JPH0412897B2 - - Google Patents
Info
- Publication number
- JPH0412897B2 JPH0412897B2 JP27259286A JP27259286A JPH0412897B2 JP H0412897 B2 JPH0412897 B2 JP H0412897B2 JP 27259286 A JP27259286 A JP 27259286A JP 27259286 A JP27259286 A JP 27259286A JP H0412897 B2 JPH0412897 B2 JP H0412897B2
- Authority
- JP
- Japan
- Prior art keywords
- polyimide
- adhesive
- treated
- treatment
- silane coupling
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920001721 polyimide Polymers 0.000 claims description 47
- 239000004642 Polyimide Substances 0.000 claims description 39
- 239000000853 adhesive Substances 0.000 claims description 24
- 230000001070 adhesive effect Effects 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 14
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 13
- 150000007514 bases Chemical class 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 6
- 238000003825 pressing Methods 0.000 claims description 4
- 239000000243 solution Substances 0.000 description 14
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 13
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 13
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 239000002313 adhesive film Substances 0.000 description 7
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000011889 copper foil Substances 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000005304 joining Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 239000002966 varnish Substances 0.000 description 3
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 239000004962 Polyamide-imide Substances 0.000 description 2
- 239000004697 Polyetherimide Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 150000003949 imides Chemical group 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 229920003055 poly(ester-imide) Polymers 0.000 description 2
- 229920002312 polyamide-imide Polymers 0.000 description 2
- 229920001601 polyetherimide Polymers 0.000 description 2
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical class [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 2
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical class S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 2
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- BBRAYSQBAHZREF-UHFFFAOYSA-N (6-ethyl-6-trimethoxysilylcyclohexa-2,4-dien-1-yl)methanamine Chemical compound CO[Si](OC)(OC)C1(CC)C=CC=CC1CN BBRAYSQBAHZREF-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 description 1
- AHYFYQKMYMKPKD-UHFFFAOYSA-N 3-ethoxysilylpropan-1-amine Chemical compound CCO[SiH2]CCCN AHYFYQKMYMKPKD-UHFFFAOYSA-N 0.000 description 1
- LVNLBBGBASVLLI-UHFFFAOYSA-N 3-triethoxysilylpropylurea Chemical compound CCO[Si](OCC)(OCC)CCCNC(N)=O LVNLBBGBASVLLI-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- CNODSORTHKVDEM-UHFFFAOYSA-N 4-trimethoxysilylaniline Chemical compound CO[Si](OC)(OC)C1=CC=C(N)C=C1 CNODSORTHKVDEM-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- -1 etc. Substances 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- NHBRUUFBSBSTHM-UHFFFAOYSA-N n'-[2-(3-trimethoxysilylpropylamino)ethyl]ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCNCCN NHBRUUFBSBSTHM-UHFFFAOYSA-N 0.000 description 1
- XKLJRDXPVLBKKA-UHFFFAOYSA-N n'-[2-[dimethoxy(2-phenylethyl)silyl]oxyethyl]ethane-1,2-diamine Chemical compound NCCNCCO[Si](OC)(OC)CCC1=CC=CC=C1 XKLJRDXPVLBKKA-UHFFFAOYSA-N 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- CLYWMXVFAMGARU-UHFFFAOYSA-N n-benzyl-3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCNCC1=CC=CC=C1 CLYWMXVFAMGARU-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000006798 ring closing metathesis reaction Methods 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- UKRDPEFKFJNXQM-UHFFFAOYSA-N vinylsilane Chemical class [SiH3]C=C UKRDPEFKFJNXQM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
Landscapes
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はポリイミド成形品の接着法に関し、さ
らに詳しくは、接着力の優れた積層品を与えるポ
リイミド成形品の接着法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for adhering polyimide molded products, and more particularly to a method for adhering polyimide molded products that provides a laminate with excellent adhesive strength.
ポリイミド成形品、特にポリイミドフイルムは
電気絶縁材料として広く用いられている。例えば
ポリイミドフイルムを銅箔等の金属箔に接着して
フレキシブル配線板が製造されており、接着剤と
しては特開昭50−34640号公報に示されているよ
うにアクリル系接着剤が用いられてきた。しか
し、アクリル系接着剤は耐熱性が低く、ポリイミ
ドフイルム本来の耐熱性を十分生かしていなかつ
た。そこでポリイミドフイルムの耐熱性を生かす
ため、ポリイミド接着剤が開発された(例えば特
開昭61−60755号公報参照)。ところがポリイミド
接着剤は閉環時に水を発生するため、複雑かつ長
時間の乾燥が必要であつたり、弾性率が高いため
に剥離強さが低い等の欠点がある。接着力の改善
するためにサンドブラスト等でポリイミドフイル
ムの表面を機械的に粗化したり、プラズマ処理等
が試みられている(特開昭59−21878号公報)。し
かし、機械的粗化では接着力は十分でなく、プラ
ズマ処理では若干の効果はあるものの高価な装置
が必要であり、また処理効果も短時間で低下する
という欠点がある。一方、特公昭52−36778号公
報に示されているように、ポリイミドフイルムを
アルカリで処理した後、アルカリ金属よりもイオ
ン化傾向の小さい金属塩で再度処理する方法もあ
るが、この方法では重金属を使用することや、ま
た特定のポリイミド接着剤に対しては効果はある
ものの、他の多くのポリイミド接着剤に対して効
果が不十分である等の欠点がある。
Polyimide molded products, especially polyimide films, are widely used as electrical insulating materials. For example, flexible wiring boards are manufactured by bonding polyimide film to metal foil such as copper foil, and acrylic adhesives are used as adhesives as disclosed in Japanese Patent Application Laid-Open No. 50-34640. Ta. However, acrylic adhesives have low heat resistance and do not take full advantage of polyimide film's inherent heat resistance. Therefore, in order to take advantage of the heat resistance of polyimide film, polyimide adhesives were developed (see, for example, Japanese Patent Laid-Open No. 60755/1983). However, polyimide adhesives generate water during ring closure, requiring complicated and long drying times, and have drawbacks such as low peel strength due to high elastic modulus. In order to improve the adhesive strength, attempts have been made to mechanically roughen the surface of the polyimide film by sandblasting or the like, or to perform plasma treatment (Japanese Unexamined Patent Publication No. 59-21878). However, mechanical roughening does not provide sufficient adhesion, and plasma treatment, although somewhat effective, requires expensive equipment and also has the disadvantage that the treatment effect deteriorates in a short period of time. On the other hand, as shown in Japanese Patent Publication No. 52-36778, there is a method in which a polyimide film is treated with an alkali and then treated again with a metal salt that has a smaller ionization tendency than an alkali metal. Although it is effective for certain polyimide adhesives, it has drawbacks such as insufficient effectiveness for many other polyimide adhesives.
本発明は上記の如き従来技術の欠点を解消し、
十分な接着力を得ることのできるポリイミド成形
品の接合法を提供せんとするものである。
The present invention eliminates the drawbacks of the prior art as described above,
The present invention aims to provide a method for joining polyimide molded products that can obtain sufficient adhesive strength.
本発明のポリイミド成形品の接合法は、表面を
塩基性化合物を含む溶液で処理した後、シランカ
ツプリング剤で処理し、つぎに熱処理したポリイ
ミド成形品の処理面に熱溶融可能なポリイミドの
シート状接着剤を重ね、その上に任意の被着体を
重ねて接着剤の軟化点以上の温度で加圧、加熱す
ることを特徴とする。
The joining method for polyimide molded products of the present invention involves first treating the surface with a solution containing a basic compound, then treating it with a silane coupling agent, and then attaching a heat-meltable polyimide sheet to the treated surface of the heat-treated polyimide molded product. It is characterized by stacking a layer of adhesive, placing an arbitrary adherend on top of it, and pressing and heating it at a temperature above the softening point of the adhesive.
本発明方法において用いられるポリイミド成形
品はフイルムの他、フレキシブル印刷配線板、積
層板等、ポリイミド樹脂が表面に露出しているも
のであればよい。またポリイミドとしては、ポリ
アミドイミド、ポレエーテルイミド、ポリエステ
ルイミド等、イミド構造を含むものであればよ
い。 The polyimide molded product used in the method of the present invention may be anything other than a film, such as a flexible printed wiring board, a laminate, etc., as long as the polyimide resin is exposed on the surface. Further, the polyimide may be one containing an imide structure, such as polyamideimide, polyetherimide, polyesterimide, or the like.
本発明方法に用いられる塩基性化合物として
は、水酸化ナトリウム、水酸化カリウム、水酸化
リチウム等のアルカリ金属水酸化物、および水酸
化テトラメチルアンモニウム、水酸化テトラエチ
ルアンモニウム、水酸化テトラブチルアンモニウ
ム等の四級アンモニウム水酸化物が好ましく、特
に好ましくは水酸化カリウム、水酸化ナトリウム
である。 The basic compounds used in the method of the present invention include alkali metal hydroxides such as sodium hydroxide, potassium hydroxide, and lithium hydroxide, and tetramethylammonium hydroxide, tetraethylammonium hydroxide, and tetrabutylammonium hydroxide. Quaternary ammonium hydroxide is preferred, and potassium hydroxide and sodium hydroxide are particularly preferred.
上記の塩基性化合物を溶解する溶媒としては
水、メタノール、エタノール、プロパノール、イ
ソプロパノール等のアルコールおよび水とアルコ
ールの混合溶媒が好ましい。 Preferred solvents for dissolving the basic compound include water, alcohols such as methanol, ethanol, propanol, and isopropanol, and mixed solvents of water and alcohol.
塩基性化合物を含む溶液中の塩基性化合物の濃
度およびポリイミド成形品を処理する温度、時間
は望みの処理程度によつて決定され、特に限定は
されないが、一般的には濃度は0.1〜50重量%、
温度は室温ないし80℃、時間は0.1分ないし1時
間である。この塩基性化合物を含む溶液によるポ
リイミド成形品の表面処理は、例えばポリイミド
成形品を該溶液中に浸漬するか、アプリケータ、
ドクターナイフ等を用いて流延塗布する等、公知
の方法を用いればよい。塩基性化合物を含む溶液
で処理した後、シランカツプリング剤で処理する
前に、塩酸、硫酸、酢酸等の酸溶液で処理しても
よい。 The concentration of the basic compound in the solution containing the basic compound and the temperature and time for treating the polyimide molded article are determined depending on the desired degree of treatment, and are not particularly limited, but generally the concentration is between 0.1 and 50% by weight. %,
The temperature is room temperature to 80°C, and the time is 0.1 minute to 1 hour. The surface treatment of a polyimide molded article with a solution containing this basic compound can be carried out, for example, by immersing the polyimide molded article in the solution, or by using an applicator,
Any known method may be used, such as casting using a doctor knife or the like. After treatment with a solution containing a basic compound and before treatment with a silane coupling agent, treatment with an acid solution such as hydrochloric acid, sulfuric acid, or acetic acid may be performed.
本発明方法に用いられるシランカツプリング剤
としては、ビニルトリメトキシシラン等のビニル
シラン、γ−グリシドキシプロピルトリメトキシ
シラン等のエポキシシラン、γ−メルカプトプロ
ピルトリメトキシシラン等のメルカプトシラン、
γ−アミノプロピルトリエトキシシラン、N−フ
エニル−γ−アミノプロピルトリメトキシシラ
ン、N−β(アミノエチル)γ−アミノプロピル
トリメトキシシラン、N−β(アミノエチル)γ
−アミノプロピルメチルジメトキシシラン、γ−
ウレイドプロピルトリエトキシシラン、N−ベン
ジル−γ−アミノプロピルトリメトキシシラン、
アミノエチルアミノメチルフエネチルトリメトキ
シシラン、p−アミノフエニルトリメトキシシラ
ン、トリメトキシシリルプロピルジエチレントリ
アミン、1−トリメトキシシリル−2−(アミノ
メチル)フエニルエタン等のアミノシランが用い
られているが、中でもメルカプトシランおよびア
ミノシランが好ましく、γ−メルカプトプロピル
トリメトキシシラン、γ−アミノプロピルエトキ
シシランが特に好ましい。 Silane coupling agents used in the method of the present invention include vinylsilanes such as vinyltrimethoxysilane, epoxysilanes such as γ-glycidoxypropyltrimethoxysilane, mercaptosilanes such as γ-mercaptopropyltrimethoxysilane,
γ-aminopropyltriethoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane, N-β(aminoethyl)γ-aminopropyltrimethoxysilane, N-β(aminoethyl)γ
-aminopropylmethyldimethoxysilane, γ-
ureidopropyltriethoxysilane, N-benzyl-γ-aminopropyltrimethoxysilane,
Aminosilanes such as aminoethylaminomethylphenethyltrimethoxysilane, p-aminophenyltrimethoxysilane, trimethoxysilylpropyldiethylenetriamine, and 1-trimethoxysilyl-2-(aminomethyl)phenylethane are used, among which Mercaptosilane and aminosilane are preferred, and γ-mercaptopropyltrimethoxysilane and γ-aminopropylethoxysilane are particularly preferred.
シランカツプリング剤による処理は、塩基性化
合物を含有する溶液による処理後行われ、処理方
法としては、例えばポリイミド成形品をシランカ
ツプリング剤溶液中に浸漬するか、アプリケー
タ、ドクターナイフ等を用いて流延塗布する等、
公知の方法を用いればよい。 Treatment with a silane coupling agent is carried out after treatment with a solution containing a basic compound, and the treatment method includes, for example, immersing a polyimide molded article in a silane coupling agent solution, or using an applicator, doctor knife, etc. Casting coating, etc.
Any known method may be used.
シランカルプリング剤を溶解する溶媒として
は、水、アルコール、アセトン、酢酸エチル、ト
ルエン等、シランカツプリング剤を溶解するもの
であれば何でもよいが、水、アルコール、アセト
ンが中でも好ましい。 The solvent for dissolving the silane coupling agent may be any solvent as long as it dissolves the silane coupling agent, such as water, alcohol, acetone, ethyl acetate, toluene, etc., and water, alcohol, and acetone are particularly preferred.
シランカツプリング剤溶液中のシランカツプリ
ング剤の濃度は、特に限定はされないが、0.01〜
30重量%が好ましく、0.1〜5重量%が特に好ま
しい。0.01重量%未満の濃度ではシランカツプリ
ング剤処理による効果が乏しく、また30重量%を
超えても効果が弱くなる。処理する温度、時間は
特に制限はないが、一般的には室温で0.5〜10分
浸漬するか、塗布後、室温で0.5〜10分放置すれ
ば十分である。 The concentration of the silane coupling agent in the silane coupling agent solution is not particularly limited, but is from 0.01 to
30% by weight is preferred, and 0.1-5% by weight is particularly preferred. If the concentration is less than 0.01% by weight, the effect of the silane coupling agent treatment will be poor, and if it exceeds 30% by weight, the effect will be weak. There are no particular restrictions on the temperature or time of the treatment, but generally it is sufficient to immerse it at room temperature for 0.5 to 10 minutes, or to leave it for 0.5 to 10 minutes at room temperature after application.
シランカツプリング剤による処理後、熱処理を
行うが、熱処理の温度および時間はシランカツプ
リング剤溶液の溶媒を乾燥できる条件以上が必要
であり、一般的には80℃以上の温度で1〜60分間
行うことが好ましい。特に好ましくは150〜250℃
の温度で5〜20分間行う。 After treatment with the silane coupling agent, heat treatment is performed, but the temperature and time of the heat treatment must be at least conditions that can dry the solvent of the silane coupling agent solution, and generally at a temperature of 80°C or higher for 1 to 60 minutes. It is preferable to do so. Particularly preferably 150-250℃
Do this for 5 to 20 minutes at a temperature of .
次いで、上記のようにして処理したポリイミド
成形品の処理面に熱溶融可能なポリイミドのシー
ト状接着剤と被着体を順次重ねて加圧加熱するこ
とによつて強固な接着が可能となる。 Next, a heat-meltable polyimide sheet adhesive and an adherend are sequentially stacked on the treated surface of the polyimide molded product treated as described above and heated under pressure, thereby achieving strong adhesion.
本発明において用いることのできる熱溶融可能
なポリイミドのシート状接着剤としては樹脂単独
のフイルムであつてもよく、ガラス布やアラミド
布等の基材に樹脂を含浸させたものでもよい。ポ
リイミドとしてはポリアミドイミド、ポリエステ
ルイミド、ポリエーテルイミド等イミド構造を含
むものであればよく、軟化点が400℃以下のもの
が好ましい。 The heat-meltable polyimide sheet adhesive that can be used in the present invention may be a film made of resin alone, or may be a resin-impregnated base material such as glass cloth or aramid cloth. The polyimide may be one containing an imide structure such as polyamideimide, polyesterimide, polyetherimide, etc., and preferably has a softening point of 400°C or less.
被着体としては、ポリイミド成形品、銅箔、ア
ルミ箔等の金属箔、銅板、鉄板、アルミ板、ステ
ンレス板、42アロイ板等の金属板等、何であつて
もよい。 The adherend may be anything, including polyimide molded products, metal foils such as copper foil and aluminum foil, metal plates such as copper plates, iron plates, aluminum plates, stainless steel plates, and 42 alloy plates.
接着条件は用いるシート状接着剤の物性に応じ
て異なるが、一般的には、温度は接着剤の軟化点
以上、好ましくは接着剤の軟化点以上熱分解開始
温度未満であり、圧力は0.1Kg/cm3〜100Kg/cm3で
ある。この接着方法は特に限定はされないが、例
えば、接着剤層に任意の被着体を重ね、ロールラ
ミネート、プレスあるいはオートクレープ中で加
熱、加圧することにより行うことができる。 Adhesion conditions vary depending on the physical properties of the sheet adhesive used, but generally the temperature is above the softening point of the adhesive, preferably above the softening point of the adhesive and below the thermal decomposition start temperature, and the pressure is 0.1 kg. /cm 3 to 100Kg/cm 3 . This bonding method is not particularly limited, but can be carried out, for example, by stacking an arbitrary adherend on the adhesive layer and heating and pressurizing it in roll lamination, press, or autoclave.
以下に実施例を示して本発明を更に詳細に説明
するが、本発明の範囲はこれら例によつて何ら限
定されるものではない。
EXAMPLES The present invention will be explained in more detail with reference to Examples below, but the scope of the present invention is not limited in any way by these Examples.
実施例 1
カプトン200H(デユポン社製、50μmポリイミ
ドフイルム)を水酸化カリウム30%水溶液に室温
で10分間浸漬後、水洗した。つぎにγ−アミノプ
ロピルトリエトキシシラン1%アセトン溶液に室
温で30秒間浸漬した後、200℃で10分間乾燥した。Example 1 Kapton 200H (manufactured by DuPont, 50 μm polyimide film) was immersed in a 30% potassium hydroxide aqueous solution for 10 minutes at room temperature, and then washed with water. Next, it was immersed in a 1% acetone solution of γ-aminopropyltriethoxysilane for 30 seconds at room temperature, and then dried at 200°C for 10 minutes.
一方、3,3′,4,4′−ベンゾフエノンテトラ
カルボン酸二無水物64.4g、m−トルイレンジア
ミン12.2g、ビス〔4−(3−アミノフエノキシ)
フエニル〕スルホン43.2gをN−メチルピロリド
ン480gに溶解し、180℃で6時間加熱した後、
N,N′−ジフエニルメタンビスマレイミド11.3g
を溶解し、ポリイミドワニスを得た。ワニス中の
ポリイミドの濃度は20重量%であつた。得られた
ワニスをガラス板上に流延し、80℃10分乾燥した
のちガラス板より剥離し、鉄枠にとめて200℃1
時間乾燥してポリイミド接着フイルムを得た。前
述の表面処理したカプトンの処理面上にポリイミ
ド接着フイルムと35μm片面粗化銅箔を順次重ね
て275℃、50Kg/cm3で30分間プレスして銅張基板
を得た。この銅張基板のカプトンとポリイミド接
着剤間の90゜引き剥がし強さは0.83Kg/cmであつ
た。 On the other hand, 64.4 g of 3,3',4,4'-benzophenonetetracarboxylic dianhydride, 12.2 g of m-tolylenediamine, bis[4-(3-aminophenoxy)
After dissolving 43.2 g of phenyl]sulfone in 480 g of N-methylpyrrolidone and heating at 180°C for 6 hours,
N,N'-diphenylmethane bismaleimide 11.3g
was dissolved to obtain polyimide varnish. The concentration of polyimide in the varnish was 20% by weight. The obtained varnish was cast onto a glass plate, dried at 80℃ for 10 minutes, peeled off from the glass plate, fixed on an iron frame, and heated at 200℃ for 10 minutes.
After drying for several hours, a polyimide adhesive film was obtained. A polyimide adhesive film and a 35 μm single-sided roughened copper foil were sequentially stacked on the surface of the Kapton surface treated above and pressed at 275° C. and 50 kg/cm 3 for 30 minutes to obtain a copper-clad substrate. The 90° peel strength between Kapton and polyimide adhesive on this copper-clad board was 0.83 kg/cm.
比較例 1
γ−アミノプロピルトリエトキシシランを用い
ない以外は実施例1と同様にして銅張基板を得
た。この銅張基板のカプトンとポリイミド接着剤
間の90゜引き剥がし強さは0.04Kg/cmと非常に弱
いものであつた。Comparative Example 1 A copper-clad substrate was obtained in the same manner as in Example 1 except that γ-aminopropyltriethoxysilane was not used. The 90° peel strength between the Kapton and polyimide adhesive of this copper-clad board was very weak at 0.04 kg/cm.
比較例 2
何も処理しないカプトンを用いた他は実施例1
と同様にして銅張基板を得た。この銅張基板のカ
プトンとポリイミド接着剤間の90゜引き剥がし強
さは0.05Kg/cmと非常に弱いものであつた。Comparative Example 2 Example 1 except that Kapton without any treatment was used
A copper-clad board was obtained in the same manner. The 90° peel strength between the Kapton and polyimide adhesive of this copper-clad board was very weak at 0.05 kg/cm.
実施例 2
カプトン200Hを水酸化ナトリウム30%水溶液
に室温で30分間浸漬後、水洗した。つぎにγ−メ
ルカプトプロピルトリメトキシシラン1%アセト
ン溶液に30秒間浸漬後、250℃で10分間乾燥した。
この表面処理したカプトンの間にポリイミド接着
フイルムをはさんで実施例1と同様にして積層品
を得た。この積層品のカプトンのポリイミド接着
剤間の90゜引き剥がし強さは0.80Kg/cmであつた。Example 2 Kapton 200H was immersed in a 30% sodium hydroxide aqueous solution at room temperature for 30 minutes, and then washed with water. Next, it was immersed in a 1% acetone solution of γ-mercaptopropyltrimethoxysilane for 30 seconds, and then dried at 250°C for 10 minutes.
A laminate was obtained in the same manner as in Example 1 by sandwiching a polyimide adhesive film between the surface-treated Kapton. The 90° peel strength between Kapton's polyimide adhesives in this laminate was 0.80 kg/cm.
実施例 3
γ−アミノプロピルトリエトキシシランのかわ
りにγ−メルカプトプロピルトリメトキシシラン
5%アセトン溶液を用いる以外は実施例1と同様
にして銅張基板を得た。この銅張基板のカプトン
とポリイミド接着フイルム間の90゜引きはがし強
さは0.94Kg/cmであつた。Example 3 A copper-clad substrate was obtained in the same manner as in Example 1, except that a 5% acetone solution of γ-mercaptopropyltrimethoxysilane was used instead of γ-aminopropyltriethoxysilane. The 90° peel strength between the Kapton and polyimide adhesive film of this copper-clad board was 0.94 kg/cm.
比較例 3
水酸化カリウム溶液に浸漬しないこと以外は実
施例2と同様にして積層品を得た。この積層品の
カプトンとポリイミド接着フイルム間の90゜引き
はがし強さは0.04Kg/cmと非常に弱いものであつ
た。Comparative Example 3 A laminate was obtained in the same manner as in Example 2 except that it was not immersed in the potassium hydroxide solution. The 90° peel strength between Kapton and the polyimide adhesive film of this laminate was very weak at 0.04 kg/cm.
実施例 4
カプトン200Hを水酸化ナトリウム10%水溶液
に40℃で20分間浸漬後、水洗した。つぎにγ−ア
ミノプロピルトリエトキシシラン1%アセトン溶
液に室温で1分間浸漬した後200℃で10分乾燥し
た。この表面処理したカプトンと35μm片面粗化
銅箔の間にポリイミドプリプレグI−67又はI−
68(日立化成工業(株)商品名)をはさみそれぞれ170
℃60Kg/cm21.5時間、200℃40Kg/cm22時間の条件
でプレスして積層品を得た。この積層品のカプト
ンとプリプレグ間の90゜引きはがし強さはそれぞ
れ0.98Kg/cm、0.65Kg/cmであつた。Example 4 Kapton 200H was immersed in a 10% sodium hydroxide aqueous solution at 40° C. for 20 minutes, and then washed with water. Next, it was immersed in a 1% acetone solution of γ-aminopropyltriethoxysilane for 1 minute at room temperature, and then dried at 200°C for 10 minutes. Polyimide prepreg I-67 or I-
68 (Hitachi Chemical Co., Ltd. product name) scissors and 170 each
A laminate was obtained by pressing under the conditions of 1.5 hours at 60 Kg/cm 2 at 200°C and 2 hours at 40 Kg/cm 2 at 200°C. The 90° peel strength between Kapton and prepreg in this laminate was 0.98 Kg/cm and 0.65 Kg/cm, respectively.
実施例 5
当モルの3,3′,4,4′−ベンゾフエノンテト
ラカルボン酸二無水物と3,3′−ジアミノジフエ
ニルケトンを用いて作成したポリイミド接着フイ
ルムを用いて350℃、30Kg/cm2、20分の条件でプ
レスする以外は実施例1と同様にして積層品を得
た。この積層品のカプトこと接着フイルム間の
90゜引きはがし強さは0.75Kg/cmであつた。Example 5 A polyimide adhesive film prepared using equimolar amounts of 3,3',4,4'-benzophenonetetracarboxylic dianhydride and 3,3'-diaminodiphenyl ketone was used at 350°C and 30 kg. A laminate was obtained in the same manner as in Example 1, except that pressing was carried out under the conditions of /cm 2 and 20 minutes. This laminate has caputo adhesive film between
The 90° peel strength was 0.75 kg/cm.
以上詳細に述べた如く、本発明の接合法によれ
ば強固な接着力を有するポリイミド成形品の積層
品を得ることができ、その工業的価値は大であ
る。
As described above in detail, according to the joining method of the present invention, a laminate of polyimide molded products having strong adhesive strength can be obtained, and its industrial value is great.
Claims (1)
後、シランカツプリング剤で処理し、ついで熱処
理したポリイミド成形品の処理面に熱溶融可能な
ポリイミドのシート状接着剤を重ね、その上に任
意の被着体を重ねて接着剤の軟化点以上の温度で
加圧、加熱することを特徴とするポリイミド成形
品の接着法。1 After the surface is treated with a solution containing a basic compound, it is treated with a silane coupling agent, and then a heat-meltable polyimide sheet adhesive is layered on the treated surface of the heat-treated polyimide molded product, and any arbitrary A method for bonding polyimide molded products, which involves stacking adherends and applying pressure and heating at a temperature above the softening point of the adhesive.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27259286A JPS63125532A (en) | 1986-11-14 | 1986-11-14 | Bonding of polyimide molding |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27259286A JPS63125532A (en) | 1986-11-14 | 1986-11-14 | Bonding of polyimide molding |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63125532A JPS63125532A (en) | 1988-05-28 |
JPH0412897B2 true JPH0412897B2 (en) | 1992-03-06 |
Family
ID=17516064
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP27259286A Granted JPS63125532A (en) | 1986-11-14 | 1986-11-14 | Bonding of polyimide molding |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63125532A (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4337991B2 (en) * | 1997-12-22 | 2009-09-30 | 日東電工株式会社 | Thermally conductive pressure-sensitive adhesive sheets and methods of fixing electronic components and heat radiating members using the same |
KR100639648B1 (en) * | 2005-11-09 | 2006-11-01 | 삼성전기주식회사 | Method for modifying polymer materials |
JP5215182B2 (en) * | 2006-07-04 | 2013-06-19 | 新日鉄住金化学株式会社 | Method for modifying surface of polyimide resin layer and method for producing metal-clad laminate |
EP3450164B1 (en) * | 2016-04-28 | 2021-07-14 | Toyobo Co., Ltd. | Polyimide film layered body |
-
1986
- 1986-11-14 JP JP27259286A patent/JPS63125532A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS63125532A (en) | 1988-05-28 |
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