JPH079342A - Washing device for surface plate of double polishing machine - Google Patents

Abstract

PURPOSE:To remove polishing wastes, a polishing material, and the like from the grooves of surface plates, and to carry out the washing work automatically, by inserting a nozzle device between the upper and the lower surface plates without removing the surface plates of a double polishing machine, and injecting a high pressure water from a nozzle to a polishing surface. CONSTITUTION:A double polishing machine 1 is composed as a device to polishing process the upper and the lower surfaces of a work by setting the work between the upper and the lower surface plates 10 and 11. A nozzle device 40 is inserted between the upper and the lower and surface plates and a high pressure water is injected while the nozzle device is reciprocated in the radial direction of the surface plates, so as to carry out the removing work of polishing wastes and a polishing material entered in the surfaces and the grooves of the surface plates. And around the nozzle of the nozzle device 40, brush members 58 are provided, so as to prevent the scattering of the water to the surroundings. To a washing device 20 to hold the nozzle device 40, a driving means to reciprocate a pipe 41, a pump 26 to feed the high pressure water, and the like are provided, and the washing work is carried out automatically.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention performs a surface plate cleaning operation in a double-sided polishing machine that grinds a workpiece such as glass, metal plate, crystal, or silicon wafer in parallel using a surface plate. With regard to the cleaning device, in particular, by spraying high-pressure water onto the polishing surfaces of the surface plates placed above and below the double-sided polishing machine, the work of removing grinding dust and abrasives remaining in the surface plate grooves is automatically performed. To a device capable of performing.

[0002]

2. Description of the Related Art In order to finish the upper and lower surfaces of a glass plate, a silicon wafer, a metal plate or the like in parallel, processing has been conventionally performed using a double-side polishing machine. In the double-sided polishing machine, for example, as disclosed in Japanese Utility Model Publication No. 60-12691, two surface plates are arranged so as to sandwich a work piece from above and below, and a vertical shaft for supporting the surface plate is used. While driving in the opposite direction, processing is performed such that the upper and lower surfaces of the workpiece are parallel. In the double-sided polishing machine, for example, as shown in FIG.
A plurality of vertical and horizontal grooves 16 and 17 are provided on the surface to form a surface plate 10, the surface plate 10 is rotated in one direction, and a carrier 7 for supporting a workpiece 8 corresponding to the polishing surface of the surface plate is provided. Are arranged.

Further, as shown in FIG. 8, the polishing surface 15 of the surface plate is provided with a deep groove, and the groove 16 is provided.
Width H of 1mm and groove depth D of 10-15mm
The degree is set so that polishing debris, water and the like can be removed through the groove. Then, the gear provided around the carrier 7 is meshed with the gears of the middle gear 5 and the outer gear 6 to rotate the workpiece, and the surface of the workpiece can be polished. To do so. The surface plates provided with the polishing surface 15 are arranged above and below the work piece, and the two surface plates are arranged so as to be in light contact with the work piece, while supplying water for polishing, an abrasive, etc. The polishing work is performed so that the upper and lower surfaces of the workpiece are parallel to each other by a surface plate.

[0004]

SUMMARY OF THE INVENTION After the work of polishing a work piece by the surface plate is performed, polishing debris and abrasives remain in the grooves of the surface plate. It is necessary to remove the surface plate from the polishing machine and remove polishing debris and the like from the groove of the surface plate. However, the groove provided on the polishing surface of the surface plate has a very narrow width and is deeply formed, and since the polishing dust and the polishing material that have entered the groove are about to solidify, There is a problem that it cannot be easily removed. Therefore, a metal plate member having a width narrower than that of the conventional one is used to scrape out polishing dust or the like, but the number of vertical and horizontal grooves provided on the polishing surface of the surface plate is very large. Therefore, there is a drawback in that cleaning work requires a lot of time and inefficient work is required. Further, when the next polishing operation is performed without completely removing the abrasives and polishing debris from the groove of the surface plate, the polishing time becomes long and Touches the polishing surface of the workpiece being polished, scratching the polishing surface,
It may be damaged, and it is often required to perform sufficient cleaning work during polishing and after the work.

[0005]

SUMMARY OF THE INVENTION The present invention solves the above-described problem of the surface plate cleaning work, in which high-pressure water is sprayed from a nozzle device onto the polishing surfaces of the surface plates which are vertically opposed to each other. It is therefore an object of the present invention to provide a cleaning device for a surface plate of a double-sided polishing machine that can automatically remove polishing dust and the like that have entered the groove and prevent water from splashing around.

[0006]

SUMMARY OF THE INVENTION According to the present invention, an upper surface plate and a lower surface plate are arranged so as to face each other, and a carrier for supporting a workpiece is provided between opposing polishing surfaces of the two surface plates. Cleaning for a double-sided polishing machine that arranges and rotates the two surface plates in opposite directions via a vertical axis and revolves the carrier holding the work piece while polishing the upper and lower surfaces of the work piece in parallel. Regarding the device. In the present invention, a nozzle device is movably arranged between the upper and lower surface plates of the double-sided polishing machine, and a mechanism for ejecting high-pressure water from nozzles arranged on the upper and lower sides of the nozzle device is constituted. While rotating the surface plate of the machine, the nozzle device is reciprocally moved in the radial direction with respect to the surface plate, and the high-pressure water ejected from the nozzle removes polishing debris remaining in the grooves of the surface plate. is doing.

Further, according to the present invention, in the cleaning device in which the nozzle device is arranged, means for setting the height of the supporting member of the nozzle device, means for reciprocating the nozzle device,
Further, means for supplying high-pressure water toward the nozzle device can be provided, and the nozzle device can be supported at the end of the pipe connected to the reciprocating means. Further, in the present invention, the cover member is arranged around the nozzles provided above and below the nozzle device, and the water splash preventing means for cleaning the polishing surface of the surface plate can be provided integrally with the cover member. . In addition to the above configuration, the water scattering prevention means provided on the cover member may be configured by a brush-shaped member, and the protruding height of the brush-shaped member may be configured to correspond to the distance between the nozzle and the polishing surface. it can. Further, in the present invention, in addition to the means for supplying high-pressure water to the nozzle device, the cleaning device may be provided with means for supplying high-pressure water to a nozzle member or the like that is separately connected. Therefore, for example, by using a hand shower gun provided with a nylon brush-like member as a water splash prevention means, it is possible to easily perform a cleaning operation even for a member that cannot be cleaned by a nozzle member that cleans the polishing surface of the surface plate. Means for doing so can be configured.

[0008]

In the double-side polishing machine surface plate cleaning apparatus of the present invention, after the polishing work for the workpiece is completed, a predetermined gap is provided between the upper and lower surface plates, the nozzle device is inserted, and the cleaning is performed. The high pressure water is sent out from the device toward the nozzle device. Then, while rotating the platen at a low speed, the nozzle device is reciprocally driven in a direction of retracting from the cleaning device, high-pressure water of about 50 to 100 atm is jetted from the polishing nozzle, and the polishing is entering the groove of the platen. Work to remove scraps. When removing the polishing debris, etc., by covering the periphery of the nozzle with a cover member, it is possible to prevent high-pressure water from splashing to the surroundings, and to prevent contamination of the periphery of the double-sided polishing machine and control of the cleaning device. The work can be automatically performed by setting necessary control information in the device.

[0009]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A cleaning device for a double side polishing machine platen according to the present invention will be described with reference to the illustrated example. The example shown in FIG.
The case where the cleaning device 20 is combined with the double-sided polishing machine 1 to perform cleaning work on the polishing surface of the surface plate is shown.
The double-sided polishing machine 1 has a mechanism similar to that of a generally used apparatus. A surface plate as shown in FIG. 7 is used, and an upper surface plate 11 and a lower surface plate 10 are connected to each other. , Which constitutes a mechanism for performing a polishing operation on the workpiece.
The lower surface plate 10 is supported by a support plate 4, and the motor 2
Is rotated in the horizontal direction at a predetermined speed via the drive device 3. Further, the lower surface plate 10 is supported by the surface plate support member 12 from the upper side of the apparatus, and is provided so that an interval between the lower surface plate 10 and the lower surface plate 10 can be set by the device 13 for vertical movement, and is arranged at the center of the lower surface plate 10. The interlocking gear 14 is connected to the middle gear 5 so that the upper and lower surface plates rotate in mutually opposite directions. Further, a gear arranged on the outer peripheral portion of the carrier 7 as shown in FIG. 7 is meshed with a middle gear 5 arranged on the central portion of the lower surface plate 10 and an outer gear 6 arranged on the outer peripheral portion. The polishing process is performed with the workpiece supported by the carrier.

After the workpiece is polished by the double-sided polishing machine 1, as shown in FIG. 1, in order to remove the polishing chips and the polishing material that have entered the grooves of the surface plate, The interval between the surface plates 10 and 11 is opened, and the nozzle device 40 is inserted between both surface plates to perform the cleaning work with high-pressure water. The cleaning device 20 of the present invention is provided with a nozzle device 40 from a side portion of the device body 21 via a pipe 41. In order to supply high-pressure water to the nozzle device 40, a motor is provided inside the device body. 25 and the high-pressure pump 26, and
A receiver tank 27 and the like are provided. The water accumulated in the receiver tank by the high-pressure pump is, for example, 50 to
It is designed so that it can be ejected from the nozzle at an arbitrary pressure of 100 atm, and the water pressure to be ejected onto the surface plate can be arbitrarily set. Further, in order to set the working height of the nozzle device 40, a handle 29 for vertical movement is provided, and the height of the upper device 30 is manually changed to arbitrarily set the height of the nozzle device. Further, an operation panel 22 is arranged at a predetermined position of the device so that control information for the control device 23 provided in the device body can be input.

The cleaning device 20 is constructed as shown in FIGS. 2 and 3, and the high-pressure water supply mechanism is arranged at the base of the device main body 21, and the nozzle device 40 is provided.
The upper device 30 that supports the vertical movement device 28 is supported via the vertical movement device 28, and in the illustrated example, the pantograph-shaped vertical movement mechanism is operated by the rotation of the handle 29. A nozzle drive device 31 as shown in FIG. 3 is provided in the upper device 30 of the cleaning device, and in accordance with the control information input via the operation panel 22 to the pipe 41 supporting the nozzle device 40, Drive for reciprocating movement is performed. The nozzle driving device 31 includes a rod 33 driven by a motor 32,
Is connected to the end of the pipe 41 via the guide shaft 3
4, a mechanism for guiding the interlocking member 35 is configured. By moving the rod 33 back and forth within the set range by the motor 32, it is possible to perform the cleaning work on the surface plate using the nozzle device 40. A pipe 41 for supporting the nozzle device 40 and for supplying high-pressure water is provided with a guide roller device 3 provided at a tip guide portion 37 arranged at a tip portion of the upper device 30.
8 and the packing member 39, and the supporting means (not shown) guides the nozzle device 40 so that it does not shake when the nozzle device 40 reciprocates.

The nozzle device 40 held at the tip of the pipe 41 may have the structure shown in FIG. In the nozzle device 40 shown in FIG. 4, the nozzles 51, 6 are arranged above and below the nozzle body 42.
1 is arranged so that the high-pressure water sprayed from the nozzles 51 and 61 can perform the cleaning work on the polishing surfaces of the upper and lower surface plates. An upper cleaning unit 50 and a lower cleaning unit 60 are arranged respectively corresponding to the upper and lower nozzles,
The upper and lower cleaning units 50 and 60 have substantially the same structure. Therefore, the configuration of the upper and lower cleaning units will be described by taking the upper cleaning unit 50 arranged corresponding to the upper surface plate 11 as an example, and the nozzle 51 controls the jetting range of water jetted from the high-pressure water jet port 52. The angle θ is set, and the angle θ can be arbitrarily adjusted.

Further, a cover member 54 is arranged around the nozzle 51 to constitute means for preventing water from splashing around. The cover member 54 includes the nozzle 51.
A tubular portion 55 fixed to the base portion of the through a locking portion 56,
The disc member 57 is arranged on the upper portion of the disc member 57, and the brush member 58 is provided on the outer peripheral portion of the disc member 57. As the brush member 58, a nylon member having a thickness of about 1 mm and a length of about 10 cm is arranged at a predetermined density. As shown in FIG. Are arranged in a ring shape with a predetermined width. Since the brush member 58 prevents the high-pressure water ejected from the nozzle from splashing to the surroundings by returning to the groove or polishing surface of the surface plate, the pressure of water ejected from the nozzle or the like can be prevented. Depending on the conditions, conditions such as the density and length of the brush can be changed as appropriate. Further, in the cover member provided in the upper cleaning section 50, holes 59 for draining are provided in the disc member 57 so that the water used for cleaning can be drained downward.

In the lower cleaning section 60, which is disposed below the nozzle body 42 so as to face the upper cleaning section 50, the nozzle 61 having the same structure as that of the upper cleaning section and the cover member 64 are provided.
Are arranged so that the lower surface plate 10 is cleaned by the high pressure water ejected from the nozzle 61. Further, a disk member 67 that constitutes the cover member 64.
In this case, it is not necessary to arrange an opening, and the water jetted from the nozzle can be made to flow to the surface of the lower surface plate 10 and be removed from the surrounding area. Further, also in the lower cleaning section 60, the jet angle θ of the water jetted from the jet port 62 of the nozzle 61 can be set as appropriate, and the configuration of the brush member 68 provided on the disc member 67 of the cover member can be such as water pressure. Can be arbitrarily set according to.

When the platen of the double-sided polishing machine 1 is cleaned by using the nozzle device 40 having the above-described structure, the double-sided polishing machine 1 polishes the workpiece, and then the platen. Cleaning can be done without removing. That is, when it is necessary to clean the surface plate at the time when the polishing work for the workpiece is finished, as shown in FIG. 11 is moved up and down using the up-and-down device 13 to drive the drive device 3
A means for connecting the middle gear 5 and the interlocking gear 14 of the upper surface plate 11 is arranged. Further, the height of the upper device of the cleaning device 20 is set so that the nozzle device 40 can be positioned between the upper and lower surface plates 10 and 11, and the moving range of the nozzle device is input via the operation panel 22. Then, the high pressure water supply means of the cleaning device 20 is operated to rotate the upper and lower surface plates at a low speed while injecting the high pressure water from the nozzle, and the nozzle device 40 is placed between the center of the surface plate and the outer peripheral portion. Perform the cleaning work while linearly reciprocating in the radial direction. Therefore, when cleaning the surface plate by the cleaning device, by spraying very high-pressure water from the nozzle, the polishing debris and abrasives entering the deep groove of the surface plate and solidifying are hydraulically pressured. Can be eliminated.

In the apparatus of the present invention, as shown in FIG. 2, a valve 19 for supplying high pressure water is arranged on the apparatus main body. Therefore, a rubber hose is connected to the valve 19, It is possible to connect another cleaning means such as a high pressure water jet nozzle member to the rubber hose. As described above, as the high-pressure water jet nozzle member provided separately,
For example, a hand gun device 70 as shown in FIG. 6 can be configured, and the valve 1 is attached to the device body 71.
Nozzle device 75 which arranges the hose 74 connected to 9 and arranges at the tip of the pipe member 73 using the valve operating member 72.
The high pressure water is jetted from the nozzle 76.

Further, in the nozzle device 75, a brush member 78 as a water splash preventing member is arranged so as to cover the periphery of the nozzle, and the brush member 78 has a nylon thickness of 1 to 3 mm. The fibers are circularly planted on the support plate 77 around the nozzle 76 and used. Further, the pipe member 7 of the hand gun device 70.
The tip portion of 3 is bent by an angle θ, and the nozzle member 75 is arranged at the tip portion so that the cleaning operation can be easily performed. The bending angle θ of the pipe is set to 130 to 150 °, and the reinforcing member 79 is arranged around the bent portion,
The operability is improved when the high-pressure water is jetted from the nozzle 76 to perform the cleaning work, and the nozzle member can be favorably supported. In addition to cleaning the surface plate using the hand gun device 70, other members that cannot be cleaned by the nozzle device 40 of the main body, for example, the surface of the teeth of the middle gear and the outer gear, and other stains The part can be washed with high-pressure water. Further, the water pressure of the high pressure water supplied via the valve 19 is
It can be arbitrarily adjusted by adjusting the opening of the valve, and water can be jetted at a lower water pressure than in the case of using the nozzle device of the main body. Therefore, by using the nozzle attached to the separate body, it is possible to clean the members other than the surface plate of the polishing machine and the peripheral portion of the surface plate, as well as the floor and walls of the work place, and to perform the cleaning work. It can be done easily.

Further, in the apparatus of the present invention, when the pressure of the high-pressure water jetted from the nozzle is high or when the splashing of water cannot be prevented only by the brush member, a separate cover member is provided around the surface plate. It can also be covered. As the member for covering the periphery of the surface plate, any member can be used, for example, a relatively thick nylon sheet-shaped material is wound around the outer peripheral parts of the upper surface plate and the lower surface plate, It may be configured by arranging in a skirt shape, and a gap may be formed between the upper and lower cover members so that the nozzle device 40 can pass therethrough. In addition to the cover means, according to the present invention, a brush-like member may be wound around the outer peripheral portion of the surface plate to form means for preventing high-pressure water from spouting outside the surface plate. Furthermore, in the device of the present invention, the water pressure sprayed from the nozzle can be set in accordance with the depth of the groove of the surface plate used for the double-sided polishing machine, the property of the polishing material, etc. The structure of the cover member and the like can be arbitrarily formed.

[0019]

EFFECTS OF THE INVENTION The double side polishing machine surface plate cleaning device of the present invention is
Since the cleaning device configured as described above is used, it is possible to easily perform the cleaning work using the nozzle device by opening the interval between the upper and lower surface plates without removing the surface plate from the double-side polishing machine. it can. Further, in the cleaning device of the present invention,
By setting the moving range of the nozzle device, it is possible to automatically perform the cleaning work on the surface plate, and the high pressure water jetted from the nozzle can easily clean the inside of the groove of the surface plate and As compared with the case of cleaning the inside of the groove by using the manual tool or the like, the cleaning work can be performed in a shorter time. Further, the nozzle device of the present invention is provided with a means for preventing the water sprayed on the surface plate from splashing to the surroundings, so that it is possible to prevent the high pressure water from splashing to the surroundings during the cleaning work, and the work site It does not get dirty and allows workers to work automatically after setting the cleaning device.

[Brief description of drawings]

FIG. 1 is an explanatory view showing a state in which the cleaning apparatus of the present invention is combined with a double-side polishing machine.

FIG. 2 is a side view showing the configuration of the cleaning device of the present invention.

FIG. 3 is a plan view of the cleaning device.

FIG. 4 is an explanatory diagram showing a configuration of a nozzle device of the present invention.

FIG. 5 is an explanatory diagram of an upper cleaning unit.

FIG. 6 is an explanatory diagram showing a configuration of a handgun used in the present invention.

FIG. 7 is an explanatory view showing a configuration of a surface plate and a work piece in a general double-side polishing machine.

FIG. 8 is a cross-sectional view of a surface plate.

[Explanation of symbols]

1 double side polishing machine, 5 middle gear, 6 outer gear,
7 Carrier, 10 Lower Surface Plate, 11 Upper Surface Plate, 15 Polishing Surface, 16/17 Groove, 20
Cleaning device, 26 high pressure pump, 30 upper device, 31 nozzle drive device, 32 motor, 3
7 Tip guide part, 40 Nozzle device, 41
Pipe, 50 upper cleaning part, 41 upper nozzle, 5
4 upper cover device, 57 disc member, 58 brush member, 60 lower cleaning unit, 61 lower nozzle,
64 lower cover device, 68 brush member, 70
Hand gun device, 75 nozzle device, 76
Nozzle, 78 brush member.

Claims (5)

[Claims] 1. An upper surface plate and a lower surface plate are arranged so as to face each other, and a carrier for supporting a workpiece is arranged between opposing polishing surfaces of the two surface plates, and the two surface plates are arranged. A double-sided polishing machine that rotates in opposite directions via a vertical axis and revolves a carrier that holds a workpiece while polishing the upper and lower surfaces of the workpiece in parallel. A nozzle device is movably arranged between the nozzle device and a mechanism for ejecting high-pressure water from nozzles arranged above and below the nozzle device, and the surface plate of the double-side polishing machine is rotated, and the nozzle device is installed as a surface plate. A double-sided polishing machine surface plate cleaning device, characterized in that it is reciprocally moved in the radial direction and the high-pressure water jetted from the nozzle removes polishing dust and the like remaining in the grooves of the surface plate. 2. The cleaning device provided with the nozzle device,
Means for setting the height of the support member of the nozzle device, means for reciprocating the nozzle device, and means for supplying high-pressure water toward the nozzle device are provided, and at the end of the pipe connected to the reciprocating means. The cleaning device for a double side polishing machine surface plate according to claim 1, wherein the nozzle device is supported. 3. A cover member is arranged around each of the nozzles provided above and below the nozzle device, and means for preventing water splashing by cleaning the polishing surface of the surface plate is provided integrally with the cover member. The cleaning device for a double-sided polishing machine surface plate according to claim 1 or 2. 4. The water splash prevention means provided on the cover member is constituted by a brush-shaped member, and the protruding height of the brush-shaped member is made to correspond to the distance between the nozzle and the polishing surface. The cleaning device for a double-sided polishing machine surface plate according to claim 3. 5. The cleaning device is provided with means for supplying high-pressure water to a nozzle device and the like, in addition to means for supplying high-pressure water to the nozzle device. Double-sided polishing machine surface plate cleaning device described in.