JPS63166729A - Production of optical glass element - Google Patents
Production of optical glass elementInfo
- Publication number
- JPS63166729A JPS63166729A JP31207886A JP31207886A JPS63166729A JP S63166729 A JPS63166729 A JP S63166729A JP 31207886 A JP31207886 A JP 31207886A JP 31207886 A JP31207886 A JP 31207886A JP S63166729 A JPS63166729 A JP S63166729A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- mold
- weight
- press
- optical glass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000005304 optical glass Substances 0.000 title claims abstract description 35
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000010409 thin film Substances 0.000 claims abstract description 40
- 239000000463 material Substances 0.000 claims abstract description 23
- OYJSZRRJQJAOFK-UHFFFAOYSA-N palladium ruthenium Chemical compound [Ru].[Pd] OYJSZRRJQJAOFK-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229910052702 rhenium Inorganic materials 0.000 claims abstract description 14
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 11
- 239000000956 alloy Substances 0.000 claims abstract description 11
- 229910052762 osmium Inorganic materials 0.000 claims abstract description 11
- 239000011521 glass Substances 0.000 claims abstract description 8
- 229910052707 ruthenium Inorganic materials 0.000 claims abstract description 6
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 4
- 239000010937 tungsten Substances 0.000 claims abstract 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims abstract 2
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims abstract 2
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 claims abstract 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims abstract 2
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 claims abstract 2
- 238000000465 moulding Methods 0.000 claims description 29
- 238000000034 method Methods 0.000 claims description 9
- 229910052715 tantalum Inorganic materials 0.000 claims description 7
- 230000003287 optical effect Effects 0.000 claims description 4
- 239000011195 cermet Substances 0.000 claims description 3
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 claims description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims 1
- UFGZSIPAQKLCGR-UHFFFAOYSA-N chromium carbide Chemical group [Cr]#C[Cr]C#[Cr] UFGZSIPAQKLCGR-UHFFFAOYSA-N 0.000 claims 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 1
- 229910003470 tongbaite Inorganic materials 0.000 claims 1
- 229910000691 Re alloy Inorganic materials 0.000 abstract description 14
- 229910001080 W alloy Inorganic materials 0.000 abstract description 14
- 229910000929 Ru alloy Inorganic materials 0.000 abstract description 12
- 229910000820 Os alloy Inorganic materials 0.000 abstract description 11
- 238000003825 pressing Methods 0.000 abstract description 7
- 239000011159 matrix material Substances 0.000 abstract 2
- 239000002994 raw material Substances 0.000 abstract 2
- 239000002585 base Substances 0.000 description 7
- 230000003746 surface roughness Effects 0.000 description 6
- 239000010408 film Substances 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 239000006061 abrasive grain Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
- C03B11/086—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/10—Die base materials
- C03B2215/12—Ceramics or cermets, e.g. cemented WC, Al2O3 or TiC
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
- C03B2215/16—Metals or alloys, e.g. Ni-P, Ni-B, amorphous metals
- C03B2215/17—Metals or alloys, e.g. Ni-P, Ni-B, amorphous metals comprising one or more of the noble meals, i.e. Ag, Au, platinum group metals
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明はプレス成形後の研摩工程を必要としない高精度
な光学ガラス素子をプレス成形によって大量に生産する
ための光学ガラス素子の製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method for manufacturing optical glass elements for mass-producing high-precision optical glass elements by press molding, which does not require a polishing process after press molding. be.
従来の技術
高精度な光学ガラス素子を直接プレスして成形するため
には、型材料として高温でも安定で、耐酸化性に優れ、
ガラスに対して不活性であり、プレスした時に形状精度
が崩れないように機械的強度の優れたものが必要である
が、その反面、加工性に優れ精密加工が容易にできなく
てはならない。Conventional technology In order to directly press and mold high-precision optical glass elements, mold materials that are stable even at high temperatures and have excellent oxidation resistance are required.
It needs to be inert to glass and have excellent mechanical strength so that the shape accuracy does not collapse when pressed, but on the other hand, it must also have excellent workability and be able to be precisely processed easily.
以上のような光学ガラス素子のプレス成形用型に必要な
条件を、ある程度満足する型材料として、特開昭５２−
４５６１３号公報に記載のシリコンカーバイド（Ｓ ｉ
Ｃ） 、またはシリコンナイトライド（Ｓｉ３Ｎ４）
が用いられ、さらに特開昭５９−１２１）２６号公報の
記載のチタンカーバイド（Ｔ ｉ Ｃ）および金属の混
合材料なども検討されている。As a mold material that satisfies to some extent the conditions necessary for press molding molds for optical glass elements as described above, JP-A-52-
Silicon carbide (S i
C) or silicon nitride (Si3N4)
has been used, and a mixed material of titanium carbide (T i C) and metal described in JP-A-59-121)26 is also being considered.
発明が解決しようとする問題点
しかしながら、従来の型材料では上記の条件を全て満足
するものは得られていない。例えば、型材料としてＳｉ
ＣおよびＳｉ３Ｎ４を用いた場合では、非常に硬く機械
的強度が優れているが、加工性に劣り、さらには光学ガ
ラス素子の構成成分である鉛（Ｐｂ）やアルカリ元素と
反応し易いという欠点を有している。また、ＴｉＣおよ
び金属の混合材料の場合も光学ガラス素子と反応し易く
、型材料としては不適当である。Problems to be Solved by the Invention However, conventional mold materials that satisfy all of the above conditions have not been obtained. For example, Si as the mold material
When C and Si3N4 are used, they are extremely hard and have excellent mechanical strength, but they have the disadvantage of poor workability and easy reaction with lead (Pb) and alkali elements, which are the constituent components of optical glass elements. have. In addition, a mixed material of TiC and metal also tends to react with optical glass elements, making it unsuitable as a mold material.
以上のように、従来の型材料では前述の型材料としての
必要条件を全て満足するには至っていない。従って、型
寿命が短く、高精度な光学ガラス素子をプレス成形によ
って大量に生産することはできない。As described above, conventional mold materials do not satisfy all of the above-mentioned requirements for mold materials. Therefore, the life of the mold is short, and highly accurate optical glass elements cannot be mass-produced by press molding.
本発明では上記問題点に鑑み、直接プレス成形法による
光学性能の良い高精度な光学ガラス素子を大量に成形す
ることを可能にするためのプレス成形用型を提供するこ
とを目的としている。In view of the above problems, it is an object of the present invention to provide a press-molding mold that enables mass molding of high-precision optical glass elements with good optical performance by direct press-molding.
問題点を解決するための手段
上記問題点を解決するために、本発明では加工性が良く
機械的強度が優れたＷＣを主成分とする超硬合金あるい
は各種サーメットをプレス成形用型の母材どして、その
プレス面に２．０重量％−８０重量％のＲｅを含有する
Ｐｄ−Ｒｅ合金あるいは２．０重量％−８０重量％のＲ
ｅを含有するＰｄ−Ｒｅ合金を主成分とする薄膜、２．
０重量％−７５重量％のＯｓを含有するＰｄ−Ｏｓ合金
あるいは２．０重量％−７５重量％のＯｓを含有するＰ
ｄ−Ｏｓ合金を主成分とする薄膜、２．０重量％−８０
重量％のＲｕを含有するＰｄ−Ｒｕ合金あるいは２．０
重量％−８０重量％のＲｕを含有するＰｄ−Ｒｕ合金を
主成分とする薄膜、２．０重量％−７５重量％のＷを含
有するＰｃｔ−Ｗ合金あるいは２．０重量％−７５重量
％のＷを含有するＰｄ−Ｗ合金を主成分とする薄膜をコ
ーティングして構成される型を作製し、この型を用いる
ことによって光学性能の良い高精度な光学ガラス素子の
プレス成形を可能にしたものである。Means for Solving the Problems In order to solve the above problems, the present invention uses cemented carbide or various cermets mainly composed of WC, which has good workability and excellent mechanical strength, as a base material for press molding molds. Pd-Re alloy containing 2.0% to 80% by weight of Re or 2.0% to 80% by weight of R on the press surface.
A thin film whose main component is a Pd-Re alloy containing e, 2.
Pd-Os alloy containing 0wt%-75wt% Os or Pd-Os alloy containing 2.0wt%-75wt% Os
Thin film mainly composed of d-Os alloy, 2.0% by weight-80
Pd-Ru alloy containing wt% Ru or 2.0
A thin film based on a Pd-Ru alloy containing Ru in an amount of 80% by weight, a Pct-W alloy containing 2.0% by weight - 75% by weight in W, or a Pct-W alloy containing 2.0% by weight - 75% by weight. We created a mold coated with a thin film mainly composed of Pd-W alloy containing W, and by using this mold, it became possible to press-form high-precision optical glass elements with good optical performance. It is something.
作用
本発明は上記した構成によって、従来の型材料では実現
できなかった前記の必要条件を全て満足した型を得るこ
とができ、この型を用いることによって光学ガラス素子
を直接プレスして成形することが可能となる。Effects of the present invention With the above-described configuration, it is possible to obtain a mold that satisfies all of the above-mentioned requirements that could not be realized with conventional mold materials, and by using this mold, it is possible to directly press and mold an optical glass element. becomes possible.
実施例
以下、本発明の光学ガラス素子の製造方法の一実施例を
図面を参照しながら説明する。EXAMPLE Hereinafter, an example of the method for manufacturing an optical glass element of the present invention will be described with reference to the drawings.
直径２０龍、厚さ６１のＷＣを主成分とする超硬合金を
曲率半径がそれぞれ４６１ｎおよび２０（ｂｍの凹面形
状のプレス面を有する上下の型からなる一対の光学ガラ
ス素子のプレス成形用型に加工した。A pair of press-molding molds for optical glass elements consisting of upper and lower molds made of cemented carbide mainly composed of WC and having a radius of curvature of 461n and 20 (bm), respectively, with a concave press surface having a diameter of 20mm and a thickness of 61cm. Processed into.
これらの型のプレス面を超微細なダイヤモンド砥粒を用
いて鏡面に研摩した。次に、この鏡面上にスパッタ法に
より５μｍの厚みで第１表に示した組成のＰｄ−Ｒｅ系
合金薄膜、Ｐｄ−０ｓ系合金薄膜、Ｐｄ−Ｒｕ系合金薄
膜あるいはＰｄ−Ｗ系合金薄膜をコーティングしてプレ
ス成形用型を作製した。The press surfaces of these molds were polished to a mirror surface using ultrafine diamond abrasive grains. Next, a Pd-Re alloy thin film, a Pd-0s alloy thin film, a Pd-Ru alloy thin film, or a Pd-W alloy thin film having the composition shown in Table 1 is deposited on this mirror surface to a thickness of 5 μm using a sputtering method. A mold for press molding was prepared by coating.
このようにして作製した型の断面図を第１図に示す。第
１図において、１）は母材、１２はプレス面上にコーテ
ィングしたＰｄ−Ｒｅ系合金薄膜、Ｐｄ−０ｓ系合金薄
膜、Ｐｄ−Ｒｕ系合金薄膜あるいはＰｄ−Ｗ系合金薄膜
である。A cross-sectional view of the mold thus produced is shown in FIG. In FIG. 1, 1) is a base material, and 12 is a Pd-Re alloy thin film, a Pd-0s alloy thin film, a Pd-Ru alloy thin film, or a Pd-W alloy thin film coated on the press surface.
この型を第２図に示したプレス成形機にセントする。第
２図において、２１は上型、２２は下型、２３は上型用
加熱ヒーター、２４は下型用加熱ヒーター、２５は上型
用ピストンシリンダー、２６は下型用ピストンシリンダ
ー、２７は供給ガラス素子塊状物、２８はガラス素子供
給用治具、２９はプレス成形した光学ガラス素子の取り
出し口、２１０は供給ガラス素子塊状物の予備加熱炉、
２１）は覆いである。This mold is placed in the press molding machine shown in FIG. In Fig. 2, 21 is an upper mold, 22 is a lower mold, 23 is a heating heater for the upper mold, 24 is a heating heater for the lower mold, 25 is a piston cylinder for the upper mold, 26 is a piston cylinder for the lower mold, and 27 is a supply. 28 is a glass element supply jig; 29 is a take-out port for the press-molded optical glass element; 210 is a preheating furnace for the supplied glass element lump;
21) is a cover.
次に、酸化鉛（ＰｂＯ）７０重量％、シリカ（Ｓｉｎ）
２７重量％および残りが微量成分からなる酸化鉛系光学
ガラスを半径１０韮の球状に加工した塊状物２７を予備
加熱炉２１０で加熱した後、５２０℃に保持されている
上下の型２１および２２の下型２２の上に置き、窒素雰
囲気で約４０ ｋｇ ／ ｃ＋＋ｔのプレス圧によりプ
レスして２分間保持し、その後、そのままの状態で上下
の型を３００℃まで冷却して、プレス成形された光学ガ
ラス素子を取り出し口２９より取り出して、光学ガラス
素子のプレス成形の工程を完了する。Next, lead oxide (PbO) 70% by weight, silica (Sin)
After heating a block 27 made of lead oxide optical glass consisting of 27% by weight and the rest being trace components into a spherical shape with a radius of 10 mm, the upper and lower molds 21 and 22 are heated at 520°C. The mold was placed on the lower mold 22 of the mold, pressed under a press pressure of approximately 40 kg/c++t in a nitrogen atmosphere, and held for 2 minutes.Then, the upper and lower molds were cooled to 300°C while remaining as they were, and press-molded. The optical glass element is taken out from the take-out port 29 to complete the process of press molding the optical glass element.
以上の工程を繰り返して１０００回目のブス終了時に、
上下の型２１および２２をプレス成形機より取りはずし
て、プレス面の状態を光学顕微鏡で観察し、その時のプ
レス面の表面粗さくＲＭＳ値、人）を測定して、それぞ
れの型精度を評価した。さらに、比較実験として、従来
使用されていた炭化ケイ素（Ｓ ｉ Ｃ）焼結体の型を
作製し、第２図に示したプレス成形機にセットし、上述
の光学ガラス素子のプレス成形の工程を１０００回繰り
返し行い、同様の型精度の評価を行った。After repeating the above process, at the end of the 1000th bus,
The upper and lower molds 21 and 22 were removed from the press molding machine, the condition of the pressed surfaces was observed with an optical microscope, and the surface roughness (RMS value, human) of the pressed surfaces at that time was measured to evaluate the accuracy of each mold. . Furthermore, as a comparative experiment, a mold of a conventionally used silicon carbide (S i C) sintered body was prepared and set in the press molding machine shown in Fig. 2, and the press molding process of the optical glass element described above was carried out. This was repeated 1000 times, and the mold accuracy was evaluated in the same way.
また、本発明の型に用いた各種合金スパッタ膜の代わり
に白金（Ｐｔ）スパッタ膜およびＰｄスパッタ膜をコー
ティングした型においても、上述のプレス試験を行った
。Moreover, the above-mentioned press test was also conducted on molds coated with a platinum (Pt) sputtered film and a Pd sputtered film instead of the various alloy sputtered films used in the mold of the present invention.
本発明の型を用いたプレス試験の結果を第１表に示し、
比較の為の型を用いたプレス試験の結果を第２表に示し
た。The results of the press test using the mold of the present invention are shown in Table 1,
Table 2 shows the results of a press test using a mold for comparison.
第１表 プレス試験の結果
第１表 プレス試験の結果
第１表 プレス試験の結果
第２表、試料患１）６の従来使用されているＳｉＣ焼結
体を用いた型においては、数回ガラスをプロ
レスしただけで型とガラス反応し、プレス面にガラス付
着し、全く使用することができなくなった。Table 1 Results of press tests Table 1 Results of press tests Table 2 Results of press tests Just by wrestling, the glass reacted with the mold and the glass adhered to the pressing surface, making it completely unusable.
また、第２表、試料隘１）７および１）８のようにｐｔ
或いはＰｄスパッタ膜でコーティングした型では、ガラ
スの付着は起らないが、１０００回プレス後には、表面
粗さくＲＭＳ値）で、それぞれ、２５３．５人および１
９２．５人と非常に粗くなり、表面が白濁し実用的では
ないことがわかる。In addition, as shown in Table 2, sample size 1) 7 and 1) 8, pt
Alternatively, with the mold coated with a Pd sputter film, no glass adhesion occurs, but after 1000 presses, the surface roughness (RMS value) was 253.5 and 1, respectively.
It can be seen that the surface becomes very rough with 92.5 people, and the surface becomes cloudy, making it impractical.
以上の比較試料に対して、第１表から明らかなように、
本発明の型、すなわち、ＷＣを主成分とした超硬合金を
母材とし、そのプレス面に２．０重量％−８０重量％の
Ｒｅを含有するＰｄ−Ｒｅ合金あるいは２．０重量％−
８０重量％のＲｅを含有するＰｄ−Ｒｅ合金を主成分と
する薄膜、２．０重量％−７５重量％のＯ３を含有する
Ｐｄ−０３合金あるいは２．０重量％−７５重量％のＯ
ｓを含有するＰｄ−〇ｓ合金を主成分とする薄膜、２．
０重量％−８０重量％のＲｕを含有するＰｄ−Ｒｕ合金
あるいは２．０重量％−８０重量％のＲｕを含有するＰ
ｄ−Ｒｕ合金を主成分とする薄膜、２．０重量％−７５
重量％のＷを含有するＰｄ−Ｗ合金あるいは２．０重量
％−７５重量％のＷを含有するＰｄ−Ｗ合金を主成分と
する薄膜をコーティングして構成される型を用いると、
１０００回プレスした時でも、表面粗さはほとんどプレ
ス前と変化がなく、型寿命が著しく伸び、高精度な光学
ガラス素子を大量にプレス成形することが可能となった
。For the above comparative samples, as is clear from Table 1,
The mold of the present invention is a Pd-Re alloy containing 2.0 wt%-80 wt% Re or 2.0 wt%-
Thin film based on Pd-Re alloy containing 80 wt% Re, Pd-03 alloy containing 2.0 wt%-75 wt% O3 or 2.0 wt%-75 wt% O3
A thin film whose main component is a Pd-〇s alloy containing s, 2.
Pd-Ru alloy containing 0wt%-80wt% Ru or Pd-Ru alloy containing 2.0wt%-80wt% Ru
Thin film based on d-Ru alloy, 2.0% by weight-75
When using a mold formed by coating a thin film mainly composed of a Pd-W alloy containing 1% by weight of W or a Pd-W alloy containing 2.0% to 75% by weight of W,
Even after pressing 1000 times, the surface roughness remained almost the same as before pressing, and the life of the mold was significantly extended, making it possible to press-mold high-precision optical glass elements in large quantities.
また、第１表から明らかなように、Ｐｄ−Ｒｅ合金薄膜
に、ＯｓあるいはＴａの少なくとも一つの元素を各１０
重量％まで添加してやると、１０００回プレス時の表面
粗さは、ＯｓあるいはＴａの含有率の増加に伴って小さ
くなり、さらに型寿命が延びることがわかる。同様に、
Ｐｄ−Ｏｓ合金薄膜に、ＲｅあるいはＴａの少なくとも
一つの元素を各１０重量％まで添加してやっても、１０
００回プレス時の表面粗さは、ＲｅあるいはＴａの含有
率の増加に伴って小さくなり、型寿命が延びることがわ
かる。さらに、Ｐｄ−Ｒｕ合金薄膜あるいはＰｄ−Ｗ合
金薄膜に、Ｒｅ ％ ＯｓあるいはＴａの少なくとも一
つの元素を各１０重量％まで添加してやると、１０００
回プレス時の表面粗さは、Ｒｅ、ＯｓあるいはＴａの含
有率の増加に伴って小さくなり、さらに型寿命が延びる
ことがわかる。このように、本発明の型は前述した高精
度な光学ガラス素子を直接プレス成形するための必要条
件を全て満足したものが得られ、従来のものに比べて、
著しく型寿命が延び、高精度な光学ガラス素子を大量に
プレス成形することが可能となった。In addition, as is clear from Table 1, at least one element of Os or Ta is added to the Pd-Re alloy thin film at 10% each.
It can be seen that when added up to % by weight, the surface roughness after 1000 presses becomes smaller as the Os or Ta content increases, and the mold life is further extended. Similarly,
Even if at least one element of Re or Ta is added to a Pd-Os alloy thin film up to 10% by weight each, the
It can be seen that the surface roughness at the time of 00 presses becomes smaller as the Re or Ta content increases, and the mold life is extended. Furthermore, if at least one element of Re%Os or Ta is added to the Pd-Ru alloy thin film or Pd-W alloy thin film up to 10% by weight each, 1000%
It can be seen that the surface roughness during double pressing becomes smaller as the content of Re, Os, or Ta increases, and the mold life is further extended. As described above, the mold of the present invention satisfies all the requirements for directly press-molding the above-mentioned high-precision optical glass element, and compared to the conventional mold,
The life of the mold has been significantly extended, and it has become possible to press-mold high-precision optical glass elements in large quantities.
なお、本発明を説明するために、実施例においてプレス
成形用型の母材としＷＣを主成分とする超硬合金を用い
た型を例に挙げたが、Ｔ Ｉ Ｎ ％ Ｔｉ ０％ Ｃ
ｒ ３ ＣｚあるいはＡｌ２Ｏ３を主成分とするサーメ
ットを母材とし、そのプレス面に２．０重量％−８０Ｍ
量％のＲｅを含有するＰｄ−Ｒｅ合金あるいは２．０重
量％−８０重量％のＲｅを含有するＰｄ−Ｒｅ合金を主
成分とする薄膜、２．０重量％−７５重量％のＯ３を含
有するＰｄ−Ｏｓ合金あるいは２．０重量％−７５重量
％のＯ３を含有するＰｄ−Ｏｓ合金を主成分とする薄膜
、２．０重量％−８０重量％のＲｕを含有するＰｄ−Ｒ
ｕ合金あるいは２．０重量％−８０重量％のＲｕを含有
するＰｄ−Ｒｕ合金を主成分とする薄膜、２．０重量％
−７５重量％のＷを含有するＰｄ−Ｗ合金あるいは２．
０重量％−７５重量％のＷを含有するＰｄ−Ｗ合金を主
成分とする薄膜をコーティングして構成される型を用い
ても、同様に型寿命が延び、高精度な光学ガラス素子の
量産化が可能となった。In addition, in order to explain the present invention, in the examples, a mold using a cemented carbide whose main component is WC as the base material of a press molding mold was taken as an example, but T I N % Ti 0% C
The base material is cermet whose main component is r3Cz or Al2O3, and 2.0% by weight-80M is applied to the pressed surface.
Thin film based on Pd-Re alloy containing % Re or Pd-Re alloy containing 2.0 wt % - 80 wt % Re, containing 2.0 wt % - 75 wt % O3 A thin film mainly composed of a Pd-Os alloy containing O3 of 2.0% to 75% by weight, a Pd-R containing 2.0% to 80% of Ru
Thin film mainly composed of u alloy or Pd-Ru alloy containing 2.0 wt%-80 wt% Ru, 2.0 wt%
- Pd-W alloy containing 75% by weight of W; or 2.
Even if a mold is coated with a thin film mainly composed of a Pd-W alloy containing 0% to 75% of W, the mold life will be similarly extended and high-precision optical glass elements can be mass-produced. became possible.
発明の効果
以上のように、本発明の光学ガラス素子のプレス成形用
型を作製するにあたり、母材として超硬合金およびサー
メットを用い、そのプレス面に２．０重量％−８０重量
％のＲｅを含有するＰｄ−Ｒｅ合金あるいは２．０重量
％−８０重量％のＲｅを含有するＰｄ−Ｒｅ合金を主成
分とする薄膜、２．０重量％−７５重量％のＯｓを含有
するＰｄ−Ｏｓ合金あるいは２．０重量％−７５重量％
のＯｓを含有するＰｄ−Ｏｓ合金を主成分とする薄膜、
２．０重量％−８０重貴重のＲｕを含有するＰｄ−Ｒｕ
合金あるいは２．０重量％−８０重量％のＲｕを含有す
るＰｄ−Ｒｕ合金を主成分とする薄膜、２．０重量％−
７５重量％のＷを含有するＰｄ−Ｗ合金あるいは２．０
重量％−７５重量％のＷを含有するＰｄ−Ｗ合金を主成
分とする薄膜をコーティングすることによって、前述し
た型材料としての必要条件を全て満足した光学ガラス素
子のプレス成形用型を提供したものであり、高精度な光
学ガラス素子を安価に、かつ、大量に製造するために、
極めて有用な発明である。Effects of the Invention As described above, in producing the press molding mold for the optical glass element of the present invention, cemented carbide and cermet are used as the base material, and 2.0% to 80% of Re is applied to the press surface. Pd-Re alloy containing Pd-Re alloy or Pd-Re alloy containing 2.0 wt%-80 wt% Re, Pd-Os containing 2.0 wt%-75 wt% Os Alloy or 2.0wt%-75wt%
A thin film mainly composed of a Pd-Os alloy containing Os,
Pd-Ru containing 2.0wt%-80wt precious Ru
Alloy or thin film mainly composed of Pd-Ru alloy containing 2.0% by weight - 80% by weight of Ru, 2.0% by weight -
Pd-W alloy containing 75% W or 2.0
By coating a thin film mainly composed of a Pd-W alloy containing 75% by weight of W, a press-molding mold for an optical glass element was provided that satisfied all of the above-mentioned requirements as a mold material. In order to manufacture high-precision optical glass elements at low cost and in large quantities,
This is an extremely useful invention.
第１図は本発明の光学ガラス素子のプレス成形用型の断
面の概略図、第２図は実施例における光学ガラス素子の
プレス成形用型を組み込んだプレス成形機の概略図であ
る。
１）・・・・・・母材、１２・・・・・・プレス面上に
コーティングしたＰｄ−Ｒｅ系合金、Ｐｄ−Ｏｓ系合金
、Ｐｄ−Ｒｕ系合金あるいはＰｄ−Ｗ系合金スパッタ薄
膜。
代理人の氏名 弁理士 中尾敏男 はか１名ｎ−ｍ−母
材
１２− プしス面上にコーティングしたＰｄ −Ｒｅ
ｔＦ、合金、 Ｐｄ−０ｓ糸令会、Ｐｄ−Ｒｕ４合金
あるＬ ｌ ＋ｊ Ｐｄ−Ｗ ｋ。
合金ズパッタ薄康
第１図FIG. 1 is a schematic cross-sectional view of a press molding mold for an optical glass element of the present invention, and FIG. 2 is a schematic diagram of a press molding machine incorporating the press molding mold for an optical glass element according to an embodiment. 1)...Base material, 12...Pd-Re alloy, Pd-Os alloy, Pd-Ru alloy, or Pd-W alloy sputtered thin film coated on the pressed surface. Name of agent: Patent attorney Toshio Nakao (1 person) Pd-Re coated on base material 12-Press surface
tF, alloy, Pd-0s yarn, Pd-Ru4 alloy L l +j Pd-W k. Alloy Sputter Usukang Figure 1
Claims (6)
用型の母材とし、そのプレス面に２．０重量％−８０重
量％のレニウム（Ｒｅ）を含有するパラジウム−レニウ
ム（Ｐｄ−Ｒｅ）合金薄膜、２．０重量％−７５重量％
のオスミウム（Ｏｓ）を含有するパラジウム−オスミウ
ム（Ｐｄ−Ｏｓ）合金薄膜、２．０重量％−８０重量％
のルテニウム（Ｒｕ）を含有するパラジウム−ルテニウ
ム（Ｐｄ−Ｒｕ）合金薄膜あるいは２．０重量％−７５
重量％のタングステン（Ｗ）を含有するパラジウム−タ
ングステン（Ｐｄ−Ｗ）合金薄膜をコーティングして構
成される型でプレス成形することを特徴とする光学ガラ
ス素子の製造方法。(1) A material with heat resistance and excellent workability is used as the base material for the press molding die, and the press surface contains palladium-rhenium (Pd) containing 2.0% to 80% by weight of rhenium (Re). -Re) Alloy thin film, 2.0% by weight - 75% by weight
palladium-osmium (Pd-Os) alloy thin film containing osmium (Os), 2.0%-80% by weight
palladium-ruthenium (Pd-Ru) alloy thin film containing ruthenium (Ru) or 2.0 wt%-75
1. A method for producing an optical glass element, which comprises press-molding using a mold coated with a palladium-tungsten (Pd-W) alloy thin film containing tungsten (W) in an amount of % by weight.
ド（ＷＣ）を主成分とする超硬合金、または、チタンナ
イトライド（ＴｉＮ）、チタンカーバイド（ＴｉＣ）、
クロムカーバイド（Ｃｒ＿３Ｃ＿２）あるいはアルミナ
（Ａｌ＿２Ｏ＿３）を主成分とするサーメットを用いた
ことを特徴とする特許請求の範囲第（１）項記載の光学
ガラス素子の製造方法。(2) Cemented carbide whose main component is tungsten carbide (WC), or titanium nitride (TiN), titanium carbide (TiC), as the base material for press molding molds,
The method for manufacturing an optical glass element according to claim (1), characterized in that a cermet whose main component is chromium carbide (Cr_3C_2) or alumina (Al_2O_3) is used.
膜中に、Ｏｓあるいはタンタル（Ｔａ）の少なくとも一
つの元素を各１０重量％以内含有することを特徴とする
特許請求の範囲第（１）項記載の光学ガラス素子の製造
方法。(3) Claim (1) characterized in that the Pd-Re thin film coated on the press molding mold contains at least one element of Os or tantalum (Ta) within 10% by weight each. A method of manufacturing the optical glass element described above.
膜中に、ＲｅあるいはＴａの少なくとも一つの元素を各
１０重量％以内含有することを特徴とする特許請求の範
囲第（１）項記載の光学ガラス素子の製造方法。(4) The optical system according to claim (1), characterized in that the Pd-Os thin film coated on the press-molding mold contains at least 10% by weight of each of at least one element of Re or Ta. Method for manufacturing glass elements.
膜中に、Ｒｅ、ＯｓあるいはＴａの少なくとも一つの元
素を各１０重量％以内含有することを特徴とする特許請
求の範囲第（１）項記載の光学ガラス素子の製造方法。(5) Claim (1) characterized in that the Pd-Ru thin film coated on the press molding die contains at least 10% by weight of at least one of Re, Os, or Ta. A method for manufacturing an optical glass element.
中に、Ｒｅ、ＯｓあるいはＴａの少なくとも一つの元素
を各１０重量％以内含有することを特徴とする特許請求
の範囲第（１）項記載の光学ガラス素子の製造方法。(6) Claim (1) characterized in that the Pd-W thin film coated on the press molding die contains at least one of Re, Os, or Ta within 10% by weight each. A method for manufacturing an optical glass element.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31207886A JPS63166729A (en) | 1986-12-26 | 1986-12-26 | Production of optical glass element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31207886A JPS63166729A (en) | 1986-12-26 | 1986-12-26 | Production of optical glass element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63166729A true JPS63166729A (en) | 1988-07-09 |
| JPH0542376B2 JPH0542376B2 (en) | 1993-06-28 |
Family
ID=18024970
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31207886A Granted JPS63166729A (en) | 1986-12-26 | 1986-12-26 | Production of optical glass element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63166729A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02188433A (en) * | 1989-01-13 | 1990-07-24 | Matsushita Electric Ind Co Ltd | Optical glass molded body and molding method thereof and thermal processing jig utilized therefor |
| US5538528A (en) * | 1993-01-07 | 1996-07-23 | Matsushita Electric Industrial Co., Ltd. | Glass optical element press-molding die having a tantalum containing alloy surface layer |
| US12066067B2 (en) | 2018-12-18 | 2024-08-20 | Hitachi Astemo, Ltd. | Pad spring and disc brake |
-
1986
- 1986-12-26 JP JP31207886A patent/JPS63166729A/en active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02188433A (en) * | 1989-01-13 | 1990-07-24 | Matsushita Electric Ind Co Ltd | Optical glass molded body and molding method thereof and thermal processing jig utilized therefor |
| US5538528A (en) * | 1993-01-07 | 1996-07-23 | Matsushita Electric Industrial Co., Ltd. | Glass optical element press-molding die having a tantalum containing alloy surface layer |
| US12066067B2 (en) | 2018-12-18 | 2024-08-20 | Hitachi Astemo, Ltd. | Pad spring and disc brake |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0542376B2 (en) | 1993-06-28 |
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