JPH0778860A - Substrate transfer device - Google Patents
Substrate transfer deviceInfo
- Publication number
- JPH0778860A JPH0778860A JP5245915A JP24591593A JPH0778860A JP H0778860 A JPH0778860 A JP H0778860A JP 5245915 A JP5245915 A JP 5245915A JP 24591593 A JP24591593 A JP 24591593A JP H0778860 A JPH0778860 A JP H0778860A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- pressing member
- supporting
- transfer device
- support arm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、半導体ウエハなどの円
弧状の外周面を有する基板に対して、その表面に形成さ
れたフォトレジスト膜やシリコン酸化膜等の透明薄膜の
厚さを光学的に測定するとか、それら透明薄膜の他に金
属薄膜等を含む各種薄膜の線幅を顕微鏡で拡大した映像
を分析することで非接触で測定するとか、容量−電圧測
定法のような物性値を測定するとか、あるいは、回転処
理装置のような各種の処理装置などに使用する基板搬送
装置に関する。BACKGROUND OF THE INVENTION The present invention relates to a substrate having a circular arc-shaped outer peripheral surface such as a semiconductor wafer, and optically measuring the thickness of a transparent thin film such as a photoresist film or a silicon oxide film formed on the surface. In addition to the transparent thin film, the non-contact measurement is performed by analyzing the image of the line width of various thin films including the metal thin film magnified by a microscope, or the physical property value such as the capacitance-voltage measurement method is measured. The present invention relates to a substrate transfer device used for measurement or various processing devices such as a rotation processing device.
【0002】[0002]
【従来の技術】上述のような各種の測定装置において基
板を搬送する場合、従来、例えば、実開平2−1223
06号公報に開示されるように構成されている。すなわ
ち、この従来例によれば、カセットなどに収容された基
板を膜厚測定用のX−Yテーブル上のZテーブルに搬送
する場合、カセットから基板の裏面を吸着して支持する
支持アームにより基板を取り出し、位置決め部に一旦搬
送し、その位置決め部において、基板を当て板に当接さ
せてセンタリングを行うように構成されている。2. Description of the Related Art In the case of transferring a substrate in various measuring devices as described above, there is a conventional method such as, for example, an actual flat plate 2-1223.
It is configured as disclosed in Japanese Patent Publication No. 06-06. That is, according to this conventional example, when a substrate accommodated in a cassette or the like is conveyed to a Z table on an XY table for film thickness measurement, the substrate is supported by a support arm that attracts and supports the back surface of the substrate from the cassette. Is taken out, conveyed once to the positioning portion, and the substrate is brought into contact with the backing plate at the positioning portion to perform centering.
【0003】また、その他の基板を搬送する場合の従来
例としては、例えば、特開平5−3241号公報や実公
平3−18435号公報に記載されているようなものが
知られている。これらは、基板の支持アームに基板の載
置面より上方に突出した第1の段部(支持アームの進行
方向手前側に設けられた段部)と第2の段部(支持アー
ムの進行方向奥側に設けられた段部)とが対向して設け
られるとともに、一方の段部を他方の段部に対して相対
移動可能に構成されている。そして、例えば、基板をカ
セットから取り出すにあたっては、搬送アームをカセッ
ト内に進入させ、第2の段部で基板を手前に引き出した
後、どちらか一方の段部を他方の段部に対して相対移動
させて基板を挟み込んでセンタリングするようにしてい
る。As a conventional example for transporting other substrates, for example, those described in Japanese Patent Laid-Open No. 5-3241 and Japanese Utility Model Publication No. 3-18435 are known. These are a first step portion (a step portion provided on the front side in the traveling direction of the support arm) and a second step portion (the traveling direction of the support arm) protruding above the mounting surface of the substrate on the supporting arm of the substrate. The step portion provided on the back side is provided so as to face each other, and one step portion is configured to be movable relative to the other step portion. Then, for example, when the substrate is taken out from the cassette, the transfer arm is inserted into the cassette, the substrate is pulled out toward the front by the second step portion, and one of the step portions is moved relative to the other step portion. The substrate is pinched by moving it to center it.
【0004】[0004]
【発明が解決しようとする課題】しかしながら、前者の
従来例では、当て板によってセンタリングを行うための
構成が必要であり、位置決め部における構成が複雑化し
て高価になるとともに装置全体が大型化する欠点があっ
た。However, the former conventional example requires a structure for performing centering by means of a backing plate, which complicates the structure of the positioning portion and increases the cost, and also increases the size of the entire apparatus. was there.
【0005】また、後者の従来例では、支持アーム上で
基板のセンタリングを行うことができるので位置決め部
を別のスペースに設ける必要はなく、その分のスペース
は削減できるが、基板を支持アームに設けられた段部に
より挟み込んでセンタリングする構成であるので段部が
必要となる分厚み方向のスペースが必要となる。したが
って、例えば、カセット内で取り出したい基板が搬送装
置の進入方向に対して前方に傾いていたり、また、カセ
ット内に収容された基板と基板との間隔が狭く基板の下
方に空間的余裕がないような場合には使用することが困
難という欠点があった。Further, in the latter conventional example, since the substrate can be centered on the support arm, it is not necessary to provide the positioning portion in another space, and the space can be reduced by that amount, but the substrate is used as the support arm. Since the centering is performed by sandwiching the stepped portion provided, a space in the thickness direction is required because the stepped portion is required. Therefore, for example, the substrate to be taken out in the cassette is inclined forward with respect to the entrance direction of the transfer device, or the space between the substrates accommodated in the cassette is narrow and there is no space below the substrate. In such a case, there is a drawback that it is difficult to use.
【0006】本発明は、このような事情に鑑みてなされ
たものであって、請求項1に係る発明の基板搬送装置
は、センタリングを行うための構成を簡略化できるよう
にして安価にかつ小型化できるようにするとともに、基
板の下方空間に余裕がないような場合にも位置決めして
基板を取り出すことができるようにすることを目的と
し、また、請求項2に係る発明の基板搬送装置は、専用
の動力を用いずに押圧部材を退避できるようにすること
を目的とする。The present invention has been made in view of the above circumstances, and the substrate transfer apparatus according to the first aspect of the present invention is inexpensive and small in size because the structure for performing centering can be simplified. In addition, it is possible to position and take out the substrate even when there is no room in the space below the substrate. Further, the substrate transfer apparatus of the invention according to claim 2 is The purpose is to enable the pressing member to be retracted without using dedicated power.
【0007】[0007]
【課題を解決するための手段】請求項1に係る発明の基
板搬送装置は、上述のような目的を達成するために、水
平方向への移動を許容する状態で基板を支持する基板支
持部と、基板の外周端面が当接することにより水平方向
のうちの特定方向への基板の移動の限度を規制する移動
規制部とを備える基板支持手段に対して、基板を取り出
す基板搬送装置において、円弧状の外周面を有する基板
を支持する支持アームと、その支持アームを、基板支持
手段が支持する基板の下方にて、移動規制部が基板の移
動を規制する特定方向へ向けて、移動させる支持アーム
移動手段と、その支持アーム移動手段に変位可能なよう
に付設され、基板支持手段の移動規制部へ向けて円弧状
の当接部が基板の外周端面を押圧することで基板支持手
段の移動規制部に対して基板の位置決めをする押圧部材
を備えて構成する。In order to achieve the above-mentioned object, a substrate transfer apparatus of the invention according to claim 1 is provided with a substrate support portion for supporting the substrate in a state where movement in the horizontal direction is allowed. , A circular arc shape in the substrate transfer device for taking out the substrate with respect to the substrate supporting means having a movement restricting portion for restricting the limit of the movement of the substrate in a specific direction of the horizontal direction by the contact of the outer peripheral end surface of the substrate. And a support arm for supporting a substrate having an outer peripheral surface of the substrate, and a support arm for moving the support arm in a specific direction where the movement restricting unit restricts the movement of the substrate under the substrate supported by the substrate supporting means. The moving means and its supporting arm moving means are provided so as to be displaceable, and the arc-shaped contact portion presses the outer peripheral end surface of the substrate toward the movement restricting portion of the substrate supporting means, thereby restricting the movement of the substrate supporting means. To the department Configuring comprises a pressing member for positioning the substrate with.
【0008】また、請求項2に係る発明の基板搬送装置
は、上述のような目的を達成するために、請求項1に記
載の押圧部材と支持アームとの間に押圧力付与用のバネ
を設けるとともに、基板に対する保持力を解除した状態
で、カム面との接触によりバネの弾性復元力に抗して押
圧部材を基板から離れる水平方向に変位させるカム機構
を付設して構成する。In order to achieve the above-mentioned object, the substrate transfer apparatus of the invention according to claim 2 has a spring for applying a pressing force between the pressing member and the support arm according to claim 1. A cam mechanism is additionally provided, which displaces the pressing member in the horizontal direction away from the substrate against the elastic restoring force of the spring due to contact with the cam surface while the holding force to the substrate is released.
【0009】[0009]
【作用】請求項1に係る発明の基板搬送装置の構成によ
れば、基板支持手段に支持された基板を取り出すときな
どにおいて、支持アームを基板支持手段の移動規制部が
基板の移動を規制する特定位置へ向けて移動させると、
押圧部材の円弧状の当接部が基板の外周端面に当接し、
基板が基板支持手段の移動規制部に当接するまで押し動
かされ、行き止まる。これに伴い、基板の位置がずれて
いる場合に押圧力によって位置を自ずと調整し、その状
態で支持アームにより基板を支持することにより、セン
タリングを行った状態で基板を取り出すことができる。
また、支持アームにはセンタリング用の段部が不要なの
で、基板の下方に空間的余裕がないような場合にも問題
なく基板を取り出すことができる。According to the structure of the substrate transfer apparatus of the first aspect of the present invention, when the substrate supported by the substrate supporting means is taken out, the movement restricting portion of the substrate supporting means controls the movement of the substrate by the supporting arm. If you move it to a specific position,
The arcuate contact portion of the pressing member contacts the outer peripheral end surface of the substrate,
The substrate is pushed until it comes into contact with the movement restricting portion of the substrate supporting means, and the substrate stops. Along with this, when the position of the substrate is deviated, the position is automatically adjusted by the pressing force, and the substrate is supported by the support arm in this state, so that the substrate can be taken out in the centering state.
Further, since the support arm does not need a step for centering, the substrate can be taken out without problems even when there is no space below the substrate.
【0010】また、請求項2に係る発明の基板搬送装置
の構成によれば、基板を適所に受け渡す場合において、
カム機構によって押圧部材を基板に対して退避させ、基
板に対して押圧部材が影響を与えることを回避できる。According to the structure of the substrate transfer apparatus of the invention according to claim 2, when the substrate is delivered to a proper place,
It is possible to prevent the pressing member from affecting the substrate by retracting the pressing member from the substrate by the cam mechanism.
【0011】[0011]
<実施例>次に、本発明の実施例を図面に基づいて詳細
に説明する。<Embodiment> Next, an embodiment of the present invention will be described in detail with reference to the drawings.
【0012】図1は、本発明に係る基板搬送装置を用い
た電気的特性を測定する装置の平面図、図2は図1の側
面図であり、台1上に、カセット載置部2、基板搬送装
置3、および、電気的特性を測定する測定ステージ4が
設けられている。FIG. 1 is a plan view of an apparatus for measuring electrical characteristics using a substrate transfer apparatus according to the present invention, and FIG. 2 is a side view of FIG. A substrate transfer device 3 and a measurement stage 4 for measuring electrical characteristics are provided.
【0013】カセット載置部2は、図3の要部の一部切
欠拡大側面図、および、図4の要部の一部切欠拡大平面
図それぞれに示すように、それぞれオリエンテーション
フラットを有する複数個の基板Wを上下方向に多段状に
収納したカセット5を載置して構成されている。カセッ
ト5は、上下方向に所定間隔を隔てて基板嵌入溝6を形
成した溝形成部材7を対向状態で連結して構成され、か
つ、溝形成部材7,7それぞれの奥側に基板Wの外周端
面と当接するテーパ面Fが付設されている。A plurality of cassette mounting portions 2 each have an orientation flat, as shown in the partially cutaway enlarged side view of the essential portion of FIG. 3 and the partially cutaway enlarged plan view of the essential portion of FIG. The cassette 5 in which the substrates W are stored in the vertical direction in a multi-tiered manner is placed. The cassette 5 is configured by connecting the groove forming members 7 in which the substrate fitting grooves 6 are formed at predetermined intervals in the vertical direction in an opposed state, and the outer periphery of the substrate W on the inner side of each of the groove forming members 7 and 7. A tapered surface F that comes into contact with the end surface is provided.
【0014】なお、本実施例におけるカセット5が請求
項1に記載の「基板支持手段」に相当し、溝形成部材7
が請求項1に記載の「基板支持部」に相当し、テーパ面
Fが請求項1に記載の「移動規制部」に相当する。The cassette 5 in this embodiment corresponds to the "substrate supporting means" described in claim 1, and the groove forming member 7 is used.
Corresponds to the “substrate support portion” described in claim 1, and the tapered surface F corresponds to the “movement restriction portion” described in claim 1.
【0015】前記基板搬送装置3は、第1の電動モータ
8により正逆転されるネジ軸9とガイド10とによって
昇降可能に設けられた支持体11に、第1の移動体12
aと第2の移動体12bとから成る腰折れリンク型の移
動体12を第2の電動モータ13によって駆動屈伸可能
に設け、第2の移動体12bの先端側に、基板Wの外周
端面に当接する円弧状の当接部を成す円弧面14aを有
する押圧部材14と基板Wを真空吸着によって保持する
支持アーム15とを設けて構成されている。In the substrate transfer device 3, a first movable body 12 is mounted on a support body 11 which is vertically movable by a screw shaft 9 and a guide 10 which are normally and reversely rotated by a first electric motor 8.
A waist-breaking link type moving body 12 composed of a and the second moving body 12b is provided so as to be able to be bent and extended by a second electric motor 13, and the outer peripheral end surface of the substrate W is contacted with the tip side of the second moving body 12b. A pressing member 14 having an arcuate surface 14a forming a contacting arcuate contact portion and a support arm 15 for holding the substrate W by vacuum suction are provided.
【0016】本実施例における移動体12および電動モ
ータ13が請求項1に記載の「支持アーム移動手段」に
相当する。The moving body 12 and the electric motor 13 in this embodiment correspond to the "support arm moving means" described in claim 1.
【0017】図5の要部の分解斜視図に示すように、第
2の移動体12bの先端側に支持ブラケット16が取り
付けられるとともに、その支持ブラケット16に取付プ
レート17が取り付けられ、取付プレート17の下側に
固定ガイド体18aとバネ受け18bとが取り付けられ
るとともに、取付プレート17の上側に、先端側端縁に
沿って真空吸着孔19を形成した支持アーム15がその
基部側で取り付けられている。図示しないが、真空吸着
孔19には、支持アーム15、取付プレート17、支持
ブラケット16および移動体12に形成された連通孔を
通じて真空吸引源が接続されている。As shown in the exploded perspective view of the main part of FIG. 5, the support bracket 16 is attached to the tip side of the second moving body 12b, and the attachment plate 17 is attached to the support bracket 16 and the attachment plate 17 is attached. The fixed guide body 18a and the spring receiver 18b are attached to the lower side of the mounting plate 17, and the support arm 15 having the vacuum suction holes 19 formed along the tip end edge is attached to the upper side of the mounting plate 17 at the base side thereof. There is. Although not shown, a vacuum suction source is connected to the vacuum suction hole 19 through a communication hole formed in the support arm 15, the mounting plate 17, the support bracket 16 and the moving body 12.
【0018】固定ガイド体18aに対して摺動可能に可
動体20が設けられ、その可動体20とバネ受け18b
との間にバネとしての圧縮コイルスプリング21,21
が介装されるとともに、可動体20に設けた突起22を
取付プレート17に形成した長穴23内に嵌入すること
により可動体20の移動範囲が規制されている。可動体
20に、支持アーム15の上方に位置する状態で前記押
圧部材14が取り付けられている。バネとしては圧縮コ
イルスプリング21,21に代えて引っ張りスプリング
を用いても良い。押圧部材14は、支持アーム15の上
方側において、真空吸着孔19の位置よりも基部側に位
置し、圧縮コイルスプリング21の作用により支持アー
ム15の先端側方向へ付勢されている。A movable body 20 is provided slidably with respect to the fixed guide body 18a, and the movable body 20 and the spring receiver 18b are provided.
Compression coil springs 21 and 21 as springs between
The movable range of the movable body 20 is restricted by inserting the protrusion 22 provided in the movable body 20 into the elongated hole 23 formed in the mounting plate 17 while the movable body 20 is interposed. The pressing member 14 is attached to the movable body 20 in a state of being located above the support arm 15. A tension spring may be used as the spring instead of the compression coil springs 21 and 21. The pressing member 14 is located above the support arm 15 and closer to the base than the position of the vacuum suction hole 19, and is urged toward the tip end side of the support arm 15 by the action of the compression coil spring 21.
【0019】また、可動体20の先端側下部に、カム機
構を構成するガイドローラ24が回転可能に取り付けら
れ、後述するカム機構を構成するカム面F1(図6参
照)との接触により、前記圧縮コイルスプリング21,
21の弾性復元力に抗して押圧部材14を支持アーム1
5の基部側へ退避できるように構成されている。A guide roller 24 constituting a cam mechanism is rotatably attached to the lower portion of the movable body 20 on the tip side thereof, and is brought into contact with a cam surface F1 (see FIG. 6) constituting a cam mechanism which will be described later. Compression coil spring 21,
The pressing member 14 against the elastic restoring force of the support arm 21
It is configured so that it can be retracted to the base side of No. 5.
【0020】以上の構成により、図3および図4に示す
ように、カセット5から基板Wを取り出すときには、移
動体12を所望する基板Wの下へ支持アーム15が侵入
するように所定の高さまで上昇させた後、押圧部材14
を基板Wのカセット5の開口側の外周端面に当接させて
押圧力を付与し、基板Wのカセット5の奥側の外周端面
を溝形成部材7,7のテーパ面Fに押圧するまで移動体
12を水平に移動させることにより、その3箇所が接触
するように溝形成部材7,7に対して基板Wが変位し、
自ずとセンタリング位置になるように基板Wの位置を調
整することができる。With the above structure, as shown in FIGS. 3 and 4, when the substrate W is taken out of the cassette 5, the movable body 12 is moved to a predetermined height so that the support arm 15 can enter under the desired substrate W. After raising, the pressing member 14
Is brought into contact with the outer peripheral end surface of the substrate W on the opening side of the cassette 5 to apply pressing force, and the outer peripheral end surface of the substrate W on the inner side of the cassette 5 is moved until it is pressed against the tapered surface F of the groove forming members 7, By moving the body 12 horizontally, the substrate W is displaced with respect to the groove forming members 7 and 7 so that the three positions come into contact with each other,
The position of the substrate W can be adjusted so as to be the centering position.
【0021】その後に、支持アーム15による真空吸着
を行い、押圧部材14による押圧力、換言すれば、圧縮
コイルスプリング21,21の弾性復元力に抗して、セ
ンタリングを行った状態の基板Wを保持し、しかる後
に、移動体12を屈伸旋回し、第2の移動体12bを測
定ステージ4側に向ける。After that, vacuum suction is performed by the support arm 15, and the substrate W in the centered state is resisted against the pressing force of the pressing member 14, in other words, against the elastic restoring force of the compression coil springs 21 and 21. The movable body 12 is held, and after that, the movable body 12 is bent and extended, and the second movable body 12b is directed toward the measurement stage 4 side.
【0022】次いで、図6の要部の側面図に示すよう
に、基板Wを測定ステージ4上に位置させてから、移動
体12を下降させることにより、測定ステージ4の基台
25に付設したカム面F1にガイドローラ24を接触さ
せて押圧部材14を基板Wから離れる側、即ち、支持ア
ーム15の基部側に退避させ、その途中において、基板
Wが測定ステージ4上に載置された時点で支持アーム1
5による真空吸着を解除し、押圧部材14の影響を受け
ること無く基板Wを測定ステージ4上に受け渡すことが
できる。Next, as shown in the side view of the main part of FIG. 6, the substrate W is positioned on the measurement stage 4 and then the moving body 12 is lowered to attach it to the base 25 of the measurement stage 4. When the guide roller 24 is brought into contact with the cam surface F1 and the pressing member 14 is retracted to the side away from the substrate W, that is, the base side of the support arm 15, and the substrate W is placed on the measurement stage 4 in the middle thereof. With support arm 1
The vacuum suction by 5 is released, and the substrate W can be transferred onto the measurement stage 4 without being affected by the pressing member 14.
【0023】基板Wを測定ステージ4から取り出すとき
には、押圧部材14による押圧力を付与しない状態で支
持アーム15を基板Wの下面に移動させ、支持アーム1
5により基板Wを真空吸着保持してから移動体12を上
昇させ、それを回転ならびに屈伸し、更に、移動体12
を所定高さに上昇してカセット5の所定位置に戻すこと
ができる。When the substrate W is taken out from the measuring stage 4, the supporting arm 15 is moved to the lower surface of the substrate W without applying the pressing force of the pressing member 14, and the supporting arm 1 is moved.
5, the substrate W is vacuum-sucked and held, and then the moving body 12 is raised, rotated and bent, and further, the moving body 12 is moved.
Can be raised to a predetermined height and returned to a predetermined position of the cassette 5.
【0024】本発明は、上述のようにオリエンテーショ
ンフラットを有する基板Wの搬送に限らず、例えば、ノ
ッチを有する基板など、要するに、円弧状の外周面を有
する基板を搬送する場合に適用できる。The present invention can be applied not only to the transportation of the substrate W having the orientation flat as described above, but also to the transportation of a substrate having an arc-shaped outer peripheral surface such as a substrate having a notch.
【0025】また、上記実施例では、支持アーム15
を、基板Wを真空吸着によって保持するように構成して
いるが、例えば、内部電極を形成して基板Wを静電気力
により保持する、いわゆる静電チャックによって支持ア
ーム15を構成するものでも良い。Further, in the above embodiment, the support arm 15
Is configured to hold the substrate W by vacuum suction, but the support arm 15 may be configured by a so-called electrostatic chuck that holds the substrate W by an electrostatic force by forming an internal electrode.
【0026】前述の押圧部材14を退避させる場合に、
移動体12側を下降させずに、測定ステージ4の基台2
5側を上昇させるようにしても良い。また、カム面F1
を移動体12側に、そして、ガイドローラ24を基台2
5側に設けるように構成するものでも良い。When the pressing member 14 is retracted,
Without lowering the moving body 12 side, the base 2 of the measurement stage 4
You may make it raise 5 side. Also, the cam surface F1
To the moving body 12 side, and the guide roller 24 to the base 2
It may be configured to be provided on the 5 side.
【0027】また、上記実施例では、押圧部材14によ
り押圧力を付与する際に、移動体12による押圧部材1
4の押圧方向への移動量の変動や、個々の基板Wの外形
寸法のばらつきが原因で基板Wに無理な力をかけないた
めの過大な押圧を吸収するのに、圧縮コイルスプリング
21を用い、基板Wから退避させるときに、カム機構を
利用することにより専用の駆動力を不用にできるように
構成しているが、例えば、圧縮コイルスプリングを内装
した単動式のエアシリンダを用いて構成しても良い。Further, in the above embodiment, when the pressing force is applied by the pressing member 14, the pressing member 1 by the moving body 12 is used.
The compression coil spring 21 is used to absorb the excessive pressure for not applying an unreasonable force to the substrate W due to the variation of the movement amount of 4 in the pressing direction and the variation of the outer dimensions of the individual substrates W. When the substrate W is evacuated, a cam mechanism is used so that a dedicated driving force can be dispensed with. For example, a single-acting air cylinder with a compression coil spring is used. You may.
【0028】また、上記実施例における押圧部材14の
円弧面14aは、円弧状に複数の部材を並べて構成して
も良く、また、上記実施例では、押圧部材14と基板支
持部15とを相対移動できるように構成しているが、請
求項1に係る発明の基板搬送装置としては、押圧部材1
4と基板支持部15とを一体的に構成するものでも良
い。Further, the arc surface 14a of the pressing member 14 in the above embodiment may be formed by arranging a plurality of members in an arc shape, and in the above embodiment, the pressing member 14 and the substrate supporting portion 15 are opposed to each other. Although it is configured to be movable, the pressing member 1 is provided as the substrate transfer apparatus of the invention according to claim 1.
4 and the substrate supporting portion 15 may be integrally configured.
【0029】また、上記実施例ではカセット5から基板
Wを取り出す場合について説明しているが、本発明は、
例えば、搬送装置のアームからアームへ基板を受け渡し
する場合等においても実施できる。In the above embodiment, the case where the substrate W is taken out from the cassette 5 has been described, but the present invention is
For example, it can be carried out when the substrate is transferred from the arm of the transfer device to the arm.
【0030】[0030]
【発明の効果】以上説明したように、請求項1に係る発
明の基板搬送装置によれば、基板の取り出しにおいて、
自ずとセンタリングを行うことができるから、膜厚や物
性などを測定するといった装置などを構成する上で、セ
ンタリングを行うための構成を簡略化でき、装置全体を
安価にかつ小型化できるとともに取り出したい基板の下
方に空間的余裕がないような場合にも問題なく基板を取
り出すことができるようになった。As described above, according to the substrate transfer apparatus of the first aspect of the invention, when the substrate is taken out,
Since centering can be performed by itself, the configuration for centering can be simplified when configuring a device for measuring film thickness and physical properties, etc. Even if there is no space below the board, the board can be taken out without problems.
【0031】また、請求項2に係る発明の基板搬送装置
によれば、基板を適所に受け渡す場合に、カム機構で押
圧部材を基板に対して退避させるから、例えば、押圧部
材を単動式エアシリンダで構成する場合のコンプレッサ
ーといった専用の動力を用いずに押圧部材を退避でき、
より一層安価に構成できるようになった。Further, according to the substrate transfer apparatus of the second aspect of the present invention, when the substrate is delivered to the proper place, the pressing member is retracted from the substrate by the cam mechanism. The pressing member can be retracted without using a dedicated power source such as a compressor when configured with an air cylinder,
It can be constructed at a lower cost.
【図1】本発明に係る基板搬送装置を用いた電気的特性
を測定する装置の平面図である。FIG. 1 is a plan view of an apparatus for measuring electrical characteristics using a substrate transfer apparatus according to the present invention.
【図2】図1の側面図である。FIG. 2 is a side view of FIG.
【図3】要部の一部切欠拡大側面図である。FIG. 3 is a partially cutaway enlarged side view of a main part.
【図4】要部の一部切欠拡大平面図である。FIG. 4 is a partially cutaway enlarged plan view of a main part.
【図5】要部の分解斜視図である。FIG. 5 is an exploded perspective view of a main part.
【図6】要部の一部切欠側面図である。FIG. 6 is a partially cutaway side view of a main part.
12b…第2の移動体 14…押圧部材 15…支持アーム 21…圧縮コイルスプリング 24…ガイドローラ F1…カム面 W…基板 12b ... 2nd moving body 14 ... Pressing member 15 ... Support arm 21 ... Compression coil spring 24 ... Guide roller F1 ... Cam surface W ... Board
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H01L 21/027 21/66 L 7630−4M ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification number Office reference number FI technical display location H01L 21/027 21/66 L 7630-4M
Claims (2)
を支持する基板支持部と、基板の外周端面が当接するこ
とにより水平方向のうちの特定方向への基板の移動の限
度を規制する移動規制部とを備える基板支持手段に対し
て、基板を取り出す基板搬送装置において、 円弧状の外周面を有する基板を支持する支持アームと、 前記支持アームを、前記基板支持手段が支持する基板の
下方にて、前記移動規制部が基板の移動を規制する特定
方向へ向けて、移動させる支持アーム移動手段と、 前記支持アーム移動手段に変位可能なように付設され、
前記基板支持手段の前記移動規制部へ向けて円弧状の当
接部が基板の外周端面を押圧することで前記基板支持手
段の前記移動規制部に対して基板の位置決めをする押圧
部材を備えたことを特徴とする基板搬送装置。1. A limit of movement of a substrate in a specific direction of the horizontal direction is regulated by contact between a substrate supporting portion that supports the substrate in a state where the substrate is allowed to move in the horizontal direction and an outer peripheral end surface of the substrate. In a substrate transfer device that takes out a substrate with respect to a substrate supporting unit that includes a movement restricting unit, a supporting arm that supports the substrate having an arcuate outer peripheral surface, and Below, the movement restricting portion is attached to the supporting arm moving means for moving in a specific direction for restricting the movement of the substrate, and the supporting arm moving means so as to be displaceable,
The substrate supporting means includes a pressing member for positioning the substrate with respect to the movement restricting portion of the substrate supporting means by pressing an outer peripheral end surface of the substrate toward the movement restricting portion of the substrate supporting means. A substrate transfer device characterized by the above.
との間に押圧力付与用のバネを設けるとともに、基板に
対する保持力を解除した状態で、カム面との接触により
前記バネの弾性復元力に抗して前記押圧部材を前記基板
から離れる水平方向に変位させるカム機構を付設してあ
る基板搬送装置。2. A spring for applying a pressing force is provided between the pressing member and the support arm according to claim 1, and when the holding force for the substrate is released, the elasticity of the spring is brought into contact with the cam surface. A substrate transfer device provided with a cam mechanism for displacing the pressing member in a horizontal direction away from the substrate against a restoring force.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5245915A JPH0778860A (en) | 1993-09-06 | 1993-09-06 | Substrate transfer device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5245915A JPH0778860A (en) | 1993-09-06 | 1993-09-06 | Substrate transfer device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0778860A true JPH0778860A (en) | 1995-03-20 |
Family
ID=17140734
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5245915A Pending JPH0778860A (en) | 1993-09-06 | 1993-09-06 | Substrate transfer device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0778860A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002052639A1 (en) * | 2000-12-27 | 2002-07-04 | Tokyo Electron Limited | Workpiece transfer system, transfer method, vacuum chuck, and wafer centering method |
US7457680B2 (en) | 2000-12-27 | 2008-11-25 | Tokyo Electron Limited | Conveyance method for transporting objects |
JP2010045196A (en) * | 2008-08-13 | 2010-02-25 | Disco Abrasive Syst Ltd | Transport mechanism for plate-shaped material |
CN107527848A (en) * | 2016-06-20 | 2017-12-29 | 上海新昇半导体科技有限公司 | A kind of grasping means of mechanical arm and substrate |
CN111077736A (en) * | 2018-10-18 | 2020-04-28 | 上海微电子装备(集团)股份有限公司 | Plate taking and placing device, transmission system, photoetching machine and station calibration method |
-
1993
- 1993-09-06 JP JP5245915A patent/JPH0778860A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002052639A1 (en) * | 2000-12-27 | 2002-07-04 | Tokyo Electron Limited | Workpiece transfer system, transfer method, vacuum chuck, and wafer centering method |
US7457680B2 (en) | 2000-12-27 | 2008-11-25 | Tokyo Electron Limited | Conveyance method for transporting objects |
JP2010045196A (en) * | 2008-08-13 | 2010-02-25 | Disco Abrasive Syst Ltd | Transport mechanism for plate-shaped material |
CN107527848A (en) * | 2016-06-20 | 2017-12-29 | 上海新昇半导体科技有限公司 | A kind of grasping means of mechanical arm and substrate |
CN111077736A (en) * | 2018-10-18 | 2020-04-28 | 上海微电子装备(集团)股份有限公司 | Plate taking and placing device, transmission system, photoetching machine and station calibration method |
CN111077736B (en) * | 2018-10-18 | 2021-02-09 | 上海微电子装备(集团)股份有限公司 | Plate taking and placing device, transmission system, photoetching machine and station calibration method |
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