JP3200285B2 - Substrate transfer device - Google Patents

Substrate transfer device

Info

Publication number
JP3200285B2
JP3200285B2 JP14759894A JP14759894A JP3200285B2 JP 3200285 B2 JP3200285 B2 JP 3200285B2 JP 14759894 A JP14759894 A JP 14759894A JP 14759894 A JP14759894 A JP 14759894A JP 3200285 B2 JP3200285 B2 JP 3200285B2
Authority
JP
Japan
Prior art keywords
substrate
pad
hand
vacuum
elastic member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP14759894A
Other languages
Japanese (ja)
Other versions
JPH0817896A (en
Inventor
博 中里
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP14759894A priority Critical patent/JP3200285B2/en
Publication of JPH0817896A publication Critical patent/JPH0817896A/en
Application granted granted Critical
Publication of JP3200285B2 publication Critical patent/JP3200285B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Manipulator (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は基板搬送装置、特には半
導体製造装置(露光装置、洗浄装置、検査装置等)内ま
たは半導体装置の製造工程でレチクル(フォトマスク)
やウエハ等の基板を自動搬送するための基板搬送装置に
関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a reticle (photomask) in a substrate transfer apparatus, particularly in a semiconductor manufacturing apparatus (exposure apparatus, cleaning apparatus, inspection apparatus, etc.) or in a semiconductor device manufacturing process.
The present invention relates to a substrate transfer device for automatically transferring substrates such as wafers and wafers.

【0002】[0002]

【従来の技術】半導体装置の製造工程で利用されるレチ
クル(フォトマスク)やウエハ等の基板は通常所望の収
納容器に収納されている。このため半導体製造工程で利
用する際には、その収納容器の中から基板をハンドによ
り自動的に抜き取り、目的の処理(露光、洗浄、検査
等)ステーションに搬送することが行なわれる。搬送時
に基板がハンドから落ちないようにするため、ハンドは
その保持面に複数設けられた真空吸着パツドにより基板
を保持するのが一般的である。
2. Description of the Related Art A reticle (photomask) or a substrate such as a wafer used in a semiconductor device manufacturing process is usually stored in a desired storage container. Therefore, when used in the semiconductor manufacturing process, the substrate is automatically extracted from the storage container by hand and transported to a target processing (exposure, cleaning, inspection, etc.) station. In order to prevent the substrate from dropping from the hand during transfer, the hand generally holds the substrate by a plurality of vacuum suction pads provided on the holding surface.

【0003】従来、真空吸着により基板を保持する手段
としては、ハンド上の複数のパツドの平行度の誤差が多
少大きくても基板を吸着できるように柔軟性のあるゴム
吸盤を用いるものや、パツドは剛体でも複数パツド間の
平行度誤差を吸収するためにパツドの下にコイルバネや
板バネを敷くものがあった。
Conventionally, as means for holding a substrate by vacuum suction, a means using a rubber sucker which is flexible so as to be able to suck the substrate even if the error in the parallelism of a plurality of pads on the hand is somewhat large, In some cases, a rigid body has a coil spring or a leaf spring laid under the pad to absorb a parallelism error between a plurality of pads.

【0004】図6は前者の従来例を示すゴム吸盤の断面
を示す図で、この例ではゴム吸盤11がハンド12に直
接取り付けられている。ゴム吸盤11のリップ部11a
が基板(不図示)と接触する。ハンド12内に形成され
ているハンド内真空連絡溝12b、真空導入用穴12a
を順に介して供給される真空は、ゴム吸盤11内の真空
導入用穴11bを介して真空吸着用溝11cに供給さ
れ、基板をゴム吸盤11のリップ部11aに真空吸着さ
せる。なお、この図で13はハンド12の底を密閉する
ための蓋である。
FIG. 6 is a sectional view of a rubber sucker showing the former conventional example. In this example, a rubber sucker 11 is directly attached to a hand 12. Lip portion 11a of rubber sucker 11
Contacts a substrate (not shown). In-hand vacuum communication groove 12b, vacuum introduction hole 12a formed in hand 12
Is supplied to the vacuum suction groove 11c through the vacuum introduction hole 11b in the rubber suction cup 11, and the substrate is vacuum-sucked to the lip portion 11a of the rubber suction cup 11. In this figure, reference numeral 13 denotes a lid for sealing the bottom of the hand 12.

【0005】図7は後者の従来例を示す吸着パツドの断
面を示す図で、この例では金属製の吸着パツド14が圧
縮コイルバネ18を介してハンド17に取り付けられ、
ハンド17に対して吸着パツド14の平行出しを行うこ
とを可能にしている。吸着パツド14にはその真空吸着
用溝14aに真空を供給するためのニツプル穴15aを
持つニツプル15が固着され、ニツプル15にはホース
穴16aを持つ真空供給用ホース16が接続されてい
る。ホース16はハンド17の下面に形成されている溝
17aを通っている。
FIG. 7 is a cross-sectional view of a suction pad showing the latter conventional example. In this example, a metal suction pad 14 is attached to a hand 17 via a compression coil spring 18.
The suction pad 14 can be parallelized to the hand 17. A nipple 15 having a nipple hole 15a for supplying a vacuum to the vacuum suction groove 14a is fixed to the suction pad 14, and a vacuum supply hose 16 having a hose hole 16a is connected to the nipple 15. The hose 16 passes through a groove 17 a formed on the lower surface of the hand 17.

【0006】[0006]

【発明が解決しようとする課題】ところで、このような
従来例の内、ゴム吸盤を用いるものはゴム吸盤の洗浄が
困難なため、基板を吸着するときに基板との接触部が基
板を汚染することがあるという問題があった。また、吸
着部を洗浄し易いように剛体のパツドにしたものは、コ
イルバネ等の介在でパツドがハンドと離れているため、
真空を接続するためにニップルやホースを取り付けねば
ならず、構造が複雑で大きくなり、ホースの固さが影響
して平行を出す機能が損なわれていた。
However, of the conventional examples using a rubber sucker, it is difficult to clean the rubber sucker, so that the contact portion with the substrate contaminates the substrate when sucking the substrate. There was a problem that there was. In the case of a pad made of a rigid body so that the suction section is easily cleaned, the pad is separated from the hand by the intervention of a coil spring or the like.
Nipples and hoses had to be attached in order to connect a vacuum, and the structure was complicated and large, and the rigidity of the hoses affected the function of providing parallelism.

【0007】本発明は、このような事情に鑑みなされた
もので、その目的は、基板を汚染することもなく、吸着
の平行が容易にでて真空吸着により基板を正確に保持で
きる小型の基板搬送装置を提供することにある。
SUMMARY OF THE INVENTION The present invention has been made in view of such circumstances, and has as its object to reduce the size of a small-sized substrate that can easily hold a substrate by vacuum suction without easily contaminating the substrate. An object of the present invention is to provide a transport device.

【0008】[0008]

【課題を解決するための手段】上記目的を達成するため
本発明の基板搬送装置は、基板を真空吸着保持するため
のパツドと、前記パツドに真空吸着保持された前記基板
を搬送するためのハンドと、前記パツドと前記ハンドの
間で真空供給用流路を形成する弾性部材を有し、前記パ
ツドは導電性を有するモールド樹脂製であり、前記弾性
部材は前記パツドと前記ハンドの間に介在されたOリン
グ状弾性部材であり、この弾性部材は導電性を有するゴ
ム製であることを特徴としている。
In order to achieve the above object, a substrate transfer apparatus according to the present invention comprises a pad for holding a substrate by vacuum suction and a hand for transferring the substrate held by vacuum suction to the pad. If, have a resilient member forming a vacuum supply passage between the said pads hand, the path
The tongue is made of conductive mold resin,
The member is an O-ring interposed between the pad and the hand.
Elastic member, and the elastic member is a conductive rubber.
The feature is that it is made of rubber .

【0009】なお、前記ハンドには前記パツドが前記弾
性部材を介して複数設けられるようにしても良く、前記
基板を半導体製造装置内で利用されるものとしても良
い。
[0009] The pad is provided with the pad on the hand.
May be provided with a plurality of interposed members,
Substrate can be used in semiconductor manufacturing equipment
No.

【0010】[0010]

【0011】[0011]

【作用】本発明は、基板を真空吸着保持するパツドとこ
のパツドに保持された基板を搬送するためのハンドとの
間に弾性部材を介在させ、この弾性部材介してパツドに
真空を供給して基板を保持している。このため、ゴム吸
盤のように基板を汚染することもなく、また、基板を吸
着した際のパツドの平行を弾性部材の変形により容易に
だすことができるので、真空吸着により基板を正確に保
持できる小型の基板搬送装置の提供が可能である。
According to the present invention, an elastic member is interposed between a pad for holding a substrate by vacuum suction and a hand for transferring the substrate held by the pad, and a vacuum is supplied to the pad via the elastic member. Holding a substrate. Therefore, the substrate is not contaminated unlike a rubber sucker, and the parallelism of the pad when the substrate is sucked can be easily brought out by deformation of the elastic member, so that the substrate can be accurately held by vacuum suction. It is possible to provide a small substrate transfer device.

【0012】ところで、この種のハンドは搬送する基板
(例えば半導体製造工程で利用されるレチクルやマス
ク)が帯電してしまうと、基板内に描かれた半導体装置
製造用のパターンがスパークして斯かるパターンが破壊
することがあるので、導電性の材料にすることも必要で
ある。
In this type of hand, when a substrate to be conveyed (for example, a reticle or mask used in a semiconductor manufacturing process) is charged, a pattern for manufacturing a semiconductor device drawn on the substrate sparks. Since such a pattern may be broken, it is necessary to use a conductive material.

【0013】基板との接触部に導電性のモールド樹脂パ
ツドを設け、その下部に導電性のゴムでできたOリング
状の弾性部材を置けば、基板は導電性材料を介してハン
ドにも接触していることになり、基板の帯電を防止する
こともできる。
If a conductive mold resin pad is provided at a contact portion with the substrate, and an O-ring-shaped elastic member made of conductive rubber is placed under the conductive resin pad, the substrate also comes into contact with the hand via the conductive material. As a result, charging of the substrate can be prevented.

【0014】[0014]

【実施例】図1は本発明の基板搬送装置の特徴を最も良
く表す図である。同図において、1は導電性のモールド
樹脂製のパツドで、1aはその内部を貫通する真空導入
用穴、1bはパッド1上に載置された基板(例えば半導
体製造工程で利用されるレチクルやマスク)を吸着する
際に真空が供給される真空吸着用溝である。
DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is a diagram best representing the features of the substrate transfer apparatus of the present invention. In FIG. 1, reference numeral 1 denotes a pad made of a conductive mold resin, 1a denotes a hole for vacuum introduction penetrating therethrough, and 1b denotes a substrate mounted on the pad 1 (for example, a reticle or a reticle used in a semiconductor manufacturing process). And a vacuum suction groove to which a vacuum is supplied when sucking the mask.

【0015】2はパツド1に吸着保持された基板を搬送
するための搬送用ハンドで、2aはその内部にパツド1
に向けて形成された真空導入用穴であり、この真空導入
用穴2aはパツド1の真空導入用穴1aと略同心となる
ように形成されている。2bは不図示の真空供給源に接
続されたハンド内真空連絡溝で、この溝2bを介して真
空源より供給される真空は、真空導入用穴2a,1aを
順に介してパツド1の真空吸着用溝1bに供給される。
Reference numeral 2 denotes a transfer hand for transferring the substrate sucked and held by the pad 1, and 2a denotes a pad 1 therein.
The vacuum introduction hole 2a is formed so as to be substantially concentric with the vacuum introduction hole 1a of the pad 1. Reference numeral 2b denotes an in-hand vacuum communication groove connected to a vacuum supply source (not shown). The vacuum supplied from the vacuum source through this groove 2b is applied to the pad 1 through the vacuum introduction holes 2a and 1a in order. Is supplied to the groove 1b.

【0016】また、3はハンド2と導電性のモールド樹
脂製のパツド1の間に介在し両者を接続する導電性のゴ
ムでできたOリング(弾性部材)で、ハンド2の真空導
入用穴2aとパツド1の真空導入用穴1aの対向部分の
空間を実質的に密閉し、この部分で真空用の流路を形成
している。4はハンド1内に形成された真空連絡溝2b
の蓋、5,5はパツド1のハンド2からの脱落を防止す
るための脱落防止ネジで、パツド1の端部にそれぞれ設
けられている。
Reference numeral 3 denotes an O-ring (elastic member) made of conductive rubber which is interposed between the hand 2 and the pad 1 made of conductive mold resin and connects the two. The space between the portion 2a and the vacuum introducing hole 1a of the pad 1 is substantially sealed, and a vacuum flow path is formed at this portion. 4 is a vacuum communication groove 2b formed in the hand 1.
Are cap screws 5 for preventing the pad 1 from falling off the hand 2, and are provided at the ends of the pad 1, respectively.

【0017】図2は本発明の搬送系の全体を示す斜視図
で、6は基板9を収納するカセツトの下皿、7は下皿6
に対し略密着するカセツトの上蓋、8は上蓋7を下皿6
に対して開閉する蓋開け機構である。蓋開け機構8によ
って上蓋7が下皿6に対して分離された際、ハンド2は
カセツト内部の基板9を真空吸着により保持した後、カ
セツト内部から取り出して基板9を搬送目的場所10に
搬送する。この搬送目的場所10は、例えばステツパの
ような半導体製造用露光装置においては、露光ステージ
である。
FIG. 2 is a perspective view showing the entire transfer system of the present invention, in which 6 is a lower plate of a cassette for accommodating a substrate 9, and 7 is a lower plate 6.
The upper lid of the cassette which is almost in contact with
This is a lid opening mechanism that opens and closes with respect to. When the upper lid 7 is separated from the lower plate 6 by the lid opening mechanism 8, the hand 2 holds the substrate 9 in the cassette by vacuum suction, takes it out of the cassette, and transports the substrate 9 to the destination 10 for transport. The transfer destination 10 is, for example, an exposure stage in a semiconductor manufacturing exposure apparatus such as a stepper.

【0018】図3はハンド2のみを示した斜視図で、ハ
ンド2には図示の如く4か所にモールド樹脂製のパツド
1が設けられている。これらのパツド1のそれぞれは図
1を用いて前述したように構成されている。図4は図1
に示した実施例の断面図で、Oリング3近辺の断面を示
している。
FIG. 3 is a perspective view showing only the hand 2, and the hand 2 is provided with pads 1 made of mold resin at four places as shown. Each of these pads 1 is configured as described above with reference to FIG. FIG. 4 shows FIG.
Is a cross-sectional view of the embodiment shown in FIG.

【0019】図5は本発明の他の実施例を示す。この実
施例では、Oリング3をパツド1とハンド2の間に設け
る代わりに、樹脂製のパツド1の下部に肉薄の弾性体1
cをパツド1と一体的に形成し、これに図1の弾性部材
3の役目をさせている。この実施例は、図1の実施例に
比してより構成を簡単にできる。
FIG. 5 shows another embodiment of the present invention. In this embodiment, instead of providing the O-ring 3 between the pad 1 and the hand 2, a thin elastic body 1 is provided under the resin pad 1.
c is formed integrally with the pad 1 and serves as the elastic member 3 in FIG. This embodiment can have a simpler configuration than the embodiment of FIG.

【0020】次に、上記実施例の動作を図2を参照しな
がら説明する。蓋開け機構8が基板9を収納しているカ
セツトを開けた後、ハンド2は不図示の駆動機構により
移動されてカセツト内に進入し、下皿6上から基板9の
みを取り出す。基板9はハンド2の上でパツド1に真空
吸着保持され、保持されたまま目的の露光ステージ10
まで搬送され、露光ステージ10に吸着される。
Next, the operation of the above embodiment will be described with reference to FIG. After the lid opening mechanism 8 opens the cassette containing the substrate 9, the hand 2 is moved by the drive mechanism (not shown) and enters the cassette, and takes out only the substrate 9 from the lower plate 6. The substrate 9 is held on the pad 1 by vacuum suction on the hand 2, and the target exposure stage 10 is held while being held.
And is attracted to the exposure stage 10.

【0021】基板9のほぼ中央部には露光されるパター
ンが描かれているので、搬送するときには図3に示す如
く基板の周囲4点を吸着用パツド1により真空吸着し保
持する。実際には4点の平行を出すのは困難なため図5
の従来例ではゴム吸盤11により基板9を真空吸着して
いたが、ゴムは洗浄が難しく基板9を汚染し、基板9に
吸盤の跡が付くような状況であった。
Since a pattern to be exposed is drawn at a substantially central portion of the substrate 9, the four pads around the substrate are vacuum-adsorbed and held by the suction pad 1 as shown in FIG. In practice, it is difficult to make four points parallel.
In the prior art, the substrate 9 was vacuum-sucked by the rubber sucker 11, but the rubber was difficult to clean, and the substrate 9 was contaminated, leaving a trace of the sucker on the substrate 9.

【0022】本実施例の吸着パツド1は、ゴムではなく
剛体であるモールド樹脂でできたパツドであり、パツド
1の下のOリング3の弾性効果により吸着に必要な平行
出しが容易にできる構造である。パツド1の上面には基
板9を真空吸着し易いように真空吸着用溝1bがあり、
更に真空導入用穴1aを通った真空がOリング3内をリ
ークすることなく通り、ハンド2の穴2aからハンド内
真空連絡溝2bを通って真空源につながっている。
The suction pad 1 of this embodiment is a pad made of a rigid mold resin instead of rubber, and has a structure that facilitates parallel alignment required for suction by the elastic effect of the O-ring 3 under the pad 1. It is. A groove 1b for vacuum suction is provided on the upper surface of the pad 1 so that the substrate 9 can be easily suctioned by vacuum.
Further, the vacuum passing through the vacuum introduction hole 1a passes through the O-ring 3 without leaking, and is connected to the vacuum source from the hole 2a of the hand 2 through the in-hand vacuum communication groove 2b.

【0023】パツド1はOリング3により自由に傾くこ
とができる。しかし、パツド1はただOリング3の上に
載せているだけであるし、Oリング3もハンド2の上に
載せてあるだけなので、水平方向に滑ってしまうことが
ないように脱落防止ネジ5によるストツパが効く。つま
り脱落防止ネジ5は完全に閉まっているのでなくパツド
を押えつけない程度の隙間を残して閉められ、緩み防止
のためにネジロックのような処置が施されている。
The pad 1 can be freely tilted by the O-ring 3. However, since the pad 1 is merely mounted on the O-ring 3 and the O-ring 3 is also mounted only on the hand 2, the falling-off prevention screw 5 is provided so as not to slide in the horizontal direction. Stopper works. In other words, the falling-off prevention screw 5 is not completely closed, but is closed with a gap that does not press the pad, and a treatment such as a screw lock is performed to prevent loosening.

【0024】また本実施例のパツド1は導電性のモール
ド樹脂なので基板9が帯電することがない。パツド1と
接触するOリング3も導電性のゴムで金属製のハンドに
接触している。なお、弾性部材はOリング3に限定する
ことなく、例えば図5のように樹脂パツド1の下部を一
体物ではあるが肉薄の弾性体にすることで、Oリングと
同等の効果を出すことも可能である。
Since the pad 1 of this embodiment is a conductive mold resin, the substrate 9 is not charged. The O-ring 3 that contacts the pad 1 is also in contact with a metal hand made of conductive rubber. The elastic member is not limited to the O-ring 3. For example, as shown in FIG. 5, by forming the lower part of the resin pad 1 as an integrated but thin elastic body, the same effect as the O-ring can be obtained. It is possible.

【0025】[0025]

【発明の効果】以上説明したように、本発明によれば、
パツドの下に弾性部材を置くだけの単純な構造で吸着の
平行が容易にで、基板を正確に真空吸着保持できる。更
に、弾性部材を導電性のOリングとすれば、基板を帯電
させることもない小型な基板搬送装置を提供できる。
As described above, according to the present invention,
With a simple structure in which only an elastic member is placed under the pad, parallel suction can be easily performed, and the substrate can be accurately held by vacuum suction. Furthermore, if the elastic member is a conductive O-ring, a small substrate transfer device that does not charge the substrate can be provided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例の要部を示す断面図。FIG. 1 is a sectional view showing a main part of one embodiment of the present invention.

【図2】図1の実施例の全体を示す斜視図。FIG. 2 is a perspective view showing the entire embodiment of FIG. 1;

【図3】図1の実施例のハンドを示した斜視図。FIG. 3 is a perspective view showing the hand of the embodiment of FIG. 1;

【図4】図1とは異なる方向から本実施例を示す断面
図。
FIG. 4 is a sectional view showing the embodiment from a direction different from that of FIG. 1;

【図5】本発明の他の実施例を示す断面図。FIG. 5 is a sectional view showing another embodiment of the present invention.

【図6】従来例を示す断面図。FIG. 6 is a sectional view showing a conventional example.

【図7】他の従来例を示す断面図。FIG. 7 is a sectional view showing another conventional example.

【符号の説明】[Explanation of symbols]

1 パツド 2 ハンド 3 Oリング 5 脱落防止ネジ 9 基板 DESCRIPTION OF SYMBOLS 1 Pad 2 Hand 3 O-ring 5 Captive screw 9 Substrate

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) H01L 21/68 B25J 15/06 B65G 49/07 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 7 , DB name) H01L 21/68 B25J 15/06 B65G 49/07

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 基板を真空吸着保持するためのパツド
と、前記パツドに真空吸着保持された前記基板を搬送す
るためのハンドと、前記パツドと前記ハンドの間で真空
供給用流路を形成する弾性部材を有し、 前記パツドは導電性を有するモールド樹脂製であり、前
記弾性部材は前記パツドと前記ハンドの間に介在された
Oリング状弾性部材であり、この弾性部材は導電性を有
するゴム製であることを特徴とする基板搬送装置。
A pad for vacuum-holding and holding the substrate, a hand for transferring the substrate vacuum-held on the pad, and a vacuum supply flow path between the pad and the hand. An elastic member, the pad is made of conductive mold resin, the elastic member is an O-ring elastic member interposed between the pad and the hand, and the elastic member has electric conductivity. A substrate transfer device made of rubber.
【請求項2】 前記ハンドには前記パツドが前記弾性部
材を介して複数設けられていることを特徴とする請求項
1に記載の基板搬送装置。
2. The substrate transfer apparatus according to claim 1, wherein a plurality of pads are provided on the hand via the elastic member.
【請求項3】 前記基板搬送装置は半導体製造装置内で
利用されるものであることを特徴とする請求項2に記載
の基板搬送装置。
3. The substrate transfer apparatus according to claim 2, wherein said substrate transfer apparatus is used in a semiconductor manufacturing apparatus.
JP14759894A 1994-06-29 1994-06-29 Substrate transfer device Expired - Fee Related JP3200285B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14759894A JP3200285B2 (en) 1994-06-29 1994-06-29 Substrate transfer device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14759894A JP3200285B2 (en) 1994-06-29 1994-06-29 Substrate transfer device

Publications (2)

Publication Number Publication Date
JPH0817896A JPH0817896A (en) 1996-01-19
JP3200285B2 true JP3200285B2 (en) 2001-08-20

Family

ID=15433969

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14759894A Expired - Fee Related JP3200285B2 (en) 1994-06-29 1994-06-29 Substrate transfer device

Country Status (1)

Country Link
JP (1) JP3200285B2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7459701B2 (en) * 2005-06-08 2008-12-02 Asml Netherlands B.V. Stage apparatus, lithographic apparatus and device manufacturing method
JP6224437B2 (en) 2013-11-26 2017-11-01 東京エレクトロン株式会社 Substrate transfer device
JP6486140B2 (en) * 2015-02-25 2019-03-20 キヤノン株式会社 Conveying hand, lithographic apparatus, and method for conveying an object to be conveyed
CN106292194B (en) * 2015-05-24 2018-03-30 上海微电子装备(集团)股份有限公司 Silicon chip transmission system
NL2018243B1 (en) * 2017-01-27 2018-08-07 Suss Microtec Lithography Gmbh Suction apparatus for an end effector, end effector for holding substrates and method of producing an end effector
JP6442563B1 (en) 2017-05-30 2018-12-19 キヤノン株式会社 Conveying hand, conveying apparatus, lithographic apparatus, article manufacturing method and holding mechanism
KR102556368B1 (en) * 2020-10-30 2023-07-18 세메스 주식회사 Transfer hand and substrate processing apparatus

Also Published As

Publication number Publication date
JPH0817896A (en) 1996-01-19

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