JPH03129824A - Holder - Google Patents

Abstract

PURPOSE:To manufacture a holder having no unfavorable effect in the cleaning and etching processes at all by a method wherein any residual drips of chemical solution such as cleaning solution, etchant etc., are prevented from stagnating on the upper surface parts of holding bodies constituting the holder. CONSTITUTION:First and second holding bodies 1, 2 made of Teflon, etc., are provided in opposite positions at a specific interval while a mask 4 for exposure as an element to be held is inserted downward into the gap between the first and second holding bodies 1, 2 constituting a holder so that the mask 4 may be held on lower parts and both side parts by multiple holding bars 3. In such a state the holder is immersed in a cleaning solution vessel to clean up the mask 4 for exposure and after finishing the cleaning process, the holder is to be picked up from the cleaning solution vessel. At this time, any residual drips of the cleaning solution are not to be left on the holder since the upper surface parts of the holding bodies 1, 2 are formed in non-planar shape. Through these procedures, even if the holder is immersed in a rinsing solution vessel in the following process, any conventional unfavorable effect will not be produced on the holder.

Description

[Detailed Description of the Invention] [Summary] This invention relates to a holder for holding objects such as masks and wafers in the manufacturing process of semiconductor devices.

Make sure that chemical solutions such as cleaning solution and etching solution do not accumulate on the top surface of the holder that makes up the holder.

The purpose is to prevent any negative effects from occurring during the cleaning and etching processes.

, is composed of a plurality of holding bodies constituting a frame and a plurality of support members supporting objects to be held, and is used to hold objects such as masks and wafers in the manufacturing process of semiconductor devices. The upper surface of the holder is configured to be non-planar.

[Industrial application field]

The present invention relates to a holder, and particularly to a holder for holding objects such as masks and wafers in the manufacturing process of semiconductor devices.

[Conventional technology]

FIG. 3 is a diagram showing a conventional example.

This conventional example is used in a mask cleaning process. A holder that holds one mask.

In FIG. 3, 11 is a first holder, 12 is a second holder, 13 is a support rod, and 14 is an object to be held.

15 is the upper surface portion.

In the holder of this conventional example, a first holder 11 and a second holder 12 made of Teflon or the like are provided at positions facing each other with a predetermined interval, and are made of Teflon or stainless steel. It has a structure in which it is fixed with a plurality of support rods 13 for supporting.

The exposure mask 14 as an object to be held is inserted from above the holder into the gap between the first holder 11 and the second holder 12 constituting the holder, and is supported by a plurality of support rods 13 at the lower and both side surfaces. is supported.

In this state, immerse the holder in the cleaning liquid tank.

The exposure mask 14 is cleaned. After the cleaning is completed, the holder is pulled up from the cleaning liquid tank and immersed in the rinsing liquid tank to rinse the exposure mask I4.

In this manner, the exposure mask undergoes processes such as cleaning while being held by the holder as the object to be held 14.

[Problem to be solved by the invention]

As can be seen from FIG. 3, the conventional holder has a holding body ml
, 12 had a flat upper surface portion 15. For this reason, there is a problem in that when the holder is pulled up from the cleaning liquid tank after cleaning, the cleaning liquid remains in the form of droplets on the upper surface portion 15 of the holder 11.12 that constitutes the holder.

If cleaning liquid droplets remain on the upper surface 15 of the holder 11, 12, the following adverse effects occur.

■Since the cleaning liquid is carried into the rinsing tank, the quality of the rinsing liquid changes and its effectiveness decreases.

■When the remaining cleaning droplets dry, they become fine powder.

Adheres to the mask.

■Residual cleaning droplets drip onto the surface of the mask and cause stains.

The present invention solves these problems and prevents chemical solutions such as cleaning liquid and etching liquid from accumulating on the upper surface of the holder constituting the holder, thereby preventing any adverse effects from occurring in the cleaning process or etching process. It is an object of the present invention to provide a holder for holding objects such as masks and wafers in the manufacturing process of semiconductor devices.

[Means to solve the problem]

In order to achieve the above object, a holder according to the present invention, particularly a holder for holding objects to be held such as masks and wafers in the manufacturing process of semiconductor devices, comprises a plurality of holders constituting a frame and objects to be held. In a holder for holding objects such as masks and wafers in the manufacturing process of semiconductor devices, the holder is composed of a plurality of supporting members that support objects.
The upper surface of each holder is configured to be non-planar.

[For production]

In the holder according to the present invention, the upper surface of each holder constituting the frame is formed into a non-planar shape, so that when the holder is holding an object to be held such as an exposure mask or a wafer, the holder can be placed in a cleaning liquid tank or When the holder is immersed in an etching liquid tank and then pulled out, droplets of cleaning liquid, etching liquid, etc. do not remain on the upper surface of the holder.

Therefore, if one uses the holder according to the present invention.

In the cleaning process and the etching process, there are no negative effects like in the conventional method.

(Example〕 FIG. 1 is a diagram showing an embodiment of the present invention.

In this example, two of the present inventions are used in a mask cleaning process. This is an example in which the present invention is applied to a holder that holds one mask.

In FIG. 1, 1 is a first holder, 2 is a second holder, 3 is a support rod, 4 is an object to be held, and 5 is an upper surface.

In the holder of this embodiment, a first holder 1 and a second holder 2 made of Teflon or the like are provided at positions facing each other with a predetermined interval, and the holder 1 is made of Teflon or stainless steel. multiple support rods 3 for supporting
It has a fixed structure.

The exposure mask 4 as an object to be held is inserted from above the holder into the gap between the first holder 1 and the second holder 2 that constitute the holder, and is supported by a plurality of support rods 3 at the lower and both side surfaces. is supported.

In this state, the holder is immersed in a cleaning liquid tank to clean the exposure mask 4. After cleaning, pull the holder out of the cleaning liquid tank. In this case, the holder of the present invention includes a holding body 1.
Since the upper surface portion 5 of 2 is formed in a non-planar shape, droplets of cleaning liquid will not remain. Therefore, even if the holder is immersed in a rinsing liquid bath in the subsequent rinsing process, there will be no adverse effects as in the conventional case.

In the above description, the upper surface portions 5 of the holders 1 and 2 are formed in a non-planar shape. FIG. 2 shows an example of the cross-sectional shape of the upper surface of the holder 1.degree.2.

The same figure (a) is formed into a single curved surface as in Fig. 1;
In the same figure (b), one side is sloped.

In the figure (c), both sides are sloped.

Moreover, what is shown in FIG. 2 is an example, and various other modifications can be considered in implementing the present invention.

Although the above nine examples have been shown in which the present invention is applied to a holder for a cleaning process of an exposure mask, the present invention is not limited to this. It can be applied to holders etc.

In addition, the shape of the holder is not limited to the one shown in Figure 1, but it is also possible to increase the number of holders to hold multiple objects, or to make the holder into a packet shape by integral molding. It can be applied to a structure in which a plurality of partition walls are provided at the bottom so that a plurality of objects to be held can be held.

〔Effect of the invention〕

According to the present invention, in the cleaning process and etching process,
When the holder is immersed in a cleaning liquid tank or an etching liquid tank and then pulled up, droplets of cleaning liquid or etching liquid will not remain on the upper surface of the holder that makes up the holder.
There are no negative effects, which were two problems in the past.

[Brief explanation of the drawing]

FIG. 1 is a diagram showing an embodiment of the present invention. FIG. 2 is a diagram showing an example of the cross-sectional shape of the upper surface of the holder. Figure 3 is a diagram showing a conventional example. It is. In Figure 1 l: first holder 2: Second holding body 3: Support rod 4: Object to be held 5: Upper surface

Claims (1)

[Scope of Claims] Comprised of a plurality of holding bodies constituting a frame and a plurality of support members supporting objects to be held, for holding objects such as masks and wafers in the manufacturing process of semiconductor devices. 1. A holder characterized in that the upper surface of each holder is formed into a non-planar shape.