JP2006167672A - Sensor cleaning device - Google Patents

Sensor cleaning device Download PDF

Info

Publication number
JP2006167672A
JP2006167672A JP2004367047A JP2004367047A JP2006167672A JP 2006167672 A JP2006167672 A JP 2006167672A JP 2004367047 A JP2004367047 A JP 2004367047A JP 2004367047 A JP2004367047 A JP 2004367047A JP 2006167672 A JP2006167672 A JP 2006167672A
Authority
JP
Japan
Prior art keywords
sensor
wiper
cleaning
water flow
pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004367047A
Other languages
Japanese (ja)
Inventor
Mitsugi Sano
貢 佐野
Original Assignee
Honda Electronic Co Ltd
本多電子株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honda Electronic Co Ltd, 本多電子株式会社 filed Critical Honda Electronic Co Ltd
Priority to JP2004367047A priority Critical patent/JP2006167672A/en
Publication of JP2006167672A publication Critical patent/JP2006167672A/en
Pending legal-status Critical Current

Links

Images

Abstract

<P>PROBLEM TO BE SOLVED: To solve the problem that a sensor cleaning device for jetting water stream from a jet port at the tip of piping can not completely remove bubbles, bacteria, water bloom, or contamination even making the water stream jet from the jet port of the piping strong. <P>SOLUTION: In this sensor cleaning device, the upper part of a rotary shaft 7 is mounted in the vicinity of the sensor 6 by means of a support (not illustrated), and the lower end of this rotary shaft 7 is fixed with a rotary blade 8. The rotary blade 8 is fixed with a wiper 9, and this wiper 9 comprises a material through which ultrasonic waves are easily transparent. The top surface of this wiper 9 is formed with a cleaning surface 9a, and the cleaning surface 9a is constituted in contact with an ultrasonic irradiation surface of the sensor 6. A jetting port 10a of the piping 10 is mounted in the vicinity of the rotary blade 8, the piping 10 is connected to a water supply device 11, and the water stream is jet from this jetting port 9a. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、汚泥槽又は浄化槽に装着したセンサの超音波照射面を洗浄するようにしたセンサ洗浄装置に関するものである。   The present invention relates to a sensor cleaning apparatus that cleans an ultrasonic irradiation surface of a sensor attached to a sludge tank or a septic tank.
従来、センサ洗浄装置として、図4に示すように、汚泥槽又は浄化槽1の汚水2の上面にセンサ3を装着し、汚水2に浸漬したセンサ3の照射面から汚水2内に超音波を照射して汚水2内に溜まった汚泥のレベルを検出するレベル計や、汚水2の濃度を検出する濃度計が提案されているが、このようなレベル計又は濃度計では、センサ3の照射面に発生した気泡や、バクテリア、アオコ又は汚れが付着すると、センサ3の音響インピーダンスが低下し、センサ3から照射する超音波を反射させたり、吸収して、超音波の送受波が阻害されるために、図5に示すように、水供給装置5に配管を接続し、この配管4の先端の噴出口4aから水流を噴出して、センサ3の照射面を洗浄するようにするものが提案されている。   Conventionally, as a sensor cleaning device, as shown in FIG. 4, a sensor 3 is mounted on the upper surface of sewage 2 in a sludge tank or septic tank 1, and ultrasonic waves are irradiated into the sewage 2 from the irradiation surface of the sensor 3 immersed in the sewage 2. Then, a level meter that detects the level of sludge accumulated in the sewage 2 and a concentration meter that detects the concentration of the sewage 2 have been proposed. When the generated air bubbles, bacteria, blue water or dirt adheres, the acoustic impedance of the sensor 3 decreases, and the ultrasonic wave irradiated from the sensor 3 is reflected or absorbed, so that transmission / reception of the ultrasonic wave is inhibited. As shown in FIG. 5, a pipe is connected to the water supply device 5 and a water flow is ejected from a jet outlet 4a at the tip of the pipe 4 to clean the irradiation surface of the sensor 3. Yes.
しかしながら、このように、水供給装置5から供給された配管4の先端の噴出口4aから水流を噴出して、センサを洗浄するセンサ洗浄装置では、配管4の噴出口4aから噴出される水流を強くした場合は気泡はとれるが、バクテリアやアオコ又は汚れが取りきれないという問題がある。   However, in this way, in the sensor cleaning device for cleaning the sensor by jetting a water flow from the jet outlet 4a at the tip of the pipe 4 supplied from the water supply device 5, the water jet jetted from the jet outlet 4a of the pipe 4 is used. If it is strengthened, bubbles can be removed, but there is a problem that bacteria, blue sea cucumbers or dirt cannot be removed.
解決しようとする問題点は、配管の先端の噴出口から水流を噴出するセンサ洗浄装置では、配管の噴出口から噴出される水流を強くしても、気泡や、バクテリア、アオコ又は汚れが取りきれないという問題がある。   The problem to be solved is that in the sensor cleaning device that ejects a water flow from the jet outlet at the end of the pipe, even if the water flow jetted from the pipe jet outlet is strengthened, bubbles, bacteria, aquatic or dirt can be removed. There is no problem.
本発明では、汚泥槽又は浄化槽に装着したセンサから超音波を照射して、汚泥槽又は浄化槽内の汚泥のレベル又は濃度を検出するようにしたレベル又は濃度計において、回転軸に回転可能に装着されたワイパーの洗浄面をセンサの超音波照射面に接触するように配置し、センサの近傍に配置した配管の先端の噴出口から噴出する水流によってワイパーを回転し、ワイパーでセンサの超音波照射面を洗浄するものである。   In the present invention, in a level or densitometer that detects the level or concentration of sludge in a sludge tank or septic tank by irradiating ultrasonic waves from a sensor attached to the sludge tank or septic tank, the rotary shaft is rotatably mounted. The wiper cleaning surface is placed in contact with the ultrasonic irradiation surface of the sensor, and the wiper is rotated by the water flow ejected from the jet outlet at the tip of the pipe arranged in the vicinity of the sensor. The surface is to be cleaned.
本発明のセンサ洗浄装置では、ワイパーに回転羽根を装着し、配管の先端の噴出口から流水を噴出して回転羽根を回転し、ワイパーを回転して、ワイパーの洗浄面をセンサの超音波照射面に接触させて洗浄するようにしたので、気泡や、バクテリア、アオコ又は汚れが簡単に取れ、音響インピーダンスの低下やセンサにおける超音波の反射や吸収をなくし、超音波の送受波が阻害されることを防ぐことができる。   In the sensor cleaning device of the present invention, a rotating blade is attached to a wiper, flowing water is spouted from a jet outlet at the tip of a pipe, the rotating blade is rotated, the wiper is rotated, and the cleaning surface of the wiper is irradiated with ultrasonic waves of the sensor. Since cleaning is done by touching the surface, bubbles, bacteria, mushrooms or dirt can be removed easily, acoustic impedance is reduced, and reflection and absorption of ultrasonic waves at the sensor are eliminated, and transmission and reception of ultrasonic waves are hindered. Can be prevented.
本発明では、汚泥槽又は浄化槽に装着したセンサから超音波を照射して、汚泥槽又は浄化槽内の汚泥のレベル又は濃度を検出するようにしたレベル又は濃度計において、回転軸に回転可能に装着されたワイパーの洗浄面をセンサの超音波照射面に接触するように配置し、ワイパーの回転羽根にセンサの近傍に配置した配管の先端の噴出口から噴出する水流を吹き付けることによってワイパーを回転し、ワイパーでセンサの超音波照射面を洗浄するものである。   In the present invention, in a level or densitometer that detects the level or concentration of sludge in a sludge tank or septic tank by irradiating ultrasonic waves from a sensor attached to the sludge tank or septic tank, the rotary shaft is rotatably mounted. The wiper cleaning surface is placed in contact with the ultrasonic irradiation surface of the sensor. The ultrasonic irradiation surface of the sensor is cleaned with a wiper.
図1は本発明の実施例のセンサ洗浄装置の構成図で、センサ6の近傍に回転軸7の上部が支持体(図示せず)によって装着され、この回転軸7の下端に回転羽根8が固着され、又、回転羽根8にワイパー9が固着され、このワイパー9は超音波が透過し易い物質で構成され、又、このワイパー9の上面に洗浄面9aが形成され、この洗浄面9aはセンサ6の超音波照射面と接触するように構成され、さらに、回転羽根8の近傍に配管10の噴出口10aが装着され、配管10は水供給装置11に接続され、この噴出口9aから水流が噴出するように構成されている。   FIG. 1 is a block diagram of a sensor cleaning apparatus according to an embodiment of the present invention. An upper portion of a rotating shaft 7 is mounted near a sensor 6 by a support (not shown), and a rotating blade 8 is provided at the lower end of the rotating shaft 7. The wiper 9 is fixed to the rotary blade 8, and the wiper 9 is made of a material that easily transmits ultrasonic waves. A cleaning surface 9 a is formed on the upper surface of the wiper 9, and the cleaning surface 9 a It is comprised so that it may contact with the ultrasonic irradiation surface of the sensor 6, Furthermore, the spout 10a of the piping 10 is mounted | worn in the vicinity of the rotary blade 8, the piping 10 is connected to the water supply apparatus 11, and water flow is carried out from this spout 9a. Is configured to erupt.
このように構成された本実施例のセンサ洗浄装置では、配管10の噴出口10aから水流が噴出されると、回転羽根8が回転することによって、ワイパー9が回転し、ワイパー9の上面の洗浄面9aがセンサ6の超音波照射面をこすることによって、気泡やバクテリア、アオコ又は汚れがこすり取られて洗浄されるので、音響インピーダンスの低下やセンサにおける超音波の反射や吸収をなくし、超音波の送受波が阻害されることを防ぐことができ、又、こすり落とされた気泡やバクテリア、アオコ又は汚れは配管9の噴出口10aから噴出される水流によって遠くに流され、こすられた気泡やバクテリア、アオコ又は汚れがすぐに再度付着するようなことを防ぐことができ、又、ワイパー9が楕円形に構成されているので、センサ6を洗浄しない場合は、ワイパー9をセンサ6の照射面から離して置くことができるという利点がある。   In the sensor cleaning apparatus of the present embodiment configured as described above, when a water flow is ejected from the ejection port 10 a of the pipe 10, the rotating blade 8 rotates to rotate the wiper 9, thereby cleaning the upper surface of the wiper 9. As the surface 9a rubs the ultrasonic irradiation surface of the sensor 6, bubbles, bacteria, blue-greens or dirt are scraped off and cleaned, so that the acoustic impedance is reduced and the reflection and absorption of ultrasonic waves at the sensor are eliminated. It is possible to prevent the transmission / reception of sound waves from being inhibited, and the rubbed bubbles, bacteria, blue-greens, or dirt are washed away by the water flow ejected from the spout 10a of the pipe 9 and rubbed. And bacteria, water spills or dirt can be prevented from re-attaching immediately, and the wiper 9 has an oval shape so that the sensor 6 can be cleaned. If not, there is an advantage of being able to put away the wiper 9 irradiated surface of the sensor 6.
図2は本発明の他の実施例のセンサ洗浄装置の構成図で、6はセンサ、7は回転軸、9はワイパー、10は配管、10aは噴出口、11は水供給装置でこれらの構成は上記実施例と同じであるので、説明は省略するが、本実施例では、回転羽根9bをワイパー9の側面に装着したものである。   FIG. 2 is a configuration diagram of a sensor cleaning device according to another embodiment of the present invention, in which 6 is a sensor, 7 is a rotating shaft, 9 is a wiper, 10 is a pipe, 10a is a spout, and 11 is a water supply device. Since this is the same as the above embodiment, the description thereof is omitted, but in this embodiment, the rotary blade 9b is mounted on the side surface of the wiper 9.
このように構成した本実施例においても、配管10の噴出口10aから噴出された水流がワイパー9の側面に装着された回転羽根9bに噴出されるので、ワイパー9が回転し、センサ6の照射面を洗浄することができ、又、このワイパー9は楕円形でもよいが、回転し易いように円形でもよい。   Also in the present embodiment configured as described above, the water flow ejected from the ejection port 10a of the pipe 10 is ejected to the rotary blade 9b attached to the side surface of the wiper 9, so that the wiper 9 rotates and the sensor 6 is irradiated. The surface can be cleaned, and the wiper 9 may be oval, but may be circular so that it can rotate easily.
図3は本発明の他の実施例のセンサ洗浄装置の構成図で、6はセンサ、7は回転軸、9はワイパー、10は配管、10aは噴出口、11は水供給装置でこれらの構成は上記実施例と同じであるので、説明は省略するが、本実施例では、ワイパー9の上面を回転羽根8cに構成し、この回転羽根9cの上面に洗浄部を形成し、回転羽根9cの下部は配管10の噴出口10aから噴出した水流が効率よく回転羽根9cに当たるように円板9dが設けられている。   FIG. 3 is a block diagram of a sensor cleaning device according to another embodiment of the present invention, wherein 6 is a sensor, 7 is a rotating shaft, 9 is a wiper, 10 is a pipe, 10a is a spout, and 11 is a water supply device. However, in this embodiment, the upper surface of the wiper 9 is formed on the rotary blade 8c, and a cleaning unit is formed on the upper surface of the rotary blade 9c. The lower part is provided with a disk 9d so that the water flow ejected from the ejection port 10a of the pipe 10 efficiently hits the rotary blade 9c.
このように構成した本実施例においても、配管10の噴出口10aから噴出された水流がワイパー9の回転羽根9cに噴出されるので、ワイパー9が回転し、ワイパー9の回転羽根9cの上面の洗浄部でセンサ6の照射面を洗浄することができる。   Also in the present embodiment configured as described above, the water flow ejected from the ejection port 10a of the pipe 10 is ejected to the rotating blade 9c of the wiper 9, so that the wiper 9 rotates and the upper surface of the rotating blade 9c of the wiper 9 is rotated. The irradiation surface of the sensor 6 can be cleaned by the cleaning unit.
なお、上記実施例において、上記3つの実施例以外にも、ワイパー9を配管10の噴出口10aから噴出される水流で回転するものであれば、本発明の構成であることは言うまでもない。   In addition, in the said Example, it cannot be overemphasized that it is the structure of this invention if the wiper 9 rotates with the water flow injected from the jet nozzle 10a of the piping 10 besides the said 3 Example.
本発明の実施例のセンサ洗浄装置の構成図である。It is a block diagram of the sensor cleaning apparatus of the Example of this invention. 本発明の他の実施例のセンサ洗浄装置の構成図である。It is a block diagram of the sensor washing | cleaning apparatus of the other Example of this invention. 本発明のさらに他の実施例のセンサ洗浄装置の構成図である。It is a block diagram of the sensor washing | cleaning apparatus of other Example of this invention. センサを装着する汚泥槽又は浄化槽の構成図である。It is a block diagram of the sludge tank or septic tank which mounts a sensor. 従来のセンサ洗浄装置の構成図である。It is a block diagram of the conventional sensor washing | cleaning apparatus.
符号の説明Explanation of symbols
6 センサ
7 回転軸
8 回転羽根
9 ワイパー
10 配管
11 水供給装置
6 Sensor 7 Rotating shaft 8 Rotating blade 9 Wiper 10 Piping 11 Water supply device

Claims (4)

  1. 汚泥槽又は浄化槽に装着したセンサから超音波を照射して、前記汚泥槽又は浄化槽内の汚泥のレベル又は濃度を検出するようにしたレベル又は濃度計において、前記センサの近傍に配置した回転軸でワイパーを回転可能に装着し、該ワイパーの洗浄部を前記センサの超音波照射面に接触させ、前記ワイパーを前記センサの近傍に配置した配管の先端の噴出口から噴出する水流によって回転することにより、前記センサの超音波照射面を洗浄することを特徴するセンサ洗浄装置。   In a level or densitometer that detects the level or concentration of sludge in the sludge tank or septic tank by irradiating ultrasonic waves from a sensor attached to the sludge tank or septic tank, with a rotating shaft arranged in the vicinity of the sensor A wiper is rotatably mounted, the cleaning part of the wiper is brought into contact with the ultrasonic irradiation surface of the sensor, and the wiper is rotated by a water flow ejected from a jet outlet at a tip of a pipe disposed in the vicinity of the sensor. A sensor cleaning apparatus for cleaning an ultrasonic irradiation surface of the sensor.
  2. 前記ワイパーを水流によって回転するために、前記ワイパーの回転軸に回転羽根を装着し、前記配管の先端の噴出口から噴出する水流で前記ワイパーを回転することを特徴とする請求項1記載のセンサ洗浄出装置。   2. The sensor according to claim 1, wherein a rotating blade is attached to a rotating shaft of the wiper to rotate the wiper by a water flow, and the wiper is rotated by a water flow ejected from a jet outlet at a tip of the pipe. Washing out device.
  3. 前記ワイパーを水流によって回転するために、前記ワイパーの側面に羽根を装着し、前記配管の先端の噴出口から噴出する水流で前記ワイパーを回転することを特徴とする請求項1記載のセンサ洗浄装置。   2. The sensor cleaning device according to claim 1, wherein a blade is attached to a side surface of the wiper to rotate the wiper by a water flow, and the wiper is rotated by a water flow ejected from a jet outlet at a tip of the pipe. .
  4. 前記ワイパーを水流によって回転するために、前記ワイパーは回転羽根で構成し、前記配管の先端の噴出口から噴出する水流で該回転羽根を回転し、前記超音波振動子を洗浄することを特徴とする請求項1記載のセンサ洗浄装置。   In order to rotate the wiper by a water flow, the wiper is constituted by a rotating blade, the rotating blade is rotated by a water flow ejected from a jet outlet at a tip of the pipe, and the ultrasonic vibrator is cleaned. The sensor cleaning device according to claim 1.
JP2004367047A 2004-12-20 2004-12-20 Sensor cleaning device Pending JP2006167672A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004367047A JP2006167672A (en) 2004-12-20 2004-12-20 Sensor cleaning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004367047A JP2006167672A (en) 2004-12-20 2004-12-20 Sensor cleaning device

Publications (1)

Publication Number Publication Date
JP2006167672A true JP2006167672A (en) 2006-06-29

Family

ID=36668974

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004367047A Pending JP2006167672A (en) 2004-12-20 2004-12-20 Sensor cleaning device

Country Status (1)

Country Link
JP (1) JP2006167672A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009158400A1 (en) * 2008-06-25 2009-12-30 Boltz Eric S Multi-port probe purge systems and techniques
CN106733797A (en) * 2016-12-27 2017-05-31 宁夏软件工程院有限公司 One kind electrolysis electroplating workshop ground waste-liquid cleaning device
KR20200138879A (en) * 2019-06-03 2020-12-11 이수남 Ultrasonic level sensor device having condensation removal means
WO2021007947A1 (en) * 2019-07-15 2021-01-21 杨胜杰 Auxiliary apparatus for preventing jellyfish from attaching to marine sensor

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009158400A1 (en) * 2008-06-25 2009-12-30 Boltz Eric S Multi-port probe purge systems and techniques
US8844094B2 (en) 2008-06-25 2014-09-30 United Process Control Inc. Multi-port probe purge systems and techniques
CN106733797A (en) * 2016-12-27 2017-05-31 宁夏软件工程院有限公司 One kind electrolysis electroplating workshop ground waste-liquid cleaning device
KR20200138879A (en) * 2019-06-03 2020-12-11 이수남 Ultrasonic level sensor device having condensation removal means
KR102224375B1 (en) * 2019-06-03 2021-03-08 이수남 Ultrasonic level sensor device having condensation removal means
WO2021007947A1 (en) * 2019-07-15 2021-01-21 杨胜杰 Auxiliary apparatus for preventing jellyfish from attaching to marine sensor

Similar Documents

Publication Publication Date Title
JP5602724B2 (en) Method and equipment for cleaning surfaces under water
JP2006167672A (en) Sensor cleaning device
TW200405825A (en) Filter device
KR20140104466A (en) Fouling reduction device and method
JP5100358B2 (en) Filter cleaning device and filter cleaning method
JPH0795540B2 (en) Method and apparatus for cleaning both sides of substrate using ultrasonic cleaning spray nozzle
JP4247150B2 (en) Ultrasonic disinfection and decomposition equipment
CN209255355U (en) A kind of supersonic wave cleaning machine
CN210352924U (en) Belt cleaning device of squid production usefulness
JP2559360Y2 (en) Oil mist removal device
JP3829237B2 (en) Interface measuring device
JP2006136815A (en) Cleaning method and cleaning apparatus
JP2007319748A (en) Ultrasonic cleaning device
JP2006274604A (en) Private part washing device
JP3545716B2 (en) Raw laver washing machine
JP2821887B2 (en) Ultrasonic cleaning equipment
JPH0766164A (en) Rotary cleaning equipment for thin material
JP2006337124A (en) Probe support for submersible pressure type water-level gauge
JP6805708B2 (en) Cleaning equipment
KR100683890B1 (en) Supersonic cleaner
JPH04187293A (en) Submersion type sewage cleaning method and device therefor
JPH09101243A (en) Water sampler
JP2004329026A (en) Method and apparatus for removing foreign matter or impurity from seaweed
JP3818999B2 (en) Cleaning device
JP2010012366A (en) Microbubble generation apparatus and microbubble generating method