JPH0781119B2 - Manufacturing method of polyimide molding - Google Patents

Manufacturing method of polyimide molding

Info

Publication number
JPH0781119B2
JPH0781119B2 JP61246114A JP24611486A JPH0781119B2 JP H0781119 B2 JPH0781119 B2 JP H0781119B2 JP 61246114 A JP61246114 A JP 61246114A JP 24611486 A JP24611486 A JP 24611486A JP H0781119 B2 JPH0781119 B2 JP H0781119B2
Authority
JP
Japan
Prior art keywords
polyimide
varnish
adhesive
treated
kapton
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61246114A
Other languages
Japanese (ja)
Other versions
JPS6399282A (en
Inventor
秀一 松浦
康夫 宮寺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP61246114A priority Critical patent/JPH0781119B2/en
Publication of JPS6399282A publication Critical patent/JPS6399282A/en
Publication of JPH0781119B2 publication Critical patent/JPH0781119B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C66/00General aspects of processes or apparatus for joining preformed parts
    • B29C66/70General aspects of processes or apparatus for joining preformed parts characterised by the composition, physical properties or the structure of the material of the parts to be joined; Joining with non-plastics material
    • B29C66/71General aspects of processes or apparatus for joining preformed parts characterised by the composition, physical properties or the structure of the material of the parts to be joined; Joining with non-plastics material characterised by the composition of the plastics material of the parts to be joined

Landscapes

  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Lining Or Joining Of Plastics Or The Like (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はポリイミド成形品の製造法に関し、さらに詳し
くは、接着力の優れた積層品を与えるポリイミド成形品
の製造法に関する。
TECHNICAL FIELD The present invention relates to a method for producing a polyimide molded article, and more particularly to a method for producing a polyimide molded article that gives a laminate having excellent adhesive strength.

〔従来の技術〕[Conventional technology]

ポリイミド成形品、特にポリイミドフイルムは電気絶縁
材料として広く用いられている。例えばポリイミドフイ
ルムを銅箔等の金属箔に接着してフレキシブル配線板が
製造されており、接着剤としては特開昭50−34640号公
報に示されているようにアクリル系接着剤が用いられて
きた。しかし、アクリル系接着剤は耐熱性が低く、ポリ
イミドフイルム本来の耐熱性を十分生かしていなかっ
た。そこでポリイミドフイルムの耐熱性を生かすため、
ポリイミド接着剤が開発された(例えば特開昭61−6075
5号公報参照)。ところがポリイミド接着剤は閉環時に
水を発生するため、複雑かつ長時間の乾燥が必要であっ
たり、弾性率が高いために剥離強さが低い等の欠点があ
る。接着力を改善するためにサンドブラスト等でポリイ
ミドフイルムの表面を機械的に粗化したり、プラズマ処
理等が試みられている(特開昭59−218789号公報)。し
かし、機械的粗化では接着力は十分でなく、プラズマ処
理では若干の効果はあるものの高価な装置が必要であ
り、また処理効果も短時間で低下するという欠点があ
る。一方、特公昭52−36778号公報に示されているよう
に、ポリイミドフィルムをアルカリで処理した後、アル
カリ金属よりもイオン化傾向の小さい金属塩で再度処理
する方法もあるが、この方法では重金属を使用すること
や、また特定のポリイミド接着剤に対しては効果はある
ものの、他の多くのポリイミド接着剤に対して効果が不
十分である等の欠点がある。
Polyimide molded products, especially polyimide films, are widely used as electrical insulating materials. For example, a flexible wiring board is manufactured by adhering a polyimide film to a metal foil such as a copper foil, and an acrylic adhesive has been used as an adhesive as shown in JP-A-50-34640. It was However, the acrylic adhesive has a low heat resistance, and the original heat resistance of the polyimide film has not been fully utilized. Therefore, in order to take advantage of the heat resistance of the polyimide film,
A polyimide adhesive was developed (for example, Japanese Patent Laid-Open No. 61-6075).
(See Publication No. 5). However, the polyimide adhesive has drawbacks such that it requires complicated and long drying because it generates water when the ring is closed, and its peel strength is low due to its high elastic modulus. In order to improve the adhesive strength, it has been attempted to mechanically roughen the surface of the polyimide film by sandblasting, plasma treatment or the like (Japanese Patent Laid-Open No. 59-218789). However, mechanical roughening does not have sufficient adhesion, and plasma treatment has some effects, but requires an expensive device, and the treatment effect also decreases in a short time. On the other hand, as shown in JP-B-52-36778, there is also a method of treating a polyimide film with an alkali and then treating again with a metal salt having a smaller ionization tendency than an alkali metal. Although it is effective for use and for a specific polyimide adhesive, it has drawbacks such as insufficient effect for many other polyimide adhesives.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

本発明は上記の如き従来技術の欠点を解消し、十分な接
着力を得ることのできるポリイミド成形品の製造法を提
供せんとするものである。
The present invention is intended to provide a method for producing a polyimide molded article which can solve the above-mentioned drawbacks of the prior art and obtain a sufficient adhesive force.

〔問題点を解決するための手段〕[Means for solving problems]

本発明のポリイミド成形品の製造法は、表面を塩基性化
合物を含む溶液で処理した後、シランカップリング剤で
処理し、ついで熱処理したポリイミド成形品の処理面に
ポリイミドワニスまたはポリアミド酸ワニスを塗布、乾
燥して熱溶融可能な接着剤層を形成し、その上に任意の
被着体を重ねて接着剤の軟化点以上の温度で加圧、加熱
することを特徴とする。
The method for producing a polyimide molded article of the present invention is such that after treating the surface with a solution containing a basic compound, it is treated with a silane coupling agent, and then a polyimide varnish or a polyamic acid varnish is applied to the treated surface of the heat-treated polyimide molded article. The method is characterized in that a heat-meltable adhesive layer is formed by drying, an arbitrary adherend is superposed thereon, and pressure and heat are applied at a temperature equal to or higher than the softening point of the adhesive.

本発明方法において用いられるポリイミド成形品はフイ
ルムの他、フレキシブル印刷配線板、積層板等、ポリイ
ミド樹脂が表面に露出しているものであればよい。また
ポリイミドとしては、ポリアミドイミド、ポリエーテル
イミド、ポリエステルイミド等イミド構造を含むもので
あればよい。
The polyimide molded product used in the method of the present invention may be a film, a flexible printed wiring board, a laminated board or the like, as long as the polyimide resin is exposed on the surface. Further, the polyimide may be any one containing an imide structure such as polyamide-imide, polyether-imide, and polyester-imide.

本発明方法に用いられる塩基性化合物としては、水酸化
ナトリウム、水酸化カリウム、水酸化リチウム等のアル
カリ金属水酸化物、および水酸化テトラメチルアンモニ
ウム、水酸化テトラエチルアンモニウム、水酸化テトラ
ブチルアンモニウム等の四級アンモニウム水酸化物が好
ましく、特に好ましくは水酸化カリウム、水酸化ナトリ
ウムである。
Examples of the basic compound used in the method of the present invention include sodium hydroxide, potassium hydroxide, alkali metal hydroxides such as lithium hydroxide, and tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrabutylammonium hydroxide and the like. Quaternary ammonium hydroxide is preferable, and potassium hydroxide and sodium hydroxide are particularly preferable.

上記の塩基性化合物を溶解する溶媒としては水、メタノ
ール、エタノール、プロパノール、イソプロパノール等
のアルコールおよび水とアルコールの混合溶媒が好まし
い。
As the solvent for dissolving the basic compound, water, alcohols such as methanol, ethanol, propanol, and isopropanol, and a mixed solvent of water and alcohol are preferable.

塩基性化合物を含む溶液中の塩基性化合物の濃度および
ポリイミド成形品を処理する温度、時間は望みの処理程
度によって決定され、特に限定はされないが、一般的に
は濃度は0.1〜50重量%、温度は室温ないし80℃、時間
は0.1分ないし1時間である。この塩基性化合物を含む
溶液によるポリイミド成形品の表面処理は、例えばポリ
イミド成形品を該溶液中に浸漬するか、アプリケータ、
ドクターナイフ等を用いて流延塗布する等、公知の方法
を用いればよい。塩基性化合物を含む溶液で処理した
後、シランカップリング剤で処理する前に、塩酸、硫
酸、酢酸等の酸溶液で処理してもよい。
The concentration of the basic compound in the solution containing the basic compound and the temperature for treating the polyimide molded article, the time is determined by the desired degree of treatment and is not particularly limited, but generally the concentration is 0.1 to 50% by weight, The temperature is room temperature to 80 ° C., and the time is 0.1 minutes to 1 hour. Surface treatment of a polyimide molded article with a solution containing this basic compound, for example, by dipping the polyimide molded article in the solution, an applicator,
A known method such as cast coating using a doctor knife or the like may be used. After the treatment with the solution containing the basic compound and before the treatment with the silane coupling agent, the treatment with an acid solution such as hydrochloric acid, sulfuric acid or acetic acid may be performed.

本発明方法に用いられるシランカップリング剤として
は、ビニルトリメトキシシラン等のビニルシラン、γー
グリシドキシプロピルトリメトキシシラン等のエポキシ
シラン、γ−メルカプトプロピルトリメトキシシラン等
のメルカプトシラン、γーアミノプロピルトリエトキシ
シラン、N−フェニル−γーアミノプロピルトリメトキ
シシラン、N−β(アミノエチル)γーアミノプロピル
トリメトキシシラン、N−β(アミノエチル)γーアミ
ノプロピルメチルジメトキシシラン、γーウレイドプロ
ピルトリエトキシシラン、N−ベンジル−γーアミノプ
ロピルトリメトキシシラン、アミノエチルアミノメチル
フェネチルトリメトキシシラン、p−アミノフェニルト
リメトキシシラン、トリメトキシシリルプロピルジエチ
レントリアミン、1−トリメトキシシリル−2−(アミ
ノメチル)フェニルエタン等のアミノシランが用いられ
るが、中でもメルカプトシランおよびアミノシランが好
ましく、γーメルカプトプロピルトリメトキシシラン、
γーアミノプロピルトリエトキシシランが特に好まし
い。
Examples of the silane coupling agent used in the method of the present invention include vinylsilane such as vinyltrimethoxysilane, epoxysilane such as γ-glycidoxypropyltrimethoxysilane, mercaptosilane such as γ-mercaptopropyltrimethoxysilane, and γ-amino. Propyltriethoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane, N-β (aminoethyl) γ-aminopropyltrimethoxysilane, N-β (aminoethyl) γ-aminopropylmethyldimethoxysilane, γ-ureido Propyltriethoxysilane, N-benzyl-γ-aminopropyltrimethoxysilane, aminoethylaminomethylphenethyltrimethoxysilane, p-aminophenyltrimethoxysilane, trimethoxysilylpropyldiethylenetriamine, 1-tri Tokishishiriru -2 Although aminosilanes such as (aminomethyl) phenyl ethane is used, inter alia mercaptosilane and aminosilanes are preferred, gamma chromatography mercaptopropyltrimethoxysilane,
γ-Aminopropyltriethoxysilane is particularly preferred.

シランカップリング剤による処理は、塩基性化合物を含
有する溶液による処理後行われ、処理方法としては、例
えばポリイミド成形品をシランカップリング剤溶液中に
浸漬するか、アプリケータ、ドクターナイフ等を用いて
流延塗布する等、公知の方法を用いればよい。
The treatment with the silane coupling agent is performed after the treatment with the solution containing the basic compound, and the treatment method includes, for example, immersing the polyimide molded product in the silane coupling agent solution, or using an applicator or a doctor knife. A known method such as cast coating may be used.

シランカップリング剤を溶解する溶媒としては、水、ア
ルコール、アセトン、酢酸エチル、トルエン等、シラン
カップリング剤を溶解するものであれば何でもよいが、
水、アルコール、アセトンが中でも好ましい。
The solvent that dissolves the silane coupling agent may be any solvent that dissolves the silane coupling agent, such as water, alcohol, acetone, ethyl acetate, or toluene.
Water, alcohol and acetone are preferred among others.

シランカップリング剤溶液中のシランカップリング剤の
濃度は、特に限定はされないが、0.01〜30重量%が好ま
しく、0.1〜5重量%が特に好ましい。0.01重量%未満
の濃度ではシランカップリング剤処理による効果が乏し
く、また30重量%を超えても効果が弱くなる。処理する
温度、時間は特に制限はないが、一般的には室温で0.5
〜10分浸漬するか、塗布後、室温で0.5〜10分放置すれ
ば十分である。
The concentration of the silane coupling agent in the silane coupling agent solution is not particularly limited, but is preferably 0.01 to 30% by weight, particularly preferably 0.1 to 5% by weight. If the concentration is less than 0.01% by weight, the effect of the treatment with the silane coupling agent is poor, and if it exceeds 30% by weight, the effect is weakened. The temperature and time of treatment are not particularly limited, but generally 0.5 at room temperature.
It is sufficient to soak for -10 minutes or leave it for 0.5-10 minutes at room temperature after coating.

シランカップリング剤による処理後、熱処理を行うが、
熱処理の温度および時間はシランカップリング剤溶液の
溶媒を乾燥できる条件以上が必要であり、一般的には80
℃以上の温度で1〜60分間行うことが好ましい。特に好
ましくは150〜250℃の温度で5〜20分間行う。
After the treatment with the silane coupling agent, heat treatment is performed.
The heat treatment temperature and time must be at least above the condition that the solvent of the silane coupling agent solution can be dried.
It is preferable to carry out the treatment at a temperature of 0 ° C or higher for 1 to 60 minutes. Particularly preferably, it is carried out at a temperature of 150 to 250 ° C. for 5 to 20 minutes.

次いで、上記のようにして処理したポリイミド成形品の
処理面にポリイミドワニスまたはポリアミド酸ワニスを
塗布、乾燥して熱溶融可能な接着剤層を形成する。
Next, a polyimide varnish or a polyamic acid varnish is applied to the treated surface of the polyimide molded article treated as described above and dried to form a heat-meltable adhesive layer.

ポリイミドワニスに用いられるポリイミドとしては、ポ
リアミドイミド、ポリエステルイミド、ポリエーテルイ
ミド等、イミド構造を含むものであればよく、中でも軟
化点が400℃以下のものが好ましい。
The polyimide used in the polyimide varnish may be any one containing an imide structure, such as polyamideimide, polyesterimide, and polyetherimide, and among them, those having a softening point of 400 ° C. or lower are preferable.

また、ポリアミド酸ワニスに用いられるポリアミド酸と
しては、ポリアミドイミド、ポリエステルイミド、ポリ
エーテルイミド等、イミド構造を有するポリイミドの前
駆体であればよい。中でも、軟化点が400℃以下のポリ
イミドの前駆体であることが好ましい。
The polyamic acid used in the polyamic acid varnish may be a polyimide precursor having an imide structure, such as polyamideimide, polyesterimide, or polyetherimide. Among them, a polyimide precursor having a softening point of 400 ° C. or lower is preferable.

ポリイミドワニスまたはポリアミド酸ワニスの溶剤とし
ては、N−メチルピロリドン、ジグライム、ポリイミド
またはポリアミド酸を溶かすものであれば特に制限はな
いが、例えばN,N−ジメチルアセトアミド、N,N−ジメチ
ルホルムアミド、N,N−ジエチルホルムアミド、ジメチ
ルスルホキシド、スルホラン、メチルスルホラン、テト
ラメチル尿素、ヘキサメチルホスホルアミド、ブチロラ
クトン等の高沸点非ブロトン性極性溶媒が好ましく用い
られる。またこれらの溶媒を単独あるいは2種以上を混
合して用いてもよいし、さらにこれらにキシレン、トル
エン、ベンゼン、フェノール、アセトン、メチルエチル
ケトン、ジアセトンアルコール、セロソルブ、メチルイ
ソブチルケトン、クレゾール、ジオキサン、シクロヘキ
サノン等の溶媒をポリアミド酸が析出しない範囲で添加
して使用してもよい。
The solvent of polyimide varnish or polyamic acid varnish is not particularly limited as long as it dissolves N-methylpyrrolidone, diglyme, polyimide or polyamic acid, for example, N, N-dimethylacetamide, N, N-dimethylformamide, N A high boiling non-broton polar solvent such as, N-diethylformamide, dimethylsulfoxide, sulfolane, methylsulfolane, tetramethylurea, hexamethylphosphoramide or butyrolactone is preferably used. These solvents may be used alone or as a mixture of two or more thereof, and further xylene, toluene, benzene, phenol, acetone, methyl ethyl ketone, diacetone alcohol, cellosolve, methyl isobutyl ketone, cresol, dioxane, cyclohexanone may be added thereto. A solvent such as the above may be added and used within a range in which the polyamic acid does not precipitate.

また、ワニス中のポリイミドまたはポリアミド酸の濃度
は、特に制限されないが、5〜40重量%、好ましくは10
〜30重量%とすることが接着被膜形成上好ましい。
The concentration of the polyimide or polyamic acid in the varnish is not particularly limited, but is 5 to 40% by weight, preferably 10
From the viewpoint of forming an adhesive coating, it is preferable to set the content to -30% by weight.

表面処理したポリイミド成形品にポリイミドワニスまた
はポリアミド酸ワニスを塗布する方法としては、ポリイ
ミドワニスまたはポリアミド酸ワニス中に成形品を浸漬
するか、アプリケータ、ドクターナイフ等を用いて流延
塗布する等、公知の方法を用いればよい。
As a method of applying the polyimide varnish or the polyamic acid varnish to the surface-treated polyimide molded article, dipping the molded article in the polyimide varnish or the polyamic acid varnish, or by casting using an applicator or a doctor knife. A known method may be used.

表面処理したポリイミド成形品に塗布したポリイミドワ
ニスまたはポリアミド酸ワニスを乾燥し、接着剤層を形
成せしめる条件は、溶剤の種類、ワニスがポリイミドワ
ニスかポリアミド酸ワニスであるか等によって異なり、
一義的には決められないが、一般的には50℃〜400℃の
温度で0.1〜5時間乾燥させる。すなわち、ワニスがす
でに閉環したポリイミドのワニスであれば50〜200℃の
温度で0.1〜1時間乾燥させ、溶剤を揮散させるだけで
よい。一方、ワニスがポリアミド酸ワニスである場合
は、乾燥後、接着剤層を形成した時点で閉環してポリイ
ミド化していることが、接着時の乾燥工程を省くために
好ましく、従って、ポリイミド化させるため、100〜400
℃の温度で0.1〜5時間加熱することが特に好ましい。
The conditions for forming the adhesive layer by drying the polyimide varnish or polyamic acid varnish applied to the surface-treated polyimide molded article are different depending on the type of solvent, whether the varnish is a polyimide varnish or a polyamic acid varnish, and the like.
Although not uniquely determined, it is generally dried at a temperature of 50 ° C to 400 ° C for 0.1 to 5 hours. That is, if the varnish is a polyimide varnish that has already been ring-closed, it may be dried at a temperature of 50 to 200 ° C. for 0.1 to 1 hour and the solvent is volatilized. On the other hand, when the varnish is a polyamic acid varnish, after drying, it is preferable to ring-close and polyimide at the time of forming the adhesive layer, in order to omit the drying step at the time of adhesion, and therefore to make it polyimide. , 100-400
It is particularly preferable to heat at a temperature of 0 ° C for 0.1 to 5 hours.

このようにして接着剤層を形成したポリイミド成形品の
接着剤層側に任意の被着体を重ね、加圧、加熱すること
により、強固な接着力を有する積層品を得ることができ
る。
By laminating an arbitrary adherend on the adhesive layer side of the polyimide molded article having the adhesive layer thus formed, and applying pressure and heating, a laminated article having a strong adhesive force can be obtained.

被着体としては、ポリイミド成形品、銅箔、アルミ箔等
の金属箔、銅板、鉄板、アルミ板、ステンレス板、42ア
ロイ板等の金属板等、何であってもよい。
The adherend may be any of a polyimide molded product, a metal foil such as a copper foil and an aluminum foil, a copper plate, an iron plate, an aluminum plate, a stainless plate, and a metal plate such as a 42 alloy plate.

また、加圧、加熱の条件は、接着剤層の物性に応じて異
なるが、一般的には、温度は接着剤の軟化点以上、好ま
しくは接着剤の軟化点以上熱分解開始温度未満であり、
圧力は0.1kg/cm2〜100kg/cm2である。この接着方法は特
に限定はされないが、例えば、接着剤層に任意の被着体
を重ね、ロールラミネート、プレスあるいはオートクレ
ーブ中で加熱、加圧することにより行うことができる。
Further, the conditions of pressurization and heating differ depending on the physical properties of the adhesive layer, but generally, the temperature is equal to or higher than the softening point of the adhesive, preferably equal to or higher than the softening point of the adhesive and lower than the thermal decomposition start temperature. ,
Pressure is 0.1kg / cm 2 ~100kg / cm 2 . This bonding method is not particularly limited, but it can be carried out, for example, by laminating an arbitrary adherend on the adhesive layer and heating and pressing in a roll laminate, a press or an autoclave.

〔実施例〕〔Example〕

以下に実施例を示して本発明を更に詳細に説明するが、
本発明の範囲はこれら例によって何ら限定されるもので
はない。
Hereinafter, the present invention will be described in more detail with reference to Examples.
The scope of the present invention is not limited to these examples.

実施例1 カプトン200H(デュポン社製、50μmポリイミドフイル
ム)を水酸化カリウム30%水溶液に室温で10分間浸漬
後、水洗した。つぎにγ−アミノプロピルトリエトキシ
シラン1%アセトン溶液に室温で30秒間浸漬した後、20
0℃で10分間乾燥した。
Example 1 Kapton 200H (manufactured by DuPont, 50 μm polyimide film) was immersed in a 30% aqueous potassium hydroxide solution at room temperature for 10 minutes and then washed with water. Next, after soaking in 1% γ-aminopropyltriethoxysilane 1% acetone solution at room temperature for 30 seconds, 20
It was dried at 0 ° C for 10 minutes.

一方、3,3′、4、4′−ベンゾフェノンテトラカルボ
ン酸二無水物64.4g、m−トルイレンジアミン12.2g、ビ
ス〔4−(3−アミノフェノキシ)フェニル〕スルホン
43.2gをN−メチルピロリドン480gに溶解し、180℃で6
時間加熱した後、N,N′−ジフェニルメタンビスマレイ
ミド11.3gを溶解し、ポリイミドワニスを得た。ワニス
中のポリイミドの濃度は20重量%であった。得られたワ
ニスを前述の表面処理したカプトン上にアプリケータを
用いて流延し、80℃で10分間、次いで200℃で1.5時間乾
燥して接着剤層を形成した。この上に35μm片面粗化銅
箔を重ねて275℃、50kg/cm2で30分間プレスして銅張基
板を得た。この銅張基板のカプトンとポリイミド接着剤
間の90°引き剥がし強さは0.83kg/cmであった。
On the other hand, 3,3 ′, 4,4′-benzophenone tetracarboxylic acid dianhydride 64.4 g, m-toluylenediamine 12.2 g, bis [4- (3-aminophenoxy) phenyl] sulfone
Dissolve 43.2g in 480g N-methylpyrrolidone and
After heating for an hour, 11.3 g of N, N'-diphenylmethane bismaleimide was dissolved to obtain a polyimide varnish. The concentration of polyimide in the varnish was 20% by weight. The obtained varnish was cast on the surface-treated Kapton using an applicator and dried at 80 ° C. for 10 minutes and then at 200 ° C. for 1.5 hours to form an adhesive layer. A 35 μm single-sided roughened copper foil was placed on this and pressed at 275 ° C. and 50 kg / cm 2 for 30 minutes to obtain a copper-clad substrate. The 90 ° peel strength between Kapton and the polyimide adhesive of this copper-clad substrate was 0.83 kg / cm.

比較例1 γ−アミノプロピルトリエトキシシランを用いない以外
は実施例1と同様にして銅張基板を得た。この銅張基板
のカプトンとポリイミド接着剤間の90°引き剥がし強さ
は0.04kg/cmと非常に弱いものであった。
Comparative Example 1 A copper clad substrate was obtained in the same manner as in Example 1 except that γ-aminopropyltriethoxysilane was not used. The 90 ° peel strength between the Kapton and the polyimide adhesive of this copper clad substrate was 0.04 kg / cm, which was very weak.

比較例2 何も処理しないカプトンを用いた他は実施例1と同様に
して銅張基板を得た。この銅張基板のカプトンとポリイ
ミド接着剤間の90°引き剥がし強さは0.05kg/cmと非常
に弱いものであった。
Comparative Example 2 A copper clad substrate was obtained in the same manner as in Example 1 except that Kapton which was not treated was used. The 90 ° peel strength between the Kapton and the polyimide adhesive of this copper clad substrate was very weak at 0.05 kg / cm.

比較例3 カプトン200Hを水酸化カリウム30%水溶液に室温で10分
間浸漬する工程を省略すること以外は、カプトン200Hを
用いて実施例1に準じて銅張基板を得た。この銅張基板
のカプトンとポリイミド接着剤間の90°引き剥がし強さ
は0.07kg/cmであった。
Comparative Example 3 A copper-clad substrate was obtained according to Example 1 using Kapton 200H except that the step of immersing Kapton 200H in a 30% aqueous potassium hydroxide solution at room temperature for 10 minutes was omitted. The 90 ° peel strength between the Kapton and the polyimide adhesive of this copper-clad substrate was 0.07 kg / cm.

実施例2 カプトン200Hを水酸化ナトリウム30%水溶液に室温で30
分間浸漬後、水洗した。つぎにγ−メルカプトプロピル
トリメトキシシラン5%アセトン溶液に30秒間浸漬後、
250℃で10分間乾燥した。この表面処理したカプトン上
に実施例1と同様にして接着剤層を形成し、もう1枚の
表面処理したカプトンを重ねて275℃、50kg/cm2で30分
間プレスして積層品を得た。この積層品のカプトンとポ
リイミド接着剤間の90°引き剥がし強さは0.92kg/cmで
あった。
Example 2 Kapton 200H was added to a 30% aqueous sodium hydroxide solution at room temperature for 30%.
After soaking for a minute, it was washed with water. Next, after dipping in 5% γ-mercaptopropyltrimethoxysilane 5% acetone solution for 30 seconds,
It was dried at 250 ° C for 10 minutes. An adhesive layer was formed on the surface-treated Kapton in the same manner as in Example 1, another surface-treated Kapton was overlaid and pressed at 275 ° C. and 50 kg / cm 2 for 30 minutes to obtain a laminated product. . The 90 ° peel strength between the Kapton and the polyimide adhesive of this laminate was 0.92 kg / cm.

実施例3 当モルのエチレンビストリメリテート二酸無水物とビス
〔4−(m−アミノフェノキシ)フェニル〕スルホンを
用いてN−メチルピロリドン中で180℃で6時間反応さ
せてポリイミドワニスを得た。このワニスの濃度は20重
量%であった。このワニスを用いて実施例1と同様にし
て接着剤付カプトンを作製し、35μm片面粗化銅箔と重
ねて200℃、30kg/cm2で30分間プレスして銅張基板を作
製した。この銅張基板のカプトンとポリイミド接着剤間
の90°引き剥がし強さは0.72kg/cmであった。
Example 3 An equimolar amount of ethylene bis trimellitate dianhydride and bis [4- (m-aminophenoxy) phenyl] sulfone were reacted in N-methylpyrrolidone at 180 ° C. for 6 hours to obtain a polyimide varnish. . The concentration of this varnish was 20% by weight. Using this varnish, a Kapton with an adhesive was prepared in the same manner as in Example 1, laminated with a 35 μm single-sided roughened copper foil, and pressed at 200 ° C. and 30 kg / cm 2 for 30 minutes to prepare a copper-clad substrate. The 90 ° peel strength between the Kapton and the polyimide adhesive of this copper-clad substrate was 0.72 kg / cm.

実施例4 当モルの3,3′,4,4′−ベンゾフェノンテトラカルボン
酸二無水物と3,3′−ジアミノジフェニルケトンをジグ
ライム中でエタノールを適宜添加しながら15℃で24時間
攪拌してポリアミド酸ワニスを得た。このワニスの濃度
は15重量%であった。このワニスを実施例1と同様にし
て処理したカプトン上にアプリケータを用いて流延し、
100℃で30分間、220℃で60分間乾燥して接着剤層を形成
した。この上に35μm片面粗化銅箔を重ねて330℃、30k
g/cm2で30分間プレスして銅張基板を得た。この銅張基
板のカプトンとポリイミド接着剤間の90°引き剥がし強
さは0.65kg/cmであった。
Example 4 Equimolar amounts of 3,3 ', 4,4'-benzophenone tetracarboxylic dianhydride and 3,3'-diaminodiphenyl ketone were stirred in diglyme for 24 hours at 15 DEG C. with appropriate addition of ethanol. A polyamic acid varnish was obtained. The concentration of this varnish was 15% by weight. This varnish was cast on a Kapton treated in the same manner as in Example 1 using an applicator,
The adhesive layer was formed by drying at 100 ° C. for 30 minutes and 220 ° C. for 60 minutes. 35μm single-sided roughened copper foil is laid on top of this, 330 ℃, 30k
It was pressed at g / cm 2 for 30 minutes to obtain a copper clad substrate. The 90 ° peel strength between the Kapton and the polyimide adhesive of this copper-clad substrate was 0.65 kg / cm.

〔発明の効果〕〔The invention's effect〕

以上詳細に述べた如く、本発明の製造法によれば強固な
接着力を有するポリイミド成形品の積層品を得ることが
でき、その工業的価値は大である。
As described in detail above, according to the production method of the present invention, a laminate of polyimide molded products having a strong adhesive force can be obtained, and its industrial value is great.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭57−63254(JP,A) 特開 昭48−98781(JP,A) 特開 昭54−68654(JP,A) 特開 昭54−54058(JP,A) 特開 昭48−14401(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (56) Reference JP-A-57-63254 (JP, A) JP-A-48-98781 (JP, A) JP-A-54-68654 (JP, A) JP-A-54- 54058 (JP, A) JP-A-48-14401 (JP, A)

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】表面を塩基性化合物を含む溶液で処理した
後、シランカップリング剤で処理し、ついで熱処理した
ポリイミド成形品の処理面にポリイミドワニスまたはポ
リアミド酸ワニスを塗布、乾燥して熱溶融可能な接着剤
層を形成し、その上に任意の被着体を重ねて接着剤の軟
化点以上の温度で加圧、加熱することを特徴とするポリ
イミド成形品の製造法。
1. A polyimide varnish or a polyamic acid varnish is applied to the treated surface of a polyimide molded product which has been treated with a solution containing a basic compound, treated with a silane coupling agent, and then heat treated, and dried to heat-melt. A method for producing a polyimide molded article, which comprises forming a possible adhesive layer, superposing an arbitrary adherend thereon, and applying pressure and heating at a temperature equal to or higher than the softening point of the adhesive.
JP61246114A 1986-10-16 1986-10-16 Manufacturing method of polyimide molding Expired - Lifetime JPH0781119B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61246114A JPH0781119B2 (en) 1986-10-16 1986-10-16 Manufacturing method of polyimide molding

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61246114A JPH0781119B2 (en) 1986-10-16 1986-10-16 Manufacturing method of polyimide molding

Publications (2)

Publication Number Publication Date
JPS6399282A JPS6399282A (en) 1988-04-30
JPH0781119B2 true JPH0781119B2 (en) 1995-08-30

Family

ID=17143691

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61246114A Expired - Lifetime JPH0781119B2 (en) 1986-10-16 1986-10-16 Manufacturing method of polyimide molding

Country Status (1)

Country Link
JP (1) JPH0781119B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5621068A (en) * 1993-08-03 1997-04-15 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Thermoplastic polyimide polymer; thermoplastic polyimide film; polyimide laminate; and method of manufacturing the laminate
JP3952196B2 (en) * 2003-06-25 2007-08-01 信越化学工業株式会社 Method for producing flexible metal foil polyimide laminate
JP4734837B2 (en) 2004-03-23 2011-07-27 宇部興産株式会社 Polyimide film with improved adhesiveness, method for producing the same, and laminate
CN101484513B (en) * 2006-07-04 2013-05-29 新日铁化学株式会社 Method of modifying surface of polyimide resin layer and method for producing metal-clad laminated plate
EP1978024A1 (en) * 2007-04-04 2008-10-08 Atotech Deutschland Gmbh Silane compositions comprising novel crosslinking agents
JP6688450B2 (en) * 2016-01-15 2020-04-28 東洋紡株式会社 Laminate, electronic device, and flexible electronic device manufacturing method
JP6766436B2 (en) * 2016-05-09 2020-10-14 東洋紡株式会社 Laminated body and manufacturing method of laminated body

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5418110B2 (en) * 1972-03-28 1979-07-05
JPS5855489B2 (en) * 1977-10-07 1983-12-09 株式会社日立製作所 Manufacturing method of liquid crystal display cell
JPS5468654A (en) * 1977-11-11 1979-06-01 Casio Comput Co Ltd Production of liquid crystal cell
CA1198662A (en) * 1980-09-22 1985-12-31 National Aeronautics And Space Administration Process for preparing high temperature polyimide film laminates

Also Published As

Publication number Publication date
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