JPH0794330B2 - Mold for glass molding - Google Patents
Mold for glass moldingInfo
- Publication number
- JPH0794330B2 JPH0794330B2 JP63143779A JP14377988A JPH0794330B2 JP H0794330 B2 JPH0794330 B2 JP H0794330B2 JP 63143779 A JP63143779 A JP 63143779A JP 14377988 A JP14377988 A JP 14377988A JP H0794330 B2 JPH0794330 B2 JP H0794330B2
- Authority
- JP
- Japan
- Prior art keywords
- mold
- glass
- base material
- zrb
- glass molding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/05—Press-mould die materials
- C03B2215/07—Ceramic or cermets
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Ceramic Products (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、光学レンズ等のガラス成形体をプレス成形し
た後の磨き工程を必要とせず、しかも繰り返し使用に対
する耐久性の大なるガラス成形用型に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention does not require a polishing step after press-molding a glass molding such as an optical lens, and has a great durability against repeated use. Regarding the type.
ガラス成形工程においては、供給された軟らかいガラス
は、ブローやプレスなどの成形を受けながら冷却され
る。この工程で重要なことは、ガラス成形用型として、
軟化したガラスと反応せず、型形状のガラス成形体への
転写性に優れ、しかもガラス成形面が損傷を受けない型
を使用することである。In the glass forming step, the supplied soft glass is cooled while undergoing forming such as blowing or pressing. What is important in this process is as a glass molding mold,
It is to use a mold that does not react with the softened glass, is excellent in transferability to a glass molding having a mold shape, and does not damage the glass molding surface.
従来、このような条件を備えるべくセラミックス製型に
ついて種々検討されており、その例として、SiCやSi3N4
焼結体があるが、これらはガラスと反応しやすい焼結助
剤が含まれているので上記条件を満たすことはできな
い。Conventionally, various ceramic molds have been studied to provide such conditions, and examples thereof include SiC and Si 3 N 4
Although there are sintered bodies, these cannot satisfy the above conditions because they contain a sintering aid that easily reacts with glass.
そこで、ZrO2製型母材面にPt−Rh等の白金合金のコーテ
ィング膜（特公昭63−11285号公報）や、WC製型母材上
にZrB2等の金属ホウ化物層（特開昭63−50335号公報）
を形成させたり、ガラスプレス装置の搬送アーム又は離
型リングとして、AlN、B4C等のセラミックスで被覆され
た金属製部材を使用することが検討されている。Therefore, a coating film of a platinum alloy such as Pt-Rh is formed on the surface of the ZrO 2 mold base material (Japanese Patent Publication No. 63-11285), and a metal boride layer such as ZrB 2 is formed on the WC mold base material (Japanese Patent Application Laid-Open No. Sho-06-11285). 63-50335)
It has been considered to use a metal member coated with a ceramic such as AlN or B 4 C as a transfer arm or a mold release ring of a glass press machine.
しかしながら、これらの技術では、型母材と被覆膜との
材質が異なっているため、型の繰り返し使用によって被
覆膜が剥がれ易くなり、型の耐久性が充分でなかった。However, in these techniques, since the mold base material and the coating film are made of different materials, the coating film is easily peeled off by repeated use of the mold, and the durability of the mold is not sufficient.
本発明者らは、上記問題点を解消することを目的として
種々検討した結果、ガラス組成にはいろいろあるがこれ
らとはほとんど反応することがなく、しかも転写性が良
好で繰り返し使用による損傷も極めて少なく、特に光学
レンズの型として、非常に高度な寸法精度と加工性（研
磨性）を有する材料として、ZrB2（ホウ化ジルコニウ
ム）が最適であることを見いだし、本発明を完成させる
ものである。As a result of various studies aimed at solving the above-mentioned problems, the present inventors have found that there are various glass compositions, but they hardly react with them, and the transferability is good, and damage due to repeated use is extremely high. It was found that ZrB 2 (zirconium boride) is the most suitable as a material having a very high degree of dimensional accuracy and workability (polishing property) as a mold for optical lenses, and thus completes the present invention. .
すなわち、本発明は、ZrB2を主成分とする焼結体からな
り、しかもガラス成形面の最大表面粗さが0.02μｍ以下
である型母材にZrB2の薄膜が施されてなることを特徴と
するガラス成形用型である。That is, the present invention is characterized in that a ZrB 2 thin film is applied to a mold base material composed of a sintered body containing ZrB 2 as a main component and having a glass molding surface with a maximum surface roughness of 0.02 μm or less. It is a glass molding die.
以下、さらに詳しく本発明を説明する。Hereinafter, the present invention will be described in more detail.
本発明の型母材として使用されるZrB2を主成分とする焼
結体は、平均粒径10μｍ以下のZrB2粉末に、焼結助剤と
して、Cr3C2、SiC、TiC等の炭化物、TiN、TaN等の窒化
物、MoSi2、ZrSi2等の系ケイ化物、Fe、Co、Ni等の金属
を添加し、真空又は還元性雰囲気下、常圧焼結、HIP焼
結又はホットプレス焼結をして製造することができる。The sintered body containing ZrB 2 as a main component of the present invention is a ZrB 2 powder having an average particle size of 10 μm or less, and a carbide such as Cr 3 C 2 , SiC, TiC as a sintering aid. , TiN, TaN, and other nitrides, MoSi 2 , ZrSi 2, and other system silicides, Fe, Co, Ni, and other metals are added, and in a vacuum or reducing atmosphere, atmospheric pressure sintering, HIP sintering, or hot pressing. It can be manufactured by sintering.
このようなZrB2を主成分とする焼結体それ自体は知られ
ているが、本発明ではそれを型母材として使用したこと
が第１の特徴である。Although such a sintered body containing ZrB 2 as a main component is known per se, the first feature of the present invention is to use it as a mold base material.
ZrB2を主成分とする焼結体から本発明で使用される型母
材を製造するには、焼結体をダイヤモンド砥粒等によっ
て切削・研磨して高精度の型形状に加工するが、その場
合、ガラス成形面を最大表面粗さ0.02μｍ以下の精度に
研磨する。ガラス成形面の最大表面粗さが0.02μｍをこ
えると、製造されたガラス成形体の表面精度が充分でな
くなり、光学レンズ等として適性でなくなる。In order to manufacture the die base material used in the present invention from the sintered body containing ZrB 2 as a main component, the sintered body is cut and polished with diamond abrasive grains or the like to be processed into a highly precise die shape, In that case, the glass molding surface is polished with an accuracy of maximum surface roughness of 0.02 μm or less. If the maximum surface roughness of the glass molding surface exceeds 0.02 μm, the surface accuracy of the manufactured glass molding becomes insufficient and it becomes unsuitable as an optical lens or the like.
以上のようにして製造された型母材には数μｍ〜数十μ
ｍの気孔が存在し、それらがガラス成形体の表面精度に
悪影響を与えるので、本発明では型母材の表面にZrB2の
漠膜を形成させたことが第２の特徴である。このよう
に、本発明において型母材と薄膜との主成分を一致させ
たのは、両者の密着性を最大のものとするためである。The mold base material manufactured as described above has several μm to several tens μm.
The second feature of the present invention is the formation of a ZrB 2 vague film on the surface of the mold base material, since m pores exist and these adversely affect the surface accuracy of the glass molded body. As described above, the main components of the mold base material and the thin film are made to coincide with each other in the present invention in order to maximize the adhesion between them.
ZrB2の薄膜の形成法としては、CVD法、スパッタリング
法、あるいはZr成分を含む金属アルコキシド等の有機金
属化合物とＢ成分を含むアミン系化合物又はエチル硼酸
等との混合スラリーを型母材に塗布してから加熱処理す
る方法、さらにはZrB2チップを型母材に接触解離振動を
与えながらパルス放電を行う方法等を採用することがで
きる。The thin film of ZrB 2 can be formed by a CVD method, a sputtering method, or a mixed slurry of an organometallic compound such as a metal alkoxide containing a Zr component and an amine compound containing a B component or ethyl boric acid is applied to the mold base material. Then, a method of heat treatment, a method of performing pulse discharge while applying contact dissociation vibration to the die base material of the ZrB 2 chip, and the like can be adopted.
薄膜の厚みとしては、１〜数百μｍが望ましいが、適正
値は、薄膜の形成法や型母材の形状・加工方法によって
異なる。型母材が目標形状に近いほど薄くてよい。The thickness of the thin film is preferably 1 to several hundreds of μm, but the appropriate value varies depending on the thin film forming method and the shape / processing method of the die base material. The closer the mold base material is to the target shape, the thinner it may be.
以下、本発明を実施例と比較例をあげて具体的に説明す
る。Hereinafter, the present invention will be specifically described with reference to Examples and Comparative Examples.
実施例１参考例１〜２ ZrB2粉末（平均粒径2.9μｍ）、AlN粉末（平均粒径2.6
μｍ）又はB4C粉末（平均粒径1.8μｍ）とCr3C2粉末
（平均粒径4.0μｍ）又はY2O3粉末（平均粒径5.0μｍ）
とを、表−１に示す配合及び焼結条件で円板焼結体（直
径20mm×厚み5mm）を製造し、それをラッピングとポリ
ッシングによって最大表面粗さ（Rmax）0.002μｍ以下
に鏡面研磨して型母材とした。Example 1 Reference Examples 1-2 ZrB 2 powder (average particle size 2.9 μm), AlN powder (average particle size 2.6
μm) or B 4 C powder (average particle size 1.8 μm) and Cr 3 C 2 powder (average particle size 4.0 μm) or Y 2 O 3 powder (average particle size 5.0 μm)
And a disk sintered body (diameter 20 mm x thickness 5 mm) are manufactured under the composition and sintering conditions shown in Table-1, and are mirror-polished to a maximum surface roughness (R max ) of 0.002 μm or less by lapping and polishing And used as the mold base material.
次いで、これらの型母材表面に、型母材がZrB2である場
合には、スパッタリング法により厚み１μｍのZrB2薄膜
（実施例１）を、AlNである場合には、CVD法により厚み
５μｍのAlN薄膜（参考例１）を、さらにはB4Cである場
合には、CVD法により厚み５μｍのB4C薄膜（参考例２）
をそれぞれ形成させて本発明のガラス成形用型を製造し
た。Then, on the surface of these mold base materials, when the mold base material is ZrB 2 , a ZrB 2 thin film (Example 1) having a thickness of 1 μm is formed by a sputtering method, and when the mold base material is AlN, a thickness of 5 μm is formed by a CVD method. AlN thin film (reference example 1), and when B 4 C is used, a B 4 C thin film having a thickness of 5 μm by the CVD method (reference example 2)
To form a glass molding die of the present invention.
SiO264.9％、B2O32.9％、Na2O 5.2％、K2O 15.2％、BaO
9.6％、ZnO 2.0％からなる硼ケイ酸アルカリ系ガラ
ス、又はPbO 45.1％、SiO245.7％、Na2O 3.6％、K2O 5.
0％からなる酸化鉛系ガラスの円柱状チップ（半径10mm
×高さ5mm）を、上記で製造したガラス成形用型に載
せ、N2雰囲気中、温度700℃で加熱した際におけるガラ
スと型との反応性、転写性及び繰り返し使用における型
の耐久性を以下に従って評価した。それらの結果を表−
２に示す。SiO 2 64.9%, B 2 O 3 2.9%, Na 2 O 5.2%, K 2 O 15.2%, BaO
Borosilicate alkali glass consisting of 9.6%, ZnO 2.0%, or PbO 45.1%, SiO 2 45.7%, Na 2 O 3.6%, K 2 O 5.
Cylindrical chip of 0% lead oxide glass (radius 10 mm
X height 5 mm) is placed on the glass molding die manufactured above, and the reactivity between the glass and the die when heated at a temperature of 700 ° C. in an N 2 atmosphere, transferability, and durability of the die during repeated use It was evaluated according to the following. Table of the results
2 shows.
（１）反応性 型の表面組織を光学顕微鏡で観察し、ガラスとの反応性
（着色・発泡等）を以下の４段階で評価した。(1) Reactivity The surface texture of the mold was observed with an optical microscope, and the reactivity with glass (coloring, foaming, etc.) was evaluated according to the following four grades.
◎：ガラスとの反応が認められない ○：ガラスとの反応がやや有る △：ガラスとの反応が有る ×：ガラスとの反応が顕著に認められる （２）転写性 型の表面組織を光学顕微鏡で観察し、型とガラスとの形
状（表面組織）の一致性の程度を以下の４段階で評価し
た。⊚: No reaction with glass ○: Slight reaction with glass Δ: Reaction with glass ×: Remarkable reaction with glass (2) Optical texture of transferable mold surface And the degree of conformity of the shape (surface texture) between the mold and the glass was evaluated according to the following four grades.
◎：型とガラスとの形状が一致 ○：型とガラスとの形状がかなり一致 △：型とガラスとの形状がやや一致 ×：型とガラスとの形状の識別が不可能 （３）耐久性 型の間にガラスを挟み、圧力50kg/cm2、温度700℃の条
件でプレスした後冷却する操作を100回繰り返した際
の、ガラスの表面組織・形状の変化（転写性）を光学顕
微鏡で観察し、その程度を以下の４段階で評価した。◎: The shape of the mold and the glass match ○: The shape of the mold and the glass considerably match △: The shape of the mold and the glass match slightly ×: The shape of the mold and glass cannot be distinguished (3) Durability Glass is sandwiched between molds, pressure 50kg / cm 2 , pressing at 700 ° C and then cooling is repeated 100 times, and the change in surface texture and shape of glass (transferability) is observed with an optical microscope. It was observed and the degree was evaluated according to the following four grades.
◎：ガラス組織・形状の変化が認められない ○：ガラス組織・形状の変化がやや有る △：ガラス組織・形状の変化が有る ×：ガラス組織・形状の変化が顕著である 比較例１〜３ 実施例１〜３において、薄膜を形成させないZrB2、AlN
又はB4Cを主成分とする型母材をそれぞれ型として使用
した。それらの結果を表−２に示す。⊚: No change in glass structure / shape ◯: Slight change in glass structure / shape Δ: Change in glass structure / shape X: Significant change in glass structure / shape Comparative Examples 1 to 3 In Examples 1 to 3, ZrB 2 which does not form a thin film, AlN
Alternatively, a mold base material containing B 4 C as a main component was used as a mold. The results are shown in Table-2.
比較例４ 市販のSiC焼結体を鏡面仕上げしてなる型を使用した。
その結果を表−２に示す。Comparative Example 4 A mold obtained by mirror-finishing a commercially available SiC sintered body was used.
The results are shown in Table-2.
比較例５ 市販のSi3N4焼結体を鏡面仕上げしてなる型を使用し
た。その結果を表−２に示す。Comparative Example 5 A mold obtained by mirror-finishing a commercially available Si 3 N 4 sintered body was used. The results are shown in Table-2.
比較例６ ZrO2製型母材表面にPt75％−Rh25％の白金合金をスパッ
タリング法によってコーティングしてなる型を使用し
た。その結果を表−２に示す。Comparative Example 6 A mold was used in which the surface of the ZrO 2 mold base material was coated with a Pt 75% -Rh 25% platinum alloy by a sputtering method. The results are shown in Table-2.
比較例７ WC製型母材表面にZrB2薄膜をスパッタリング法によって
形成させてなる型を使用した。その結果を表−２に示
す。Comparative Example 7 A mold was used in which a ZrB 2 thin film was formed on the surface of a WC mold base material by a sputtering method. The results are shown in Table-2.
比較例８ ステンレス製型母材表面にAlN薄膜をCVD法によって形成
させてなる型を使用した。その結果を表−２に示す。Comparative Example 8 A mold in which an AlN thin film was formed on the surface of a stainless mold base material by a CVD method was used. The results are shown in Table-2.
〔発明の効果〕 本発明のガラス成形用型は、従来の型と同程度に優れた
ガラスとの非反応性と良好な転写性を保持したままで、
型の繰り返し使用に対する耐久性を向上させることがで
きる。 [Effects of the Invention] The glass molding die of the present invention, while maintaining the same excellent non-reactivity with glass and good transferability as the conventional die,
The durability against repeated use of the mold can be improved.
Claims (1)
もガラス成形面の最大表面粗さが0.02μｍ以下である型
母材にZrB2の薄膜が施されてなることを特徴とするガラ
ス成形用型。1. A mold base material comprising a sintered body containing ZrB 2 as a main component and having a glass molding surface with a maximum surface roughness of 0.02 μm or less, and a thin film of ZrB 2 applied thereto. Mold for glass molding.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63143779A JPH0794330B2 (en) | 1988-06-13 | 1988-06-13 | Mold for glass molding |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63143779A JPH0794330B2 (en) | 1988-06-13 | 1988-06-13 | Mold for glass molding |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01313337A JPH01313337A (en) | 1989-12-18 |
| JPH0794330B2 true JPH0794330B2 (en) | 1995-10-11 |
Family
ID=15346816
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63143779A Expired - Lifetime JPH0794330B2 (en) | 1988-06-13 | 1988-06-13 | Mold for glass molding |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0794330B2 (en) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6350335A (en) * | 1986-08-20 | 1988-03-03 | Matsushita Electric Ind Co Ltd | Mold for molding optical glass element |
| JP2572047B2 (en) * | 1986-10-06 | 1997-01-16 | オリンパス光学工業株式会社 | Glass press equipment members |
-
1988
- 1988-06-13 JP JP63143779A patent/JPH0794330B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01313337A (en) | 1989-12-18 |
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