JPH08157122A - Thin film manufacturing device - Google Patents

Thin film manufacturing device

Info

Publication number
JPH08157122A
JPH08157122A JP6302580A JP30258094A JPH08157122A JP H08157122 A JPH08157122 A JP H08157122A JP 6302580 A JP6302580 A JP 6302580A JP 30258094 A JP30258094 A JP 30258094A JP H08157122 A JPH08157122 A JP H08157122A
Authority
JP
Japan
Prior art keywords
roll
chamber
substrate
winding
core
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6302580A
Other languages
Japanese (ja)
Inventor
Katsuya Tabuchi
勝也 田淵
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP6302580A priority Critical patent/JPH08157122A/en
Publication of JPH08157122A publication Critical patent/JPH08157122A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65HHANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2301/00Handling processes for sheets or webs
    • B65H2301/30Orientation, displacement, position of the handled material
    • B65H2301/32Orientation of handled material
    • B65H2301/323Hanging
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Abstract

PURPOSE: To reduce the device space as well as to avoid winding deviation of a core by horizontally placing the axis of the core for winding a base plate in a feeding chamber and a winding chamber. CONSTITUTION: Cores 31, 32 for winding a base plate 1 are installed in a feeding chamber and a winding chamber with their axes being horizontal. In order to convey the base plate 1 to the core 32 from the core 31, a feeding roll 34 is installed in the feeding chamber, and a winding roll 35 is installed in the winding chamber with their axes being horizontal. Pressing rolls 36 for tightly contacting the rolls with the base plate 1 are faced to the feeding roll 34 and the winding roll 35, so that the rolls may not be deviated from the base plate 1, and idle rolls 33 rotatable around center shafts for changing the direction of the base plate 1 are provided on both sides. The axes of the pressing roll 36 and the idle roller 33 are horizontal. The winding deviation of the cores 31, 32 can be avoided, the installation space can be reduced, and the space for maintenance can be secured.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、送り室から巻き取り室
へ向けて搬送される可撓性基板上に例えば薄膜光電変換
素子の各層を成膜する薄膜製造装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thin film manufacturing apparatus for depositing, for example, each layer of a thin film photoelectric conversion element on a flexible substrate conveyed from a feeding chamber to a winding chamber.

【0002】[0002]

【従来の技術】a−Siを主材料とした光電変換層を含
む各層を長尺の高分子材料あるいはステンレス鋼などの
金属からなる可撓性基板 (以下単に基板と記す) 上に形
成して薄膜光電変換素子を製造する方法は、生産性の点
ですぐれている。長尺の基板上に複数の層を成膜する方
式として、各成膜室内を移動する基板上に成膜するロー
ルツーロール方式と、成膜室内で停止させた基板上に成
膜したのち成膜の終わった基板部分を成膜室外へ送り出
すステッピングロール方式とがある。
2. Description of the Related Art Each layer including a photoelectric conversion layer containing a-Si as a main material is formed on a flexible substrate (hereinafter simply referred to as a substrate) made of a long polymer material or a metal such as stainless steel. The method of manufacturing a thin film photoelectric conversion element is excellent in productivity. As a method for forming a plurality of layers on a long substrate, there are a roll-to-roll method for forming a film on a substrate moving in each film forming chamber and a method for forming a film on a substrate stopped in the film forming chamber. There is a stepping roll method in which the substrate portion after the film is sent out of the film forming chamber.

【0003】これらの薄膜製造装置では、基板を巻いて
ある送りコア、基板を巻き取る巻き取りコアは、ほぼ水
平方向に設置され、基板は水平方向に搬送、成膜され
る。しかしながら、このような装置構成では、基板の短
尺方向の幅よりも装置幅を広くする必要があり、装置の
設置スペースが非常に多く必要となる。また、成膜室を
メンテナンスする場合には、開口部を上下方向に取る必
要があり、装置下部ならびに上部にメンテナンス用のス
ペースを確保する必要があった。さらに、水平面内にあ
る基板表面には、基板や電極上に反応生成物のフレーク
等が付着し、膜特性、素子特性が劣化する問題があっ
た。
In these thin film manufacturing apparatuses, the feed core around which the substrate is wound and the winding core around which the substrate is wound are installed in a substantially horizontal direction, and the substrate is transported and film-formed in the horizontal direction. However, in such a device configuration, it is necessary to make the device width wider than the width of the substrate in the short-side direction, which requires a very large installation space for the device. Further, when maintaining the film forming chamber, it is necessary to take the opening in the vertical direction, and it is necessary to secure a space for maintenance in the lower part and the upper part of the apparatus. Further, on the surface of the substrate lying in the horizontal plane, there is a problem that flakes of reaction products adhere to the substrate and the electrodes and the film characteristics and device characteristics are deteriorated.

【0004】これらの問題を解決するために、特願平6
−120942号明細書には、送りコア、巻き取りコア
を鉛直に設置し、基板を鉛直面内にて搬送し、成膜する
装置が記載されている。図2、図3は上記明細書に添付
された図面である。この薄膜光電変換素子製造装置にお
いては、それぞれ架台25上に設置した送り室21およ
び巻き取り室24の中にコア31および32が軸を鉛直
にして保持されており、そのため下部に真空シールを備
えた軸受53があって、基準テーパコーン51を軸を鉛
直にして保持している。そして、基準テーパコーン51
の軸には室外に配置したコア駆動モータ54が直結され
ている。基準テーパコーン51の直上には従動テーパコ
ーン52が対向している。従動テーパコーン52は、そ
の上のコアアセット機構55により上下に移動させるこ
とができる。基板1をコア31からコア32まで搬送す
るために、送り室21には送りロール34が、巻き取り
室24には巻き取りロール35が配置され、それぞれ室
外の駆動モータ57が直結されている。その回転軸は真
空シールされた軸受56により支持され、送りロール3
4、巻き取りロール35には基板とずれないように密着
させるための押さえロール36が対向すると共に、両側
に基板の向きを変える中心軸の周りに回動自在のアイド
ルロール33を備え、送りロール34あるいは巻き取り
ロール35、押さえロール36、各アイドルロール33
の上部は、上部支持軸受58で支持し、アイドルロール
33、押さえロール36の下端は、それぞれ下部支持軸
受59で保持している。送り室21、巻き取り室22に
はそれぞれ前面に矢印63の方向に開く扉61、62を
備え、この扉61、62を用いてコア31、32の出し
入れ、基板1のセットを行う。成膜室22、23におけ
る基板1への成膜は、基板1を図示しない機構で高電圧
電極41を囲む壁体44上部のトッププレート45へ押
し付け、接地電極42に内蔵され、交流電源46に接続
されたヒータで基板1を加熱し、基板1と高電圧電極4
1の間に生ずる放電室間7にガス71を導入し、RF電
源47により高電圧電極41に電圧を印加して成膜空間
7にプラズマを発生させて行う。膜はトッププレートの
開口部48に面した基板1上に形成される。高電圧電極
41は扉72に取り付けられており、扉72を矢印73
の方向に開いて電極のメンテナンス作業を行うことがで
きる。接地電極42も同様に扉に取り付けて、メンテナ
ンス作業を容易にすることができる。
In order to solve these problems, Japanese Patent Application No.
No. 120942 describes an apparatus in which a feed core and a take-up core are installed vertically and a substrate is conveyed in a vertical plane to form a film. 2 and 3 are drawings attached to the above specification. In this thin-film photoelectric conversion element manufacturing apparatus, the cores 31 and 32 are held in the feed chamber 21 and the winding chamber 24, respectively, which are installed on the pedestal 25 with their axes being vertical, and therefore a vacuum seal is provided at the bottom. There is a bearing 53, which holds the reference tapered cone 51 with its axis vertical. Then, the standard taper cone 51
A core drive motor 54 arranged outdoors is directly connected to the shaft of the. A driven taper cone 52 faces directly above the reference taper cone 51. The driven taper cone 52 can be moved up and down by the core asset mechanism 55 thereon. In order to convey the substrate 1 from the core 31 to the core 32, a feed roll 34 is arranged in the feed chamber 21 and a winding roll 35 is arranged in the winding chamber 24, and an outdoor drive motor 57 is directly connected thereto. The rotating shaft is supported by a vacuum-sealed bearing 56, and the feed roll 3
4. The take-up roll 35 is opposed to a pressing roll 36 for closely contacting the substrate so that the substrate does not shift, and an idle roll 33 that is rotatable around a central axis that changes the direction of the substrate is provided on both sides. 34 or winding roll 35, pressing roll 36, each idle roll 33
Is supported by an upper support bearing 58, and lower ends of the idle roll 33 and the pressing roll 36 are respectively supported by a lower support bearing 59. The feed chamber 21 and the take-up chamber 22 are provided with doors 61 and 62 that open in the direction of arrow 63 on the front surface, respectively. The doors 61 and 62 are used to take in and out the cores 31 and 32 and set the substrate 1. The film formation on the substrate 1 in the film forming chambers 22 and 23 is performed by pressing the substrate 1 against the top plate 45 above the wall body 44 surrounding the high voltage electrode 41 by a mechanism (not shown), which is built into the ground electrode 42 and supplied to the AC power supply 46. The substrate 1 is heated by the heater connected to the substrate 1 and the high voltage electrode 4
The gas 71 is introduced into the space 7 between the discharge chambers generated during 1 and a voltage is applied to the high voltage electrode 41 by the RF power source 47 to generate plasma in the film forming space 7. The film is formed on the substrate 1 facing the opening 48 of the top plate. The high voltage electrode 41 is attached to the door 72, and the door 72 is attached to the arrow 73.
The electrode can be opened for maintenance work. Similarly, the ground electrode 42 can be attached to the door to facilitate maintenance work.

【0005】基板1の搬送は、送りロール34、巻き取
りロール35および基準テーパコーン51の各々の駆動
モータ57、54を外部に設けた制御装置でサーボ制御
することで、基板面が鉛直面内にあるようにして行う。
The substrate 1 is conveyed by servo-controlling the drive motors 57 and 54 of the feed roll 34, the take-up roll 35 and the reference taper cone 51 by an externally provided control device so that the substrate surface is within the vertical plane. Do it as it is.

【0006】[0006]

【発明が解決しようとする課題】図2、図3に示した薄
膜製造装置では、基板を鉛直面内で搬送、成膜するすめ
に、送り室21および巻き取り室24の中にコア31お
よび32を軸を鉛直にして保持している。このコア31
および32では巻かれている基板1が自重によりコア上
でずれ落ちる問題が生じた。特に、基板上に導電性薄膜
が形成されていると、基板同志が滑りやすくなり、巻き
ずれが生じやすくなる。また、弱い張力で基板をコアに
巻いた場合にも、巻きずれが生じやすい。
In the thin film manufacturing apparatus shown in FIGS. 2 and 3, the core 31 and the winding chamber 24 are provided in the feeding chamber 21 and the winding chamber 24 so that the substrate is transported and film-formed in the vertical plane. The shaft 32 is held vertically. This core 31
In Nos. 32 and 32, there was a problem that the wound substrate 1 slipped on the core due to its own weight. In particular, when the conductive thin film is formed on the substrate, the substrates become slippery, and winding deviation easily occurs. Further, even when the substrate is wound around the core with a weak tension, the winding deviation easily occurs.

【0007】本発明の目的は、この巻きずれの問題を解
決し、基板を鉛直面内で搬送、成膜することのできる薄
膜製造装置を提供することにある。
An object of the present invention is to solve the problem of winding deviation and to provide a thin film manufacturing apparatus capable of transporting a substrate within a vertical plane to form a film.

【0008】[0008]

【課題を解決するための手段】上記の目的を達成するた
めに、本発明は、送り室にある芯体上に巻回された基板
を成膜室内を通じて面が鉛直面内にあるように搬送して
成膜室内で表面上に成膜し、巻き取り室内にある芯体上
に巻回する薄膜製造装置において、送り室および巻き取
り室にある芯体の少なくとも一方が軸を水平にして設置
されたものとする。軸を水平にして設置された芯体と成
膜室との間に軸が水平方向と鉛直方向との間にある方向
に傾斜しているロールが設置され、可撓性基板がそのロ
ールの円柱面に沿って搬送されることが良い。その軸が
傾斜したロールの表面に基板面との摩擦係数を減らす処
理を施されたことが有効である。
In order to achieve the above object, the present invention conveys a substrate wound on a core in a feed chamber so that the surface is in a vertical plane through the film formation chamber. In a thin film manufacturing apparatus that deposits a film on the surface in the film forming chamber and winds it around the core in the winding chamber, at least one of the core in the feed chamber and the winding chamber is installed with its axis horizontal. It has been done. A roll whose axis is inclined in a direction between a horizontal direction and a vertical direction is installed between a core body installed with its axis horizontal and a film forming chamber, and a flexible substrate is a cylinder of the roll. It may be conveyed along the surface. It is effective that the surface of the roll whose axis is inclined is subjected to a treatment to reduce the coefficient of friction with the substrate surface.

【0009】[0009]

【作用】芯体上に巻回された基板の巻きずれは、芯体軸
が鉛直であることによって起こるので、送り室あるいは
巻き取り室にある芯体の軸を水平にすれば、巻きずれの
問題は解決する。そして、膜特性の確保のために基板を
鉛直面内で搬送する成膜室との間に、軸が水平と鉛直の
間の方向に向くロールを配置し、その円柱面に沿って基
板を搬送することにより、基板面の水平面内と鉛直面内
との変換が容易にできる。さらに、そのような軸の傾い
たロールの円柱面上では、基板が横滑りする必要がある
ため、ロール表面に摩擦係数を減らす処理を施せば、円
滑に横滑りする。
The winding deviation of the substrate wound on the core body occurs because the axis of the core body is vertical. Therefore, if the axis of the core body in the feeding chamber or the winding chamber is horizontal, The problem is solved. Then, in order to secure the film characteristics, a roll whose axis is oriented in the direction between the horizontal and the vertical is placed between the substrate and the deposition chamber that transports the substrate in the vertical plane, and the substrate is transported along the cylindrical surface. By doing so, the conversion between the horizontal plane of the substrate surface and the vertical plane can be easily performed. Further, on such a cylindrical surface of the roll having an inclined axis, the substrate needs to slide sideways, and therefore, if the surface of the roll is subjected to a treatment for reducing the friction coefficient, the roll slides smoothly.

【0010】[0010]

【実施例】以下、図2、図3と共通の部分に同一の符号
を付した図を引用して本発明の実施例について述べる。
図1に示した薄膜製造装置においては、送り室21、巻
き取り室24には、基板1を巻いてあるコア31、それ
を巻き取るコア32が軸を水平にして設置されている。
基板1をコア31からコア32まで搬送するために、送
り室には送りロール34が、巻き取り室には巻き取りロ
ール35がいずれも軸を水平にして設置されている。送
りロール34、巻き取りロール35には、基板とずれな
いように密着させるための押さえロール36が対向する
と共に、両側に基板の向きを変える中心軸の回りに回転
自在のアイドルロール33を備えている。これらの押さ
えロール36、アイドルロール33も軸が水平である。
さらに、コア31と成膜室22との間、およびコア32
と成膜室23との間に、軸が基板1の短尺方向と平行で
なく、コア31、32の軸に対して角度をなしているね
じりロール37を設置し、基板1を水平面内から鉛直面
内、および鉛直面内から水平面内に変換して搬送するこ
とを可能にしている。この図では、各3本のねじりロー
ル37を設置した例について示しているが、ねじりロー
ルの数は3本以上でも良いことは言うまでもない。ねじ
りロールの数を増やすことにより、一本のねじりロール
により基板1のねじられる角度を低減することができ
る。成膜室22の直前および成膜室23の直後には、軸
が鉛直のアイドルロール38が設置されている。
Embodiments of the present invention will be described below with reference to the drawings in which the same parts as those in FIGS.
In the thin film manufacturing apparatus shown in FIG. 1, in the feed chamber 21 and the winding chamber 24, a core 31 around which the substrate 1 is wound and a core 32 around which the substrate 1 is wound are installed with their axes horizontal.
In order to convey the substrate 1 from the core 31 to the core 32, a feed roll 34 is installed in the feed chamber, and a take-up roll 35 is installed in the take-up chamber with their axes being horizontal. The feed roll 34 and the take-up roll 35 are opposed to a pressing roll 36 for tightly contacting the substrate so that the substrate does not shift, and an idle roll 33 that is rotatable around a central axis that changes the direction of the substrate is provided on both sides. There is. The axes of the pressing roll 36 and the idle roll 33 are also horizontal.
Further, between the core 31 and the film forming chamber 22, and the core 32.
Between the film forming chamber 23 and the film forming chamber 23, a twisting roll 37 whose axis is not parallel to the short-side direction of the substrate 1 and forms an angle with the axes of the cores 31 and 32 is provided, and the substrate 1 is vertically aligned from the horizontal plane. It is possible to transfer from within the plane and within the vertical plane to the horizontal plane. In this figure, an example in which three twist rolls 37 are installed is shown, but it goes without saying that the number of twist rolls may be three or more. By increasing the number of twisting rolls, the twisting angle of the substrate 1 by one twisting roll can be reduced. Immediately before the film forming chamber 22 and immediately after the film forming chamber 23, an idle roll 38 having a vertical axis is installed.

【0011】成膜室は、22、23の二つに限定されず
単一でも3室以上でもよい。成膜方式としては、各成膜
室内を移動する基板1上に成膜するロールツーロール方
式、あるいは、成膜室内で停止させた基板1上に成膜し
た後成膜の終わった基板部分を成膜室外へ送り出すステ
ッピングロール方式のどちらでも良いし、両者が混在し
ていても良い。成膜方法は、主原料ガスにSiH4 、S
2 6 、Si2 Cl 2 2 の少なくとも一つを用いた
非晶質Si、微結晶Si、多結晶Si等を形成するプラ
ズマCVD法などの化学気相反応法、Ag、Al、Cr
等の金属や、ITO、ZnO、SnO2 、SiOx 等の
金属酸化物を形成するスパッタリング法、蒸着法など、
何でも良い。成膜室内で基板を鉛直面内で巻きずれ、位
置ずれを起こすことなく搬送する手段としては、上記の
明細書に記載された技術を採ればよい。
The film forming chamber is not limited to the two 22 and 23.
It may be a single room or three or more rooms. As the film formation method, each film formation
Roll-to-roll method for forming a film on a substrate 1 moving in a room
Film formation, or film formation on the substrate 1 stopped in the film formation chamber
After the film formation, the substrate part where the film formation is completed is sent to the outside of the film formation chamber.
Either of the wrapping roll methods may be used, or both may be mixed.
It may be. The film formation method uses SiH as the main source gas.Four, S
i2H6, Si2Cl 2H2At least one of
A plastic for forming amorphous Si, microcrystalline Si, polycrystalline Si, etc.
Chemical vapor phase reaction method such as Zuma CVD method, Ag, Al, Cr
Metal such as ITO, ZnO, SnO2, SiOx, etc.
Sputtering method for forming metal oxide, vapor deposition method, etc.
anything is fine. The substrate is misaligned in the vertical plane in the deposition chamber.
As a means for transporting without causing misalignment, the above
The technique described in the specification may be adopted.

【0012】図1の実施例では、送り室21、巻き取り
室24の両方のコア31、32を水平に設置している
が、もちろん、特に巻きずれによって支障の生ずるどち
らか一方を水平に設置し、他方を垂直に設置していても
良い。図4は、基板1とねじりロール37の位置関係を
示した図である。この図に示すように、基板1はねじり
ロール37に接して搬送される間に横方向に対して図に
示すΔxだけ滑る必要がある。そのため、基板1、ある
いは、基板上に形成された薄膜との摩擦係数を低下させ
る処理を特にねじりロール37について行った。この処
理は、ねじりロール37の表面に基板1、あるいは基板
上に形成された薄膜との摩擦係数を低下させる物質を蒸
着、あるいは塗布する等により行われる。この結果、基
板1はねじりロール37上を搬送される間に円滑に横方
向に滑り、基板の位置ずれ、コア上での巻きずれや基板
上に形成された薄膜、素子の特性劣化が少なくなった。
In the embodiment of FIG. 1, both the cores 31 and 32 of the feeding chamber 21 and the winding chamber 24 are horizontally installed, but of course, one of them, which is particularly troubled by winding misalignment, is horizontally installed. However, the other may be installed vertically. FIG. 4 is a diagram showing a positional relationship between the substrate 1 and the twist roll 37. As shown in this figure, the substrate 1 needs to slide laterally by Δx shown in the figure while being conveyed in contact with the twisting roll 37. Therefore, the treatment for reducing the coefficient of friction with the substrate 1 or the thin film formed on the substrate was performed especially for the twist roll 37. This treatment is performed by vapor-depositing or applying a substance that reduces the coefficient of friction with the substrate 1 or the thin film formed on the substrate on the surface of the twist roll 37. As a result, the substrate 1 smoothly slides in the lateral direction while being conveyed on the twisting roll 37, and the positional displacement of the substrate, the winding displacement on the core, the thin film formed on the substrate, and the characteristic deterioration of the element are reduced. It was

【0013】[0013]

【発明の効果】本発明によれば、基板を鉛直面内におい
て成膜する薄膜製造装置において、送り室、巻き取り室
では基板を巻回する芯体の軸を水平にすることにより、
巻回した基板の巻きずれの問題がなくなり、しかも装置
スペースの節減、メンテナンス用スペースの確保は可能
で、良好な膜特性の薄膜の製造装置を得ることができ
る。
According to the present invention, in a thin film manufacturing apparatus for forming a film on a substrate in a vertical plane, the axis of the core body around which the substrate is wound is horizontal in the feed chamber and the winding chamber.
The problem of winding misalignment of the wound substrate is eliminated, the space for the device can be saved, the space for maintenance can be secured, and a thin film manufacturing apparatus with good film characteristics can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例の薄膜製造装置の構成図FIG. 1 is a configuration diagram of a thin film manufacturing apparatus according to an embodiment of the present invention.

【図2】従来の薄膜光電素子製造装置の正面断面図FIG. 2 is a front sectional view of a conventional thin-film photoelectric device manufacturing apparatus.

【図3】従来の薄膜光電素子製造装置の平面断面図FIG. 3 is a plan sectional view of a conventional thin-film photoelectric device manufacturing apparatus.

【図4】図1の装置のねじりロール近傍部の斜視図4 is a perspective view of the vicinity of the twist roll of the apparatus of FIG.

【符号の説明】[Explanation of symbols]

1 可撓性基板 21 送り室 22、23 成膜室 24 巻き取り室 31、32 コア 33、38 アイドルロール 34 送りロール 35 巻き取りロール 36 押さえロール 37 ねじりロール 1 Flexible Substrate 21 Feed Chamber 22, 23 Film Forming Chamber 24 Winding Chamber 31, 32 Core 33, 38 Idle Roll 34 Feed Roll 35 Winding Roll 36 Pressing Roll 37 Twisting Roll

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】送り室にある芯体上に巻回された可撓性基
板を成膜室内を通じて面が鉛直面内にあるように搬送し
て成膜室内で表面上に成膜し、巻き取り室内にある芯体
上に巻回するものにおいて、送り室および巻き取り室に
ある芯体の少なくとも一方が軸を水平にして設置された
ことを特徴とする薄膜製造装置。
1. A flexible substrate wound on a core body in a feed chamber is conveyed through a film forming chamber so that the surface is in a vertical plane, and a film is formed on the surface in the film forming chamber and wound. What is wound around a core in a take-up chamber, wherein at least one of the core in the feed chamber and the take-up chamber is installed with its axis horizontal.
【請求項2】軸を水平にして設置された芯体と成膜室と
の間に軸が水平方向と鉛直方向との間にある方向に傾斜
しているロールが設置され、可撓性基板がそのロールの
円柱面に沿って搬送される請求項1記載の薄膜製造装
置。
2. A flexible substrate, wherein a roll having an axis inclined in a direction between a horizontal direction and a vertical direction is installed between a core body installed with the axis horizontal and a film forming chamber. The thin film manufacturing apparatus according to claim 1, wherein the film is conveyed along the cylindrical surface of the roll.
【請求項3】軸が傾斜したロールの表面に可撓性基板面
との摩擦係数を減らす処理が施された請求項2記載の薄
膜製造装置。
3. The thin film manufacturing apparatus according to claim 2, wherein the surface of the roll whose axis is inclined is subjected to a treatment for reducing the coefficient of friction with the surface of the flexible substrate.
JP6302580A 1994-12-07 1994-12-07 Thin film manufacturing device Pending JPH08157122A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6302580A JPH08157122A (en) 1994-12-07 1994-12-07 Thin film manufacturing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6302580A JPH08157122A (en) 1994-12-07 1994-12-07 Thin film manufacturing device

Publications (1)

Publication Number Publication Date
JPH08157122A true JPH08157122A (en) 1996-06-18

Family

ID=17910694

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6302580A Pending JPH08157122A (en) 1994-12-07 1994-12-07 Thin film manufacturing device

Country Status (1)

Country Link
JP (1) JPH08157122A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009038276A (en) * 2007-08-03 2009-02-19 Fuji Electric Systems Co Ltd Apparatus for manufacturing thin-film laminated member

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009038276A (en) * 2007-08-03 2009-02-19 Fuji Electric Systems Co Ltd Apparatus for manufacturing thin-film laminated member

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