JPS63125532A - Bonding of polyimide molding - Google Patents
Bonding of polyimide moldingInfo
- Publication number
- JPS63125532A JPS63125532A JP27259286A JP27259286A JPS63125532A JP S63125532 A JPS63125532 A JP S63125532A JP 27259286 A JP27259286 A JP 27259286A JP 27259286 A JP27259286 A JP 27259286A JP S63125532 A JPS63125532 A JP S63125532A
- Authority
- JP
- Japan
- Prior art keywords
- treated
- polyimide
- adhesive
- solution
- polyimide molding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920001721 polyimide Polymers 0.000 title claims abstract description 52
- 239000004642 Polyimide Substances 0.000 title claims abstract description 44
- 238000000465 moulding Methods 0.000 title abstract 5
- 239000000853 adhesive Substances 0.000 claims abstract description 27
- 230000001070 adhesive effect Effects 0.000 claims abstract description 27
- 239000006087 Silane Coupling Agent Substances 0.000 claims abstract description 14
- 238000010438 heat treatment Methods 0.000 claims abstract description 6
- 150000007514 bases Chemical class 0.000 claims abstract 2
- 238000000034 method Methods 0.000 claims description 12
- 238000003825 pressing Methods 0.000 claims description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 abstract description 15
- 238000011282 treatment Methods 0.000 abstract description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 3
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 abstract description 2
- 239000002253 acid Substances 0.000 abstract description 2
- 239000011889 copper foil Substances 0.000 abstract description 2
- 239000004952 Polyamide Substances 0.000 abstract 1
- 229920002647 polyamide Polymers 0.000 abstract 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 13
- 239000000243 solution Substances 0.000 description 13
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000002313 adhesive film Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 239000000654 additive Substances 0.000 description 5
- 230000000996 additive effect Effects 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 239000004962 Polyamide-imide Substances 0.000 description 2
- 239000004697 Polyetherimide Substances 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000003949 imides Chemical group 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 229920003055 poly(ester-imide) Polymers 0.000 description 2
- 229920002312 polyamide-imide Polymers 0.000 description 2
- 229920001601 polyetherimide Polymers 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- JPYXQNWIQIBLJT-UHFFFAOYSA-N (2-ethylphenyl)methanamine Chemical compound CCC1=CC=CC=C1CN JPYXQNWIQIBLJT-UHFFFAOYSA-N 0.000 description 1
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 description 1
- CNODSORTHKVDEM-UHFFFAOYSA-N 4-trimethoxysilylaniline Chemical compound CO[Si](OC)(OC)C1=CC=C(N)C=C1 CNODSORTHKVDEM-UHFFFAOYSA-N 0.000 description 1
- DFGKGUXTPFWHIX-UHFFFAOYSA-N 6-[2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]acetyl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)C1=CC2=C(NC(O2)=O)C=C1 DFGKGUXTPFWHIX-UHFFFAOYSA-N 0.000 description 1
- 235000002568 Capsicum frutescens Nutrition 0.000 description 1
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 1
- 240000002834 Paulownia tomentosa Species 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 235000012438 extruded product Nutrition 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- SBOJXQVPLKSXOG-UHFFFAOYSA-N o-amino-hydroxylamine Chemical compound NON SBOJXQVPLKSXOG-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- -1 propatool Chemical compound 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000006798 ring closing metathesis reaction Methods 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical compound S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical compound CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 229920006259 thermoplastic polyimide Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
Landscapes
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はポリイミド成形品の接着法に関し、さらに詳し
くは、接着力の4&nた積層品を与えるポリイミド成形
品の接着法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for adhering polyimide molded products, and more particularly to a method for adhering polyimide molded products that provides a laminate with an adhesive strength of 4&n.
ポリイミド成形品、特にポリイミドフィルムは電気P2
縁材料として広(用いらrしている。例えばポリイミド
フィルムを銅箔等の金W4箔に接着してフレキシブル配
線板が製造さiしており、接着剤としては特開昭50−
34640号公報に示さnているようにアクリル系接着
剤が用いらnてきた。しかし、アクリル系接着剤は耐熱
性が低く、ポリイミドフィルム本来の耐熱性を十分生か
していなかった。そこでポリイミドフィルムの耐熱性を
生かすため、ポリイミド接着剤が開発さnた(例えば特
開昭61−60755号公報参照)。ところがポリイミ
ド接着剤は閉環時に水を発生するため、複雑かつ長時間
の乾燥が必要であったり、弾性率が高いために剥離強さ
が低い等の欠点がある。接着力の改善するためにサンド
ブラスト等でポリイミドフィルムの表面を機械的に粗化
したり、プラズマ処理等が試みろnている(%開昭59
−21878号公報)。しかし、機械的粗化でに接着力
に十分でなく、プラズマ処理でに若干の効果ニするもの
の高価な装置が必要であり、また処理効果も短時間で低
下するという欠点がめる。−万、特公昭52−3677
8号公報に示さnているように、ポリイミドフィルムを
アルカリで処理した後、アルカリ金属よりもイオン化傾
向の小さい金属塩で再度処理する方法もあるが、この方
法では重金属を使用することや、また特定のポリイミド
接着剤に対しては効果にあるものの、他の多くのポリイ
ミド接着剤に対して効果が不十分である等の欠点がある
。Polyimide molded products, especially polyimide films, are electrically P2
It is widely used as a border material. For example, flexible wiring boards are manufactured by bonding polyimide film to gold W4 foil such as copper foil.
Acrylic adhesives have been used as shown in Japanese Patent No. 34640. However, acrylic adhesives have low heat resistance and do not take full advantage of the inherent heat resistance of polyimide films. Therefore, in order to take advantage of the heat resistance of polyimide film, polyimide adhesives were developed (see, for example, Japanese Patent Laid-Open No. 60755/1983). However, since polyimide adhesives generate water during ring closure, they have drawbacks such as requiring complex and long drying times and low peel strength due to their high elastic modulus. In order to improve the adhesion, attempts have been made to mechanically roughen the surface of the polyimide film by sandblasting, etc., or to perform plasma treatment.
-21878). However, mechanical roughening is not sufficient for adhesion, plasma treatment is somewhat effective but requires expensive equipment, and the treatment effect deteriorates in a short period of time. - 10,000, special public service Sho 52-3677
As shown in Publication No. 8, there is a method in which a polyimide film is treated with an alkali and then treated again with a metal salt that has a smaller ionization tendency than an alkali metal, but this method requires the use of heavy metals and Although it is effective for certain polyimide adhesives, it has drawbacks such as insufficient effectiveness for many other polyimide adhesives.
本発明に上記の如き従来技術の欠点を解消し、十分な接
着力を得ることのできるポリイミド成形品の接合済を提
供せんとするものである。It is an object of the present invention to overcome the drawbacks of the prior art as described above and to provide a bonded polyimide molded product that can obtain sufficient adhesive strength.
本発明のポリイミド既形品の接合済は、表面を塩基性化
付物を含むFJ液で処理した後、シランカップリング剤
で処堆し、ついで熱処理したポリイミド成形品の処理面
に熱溶融可能なポリイミドのシート状接着剤を重ね、そ
の上に任意の被着体を重ねてwi剤の軟化点以上のYM
度で加圧、加熱すること′t−%徴とする。The bonded polyimide molded product of the present invention can be thermally melted onto the treated surface of the polyimide molded product whose surface has been treated with FJ liquid containing a basic additive, treated with a silane coupling agent, and then heat treated. A sheet of polyimide adhesive is layered, and an arbitrary adherend is layered on top of the YM adhesive, which has a temperature higher than the softening point of the Wi agent.
Pressure and heat at 100%.
本発明方法において用いろrしるポリイミド成形品はフ
ィルムの他、フレキシブル印桐配線板、積層板等、ポリ
イミド樹脂が表面に露出しているものであnばよい。ま
たポリイミドとしては、ポリアミドイミド、ポリエーテ
ルイミド、ポリエステルイミド等、イミド構造上官むも
のであればよい。In addition to films, the polyimide molded product used in the method of the present invention may be one in which the polyimide resin is exposed on the surface, such as a flexible paulownia wiring board or a laminate. Further, the polyimide may be one having the same imide structure, such as polyamideimide, polyetherimide, polyesterimide, etc.
本発明方法に用いらγLる塩基性化付物としてに、水酸
化ナトリウム、水酸化カリウム、水酸化リチウム等のア
ルカリ金属水酸化物、および水酸化テトラメチルアンモ
ニウム、水酸化テトラエテルアンモニウム、水酸化テト
ラブチルアンモニウム等の四級アンそニウム水酸化物が
好ましく、特に好ましくは水酸化カリウム、水酸、化ナ
トリウムである。The basification adducts used in the method of the present invention include alkali metal hydroxides such as sodium hydroxide, potassium hydroxide, and lithium hydroxide, and tetramethylammonium hydroxide, tetraethelammonium hydroxide, and hydroxide. Quaternary anthonium hydroxides such as tetrabutylammonium are preferred, and potassium hydroxide, hydroxide, and sodium chloride are particularly preferred.
上記の塩基性化付物を溶解する溶媒としCに水、メタノ
ール、エタノール、プロパツール、イソプロパツール等
のアルコールおよび水とアルコールの混付溶媒が好まし
い。As the solvent for dissolving the above-mentioned basification adduct, C is preferably water, alcohol such as methanol, ethanol, propatool, isopropanol, or a mixed solvent of water and alcohol.
塩基性化付物を含む溶液中の塩基性化付物の濃度および
ポリイミド成形品を処理するm度、時間は望みの処理程
度によって決定され、特に限定はさγ(ないが、一般的
には111度にQ、1〜50重量%、温度に室温ないし
80℃、時間rc0゜1分ないし1時間である。この塩
基性化付物を含む浴液によるポリイミド成形品の表面処
理は、例えばポリイミド成形品を該l@液液中浸漬する
か、アプリケータ、ドクターナイフ等を用いて流延塗布
する等、公知の方法を用いnはよい。The concentration of the basifying additive in the solution containing the basifying additive, the degree of treatment, and the time for treating the polyimide molded article are determined by the desired degree of treatment, and there are no particular limitations on the degree of treatment (although there is no Q at 111 degrees, 1 to 50% by weight, temperature from room temperature to 80 degrees Celsius, and time rc from 0 degrees to 1 minute to 1 hour.Surface treatment of polyimide molded articles with a bath solution containing this basic additive is effective, for example. Any known method may be used, such as immersing the molded article in the liquid or casting the molded article using an applicator, doctor knife, or the like.
塩M性化付物を含む溶液で処理した後、シランカップリ
ング剤で処理する前に、塩酸、硫酸、酢酸等の酸溶液で
処理してもよい。After treatment with a solution containing a salt M-containing adduct, treatment with an acid solution such as hydrochloric acid, sulfuric acid, or acetic acid may be performed before treatment with a silane coupling agent.
本発明方法に用いろnるシランカップリング剤としては
、ビニルトリメトキシシラン等のビニル7ラン、r−グ
リシドキシブpビルトリメトキ7シラン等のエポキシシ
ラン、γ−メルカプドブaピルトリメトキシ7ラン等の
メルカプト7ラン、γ−アミノグロビルトリよりキシ7
ラン、N−7二二ルーγ−アミノプロピルトリメトキシ
シラン、N−β(アミノエテA−ンγ−アミノグaピル
トリメトキシ7ラン、N−β(アミノエテル)γ−アミ
ノプロピルメチルジメトキシシラン、γ−ウレイドグロ
ビルトリエトキシ7ラン、N−ベンジル−γ−アミンプ
ロピルトリメトキシシラン、アミノエテルアミノメテル
フェネテルトリメトキシシラン、p−アミノフェニルト
リメトキシシラン、トリメト牛シクリルプロピルジエテ
レントリアミン、1−トリメトキクシリA−2−(アミ
ノメチル)フェニルエタン等の1ミノシランが用いろγ
Lるが、中でもメルカプトシランおよびアミノシランが
好筐しく、T−メルカプトプロピルトリメトキシシラン
、γ−アミノプロピルトリエトキシシランが特に好まし
い。Examples of the silane coupling agent used in the method of the present invention include vinyl 7-lanes such as vinyltrimethoxysilane, epoxysilanes such as r-glycidoxibu p-virtrimethoxy 7-silane, and mercapto-7 silanes such as γ-mercapdobu-pyltrimethoxy 7-silane. Ran, γ-aminoglovirtri to xy7
Ran, N-722-γ-aminopropyltrimethoxysilane, N-β(aminoethane γ-aminogapyltrimethoxy7ran, N-β(aminoether)γ-aminopropylmethyldimethoxysilane, γ- Ureidoglobil triethoxy 7rane, N-benzyl-γ-aminepropyltrimethoxysilane, aminoethelaminometherphenethertrimethoxysilane, p-aminophenyltrimethoxysilane, trimethoxycyclylpropyldietherenetriamine, 1-trimethoxysilane A-1-minosilane such as 2-(aminomethyl)phenylethane should be used.
Among them, mercaptosilane and aminosilane are preferable, and T-mercaptopropyltrimethoxysilane and γ-aminopropyltriethoxysilane are particularly preferable.
シランカップリング剤による処理に、塩基性化付物を含
有する溶液による処理後行わn、処理方法としては、例
えばポリイミド成形品をシランカップリング剤溶液中に
′f9漬するか、アプリケータ、ドクターナイフ等を用
いて流延塗布する等、公知の方法を用いn&f、よい。The treatment with a silane coupling agent is carried out after treatment with a solution containing a basic additive.The treatment method includes, for example, immersing a polyimide molded article in a silane coupling agent solution, or using an applicator or a doctor. It is possible to use a known method such as casting using a knife or the like.
シランカップリング剤を溶解する溶媒とじてに、水、ア
ルコール、アセトン、酢酸エチル、トルエン等、シラン
カップリング剤ヲ溶解するものであnば何でもよいが、
水、アルコール、アセトンが中でも好ましい0
シランカップリング剤溶液中のシランカップリング剤の
濃度は、特に限定はさ九ないが、α01〜3031量%
が好it、<、(Ll 〜5][11%が特に好ましい
。α01Xit%未満の濃度でにシランカップリング剤
処理による効果が乏しく、また30重量%を超えても効
果か弱(なる。処理する温度、時間は特に制限にないが
、一般的には室温で15〜10分浸漬するか、上布後、
室温で[L5〜10分放置すれば十分である。The solvent for dissolving the silane coupling agent may be water, alcohol, acetone, ethyl acetate, toluene, etc., as long as it dissolves the silane coupling agent.
Among them, water, alcohol, and acetone are preferable. The concentration of the silane coupling agent in the silane coupling agent solution is not particularly limited, but α01 to 3031% by weight.
It is particularly preferable that it is <, (Ll ~ 5] [11%. The effect of the silane coupling agent treatment is poor at a concentration of less than α01Xit%, and the effect is weak even at a concentration exceeding 30% by weight. There are no particular restrictions on the temperature or time, but generally it is soaked at room temperature for 15 to 10 minutes, or after the cloth is soaked,
It is sufficient to leave it for 5 to 10 minutes at room temperature.
シランカップリング剤による処理後、熱処理を行うが、
熱処理の温度および時間はシランカップリング剤溶液の
溶媒を乾燥できる条件以上が必要であり、一般的にに8
0℃以上の温度で1へ60分間行うことが好ましい。時
に好ましくに150〜250℃の温度で5〜20分間行
う。After treatment with a silane coupling agent, heat treatment is performed.
The temperature and time of the heat treatment must be at least conditions that can dry the solvent of the silane coupling agent solution, and generally 8
It is preferable to carry out the reaction at a temperature of 0° C. or higher for 60 minutes. It is preferably carried out at a temperature of 150 to 250°C for 5 to 20 minutes.
次いで、上記のようにして処理したポリイミド成形品の
処理面に熱浴融可能なポリイミドのシート状接着剤と被
着体′jr、j@欠重ねて加圧加熱することによって強
固な接着が可能となる。Next, a polyimide sheet-like adhesive that can be melted in a heat bath is applied to the treated surface of the polyimide molded product treated as described above, and the adherend ′jr,j@ is heated under pressure to form a strong bond. becomes.
本発明において用いることのできる熱#j融町症なポリ
イミドのシート状接着剤としてニ榴脂単独のフィルムで
あってもよく、ガラス布やアラミド布等の基材にJa4
脂を宮浸させたものでもよい。ポリイミドとしてはポリ
アミトイミド、ポリエステルイミド、ポリエーテルイミ
ド等イミド構造を含むものであnばよ(、軟化点が40
0℃以下のものが好ましい。As a sheet-like adhesive of thermoplastic polyimide that can be used in the present invention, a film of chili resin alone may be used.
You can also use one that has been soaked in fat. Examples of polyimides include those containing an imide structure such as polyamideimide, polyesterimide, and polyetherimide (with a softening point of 40
Preferably, the temperature is 0°C or lower.
被着体と口てトポリイミド放形品、@箔、アルミ箔等の
金属箔、鋼板、鉄板、アルミ板、ステンレス板、421
0イ板等の金属板等、何であってもよい。Adherent and mouth polyimide extruded product, @ foil, metal foil such as aluminum foil, steel plate, iron plate, aluminum plate, stainless steel plate, 421
It may be anything, such as a metal plate such as a 0i plate.
接着条件に用いるシート状接着剤の物性に応じて異なる
が、一般的には、温度は接着剤の軟化点以上、好!しく
に接着剤の軟化点以上熱分解開始温度未満であり、圧力
にl 1 kg/−〜100kg/aII+である。こ
の接着方法rc特に限定はさnないが、例えば、接着剤
層に任意の被着体を重ね、ロールラミネート、プレスあ
るいにオートクレーブ中で加熱、加圧することにより行
うことができる。Adhesion conditions vary depending on the physical properties of the sheet adhesive used, but in general, the temperature should be above the softening point of the adhesive. Specifically, it is above the softening point of the adhesive and below the thermal decomposition start temperature, and the pressure is l 1 kg/- to 100 kg/aII+. This bonding method rc is not particularly limited, but can be carried out, for example, by stacking an arbitrary adherend on the adhesive layer and heating and pressurizing it in a roll lamination, press, or autoclave.
以下に実施例を示して本発明を更に詳細に説明するが、
本発明の範囲はこnら例によって何ら限定さnるもので
はない1、
実施例1
カプトン200H(デュポン社製、50 amポリイミ
ドフィルム)を水酸化カリウム30%水溶液に室温で1
0分間浸fj!を後、水洗し1こ。つぎにγ−アミツブ
aビ3トリエトキ772ン1%アセトン溶液に室温で3
0秒間浸漬し1こ後、200℃で10分間乾燥した。The present invention will be explained in more detail with reference to Examples below.
The scope of the present invention is not limited in any way by these examples.1 Example 1 Kapton 200H (manufactured by DuPont, 50 am polyimide film) was added to a 30% potassium hydroxide aqueous solution at room temperature for 1 hour.
Soak for 0 minutes fj! After that, wash it with water. Next, add γ-amitube abitriethoxy772 to a 1% acetone solution at room temperature.
After immersion for 0 seconds, it was dried at 200° C. for 10 minutes.
一方、3. 3’、 4. 4’ −ベンゾ2エノンテ
トラカルボン酸二無水物64.4g、m)ルイレンジア
ミン12.2g、 ビス(4−(3−1ミノフエノキ
7)フェニル〕スルホン4i2gtN−メチルピロリド
ン480 gK溶解し、180℃で6時間加熱した後、
N、N’ −ジ2ヱニルメタンビスマレイミド11.
3g’Th浴解し、ポリイミド成形品を得た。ワニス中
のポリイミドの濃度は20fi童%であった。得らnた
ワニスをガラス板上に流延し、80℃10分乾燥したの
ちガラス板より剥離し、鉄枠にとめて200℃1時間乾
燥してポリイミド接着ンイ/L−A を得た。前述の表
面処理したカプトンの処理面上にポリイミド接着フィル
ムと35μm片面租化銅it−順次重ねて275℃、5
0kg/atテ30分間プレスして鋼張基板を得た。こ
の@張基板のカプトンとポリイミド接着剤間の90°引
き剥がし強さは0.83 kg/amであった。On the other hand, 3. 3', 4. 64.4 g of 4'-benzo2enonetetracarboxylic dianhydride, 12.2 g of m) lylene diamine, 480 g of bis(4-(3-1minophenoki7)phenyl)sulfone 4i2gtN-methylpyrrolidone dissolved at 180°C After heating for 6 hours,
N,N'-di2enylmethane bismaleimide 11.
A polyimide molded article was obtained by dissolution in a 3 g'Th bath. The concentration of polyimide in the varnish was 20%. The obtained varnish was cast onto a glass plate, dried at 80°C for 10 minutes, peeled off from the glass plate, fixed on an iron frame, and dried at 200°C for 1 hour to obtain a polyimide adhesive tape/LA. A polyimide adhesive film and 35 μm single-sided granulated copper were sequentially layered on the surface of the Kapton surface treated above and heated at 275°C for 5 minutes.
A steel-clad substrate was obtained by pressing at 0 kg/at for 30 minutes. The 90° peel strength between Kapton and the polyimide adhesive of this @-clad board was 0.83 kg/am.
比較例1
γ−アミノプロビルトリエトキ7シランt?/flいな
い以外は実施例1と同様にして鋼張基板を得た。この銅
張基板のカプトンとポリイミド接着剤間の90°引き剥
がし強さは104kg/cmと非常に弱いものでめった
。Comparative Example 1 γ-aminopropyltriethoxy7silane t? A steel-clad substrate was obtained in the same manner as in Example 1 except that /fl was not used. The 90° peel strength between the Kapton adhesive and the polyimide adhesive of this copper-clad board was 104 kg/cm, which was very weak.
比較例2
何も処理しないカプトンを用いた他は実施例1と同様に
して@張基板を得た。この鋼張基板のカプトンとポリイ
ミド接着剤間の90°引き剥がし強さは0.05に呂/
amと非常に弱いものであった。Comparative Example 2 An @-clad substrate was obtained in the same manner as in Example 1, except that untreated Kapton was used. The 90° peel strength between Kapton and polyimide adhesive of this steel-clad substrate is 0.05/
am, which was very weak.
実施例2
カプトン200Ht−水酸化ナトリウム30%水浴液に
室温で30分間浸漬後、水洗した。つぎにγ−メルカプ
ドブaピルトリメトキシシラン1%アセトン溶液に30
秒間浸漬後、250℃で10分間乾燥した。この表面処
理したカプトンの間にポリイミド接着フィルムをはさん
で実施例1と四様にして積層品を得た。この積層品のカ
プトンのポリイミド接着剤間の90°引き剥がし強さは
0.80kg/cmであった。Example 2 After immersing in Kapton 200Ht-30% sodium hydroxide water bath solution at room temperature for 30 minutes, it was washed with water. Next, add 30% of γ-mercapdobutyltrimethoxysilane to a 1% acetone solution.
After being immersed for a second, it was dried at 250°C for 10 minutes. A polyimide adhesive film was sandwiched between the surface-treated Kapton layers, and a laminate was obtained in the same manner as in Example 1. The 90° peel strength between the Kapton polyimide adhesives of this laminate was 0.80 kg/cm.
実施例3
γ−1ミノプロピルトリエトキシ7ランのかわりにγ−
メルカプトグロビルトリメトキシシラン5%アセトン溶
液を用いる以外は実施例1と同様にして鋼張基板を得た
。こり銅張基板のカプトンとポリイミド接着フィルム間
の90゜引きはがし強さはcL94kg/cmであった
。Example 3 γ-1 instead of γ-1minopropyltriethoxy7rane
A steel-clad substrate was obtained in the same manner as in Example 1 except that a 5% acetone solution of mercaptoglobiltrimethoxysilane was used. The 90° peel strength between the Kapton and polyimide adhesive film of the stiff copper-clad substrate was cL94 kg/cm.
比較例3
水酸化カリウム溶液に浸漬しないこと以外は実施例2と
同様にして積層品を得た。この積層品のカプトンとポリ
イミド接着フィルム間の900引きはがし強さは(10
4kg7cmと非常に弱いものであった。Comparative Example 3 A laminate was obtained in the same manner as in Example 2 except that it was not immersed in the potassium hydroxide solution. The 900 peel strength between the Kapton and polyimide adhesive films of this laminate is (10
It was very weak at 4 kg and 7 cm.
実施例4
カプトン200 H’i水酸化ナトリウム10%水溶液
に40℃で20分間浸漬後、水洗し1こ。Example 4 Kapton 200 H'i was immersed in a 10% aqueous solution of sodium hydroxide at 40°C for 20 minutes, then washed with water once.
つぎにγ−アミツブΩピルトリエトキン7ラン1%アセ
トン溶液に室温で1分浸漬した後200℃で10分乾燥
した。この表面処理したカプトンと35μm片面粗化銅
箔の間にポリイミドプリプレグl−67又はl−68(
日又化成工業■商品名)′t−はさみそnぞn170℃
60■/aIF1.5時間、200℃40kg/aIi
12時間の条件でプレスして積層品を得た。この積層品
のカプトンとプリプレグ間の90°引きはがし強さはそ
n−f:n 0.98 kg/cm、 0.65 kg
/co+でlyッだ。Next, it was immersed in a 1% acetone solution of γ-amitube Ω piltrietquine 7 run at room temperature for 1 minute, and then dried at 200° C. for 10 minutes. Polyimide prepreg l-67 or l-68 (
Himata Kasei Kogyo ■Product name)'t-Hasamiso nzon170℃
60■/aIF1.5 hours, 200℃40kg/aIi
A laminate was obtained by pressing under conditions of 12 hours. The 90° peeling strength between Kapton and prepreg of this laminate is: n-f:n 0.98 kg/cm, 0.65 kg
/co+ is ly.
実施例5
当モルの3. 3’、4. 4’ −ベンゾフェノンテ
トラカルボン酸二無水物と3,3′−ジアミノジフェニ
ルケトンを用いて作成したポリイミド接着フィルムを用
いて350℃、30kg/a+f、20分の条件でプレ
スする以外は実施例1と同様にして積層品を得た。この
積層品のカプトこと接着フィルム間の90°引きはがし
強さはα75kg/Cf1lであった。Example 5 3. 3', 4. Example 1 except that a polyimide adhesive film prepared using 4'-benzophenone tetracarboxylic dianhydride and 3,3'-diaminodiphenyl ketone was pressed at 350°C, 30 kg/a+f, and 20 minutes. A laminate was obtained in the same manner. The 90° peel strength between the adhesive films of this laminate was α75 kg/Cf1l.
以上詳細に述べた如(、本発明の接合深によrLば強固
な接着力を有するポリイミド成形品の積層品を得ること
ができ、その1東的1iTo埴は大である。As described in detail above, it is possible to obtain a laminated product of polyimide molded products having a strong adhesive strength depending on the bonding depth of the present invention, and its characteristic value is large.
X 。X.
゛\−ヱ゛\-ヱ
Claims (1)
ンカップリング剤で処理し、ついで熱処理したポリイミ
ド成形品の処理面に熱溶融可能なポリイミドのシート状
接着剤を重ね、その上に任意の被着体を重ねて接着剤の
軟化点以上の温度で加圧、加熱することを特徴とするポ
リイミド成形品の接着法。1. After the surface is treated with a solution containing a basic compound, it is treated with a silane coupling agent, and then a heat-meltable polyimide sheet adhesive is layered on the treated surface of the heat-treated polyimide molded product, and an optional adhesive is applied on top of the treated surface of the polyimide molded product. A method for bonding polyimide molded products, which involves stacking adherends and applying pressure and heating at a temperature above the softening point of the adhesive.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27259286A JPS63125532A (en) | 1986-11-14 | 1986-11-14 | Bonding of polyimide molding |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27259286A JPS63125532A (en) | 1986-11-14 | 1986-11-14 | Bonding of polyimide molding |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63125532A true JPS63125532A (en) | 1988-05-28 |
JPH0412897B2 JPH0412897B2 (en) | 1992-03-06 |
Family
ID=17516064
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP27259286A Granted JPS63125532A (en) | 1986-11-14 | 1986-11-14 | Bonding of polyimide molding |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63125532A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0924761A1 (en) * | 1997-12-22 | 1999-06-23 | Nitto Denko Corporation | Heat-conductive and pressure-sensitive adhesive sheets and method for fixing electronic parts to heat-radiating members with the use of the same |
KR100639648B1 (en) * | 2005-11-09 | 2006-11-01 | 삼성전기주식회사 | Method for modifying polymer materials |
WO2008004520A1 (en) * | 2006-07-04 | 2008-01-10 | Nippon Steel Chemical Co., Ltd. | Method of modifying surface of polyimide resin layer and process for producing metal-clad laminate |
WO2017188174A1 (en) * | 2016-04-28 | 2017-11-02 | 東洋紡株式会社 | Polyimide film layered body |
-
1986
- 1986-11-14 JP JP27259286A patent/JPS63125532A/en active Granted
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0924761A1 (en) * | 1997-12-22 | 1999-06-23 | Nitto Denko Corporation | Heat-conductive and pressure-sensitive adhesive sheets and method for fixing electronic parts to heat-radiating members with the use of the same |
KR100639648B1 (en) * | 2005-11-09 | 2006-11-01 | 삼성전기주식회사 | Method for modifying polymer materials |
WO2008004520A1 (en) * | 2006-07-04 | 2008-01-10 | Nippon Steel Chemical Co., Ltd. | Method of modifying surface of polyimide resin layer and process for producing metal-clad laminate |
JPWO2008004520A1 (en) * | 2006-07-04 | 2009-12-03 | 新日鐵化学株式会社 | Method for modifying surface of polyimide resin layer and method for producing metal-clad laminate |
JP5215182B2 (en) * | 2006-07-04 | 2013-06-19 | 新日鉄住金化学株式会社 | Method for modifying surface of polyimide resin layer and method for producing metal-clad laminate |
WO2017188174A1 (en) * | 2016-04-28 | 2017-11-02 | 東洋紡株式会社 | Polyimide film layered body |
JPWO2017188174A1 (en) * | 2016-04-28 | 2018-12-20 | 東洋紡株式会社 | Polyimide film laminate |
Also Published As
Publication number | Publication date |
---|---|
JPH0412897B2 (en) | 1992-03-06 |
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