JPH0779123B2 - Wafer carrier - Google Patents
Wafer carrierInfo
- Publication number
- JPH0779123B2 JPH0779123B2 JP3382086A JP3382086A JPH0779123B2 JP H0779123 B2 JPH0779123 B2 JP H0779123B2 JP 3382086 A JP3382086 A JP 3382086A JP 3382086 A JP3382086 A JP 3382086A JP H0779123 B2 JPH0779123 B2 JP H0779123B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- carrier
- side wall
- wafers
- wafer carrier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Packaging Frangible Articles (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は半導体工業で取扱うシリコン等からなるウェハ
ーの加工、貯蔵、運搬の際に使用するウェハーキャリャ
ーに関する。TECHNICAL FIELD The present invention relates to a wafer carrier used for processing, storing and transporting a wafer made of silicon or the like handled in the semiconductor industry.
半導体工業で取扱うシリコン等からなるウェハーは高価
であり、しかももろく、また直径10cm以上、厚み0.2mm
以下のものが普通であるため、ウェハーの加工、貯蔵、
運搬に使用されるキャリャーにはウェハーの保持、ウェ
ハー相互の隔離、または薬液浸漬後、キャリャー側壁を
通してすみやかにウェハー表面を流通する構造であるべ
きである。Wafers made of silicon, etc. handled in the semiconductor industry are expensive, fragile, and have a diameter of 10 cm or more and a thickness of 0.2 mm.
Since the following are common, wafer processing, storage,
The carrier used for transportation should have a structure that allows the wafer surface to be quickly passed through the side wall of the carrier after holding the wafers, separating the wafers from each other, or dipping in a chemical solution.
然るに、従来のキャリャー形状では薬液浸漬後、ウェハ
ー表面の流れ、特に流通性が悪いため、しばしばキャリ
ャー内部で薬液の滞留がおこり、ウェハー処理工程の作
業を困難にする等の問題があった。However, in the conventional carrier shape, since the flow of the wafer surface, especially the flowability after the immersion of the chemical solution, is poor, the chemical solution often stays inside the carrier, which makes the work of the wafer processing step difficult.
本発明はウェハーの加工、貯蔵、運搬の際に使用するウ
ェハーキャリャーにおいて、薬液浸漬後、薬液がウェハ
ー表面にすみやかに流通する構造を有するウェハーキャ
リャーに関する。The present invention relates to a wafer carrier used for processing, storing, and transporting wafers, which has a structure in which the chemical solution is quickly distributed on the wafer surface after being immersed in the chemical solution.
本発明者らは前記の問題点を解決するため各種検討した
結果、キャリャーの形状として、各ウエハーの主面が垂
直面となり、かつ、平行となるようにウエハーを装着
し、該ウエハーを両側方より支持するための向きあった
側壁(および)と、ウエハーを挿入および取出すた
めの開放頂部面(A)、並びに両側壁(および)の
端部()の各前端間及び同後端間を連結する結合部
(、および)よりなるウエハーキヤリヤーであっ
て、該側壁(および)は、 (1).各ウエハーを相互に隔離するリブ()、 (2).各リブ()を相互に固定するフランジ(お
よび)、 (3).ウエハーがキヤリヤー外に突出する事を防ぐ保
持部(および)及び (4).開放頂部の面(A)を上方に向けた際にウエハ
ーを下方から支持するための取はずし可能な支持部
()よりなり、 (5).ウエハーキヤリヤーの側壁(および)の面
のフランジ(及び)及び端部()を除くウエハー
収納部分における開放部分が、該ウエハー収納部分全面
積の15%以上であり、100%に到らないことを特徴とす
るウエハーキヤリヤーにより本発明を完成するに至っ
た。As a result of various studies to solve the above-mentioned problems, the present inventors mounted the wafers such that the main surfaces of the respective wafers were vertical and parallel to each other as the shape of the carrier, and the wafers were mounted on both sides. Connection between side walls (and) facing each other for better support, an open top surface (A) for inserting and removing a wafer, and front and rear ends of both side walls (and) ends (). A wafer carrier comprising: (1). Ribs () for isolating each wafer from each other, (2). Flange (and) for fixing each rib () to each other, (3). Holding parts (and) and (4) to prevent the wafer from protruding outside the carrier. (5) consists of a detachable support part () for supporting the wafer from below when the surface (A) of the open top is directed upward. The open part of the wafer storage part excluding the flange (and) and the end part () of the side wall (and) of the wafer carrier is 15% or more of the total area of the wafer storage part and does not reach 100%. The present invention has been completed by a wafer carrier characterized by:
本発明によるキャリャーは軸線方向に整合したウェハー
をその間に支持するための向きあった側壁と、ウェハー
を挿入、および取出すための開放頂部および側壁間を連
結する結合部よりなり、 第1図は本発明のウェハーキャリャーの開放頂部からの
上面図、第2図は結合部側からの正面図、第3図は側壁
側からの側面図で、一部側壁の内側を示したものであ
り、対抗する平行な側壁、、側壁を結ぎ合わせる結
合部、、からなり、側壁はウェハーを相互に隔離
するリブ、リブを相互に固定するフランジ、、ウ
ェハーがキャリャーの外部に突出することを防ぐ保持部
、ウェハーを支持するための支持部、および端部
よりなり、さらに該支持部はビス等により固定されて
おり、使用条件によって取りはずし可能である。A carrier according to the present invention comprises side walls facing each other for supporting an axially aligned wafer therebetween, an open top for inserting and removing the wafer, and a coupling part connecting the side walls. A top view from the open top of the wafer carrier of the invention, FIG. 2 is a front view from the side of the coupling part, and FIG. 3 is a side view from the side wall side, showing the inside of part of the side wall. Parallel side walls, and a connecting part that connects the side walls together. The side walls are ribs for separating the wafers from each other, a flange for fixing the ribs to each other, and a holding portion for preventing the wafers from protruding to the outside of the carrier. , A supporting portion for supporting the wafer, and an end portion. Further, the supporting portion is fixed by screws or the like, and can be removed depending on use conditions.
第4図は側壁の側面図であり、ウェハー収納部分の面積
S1は第4図において長破線で示した四辺形内部、すなわ
ち側壁端部の内面及びフランジ及びの内面で囲ま
れた面積を示し、ウエハー装着のためのスリット形状を
なす開放部分の面積S2はリブの総数が占める面積、保
持部、さらに支持部が占める面積の総和を除いた
面積であり、S2/S1が0.15以上即ち15%以上になるよう
にし、100%に到らないようにしたものである。すなわ
ち、ウエハーキヤリヤーの側壁、の面のフランジ
(及び)及び端部()を除くウエハー収納部分に
おける開放部分が、該ウエハー収納部分全面積の15%以
上であるようにしたものであり、より簡単にはウエハー
収納部分の側壁部の開口率が15%以上になるようにした
ものである。S2/S1が0.15以下では薬液の流通がわる
く、薬液の滞留等の問題が生じ好ましくない。FIG. 4 is a side view of the side wall, showing the area of the wafer storage portion.
S 1 indicates the inside of the quadrangle shown by the long dashed line in FIG. 4, that is, the area surrounded by the inner surface of the side wall end and the inner surface of the flange, and the area S 2 of the open portion having the slit shape for wafer mounting. area, holding portion occupied by the total number of ribs is the area excluding the sum of the area occupied by the further supporting part, as S 2 / S 1 is 0.15 or more words 15% or more, so as not to lead to 100% It is the one. That is, the open portion of the wafer storage portion excluding the flange (and) and the end portion () of the side surface of the wafer carrier is 15% or more of the entire area of the wafer storage portion, and Simply, the opening ratio of the side wall of the wafer storage part is set to 15% or more. When S 2 / S 1 is 0.15 or less, the flow of the chemical liquid is poor, and problems such as retention of the chemical liquid occur, which is not preferable.
また保持部、支持部の位置及び数はキャリャーに収納す
るウェハーの径、厚み、種類等により決められるが、S2
/S1が0.15以上になる条件内で適宜決めることが可能で
ある。The holder, location and number of the supporting portion diameter of the wafer to be stored in Kyarya, thickness, but is determined by the type and the like, S 2
It can be appropriately determined within the condition that / S 1 becomes 0.15 or more.
さらに、本発明で云うウェハーキャリャーは、それ自体
の運搬、移送等の目的で、結合部、、を有する面
等に、ハンドル、把手などをとりつける事も可能であ
る。Further, in the wafer carrier referred to in the present invention, a handle, a handle and the like can be attached to the surface having the coupling portion, for the purpose of transporting and transferring the wafer carrier.
本発明によるウェハーキャリャーには従来公知の材料、
例えばポリプロピレン等の汎用樹脂、又はテトラフルオ
ロエチレン等のフッ素樹脂、アルミニウムにフッ素樹脂
を被覆した材料、さにはガラス転移温度140℃以上の樹
脂、例えばポリエーテルエーテルケトン、液晶性芳香族
ポリエステルも好適である。以下に、本発明のウエハキ
ヤリヤーの薬液洗浄後の薬液の流通性を示す実施態様の
例を示す。Conventionally known materials for the wafer carrier according to the present invention,
For example, a general-purpose resin such as polypropylene, a fluororesin such as tetrafluoroethylene, a material obtained by coating aluminum with a fluororesin, or a resin having a glass transition temperature of 140 ° C. or higher, such as polyether ether ketone or liquid crystalline aromatic polyester is also suitable. Is. The following is an example of an embodiment showing the flowability of the chemical liquid after the chemical cleaning of the wafer carrier of the present invention.
実施態様例 本発明におけるウエハーキヤリヤーの側壁、の面の
ウエハー収納部分における開放部分が、該ウエハー収納
部分全面積、すなわち、ウエハー収納部分の側壁部の開
口率が、それぞれ10%、15%、20%及び30%で、かつ5
インチサイズのウエハキヤリヤーをI.C.I(株)社製PEE
Kを材料にして製作した。各キヤリヤーの水切り特性を
評価するために、室温下、2分の水中浸漬から取り出し
た該キヤリヤーへの付着水量の経時変化を測定した、付
着水量は水滴を抱えたキヤリヤー重量から水中浸漬前の
キヤリヤー重量を引くことにより求めた。また、各キヤ
リヤーは何れも鉄製の平衡平板上に静置した状態に保
ち、水滴の落下は自然にまかせた。結果を第5図に示
す。Embodiment Example The side wall of the wafer carrier in the present invention, the open portion of the wafer storage portion of the surface of the wafer storage portion, the entire area of the wafer storage portion, that is, the opening ratio of the side wall portion of the wafer storage portion, respectively 10%, 15%, 20% and 30%, and 5
Inch-sized wafer carrier made by ICI PEE
It was made from K. In order to evaluate the draining characteristics of each carrier, the time-dependent change in the amount of water adhering to the carrier taken out from the water soaked for 2 minutes at room temperature was measured. The amount of water adhering was determined from the weight of the carrier having water droplets It was calculated by subtracting the weight. In addition, each carrier was kept in a state of standing on an iron balance plate, and the drop of water was allowed to fall naturally. Results are shown in FIG.
この図から明らかなように、開口率が小さいと、水切り
性が悪く、洗浄工程にてウエハーに付着したままの洗浄
液の量が顕著に多くなることは明白であり、次の工程に
与える影響も無視できない。As is clear from this figure, if the aperture ratio is small, it is clear that the drainage property is poor, and the amount of the cleaning liquid remaining on the wafer in the cleaning process is significantly increased, and it has an effect on the next process. I can't ignore it.
第1図は本発明のウェハーキャリャーの開放頂部からの
上面図、第2図は結合部側からの正面図、第3図は側壁
側からの側面図で、一部側壁の内側を示すものである。
第4図は側壁の側面図である。第5図は本発明のウエハ
ーキヤリヤーの一般的な実施態様として、ウエハー及び
ウエハーキヤリヤーを、洗浄用としての薬液(本実施態
様では水を使用した。)に浸漬後、洗浄液の流通性を試
験した結果を示すもので、洗浄液浸漬後の経過時間と付
着水量を示す図である。 尚、図中の番号はそれぞれ次の部位を示す。 、……側壁 、、……結合部 ……リブ 、……フランジ 、……保持部 ……支持部 ……端部 ……長破線で示した四辺形内のウェハー収納部分 ……ウエハー装着のためのスリット部 A面……ウエハーキヤリヤーの開放頂部の面 a−・−a′……軸線方向FIG. 1 is a top view from the open top of the wafer carrier of the present invention, FIG. 2 is a front view from the side of the coupling portion, and FIG. 3 is a side view from the side wall side, showing the inside of part of the side wall. Is.
FIG. 4 is a side view of the side wall. FIG. 5 shows, as a general embodiment of the wafer carrier of the present invention, the flowability of the cleaning liquid after immersing the wafer and the wafer carrier in a chemical liquid for cleaning (water is used in this embodiment). It is a figure which shows the test result and shows the elapsed time after immersion in a cleaning liquid and the amount of attached water. The numbers in the figure indicate the following parts, respectively.・ ・ ・ Side wall ・ ・ ・ Joining part ・ ・ ・ Rib ・ ・ ・ Flange ・ ・ ・ Holding part ・ ・ ・ Supporting part ・ ・ ・ End part ・ ・ ・ Wafer storage part in the quadrangle indicated by the long dashed line ・ ・ ・ For mounting the wafer Slit part of A surface ...... Wafer carrier open top surface a- ・ -a '…… Axial direction
Claims (1)
平行となるようにウエハーを装着し、該ウエハーを両側
方より支持するための向きあった側壁(および)
と、ウエハーを挿入および取出すための開放頂部面
(A)、並びに両側壁(および)の端部()の各
前端間及び同後端間を連結する結合部(、および
)よりなるウエハーキヤリヤーであって、該側壁(
および)は、 (1).各ウエハーを相互に隔離するリブ()、 (2).各リブ()を相互に固定するフランジ(お
よび)、 (3).ウエハーがキヤリヤー外に突出する事を防ぐ保
持部(および)及び (4).開放頂部の面(A)を上方に向けた際にウエハ
ーを下方から支持するための取はずし可能な支持部
()よりなり、 (5).ウエハーキヤリヤーの側壁(および)の面
のフランジ(及び)及び端部()を除くウエハー
収納部分における開放部分が、該ウエハー収納部分全面
積の15%以上であり、100%に到らない ことを特徴とするウエハーキヤリヤー。1. The main surface of each wafer is a vertical surface, and
Side walls (and) facing each other for mounting the wafers in parallel and supporting the wafers from both sides.
And a wafer carrier including an open top surface (A) for inserting and removing a wafer, and a connecting portion (and) connecting between front ends and rear ends of both end portions () of both side walls (and). And the side wall (
And) are (1). Ribs () for isolating each wafer from each other, (2). Flange (and) for fixing each rib () to each other, (3). Holding parts (and) and (4) to prevent the wafer from protruding outside the carrier. (5) consists of a detachable support part () for supporting the wafer from below when the surface (A) of the open top is directed upward. The open part of the wafer storage part excluding the flange (and) and the end part () on the side wall (and) of the wafer carrier shall be 15% or more of the total area of the wafer storage part and not 100%. Wafer carrier.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3382086A JPH0779123B2 (en) | 1986-02-20 | 1986-02-20 | Wafer carrier |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3382086A JPH0779123B2 (en) | 1986-02-20 | 1986-02-20 | Wafer carrier |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62295429A JPS62295429A (en) | 1987-12-22 |
JPH0779123B2 true JPH0779123B2 (en) | 1995-08-23 |
Family
ID=12397120
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3382086A Expired - Fee Related JPH0779123B2 (en) | 1986-02-20 | 1986-02-20 | Wafer carrier |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0779123B2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR19990070641A (en) * | 1998-02-23 | 1999-09-15 | 윤종용 | Wafer guides for wet cleaning equipment with improved retention of slot supports |
WO2009107254A1 (en) * | 2008-02-27 | 2009-09-03 | ミライアル株式会社 | Wafer storage container with back supporting structure |
-
1986
- 1986-02-20 JP JP3382086A patent/JPH0779123B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPS62295429A (en) | 1987-12-22 |
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