JPH08116077A - Manufacturing equipment of thin film photoelectric transducer - Google Patents

Manufacturing equipment of thin film photoelectric transducer

Info

Publication number
JPH08116077A
JPH08116077A JP6250279A JP25027994A JPH08116077A JP H08116077 A JPH08116077 A JP H08116077A JP 6250279 A JP6250279 A JP 6250279A JP 25027994 A JP25027994 A JP 25027994A JP H08116077 A JPH08116077 A JP H08116077A
Authority
JP
Japan
Prior art keywords
chamber
substrate
film
roll
film forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6250279A
Other languages
Japanese (ja)
Other versions
JP2902953B2 (en
Inventor
Hitoshi Shimizu
均 清水
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Corporate Research and Development Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Corporate Research and Development Ltd filed Critical Fuji Electric Corporate Research and Development Ltd
Priority to JP6250279A priority Critical patent/JP2902953B2/en
Publication of JPH08116077A publication Critical patent/JPH08116077A/en
Application granted granted Critical
Publication of JP2902953B2 publication Critical patent/JP2902953B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Landscapes

  • Photovoltaic Devices (AREA)

Abstract

PURPOSE: To prevent the generation of pucker on the surface of a substrate when it is heated, by installing rolls which bring the cylinder surfaces into contact with the substrate sent out of film forming chambers and are cooled by a circulating refrigerant. CONSTITUTION: A substrate 1 is carried from a sending core 31 of a sending chamber 21 to a rolling-up core 32 of a rolling-up chamber 24, through film forming chambers 22, 23. A touch roll 36 faces a sending roll 34, between the sending chamber 21 and the film forming chamber 22. A touch roll 36 and a sending roll 34 face each other, between the film forming chamber 22 and the film forming chamber 23. A touch roll 36 faces a rolling-up roll 35, between the film forming chamber 23 and the rolling-up chamber 24. The substrate 1 coming into contact with the cylinder surfaces of the touch rolls 36 is cooled at the time of carriage, because the touch rolls are cooled by circulating cooling water in the inside. Thereby the pucker which is caused by heating with a heater or by heat given from plasma can be eliminated.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、送り室から巻き取り室
へ向けて搬送される可撓性基板上に各層を成膜する薄膜
光電変換素子の製造装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for manufacturing a thin film photoelectric conversion element for forming each layer on a flexible substrate which is conveyed from a feeding chamber to a winding chamber.

【0002】[0002]

【従来の技術】a−Siを主材料とした光電変換層を含
む各層を長尺の高分子材料あるいはステンレス鋼などの
金属からなる可撓性基板 (以下単に基板と記す) 上に形
成して薄膜光電変換素子を製造する方法は、生産性の点
ですぐれている。長尺の基板上に複数の層を成膜する方
式として、各成膜室内を移動する基板上に成膜するロー
ルツーロール方式と、成膜室内で停止させた基板上に成
膜したのち成膜の終わった基板部分を成膜室外へ送り出
すステッピングロール方式とがある。従来のこの種の成
膜装置は、基板面を水平にして搬送するものであった
が、本出願人の出願にかかる特願平6−120942号
明細書に記載された薄膜光電変換素子製造装置は、基板
面を鉛直にして搬送することにより装置の設置スペース
を節減したもので、その際問題となる基板の下方へのず
れ、たわみを基板の搬送方向を局部的に変えることによ
り搬送ロールの円柱面に基板をある距離だけ密着して通
過するようにして防止している。図3、図4は前記明細
書に添付された図とほぼ同一で、図3に平面断面図、図
4に正面断面図で示すこの装置では、それぞれ架台25
上に設置した送り室21および巻き取り室24の中にコ
ア31および32が軸を鉛直にして保持されており、そ
のため下部に真空シールを備えた軸受53があって、基
準テーパコーン51を軸を鉛直にして保持している。そ
して、基準テーパコーン51の軸には室外に配置したコ
ア駆動モータ54が直結されている。基準テーパコーン
51の直上には従動テーパコーン52が対向している。
従動テーパコーン52は、その上のコアセット機構55
により上下に移動させることができる。基板1をコア3
1からコア32まで搬送するために、送り室21には送
りロール34が、巻き取り室24には巻き取りロール3
5が配置され、それぞれ室外の駆動モータ57が直結さ
れている。その回転軸は真空シールされた軸受56によ
り支持され、送りロール34、巻き取りロール35の両
側に基板の向きを変える中心軸の周りに回動自在のアイ
ドルロール33を備え、送りロール34および巻き取り
ロール35および各アイドルロール33の上部は、上部
支持軸受58で支持し、アイドルロール33の下端は、
それぞれ下部支持軸受59で保持している。送り室2
1、巻き取り室22にはそれぞれ前面に矢印63の方向
に開く扉61、62を備え、この扉61、62を用いて
コア31、32の出し入れ、基板1のセットを行う。成
膜室22、23における基板1への成膜は、接地電極4
2を駆動源49により下降させ、基板1を高電圧電極4
1を囲む壁体44上部のトッププレート45へ押し付
け、接地電極42に内蔵され、交流電源46に接続され
たヒータで基板1を加熱し、基板1と高電圧電極41の
間に生ずる放電室間7にガス71、72を導入し、RF
電源47により高電圧電極41に電圧を印加して成膜空
間7にプラズマを発生させて行う。膜はトッププレート
の開口部48に面した基板1上に形成される。高電圧電
極41は扉73に取り付けられており、扉73を開いて
電極のメンテナンス作業を行うことができる。接地電極
42も同様に扉に取り付けて、メンテナンス作業を容易
にすることができる。
2. Description of the Related Art Each layer including a photoelectric conversion layer containing a-Si as a main material is formed on a flexible substrate (hereinafter simply referred to as a substrate) made of a long polymer material or a metal such as stainless steel. The method of manufacturing a thin film photoelectric conversion element is excellent in productivity. As a method for forming a plurality of layers on a long substrate, there are a roll-to-roll method for forming a film on a substrate moving in each film forming chamber and a method for forming a film on a substrate stopped in the film forming chamber. There is a stepping roll method in which the substrate portion after the film is sent out of the film forming chamber. A conventional film forming apparatus of this type conveys the substrate surface horizontally, but the thin film photoelectric conversion element manufacturing apparatus described in Japanese Patent Application No. 6-120942 filed by the present applicant. Is a device that saves the installation space of the device by making the substrate surface vertical and transporting it. The substrate is prevented from coming in close contact with the cylindrical surface for a certain distance. 3 and 4 are substantially the same as the drawings attached to the above description, and in this apparatus shown in a plan sectional view in FIG. 3 and a front sectional view in FIG.
In the feed chamber 21 and the winding chamber 24 installed above, the cores 31 and 32 are held with their shafts vertically, and therefore there is a bearing 53 with a vacuum seal at the bottom, and the reference taper cone 51 It is held vertically. A core drive motor 54 arranged outdoors is directly connected to the shaft of the reference tapered cone 51. A driven taper cone 52 faces directly above the reference taper cone 51.
The driven taper cone 52 has a core set mechanism 55 on it.
Can be moved up and down. Board 1 to core 3
1 to the core 32, a feed roll 34 is provided in the feed chamber 21 and a take-up roll 3 is provided in the take-up chamber 24.
5 are arranged, and the outdoor drive motors 57 are directly connected to each other. The rotating shaft is supported by a vacuum-sealed bearing 56, and the idle roll 33 is provided on both sides of the feed roll 34 and the take-up roll 35 so as to be rotatable around a central axis that changes the orientation of the substrate. The upper part of the take-up roll 35 and each idle roll 33 is supported by an upper support bearing 58, and the lower end of the idle roll 33 is
Each of them is held by a lower support bearing 59. Sending room 2
1. The winding chamber 22 is provided with doors 61 and 62 that open in the direction of arrow 63 on the front surface, respectively. Using the doors 61 and 62, the cores 31 and 32 are taken in and out, and the substrate 1 is set. The film formation on the substrate 1 in the film formation chambers 22 and 23 is performed by using the ground electrode 4
2 is lowered by the drive source 49 to move the substrate 1 to the high voltage electrode 4
1 is pressed against the top plate 45 above the wall 44 surrounding 1 and the substrate 1 is heated by a heater built in the ground electrode 42 and connected to the AC power supply 46, and between the discharge chambers generated between the substrate 1 and the high voltage electrode 41. Introducing gas 71 and 72 into 7, RF
A voltage is applied to the high-voltage electrode 41 by the power supply 47 to generate plasma in the film formation space 7, and this is performed. The film is formed on the substrate 1 facing the opening 48 of the top plate. The high voltage electrode 41 is attached to the door 73, and the electrode 73 can be opened for maintenance work on the electrode. Similarly, the ground electrode 42 can be attached to the door to facilitate maintenance work.

【0003】基板1の搬送は、送りロール34、巻き取
りロール35および基準テーパコーン51の各々の駆動
モータ57、54を外部に設けた制御装置でサーボ制御
することで、基板面が鉛直面内にあるようにして行う。
The substrate 1 is conveyed by servo-controlling the drive motors 57 and 54 of the feed roll 34, the take-up roll 35, and the reference taper cone 51 by an externally provided control device so that the substrate surface is within the vertical plane. Do it as it is.

【0004】[0004]

【発明が解決しようとする課題】しかし、図3、図4に
示した薄膜光電変換素子製造装置においては、基板加熱
あるいは成膜中のプラズマから受ける熱により基板1に
しわが生じ、これが結果的にコア32における巻きしわ
を発生し、薄膜光電変換素子の損傷をひきおこし、製造
される薄膜光電変換素子の特性に低下をまねく可能性が
ある。また、この装置の量産に適する特長を生かすため
に長尺の基板を仕込もうとした場合、送りコア31およ
び巻き取りコア32の重量が必然的に重くなり、また作
業者がコアを軸を鉛直にして運ぶことは水平にして運ぶ
より困難であることから、基板1の着脱作業に時間が長
くかかる問題がある。さらに、薄膜光電変換素子の生産
量を増やすためには、送りロールから巻き取りロールに
至るラインを並列にすることが望ましい。図5に示すの
は、特願平5−220870号明細書などに記載されて
いる薄膜光電変換素子で、基板1の表面上に金属膜1
1、アモルファスシリコン (a−Si) 膜12、透明導
電膜13が積層され、裏面上に金属膜14が成膜されて
いる。そして、第一電極となる金属膜11は、基板1を
貫通する穴16の中でその内面金属膜13形成時に付着
する金属膜15により裏面電極となる金属膜14と接続
され、第二電極となる透明導電膜13は、a−Si膜1
2、金属膜11および基板1を貫通する穴17の中でそ
の内面に付着する金属膜15により金属膜14の他の部
分と接続される。従ってこの薄膜変換素子では、単一セ
ルの接続のための第一電極11と第二電極12との接続
を裏面での金属膜14の部分間で行うことができる。こ
のような薄膜光電変換素子の製造のためには、透明導電
膜13と金属膜14の成膜を、基板の両面に対して行わ
ねばならない。このような成膜ラインを一つの装置内で
並列にすることは、メンテナンス作業の点から困難であ
るという問題がある。
However, in the thin-film photoelectric conversion element manufacturing apparatus shown in FIGS. 3 and 4, the substrate 1 is wrinkled by heat received from the substrate heating or plasma during film formation, which results in Wrinkles may be generated in the core 32, causing damage to the thin film photoelectric conversion element, which may lead to deterioration in the characteristics of the manufactured thin film photoelectric conversion element. If a long board is to be loaded in order to take advantage of the features suitable for mass production of this device, the weights of the feed core 31 and the take-up core 32 will inevitably be heavy, and the operator will make the axis of the core vertical. Since it is more difficult to carry the substrate 1 than to carry it horizontally, there is a problem that it takes a long time to attach and detach the substrate 1. Further, in order to increase the production amount of the thin film photoelectric conversion element, it is desirable that the lines from the feed roll to the take-up roll are arranged in parallel. FIG. 5 shows a thin film photoelectric conversion element described in Japanese Patent Application No. 5-2220870, in which a metal film 1 is formed on the surface of a substrate 1.
1. An amorphous silicon (a-Si) film 12 and a transparent conductive film 13 are laminated, and a metal film 14 is formed on the back surface. Then, the metal film 11 to be the first electrode is connected to the metal film 14 to be the back surface electrode by the metal film 15 attached at the time of forming the inner surface metal film 13 in the hole 16 penetrating the substrate 1, and to be connected to the second electrode. The transparent conductive film 13 is a-Si film 1.
2. In the hole 17 penetrating the metal film 11 and the substrate 1, the metal film 15 attached to the inner surface thereof is connected to the other part of the metal film 14. Therefore, in this thin film conversion element, the connection between the first electrode 11 and the second electrode 12 for connecting a single cell can be performed between the portions of the metal film 14 on the back surface. In order to manufacture such a thin film photoelectric conversion element, the transparent conductive film 13 and the metal film 14 must be formed on both sides of the substrate. It is difficult from the viewpoint of maintenance work to arrange such film forming lines in parallel in one apparatus.

【0005】本発明の目的は、上述の問題を解決するこ
とにあり、第一の目的は基板が加熱されても基板面にし
わが発生することのない薄膜光電変換素子の製造装置を
提供することにあり、第二の目的は重量のあるコアの着
脱の容易な薄膜光電変換素子の製造装置を提供すること
にある。また、第三の目的は、基板の両面に成膜するラ
インを2列備えた薄膜光電変換素子の製造装置を提供す
ることにある。
An object of the present invention is to solve the above problems, and a first object thereof is to provide an apparatus for manufacturing a thin film photoelectric conversion element in which wrinkles do not occur on the substrate surface even when the substrate is heated. The second object is to provide an apparatus for manufacturing a thin film photoelectric conversion element in which a heavy core can be easily attached and detached. A third object is to provide an apparatus for manufacturing a thin film photoelectric conversion element having two lines for forming a film on both surfaces of a substrate.

【0006】[0006]

【課題を解決するための手段】上記の第一の目的を達成
するために本発明は、送り室から巻き取り室へ回転駆動
される搬送ロールと押さえロールとの間を通して面が鉛
直面内にあるようにして搬送される基板の表面上に、一
つあるいは複数の成膜室内で基板をはさんで対向する電
極間に電圧を印加して成膜する薄膜光電変換素子の製造
装置において、円柱面が成膜室を出た基板に接触する、
冷媒の通流によって冷却されたロールを備えたものとす
る。冷媒が水であることがよい。上記の第二の目的を達
成するために本発明は、送り室から巻き取り室へ回転駆
動される搬送ロールと押さえロールとの間を通して面が
鉛直面内にあるようにして搬送される基板の表面上に、
一つあるいは複数の成膜室内で基板をはさんで対向する
電極間に電圧を印加して成膜する薄膜光電変換素子の製
造装置において、送り室および巻き取り室の外に、基板
を巻回した芯体の保持体の位置を芯体軸の水平位置と鉛
直位置の間で変換できる回転手段と、前記保持体の位置
を上下に変更できる昇降手段と、前記保持体の位置を送
り室あるいは巻き取り室内の芯体装着位置との間で変換
できる前後移動手段とをそれぞれ備えたものとする。上
記の第三の目的を達成するために本発明は、送り室から
巻き取り室へ回動駆動される搬送ロールと押さえロール
との間を通して面が鉛直面内にあるようにして搬送され
る可動性基板上に、複数の成膜室内で基板をはさんで対
向する電極間に電圧を印加して成膜するものにおいて、
2枚の可撓性基板を別個に搬送する二つの搬送径路を有
し、その二つの搬送径路は、共通の送り室を出て、並行
に成膜室を通る並列区間と、その区間に等しい角度をな
して別れて互いに反対の方向に走る単独区間とを有し、
単独区間において基板の一面上に成膜する成膜室と基板
の他面上に成膜する成膜室を通るものとする。
In order to achieve the above-mentioned first object, the present invention provides a surface in a vertical plane between a conveying roll and a pressing roll which are rotationally driven from a feeding chamber to a winding chamber. In a thin-film photoelectric conversion device manufacturing apparatus for applying a voltage between electrodes facing each other across one or more film forming chambers on the surface of a substrate conveyed in a certain manner, The surface contacts the substrate exiting the deposition chamber,
It is assumed to have a roll cooled by the flow of a refrigerant. The refrigerant is preferably water. In order to achieve the above-mentioned second object, the present invention provides a substrate to be conveyed such that a surface is in a vertical plane between a conveying roll and a pressing roll which are rotationally driven from a feeding chamber to a winding chamber. On the surface,
In a thin-film photoelectric conversion device manufacturing apparatus for applying a voltage between electrodes facing each other across a substrate in one or more film forming chambers, the substrate is wound outside the feed chamber and the winding chamber. Rotating means for converting the position of the holding body of the core body between the horizontal position and the vertical position of the core body axis, elevating means for changing the position of the holding body up and down, and the position of the holding body for the feed chamber or A front-rear moving unit that can convert the core body mounting position in the winding chamber is provided. In order to achieve the above-mentioned third object, the present invention provides a movable structure in which a surface is in a vertical plane through a conveying roll and a pressing roll which are rotationally driven from a feeding chamber to a winding chamber. In a method of forming a film on a flexible substrate by applying a voltage between electrodes facing each other across the substrate in a plurality of film forming chambers,
It has two transport paths for separately transporting two flexible substrates, and the two transport paths are equal to a parallel section that exits the common feed chamber and passes through the film formation chambers in parallel. And a single section that splits at an angle and runs in opposite directions,
In a single section, a film forming chamber for forming a film on one surface of the substrate and a film forming chamber for forming a film on the other surface of the substrate are passed.

【0007】[0007]

【作用】成膜室において、成膜温度にするために加熱さ
れ、あるいはプラズマが与えられる熱によって加熱され
た基板に、冷媒の通流によって冷却されたロールの円柱
面を接触させれば熱から生ずる基板のしわを取り除くこ
とができる。送り室および巻き取り室の外にそれぞれ回
転手段、昇降手段および前後移動手段を備えることによ
り、運搬しやすい軸の水平位置にある芯体を鉛直に立
て、高さを調整した後送り室に入れて装着する作業、ま
た成膜後巻き取り室で外して室外へ取り出し、運搬しや
すい軸の水平位置に倒す作業が容易になる。
In the film forming chamber, if the cylindrical surface of the roll cooled by the flow of the refrigerant is brought into contact with the substrate heated to the film forming temperature or heated by the heat given by the plasma, the heat is generated. The resulting substrate wrinkles can be removed. By providing rotating means, lifting means, and front-rear moving means outside the feeding chamber and the winding chamber, respectively, the core at the horizontal position of the shaft that is easy to transport is erected vertically, and after adjusting the height, put it in the feeding chamber. This makes it easy to attach and remove the film after film formation, remove it in the winding room, take it out of the room, and tilt it to the horizontal position of the axis for easy transportation.

【0008】基板の搬送径路を並列区間とそれと等しい
角度をなす単独区間に分け、並列区間では二つの搬送径
路を並行に通して成膜し、単独区間ではメンテナンス位
置が逆になる互いに基板の反対側の面への成膜を行うこ
とにより、単独の搬送径路を別個に配置する場合に比し
て占有面積が小さくなる。また、並列区間と単独区間の
間でもメンテナンスの作業領域の相互干渉を避ける配置
が可能になる。
The substrate transfer path is divided into a parallel section and a single section having an angle equal to the parallel section, and two transfer paths are formed in parallel in the parallel section to form a film, and the maintenance positions are reversed in the single section. By forming the film on the side surface, the occupied area becomes smaller than in the case where a single transport path is separately arranged. Further, it is possible to arrange the parallel work section and the single section so as to avoid mutual interference of the maintenance work areas.

【0009】[0009]

【実施例】以下、図3、図4を含めて共通の部分に同一
の符号を付した図を引用して本発明の実施例について述
べる。図1、図2は、請求項1記載の本発明の一実施例
の薄膜光電変換素子製造装置を示し、図1は平面断面
図、図2は正面断面図である。基板1を送り室21の送
りコア31から成膜室22、23を経て巻き取り室24
の巻き取りコア32へ搬送する機構は図3、図4とほぼ
同じである。基板1をコア31からコア32まで張力を
一定に保って搬送するために、送り室21と巻き取り室
24の基準テーパコーン51を回動させるコア駆動モー
タ54の個々の周速を制御器により検知し、周速の比率
を制御している。成膜室側のアイドルロール38の上端
は、基板1のずれ量を検知するレベルセンサ81の信号
によって前後に動作するアクチュエータ82に保持さ
れ、下端は、下部支持軸受としての球面軸受60で支持
されている。本発明によりタッチロール36が送り室2
1と成膜室22との間で送りロール34と対向して、成
膜室22と成膜室23との間で2本が互いに対向して、
また成膜室23と成膜室24との間で巻き取りロール3
5と対向して配置されている。これらのタッチロール3
6の円柱面で接触する基板1は、タッチロール36が内
部に冷却水37を流すことによって冷却されているの
で、搬送時に冷却される。これにより、基板のヒータに
よる加熱あるいはプラズマから与えられる熱によって基
板のしわを取り除くことができる。この場合、タッチロ
ール36に対向する送りロール34、巻き取りロール3
5も冷却することは、それらのロールと基板との接触面
積が大きいので、しわ除去により有効である。この装置
を用いて、すでに第一電極の金属膜を成膜した基板1の
上に成膜室22でa−Si膜を形成し、成膜室23では
高電圧電極41をターゲット電極としスパッタにより透
明導電膜を積層した。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT An embodiment of the present invention will be described below with reference to FIGS. 3 and 4 in which common parts are designated by the same reference numerals. 1 and 2 show a thin-film photoelectric conversion element manufacturing apparatus according to an embodiment of the present invention described in claim 1. FIG. 1 is a plan sectional view and FIG. 2 is a front sectional view. The substrate 1 is fed from the feeding core 31 of the feeding chamber 21 through the film forming chambers 22 and 23 to the winding chamber 24.
The mechanism for transporting the film to the take-up core 32 is substantially the same as that shown in FIGS. In order to convey the substrate 1 from the core 31 to the core 32 while keeping the tension constant, each peripheral speed of the core drive motor 54 that rotates the reference taper cone 51 of the feed chamber 21 and the winding chamber 24 is detected by the controller. However, the peripheral speed ratio is controlled. The upper end of the idle roll 38 on the film forming chamber side is held by an actuator 82 that moves back and forth according to a signal from a level sensor 81 that detects the amount of displacement of the substrate 1, and the lower end is supported by a spherical bearing 60 as a lower support bearing. ing. According to the present invention, the touch roll 36 has the feed chamber 2
1 between the film forming chamber 22 and the feed roll 34, and between the film forming chamber 22 and the film forming chamber 23, the two rolls face each other.
Further, the winding roll 3 is provided between the film forming chamber 23 and the film forming chamber 24.
It is arranged so as to face 5. These touch rolls 3
Since the touch roll 36 cools the substrate 1 in contact with the cylindrical surface 6 by the cooling water 37 flowing inside, the substrate 1 is cooled during transportation. As a result, the wrinkles of the substrate can be removed by heating the substrate with the heater or heat given from the plasma. In this case, the feed roll 34 and the take-up roll 3 facing the touch roll 36
Cooling 5 is also more effective in removing wrinkles because the contact area between the roll and the substrate is large. Using this apparatus, an a-Si film is formed in the film forming chamber 22 on the substrate 1 on which the metal film of the first electrode has already been formed, and in the film forming chamber 23, the high voltage electrode 41 is used as the target electrode by sputtering. A transparent conductive film was laminated.

【0010】図6、図7は、請求項3記載の本発明の一
実施例の薄膜光電変換装置を成膜室の部分を省略して示
し、図6は平面断面図、図7は正面断面図である。送り
室21のコア31は、送り室に隣接する上下、旋回移動
機構を備えたコア装着装置91により、基準テーパコー
ン51と従動テーパコーン52の間に装着される。巻き
取り室24のコア32は、巻き取り室に隣接するコア取
り出し装置92により取り出される。コア装着装置91
のハンドリング機構93は、1点鎖線で示すようにコア
31を水平姿勢で保持し、ロータリーアクチュエータ9
4により90°旋回して垂直に立てる。送り室21の扉
61の位置が高い場合は、上下移動アクチュエータ95
と移動ガイド96より移動テーブル97が上昇し、コア
31を装着高さまで移動させる。装着高さに達したコア
31を、対向する基準テーパコーン51と従動テーパコ
ーン52の軸線上まで移動させるため、前後移動アクチ
ュエータ98と移動ガイド86により移動テーブル87
を送り室21の方向に移動する。次に、基準テーパコー
ン51のテーパとコア31のテーパが嵌合するように、
移動テーブル97を下方に移動し、従動テーパコーン5
2をコアセット機構55によって下降させてコア31を
装着する。そのあと、コア31を保持していたハンドリ
ング機構93を解除し、移動テーブル87、97により
ハンドリング機構93を所定の位置に待機させる。巻き
取り室24からのコア32の取り出しは、コア取り出し
装置92により、コア装着装置91の逆工程で行う。
FIGS. 6 and 7 show a thin film photoelectric conversion device according to an embodiment of the present invention as defined in claim 3 by omitting the film forming chamber. FIG. 6 is a plan sectional view, and FIG. 7 is a front sectional view. It is a figure. The core 31 of the feed chamber 21 is mounted between the reference taper cone 51 and the driven taper cone 52 by a core mounting device 91 which is adjacent to the feed chamber and has a vertical and swivel moving mechanism. The core 32 of the winding chamber 24 is taken out by the core take-out device 92 adjacent to the winding chamber. Core mounting device 91
The handling mechanism 93 of the rotary actuator 9 holds the core 31 in the horizontal posture as shown by the one-dot chain line.
Rotate 90 ° by 4 and stand vertically. When the position of the door 61 of the feed chamber 21 is high, the vertical movement actuator 95
The moving table 97 rises from the moving guide 96 and moves the core 31 to the mounting height. In order to move the core 31 that has reached the mounting height to the axis of the opposing reference taper cone 51 and driven taper cone 52, the moving table 87 is moved by the forward / backward movement actuator 98 and the movement guide 86.
Is moved toward the feed chamber 21. Next, so that the taper of the reference taper cone 51 and the taper of the core 31 are fitted,
Move the moving table 97 downward to move the driven taper cone 5
2 is lowered by the core setting mechanism 55 and the core 31 is mounted. After that, the handling mechanism 93 holding the core 31 is released, and the handling mechanism 93 is made to stand by at a predetermined position by the moving tables 87 and 97. The removal of the core 32 from the winding chamber 24 is performed by the core removal device 92 in the reverse process of the core mounting device 91.

【0011】図8は、図5に示した薄膜光電変換素子の
製造のために用いられる請求項4に記載の本発明の一実
施例を示す平面断面図である。図5に示す多層構造の光
電変換素子の製造のためには、第一工程として基板1上
に、金属膜11を成膜する。第二工程は、基板1を成膜
した金属膜11と共に貫通するスルーホール16、17
を形成する。第三工程は、基板1に成膜した金属膜11
上にa−Si膜12を成膜し、続いて第四工程として、
a−Si膜12上に透明導電膜13を成膜する。最終工
程において前工程で成膜した基板1の裏面に金属膜14
を成膜する必要がある。図8に示す製造装置において
は、2列の搬送系を備えている。成膜室の構成は、既に
第二工程まで終了した基板1にa−Si膜12を成膜す
る成膜室22、透明導電膜13を成膜する成膜室23、
金属膜14を成膜する成膜室26が搬送系毎にあり、共
通の送り室21につづいて、両成膜室22は一つの真空
室内に形成され、成膜室23、24は成膜室22後に中
間室27をはさんでL字状に曲げて配置されている。こ
のように配置することにより、扉64を開けての成膜室
22のメンテナンス、扉65、66を開けての成膜室2
3、26のメンテナンスは、互いの作業領域が干渉され
ることなく行うことができる。これにより、狭い面積に
生産性の大きい薄膜光電変換素子製造装置を配置するこ
とができる。実施例では、二つの搬送系 L字状に曲げ
ているT字状配置だが、成膜室23、26の扉が開閉で
きる配置であればこの配置に限定されず、例えばY字状
にしてもよい。成膜室26の構造は成膜室23と同一で
あるが、高電圧電極41と接地電極42の位置が基板1
の面に対し対称である。上記成膜工程の第三工程から最
終工程までを1台の装置で成膜する。この実施例では、
旋回機能を備えたハンドリフター99により、コア3
1、32の着脱が行われる。 本発明による薄膜光電変
換素子製造装置は、ロールツーロール方式、ステッピン
グロール方式のいずれにも適用でき、成膜方法も、プラ
ズマCVD法、スパッタ法のいずれを用いることもでき
る。
FIG. 8 is a plan sectional view showing an embodiment of the present invention as set forth in claim 4, which is used for manufacturing the thin film photoelectric conversion element shown in FIG. In order to manufacture the photoelectric conversion element having the multilayer structure shown in FIG. 5, the metal film 11 is formed on the substrate 1 as the first step. In the second step, through holes 16 and 17 penetrating with the metal film 11 on which the substrate 1 is formed are penetrated.
To form. The third step is the metal film 11 formed on the substrate 1.
An a-Si film 12 is formed on the upper surface, and subsequently, as a fourth step,
The transparent conductive film 13 is formed on the a-Si film 12. In the final step, the metal film 14 is formed on the back surface of the substrate 1 formed in the previous step.
It is necessary to form a film. The manufacturing apparatus shown in FIG. 8 is provided with two rows of transport systems. The structure of the film forming chamber is as follows: a film forming chamber 22 for forming the a-Si film 12 on the substrate 1 that has already undergone the second step, a film forming chamber 23 for forming the transparent conductive film 13,
There is a film forming chamber 26 for forming the metal film 14 for each transport system, and following the common feed chamber 21, both film forming chambers 22 are formed in one vacuum chamber, and film forming chambers 23, 24 are formed. After the chamber 22, the intermediate chamber 27 is sandwiched and bent in an L-shape. By arranging in this manner, maintenance of the film forming chamber 22 with the door 64 opened, and film forming chamber 2 with the doors 65 and 66 opened
The maintenance of 3, 26 can be performed without interference of the working areas of each other. Thereby, the thin-film photoelectric conversion element manufacturing apparatus with high productivity can be arranged in a small area. In the embodiment, the two transfer systems are arranged in a T-shape which is bent into an L-shape, but the arrangement is not limited to this as long as the doors of the film forming chambers 23 and 26 can be opened and closed. Good. The structure of the film forming chamber 26 is the same as that of the film forming chamber 23, but the positions of the high voltage electrode 41 and the ground electrode 42 are the same as those of the substrate 1.
Is symmetric with respect to the plane. The film formation process from the third process to the final process is performed by one apparatus. In this example,
The hand lifter 99 with a turning function allows the core 3
1, 32 are attached and detached. The thin-film photoelectric conversion element manufacturing apparatus according to the present invention can be applied to both the roll-to-roll method and the stepping roll method, and the film-forming method can be either the plasma CVD method or the sputtering method.

【0012】[0012]

【発明の効果】本発明によれば、冷媒を通流して冷却し
たロールの円柱面を接触させて成膜時に温度が上昇して
しわが生じた基板を冷却してしわを取り除き、薄膜光電
変換素子の損傷を防止できた。別の本発明によれば、基
板を巻回した芯体の着脱のために芯体保持体の位置を変
える装着装置および取り出し装置を備えたことにより、
量産を行うために基板の長さが長尺となりコア重量が重
くなっても、一人の作業者で容易に着脱作業が行え、作
業性が向上し作業時間の短縮を図ることができた。
According to the present invention, a cylindrical surface of a roll, which has been cooled by flowing a cooling medium, is brought into contact with the substrate to raise the temperature at the time of film formation, and the wrinkled substrate is cooled to remove the wrinkle, and thin film photoelectric conversion is performed. It was possible to prevent damage to the element. According to another aspect of the present invention, by providing a mounting device and a take-out device that change the position of the core body holder for attaching and detaching the core body around which the substrate is wound,
Even if the length of the substrate becomes long and the core weight becomes heavy for mass production, one worker can easily perform the attachment / detachment work, the workability is improved, and the work time can be shortened.

【0013】さらに別の本発明によれば、搬送径路を二
つの径路を並行にした並列区間と単独区間に分け、並列
区間にしにくい基板の両面への成膜は単独区間で行い、
他の成膜を並列区間で行うことにより、装置占有面積の
節減が可能になった。
According to still another aspect of the present invention, the conveying path is divided into a parallel section in which two paths are parallel and a single section, and film formation on both surfaces of a substrate which is difficult to form a parallel section is performed in the single section.
By performing other film formations in parallel sections, it is possible to reduce the area occupied by the device.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例の薄膜光電変換素子製造装置
の平面断面図
FIG. 1 is a plan sectional view of a thin-film photoelectric conversion element manufacturing apparatus according to an embodiment of the present invention.

【図2】図1の薄膜光電変換素子製造装置の正面断面図FIG. 2 is a front sectional view of the thin-film photoelectric conversion element manufacturing apparatus of FIG.

【図3】従来の薄膜光電変換素子製造装置の平面断面図FIG. 3 is a plan sectional view of a conventional thin-film photoelectric conversion element manufacturing apparatus.

【図4】図3の薄膜光電変換素子製造装置の正面断面図FIG. 4 is a front sectional view of the thin-film photoelectric conversion element manufacturing apparatus of FIG.

【図5】本発明の製造装置で製造される薄膜光電変換素
子製造装置の一例の断面図
FIG. 5 is a sectional view of an example of a thin-film photoelectric conversion element manufacturing apparatus manufactured by the manufacturing apparatus of the present invention.

【図6】別の本発明の一実施例である薄膜光電変換素子
製造装置の平面断面図
FIG. 6 is a plan sectional view of a thin-film photoelectric conversion element manufacturing apparatus according to another embodiment of the present invention.

【図7】図6の薄膜光電変換素子製造装置の正面断面図FIG. 7 is a front sectional view of the thin-film photoelectric conversion element manufacturing apparatus of FIG.

【図8】さらに別の本発明の一実施例である薄膜光電変
換素子製造装置の平面断面図
FIG. 8 is a plan sectional view of a thin-film photoelectric conversion element manufacturing apparatus which is still another embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 可撓性基板 21 送り室 22、23、26 成膜室 24 巻き取り室 34 送りロール 35 巻き取りロール 36 タッチロール 37 冷却水 41 高電圧電極 42 接地電極 51 基準テーパコーン 52 従動テーパコーン 91 コア装着装置 92 コア取り出し装置 93 ハンドリング機構 94 ロータリーアクチュエータ 95 上下移動アクチュエータ 98 前後移動アクチュエータ 1 Flexible Substrate 21 Feed Chamber 22, 23, 26 Film Forming Chamber 24 Winding Chamber 34 Feed Roll 35 Winding Roll 36 Touch Roll 37 Cooling Water 41 High Voltage Electrode 42 Grounding Electrode 51 Reference Tapered Cone 52 Driven Tapered Cone 91 Core Mounting Device 92 core take-out device 93 handling mechanism 94 rotary actuator 95 vertical movement actuator 98 longitudinal movement actuator

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】送り室から巻き取り室へ回転駆動される搬
送ロールと押さえロールとの間を通して面が鉛直面内に
あるようにして搬送される可撓性基板の表面上に、一つ
あるいは複数の成膜室内で基板をはさんで対向する電極
間に電圧を印加して成膜するものにおいて、円柱面が成
膜室を出た基板に接触する、冷媒の通流によって冷却さ
れたロールを備えたことを特徴とする薄膜光電変換素子
の製造装置。
1. A flexible substrate which is conveyed with a surface in a vertical plane between a conveying roll and a pressing roll which are rotationally driven from a feed chamber to a winding chamber, and one or In a film formation method in which a voltage is applied between electrodes facing each other across a substrate in a plurality of film formation chambers, a cylindrical surface is in contact with the substrate that has left the film formation chamber, and the roll is cooled by the flow of a refrigerant. An apparatus for manufacturing a thin film photoelectric conversion element, comprising:
【請求項2】冷媒が水である請求項1記載の薄膜光電変
換素子の製造装置。
2. The apparatus for manufacturing a thin film photoelectric conversion element according to claim 1, wherein the refrigerant is water.
【請求項3】送り室から巻き取り室へ回転駆動される搬
送ロールと押さえロールとの間を通して面が鉛直面内に
あるようにして搬送される可撓性基板の表面上に、一つ
あるいは複数の成膜室内で基板をはさんで対向する電極
間に電圧を印加して成膜するものにおいて、送り室およ
び巻き取り室の外に、基板を巻回した芯体の保持体の位
置を芯体軸の水平位置と鉛直位置の間で変換できる回転
手段と、前記保持体の位置を上下に変更できる昇降手段
と、前記保持体の位置を送り室あるいは巻き取り室内の
芯体装着位置との間で変換できる前後移動手段とをそれ
ぞれ備えたことを特徴とする薄膜光電変換素子の製造装
置。
3. One or more of the flexible substrates are conveyed on the surface of the flexible substrate such that the surface is in the vertical plane between the conveying roll and the pressing roll which are rotationally driven from the feeding chamber to the winding chamber. In a film formation in which a voltage is applied between electrodes facing each other across the substrates in a plurality of film formation chambers, the position of the holder of the core body around which the substrates are wound is placed outside the feed chamber and the winding chamber. Rotating means capable of converting between a horizontal position and a vertical position of the core body, an elevating means capable of changing the position of the holding body up and down, a position of the holding body in a feed chamber or a winding chamber, and a core mounting position. An apparatus for manufacturing a thin-film photoelectric conversion element, characterized in that it is provided with a front-back moving means capable of converting between the two.
【請求項4】送り室から巻き取り室へ回動駆動される搬
送ロールと押さえロールとの間を通して面が鉛直面内に
あるようにして搬送される可動性基板上に、複数の成膜
室内で基板をはさんで対向する電極間に電圧を印加して
成膜するものにおいて、2枚の可撓性基板を別個に搬送
する二つの搬送径路を有し、その二つの搬送径路は、共
通の送り室を出て、並行に成膜室を通る並列区間と、そ
の区間に等しい角度をなして別れて互いに反対の方向に
走る単独区間とを有し、単独区間において基板の一面上
に成膜する成膜室と基板の他面上に成膜する成膜室を通
ることを特徴とする薄膜光電変換素子の製造装置。
4. A plurality of film forming chambers are provided on a movable substrate which is conveyed while passing between a conveying roll and a pressing roll which are rotationally driven from a feeding chamber to a winding chamber so that the surface is in a vertical plane. In the case of forming a film by applying a voltage between the electrodes facing each other across the substrate, there are two transport paths for separately transporting two flexible substrates, and the two transport paths are common. Exiting the feed chamber and passing through the film forming chambers in parallel, and a single section that runs at the same angle and separates in opposite directions, and is formed on one surface of the substrate in the single section. An apparatus for manufacturing a thin film photoelectric conversion element, comprising: a film forming chamber for film formation and a film forming chamber for film formation on the other surface of the substrate.
JP6250279A 1994-10-17 1994-10-17 Manufacturing equipment for thin-film photoelectric conversion elements Expired - Fee Related JP2902953B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6250279A JP2902953B2 (en) 1994-10-17 1994-10-17 Manufacturing equipment for thin-film photoelectric conversion elements

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6250279A JP2902953B2 (en) 1994-10-17 1994-10-17 Manufacturing equipment for thin-film photoelectric conversion elements

Publications (2)

Publication Number Publication Date
JPH08116077A true JPH08116077A (en) 1996-05-07
JP2902953B2 JP2902953B2 (en) 1999-06-07

Family

ID=17205539

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6250279A Expired - Fee Related JP2902953B2 (en) 1994-10-17 1994-10-17 Manufacturing equipment for thin-film photoelectric conversion elements

Country Status (1)

Country Link
JP (1) JP2902953B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001339082A (en) * 2000-05-29 2001-12-07 Toppan Printing Co Ltd Vacuum film forming device
JP2009038277A (en) * 2007-08-03 2009-02-19 Fuji Electric Systems Co Ltd Apparatus for manufacturing thin-film laminated member
JP2010177407A (en) * 2009-01-29 2010-08-12 Fuji Electric Holdings Co Ltd Apparatus for manufacturing thin-film laminate
JP2010177344A (en) * 2009-01-28 2010-08-12 Fuji Electric Holdings Co Ltd Device for manufacturing thin film laminate
JP2010177343A (en) * 2009-01-28 2010-08-12 Fuji Electric Holdings Co Ltd Device for manufacturing thin film laminate

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001339082A (en) * 2000-05-29 2001-12-07 Toppan Printing Co Ltd Vacuum film forming device
JP2009038277A (en) * 2007-08-03 2009-02-19 Fuji Electric Systems Co Ltd Apparatus for manufacturing thin-film laminated member
JP2010177344A (en) * 2009-01-28 2010-08-12 Fuji Electric Holdings Co Ltd Device for manufacturing thin film laminate
JP2010177343A (en) * 2009-01-28 2010-08-12 Fuji Electric Holdings Co Ltd Device for manufacturing thin film laminate
JP2010177407A (en) * 2009-01-29 2010-08-12 Fuji Electric Holdings Co Ltd Apparatus for manufacturing thin-film laminate

Also Published As

Publication number Publication date
JP2902953B2 (en) 1999-06-07

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