JPH0773678A - Semiconductor static memory - Google Patents

Semiconductor static memory

Info

Publication number
JPH0773678A
JPH0773678A JP5218293A JP21829393A JPH0773678A JP H0773678 A JPH0773678 A JP H0773678A JP 5218293 A JP5218293 A JP 5218293A JP 21829393 A JP21829393 A JP 21829393A JP H0773678 A JPH0773678 A JP H0773678A
Authority
JP
Japan
Prior art keywords
bit line
resistance
load element
bit
memory cell
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5218293A
Other languages
Japanese (ja)
Inventor
Kazuyuki Nakamura
和之 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP5218293A priority Critical patent/JPH0773678A/en
Priority to KR1019940016542A priority patent/KR0138881B1/en
Priority to US08/271,663 priority patent/US5463580A/en
Publication of JPH0773678A publication Critical patent/JPH0773678A/en
Pending legal-status Critical Current

Links

Landscapes

  • Dram (AREA)
  • Static Random-Access Memory (AREA)

Abstract

PURPOSE:To accelerate information read operation by arranging a load element pulling up a bit line in an SRAM on the central part of the bit line. CONSTITUTION:When a specified word line is made H level, a memory cell current flows through the bit line according to an information content of a relevant memeory cell. A voltage drop when the current flows through the bit line load element consisting of e.g. a MOSFET is detected by a sense amplifier mounted on one end of the bit line to be outputted as the bit data. When the bit line is long and thin, since the voltage drop due to resistance of the bit line itself is added to that also, a difference occurs to the level of a detection signal according to the position of the cell. As a countermeasure, the bit line load element is arranged on the central part of the bit line in the direction of prolongation. Thus, the resistance of the bit line is reduced substantially.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体スタティックメ
モリの大規模化、高速化に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to increasing the scale and speed of a semiconductor static memory.

【0002】[0002]

【従来の技術】現在の大容量半導体スタティックランダ
ムアクセスメモリ(SRAM)においては、大規模化に
応じて、一対のビット線につながるセル数の増大によ
り、ビット線長は伸び、また、一方で、LSIの微細化
により、ビット線の線幅は縮小している。これらの要因
によって、ビット線自身の抵抗は増大する傾向にあり、
これは、情報読みだし時間の悪化や、動作マージンの減
少を起させることになる。図4に、SRAMにおける、
ビット線からセンスアンプまでの回路の一例を示す。こ
の回路において、メモリセルの情報は、ワード線WL1
がハイ(H)レベルとなることによって、メモリセル電
流ICIとして読み出され、この電流が負荷MOSFE
T MP41に流れることで、電圧降下を生じ、センス
回路SAの入力にΔVなる電位差を与える。しかし、こ
こで、ビット線自身に寄生抵抗Rbがある場合には、選
択するメモリセルの位置に依存して、センス回路への入
力振幅△Vが異なるという現象がおこる。図4において
は、ワード線WL2につながるメモリセルを選択する場
合、メモリセル電流IC2はICIと同様であるが、ビ
ット線負荷MP41のオン抵抗とビット線抵抗Rbの和
に対してIC2が流れるために、ビット線Bの電圧降下
は、メモリセル1を選択する場合よりも大きくなり、△
Vは増大してしまう。高速動作の為には、センス回路の
入力信号振幅△Vは小さい方が好ましい。必要以上の△
Vの増大は、ビット線の反転時間を劣化させ、読みだし
時間の増大を招く。
2. Description of the Related Art In a current large-capacity semiconductor static random access memory (SRAM), the bit line length is increased due to an increase in the number of cells connected to a pair of bit lines in accordance with the increase in size, and on the other hand, Due to the miniaturization of LSIs, the line width of bit lines has been reduced. Due to these factors, the resistance of the bit line itself tends to increase,
This causes deterioration of the information reading time and reduction of the operation margin. In FIG. 4, in SRAM,
An example of a circuit from a bit line to a sense amplifier is shown. In this circuit, the information of the memory cell is the word line WL1.
Becomes high (H) level, and is read as the memory cell current ICI, and this current is read by the load MOSFE.
By flowing into TMP41, a voltage drop occurs and a potential difference of ΔV is applied to the input of the sense circuit SA. However, here, when the bit line itself has a parasitic resistance Rb, the input amplitude ΔV to the sense circuit differs depending on the position of the selected memory cell. In FIG. 4, when the memory cell connected to the word line WL2 is selected, the memory cell current IC2 is the same as ICI, but because IC2 flows with respect to the sum of the ON resistance of the bit line load MP41 and the bit line resistance Rb. In addition, the voltage drop of the bit line B becomes larger than that when the memory cell 1 is selected, and Δ
V will increase. For high speed operation, it is preferable that the input signal amplitude ΔV of the sense circuit is small. More than necessary △
The increase of V deteriorates the inversion time of the bit line and causes an increase in read time.

【0003】[0003]

【発明が解決しようとする課題】しかるに、近年のLS
Iの大規模化に伴い、ビット線抵抗の増大が顕著となっ
てきたために、選択するメモリセルの位置による、ビッ
ト線振幅値の差が無視できなくなってきた。また、ビッ
ト線抵抗による、ビット線上の信号遅延時間の増大も問
題となっている。今後、さらに、集積化が進むにしたが
って、この問題は、より顕著となり、高速SRAMを実
現する上で大きな問題となることが予想される。
However, LS in recent years
Since the bit line resistance has increased remarkably with the increase in I, the difference in the bit line amplitude value depending on the position of the selected memory cell cannot be ignored. Another problem is that the bit line resistance increases the signal delay time on the bit line. It is expected that this problem will become more prominent as the integration further progresses in the future, and will become a major problem in realizing a high-speed SRAM.

【0004】本発明の目的は、ビット線の抵抗が高い場
合でも、ビット線負荷の配置位置を最適化することによ
って、読みだし動作速度の劣化を最小化することを実現
するものである。
It is an object of the present invention to minimize the deterioration of the read operation speed by optimizing the arrangement position of the bit line load even when the resistance of the bit line is high.

【0005】[0005]

【課題を解決するための手段】本発明は、選択されたメ
モリセルによる読みだし電流を、一対のビット線対を通
して接続される抵抗性負荷に流すことにより電位差を生
じさせ、情報を読み出す半導体スタティックメモリにお
いて、前記抵抗性負荷をビット線の中央部に配置するこ
とを特徴とする。
SUMMARY OF THE INVENTION According to the present invention, a read static current from a selected memory cell is applied to a resistive load connected through a pair of bit lines to generate a potential difference, thereby reading information. In the memory, the resistive load is arranged at the center of the bit line.

【0006】本発明によれば、ビット線抵抗が増大した
場合でも、SRAMの情報読みだし時間の劣化を最小化
し、より大規模な高速SRAMを実現できるようにな
る。
According to the present invention, even if the bit line resistance increases, the deterioration of the information reading time of the SRAM can be minimized and a larger scale high speed SRAM can be realized.

【0007】[0007]

【実施例】次に、図1を参照して、本発明の実施例につ
いて説明する。図1は、本発明の第1実施例の構成であ
る。従来は、図2(1)、(2)に示すように、ビット
線負荷はビット線端部に配置されていた。これは端部に
配置すると片側だけでビット線と接続すればよいので配
置が容易だからである。本発明では、図1に示すよう
に、ビット線負荷はビット線中央部に配置する。次に、
図3を用いて、本発明の効果を示す。図3は、ビット線
上のビット線負荷の配置位置とビット線遅延時間の関係
を示したもので、設計パラメータとしては、16Mb相
当の大容量SRAMを想定している。このビット線遅延
時間は、同一ビット線上の2つの任意のメモリセルの切
り換え読みだしにおいて、最大となる遅延時間を示す。
ビット線抵抗値は、0Ω、500Ω、1KΩの場合を示
した。ビット線抵抗が大きいほど、遅延時間のビット線
負荷配置位置に対する影響は顕著であり、ビット線中央
から、ややセンスアンプよりにビット線負荷を配置した
場合が、最も高速となっている。これは、ビット線中央
部にビット線負荷を配置すれば、ビット線のプルアップ
電流がビット線中央から供給されるために、ビット線抵
抗が半分に見え、高速なビット線プルアップが行えるた
めである。
EXAMPLES Next, examples of the present invention will be described with reference to FIG. FIG. 1 shows the configuration of the first embodiment of the present invention. Conventionally, as shown in FIGS. 2A and 2B, the bit line load has been arranged at the end of the bit line. This is because the arrangement at the end portion is easy because it is sufficient to connect to the bit line on only one side. In the present invention, as shown in FIG. 1, the bit line load is arranged at the center of the bit line. next,
The effect of the present invention will be described with reference to FIG. FIG. 3 shows the relationship between the arrangement position of the bit line load on the bit line and the bit line delay time. As a design parameter, a large capacity SRAM equivalent to 16 Mb is assumed. This bit line delay time indicates the maximum delay time when switching and reading two arbitrary memory cells on the same bit line.
The bit line resistance values are 0Ω, 500Ω, and 1KΩ. The greater the bit line resistance, the more noticeable the influence of the delay time on the bit line load placement position, and the highest speed is achieved when the bit line load is placed slightly from the center of the bit line to the sense amplifier. This is because if the bit line load is placed in the center of the bit line, the pull-up current of the bit line is supplied from the center of the bit line, so the bit line resistance appears to be half and high-speed bit line pull-up can be performed. Is.

【0008】よって、実際のメモリセルのレイアウトで
は、ビット線負荷MOSをビット線中央に配置すること
により、ビット線遅延時間を最小化できる。
Therefore, in the actual layout of the memory cell, the bit line delay time can be minimized by disposing the bit line load MOS in the center of the bit line.

【0009】[0009]

【発明の効果】本発明の効果は、請求の範囲に記載した
構成によって、ビット線抵抗が高い場合でも、読みだし
動作速度の劣化を最小とすることを実現するという目的
が達成されるというものである。
According to the effects of the present invention, the object of achieving the minimum deterioration of the read operation speed even when the bit line resistance is high is achieved by the structure described in the claims. Is.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の実施例を示す構成図である。FIG. 1 is a configuration diagram showing an embodiment of the present invention.

【図2】従来方式の構成図である。FIG. 2 is a configuration diagram of a conventional method.

【図3】本発明の効果を示すシミュレーション結果の図
である。
FIG. 3 is a diagram showing simulation results showing the effect of the present invention.

【図4】半導体スタティックメモリのビット線周辺回路
の図である。
FIG. 4 is a diagram of a bit line peripheral circuit of a semiconductor static memory.

【符号の説明】[Explanation of symbols]

MP41,MP42 ビット線負荷用pチャンネルMO
Sトランジスタ WL1,WL2 ワード線 B,Bバー ビット線 Rb ビット線抵抗 Ic1,Ic2 メモリセル電流 △V センス回路への入力信号振幅 VCC 電源電圧
MP41, MP42 p channel MO for bit line load
S transistor WL1, WL2 Word line B, B bar Bit line Rb Bit line resistance Ic1, Ic2 Memory cell current ΔV Input signal amplitude to sense circuit VCC Power supply voltage

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 選択されたメモリセルによる読みだし電
流を、一対のビット線対を通して接続される抵抗性負荷
に流すことにより電位差を生じさせ、情報を読み出す半
導体スタティックメモリにおいて、前記抵抗性負荷をビ
ット線の中央部に配置することを特徴とする半導体スタ
ティックメモリ。
1. A semiconductor static memory for reading information by causing a read current from a selected memory cell to flow through a resistive load connected through a pair of bit lines to generate a potential difference, and the resistive load is applied to the semiconductor static memory. A semiconductor static memory characterized by being arranged in the center of a bit line.
JP5218293A 1993-07-07 1993-09-02 Semiconductor static memory Pending JPH0773678A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP5218293A JPH0773678A (en) 1993-09-02 1993-09-02 Semiconductor static memory
KR1019940016542A KR0138881B1 (en) 1993-07-07 1994-07-07 Static semiconductor memory device having improved read operation margin and speed
US08/271,663 US5463580A (en) 1993-07-07 1994-07-07 Static semiconductor memory device having improved read operation margin and speed

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5218293A JPH0773678A (en) 1993-09-02 1993-09-02 Semiconductor static memory

Publications (1)

Publication Number Publication Date
JPH0773678A true JPH0773678A (en) 1995-03-17

Family

ID=16717570

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5218293A Pending JPH0773678A (en) 1993-07-07 1993-09-02 Semiconductor static memory

Country Status (1)

Country Link
JP (1) JPH0773678A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08273363A (en) * 1995-03-30 1996-10-18 Nec Corp Semiconductor memory

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03127398A (en) * 1989-10-13 1991-05-30 Sharp Corp Readout circuit for semiconductor memory device
JPH05274883A (en) * 1992-03-25 1993-10-22 Seiko Epson Corp Semiconductor memory

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03127398A (en) * 1989-10-13 1991-05-30 Sharp Corp Readout circuit for semiconductor memory device
JPH05274883A (en) * 1992-03-25 1993-10-22 Seiko Epson Corp Semiconductor memory

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08273363A (en) * 1995-03-30 1996-10-18 Nec Corp Semiconductor memory

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