JPH0735294Y2 - イオン処理装置 - Google Patents
イオン処理装置Info
- Publication number
- JPH0735294Y2 JPH0735294Y2 JP1988157366U JP15736688U JPH0735294Y2 JP H0735294 Y2 JPH0735294 Y2 JP H0735294Y2 JP 1988157366 U JP1988157366 U JP 1988157366U JP 15736688 U JP15736688 U JP 15736688U JP H0735294 Y2 JPH0735294 Y2 JP H0735294Y2
- Authority
- JP
- Japan
- Prior art keywords
- ion
- sample
- ion source
- source chamber
- deceleration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 31
- 238000001514 detection method Methods 0.000 claims description 8
- 238000000605 extraction Methods 0.000 claims description 7
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 150000002500 ions Chemical class 0.000 description 36
- 238000009826 distribution Methods 0.000 description 21
- 230000001133 acceleration Effects 0.000 description 13
- 101100269674 Mus musculus Alyref2 gene Proteins 0.000 description 12
- 101100537098 Mus musculus Alyref gene Proteins 0.000 description 11
- 101150095908 apex1 gene Proteins 0.000 description 11
- 230000007423 decrease Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000000630 rising effect Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988157366U JPH0735294Y2 (ja) | 1988-12-01 | 1988-12-01 | イオン処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988157366U JPH0735294Y2 (ja) | 1988-12-01 | 1988-12-01 | イオン処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0277843U JPH0277843U (enrdf_load_stackoverflow) | 1990-06-14 |
| JPH0735294Y2 true JPH0735294Y2 (ja) | 1995-08-09 |
Family
ID=31436742
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1988157366U Expired - Fee Related JPH0735294Y2 (ja) | 1988-12-01 | 1988-12-01 | イオン処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0735294Y2 (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4504880B2 (ja) * | 2005-07-08 | 2010-07-14 | 株式会社日立ハイテクノロジーズ | 真空排気系を利用したシリンダを用いたイオンビーム電流測定機構 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58157045A (ja) * | 1982-03-15 | 1983-09-19 | Hitachi Ltd | イオン打込み装置 |
| JPS63152844A (ja) * | 1986-12-16 | 1988-06-25 | Nec Corp | イオンビ−ムスキヤン制御装置 |
-
1988
- 1988-12-01 JP JP1988157366U patent/JPH0735294Y2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0277843U (enrdf_load_stackoverflow) | 1990-06-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |