JPH081115A - Cleaning of precision parts - Google Patents
Cleaning of precision partsInfo
- Publication number
- JPH081115A JPH081115A JP14132794A JP14132794A JPH081115A JP H081115 A JPH081115 A JP H081115A JP 14132794 A JP14132794 A JP 14132794A JP 14132794 A JP14132794 A JP 14132794A JP H081115 A JPH081115 A JP H081115A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning liquid
- cleaning
- cleaned
- water
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は精密部品の洗浄方法に関
するものであり、詳細には、ステンレス鋼、炭素鋼ある
いはアルミニウム等の金属材料からなる精密切削部品の
表面に付着している微細な切粉や塵埃等を除去するため
の強制洗浄手段を提供するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for cleaning precision parts, and more particularly, it relates to a fine cutting part adhered to the surface of a precision cutting part made of a metal material such as stainless steel, carbon steel or aluminum. The present invention provides a forced cleaning means for removing powder and dust.
【０００２】[0002]
【従来の技術】ステンレス鋼、炭素鋼、軟鉄、アルミニ
ウムあるいはアルミニウム合金等の金属材料からなる精
密切削部品の表面に付着している微細な切粉や塵埃を除
去するための洗浄手段として、例えば特公平４−４５２
２５号公報に記載する超音波洗浄装置や水またはエアの
吹付けを利用する流体噴射装置などが知られている。2. Description of the Related Art For example, as a cleaning means for removing fine chips and dust adhering to the surface of precision cutting parts made of metal materials such as stainless steel, carbon steel, soft iron, aluminum or aluminum alloys, for example, Fair 4-452
An ultrasonic cleaning device described in Japanese Patent No. 25, a fluid ejecting device utilizing spraying of water or air, and the like are known.
【０００３】また、前記精密切削部品の表面や微細穴に
発生している微細なバリや、これらの部分に付着してい
る切粉の除去手段として電解加工や砥粒流動加工が知ら
れている。Further, electrolytic machining and abrasive grain flow machining are known as means for removing fine burrs generated on the surface and fine holes of the precision cutting parts and chips adhering to these portions. .
【０００４】電解加工は、予め成型した加工用ツールを
陰極とし、被加工物を陽極とし、両者を僅かな間隔を隔
てて対向させた状態で前記間隙へ加圧電解液を高速で流
下させ、直流電流を流しながら前記加工用ツールを被加
工物に進入させ、被加工物を電気分解によって主とて金
属水酸化物として電解液中に溶出させる表面加工方法で
ある。In electrolytic processing, a preformed processing tool is used as a cathode, an object to be processed is used as an anode, and the two are opposed to each other with a slight gap, and a pressurized electrolytic solution is caused to flow down into the gap at a high speed. This is a surface processing method in which the processing tool is allowed to enter a work piece while a direct current is applied, and the work piece is electrolyzed to elute mainly in the electrolyte as a metal hydroxide.
【０００５】一方、砥粒流動加工は、粘土状の高分子材
料を媒体として砥粒を包み込んだ粘弾性研摩剤で被加工
物の表面や穴に発生しているバリを除去するバリ取り加
工方法である。On the other hand, the abrasive grain flow processing is a deburring method for removing burrs generated on the surface or holes of a workpiece with a viscoelastic abrasive wrapping the abrasive grains with a clay-like polymer material as a medium. Is.
【０００６】[0006]
【発明が解決しようとする課題】特に半導体などに用い
られる精密部品に於ては異物の付着は即不良原因となる
ため部品を高度に清浄化することが要望されている。し
かしながら従来の流体噴射方式では、被洗浄部品に対し
て水又はエアが一方向から噴射されるため、被洗浄部品
の形状によっては洗浄媒体の吹付けが充分に行われない
部分が残り、洗浄効果が阻害されることが少なくない。Particularly in precision parts used for semiconductors and the like, adhesion of foreign matters immediately causes defects, and therefore it is demanded to highly clean the parts. However, in the conventional fluid jet method, water or air is jetted from one direction to the part to be cleaned, so that depending on the shape of the part to be cleaned, there is a portion where the cleaning medium is not sufficiently sprayed, and the cleaning effect remains. Is often blocked.
【０００７】また、電解加工方式や砥粒流動加工方式を
採用した場合には、装置が複雑、かつ、大型化すること
によって加工コストが高騰するほか、被加工物の形状が
複雑な場合あるいは被加工物に微細な穴がある場合、１
工程での処理が困難になり、生産性が低下してしまう。
更に、被加工物に寸法や形状の変化があった場合、加工
装置の仕様と運転条件を前記変化に対応して変更する必
要があり、インデックスの低下が著しい。Further, when the electrolytic processing method or the abrasive grain flow processing method is adopted, the processing cost rises due to the complicated and large size of the apparatus, and when the shape of the workpiece is complicated or If the workpiece has fine holes, 1
The process becomes difficult and the productivity is reduced.
Furthermore, when the size or shape of the workpiece changes, it is necessary to change the specifications of the processing apparatus and the operating conditions in response to the changes, and the index is significantly reduced.
【０００８】[0008]
【課題を解決するための手段】前記課題の解決手段とし
て本発明は、上下両端面に洗浄液の流入口と流出口を開
口させた上下２分割型の密封器室内に被洗浄部品を封入
し、この密封器室に連設された洗浄液供給装置から前記
流入口及び流出口を通して前記密封器室内に砥粒と水溶
性防錆剤を水、アルコールまたは水とアルコールの混合
液中に分散させた洗浄液を導入し、前記流入口と流出口
の間で洗浄液の流入・流出方向を少なくとも１回以上反
転させながら所定時間に亘って洗浄処理した後、前記密
封器室から取出した被洗浄部品を水洗することを特徴と
する精密部品の洗浄方法を提供するものである。As a means for solving the above problems, the present invention encloses a part to be cleaned in an upper and lower two-part type sealer chamber in which an inlet and an outlet of a cleaning liquid are opened on both upper and lower end surfaces, A cleaning liquid in which abrasive grains and a water-soluble rust preventive are dispersed in water, alcohol, or a mixed liquid of water and alcohol through the inflow port and the outflow port from the cleaning liquid supply device connected to the sealing chamber. Is introduced, and the inflow and outflow directions of the cleaning liquid are reversed at least once between the inflow port and the outflow port, and after the cleaning process for a predetermined time, the parts to be cleaned taken out from the sealed chamber are washed with water. The present invention provides a method for cleaning precision parts, which is characterized by the above.
【０００９】砥粒として適量の防錆剤と共に洗浄液中に
配合するアルミナ、ダイヤモンドあるいは炭化珪素の微
細粒子は、平均粒径を０．１μｍ乃至１０μｍの範囲に
設定し、洗浄液に対する配合量は０．２乃至１０重量パ
ーセントに調整する。The fine particles of alumina, diamond or silicon carbide to be incorporated into the cleaning liquid together with an appropriate amount of rust preventive as abrasive grains have an average particle size in the range of 0.1 μm to 10 μm, and the mixing amount to the cleaning liquid is 0.1. Adjust to 2 to 10 weight percent.
【００１０】また、密封器室内に導入する洗浄液の圧力
は、被洗浄部品の形状と寸法に応じて５乃至１５０ｋｇ
／ｃｍ2の範囲に設定する。The pressure of the cleaning liquid introduced into the sealed chamber is 5 to 150 kg depending on the shape and size of the parts to be cleaned.
/ Cm 2 range.
【００１１】[0011]
【作用】密封器室内に被洗浄部品を封入し、密封器室の
上下両端面に対向配置状態で設けられた流入口と流出口
から密封器室内に洗浄液を噴射することによって、被洗
浄部品の表面や微細穴内に付着している切粉や塵埃を強
制洗浄する。この際、被洗浄部品に対する洗浄液の噴射
方向を所定の時間的周期で１回以上反転させ、これによ
って従来生じ勝ちであった洗浄不良を解消する。The parts to be cleaned are sealed by enclosing the parts to be cleaned in the sealer chamber and injecting the cleaning liquid into the sealer chamber from the inflow port and the outflow port, which are provided on the upper and lower end surfaces of the sealer chamber so as to face each other. Forcefully clean the chips and dust adhering to the surface and inside the fine holes. At this time, the direction of spraying the cleaning liquid onto the parts to be cleaned is reversed once or more at a predetermined time cycle, thereby eliminating the cleaning failure that is apt to occur in the past.
【００１２】[0012]
【実施例】以下、図１を参照しながら本発明の一具体例
を説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A specific example of the present invention will be described below with reference to FIG.
【００１３】強制洗浄装置（２０）は、内部に被洗浄部
品（１２）の収納空間（１６）を形成し、シーリング部
材（１１）を介して上下１対に密封接合される上側治具
（９）と下側治具（１０）に流路切替弁、例えば三方弁
Ｖ1、Ｖ2、Ｖ3を介して洗浄液の供給管路（１５）、
（１４）、（２）、（３）、（５）と排出管路（４）
（６）（７）を接続することによって、被洗浄部品（１
２）の収納空間（１６）内への洗浄液の噴射方向が上側
治具（９）側と下側治具（１０）側に交互に切替わる強
制洗浄手段を形成している。The forced cleaning device (20) forms an accommodation space (16) for the part to be cleaned (12) inside, and an upper jig (9) which is hermetically joined to a pair of upper and lower parts through a sealing member (11). ) And the lower jig (10) through a flow path switching valve, for example, a three-way valve V 1 , V 2 , V 3 to supply a cleaning liquid supply pipe (15),
(14), (2), (3), (5) and discharge line (4)
(6) By connecting (7), the part to be cleaned (1
A forced cleaning means is formed in which the direction of injection of the cleaning liquid into the storage space (16) of 2) is alternately switched to the upper jig (9) side and the lower jig (10) side.
【００１４】洗浄液供給管路（１５）の上流側には洗浄
液の圧送ポンプＰと洗浄液貯槽（１）が接続されてお
り、これに対応して排出管路（７）の下流側には、使用
済み洗浄液の回収槽（８）が接続されている。A cleaning liquid pressure pump P and a cleaning liquid storage tank (1) are connected to the upstream side of the cleaning liquid supply pipe (15), and correspondingly, to the downstream side of the discharge pipe (7), a cleaning liquid storage pump (1) is used. A collection tank (8) for the used cleaning liquid is connected.
【００１５】そして、洗浄処理途上で被洗浄部品（１
２）の収納空間（１６）内へ噴射される洗浄液の供給方
向を所定の時間的周期で２回以上反転させるため、前記
三方弁Ｖ1、Ｖ2、Ｖ3にはタイマー、継電器等を組込ん
だ流路切替回路（図示省略）が接続されている。尚、参
照符号Ｍは洗浄液圧送ポンプＰの駆動モータを示す。During the cleaning process, the parts to be cleaned (1
In order to reverse the supply direction of the cleaning liquid injected into the storage space (16) of 2) at least twice in a predetermined time cycle, the three-way valves V 1 , V 2 and V 3 are equipped with a timer, a relay, etc. A built-in flow path switching circuit (not shown) is connected. Reference numeral M indicates a drive motor for the cleaning liquid pressure pump P.
【００１６】図１に示す強制洗浄装置（２０）では、被
洗浄部品（１２）の収納空間（１６）内への洗浄液の噴
射方向を、３個の三方弁Ｖ1、Ｖ2、Ｖ3で切替えている
が、洗浄液噴射方向の切替え手段はこれに限定されるも
のではなく、種々の変形例を実施することができる。例
えば、上側治具（９）及び下側治具（１０）の器壁面
に、洗浄液の導入用管路と排出用管路をそれぞれ分離状
態で接続し、これらの導入用管路と排出用管路に回転方
向を正逆２通りに切替えられる単一のモータと圧送ポン
プを組込むことによって洗浄液噴射方向の交互変換手段
を形成することも可能である。In the forced cleaning device (20) shown in FIG. 1, the direction of injection of the cleaning liquid into the storage space (16) of the part to be cleaned (12) is controlled by three three-way valves V 1 , V 2 , V 3 . Although the switching is performed, the switching means for switching the cleaning liquid ejection direction is not limited to this, and various modified examples can be implemented. For example, a cleaning liquid introduction pipe line and a discharge liquid pipe line are separately connected to the wall surfaces of the upper jig (9) and the lower jig (10), and these introduction pipe line and discharge pipe line are connected. It is also possible to form an alternate conversion means of the cleaning liquid jetting direction by incorporating a single motor and a pressure feed pump that can switch the direction of rotation between two directions of forward and reverse.
【００１７】洗浄液は、水、アルコールまたは水とアル
コールの混合液中に適量の水溶性防錆剤を溶解させると
共に、アルミナ、ダイヤモンドあるいは炭化珪素の微細
粒子からなる砥粒を分散させた分散液であって、砥粒の
平均粒径は、被洗浄部品（１２）の表面や微細穴の内面
に付着している切粉の材質や大きさに応じて調整する。The cleaning liquid is a dispersion liquid in which an appropriate amount of a water-soluble rust preventive agent is dissolved in water, alcohol or a mixed liquid of water and alcohol, and abrasive grains composed of fine particles of alumina, diamond or silicon carbide are dispersed. Therefore, the average grain size of the abrasive grains is adjusted according to the material and size of the cutting chips attached to the surface of the part to be cleaned (12) and the inner surface of the fine hole.
【００１８】本発明の好ましい実施態様においては、前
記砥粒の平均粒径を０．１μｍ乃至１０μｍの範囲に設
定し、かつ、その配合量を前記洗浄液の０．２乃至１０
重量パーセントをしめるように調整する。In a preferred embodiment of the present invention, the average particle size of the abrasive grains is set in the range of 0.1 μm to 10 μm, and the compounding amount thereof is 0.2 to 10 of the cleaning liquid.
Adjust to give weight percent.
【００１９】砥粒の平均粒径が０．１μｍ未満である場
合には所期の切粉除去効果が得られず、平均粒径が１０
μｍを上回ると、洗浄液の噴射ノズルが詰まったり摩耗
が激しくなる等の障害が発生し、被洗浄部品（１２）の
表面に砥粒が残り易くなる。When the average grain size of the abrasive grains is less than 0.1 μm, the desired chip removing effect cannot be obtained, and the average grain size is 10
When it exceeds μm, troubles such as clogging of the cleaning liquid injection nozzle and severe wear occur, and the abrasive grains are likely to remain on the surface of the part to be cleaned (12).
【００２０】また、被洗浄部品（１２）の収納空間（１
６）、換言すればシーリング部材（１１）によって上下
１対に密封接合された上側治具（９）と下側治具（１
０）の中空器室（１６）内に噴射される洗浄液の圧力
は、５乃至１５０ｋｇ／ｃｍ2の範囲に設定する。一般
的には、被洗浄部品（１２）に穴（１３）が設けられて
いる場合、穴径が小さい程洗浄液の噴射圧力を高めに設
定する。Further, the storage space (1) for the parts to be cleaned (12)
6), in other words, an upper jig (9) and a lower jig (1) which are hermetically joined in a pair by the sealing member (11).
The pressure of the cleaning liquid injected into the hollow vessel chamber (16) of 0) is set in the range of 5 to 150 kg / cm 2 . Generally, when the part to be cleaned (12) is provided with the hole (13), the smaller the hole diameter, the higher the injection pressure of the cleaning liquid is set.
【００２１】砥粒を分散させた洗浄液中には、前記砥粒
と共に水溶性の防錆剤を適量配合する。防錆剤の配合量
は、水、アルコールあるいは水とアルコールの混合液中
１乃至２０重量パーセントをしめるように調整する。水
溶性防錆剤としては被洗浄部品（１２）が、炭素鋼また
は軟鉄製である場合は、例えばニューパックＷ（日新工
油株式会社製）を使用する。An appropriate amount of a water-soluble rust preventive agent is mixed with the abrasive grains in the cleaning liquid in which the abrasive grains are dispersed. The amount of the rust preventive compounded is adjusted so as to be 1 to 20% by weight in water, alcohol or a mixed solution of water and alcohol. When the part to be cleaned (12) is made of carbon steel or soft iron as the water-soluble rust preventive, for example, Newpack W (manufactured by Nisshin Kogyo Co., Ltd.) is used.
【００２２】洗浄液の噴射方向を所定の時間的周期で１
回以上反転させながら被洗浄部品（１２）に強制洗浄処
理を施こした後、上側治具（９）と下側治具（１０）間
の密封状態を解除して強制洗浄装置（２０）内から被洗
浄部品（１２）を取出し、別設の（図示していない）水
洗工程で最終の洗浄処理を施こす。The cleaning liquid jet direction is set to 1 at a predetermined time period.
After subjecting the part to be cleaned (12) to a forced cleaning process while reversing it more than once, the sealed state between the upper jig (9) and the lower jig (10) is released to remove the forced cleaning device (20). The part to be cleaned (12) is taken out from the above, and the final cleaning process is performed in a water washing process (not shown) provided separately.
【００２３】以下、図１を参照しながら本発明の具体例
を記述する。A specific example of the present invention will be described below with reference to FIG.
【００２４】下側治具（１０）上に被洗浄部品（１２）
を載置した後、上側治具（９）を下降させることによっ
て強制洗浄装置（２０）の密封器室（１６）内に被洗浄
部品（１２）を封入する。Parts to be cleaned (12) on the lower jig (10)
After mounting, the upper jig (9) is lowered to enclose the part (12) to be cleaned in the sealed chamber (16) of the forced cleaning device (20).
【００２５】平均粒径１μｍのアルミナ微細粒子１重量
パーセントと水溶性防錆剤３重量パーセントとを９６重
量パーセントの水中に分散させた洗浄液を用意する。A cleaning liquid is prepared by dispersing 1% by weight of alumina fine particles having an average particle size of 1 μm and 3% by weight of a water-soluble rust preventive in 96% by weight of water.
【００２６】先ず、三方弁Ｖ1と三方弁Ｖ3を操作して洗
浄液供給管路（１５）（１４）（５）間を連通させると
共に上流側の洗浄液排出管路（６）を閉鎖し、これと同
時に三方弁Ｖ2を操作して下流側の洗浄液排出管路
（４）を開口状態に保持する。First, the three-way valve V 1 and the three-way valve V 3 are operated to establish communication between the cleaning liquid supply pipes (15), (14) and (5) and to close the upstream cleaning liquid discharge pipe line (6), At the same time, the three-way valve V 2 is operated to hold the downstream cleaning liquid discharge conduit (4) in an open state.
【００２７】駆動モータＭを起動し、圧送ポンプＰで圧
力を７０ｋｇ／ｃｍ2に調整され、洗浄液貯槽（１）内
に貯えられている洗浄液を供給管路（１５）（１４）
（５）を通して１．２秒間に亘って強制洗浄装置（２
０）の密封器室（１６）内に導入する。洗浄処理によっ
て発生した切粉含有洗浄液は、管路（３）、三方弁Ｖ2
及び排出管路（４）を通って共通の排出管路（７）内に
送り出され、その下流側に接続されている回収槽（８）
内に廃液として貯留される。The drive motor M is started, the pressure is adjusted to 70 kg / cm 2 by the pressure pump P, and the cleaning liquid stored in the cleaning liquid storage tank (1) is supplied to the supply pipes (15) (14).
Forced cleaning device (2
It is introduced into the sealed chamber (16) of 0). The chip-containing cleaning liquid generated by the cleaning process is supplied to the pipe line (3) and the three-way valve V 2
And a collection tank (8) sent out into the common discharge pipe (7) through the discharge pipe (4) and connected to the downstream side thereof.
It is stored as waste liquid inside.
【００２８】前記１．２秒間の１次強制洗浄動作が終了
した段階で強制洗浄装置（２０）の密封器室（１６）内
への洗浄液の導入方向及び排出方向を反転させて２次強
制洗浄動作を続行する。即ち、三方弁Ｖ1とＶ2の開口位
置と閉鎖位置を前記１次強制洗浄動作時と逆転させ、洗
浄液供給管路（１５）（２）（３）間を連通させると共
に下流側の洗浄液排出管路（４）を閉鎖し、これと同時
に三方弁Ｖ3を操作して上流側の洗浄液排出管路（６）
を開口状態に保持する。駆動モータＭを再起動し、圧送
ポンプＰで圧力を７０ｋｇ／ｃｍ2に調整され洗浄液貯
槽（１）内に貯えられている洗浄液を供給管路（１５）
（２）（３）を通して１、２秒間に亘って前記密封器室
（１６）内に導入する。洗浄処理によって発生した切粉
含有洗浄液は、管路（５）、三方弁Ｖ3及び排出管路
（６）を通って共通の排出管路（７）内に送り出され、
その下流側に接続されている回収槽（８）内に廃液とし
て貯留される。At the stage where the 1.2-second primary forced cleaning operation is completed, the secondary forced cleaning is performed by reversing the introduction direction and the discharge direction of the cleaning liquid into the sealed chamber (16) of the forced cleaning device (20). Continue operation. That is, the opening position and the closing position of the three-way valves V 1 and V 2 are reversed from those in the primary forced cleaning operation so that the cleaning liquid supply pipelines (15), (2) and (3) are connected to each other and the downstream cleaning liquid is discharged. The pipe line (4) is closed, and at the same time, the three-way valve V 3 is operated to upstream the cleaning liquid discharge pipe line (6).
Hold open. The drive motor M is restarted, the pressure is adjusted to 70 kg / cm 2 by the pressure pump P, and the cleaning liquid stored in the cleaning liquid storage tank (1) is supplied to the supply line (15).
(2) Through the (3), it is introduced into the sealed chamber (16) for 1 or 2 seconds. The chip-containing cleaning liquid generated by the cleaning process is sent into the common discharge pipe (7) through the pipe (5), the three-way valve V 3 and the discharge pipe (6),
It is stored as waste liquid in the recovery tank (8) connected to the downstream side.
【００２９】前記洗浄動作は、噴射方向を互いに反対方
向に切替えながら各２回繰返し、被洗浄部品（１２）の
強制洗浄処理を終了する。The cleaning operation is repeated twice while switching the jetting directions to opposite directions, and the forced cleaning process for the part to be cleaned (12) is completed.
【００３０】この後、原位置に向けて上側治具（９）を
上昇させ、上側治具（９）と下側治具（１０）間の密封
状態を解除し、強制洗浄装置（２０）の密封器室（１
６）内から被洗浄部品（１２）を取出す。これに続いて
別設の水洗工程で被洗浄部品（１２）に最終の洗浄処理
を施こす。After that, the upper jig (9) is raised toward the original position, the sealed state between the upper jig (9) and the lower jig (10) is released, and the forced cleaning device (20) is Sealer room (1
6) Remove the part to be cleaned (12) from inside. Following this, a final washing process is applied to the part to be cleaned (12) in a separately provided water washing step.
【００３１】[0031]
【発明の効果】被洗浄部品（１２）に対する洗浄液の噴
射方向を所定の時間的周期で少なくとも１回以上反転さ
せることによって、被洗浄部品（１２）の表面や穴（１
３）内が確実に洗浄され、切粉や塵埃の洗い流し不良に
起因する品質欠陥が略皆無になる。EFFECTS OF THE INVENTION By reversing the direction of injection of the cleaning liquid onto the part to be cleaned (12) at least once at a predetermined time cycle, the surface or hole (1) of the part to be cleaned (12) is
3) The inside is reliably cleaned, and almost no quality defects due to defective washing of cutting chips and dust are eliminated.
【００３２】また、超音波洗浄方式、砥粒流動加工方
式、電解加工方式等で問題とされていた装置の複雑化や
大型化等が回避され、生産性の向上と加工コストの節減
に対しても顕著な効果が発揮される。In addition, it is possible to avoid the complication and increase in size of the device, which have been a problem in the ultrasonic cleaning method, the abrasive grain flow processing method, the electrolytic processing method, etc., and to improve the productivity and reduce the processing cost. Also has a remarkable effect.
【図面の簡単な説明】[Brief description of drawings]
【図１】本発明方法の実施に好適な強制洗浄装置の一部
破断正面図。FIG. 1 is a partially cutaway front view of a forced cleaning device suitable for carrying out the method of the present invention.
１ 洗浄液貯槽 ２ 洗浄液供給管路 ３ 洗浄液供給管路 ４ 洗浄液排出管路 ５ 洗浄液供給管路 ６ 洗浄液排出管路 ７ 洗浄液の共通排出管路 ８ 洗浄液回収槽 ９ 上側治具 １０ 下側治具 １１ シーリング部材 １２ 被洗浄部品 １３ 被洗浄部品の穴 １５ 洗浄供給管路 １６ 密封器室 Ｖ1 三方弁（流路切替弁） Ｖ2 三方弁（流路切替弁） Ｖ3 三方弁（流路切替弁） Ｐ 圧送ポンプ Ｍ 駆動モータ1 Cleaning Solution Storage Tank 2 Cleaning Solution Supply Pipeline 3 Cleaning Solution Supply Pipeline 4 Cleaning Solution Discharge Pipeline 5 Cleaning Solution Supply Pipeline 6 Cleaning Solution Discharge Pipeline 7 Cleaning Solution Common Discharge Pipeline 8 Cleaning Solution Recovery Tank 9 Upper Jig 10 Lower Jig 11 Sealing Parts 12 Parts to be cleaned 13 Holes for parts to be cleaned 15 Cleaning supply line 16 Sealer chamber V 1 Three-way valve (flow path switching valve) V 2 Three-way valve (flow path switching valve) V 3 Three-way valve (flow path switching valve) P pressure feed pump M drive motor
Claims (3)
開口させた上下２分割型の密封器室内に被洗浄部品を封
入し、この密封器室に連設された洗浄液供給装置から前
記流入口及び流出口を通して前記密封器室内に砥粒と水
溶性防錆剤を水、アルコールまたは水とアルコールの混
合液中に分散させた洗浄液を導入し、前記流入口と流出
口の間で洗浄液の流入・流出方向を少なくとも１回以上
反転させながら所定時間に亘って洗浄処理した後、前記
密封器室から取出した被洗浄部品を水洗することを特徴
とする精密部品の洗浄方法。1. A part to be cleaned is enclosed in an upper and lower two-part type sealer chamber in which an inlet and an outlet for a cleaning liquid are opened at both upper and lower end surfaces, and a cleaning liquid supply device connected to the sealer chamber is connected to the cleaning liquid supply device. Introducing a cleaning liquid in which abrasive grains and a water-soluble rust inhibitor are dispersed in water, alcohol or a mixed liquid of water and alcohol into the sealer chamber through the inlet and the outlet, and the cleaning liquid between the inlet and the outlet. The method for cleaning precision parts is characterized in that after the cleaning process is performed for a predetermined time while reversing the direction of inflow and outflow of at least once, the parts to be cleaned taken out from the sealed chamber are washed with water.
径０．１μｍ乃至１０μｍのアルミナ、ダイヤモンド、
または炭化珪素などの微細粒子から選択し、かつ、その
配合量を前記洗浄液の０．２乃至１０重量パーセントを
占めるように調整したことを特徴とする請求項１記載の
精密部品の洗浄方法。2. The abrasive grains dispersed in the cleaning liquid are alumina, diamond having an average particle diameter of 0.1 μm to 10 μm,
2. The method for cleaning precision parts according to claim 1, wherein fine particles such as silicon carbide are selected, and the amount thereof is adjusted so as to account for 0.2 to 10 weight% of the cleaning liquid.
圧力を５乃至１５０ｋｇ／ｃｍ2の範囲に設定したこと
を特徴とする請求項１記載の精密部品の洗浄方法。3. The method for cleaning precision parts according to claim 1, wherein the pressure of the cleaning liquid introduced into the sealed chamber is set in the range of 5 to 150 kg / cm 2 .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6141327A JP2872573B2 (en) | 1994-06-23 | 1994-06-23 | Cleaning equipment for precision parts |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6141327A JP2872573B2 (en) | 1994-06-23 | 1994-06-23 | Cleaning equipment for precision parts |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH081115A true JPH081115A (en) | 1996-01-09 |
| JP2872573B2 JP2872573B2 (en) | 1999-03-17 |
Family
ID=15289364
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6141327A Expired - Fee Related JP2872573B2 (en) | 1994-06-23 | 1994-06-23 | Cleaning equipment for precision parts |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2872573B2 (en) |
Cited By (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003146757A (en) * | 2001-11-08 | 2003-05-21 | Bridgestone Corp | Method for cleaning silicon carbide sintered compact and cleaning solution |
| JP2010047779A (en) * | 2008-08-19 | 2010-03-04 | Sanoh Industrial Co Ltd | Method and device for polishing metal tube |
| JP2010523300A (en) * | 2007-03-30 | 2010-07-15 | ラム リサーチ コーポレーション | Method for cleaning surface metal contamination from electrode assemblies |
| JP2014108402A (en) * | 2012-12-03 | 2014-06-12 | Mitsubishi Heavy Ind Ltd | Method for removing corrosion product and salt content in narrow part, and device for cleaning narrow part |
| JP2015058378A (en) * | 2013-09-18 | 2015-03-30 | 安田工業株式会社 | Tool cleaning method and tool cleaning device for machine tool |
| CN105541402A (en) * | 2016-01-29 | 2016-05-04 | 孙英 | Treatment process of alumina ceramic wafers |
| CN105541397A (en) * | 2016-01-29 | 2016-05-04 | 孙英 | Treatment process of alumina ceramic wafers |
| CN105541399A (en) * | 2016-01-29 | 2016-05-04 | 孙英 | Treatment process of alumina ceramic wafers |
| CN105541403A (en) * | 2016-01-29 | 2016-05-04 | 孙英 | Aluminum oxide ceramic plate treatment process |
| CN105541401A (en) * | 2016-01-29 | 2016-05-04 | 孙英 | Treatment process of alumina ceramic wafers |
| CN105541398A (en) * | 2016-01-29 | 2016-05-04 | 孙英 | Treatment process of alumina ceramic wafers |
| CN105541400A (en) * | 2016-01-29 | 2016-05-04 | 孙英 | Treatment process of alumina ceramic wafers |
| CN105541404A (en) * | 2016-01-29 | 2016-05-04 | 孙英 | Treatment process of alumina ceramic wafers |
| CN105601334A (en) * | 2016-01-29 | 2016-05-25 | 孙英 | Aluminum oxide ceramic chip treatment technology |
| CN105601339A (en) * | 2016-01-29 | 2016-05-25 | 孙英 | Aluminum oxide ceramic chip treatment technology |
| CN105601336A (en) * | 2016-01-29 | 2016-05-25 | 孙英 | Aluminum oxide ceramic chip treatment technology |
| CN105732116A (en) * | 2016-01-29 | 2016-07-06 | 孙英 | Alumina ceramic wafer treatment process |
| CN105732114A (en) * | 2016-01-29 | 2016-07-06 | 孙英 | Alumina ceramic wafer treatment process |
| CN105732112A (en) * | 2016-01-29 | 2016-07-06 | 孙英 | Alumina ceramic wafer treatment process |
| CN105732113A (en) * | 2016-01-29 | 2016-07-06 | 孙英 | Alumina ceramic wafer treatment process |
| JP2019513348A (en) * | 2016-03-11 | 2019-05-30 | マレル ファーザー プロセッシング ビー．ヴィー． | Method and / or method for cleaning a food product type drum and the combination of such food product type drum with a mold drum cleaning device and / or evaluation device |
| CN110977787A (en) * | 2019-12-30 | 2020-04-10 | 国营第六一六厂 | Accurate quick hydraulic extrusion slide valve fine metering hole anchor clamps |
| KR102417223B1 (en) * | 2021-06-04 | 2022-07-06 | 부경엔지니어링주식회사 | Intelligent Remote Surveillance System Using Instrumentation Control Device for Water Treatment Management |
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| JPS57166500A (en) * | 1981-04-04 | 1982-10-13 | Shigenobu Hironaka | Grinding material injecting method |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4849095A (en) * | 1971-10-21 | 1973-07-11 | ||
| JPS5322689A (en) * | 1976-08-14 | 1978-03-02 | Jitsuo Satozaki | Fluid grinding machine for precious metals |
| JPS57166500A (en) * | 1981-04-04 | 1982-10-13 | Shigenobu Hironaka | Grinding material injecting method |
Cited By (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003146757A (en) * | 2001-11-08 | 2003-05-21 | Bridgestone Corp | Method for cleaning silicon carbide sintered compact and cleaning solution |
| JP2010523300A (en) * | 2007-03-30 | 2010-07-15 | ラム リサーチ コーポレーション | Method for cleaning surface metal contamination from electrode assemblies |
| JP2010047779A (en) * | 2008-08-19 | 2010-03-04 | Sanoh Industrial Co Ltd | Method and device for polishing metal tube |
| JP2014108402A (en) * | 2012-12-03 | 2014-06-12 | Mitsubishi Heavy Ind Ltd | Method for removing corrosion product and salt content in narrow part, and device for cleaning narrow part |
| JP2015058378A (en) * | 2013-09-18 | 2015-03-30 | 安田工業株式会社 | Tool cleaning method and tool cleaning device for machine tool |
| CN105541398A (en) * | 2016-01-29 | 2016-05-04 | 孙英 | Treatment process of alumina ceramic wafers |
| CN105601339A (en) * | 2016-01-29 | 2016-05-25 | 孙英 | Aluminum oxide ceramic chip treatment technology |
| CN105541399A (en) * | 2016-01-29 | 2016-05-04 | 孙英 | Treatment process of alumina ceramic wafers |
| CN105541403A (en) * | 2016-01-29 | 2016-05-04 | 孙英 | Aluminum oxide ceramic plate treatment process |
| CN105541401A (en) * | 2016-01-29 | 2016-05-04 | 孙英 | Treatment process of alumina ceramic wafers |
| CN105541402A (en) * | 2016-01-29 | 2016-05-04 | 孙英 | Treatment process of alumina ceramic wafers |
| CN105541400A (en) * | 2016-01-29 | 2016-05-04 | 孙英 | Treatment process of alumina ceramic wafers |
| CN105541404A (en) * | 2016-01-29 | 2016-05-04 | 孙英 | Treatment process of alumina ceramic wafers |
| CN105601334A (en) * | 2016-01-29 | 2016-05-25 | 孙英 | Aluminum oxide ceramic chip treatment technology |
| CN105541397A (en) * | 2016-01-29 | 2016-05-04 | 孙英 | Treatment process of alumina ceramic wafers |
| CN105601336A (en) * | 2016-01-29 | 2016-05-25 | 孙英 | Aluminum oxide ceramic chip treatment technology |
| CN105732116A (en) * | 2016-01-29 | 2016-07-06 | 孙英 | Alumina ceramic wafer treatment process |
| CN105732114A (en) * | 2016-01-29 | 2016-07-06 | 孙英 | Alumina ceramic wafer treatment process |
| CN105732112A (en) * | 2016-01-29 | 2016-07-06 | 孙英 | Alumina ceramic wafer treatment process |
| CN105732113A (en) * | 2016-01-29 | 2016-07-06 | 孙英 | Alumina ceramic wafer treatment process |
| JP2019513348A (en) * | 2016-03-11 | 2019-05-30 | マレル ファーザー プロセッシング ビー．ヴィー． | Method and / or method for cleaning a food product type drum and the combination of such food product type drum with a mold drum cleaning device and / or evaluation device |
| CN110977787A (en) * | 2019-12-30 | 2020-04-10 | 国营第六一六厂 | Accurate quick hydraulic extrusion slide valve fine metering hole anchor clamps |
| KR102417223B1 (en) * | 2021-06-04 | 2022-07-06 | 부경엔지니어링주식회사 | Intelligent Remote Surveillance System Using Instrumentation Control Device for Water Treatment Management |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2872573B2 (en) | 1999-03-17 |
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