JPH0817896A - Substrate carrying device - Google Patents

Substrate carrying device

Info

Publication number
JPH0817896A
JPH0817896A JP14759894A JP14759894A JPH0817896A JP H0817896 A JPH0817896 A JP H0817896A JP 14759894 A JP14759894 A JP 14759894A JP 14759894 A JP14759894 A JP 14759894A JP H0817896 A JPH0817896 A JP H0817896A
Authority
JP
Japan
Prior art keywords
pad
substrate
hand
vacuum
elastic member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14759894A
Other languages
Japanese (ja)
Other versions
JP3200285B2 (en
Inventor
Hiroshi Nakazato
博 中里
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP14759894A priority Critical patent/JP3200285B2/en
Publication of JPH0817896A publication Critical patent/JPH0817896A/en
Application granted granted Critical
Publication of JP3200285B2 publication Critical patent/JP3200285B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a small device capable of facilitating parallel conditions in chucking and accurately holding a substrate by vacuum-chucking without contaminating the substrate by a method wherein a pad for holding a substrate held by vacuum-chucking and an elastic member for forming a vacuum supply flow path are provided. CONSTITUTION:This embodiment comprises: a pad 1 for holding a substrate by vacuum-chucking; a hand 2 for carrying the substrate held in the hand 1 by vacuum-chucking; and an elastic member 3 for forming a vacuum supply flow path between the pad 1 and the hand 2. For example, the pad 1 is mold- resinous having conduction, and the elastic member 3 is an O-ring elastic member interposed between the pad 1 and the hand 2, and the elastic member 3 is made of rubber having conduction. Further, in the hand 2, a plurality of pads 1 are provided via the elastic member 3 and a detachment of the pad 1 from the hand 2 is prevented by a detachment preventing screw 5.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は基板搬送装置、特には半
導体製造装置(露光装置、洗浄装置、検査装置等)内ま
たは半導体装置の製造工程でレチクル(フォトマスク)
やウエハ等の基板を自動搬送するための基板搬送装置に
関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate transfer apparatus, and more particularly, to a reticle (photomask) in a semiconductor manufacturing apparatus (exposure apparatus, cleaning apparatus, inspection apparatus, etc.) or in a semiconductor device manufacturing process.
The present invention relates to a substrate transfer device for automatically transferring a substrate such as a wafer or a wafer.

【0002】[0002]

【従来の技術】半導体装置の製造工程で利用されるレチ
クル(フォトマスク)やウエハ等の基板は通常所望の収
納容器に収納されている。このため半導体製造工程で利
用する際には、その収納容器の中から基板をハンドによ
り自動的に抜き取り、目的の処理(露光、洗浄、検査
等)ステーションに搬送することが行なわれる。搬送時
に基板がハンドから落ちないようにするため、ハンドは
その保持面に複数設けられた真空吸着パツドにより基板
を保持するのが一般的である。
2. Description of the Related Art Substrates such as reticles (photomasks) and wafers used in the manufacturing process of semiconductor devices are usually stored in a desired storage container. Therefore, when it is used in a semiconductor manufacturing process, the substrate is automatically taken out from the storage container by a hand and conveyed to a target processing (exposure, cleaning, inspection, etc.) station. In order to prevent the substrate from dropping from the hand during transportation, the hand generally holds the substrate by a plurality of vacuum suction pads provided on its holding surface.

【0003】従来、真空吸着により基板を保持する手段
としては、ハンド上の複数のパツドの平行度の誤差が多
少大きくても基板を吸着できるように柔軟性のあるゴム
吸盤を用いるものや、パツドは剛体でも複数パツド間の
平行度誤差を吸収するためにパツドの下にコイルバネや
板バネを敷くものがあった。
Conventionally, as a means for holding a substrate by vacuum suction, a flexible rubber suction cup is used so that the substrate can be sucked even if the parallelism error of a plurality of pads on the hand is somewhat large, or the pad is used. In some cases, even with a rigid body, a coil spring or a leaf spring is placed under the pad to absorb the parallelism error between the pads.

【0004】図6は前者の従来例を示すゴム吸盤の断面
を示す図で、この例ではゴム吸盤11がハンド12に直
接取り付けられている。ゴム吸盤11のリップ部11a
が基板(不図示)と接触する。ハンド12内に形成され
ているハンド内真空連絡溝12b、真空導入用穴12a
を順に介して供給される真空は、ゴム吸盤11内の真空
導入用穴11bを介して真空吸着用溝11cに供給さ
れ、基板をゴム吸盤11のリップ部11aに真空吸着さ
せる。なお、この図で13はハンド12の底を密閉する
ための蓋である。
FIG. 6 is a cross-sectional view of a rubber suction cup showing the former conventional example. In this example, the rubber suction cup 11 is directly attached to the hand 12. Lip portion 11a of the rubber suction cup 11
Contacts a substrate (not shown). In-hand vacuum communication groove 12b formed in the hand 12, vacuum introduction hole 12a
The vacuum that is sequentially supplied through the vacuum suction hole 11b is supplied to the vacuum suction groove 11c through the vacuum introduction hole 11b in the rubber suction cup 11, and the substrate is vacuum suctioned to the lip portion 11a of the rubber suction cup 11. In this figure, 13 is a lid for sealing the bottom of the hand 12.

【0005】図7は後者の従来例を示す吸着パツドの断
面を示す図で、この例では金属製の吸着パツド14が圧
縮コイルバネ18を介してハンド17に取り付けられ、
ハンド17に対して吸着パツド14の平行出しを行うこ
とを可能にしている。吸着パツド14にはその真空吸着
用溝14aに真空を供給するためのニツプル穴15aを
持つニツプル15が固着され、ニツプル15にはホース
穴16aを持つ真空供給用ホース16が接続されてい
る。ホース16はハンド17の下面に形成されている溝
17aを通っている。
FIG. 7 is a cross-sectional view of a suction pad showing the latter conventional example. In this example, a metal suction pad 14 is attached to a hand 17 via a compression coil spring 18.
The suction pad 14 can be moved parallel to the hand 17. A nipple 15 having a nipple hole 15a for supplying a vacuum to the vacuum suction groove 14a is fixed to the suction pad 14, and a vacuum supply hose 16 having a hose hole 16a is connected to the nipple 15. The hose 16 passes through a groove 17a formed on the lower surface of the hand 17.

【0006】[0006]

【発明が解決しようとする課題】ところで、このような
従来例の内、ゴム吸盤を用いるものはゴム吸盤の洗浄が
困難なため、基板を吸着するときに基板との接触部が基
板を汚染することがあるという問題があった。また、吸
着部を洗浄し易いように剛体のパツドにしたものは、コ
イルバネ等の介在でパツドがハンドと離れているため、
真空を接続するためにニップルやホースを取り付けねば
ならず、構造が複雑で大きくなり、ホースの固さが影響
して平行を出す機能が損なわれていた。
By the way, among such conventional examples, those using a rubber suction cup have difficulty in cleaning the rubber suction cup, so that the contact portion with the substrate contaminates the substrate when the substrate is sucked. There was a problem. Also, in the case of a rigid pad so that the suction part can be easily washed, the pad is separated from the hand by the interposition of a coil spring, etc.
In order to connect the vacuum, nipples and hoses had to be attached, the structure was complicated and large, and the function of producing parallelism was impaired due to the rigidity of the hose.

【0007】本発明は、このような事情に鑑みなされた
もので、その目的は、基板を汚染することもなく、吸着
の平行が容易にでて真空吸着により基板を正確に保持で
きる小型の基板搬送装置を提供することにある。
The present invention has been made in view of the above circumstances, and an object thereof is to provide a small-sized substrate which does not contaminate the substrate, facilitates parallel suction, and accurately holds the substrate by vacuum suction. It is to provide a carrier.

【0008】[0008]

【課題を解決するための手段】上記目的を達成するため
本発明の基板搬送装置は、基板を真空吸着保持するため
のパツドと、前記パツドに真空吸着保持された前記基板
を搬送するためのハンドと、前記パツドと前記ハンドの
間で真空供給用流路を形成する弾性部材を有することを
特徴としている。
To achieve the above object, a substrate transfer apparatus according to the present invention comprises a pad for holding a substrate by vacuum suction and a hand for transferring the substrate vacuum-held by the pad. And an elastic member that forms a vacuum supply channel between the pad and the hand.

【0009】また、より好ましくは、前記弾性部材は前
記パツドと前記ハンドの間に介在されたOリング状弾性
部材であり、前記パツドは前記ハンドからの脱落を脱落
防止ネジにより防止されていたり、前記パツドは導電性
を有するモールド樹脂製であり、前記弾性部材は導電性
を有するゴム製であるようにしている。
More preferably, the elastic member is an O-ring-shaped elastic member interposed between the pad and the hand, and the pad is prevented from falling off from the hand by a falling prevention screw, The pad is made of conductive mold resin, and the elastic member is made of conductive rubber.

【0010】なお、前記ハンドには前記パツドが前記弾
性部材を介して複数設けられるようにしても良く、前記
基板を半導体製造装置内で利用されるものとしても良
い。
The hand may be provided with a plurality of pads through the elastic member, and the substrate may be used in a semiconductor manufacturing apparatus.

【0011】[0011]

【作用】本発明は、基板を真空吸着保持するパツドとこ
のパツドに保持された基板を搬送するためのハンドとの
間に弾性部材を介在させ、この弾性部材介してパツドに
真空を供給して基板を保持している。このため、ゴム吸
盤のように基板を汚染することもなく、また、基板を吸
着した際のパツドの平行を弾性部材の変形により容易に
だすことができるので、真空吸着により基板を正確に保
持できる小型の基板搬送装置の提供が可能である。
According to the present invention, an elastic member is interposed between a pad for vacuum-holding a substrate and a hand for carrying the substrate held by the pad, and a vacuum is supplied to the pad through the elastic member. Holding a substrate. Therefore, unlike the rubber suction cup, the substrate is not contaminated, and the parallelism of the pad when the substrate is sucked can be easily taken out by the deformation of the elastic member, so that the substrate can be held accurately by vacuum suction. It is possible to provide a small substrate transfer device.

【0012】ところで、この種のハンドは搬送する基板
(例えば半導体製造工程で利用されるレチクルやマス
ク)が帯電してしまうと、基板内に描かれた半導体装置
製造用のパターンがスパークして斯かるパターンが破壊
することがあるので、導電性の材料にすることも必要で
ある。
By the way, when a substrate (for example, a reticle or a mask used in a semiconductor manufacturing process) conveyed by this type of hand is charged, a semiconductor device manufacturing pattern drawn on the substrate is sparked. Since the light pattern may be destroyed, it is necessary to use a conductive material.

【0013】基板との接触部に導電性のモールド樹脂パ
ツドを設け、その下部に導電性のゴムでできたOリング
状の弾性部材を置けば、基板は導電性材料を介してハン
ドにも接触していることになり、基板の帯電を防止する
こともできる。
If a conductive mold resin pad is provided at the contact portion with the substrate and an O-ring elastic member made of conductive rubber is placed under the pad, the substrate also comes into contact with the hand through the conductive material. Therefore, the substrate can be prevented from being charged.

【0014】[0014]

【実施例】図1は本発明の基板搬送装置の特徴を最も良
く表す図である。同図において、1は導電性のモールド
樹脂製のパツドで、1aはその内部を貫通する真空導入
用穴、1bはパッド1上に載置された基板(例えば半導
体製造工程で利用されるレチクルやマスク)を吸着する
際に真空が供給される真空吸着用溝である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is a view best showing the features of the substrate transfer apparatus of the present invention. In the figure, 1 is a pad made of a conductive mold resin, 1a is a vacuum introducing hole penetrating through the pad, and 1b is a substrate placed on the pad 1 (for example, a reticle used in a semiconductor manufacturing process or This is a vacuum suction groove to which a vacuum is supplied when sucking a mask).

【0015】2はパツド1に吸着保持された基板を搬送
するための搬送用ハンドで、2aはその内部にパツド1
に向けて形成された真空導入用穴であり、この真空導入
用穴2aはパツド1の真空導入用穴1aと略同心となる
ように形成されている。2bは不図示の真空供給源に接
続されたハンド内真空連絡溝で、この溝2bを介して真
空源より供給される真空は、真空導入用穴2a,1aを
順に介してパツド1の真空吸着用溝1bに供給される。
Reference numeral 2 is a transfer hand for transferring the substrate sucked and held by the pad 1, and 2a is a pad 1 inside the transfer hand.
The vacuum introducing hole 2a is formed so as to be directed toward, and the vacuum introducing hole 2a is formed so as to be substantially concentric with the vacuum introducing hole 1a of the pad 1. Reference numeral 2b denotes an in-hand vacuum communication groove connected to a vacuum supply source (not shown). The vacuum supplied from the vacuum source through this groove 2b is the vacuum suction of the pad 1 through the vacuum introduction holes 2a and 1a in order. It is supplied to the groove 1b.

【0016】また、3はハンド2と導電性のモールド樹
脂製のパツド1の間に介在し両者を接続する導電性のゴ
ムでできたOリング(弾性部材)で、ハンド2の真空導
入用穴2aとパツド1の真空導入用穴1aの対向部分の
空間を実質的に密閉し、この部分で真空用の流路を形成
している。4はハンド1内に形成された真空連絡溝2b
の蓋、5,5はパツド1のハンド2からの脱落を防止す
るための脱落防止ネジで、パツド1の端部にそれぞれ設
けられている。
Numeral 3 is an O-ring (elastic member) made of a conductive rubber which is interposed between the hand 2 and the pad 1 made of a conductive mold resin to connect them to each other. 2a and the space of the pad 1 facing the vacuum introduction hole 1a are substantially sealed, and a vacuum flow path is formed in this space. 4 is a vacuum communication groove 2b formed in the hand 1
The lids 5 and 5 are fall-preventing screws for preventing the pad 1 from coming off the hand 2, and are provided at the ends of the pad 1, respectively.

【0017】図2は本発明の搬送系の全体を示す斜視図
で、6は基板9を収納するカセツトの下皿、7は下皿6
に対し略密着するカセツトの上蓋、8は上蓋7を下皿6
に対して開閉する蓋開け機構である。蓋開け機構8によ
って上蓋7が下皿6に対して分離された際、ハンド2は
カセツト内部の基板9を真空吸着により保持した後、カ
セツト内部から取り出して基板9を搬送目的場所10に
搬送する。この搬送目的場所10は、例えばステツパの
ような半導体製造用露光装置においては、露光ステージ
である。
FIG. 2 is a perspective view showing the whole of the carrying system of the present invention. 6 is the lower tray of the cassette for housing the substrate 9, and 7 is the lower tray 6.
The upper lid 7 and the lower lid 6 are in close contact with each other.
It is a lid opening mechanism that opens and closes. When the upper lid 7 is separated from the lower plate 6 by the lid opening mechanism 8, the hand 2 holds the substrate 9 inside the cassette by vacuum suction, and then removes it from the inside of the cassette and conveys the substrate 9 to the conveyance destination 10. The transport destination 10 is an exposure stage in a semiconductor manufacturing exposure apparatus such as a stepper.

【0018】図3はハンド2のみを示した斜視図で、ハ
ンド2には図示の如く4か所にモールド樹脂製のパツド
1が設けられている。これらのパツド1のそれぞれは図
1を用いて前述したように構成されている。図4は図1
に示した実施例の断面図で、Oリング3近辺の断面を示
している。
FIG. 3 is a perspective view showing only the hand 2. As shown in the figure, the hand 2 is provided with four pads 1 made of a mold resin. Each of these pads 1 is constructed as described above with reference to FIG. 4 is shown in FIG.
In the cross-sectional view of the embodiment shown in FIG. 3, a cross section near the O-ring 3 is shown.

【0019】図5は本発明の他の実施例を示す。この実
施例では、Oリング3をパツド1とハンド2の間に設け
る代わりに、樹脂製のパツド1の下部に肉薄の弾性体1
cをパツド1と一体的に形成し、これに図1の弾性部材
3の役目をさせている。この実施例は、図1の実施例に
比してより構成を簡単にできる。
FIG. 5 shows another embodiment of the present invention. In this embodiment, instead of providing the O-ring 3 between the pad 1 and the hand 2, a thin elastic body 1 is provided under the resin pad 1.
c is formed integrally with the pad 1, and this serves as the elastic member 3 of FIG. This embodiment can have a simpler configuration than the embodiment of FIG.

【0020】次に、上記実施例の動作を図2を参照しな
がら説明する。蓋開け機構8が基板9を収納しているカ
セツトを開けた後、ハンド2は不図示の駆動機構により
移動されてカセツト内に進入し、下皿6上から基板9の
みを取り出す。基板9はハンド2の上でパツド1に真空
吸着保持され、保持されたまま目的の露光ステージ10
まで搬送され、露光ステージ10に吸着される。
Next, the operation of the above embodiment will be described with reference to FIG. After the lid opening mechanism 8 opens the cassette accommodating the substrate 9, the hand 2 is moved by a driving mechanism (not shown) to enter the cassette, and only the substrate 9 is taken out from the lower plate 6. The substrate 9 is vacuum-sucked and held by the pad 1 on the hand 2, and the target exposure stage 10 is held as it is.
And is attracted to the exposure stage 10.

【0021】基板9のほぼ中央部には露光されるパター
ンが描かれているので、搬送するときには図3に示す如
く基板の周囲4点を吸着用パツド1により真空吸着し保
持する。実際には4点の平行を出すのは困難なため図5
の従来例ではゴム吸盤11により基板9を真空吸着して
いたが、ゴムは洗浄が難しく基板9を汚染し、基板9に
吸盤の跡が付くような状況であった。
Since a pattern to be exposed is drawn in the substantially central portion of the substrate 9, four points around the substrate are vacuum-sucked and held by the suction pads 1 as shown in FIG. Actually, it is difficult to make the four points parallel to each other.
In the prior art example, the substrate 9 was vacuum-adsorbed by the rubber suction cup 11, but it was difficult to clean the rubber, and the substrate 9 was contaminated, and the suction mark was left on the substrate 9.

【0022】本実施例の吸着パツド1は、ゴムではなく
剛体であるモールド樹脂でできたパツドであり、パツド
1の下のOリング3の弾性効果により吸着に必要な平行
出しが容易にできる構造である。パツド1の上面には基
板9を真空吸着し易いように真空吸着用溝1bがあり、
更に真空導入用穴1aを通った真空がOリング3内をリ
ークすることなく通り、ハンド2の穴2aからハンド内
真空連絡溝2bを通って真空源につながっている。
The suction pad 1 of the present embodiment is a pad made of a rigid molding resin, not rubber, and the O-ring 3 under the pad 1 has an elastic effect so that the parallel alignment required for suction can be easily performed. Is. There is a vacuum suction groove 1b on the upper surface of the pad 1 to facilitate vacuum suction of the substrate 9,
Further, the vacuum passing through the vacuum introduction hole 1a passes through the O-ring 3 without leaking, and is connected to the vacuum source from the hole 2a of the hand 2 through the in-hand vacuum communication groove 2b.

【0023】パツド1はOリング3により自由に傾くこ
とができる。しかし、パツド1はただOリング3の上に
載せているだけであるし、Oリング3もハンド2の上に
載せてあるだけなので、水平方向に滑ってしまうことが
ないように脱落防止ネジ5によるストツパが効く。つま
り脱落防止ネジ5は完全に閉まっているのでなくパツド
を押えつけない程度の隙間を残して閉められ、緩み防止
のためにネジロックのような処置が施されている。
The pad 1 can be freely tilted by the O-ring 3. However, since the pad 1 is only placed on the O-ring 3 and the O-ring 3 is also placed on the hand 2, the captive screw 5 is attached so that it does not slide horizontally. The stopper is effective. That is, the captive screw 5 is not completely closed, but is closed with a gap to the extent that the pad is not pressed down, and a treatment such as a screw lock is applied to prevent loosening.

【0024】また本実施例のパツド1は導電性のモール
ド樹脂なので基板9が帯電することがない。パツド1と
接触するOリング3も導電性のゴムで金属製のハンドに
接触している。なお、弾性部材はOリング3に限定する
ことなく、例えば図5のように樹脂パツド1の下部を一
体物ではあるが肉薄の弾性体にすることで、Oリングと
同等の効果を出すことも可能である。
Since the pad 1 of this embodiment is a conductive mold resin, the substrate 9 is not charged. The O-ring 3 in contact with the pad 1 is also in contact with the metal hand made of conductive rubber. The elastic member is not limited to the O-ring 3, and the same effect as that of the O-ring can be obtained by forming the lower part of the resin pad 1 as an integral but thin elastic body as shown in FIG. 5, for example. It is possible.

【0025】[0025]

【発明の効果】以上説明したように、本発明によれば、
パツドの下に弾性部材を置くだけの単純な構造で吸着の
平行が容易にで、基板を正確に真空吸着保持できる。更
に、弾性部材を導電性のOリングとすれば、基板を帯電
させることもない小型な基板搬送装置を提供できる。
As described above, according to the present invention,
With a simple structure in which an elastic member is placed under the pad, it is easy to perform parallel suction, and the substrate can be accurately vacuum-held and held. Furthermore, if the elastic member is a conductive O-ring, it is possible to provide a compact substrate transfer device that does not charge the substrate.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例の要部を示す断面図。FIG. 1 is a sectional view showing an essential part of an embodiment of the present invention.

【図2】図1の実施例の全体を示す斜視図。FIG. 2 is a perspective view showing the entire embodiment of FIG.

【図3】図1の実施例のハンドを示した斜視図。FIG. 3 is a perspective view showing the hand of the embodiment shown in FIG.

【図4】図1とは異なる方向から本実施例を示す断面
図。
FIG. 4 is a sectional view showing the present embodiment from a direction different from that in FIG.

【図5】本発明の他の実施例を示す断面図。FIG. 5 is a sectional view showing another embodiment of the present invention.

【図6】従来例を示す断面図。FIG. 6 is a sectional view showing a conventional example.

【図7】他の従来例を示す断面図。FIG. 7 is a sectional view showing another conventional example.

【符号の説明】[Explanation of symbols]

1 パツド 2 ハンド 3 Oリング 5 脱落防止ネジ 9 基板 1 pad 2 hand 3 O-ring 5 captive screw 9 substrate

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 基板を真空吸着保持するためのパツド
と、前記パツドに真空吸着保持された前記基板を搬送す
るためのハンドと、前記パツドと前記ハンドの間で真空
供給用流路を形成する弾性部材を有することを特徴とす
る基板搬送装置。
1. A pad for vacuum-holding a substrate, a hand for transporting the substrate vacuum-held on the pad, and a vacuum supply channel between the pad and the hand. A substrate transfer device having an elastic member.
【請求項2】 前記弾性部材は前記パツドと前記ハンド
の間に介在されたOリング状弾性部材であり、前記パツ
ドは前記ハンドからの脱落を脱落防止ネジにより防止さ
れていることを特徴とする請求項1に記載の基板搬送装
置。
2. The elastic member is an O-ring-shaped elastic member interposed between the pad and the hand, and the pad is prevented from falling off from the hand by a falling prevention screw. The substrate transfer device according to claim 1.
【請求項3】 前記パツドは導電性を有するモールド樹
脂製であり、前記弾性部材は前記パツドと前記ハンドの
間に介在されたOリング状弾性部材であり、この弾性部
材は導電性を有するゴム製であることを特徴とする請求
項1に記載の基板搬送装置。
3. The pad is made of a conductive mold resin, the elastic member is an O-ring elastic member interposed between the pad and the hand, and the elastic member is a conductive rubber. The substrate transfer device according to claim 1, wherein the substrate transfer device is manufactured.
【請求項4】 前記ハンドには前記パツドが前記弾性部
材を介して複数設けられていることを特徴とする請求項
3に記載の基板搬送装置。
4. The substrate transfer apparatus according to claim 3, wherein the hand is provided with a plurality of pads through the elastic member.
【請求項5】 前記基板は半導体製造装置内で利用され
るものであることを特徴とする請求項4に記載の基板搬
送装置。
5. The substrate transfer apparatus according to claim 4, wherein the substrate is used in a semiconductor manufacturing apparatus.
JP14759894A 1994-06-29 1994-06-29 Substrate transfer device Expired - Fee Related JP3200285B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14759894A JP3200285B2 (en) 1994-06-29 1994-06-29 Substrate transfer device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14759894A JP3200285B2 (en) 1994-06-29 1994-06-29 Substrate transfer device

Publications (2)

Publication Number Publication Date
JPH0817896A true JPH0817896A (en) 1996-01-19
JP3200285B2 JP3200285B2 (en) 2001-08-20

Family

ID=15433969

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14759894A Expired - Fee Related JP3200285B2 (en) 1994-06-29 1994-06-29 Substrate transfer device

Country Status (1)

Country Link
JP (1) JP3200285B2 (en)

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JP2006352115A (en) * 2005-06-08 2006-12-28 Asml Netherlands Bv Stage apparatus, lithographic apparatus and device manufacturing method
JP2016157822A (en) * 2015-02-25 2016-09-01 キヤノン株式会社 Transfer hand and lithography apparatus
US9760023B2 (en) 2013-11-26 2017-09-12 Tokyo Electron Limited Substrate carrying device
KR20180008714A (en) * 2015-05-24 2018-01-24 상하이 마이크로 일렉트로닉스 이큅먼트(그룹) 컴퍼니 리미티드 Silicon wafer transfer system
JP2018157194A (en) * 2017-01-27 2018-10-04 ズス・マイクロテック・リソグラフィ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツングSuss MicroTec Lithography GmbH End effector suction device, substrate holding end effector, and end effector manufacturing method
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Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006352115A (en) * 2005-06-08 2006-12-28 Asml Netherlands Bv Stage apparatus, lithographic apparatus and device manufacturing method
JP4695022B2 (en) * 2005-06-08 2011-06-08 エーエスエムエル ネザーランズ ビー.ブイ. Stage apparatus, lithographic apparatus, and device manufacturing method
US9760023B2 (en) 2013-11-26 2017-09-12 Tokyo Electron Limited Substrate carrying device
JP2016157822A (en) * 2015-02-25 2016-09-01 キヤノン株式会社 Transfer hand and lithography apparatus
KR20180008714A (en) * 2015-05-24 2018-01-24 상하이 마이크로 일렉트로닉스 이큅먼트(그룹) 컴퍼니 리미티드 Silicon wafer transfer system
JP2018517308A (en) * 2015-05-24 2018-06-28 シャンハイ マイクロ エレクトロニクス イクイプメント(グループ)カンパニー リミティド Silicon wafer transfer system
JP2018157194A (en) * 2017-01-27 2018-10-04 ズス・マイクロテック・リソグラフィ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツングSuss MicroTec Lithography GmbH End effector suction device, substrate holding end effector, and end effector manufacturing method
JP2018206814A (en) * 2017-05-30 2018-12-27 キヤノン株式会社 Transport hand, transport device, lithography apparatus, article manufacturing method, and article holding mechanism
US10319623B2 (en) 2017-05-30 2019-06-11 Canon Kabushiki Kaisha Conveyance hand, conveyance apparatus, lithography apparatus, manufacturing method of article, and holding mechanism
US20220139756A1 (en) * 2020-10-30 2022-05-05 Semes Co., Ltd. Transfer hand and substrate processing apparatus
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US11935779B2 (en) 2020-10-30 2024-03-19 Semes Co., Ltd. Transfer hand and substrate processing apparatus with conductive ring and tilting vacuum pad

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