JPH0795540B2 - Method and apparatus for cleaning both sides of substrate using ultrasonic cleaning spray nozzle - Google Patents
Method and apparatus for cleaning both sides of substrate using ultrasonic cleaning spray nozzleInfo
- Publication number
- JPH0795540B2 JPH0795540B2 JP63087382A JP8738288A JPH0795540B2 JP H0795540 B2 JPH0795540 B2 JP H0795540B2 JP 63087382 A JP63087382 A JP 63087382A JP 8738288 A JP8738288 A JP 8738288A JP H0795540 B2 JPH0795540 B2 JP H0795540B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- cleaning
- ultrasonic
- cleaned
- spray nozzle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は超音波洗浄スプレイノズルを用いた基板の洗浄
方法及び洗浄装置に係り、特に基板両面を同時に洗浄す
るのに好適な洗浄方法及び洗浄装置に関する。The present invention relates to a substrate cleaning method and a cleaning apparatus using an ultrasonic cleaning spray nozzle, and particularly to a cleaning method and a cleaning method suitable for simultaneously cleaning both surfaces of a substrate. Regarding the device.
従来の超音波洗浄方法は、周知のように洗浄槽内に洗浄
液と超音波発生手段とを設け、被洗浄物を槽内に浸漬し
て洗浄するものが主体であった。しかし、最近はこの洗
浄槽を廃し、洗浄水自体に超音波振動を伝搬させること
のできる洗浄スプレイノズルを用いることにより、この
洗浄水を被洗浄物に噴射し洗浄する超音波洗浄器が提案
されている。As is well known, the conventional ultrasonic cleaning method is mainly one in which a cleaning liquid and an ultrasonic wave generating means are provided in a cleaning tank and an object to be cleaned is immersed in the tank for cleaning. However, recently, an ultrasonic cleaning device has been proposed in which this cleaning tank is abolished and a cleaning spray nozzle capable of propagating ultrasonic vibrations to the cleaning water itself is used to spray the cleaning water onto the object to be cleaned. ing.
なお、この種の装置として関連するものには、例えば特
開昭56-6077号が挙げられる。As a device related to this type, for example, JP-A-56-6077 can be cited.
上記従来技術は、超音波振動子を取り付けたスプレイノ
ズルに純水を供給し、この振動子を発振させて超音波振
動をのせた純水を被洗浄物の一部分に照射するという方
法を取っており、被洗浄物の両面を同時に洗浄する方法
及び装置については何ら配慮がされておらず、汚染異物
の除去能力の向上及び処理時間の短縮に改善すべき技術
課題が多少あった。The above-mentioned conventional technique takes a method of supplying pure water to a spray nozzle equipped with an ultrasonic vibrator, oscillating the vibrator, and irradiating a portion of the object to be cleaned with the pure water with ultrasonic vibration. However, no consideration has been given to the method and apparatus for cleaning both sides of the object to be cleaned at the same time, and there have been some technical problems to be solved in order to improve the ability to remove contaminated foreign substances and shorten the processing time.
本発明の目的は、上記した技術課題を解決することにあ
り、その第１の目的は被洗浄基板面に付着した汚染異物
を速やかに、かつ能率よく除去できる改善された被洗浄
基板の洗浄方法を提供することにあり、第２の目的は洗
浄装置を供することにある。An object of the present invention is to solve the above technical problem, and a first object thereof is an improved method for cleaning a substrate to be cleaned, which can remove contaminants adhering to the surface of the substrate to be cleaned promptly and efficiently. The second purpose is to provide a cleaning device.
上記第１の目的は、板状の被洗浄基板を回転させなが
ら、前記基板の両面に基板の回転方向に逆らって、かつ
基板面と鋭角の傾斜をもって超音波振動が伝搬された洗
浄液を基板の回転中心軸の半径方向に走査移動させなが
ら集中的に噴射、浴びせることを特徴とする超音波スプ
レイノズルを用いた基板両面の洗浄方法によって達成さ
れる。The first purpose is to rotate the plate-shaped substrate to be cleaned and to transfer the cleaning liquid to the both sides of the substrate against which the ultrasonic vibration is propagated against the rotation direction of the substrate and at an acute angle to the substrate surface. This is achieved by a method for cleaning both surfaces of a substrate using an ultrasonic spray nozzle, which is characterized by intensively spraying and bathing while scanningly moving in the radial direction of the rotation center axis.
そして上記第２の目的は、被洗浄基板を少なくとも３個
の固定治具で回転可能に支持する支持手段と、前記基板
の回転方向とは逆らう向きに、しかも基板の回転面に対
し鋭角の傾斜をもって前記基板の両面にそれぞれ少なく
とも１個の超音波洗浄スプレイノズルを対向させる手段
と、前記超音波洗浄スプレイノズルを回転基板の半径方
向に走査する手段とを具備して成ることを特徴とする洗
浄装置によって達成される。The second purpose is to provide a supporting means for rotatably supporting the substrate to be cleaned by at least three fixing jigs, a direction opposite to the rotation direction of the substrate, and an inclination of an acute angle with respect to the rotation surface of the substrate. And a means for facing at least one ultrasonic cleaning spray nozzle to both surfaces of the substrate, and a means for scanning the ultrasonic cleaning spray nozzle in the radial direction of the rotating substrate. Achieved by the device.
上記洗浄装置において、好ましくは、上記少なくとも３
個の固定治具の少なくとも１個を回転駆動体とし、他の
少なくとも２個の固定治具で被洗浄基板を支持すると共
に前記固定治具を回転基板の中心軸から遠ざかる方向に
移動可能な構成とすることにより、前記固定治具の移動
で前記被洗浄基板を着脱自在とする構成が望ましい。In the above cleaning apparatus, preferably at least the above 3
A configuration in which at least one of the fixing jigs is used as a rotation driving body, the substrate to be cleaned is supported by at least two other fixing jigs, and the fixing jig is movable in a direction away from the central axis of the rotating substrate. Therefore, it is desirable that the substrate to be cleaned be detachable by moving the fixing jig.
更に好ましくは、上記被洗浄基板の両面に対向配設され
た超音波洗浄スプレイノズルを相互に同期して回転基板
の半径方向に走査移動可能とした超音波洗浄スプレイノ
ズルの走査手段を有していることが望ましい。More preferably, it has a scanning means for ultrasonic cleaning spray nozzles capable of scanning and moving in a radial direction of the rotating substrate in synchronism with ultrasonic cleaning spray nozzles disposed opposite to each other on the surface to be cleaned. Is desirable.
上記被洗浄基板を例えば磁気ディスク、光ディスク等の
記録媒体用ディスク基板とした場合には、すぐれた洗浄
効果を有するディスク基板の洗浄装置が実現可能とな
る。When the substrate to be cleaned is a disk substrate for a recording medium such as a magnetic disk or an optical disk, a cleaning device for a disk substrate having an excellent cleaning effect can be realized.
なお、上記超音波洗浄スプレイノズルは、洗浄液の噴出
と洗浄液への超音波伝搬機能を有する周知のノズルで十
分に対応できる。It should be noted that the above ultrasonic cleaning spray nozzle may be a well-known nozzle having a function of ejecting the cleaning liquid and propagating the ultrasonic liquid to the cleaning liquid.
また、上記洗浄基板面に対し鋭角の傾斜をもって、洗浄
液を噴出させる訳であるが、この傾斜角は洗浄力との関
係において重要であり、約30*で最も優れており、これ
を界にして±15*の範囲が実用的である。Further, the cleaning liquid is jetted at an acute angle with respect to the surface of the cleaning substrate, and this inclination angle is important in relation to the cleaning power, and is the best at about 30 * , and this is the boundary. A range of ± 15 * is practical.
さらにまた、超音波洗浄スプレイノズルの走査移動方向
は外周方向から中心部方向あるいはさらに中心部から外
周方向に往復させることも可能であるが、好ましくは、
中心部から外周方向に一方的に移動した方が好ましい。
ノズル先端から基板表面までの距離は、超音波の周波数
に応じ最適値に設定するのが望ましく、一般的には20mm
以内が、より好ましくは10mm以内である。Furthermore, the scanning movement direction of the ultrasonic cleaning spray nozzle can be reciprocated from the outer peripheral direction to the central part direction or further from the central part to the outer peripheral direction, but preferably,
It is preferable to move unilaterally from the center to the outer circumference.
It is desirable to set the distance from the nozzle tip to the substrate surface to an optimum value according to the frequency of ultrasonic waves, generally 20 mm.
Within 10 mm, more preferably within 10 mm.
また、回転基板に対する超音波洗浄スプレイノズルの傾
斜角θは、前述のとおり鋭角であることが望ましく、実
用的には30*±15*の範囲がより望ましく、特に望ましく
は約30*である。Further, the inclination angle θ of the ultrasonic cleaning spray nozzle with respect to the rotating substrate is preferably an acute angle as described above, practically more preferably in the range of 30 * ± 15 * , particularly preferably about 30 * .
被洗浄基板の両面上に配設される超音波洗浄スプレイノ
ズルは、上述のごとく相互に同期して走査移動するが、
これは一方の面側から他方の面側のノズルに例えばリン
ク機構等の周知の走査手段で動作させることが望まし
い。The ultrasonic cleaning spray nozzles arranged on both sides of the substrate to be cleaned move in scanning in synchronization with each other as described above.
It is desirable that the nozzles on one surface side to the other surface side be operated by a known scanning means such as a link mechanism.
回転機構を有した被洗浄基板固定治具支持手段により、
被洗浄基板は一定方向に回転させられる。また、この被
洗浄基板面上に傾斜して設けられた超音波洗浄スプレイ
ノズルは、上記被洗浄基板面との距離を超音波振動の伝
播効率の最もよい距離に固定し、上記ノズルの傾斜角度
も一定にして被洗浄基板の中心部から外周方向、或いは
その逆方向へ走査移動する。それによって、被洗浄基板
は一度の処理により両面が同時に洗浄されるので短時間
で効率よく汚染異物の除去が可能となる。By the substrate fixing jig supporting means having a rotating mechanism,
The substrate to be cleaned is rotated in a fixed direction. The ultrasonic cleaning spray nozzle provided on the surface of the substrate to be cleaned is fixed at a distance from the surface of the substrate to be cleaned to a distance at which the propagation efficiency of ultrasonic vibration is the best, and the inclination angle of the nozzle is set. Is also constant, and scanning is moved from the central portion of the substrate to be cleaned in the outer peripheral direction or in the opposite direction. As a result, both surfaces of the substrate to be cleaned are cleaned simultaneously by a single treatment, so that contaminants can be removed efficiently in a short time.
以下本発明の実施例を図面を用いて説明する。 Embodiments of the present invention will be described below with reference to the drawings.
先ず各図の概略を説明すると、第１図は本発明による基
板両面洗浄装置の構成を説明する概略正面図である。第
２図は側面図、第３図（ａ）は被洗浄基板１の回転方向
（矢印17）とスプレイノズル５の走査移動方向18を示し
た説明図、第３図（ｂ）はスプレイノズル５の基板面１
に対する傾斜角θと、ノズル先端から基板面迄の距離ｄ
を説明するための図である。第４図はスプレイノズルと
洗浄基板１との距離ｄを決定するために汚染異物除去率
と照射距離について検討した結果の特性曲線図、そして
第５図は傾斜角θをパラメータとした場合の異物除去率
と洗浄時間との関係を示した特性曲線図である。First, the outline of each drawing will be described. FIG. 1 is a schematic front view illustrating the configuration of a substrate double-sided cleaning apparatus according to the present invention. 2 is a side view, FIG. 3 (a) is an explanatory view showing the rotation direction (arrow 17) of the substrate to be cleaned 1 and the scanning movement direction 18 of the spray nozzle 5, and FIG. 3 (b) is the spray nozzle 5. Board surface 1
Inclination angle θ with respect to the distance d from the nozzle tip to the substrate surface
It is a figure for explaining. FIG. 4 is a characteristic curve diagram as a result of examining the contamination foreign matter removal rate and the irradiation distance in order to determine the distance d between the spray nozzle and the cleaning substrate 1, and FIG. 5 is the foreign matter when the inclination angle θ is used as a parameter. It is a characteristic curve figure which showed the relationship between a removal rate and cleaning time.
以下、各図についてさらに具体的に説明すると、第１図
及び第２図に示す被洗浄基板１は、回転機構を有した基
板固定治具２と洗浄基板１を支えるだけの固定治具３に
装着される。装着された洗浄基板１は回転機構を有した
基板固定治具２が駆動伝達部12を介して駆動モータ８に
より回転することで一定方向に回転する。この回転する
洗浄基板１に洗浄基板の両側に設けられた超音波スプレ
イノズル５から超音波振動をのせた純水が給水タンク９
から給水菅11を通して、図面の省略された導管を介して
送給され照射される。この超音波スプレイノズル５は駆
動装置８により洗浄基板１と一定距離と角度を保持する
ために設けられたガイド７に沿って移動する。なお、ノ
ズル５は支持棒４、支持台６を介して駆動装置８から動
力が伝達される。また、超音波スプレイノズル５から照
射（本来は噴射と表現すべきであるが、超音波も加わっ
ていることからここでは照射と称す）される純水は純水
供給タンク９から給水配管11を通して供給され、洗浄後
の排液は洗浄室15の底部しきり板14に設けられた連絡通
路16から排液タンク10へもどされる。さらに、装置は超
音波スプレイノズル５から照射された純水や除去された
汚染異物が他へ飛散しないためと、洗浄基板１の汚染防
止のために飛散防止カバー13で覆われている。More specifically, each of the drawings will be described below. The substrate to be cleaned 1 shown in FIGS. 1 and 2 is composed of a substrate fixing jig 2 having a rotation mechanism and a fixing jig 3 only supporting the cleaning substrate 1. It is installed. The mounted cleaning substrate 1 rotates in a fixed direction when the substrate fixing jig 2 having a rotation mechanism is rotated by the drive motor 8 via the drive transmission unit 12. Pure water with ultrasonic vibrations applied to the rotating cleaning substrate 1 from ultrasonic spray nozzles 5 provided on both sides of the cleaning substrate is a water supply tank 9.
From a water supply pipe 11 through a conduit (not shown) to be irradiated. The ultrasonic spray nozzle 5 is moved by a drive device 8 along a guide 7 provided to maintain a constant distance and angle with respect to the cleaning substrate 1. Power is transmitted from the drive unit 8 to the nozzle 5 via the support rod 4 and the support base 6. In addition, pure water which is irradiated from the ultrasonic spray nozzle 5 (which should be expressed as jetting, but is also referred to as irradiation because ultrasonic waves are also applied here) is passed from the pure water supply tank 9 through the water supply pipe 11. The drainage liquid supplied and washed is returned to the drainage tank 10 from the communication passage 16 provided in the bottom cutoff plate 14 of the washing chamber 15. Further, the apparatus is covered with a scattering prevention cover 13 in order to prevent the pure water irradiated from the ultrasonic spray nozzle 5 and the removed contaminants from scattering, and to prevent the cleaning substrate 1 from being contaminated.
以上、第１図及び第２図で説明した基板両面洗浄装置に
おいて超音波スプレイノズル５と洗浄基板１との距離
ｄ、ノズルの走査移動方向18、傾斜角θ、基板１の回転
方向17の詳細な説明図が第３図（ａ），（ｂ）である。
超音波スプレイノズル５から照射された純水19に効率よ
く超音波振動がのり、汚染異物除去が行われる距離は限
られている。この距離ｄは、第４図に示した汚染異物除
去率と距離ｄとの関係から約10mmで100％に近い除去率
を示しており、実用上20mm以内、好ましくは10mm以内で
ある。Details of the distance d between the ultrasonic spray nozzle 5 and the cleaning substrate 1, the nozzle scanning movement direction 18, the inclination angle θ, and the rotation direction 17 of the substrate 1 in the substrate double-sided cleaning apparatus described with reference to FIGS. 3 (a) and 3 (b) are explanatory views.
Ultrasonic vibration is efficiently applied to the pure water 19 irradiated from the ultrasonic spray nozzle 5, and the distance for removing contaminants is limited. This distance d is about 10 mm, which shows a removal rate close to 100% from the relationship between the contamination foreign matter removal rate and the distance d shown in FIG. 4, and is practically within 20 mm, preferably within 10 mm.
第５図は、被洗浄基板１とノズル５との距離ｄを10mmと
したときの、傾斜角θが洗浄効果に如何なる影響を与え
るかを測定した結果の特性曲線図である。すなわち、こ
の図からθ＝30*の場合、洗浄時間約30secで除去率100
％に達しており、30*が最適傾斜角であることがわか
る。実用的には30*±15*の範囲である。FIG. 5 is a characteristic curve diagram of the result of measurement of how the inclination angle θ affects the cleaning effect when the distance d between the substrate to be cleaned 1 and the nozzle 5 is 10 mm. In other words, from the figure, when θ = 30 * , the removal rate is 100 after cleaning for about 30 seconds.
%, And it can be seen that 30 * is the optimum tilt angle. Practically, the range is 30 * ± 15 * .
なお、参考までに基板１の回転方向17を上記第３図
（ａ）とは逆方向にしたことろ、異物除去率は格段に劣
化し、実用にはならなかった。For reference, the rotation direction 17 of the substrate 1 was set to the opposite direction to that shown in FIG. 3 (a), and the foreign matter removal rate was remarkably deteriorated, which was not practical.
また、上記実施例においては、被洗浄基板１として、磁
気ディスク用金属円板を用いたが、金属に限らず、ガラ
ス板その他あらゆる洗浄を必要とする基板に適用可能で
あることは云うまでもない。さらにまた、洗浄液も水に
限らず、通常用いられている有機、無機の洗浄剤いずれ
においても使用可能である。Further, in the above-described embodiment, the magnetic disk metal disk is used as the substrate 1 to be cleaned, but needless to say, it is applicable to not only metal but also a glass plate or any other substrate requiring cleaning. Absent. Furthermore, the cleaning liquid is not limited to water and can be used with any of the commonly used organic and inorganic cleaning agents.
本発明によれば、被洗浄基板の両面を同時に短時間に、
しかも高効率で汚染異物の除去が出来るので、基板洗浄
における高清浄化や短時間処理に効果があり、十分に従
来の技術課題を解決することができた。According to the present invention, both sides of the substrate to be cleaned can be simultaneously processed in a short time,
Moreover, since contaminants can be removed with high efficiency, it is effective for high cleaning and short time processing in cleaning the substrate, and the conventional technical problems can be sufficiently solved.
第１図は本発明の実施例の基板両面洗浄装置の概略説明
用正面図、第２図はその側面図、第３図（ａ）は洗浄基
板の回転方向と超音波スプレイノズルの移動方向を説明
する要部正面図、第３図（ｂ）は基板に対する超音波ス
プレイノズルの傾斜角θを説明する図、第４図は超音波
スプレイノズルと洗浄基板の距離と異物除去率との関係
を示した特性曲線図、第５図はノズルの傾斜角θをパラ
メータとした時の洗浄時間と異物除去率との関係を示し
た特性曲線図である。 図において、 １……被洗浄基板 ２……回転機構付き固定治具 ３……固定治具 ４……支持棒 ５……超音波スプレイノズル ６……支持台、７……ガイド ８……駆動装置、９……純水タンク 10……排水タンク、11……給水配菅 12……駆動伝達部、13……飛散防止カバー 14……しきい板、15……洗浄室FIG. 1 is a front view for schematically explaining a double-sided substrate cleaning apparatus according to an embodiment of the present invention, FIG. 2 is a side view thereof, and FIG. 3 (a) shows a rotating direction of a cleaning substrate and a moving direction of an ultrasonic spray nozzle. A front view of relevant parts, FIG. 3 (b) is a view for explaining an inclination angle θ of the ultrasonic spray nozzle with respect to the substrate, and FIG. 4 shows a relationship between the distance between the ultrasonic spray nozzle and the cleaning substrate and the foreign matter removal rate. The characteristic curve diagram shown in FIG. 5 is a characteristic curve diagram showing the relationship between the cleaning time and the foreign matter removal rate when the inclination angle θ of the nozzle is used as a parameter. In the figure, 1 ... Substrate to be cleaned 2 ... Fixing jig with rotating mechanism 3 ... Fixing jig 4 ... Support rod 5 ... Ultrasonic spray nozzle 6 ... Supporting base, 7 ... Guide 8 ... Drive Equipment, 9 ... Pure water tank 10 ... Drain tank, 11 ... Water supply pipe 12 ... Drive transmission part, 13 ... Scatter prevention cover 14 ... Threshold plate, 15 ... Cleaning room
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭59−94425（ＪＰ，Ａ) 特開 平１−179422（ＪＰ，Ａ) 特開 平１−19730（ＪＰ，Ａ) 特開 平１−297186（ＪＰ，Ａ) 特開 昭63−266831（ＪＰ，Ａ) 特開 昭56−6077（ＪＰ，Ａ) 特公 平６−95382（ＪＰ，Ｂ２) 実公 昭44−11355（ＪＰ，Ｙ１) ─────────────────────────────────────────────────── ─── Continuation of front page (56) Reference JP-A-59-94425 (JP, A) JP-A-1-179422 (JP, A) JP-A-1-19730 (JP, A) JP-A-1- 297186 (JP, A) JP 63-266831 (JP, A) JP 56-6077 (JP, A) JP 6-95382 (JP, B2) JP 44-11355 (JP, Y1)
Claims (5)
基板の両面に基板の回転方向に逆らって、かつ基板面と
鋭角の傾斜をもって超音波振動が伝搬された洗浄液を基
板の回転中心軸の半径方向に走査移動させながら集中的
に噴射、浴びせることを特徴とする超音波スプレイノズ
ルを用いた基板両面の洗浄方法。1. A cleaning liquid in which ultrasonic vibration is propagated while rotating a plate-shaped substrate to be cleaned against both sides of the substrate against the direction of rotation of the substrate and at an acute angle with respect to the substrate surface. A method for cleaning both sides of a substrate using an ultrasonic spray nozzle, which comprises intensively spraying and pouring while moving in a radial direction of an axis.
回転可能に支持する支持手段と、前記基板の回転方向と
は逆らう向きに、しかも基板の回転面に対し鋭角の傾斜
をもって前記基板の両面にそれぞれ少なくとも１個の超
音波洗浄スプレイノズルを対向させる手段と、前記超音
波洗浄スプレイノズルを回転基板の半径方向に走査する
手段とを具備して成ることを特徴とする洗浄装置。2. A support means for rotatably supporting a substrate to be cleaned with at least three fixing jigs, and a substrate which is opposite to the rotation direction of the substrate and has an acute angle with respect to the rotation surface of the substrate. 2. A cleaning apparatus comprising: means for facing at least one ultrasonic cleaning spray nozzle on each side of the surface; and means for scanning the ultrasonic cleaning spray nozzle in the radial direction of the rotating substrate.
も１個を回転駆動体とし、他の少なくとも２個の固定治
具で被洗浄基板を支持すると共に前記固定治具を回転基
板の中心軸から遠ざかる方向に移動可能な構成とするこ
とにより、前記固定治具の移動で前記被洗浄基板を着脱
可能としたことを特徴とする請求項２記載の洗浄装置。3. At least one of the at least three fixing jigs is used as a rotary driving body, and the substrate to be cleaned is supported by at least two other fixing jigs, and the fixing jig is used as a central axis of the rotating substrate. The cleaning apparatus according to claim 2, wherein the cleaning target substrate can be attached and detached by moving the fixing jig by being configured to be movable in a direction away from the fixing jig.
音波洗浄スプレイノズルを相互に同期して回転基板の半
径方向に走査移動可能とした超音波洗浄スプレイノズル
の走査手段を有して成ることを特徴とする請求項２記載
の洗浄装置。4. A scanning means for ultrasonic cleaning spray nozzles, wherein ultrasonic cleaning spray nozzles arranged opposite to each other on the substrate to be cleaned are movable in a radial direction of a rotating substrate in synchronization with each other. The cleaning device according to claim 2, wherein the cleaning device comprises:
たことを特徴とする請求項2,3もしくは４記載のディス
ク基板の洗浄装置。5. The apparatus for cleaning a disk substrate according to claim 2, wherein the substrate to be cleaned is a disk substrate for a recording medium.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63087382A JPH0795540B2 (en) | 1988-04-11 | 1988-04-11 | Method and apparatus for cleaning both sides of substrate using ultrasonic cleaning spray nozzle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63087382A JPH0795540B2 (en) | 1988-04-11 | 1988-04-11 | Method and apparatus for cleaning both sides of substrate using ultrasonic cleaning spray nozzle |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01259536A JPH01259536A (en) | 1989-10-17 |
| JPH0795540B2 true JPH0795540B2 (en) | 1995-10-11 |
Family
ID=13913347
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63087382A Expired - Lifetime JPH0795540B2 (en) | 1988-04-11 | 1988-04-11 | Method and apparatus for cleaning both sides of substrate using ultrasonic cleaning spray nozzle |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0795540B2 (en) |
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|---|---|---|---|---|
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| JPWO2011135979A1 (en) * | 2010-04-28 | 2013-07-18 | コニカミノルタ株式会社 | Method for manufacturing imaging lens |
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Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5994425A (en) * | 1982-11-19 | 1984-05-31 | Nec Kyushu Ltd | Manufacturing device for semiconductor |
| JPS59150584A (en) * | 1983-02-16 | 1984-08-28 | 株式会社日立製作所 | Ultrasonic washing method and apparatus |
| JPS60143634A (en) * | 1983-12-29 | 1985-07-29 | Fujitsu Ltd | Wafer treatment and device thereof |
| JPS6218717A (en) * | 1985-07-18 | 1987-01-27 | Matsushita Electric Ind Co Ltd | Drying nozzle |
-
1988
- 1988-04-11 JP JP63087382A patent/JPH0795540B2/en not_active Expired - Lifetime
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|---|---|---|---|---|
| WO2016076303A1 (en) * | 2014-11-11 | 2016-05-19 | 株式会社荏原製作所 | Substrate washing device |
| JP2016096337A (en) * | 2014-11-11 | 2016-05-26 | 株式会社荏原製作所 | Substrate cleaning device |
| CN107004593A (en) * | 2014-11-11 | 2017-08-01 | 株式会社荏原制作所 | Base plate cleaning device |
| TWI725003B (en) * | 2014-11-11 | 2021-04-21 | 日商荏原製作所股份有限公司 | Substrate cleaning apparatus |
| CN107004593B (en) * | 2014-11-11 | 2021-06-11 | 株式会社荏原制作所 | Substrate cleaning device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01259536A (en) | 1989-10-17 |
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