is made by thinly stretching a material such as gold, copper, or aluminum to a thickness of about 5 to 20 μm, and it is difficult to uniformly fix the metal foil 6 to the electrode 41 with an adhesive. Poor mass production. Therefore, the metal foil 6 is conventionally formed into a band shape extending in the diametrical direction as shown in FIG. When trying to attach an acoustic matching layer (not shown) on a board or the like using an adhesive such as epoxy, the adhesive layer needs to be thick enough to absorb the level difference, which has the disadvantage of degrading the acoustic matching. have

発明の目的 本発明は、電極の引き出し方法を改良して圧電素子の特
性を劣化させずそして製作も容易であるようにしようと
するものである。
OBJECTS OF THE INVENTION The present invention aims to improve the method of drawing out electrodes so that the characteristics of the piezoelectric element are not deteriorated and the manufacturing thereof is easy.

発明の構成 本発明の超音波探触子は、圧電素子の超音波放射面と該
圧電素子の側部にあり、導電部を有するホルダの端面と
該圧電素子とホルダの間を接着する接着層の端面の各端
面に金属蒸着、スパッタ或いはメッキ等の導電処理を施
こして薄い金属膜を形成し、そして該金属膜を該ホルダ
を経由して放射側電極用リード線に接続してなることを
特徴とするが、以下図示の実施例を参照しながらこれを
詳細に説明する。
Structure of the Invention The ultrasonic probe of the present invention comprises an ultrasonic radiation surface of a piezoelectric element, an adhesive layer on the side of the piezoelectric element and bonding between the end face of a holder having a conductive part and the piezoelectric element and the holder. A thin metal film is formed on each of the end faces by conductive treatment such as metal vapor deposition, sputtering, or plating, and the metal film is connected to the radiation-side electrode lead wire via the holder. This will be described in detail below with reference to the illustrated embodiments.

発明の実施例 第3図は本発明の一実施例を示す縦断面図で、第1図等
と同一部分には同一符号が付しである。圧電素子1の表
裏全面には金、銀等の電極41.42が焼き付け、蒸着
、メッキ等によって形成されるが、ホルダ3は内径が圧
電素子1の直径より大きく設定され、両者の間にはバッ
キング材2が介在する。ホルダ3の下端面と電極41は
同一面に設定され、且つ両者の間のバッキング材2の端
面も同じ面に設定される。そして、これらの面に一様に
全面に薄い(数μm以下の)金属膜7を形成する。この
金属膜7の形式は化学メッキ、金属蒸着、スパッタ、電
気メッキ等によるが、前3者と異なり電気メッキは下地
が導電体でなければならないから電気メッキは前3者の
あとに行なって厚み又は導電度調整を行なう。本例では
ホルダ3を導電性にして電極41〜金属膜7〜ホルダ3
〜リード線51の経路で電極41とリード線51の間を
接続する。ホルダ3を導電性にするには素材そのものが
金属などの導電体であるか、又は樹脂、ガラス、セラミ
ック等の不導体の表面に焼き付け、スパッタ、蒸着、導
電ペースト付着等で導電性を持たせればよい。リード線
51はホルダ3に、またリード線52は電極42にそれ
ぞれ半田付けされる。尚、放射側電極41はその機能を
金属膜7に兼ねさせることができるので省略することが
できる(以下の例についても同様)。
Embodiment of the Invention FIG. 3 is a longitudinal sectional view showing an embodiment of the present invention, in which the same parts as in FIG. 1 etc. are given the same reference numerals. Electrodes 41 and 42 of gold, silver, etc. are formed on the front and back surfaces of the piezoelectric element 1 by baking, vapor deposition, plating, etc. The inner diameter of the holder 3 is set larger than the diameter of the piezoelectric element 1, and there is a space between them. A backing material 2 is interposed. The lower end surface of the holder 3 and the electrode 41 are set on the same surface, and the end surface of the backing material 2 between them is also set on the same surface. Then, a thin (several μm or less) metal film 7 is uniformly formed over the entire surface of these surfaces. The format of this metal film 7 is chemical plating, metal vapor deposition, sputtering, electroplating, etc., but unlike the first three, electroplating requires the base to be a conductor, so electroplating is performed after the first three to increase the thickness. Or conductivity adjustment. In this example, the holder 3 is made conductive and the electrode 41 - metal film 7 - holder 3
~Connect between the electrode 41 and the lead wire 51 through the path of the lead wire 51. To make the holder 3 conductive, the material itself must be a conductor such as metal, or the surface of a non-conductor such as resin, glass, or ceramic must be made conductive by baking, sputtering, vapor deposition, or applying a conductive paste. Bye. The lead wire 51 is soldered to the holder 3, and the lead wire 52 is soldered to the electrode 42. Note that the radiation-side electrode 41 can be omitted since the metal film 7 can also serve its function (the same applies to the following examples).

バッキング材2として、タングステン等の金属粉をエポ
キシ樹脂等の樹脂に混入したものを用いる場合は、バン
キング材2が導電性を有することがある。この場合には
第3図の様な構成にしておくと電極41と42、もしく
は、電極42とホルダ3とが導通する可能性がある。そ
こで、これらの場合にはバンキング材2としてエポキシ
樹脂、もしくは金属の酸化物を混入したエポキシ樹脂等
の不導体を用いるのが良い。或いは、バンキング材2が
導電性を有する場合でも第4図に示す第2の実施例の様
に、不導体の接着剤8をホルダ3と圧電素子1の間に充
愼することで電極41.42間の導通を防くことができ
る。さらにバンキング2を介して、電極42とリード5
1とが導通することを防ぐためにホルダ3の内面と外面
とが導通しない様にしておくのが良い。例えばホルダ3
として樹脂を用い外側と底面を予め導電処理を施してお
く方法である。
When the backing material 2 is made of a resin such as an epoxy resin mixed with metal powder such as tungsten, the banking material 2 may have conductivity. In this case, if the structure is as shown in FIG. 3, there is a possibility that the electrodes 41 and 42 or the electrode 42 and the holder 3 will be electrically connected. Therefore, in these cases, it is preferable to use a nonconductor such as an epoxy resin or an epoxy resin mixed with a metal oxide as the banking material 2. Alternatively, even if the banking material 2 is conductive, as in the second embodiment shown in FIG. 4, the electrode 41. 42 can be prevented from conducting. Furthermore, the electrode 42 and the lead 5 are connected through the banking 2.
In order to prevent conduction between the inner and outer surfaces of the holder 3, it is preferable to prevent conduction between the inner and outer surfaces of the holder 3. For example, holder 3
This is a method in which the outside and bottom surfaces are pre-conductively treated using resin.

第5図は本発明の第3の実施例で、ホルダ3が不導体の
場合である。従って、放射側電極41は金属膜7をホル
ダ3の側部にも形成する等してリード線51に接続可能
とする。また第3図の背面電極42とリード線52との
半田付けは、背面は非放射側であって発生した超音波の
大部分はバンキング材2により吸収されるので圧電素子
特性に与える影響は小さいが、これを更に極力少なくす
るために、第5図では両者の接続もスパッタ、メッキ等
の方法で形成された金属膜7′によっている。
FIG. 5 shows a third embodiment of the present invention, in which the holder 3 is made of a nonconductor. Therefore, the radiation side electrode 41 can be connected to the lead wire 51 by, for example, forming a metal film 7 on the side of the holder 3 as well. Furthermore, when soldering the back electrode 42 and the lead wire 52 in FIG. 3, since the back side is on the non-emission side and most of the generated ultrasonic waves are absorbed by the banking material 2, the effect on the piezoelectric element characteristics is small. However, in order to further reduce this as much as possible, in FIG. 5, the connection between the two is also made by a metal film 7' formed by a method such as sputtering or plating.

金属膜7は圧電素子1とケース3とをバンキング材2も
しくは接着剤8によって固定した後に真空蒸着、もしく
はスパッタリング等によって付加されるが、その密着性
を向上させるには通常の真空蒸着よりもスパッタリング
、さらには金属をイオン化してターゲットに打ち込むイ
オンブレーティング法が適している。蒸着する金属材料
として第1層はTi、Cr等が密着性が優れていて望ま
しい。導通性および信頼性を向上させるために、この第
1層上にさらに金属を数層にわたり蒸着したり、あるい
はCu、Ni等の電気メッキを施すと良い。ただし、金
属層7が厚くなると、圧電素子1の厚みが等測的に厚く
なり、共振周波数が下がることがあるためにその分圧型
素子の共振周波数を予め若干高くしておくと良い。
The metal film 7 is added by vacuum deposition or sputtering after fixing the piezoelectric element 1 and the case 3 with the banking material 2 or the adhesive 8, but in order to improve the adhesion, sputtering is preferable to normal vacuum deposition. Furthermore, the ion brating method, in which metal is ionized and implanted into the target, is suitable. As the metal material to be vapor-deposited, Ti, Cr, etc. are preferable for the first layer because they have excellent adhesion. In order to improve conductivity and reliability, it is preferable to further evaporate several layers of metal on this first layer, or to perform electroplating with Cu, Ni, or the like. However, as the metal layer 7 becomes thicker, the thickness of the piezoelectric element 1 becomes thicker isometrically, and the resonant frequency may decrease, so it is better to set the resonant frequency of the voltage-dividing element a little higher in advance.

以下に、金属層7の付加方法の一例を示す。An example of a method for adding the metal layer 7 will be shown below.

密着性を良くするためには蒸着、もしくはスパッタリン
グする面の洗浄を十分にすることが重要である。これに
は先ず、薬品を用いた洗浄を超音波洗浄層中で行なう。
In order to improve adhesion, it is important to thoroughly clean the surface to be deposited or sputtered. For this purpose, cleaning using chemicals is first performed in an ultrasonic cleaning layer.

その−例を示すと、■トリクレン中で1分洗浄、■純水
中で1分洗浄、■IPA中で1分洗浄、■アセトン中で
1分洗浄し、乾燥させた後、真空槽中でさらにグロー放
電を用いて蒸着面を洗浄すると良い。
Examples are: ■ Washing for 1 minute in trichlene, ■ Washing for 1 minute in pure water, ■ Washing for 1 minute in IPA, ■ Washing for 1 minute in acetone, and after drying, in a vacuum chamber. Furthermore, it is preferable to clean the deposition surface using glow discharge.

次はスパッタリング、及びイオンブレーティングによる
金属膜付加を行なう。スパッタリングの一例として10
0人のTiを先ず付加し、後に500人のNiを付加す
る。更に導通性を向上するためにCuの電気メッキを2
μm施す。
Next, a metal film is added by sputtering and ion blasting. 10 as an example of sputtering
0 people Ti is added first, and 500 people Ni is added later. In order to further improve conductivity, Cu electroplating was applied.
μm is applied.

イオンブレーティングの一イ列としては500人のCr
を付加した後1μmのNiを付加する。この状態で十分
に導通性は確保されるが、信頼性向上のためNiの電気
メッキを2〜3μm施す。
500 Cr as one row of ion blasting
After that, 1 μm of Ni is added. Sufficient conductivity is ensured in this state, but to improve reliability, Ni electroplating is applied to a thickness of 2 to 3 μm.

以上の工程で形成された金属膜7はいずれも強固に付着
しており、樹脂に対しての密着性は良好であった。また
、更に電極面保護のためにシリコン系やエポキシ系の表
面コーティングを施す。この保護膜は音響整合層を兼ね
ることも可能であり、そうすることが望ましい。また蒸
着した金属膜7の表面は凹凸が少ないために、音響整合
層として、ガラス等の薄板を接着することも可能である
All of the metal films 7 formed in the above steps adhered firmly and had good adhesion to the resin. Additionally, a silicone or epoxy surface coating is applied to protect the electrode surface. This protective film can also serve as an acoustic matching layer, and it is desirable to do so. Further, since the surface of the deposited metal film 7 has few irregularities, it is also possible to bond a thin plate of glass or the like as an acoustic matching layer.

第6図は本発明の第4の実施例で、ホルダ3はガラス、
セラミック、樹脂等の不導体によって円環状に形成され
、その表面上には焼付は等により電極41.42の中継
部91.92が形成しである。中継部91は断面コの字
状の導体で、底面において金属膜7に接触する。また中
継部91の上面はリード線51に半田付けされる。中継
部92はホルダ3の上面にのみ形成された導体で、電極
42との間は25μm程度の金線もしくはアルミ線53
を用いた超音波、ボンディング(またはアーク接続)に
より接続する。この方法は半田付は部分の影響が無視で
きない小径(例えば511以下)の圧電素子に有効であ
る。ボンディングの信頼性を高めるためには第6図(a
)のように線53を数個所に設けるとよい。第6図の例
はバンキング材2が固化して支持体になるので、特に第
4図の様な長尺のホルダ3 (ケースとしても機能する
)は必要としない。8は前述の非導電性バンキング剤ま
たは接着剤である。
FIG. 6 shows a fourth embodiment of the present invention, in which the holder 3 is made of glass;
It is formed in an annular shape from a nonconductor such as ceramic or resin, and relay portions 91.92 of the electrodes 41.42 are formed on the surface thereof by baking or the like. The relay part 91 is a conductor having a U-shaped cross section, and contacts the metal film 7 at the bottom surface. Further, the upper surface of the relay section 91 is soldered to the lead wire 51. The relay part 92 is a conductor formed only on the upper surface of the holder 3, and a gold wire or aluminum wire 53 of about 25 μm is connected between it and the electrode 42.
Connect using ultrasonic waves, bonding (or arc connection). This method is effective for piezoelectric elements with a small diameter (for example, 511 mm or less) where the influence of soldering cannot be ignored. In order to increase the reliability of bonding,
) It is preferable to provide the lines 53 at several locations. In the example shown in FIG. 6, since the banking material 2 solidifies and becomes a support, a long holder 3 (which also functions as a case) as shown in FIG. 4 is not particularly required. 8 is the non-conductive banking agent or adhesive described above.

第7図はりニアアレイ或いはセククアレイ型の探触子に
適用した本発明の第5の実施例である。
FIG. 7 is a fifth embodiment of the present invention applied to a linear array or sector array type probe.

この種の超音波探触子では各圧電素子1が分割されて小
さくなるので、背面電極42側は線53によるボンディ
ングで中継部92へ接続し、また放射側の電極41は金
属膜7で一括して中継部91へ接続すると製造が容易に
なる。この分割振動子の場合本発明は特に有効である。
In this type of ultrasonic probe, each piezoelectric element 1 is divided into smaller pieces, so the back electrode 42 side is connected to the relay part 92 by bonding with a wire 53, and the electrode 41 on the radiation side is connected to the relay part 92 by a metal film 7. Manufacturing is facilitated by connecting it to the relay section 91. The present invention is particularly effective in the case of this split vibrator.

尚、上記実施例第1図より第7図において、圧電素子1
は平面型ばかりでなく、凹面の集中型でもよい。
In addition, in the above embodiments from FIG. 1 to FIG. 7, the piezoelectric element 1
may be not only a flat type but also a concave concentrated type.

発明の効果 以上述べたように本発明によれば、圧電素子の放射側電
極の引き出しをメッキ、蒸着等による薄い金属膜で行う
ようにしたので、製作が容易で、圧電素子特性に与える
影響を小さくすることができ、特に小型の圧電素子を用
いる超音波探触子の放射ビーム形状および変換効率を改
善できる利点がある。
Effects of the Invention As described above, according to the present invention, the radiation side electrode of the piezoelectric element is drawn out using a thin metal film formed by plating, vapor deposition, etc., which facilitates production and reduces the influence on the piezoelectric element characteristics. It has the advantage of being able to be made smaller and improving the radiation beam shape and conversion efficiency of ultrasound probes, especially those that use small piezoelectric elements.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図および第2図は従来の超音波探触子の異なる例を
示す構成図、第3図〜第7図は本発明の異なる実施例を
示す構成図である。 図中、1は圧電素子、2はハソキング材、3はホルダ、
41は放射側電極、42は背面電極、51.52はリー
ド線、7.7′は金属膜、8は接着層、91.92は中
継部である。 出願人 富士通株式会社 代理人弁理士  青  柳    稔 第1図 第3図 1 第2図 第5図 1 第4区 51 第7面
FIGS. 1 and 2 are block diagrams showing different examples of conventional ultrasonic probes, and FIGS. 3 to 7 are block diagrams showing different embodiments of the present invention. In the figure, 1 is a piezoelectric element, 2 is a sawing material, 3 is a holder,
41 is a radiation side electrode, 42 is a back electrode, 51.52 is a lead wire, 7.7' is a metal film, 8 is an adhesive layer, and 91.92 is a relay part. Applicant Fujitsu Limited Patent Attorney Minoru Aoyagi Figure 1 Figure 3 Figure 1 Figure 2 Figure 5 1 Ward 4 51 Page 7

Claims (5)

【特許請求の範囲】[Claims] (1)圧電素子の超音波放射面と該圧電素子の側部にあ
り、導電部を有するホルダの端面と該圧電素子とホルダ
の間を接着する接着層の端面の各端面に金属蒸着、スパ
ッタ或いはメッキ等の導電処理を施こして薄い金属膜を
形成し、そして該金属膜を該ホルダを経由して放射側電
極用リード線に接続してなることを特徴とする超音波探
触子。
(1) Metal vapor deposition and sputtering on the ultrasonic emission surface of the piezoelectric element, the end face of the holder that has a conductive part on the side of the piezoelectric element, and the end face of the adhesive layer that adheres between the piezoelectric element and the holder. Alternatively, an ultrasonic probe characterized in that a thin metal film is formed by conducting conductive treatment such as plating, and the metal film is connected to a radiation-side electrode lead wire via the holder.
(2)圧電素子の超音波放射面と、ホルダの端面と、接
着層の端面とを略同−面に設定したことを特徴とする特
許請求の範囲第1項記載の超音波探触子。
(2) The ultrasonic probe according to claim 1, wherein the ultrasonic radiation surface of the piezoelectric element, the end surface of the holder, and the end surface of the adhesive layer are set to be substantially the same plane.
(3)接着層がバンキング材の一部であることを特徴と
する特許請求の範囲第1項乃至第2項記載の超音波探触
子。
(3) The ultrasonic probe according to claims 1 and 2, wherein the adhesive layer is a part of the banking material.
(4)金属膜は放射側電極用リード線と超音波放射面以
外の個所で接続されることを特徴とする特許請求の範囲
第1項な至第3項記載の超音波探触子。
(4) The ultrasonic probe according to claims 1 to 3, wherein the metal film is connected to the radiation-side electrode lead wire at a location other than the ultrasound radiation surface.
(5)ホルダがその一部に圧電素子の背面電極用中継部
を有し、該中継部に背面電極用リード線が接続されるこ
とを特徴とする特許請求の範囲第1項乃至第4項のいず
れかに記載の超音波探触子。 倒中継部と背面電極の間が、超音波ポンダあるいはアー
ク溶接により連結された1ないし複数本の細線で接続さ
れてなることを特徴とする特許請求の範囲第5項記載の
超音波探触子。
(5) Claims 1 to 4, characterized in that the holder has a relay part for the back electrode of the piezoelectric element in a part thereof, and a lead wire for the back electrode is connected to the relay part. The ultrasonic probe according to any of the above. The ultrasonic probe according to claim 5, wherein the inverted relay part and the back electrode are connected by one or more thin wires connected by an ultrasonic ponder or arc welding. .
JP1439283A 1983-01-31 1983-01-31 Ultrasonic probe Pending JPS59141060A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1439283A JPS59141060A (en) 1983-01-31 1983-01-31 Ultrasonic probe

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1439283A JPS59141060A (en) 1983-01-31 1983-01-31 Ultrasonic probe

Publications (1)

Publication Number Publication Date
JPS59141060A true JPS59141060A (en) 1984-08-13

Family

ID=11859781

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1439283A Pending JPS59141060A (en) 1983-01-31 1983-01-31 Ultrasonic probe

Country Status (1)

Country Link
JP (1) JPS59141060A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6041855U (en) * 1983-08-30 1985-03-25 三菱電機株式会社 ultrasonic probe
JPH0426365U (en) * 1990-06-27 1992-03-02
JP2002521163A (en) * 1998-07-31 2002-07-16 ボストン・サイアンティフィック・リミテッド Off-aperture electrical connection for ultrasonic transducers
JP2017044601A (en) * 2015-08-27 2017-03-02 三菱重工業株式会社 Ultrasonic sensor and method of manufacturing the same

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5099788A (en) * 1973-12-29 1975-08-07
JPS51120779A (en) * 1975-04-16 1976-10-22 Hitachi Ltd Asoustic probe
JPS5234779A (en) * 1975-09-12 1977-03-16 Tokyo Keiki Co Ltd Ultrasonic probe
JPS5575647A (en) * 1978-12-04 1980-06-07 Mitsubishi Electric Corp Probe for electroacoustic conversion
JPS587994A (en) * 1981-07-08 1983-01-17 Toray Ind Inc Joined material between metallic material and high polymer material

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5099788A (en) * 1973-12-29 1975-08-07
JPS51120779A (en) * 1975-04-16 1976-10-22 Hitachi Ltd Asoustic probe
JPS5234779A (en) * 1975-09-12 1977-03-16 Tokyo Keiki Co Ltd Ultrasonic probe
JPS5575647A (en) * 1978-12-04 1980-06-07 Mitsubishi Electric Corp Probe for electroacoustic conversion
JPS587994A (en) * 1981-07-08 1983-01-17 Toray Ind Inc Joined material between metallic material and high polymer material

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6041855U (en) * 1983-08-30 1985-03-25 三菱電機株式会社 ultrasonic probe
JPH0426365U (en) * 1990-06-27 1992-03-02
JP2002521163A (en) * 1998-07-31 2002-07-16 ボストン・サイアンティフィック・リミテッド Off-aperture electrical connection for ultrasonic transducers
JP2017044601A (en) * 2015-08-27 2017-03-02 三菱重工業株式会社 Ultrasonic sensor and method of manufacturing the same

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