JPH0734926Y2 - イオン処理装置 - Google Patents

イオン処理装置

Info

Publication number
JPH0734926Y2
JPH0734926Y2 JP1988137289U JP13728988U JPH0734926Y2 JP H0734926 Y2 JPH0734926 Y2 JP H0734926Y2 JP 1988137289 U JP1988137289 U JP 1988137289U JP 13728988 U JP13728988 U JP 13728988U JP H0734926 Y2 JPH0734926 Y2 JP H0734926Y2
Authority
JP
Japan
Prior art keywords
ion beam
ion
holder
sample
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP1988137289U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0257956U (enrdf_load_html_response
Inventor
勝男 内藤
英五 古口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissin Electric Co Ltd
Original Assignee
Nissin Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissin Electric Co Ltd filed Critical Nissin Electric Co Ltd
Priority to JP1988137289U priority Critical patent/JPH0734926Y2/ja
Publication of JPH0257956U publication Critical patent/JPH0257956U/ja
Application granted granted Critical
Publication of JPH0734926Y2 publication Critical patent/JPH0734926Y2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP1988137289U 1988-10-20 1988-10-20 イオン処理装置 Expired - Fee Related JPH0734926Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1988137289U JPH0734926Y2 (ja) 1988-10-20 1988-10-20 イオン処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988137289U JPH0734926Y2 (ja) 1988-10-20 1988-10-20 イオン処理装置

Publications (2)

Publication Number Publication Date
JPH0257956U JPH0257956U (enrdf_load_html_response) 1990-04-26
JPH0734926Y2 true JPH0734926Y2 (ja) 1995-08-09

Family

ID=31398578

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988137289U Expired - Fee Related JPH0734926Y2 (ja) 1988-10-20 1988-10-20 イオン処理装置

Country Status (1)

Country Link
JP (1) JPH0734926Y2 (enrdf_load_html_response)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60185657U (ja) * 1984-05-17 1985-12-09 三洋電機株式会社 薄膜形成装置

Also Published As

Publication number Publication date
JPH0257956U (enrdf_load_html_response) 1990-04-26

Similar Documents

Publication Publication Date Title
JPH088245B2 (ja) 集束イオンビームエッチング装置
JPH04112441A (ja) イオン注入装置及びそのクリーニング方法
JPH0734926Y2 (ja) イオン処理装置
JPH07122136B2 (ja) イオンビームスパッタ装置および運転方法
JPH11293468A (ja) プラズマcvd装置およびそのクリーニング方法
JPH01207930A (ja) 表面改質法
JPS63107118A (ja) イオンビ−ム装置
JP3525134B2 (ja) クラスターイオンビームの質量分離方法
JPS6148210B2 (enrdf_load_html_response)
JPH01238020A (ja) プラズマ処理装置、及びその処理システム
JP7385809B2 (ja) イオンビーム照射装置のクリーニング方法
JPH10135149A (ja) レーザーアニール処理装置
JPH01294341A (ja) イオン注入装置
JPS634997Y2 (enrdf_load_html_response)
JPS6136928A (ja) 真空装置
JPS61163269A (ja) イオン蒸着薄膜形成装置
JPH03259515A (ja) ドライエッチング方法
JPH03207859A (ja) イオン源装置およびイオンビーム処理装置
JPH03210746A (ja) イオン処理装置のクリーニング方法
JPS61163270A (ja) イオン蒸着薄膜形成装置
JPS63271856A (ja) イオンビ−ム蒸着装置
JPH0943174A (ja) プラズマエッチング装置を備えた表面分析装置
JPH07151711A (ja) 表面分析方法および装置
JPS5854540A (ja) 質量分析装置のイオン源
JPH02230731A (ja) イオンビーム加工方法

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees